CN106502005A - 一种显示面板及其制备方法和显示装置 - Google Patents
一种显示面板及其制备方法和显示装置 Download PDFInfo
- Publication number
- CN106502005A CN106502005A CN201710002573.1A CN201710002573A CN106502005A CN 106502005 A CN106502005 A CN 106502005A CN 201710002573 A CN201710002573 A CN 201710002573A CN 106502005 A CN106502005 A CN 106502005A
- Authority
- CN
- China
- Prior art keywords
- substrate
- bolster
- chock insulator
- insulator matter
- towards
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002360 preparation method Methods 0.000 title claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 171
- 239000012212 insulator Substances 0.000 claims abstract description 121
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 30
- 239000010410 layer Substances 0.000 claims description 66
- 238000000034 method Methods 0.000 claims description 16
- 239000011241 protective layer Substances 0.000 claims description 9
- 229920002120 photoresistant polymer Polymers 0.000 claims description 8
- 239000002861 polymer material Substances 0.000 claims description 5
- 239000006185 dispersion Substances 0.000 claims description 3
- 239000000049 pigment Substances 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 11
- 238000005516 engineering process Methods 0.000 abstract description 5
- 239000010408 film Substances 0.000 description 6
- 230000035515 penetration Effects 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 229920002521 macromolecule Polymers 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1341—Filling or closing of cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1218—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or structure of the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1262—Multistep manufacturing methods with a particular formation, treatment or coating of the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1288—Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13396—Spacers having different sizes
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13398—Spacer materials; Spacer properties
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
本发明涉及显示技术领域,特别涉及一种显示面板及其制备方法和显示装置。该显示面板包括第一基板、第二基板、液晶层以及多个枕垫隔垫物;每个枕垫隔垫物包括枕垫以及隔垫物;每个枕垫隔垫物的高度均相等,即,每个枕垫隔垫物中,枕垫与隔垫物的高度之和均相等,以使液晶层在第一基板和第二基板之间的厚度均等。该显示面板能够提高盒厚的均一性,减少产生显示不良的概率,进而能够提高显示面板的画面质量和显示效果。
Description
技术领域
本发明涉及显示技术领域,特别涉及一种显示面板及其制备方法和显示装置。
背景技术
液晶显示器(Liquid Crystal Display,LCD)因具有节省空间、发热少、功耗低、无辐射等诸多优点,而受到广大用户的青睐。液晶显示器主要包括彩膜基板、阵列基板、液晶层以及偏光片等部件,液晶层由灌入在彩膜基板和阵列基板之间的液晶形成。液晶显示器中液晶层的厚度对光的透过率影响较大,透过液晶层的光不同时便会出现显示不均的现象。因此,为了保证液晶显示器的均一显示,保证均匀的盒厚(Cell Gap)非常重要。
在制作液晶显示器的阵列基板的过程中,阵列基板的金属膜层是通过磁控溅射(Magnetron Sputtering)方式形成的。目前,磁控溅射过程中使用的靶材均为拼接而成的条状靶材,在靶材中心位置和拼接位置的成膜质量和成膜速度均有差异,并且靶材中心的金属膜较厚,靶材拼接位置的金属膜较薄,因此在靶材垂直方向上将形成金属膜薄厚的周期分布。
为了保持盒厚的稳定性和均一性,在阵列基板和彩膜基板之间设置枕垫(Pillow)隔垫物(Post Spacer,PS),枕垫隔垫物包括隔垫物和由阵列基板的金属膜层形成的枕垫。由于阵列基板的金属膜层的厚度成周期性分布,因此,导致枕垫的厚度呈周期性分布。在显示面板对盒后必将形成盒厚的周期性分布,即:靶材中心位置的厚度偏大,靶材拼接位置的厚度偏小,使液晶显示器在靶材中心位置的光线透过率大于靶材拼接位置的光线透过率,产生显示不良。
发明内容
本发明提供了一种显示面板及其制备方法和显示装置,该显示面板能够提高盒厚的均一性,减少产生显示不良的概率,进而能够提高显示面板的画面质量和显示效果。
为达到上述目的,本发明提供以下技术方案:
一种显示面板,包括第一基板、第二基板、液晶层、以及支撑于所述第一基板和所述第二基板之间的多个枕垫隔垫物;每个枕垫隔垫物包括形成于所述第一基板朝向所述第二基板一侧的枕垫、以及形成于所述第二基板朝向所述第一基板一侧的隔垫物,所述枕垫朝向所述第二基板一侧的端面与所述隔垫物朝向所述第一基板一侧的端面相抵;
每个所述枕垫隔垫物的高度均相等,即,每个所述枕垫隔垫物中,所述枕垫与所述隔垫物的高度之和均相等,以使所述液晶层在所述第一基板和所述第二基板之间的厚度均等。
在上述显示面板中,由于每个枕垫隔垫物的高度均相等,即,每个枕垫隔垫物中,枕垫与隔垫物的高度之和均相等,因此,通过枕垫隔垫物支撑的第一基板和第二基板之间的间距均相等,也就是说,第一基板与第二基板之间的间距一致,进而灌注在第一基板和第二基板之间的液晶层的厚度也均等,消除了现有技术中盒厚的周期性变化,提高了盒厚的均一性,使整个显示面板的光线透过率一致,减少了产生显示不良的概率,进一步减小了对显示效果的影响,提高了画面质量和显示效果。
因此,该显示面板能够提高盒厚的均一性,减少产生显示不良的概率,进而能够提高显示面板的画面质量和显示效果。
优选地,在每个枕垫隔垫物中,所述隔垫物的高度随所述枕垫的高度的变化而变化。
优选地,所述枕垫包括设置于所述第一基板朝向所述第二基板一侧表面的栅极层。
优选地,所述枕垫包括依次设置于所述第一基板朝向所述第二基板一侧表面的栅极层、栅极绝缘层、有源层、源漏电极层以及保护层。
优选地,所述隔垫物由高分子聚合物材料制成。
本发明还提供了一种显示装置,该显示装置包括上述技术方案提供的任意一种显示面板。
另外,本发明还提供了一种上述技术方案中任意一种显示面板的制备方法,所述显示面板包括第一基板、第二基板、液晶层、以及支撑于所述第一基板和所述第二基板之间的多个枕垫隔垫物;每个枕垫隔垫物包括形成于所述第一基板朝向所述第二基板一侧的枕垫、以及形成于所述第二基板朝向所述第一基板一侧的隔垫物,所述枕垫朝向所述第二基板一侧的端面与所述隔垫物朝向所述第一基板一侧的端面相抵;每个所述枕垫隔垫物的高度均相等;制备方法包括:
形成第一基板和第二基板;
在所述第一基板朝向所述第二基板的一侧形成多个枕垫;
在所述第二基板朝向所述第一基板的一侧形成与所述多个枕垫一一对应的隔垫物,每个隔垫物的高度随对应的枕垫高度的变化而变化,以使每对一一对应的枕垫和隔垫物的高度之和均相等;
对盒连接所述第一基板和所述第二基板,使每个枕垫与对应的隔垫物相抵。
优选地,在所述第二基板朝向所述第一基板的一侧形成与所述多个枕垫一一对应的隔垫物之前,还包括:
在所述第二基板上形成光阻层。
优选地,在所述第二基板上形成光阻层中,通过颜料分散法或喷墨法形成所述光阻层。
优选地,在所述第二基板朝向所述第一基板的一侧形成与所述多个枕垫一一对应的隔垫物中,通过灰阶掩膜工艺曝光形成所述隔垫物,以使在每个枕垫隔垫物中,所述隔垫物的高度随所述枕垫的高度的变化而变化,以使每个所述枕垫隔垫物的高度均相等,即,每个所述枕垫隔垫物中,所述枕垫与所述隔垫物的高度之和均相等。
附图说明
图1为本发明一种实施例提供的显示面板的结构示意图;
图2为本发明一种实施例提供的显示面板的枕垫隔垫物的具体结构示意图;
图3为本发明一种实施例提供的显示面板的制备方法的工艺流程图。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
本发明实施例提供了一种显示面板及其制备方法和显示装置,该显示装置包括显示面板,该显示面板通过高度均相等的枕垫隔垫物使液晶层在第一基板和第二基板之间的厚度均等,因此,该显示面板能够提高盒厚的均一性,减少产生显示不良的概率,进而能够提高显示面板的画面质量和显示效果。
其中,如图1以及图2结构所示,本发明一种实施例提供的显示面板1,包括第一基板10、第二基板20、液晶层30、以及支撑于第一基板10和第二基板20之间的多个枕垫隔垫物40;每个枕垫隔垫物40包括形成于第一基板10朝向第二基板20一侧的枕垫41、以及形成于第二基板20朝向第一基板10一侧的隔垫物42,枕垫41朝向第二基板20一侧的端面与隔垫物42朝向第一基板10一侧的端面相抵;
每个枕垫隔垫物40的高度均相等,即,每个枕垫隔垫物40中,枕垫41与隔垫物42的高度之和均相等,以使液晶层30在第一基板10和第二基板20之间的厚度均等。
如图1中结构所示,在第一基板10和第二基板20之间阵列分布有多个枕垫隔垫物40,每个枕垫隔垫物40均支撑于第一基板10和第二基板20之间,并且每个枕垫隔垫物40的高度均相等,每个枕垫隔垫物40中隔垫物42的高度与枕垫41的高度相关,并随枕垫41的高度变化而变化,使枕垫41与隔垫物42的高度之和保持统一,并使枕垫41与隔垫物42的高度之和均等于第一基板10与第二基板20之间的间距,以使第一基板10与第二基板20之间的间距保持一致,进而使设置于第一基板10与第二基板20之间的液晶层30厚度均等,使光线透过率一致。
在上述显示面板1中,由于每个枕垫隔垫物40的高度均相等,即,每个枕垫隔垫物40中,枕垫41与隔垫物42的高度之和均相等,因此,通过枕垫隔垫物40支撑的第一基板10与第二基板20之间的间距均相等,也就是说,第一基板10和第二基板20之间间距一致,进而灌注在第一基板10与第二基板20之间的液晶层30的厚度也相等,消除了现有技术中盒厚的周期性变化,提高了盒厚的均一性,使整个显示面板1的光线透过率一致,减少了产生显示不良的概率,进一步减小了对显示效果的影响,提高了画面质量和显示效果。
因此,该显示面板1能够提高盒厚的均一性,减少产生显示不良的概率,进而能够提高显示面板1的画面质量和显示效果。
一种具体的实施方式中,如图1结构所示,上述显示面板1,在每个枕垫隔垫物40中,隔垫物42的高度随枕垫41的高度的变化而变化。
为了提高显示面板1的显示效果和画面质量、维持盒厚的均一性,由于枕垫41的高度不统一,通过隔垫物42的高度随枕垫41的高度的变化而变化,能够实现枕垫41和隔垫物42的高度总和的统一,即,每个枕垫隔垫物40高度的统一,进而使第一基板10与第二基板20之间的间距统一,使通过液晶层30的光线透过率一致,减少了产生显示不良的概率。
具体地,如图1以及图2结构所示,枕垫41包括形成于于第一基板10朝向第二基板20一侧表面的栅极层411。
在上述显示面板1的具体制造过程中,枕垫41包括栅极层411,例如可以采用栅极层411作为枕垫41,使隔垫物42支撑于第二基板20与栅极层411之间,即,形成支撑于栅极层411的隔垫物42。
更进一步地,如图2结构所示,枕垫41包括依次设置于第一基板10朝向第二基板20一侧表面的栅极层411、栅极绝缘层412、有源层413、源漏电极层以及保护层416。
如图2结构所示,枕垫41可包括依次设置于第一基板10上的栅极层411、栅极绝缘层412、有源层413、源漏电极层以及保护层416,并且源漏电极层包括设置于栅极绝缘层412和保护层416之间的源电极层414和漏电极层415。此时,枕垫41由栅极层411、栅极绝缘层412、有源层413、源漏电极层以及保护层416形成,隔垫物42与枕垫41的保护层416相抵。
在上述各实施例的基础上,隔垫物42可以由高分子聚合物材料制成。
在具体的制造过程中,隔垫物42可以采用高分子聚合物材料通过曝光工艺制成,使其制备方法简单、快速;隔垫物42不仅可以采用高分子聚合物材料形成,也可以采用其他的材料制成。
本发明实施例还提供了一种显示装置,该显示装置包括上述实施例中提供的任意一种显示面板1。
上述显示装置可以为薄膜晶体管液晶显示器(thin film transistor-liquidcrystal display,TFT-LCD)。
另外,如图3所示,本发明实施例还提供了一种上述实施例中任意一种显示面板1的制备方法,显示面板1包括第一基板10、第二基板20、液晶层30、以及支撑于第一基板10和第二基板20之间的多个枕垫隔垫物40;每个枕垫隔垫物40包括形成于第一基板10朝向第二基板20一侧的枕垫41、以及形成于第二基板20朝向第一基板10一侧的隔垫物42,枕垫41朝向第二基板20一侧的端面与隔垫物42朝向第一基板10一侧的端面相抵;每个枕垫隔垫物40的高度均相等;制备方法包括:
步骤S11,形成第一基板10和第二基板20;
步骤S12,在第一基板10朝向第二基板20的一侧形成多个枕垫41;
步骤S13,在第二基板20朝向第一基板10的一侧形成与多个枕垫41一一对应的隔垫物42,每个隔垫物42的高度随对应的枕垫41高度的变化而变化,以使每对一一对应的枕垫41和隔垫物42的高度之和均相等;
步骤S14,对盒连接第一基板10和第二基板20,使每个枕垫41与对应的隔垫物42相抵。
在采用上述制备方法生产显示面板1时,可以通过在第二基板20上控制形成的隔垫物42的高度,使隔垫物42的高度随对应的枕垫41的高度的变化而变化,以使每对一一对应的枕垫41和隔垫物42的高度之和均相等,来使第一基板10和第二基板20之间的间距统一,进而使液晶层30的厚度保持一致,保证盒厚的均一性,从而使制造的显示面板1减少产生显示不良的概率,进而能够提高画面质量和显示效果。
采用上述制备方法制备的显示面板1中,如图2结构所示,在第一基板10朝向第二基板20的一侧还形成有第一透明电极层417和第二透明电极层418,第一透明电极层417和第二透明电极层418均可以由氧化铟锡(ITO)形成,但并不限于上述材料。
在上述制备方法的基础上,在第二基板20朝向第一基板10的一侧形成与多个枕垫41一一对应的隔垫物的步骤S13之前,还包括:
在第二基板20上形成光阻层。
在第二基板20上形成光阻层,用于通过灰阶掩膜工艺形成隔垫物42。
具体地,在第二基板20上形成光阻层中,可以通过颜料分散法或喷墨法形成光阻层。
在上述制备方法的各种实施例的基础上,在第一基板10朝向第二基板20的一侧形成多个枕垫41的步骤S12中,在第一基板10的一侧形成枕垫41。如图2结构所示,枕垫41可以包括形成于第一基板10朝向第二基板20一侧表面的栅极层411,还可以包括依次设置于第一基板10朝向第二基板20一侧表面的栅极层411、栅极绝缘层412、有源层413、源漏电极层以及保护层416,并且源漏电极层包括设置于栅极绝缘层412和保护层416之间的源电极层414和漏电极层415。
并且,在第二基板20朝向第一基板10的一侧形成与多个枕垫41一一对应的隔垫物42的步骤S13中,可以通过灰阶掩膜工艺曝光形成隔垫物42,以使在每个枕垫隔垫物40中,隔垫物42的高度随枕垫41的高度的变化而变化,并使每个枕垫隔垫物40的高度相等。
在通过灰阶掩膜工艺曝光形成隔垫物42的过程中,可通过控制光罩(Mask)的透光量来控制形成隔垫物42的高度,以通过隔垫物42和枕垫41形成的每个枕垫隔垫物40的高度相等,以保证盒厚的一致性。
上述灰阶掩膜工艺可以包含半曝光、1/5、2/3等曝光。
在本发明的各种实施例中,第一基板10可以为阵列基板,第二基板20可以为彩膜基板;同理,第一基板10也可以为彩膜基板,而相对应的第二基板20也可以为阵列基板。
显然,本领域的技术人员可以对本发明实施例进行各种改动和变型而不脱离本发明的精神和范围。这样,倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内,则本发明也意图包含这些改动和变型在内。
Claims (10)
1.一种显示面板,包括第一基板、第二基板、液晶层、以及支撑于所述第一基板和所述第二基板之间的多个枕垫隔垫物;每个枕垫隔垫物包括形成于所述第一基板朝向所述第二基板一侧的枕垫、以及形成于所述第二基板朝向所述第一基板一侧的隔垫物,所述枕垫朝向所述第二基板一侧的端面与所述隔垫物朝向所述第一基板一侧的端面相抵;
其特征在于,
每个所述枕垫隔垫物的高度均相等,即,每个所述枕垫隔垫物中,所述枕垫与所述隔垫物的高度之和均相等,以使所述液晶层在所述第一基板和所述第二基板之间的厚度均等。
2.根据权利要求1所述的显示面板,其特征在于,在每个枕垫隔垫物中,所述隔垫物的高度随所述枕垫的高度的变化而变化。
3.根据权利要求1所述的显示面板,其特征在于,所述枕垫包括设置于所述第一基板朝向所述第二基板一侧表面的栅极层。
4.根据权利要求1所述的显示面板,其特征在于,所述枕垫包括依次设置于所述第一基板朝向所述第二基板一侧表面的栅极层、栅极绝缘层、有源层、源漏电极层以及保护层。
5.根据权利要求1-4任一项所述的显示面板,其特征在于,所述隔垫物由高分子聚合物材料制成。
6.一种显示装置,其特征在于,包括如权利要求1-5任一项所述的显示面板。
7.一种如权利要求1-5任一项所述显示面板的制备方法,所述显示面板包括第一基板、第二基板、液晶层、以及支撑于所述第一基板和所述第二基板之间的多个枕垫隔垫物;每个枕垫隔垫物包括形成于所述第一基板朝向所述第二基板一侧的枕垫、以及形成于所述第二基板朝向所述第一基板一侧的隔垫物,所述枕垫朝向所述第二基板一侧的端面与所述隔垫物朝向所述第一基板一侧的端面相抵;每个所述枕垫隔垫物的高度均相等;其特征在于,包括:
形成第一基板和第二基板;
在所述第一基板朝向所述第二基板的一侧形成多个枕垫;
在所述第二基板朝向所述第一基板的一侧形成与所述多个枕垫一一对应的隔垫物,每个隔垫物的高度随对应的枕垫高度的变化而变化,以使每对一一对应的枕垫和隔垫物的高度之和均相等;
对盒连接所述第一基板和所述第二基板,使每个枕垫与对应的隔垫物相抵。
8.根据权利要求7所述的制备方法,其特征在于,在所述第二基板朝向所述第一基板的一侧形成与所述多个枕垫一一对应的隔垫物之前,包括:
在所述第二基板上形成光阻层。
9.根据权利要求8所述的制备方法,其特征在于,在所述第二基板上形成光阻层中,通过颜料分散法或喷墨法形成所述光阻层。
10.根据权利要求9所述的制备方法,其特征在于,在所述第二基板朝向所述第一基板的一侧形成与所述多个枕垫一一对应的隔垫物中,通过灰阶掩膜工艺曝光形成所述隔垫物,以使在每个枕垫隔垫物中,所述隔垫物的高度随所述枕垫的高度的变化而变化,以使每个所述枕垫隔垫物的高度均相等,即,每个所述枕垫隔垫物中,所述枕垫与所述隔垫物的高度之和均相等。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710002573.1A CN106502005A (zh) | 2017-01-03 | 2017-01-03 | 一种显示面板及其制备方法和显示装置 |
US15/758,878 US20180341140A1 (en) | 2017-01-03 | 2017-08-03 | Display Panel, Method For Fabricating The Same And Display Device |
PCT/CN2017/098621 WO2018126704A1 (zh) | 2017-01-03 | 2017-08-23 | 一种显示面板及其制备方法和显示装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710002573.1A CN106502005A (zh) | 2017-01-03 | 2017-01-03 | 一种显示面板及其制备方法和显示装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN106502005A true CN106502005A (zh) | 2017-03-15 |
Family
ID=58344971
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710002573.1A Pending CN106502005A (zh) | 2017-01-03 | 2017-01-03 | 一种显示面板及其制备方法和显示装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20180341140A1 (zh) |
CN (1) | CN106502005A (zh) |
WO (1) | WO2018126704A1 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018126704A1 (zh) * | 2017-01-03 | 2018-07-12 | 京东方科技集团股份有限公司 | 一种显示面板及其制备方法和显示装置 |
CN109765731A (zh) * | 2019-03-27 | 2019-05-17 | 友达光电(昆山)有限公司 | 显示装置 |
CN110320712A (zh) * | 2018-03-29 | 2019-10-11 | 夏普株式会社 | 液晶显示装置的制造方法及液晶显示装置 |
CN110658655A (zh) * | 2019-10-12 | 2020-01-07 | 深圳市华星光电技术有限公司 | 显示面板及显示面板的制备方法 |
CN112086471A (zh) * | 2020-09-28 | 2020-12-15 | 成都中电熊猫显示科技有限公司 | 阵列基板的制造方法、阵列基板及显示面板 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1048640A (ja) * | 1996-07-30 | 1998-02-20 | Toshiba Corp | アクティブマトリクス型液晶表示装置 |
CN103969892A (zh) * | 2014-04-24 | 2014-08-06 | 京东方科技集团股份有限公司 | 阵列基板、阵列基板的制备方法和显示面板 |
CN104460121A (zh) * | 2014-12-19 | 2015-03-25 | 厦门天马微电子有限公司 | 液晶显示面板及其制作方法、液晶显示装置 |
US20150131025A1 (en) * | 2013-11-13 | 2015-05-14 | Mitsubishi Electric Corporation | Liquid crystal display |
CN105140242A (zh) * | 2015-09-18 | 2015-12-09 | 京东方科技集团股份有限公司 | 一种显示基板及其制作方法、显示装置 |
CN105182622A (zh) * | 2015-08-20 | 2015-12-23 | 武汉华星光电技术有限公司 | 曲面液晶面板及显示装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100611672B1 (ko) * | 2005-01-31 | 2006-08-10 | 삼성에스디아이 주식회사 | Ocb 모드 액정층을 구비하는 액정표시장치 및 그의제조방법 |
KR20060098576A (ko) * | 2005-03-03 | 2006-09-19 | 엘지.필립스 엘시디 주식회사 | 액정 표시 장치 |
JP2010066461A (ja) * | 2008-09-10 | 2010-03-25 | Hitachi Displays Ltd | 液晶表示装置 |
CN102012576A (zh) * | 2009-09-07 | 2011-04-13 | 北京京东方光电科技有限公司 | 液晶面板母板及其制作方法 |
JP5077367B2 (ja) * | 2010-01-28 | 2012-11-21 | 凸版印刷株式会社 | 半透過型液晶表示装置用カラーフィルタ基板、その製造方法、及び半透過型液晶表示装置 |
CN202013466U (zh) * | 2011-04-21 | 2011-10-19 | 京东方科技集团股份有限公司 | 一种液晶面板用隔垫物和液晶面板 |
US8797495B2 (en) * | 2011-10-25 | 2014-08-05 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | LCD panel and method of forming the same |
CN103529591A (zh) * | 2013-10-15 | 2014-01-22 | 合肥京东方光电科技有限公司 | 彩膜基板及制备方法、显示面板及制备方法、显示装置 |
CN106502005A (zh) * | 2017-01-03 | 2017-03-15 | 京东方科技集团股份有限公司 | 一种显示面板及其制备方法和显示装置 |
-
2017
- 2017-01-03 CN CN201710002573.1A patent/CN106502005A/zh active Pending
- 2017-08-03 US US15/758,878 patent/US20180341140A1/en not_active Abandoned
- 2017-08-23 WO PCT/CN2017/098621 patent/WO2018126704A1/zh active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1048640A (ja) * | 1996-07-30 | 1998-02-20 | Toshiba Corp | アクティブマトリクス型液晶表示装置 |
US20150131025A1 (en) * | 2013-11-13 | 2015-05-14 | Mitsubishi Electric Corporation | Liquid crystal display |
CN103969892A (zh) * | 2014-04-24 | 2014-08-06 | 京东方科技集团股份有限公司 | 阵列基板、阵列基板的制备方法和显示面板 |
CN104460121A (zh) * | 2014-12-19 | 2015-03-25 | 厦门天马微电子有限公司 | 液晶显示面板及其制作方法、液晶显示装置 |
CN105182622A (zh) * | 2015-08-20 | 2015-12-23 | 武汉华星光电技术有限公司 | 曲面液晶面板及显示装置 |
CN105140242A (zh) * | 2015-09-18 | 2015-12-09 | 京东方科技集团股份有限公司 | 一种显示基板及其制作方法、显示装置 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018126704A1 (zh) * | 2017-01-03 | 2018-07-12 | 京东方科技集团股份有限公司 | 一种显示面板及其制备方法和显示装置 |
CN110320712A (zh) * | 2018-03-29 | 2019-10-11 | 夏普株式会社 | 液晶显示装置的制造方法及液晶显示装置 |
CN109765731A (zh) * | 2019-03-27 | 2019-05-17 | 友达光电(昆山)有限公司 | 显示装置 |
CN109765731B (zh) * | 2019-03-27 | 2021-10-22 | 友达光电(昆山)有限公司 | 显示装置 |
CN110658655A (zh) * | 2019-10-12 | 2020-01-07 | 深圳市华星光电技术有限公司 | 显示面板及显示面板的制备方法 |
CN110658655B (zh) * | 2019-10-12 | 2022-05-31 | Tcl华星光电技术有限公司 | 显示面板及显示面板的制备方法 |
CN112086471A (zh) * | 2020-09-28 | 2020-12-15 | 成都中电熊猫显示科技有限公司 | 阵列基板的制造方法、阵列基板及显示面板 |
Also Published As
Publication number | Publication date |
---|---|
WO2018126704A1 (zh) | 2018-07-12 |
US20180341140A1 (en) | 2018-11-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106502005A (zh) | 一种显示面板及其制备方法和显示装置 | |
TWI290644B (en) | Liquid crystal display device and method of fabricating the same | |
CN103353693B (zh) | 液晶显示装置及其制造方法 | |
CN100374923C (zh) | 液晶显示器及其制造方法 | |
CN202025167U (zh) | 彩膜基板 | |
CN104965333A (zh) | Coa型液晶显示面板及其制作方法 | |
TWI250346B (en) | Liquid crystal display apparatus and manufacturing method therefor | |
CN202563217U (zh) | 一种液晶面板以及显示装置 | |
CN102707504A (zh) | 液晶面板及其制备方法、显示装置 | |
CN202339463U (zh) | 薄膜晶体管液晶显示器像素结构及液晶显示器 | |
CN106773335A (zh) | 一种液晶显示面板 | |
CN105529008A (zh) | 液晶显示面板的驱动方法 | |
CN104777671B (zh) | 液晶显示面板及其制造方法 | |
CN103454812A (zh) | 在液晶面板内形成间隔物的方法及由此得到的液晶面板 | |
CN203337948U (zh) | 一种彩膜基板以及显示装置 | |
CN106773406A (zh) | 一种电子设备、阵列基板及其制作方法 | |
DE102006028322A1 (de) | Flüssigkristallanzeigevorrichtung und Herstellungsverfahren | |
CN102967971B (zh) | 阵列基板以及显示装置 | |
CN103676297A (zh) | 一种彩膜基板及液晶显示装置 | |
CN104730785B (zh) | 液晶显示面板及其制造方法 | |
CN1983000A (zh) | 垂直取向模式液晶显示器件 | |
CN103885261A (zh) | 像素结构、阵列基板、显示装置及像素结构的制造方法 | |
CN106444178A (zh) | 一种液晶显示面板及装置 | |
CN206877009U (zh) | 液晶显示面板及显示装置 | |
CN107895567A (zh) | 液晶显示面板以及液晶显示装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170315 |
|
RJ01 | Rejection of invention patent application after publication |