CN106479696A - Cleanout fluid for harsh the given birth to foulant of liquid crystal display panel glass and preparation method thereof - Google Patents
Cleanout fluid for harsh the given birth to foulant of liquid crystal display panel glass and preparation method thereof Download PDFInfo
- Publication number
- CN106479696A CN106479696A CN201610778592.9A CN201610778592A CN106479696A CN 106479696 A CN106479696 A CN 106479696A CN 201610778592 A CN201610778592 A CN 201610778592A CN 106479696 A CN106479696 A CN 106479696A
- Authority
- CN
- China
- Prior art keywords
- mass percent
- cleanout fluid
- foulant
- harsh
- liquid crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/72—Ethers of polyoxyalkylene glycols
- C11D1/721—End blocked ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/046—Salts
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/06—Phosphates, including polyphosphates
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/36—Organic compounds containing phosphorus
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Detergent Compositions (AREA)
Abstract
The invention discloses a kind of cleanout fluid for harsh the given birth to foulant of liquid crystal display panel glass, the ammonium fluoride being 15 30% including mass percent, mass percent is 5 10% sodium tripolyphosphate, mass percent is 5 10% hydroxy ethylidene-diphosphate, mass percent is 10 15% fatty alcohol-polyoxyethylene ether, and mass percent is 45 65% tap water.The invention also discloses a kind of manufacture method of above-mentioned cleanout fluid.
Description
Technical field
The present invention relates to a kind of cleanout fluid for harsh the given birth to foulant of liquid crystal display panel glass and preparation method thereof.
Background technology
LCDs mainly adopt the method for chemical harsh thinning at present, and it is short that it is mainly characterized by the harsh thinning time,
Produce yields high, processing technology is simple.All of thinning producer is all directly other using Fluohydric acid. or interpolation at present
Nitration mixture and organic active agent are etched.But prodan can be produced in etching process, the insoluble salt such as potassium fluosilicate, these are not
Dissolved salt meeting Severe blockage etching machine pipeline, impact produces it is difficult to clear up.
Content of the invention
The technical problem to be solved is：A kind of cleanout fluid is provided, can be easier to wash away display panels
The foulant producing during glass etching, dredges etching machine pipeline.
For solving above-mentioned technical problem, the technical solution adopted in the present invention is：One kind is used for liquid crystal display panel glass
The cleanout fluid of harsh given birth to foulant, is the ammonium fluoride of 15-30% including mass percent, and mass percent is the three of 5-10%
Polyphosphate sodium, mass percent is the hydroxy ethylidene-diphosphate of 5-10%, and mass percent is the fatty alcohol polyoxy of 10-15%
Vinyl Ether, mass percent is the tap water of 45-65%.
As a kind of preferred scheme, it is the ammonium fluoride of 20-25% including mass percent, mass percent is 8-12%
Sodium tripolyphosphate, mass percent be 4-8% hydroxy ethylidene-diphosphate, mass percent be 15-20% fatty alcohol
Polyoxyethylene ether, mass percent is the tap water of 48-60%.
The invention has the beneficial effects as follows：This cleaning liquid energy effectively removes foulant (the mainly fluorine of blocking etching machine pipeline
The insoluble inorganic salt such as silicate), it is to avoid cleaning is blocked the inconvenience of pipeline, protection equipment, and its formula is simple, cleaning efficiency
High.
Another technical problem to be solved by this invention is：A kind of manufacture method of above-mentioned cleanout fluid is provided.
For solving above-mentioned technical problem, the technical solution adopted in the present invention is：One kind is used for liquid crystal display panel glass
The preparation method of the cleanout fluid of harsh given birth to foulant, its step is：Sequentially add ammonium fluoride, tripolyphosphate toward in a container
Sodium, hydroxy ethylidene-diphosphate, fatty alcohol-polyoxyethylene ether, then squeeze into tap water with pump, stir and obtain final product.
Specific embodiment
Specific embodiments of the present invention are described below in detail.
Embodiment 1
Cleanout fluid in the present embodiment is made up of by mass percentage following component：Ammonium fluoride 20%, sodium tripolyphosphate
5%, hydroxy ethylidene-diphosphate 5%, fatty alcohol-polyoxyethylene ether 10%, balance of water.
The preparation method of above-mentioned cleanout fluid is：
Sequentially add ammonium fluoride, sodium tripolyphosphate, hydroxy ethylidene-diphosphate, aliphatic alcohol polyethenoxy toward in a container
Ether, then squeeze into tap water with pump, stir and obtain final product.
Above-mentioned cleanout fluid is squeezed in etching machines storage tank, the pipeline for blocking is carried out, and foulant was at 10 minutes
Interior removal 70%, the pipeline of blocking is successfully dredged.
Embodiment 2
Cleanout fluid in the present embodiment is made up of by mass percentage following component：Ammonium fluoride 25%, sodium tripolyphosphate
8%, hydroxy ethylidene-diphosphate 10%, fatty alcohol-polyoxyethylene ether 15%, balance of water.
The preparation method of above-mentioned cleanout fluid is：
Ammonium fluoride, sodium tripolyphosphate, hydroxy ethylidene-diphosphate, fatty alcohol polyoxy second is sequentially added toward in the container of
Alkene ether, then squeeze into tap water with pump, stir and obtain final product.
Above-mentioned cleanout fluid is squeezed in etching machines storage tank, the pipeline for blocking is carried out, and foulant was at 10 minutes
Interior removal 80%, the pipeline of blocking is successfully dredged.
The above embodiments only principle of illustrative the invention and its effect, and the enforcement that part is used
Example, not for the restriction present invention；It should be pointed out that for the person of ordinary skill of the art, creating without departing from the present invention
On the premise of making design, some deformation can also be made and improve, these broadly fall into protection scope of the present invention.
Claims (3)
1. a kind of cleanout fluid for harsh the given birth to foulant of liquid crystal display panel glass it is characterised in that：Including percent mass
The ammonium fluoride for 15-30% for the ratio, mass percent is the sodium tripolyphosphate of 5-10%, and mass percent is that the hydroxyl of 5-10% is sub-
Ethyl diphosphonic acid, mass percent is the fatty alcohol-polyoxyethylene ether of 10-15%, and mass percent is the tap water of 45-65%.
2. a kind of cleanout fluid for harsh the given birth to foulant of liquid crystal display panel glass according to claim 1, it is special
Levy and be：It is the ammonium fluoride of 20-25% including mass percent, mass percent is the sodium tripolyphosphate of 8-12%, quality hundred
Divide than the hydroxy ethylidene-diphosphate for 4-8%, mass percent is the fatty alcohol-polyoxyethylene ether of 15-20%, percent mass
Than the tap water for 48-60%.
3. a kind of system being used for the cleanout fluid of harsh the given birth to foulant of liquid crystal display panel glass as claimed in claim 1 or 2
Preparation Method, its step is：Sequentially add ammonium fluoride, sodium tripolyphosphate, hydroxy ethylidene-diphosphate, fatty alcohol toward in a container
Polyoxyethylene ether, then squeeze into tap water with pump, stir and obtain final product.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610778592.9A CN106479696A (en) | 2016-08-31 | 2016-08-31 | Cleanout fluid for harsh the given birth to foulant of liquid crystal display panel glass and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610778592.9A CN106479696A (en) | 2016-08-31 | 2016-08-31 | Cleanout fluid for harsh the given birth to foulant of liquid crystal display panel glass and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106479696A true CN106479696A (en) | 2017-03-08 |
Family
ID=58273329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610778592.9A Pending CN106479696A (en) | 2016-08-31 | 2016-08-31 | Cleanout fluid for harsh the given birth to foulant of liquid crystal display panel glass and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106479696A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102007196A (en) * | 2008-03-07 | 2011-04-06 | 高级技术材料公司 | Non-selective oxide etch wet clean composition and method of use |
| CN102399648A (en) * | 2010-09-10 | 2012-04-04 | 安集微电子（上海）有限公司 | Fluorine-containing cleaning solution |
| US20130296214A1 (en) * | 2010-07-16 | 2013-11-07 | Advanced Technology Materials, Inc. | Aqueous cleaner for the removal of post-etch residues |
| CN104673540A (en) * | 2013-11-30 | 2015-06-03 | 天津晶美微纳科技有限公司 | Water-soluble liquid crystal glass substrate detergent and preparation method thereof |
| CN105739251A (en) * | 2014-12-30 | 2016-07-06 | 气体产品与化学公司 | Stripping compositions having high wn/w etching selectivity |
-
2016
- 2016-08-31 CN CN201610778592.9A patent/CN106479696A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102007196A (en) * | 2008-03-07 | 2011-04-06 | 高级技术材料公司 | Non-selective oxide etch wet clean composition and method of use |
| US20130296214A1 (en) * | 2010-07-16 | 2013-11-07 | Advanced Technology Materials, Inc. | Aqueous cleaner for the removal of post-etch residues |
| CN102399648A (en) * | 2010-09-10 | 2012-04-04 | 安集微电子（上海）有限公司 | Fluorine-containing cleaning solution |
| CN104673540A (en) * | 2013-11-30 | 2015-06-03 | 天津晶美微纳科技有限公司 | Water-soluble liquid crystal glass substrate detergent and preparation method thereof |
| CN105739251A (en) * | 2014-12-30 | 2016-07-06 | 气体产品与化学公司 | Stripping compositions having high wn/w etching selectivity |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170308 |