CN106477511A - Fine Machinery device and its manufacture method - Google Patents
Fine Machinery device and its manufacture method Download PDFInfo
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- CN106477511A CN106477511A CN201610707753.5A CN201610707753A CN106477511A CN 106477511 A CN106477511 A CN 106477511A CN 201610707753 A CN201610707753 A CN 201610707753A CN 106477511 A CN106477511 A CN 106477511A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/02—Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0264—Pressure sensors
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- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Pressure Sensors (AREA)
- Micromachines (AREA)
- Measuring Fluid Pressure (AREA)
Abstract
The Fine Machinery device of the present invention and its manufacture method can more easily prevent the adhesion in the Fine Machinery device for using under circumstances.Fine Machinery device includes movable part (103), described movable part (103) are bearing on substrate (101) by support (102), separate configuration with substrate (101) in movable area, and can be towards substrate (101) direction displacement in movable area.The Fine Machinery device includes the 1st convex portion (104), 1st convex portion (104) is formed on the face (101a) of relative substrate (101) in movable area, with the flat upper surface (104a) relative with the face (103a) of movable part (103).The Fine Machinery device includes：Multiple 2nd convex portions (105), they are formed at the upper surface (104a) of the 1st convex portion (104)；And multiple 3rd convex portions (106), they are formed in the region (122) relative with the 1st convex portion (104) in the face (103a) of movable part (103), and size is identical with the 2nd convex portion (105).
Description
Technical field
The present invention relates to a kind of Fine Machinery device for being equipped with fine movable part and its manufacture method.
Background technology
In recent years, in switch or sensor, using by rote come the Fine Machinery device of function
MEMS (Micro Electro Mechanical System (microelectromechanical systems)) is taken seriously.MEMS is as pressure
Sensor or acceleration transducer and used, be increasingly becoming strength member together with LSI.MEMS has stereochemical structure, institute
State stereochemical structure possess by using the microfabrication of film formation technology, photoetching technique and various etching techniques fine can
Dynamic structure.
For example, in capacitance-type pressure sensor, as shown in Fig. 4 A, Fig. 4 B, will be due to pressure using support 403
And the relatively thin diaphragm 401 being subjected to displacement is supported in a spaced manner and is configured on substrate 402.In substrate 402 and diaphragm 401
Between there is space, towards space each position relative configuration electrode (not shown), formed electric capacity.The pressure of determined medium
Apply the opposition side side of the formation electric capacity side to diaphragm 401, under the pressure applies, corresponding to sky in diaphragm 401
The part of gap deforms.Above-mentioned interelectrode distance is changed corresponding to the change, and interelectrode electric capacity is corresponded to should
Change and change, become sensor output.If space is vacuum, the measurable absolute pressure of the pressure sensor.
There is following situation in this Fine Machinery device：A part for movable part after deformation is engaged with substrate, and movable
Portion does not restore (referenced patent document 1,2,3,4,5,6) under the bounce-back produced by elastic force.The phenomenon is referred to as adhesion or viscous
, be a problem in Fine Machinery device.For example, measure just as electrostatic capacitive diaphragm gauge and compare atmospheric pressure
For the pressure sensor of little pressure, due to when transporting, installing or the when of maintenance can expose in an atmosphere, therefore frequently sending out
Life is applied in the situation of excessive pressure more than measurement range.When excessive pressure is so applied in, pressurized diaphragm 401 can picture
Exceed actually used scope as shown in Fig. 4 C and largely bend, cause a part for diaphragm 401 to touch substrate 402
(bottoming out).
Because the thickness of diaphragm 401 and the size of deformed region also have the difference of the design parameters such as the material of diaphragm 401, on
State the state for bottoming out different, but in most cases, bottoming out to cause the generation of adhesion.In the case of pressure sensor,
When sticking together, even if removing pressure, diaphragm will not also restore and provide the output just as being applied with pressure, so as to lead
Cause the mistake for determining.Especially in the fine machine made by the extremely flat base material that surface roughness (Rz) is 0.1～number nm
In tool device, it is a big problem.
In the past, in order to prevent above-mentioned adhesion, industry has the relative surface shape of at least one party in movable part or substrate
Become the fine structures such as projection and reduce contact area to suppress contact force.Specifically, the system of the semiconductor device known to use
Technology is made, on the base materials such as semiconductor or quartz such as the silicon for constituting Fine Machinery device, forms small projection.For example, by profit
With known photoetching technique and the patterning of etching technique, the jut of several μm of sizes is formed.Additionally, as other technologies, also
Have to be formed the surface coating for making surface-stable come the method for the gravitation produced by reducing, made by sandblasting etc. surface become coarse come
The method for forming projection.
【Prior art literature】
【Patent document】
【Patent document 1】The flat 10-512675 publication of Japanese Patent Laid
【Patent document 2】Japanese Patent Laid-Open 11-340477 publication
【Patent document 3】Japanese Patent Laid-Open 2000-040830 publication
【Patent document 4】Japanese Patent Laid-Open 2000-196106 publication
【Patent document 5】Japanese Patent Laid-Open 2002-299640 publication
【Patent document 6】Japanese Patent Laid-Open 2007-078439 publication
Content of the invention
【Problems to be solved by the invention】
In addition, in order that device reply use environment and with corrosion resistance, resistance to pressure, heat resistance, the crystal material such as sapphire
The material such as material or aluminium oxide ceramics is used for pressure sensor always.But, this material has high-insulativity, with silicon or glass
Situations such as compare, it is easier to stick together.Especially when the relatively thin structure of diaphragm is changed into, the thrust of several μm or so of size
Not effective countermeasure.
Therefore, it is necessary to form the minute asperities of less than sub- μm of size, but the material such as sapphire or aluminium oxide ceramics is in tool
Have the another aspect of high mechanical properties, high corrosion-resistant, chemical proofing, processing more difficult than materials such as silicon or glass, and sub- μm with
Under size microfabrication extremely difficult.
In addition, although also prevent the technology of adhesion using the surface coating of surface-stable is made, but in this case, table
Face overlay film is used mostly organic material, in high temperature environments in the case of use, or by the space between diaphragm and substrate
It is set in the composition of vacuum, organic material cannot be used.
As described above, there are the following problems in the past：Prevent the adhesion in the Fine Machinery device for using under circumstances
This content easily cannot be realized.
The present invention is formed to eliminate as above problem, its object is to accomplish more easily to prevent under circumstances
Adhesion in the Fine Machinery device for using.
【The technological means of solve problem】
The manufacture method of the Fine Machinery device of the present invention is a kind of manufacturer of the Fine Machinery device including movable part
Method, the movable part are bearing on substrate by support, separate configuration with substrate in movable area, and can be in movable area
Towards orientation substrate displacement in domain, the manufacture method of the Fine Machinery device includes：1st operation, relative base in movable area
The surface of the side in plate and movable part forms the 1st convex portion, and the 1st convex portion has with the opposing party's in substrate or movable part
The relative flat upper surface in surface；2nd operation, forms the 1st material membrane in the upper surface of the 1st convex portion, and the 1st material membrane contains
There is the composition of the material for constituting substrate and movable part；3rd operation, heats and calcines the 1st material membrane, thus coagulates the 1st material membrane
Collection and crystallization, so as to form multiple 2nd convex portions in the upper surface of the 1st convex portion；4th operation, another in substrate or movable part
The 2nd material membrane is formed in the region relative with the 1st convex portion on the surface of one side, and the 2nd material membrane contains composition substrate and can
The composition of the material in dynamic portion；And the 5th operation, the 2nd material membrane is heated and calcines, the 2nd material membrane aggegation and crystallization is thus made,
So as to form size and multiple 3rd convex portions of the 2nd convex portion identical in region.
In the manufacture method of above-mentioned Fine Machinery device, the material for constituting substrate and movable part is sapphire or aluminum oxide
Pottery, the 1st material membrane and the 2nd material membrane are made up of amorphous nickel/phosphorus/aluminium oxide.
In the manufacture method of above-mentioned Fine Machinery device, the 1st material membrane and the 2nd material membrane by atomic layer deposition method,
In sputtering method, chemical vapour deposition technique any one and formed.Additionally, the 1st material membrane and the 2nd material membrane can also pass through molten
Sol-gel and formed.Additionally, the 1st material membrane and the 2nd material membrane also can be by calcining by metal alkoxide, metal complex, gold
Belong to any one film for constituting in acylate and formed.
Additionally, the Fine Machinery device of the present invention includes：Movable part, its pass through support and are bearing on substrate, movable
Separate configuration with substrate in region, and can be towards orientation substrate displacement in movable area；1st convex portion, which is formed at movable
The surface of the side in region in relative substrate and movable part, with relative with the surface of the opposing party in substrate or movable part
Flat upper surface；Multiple 2nd convex portions, they are formed at the upper surface of the 1st convex portion；And multiple 3rd convex portions, they form
In the region relative with the 1st convex portion on the surface of the opposing party in substrate or movable part, size is identical with the 2nd convex portion, also,
2nd convex portion and the 3rd convex portion be by the material membrane of the composition containing the material for constituting substrate and movable part is heated and calcine come
Make material membrane aggegation and crystallization and formed.
【The effect of invention】
By content discussed above, according to the present invention, following excellent effect is obtained：More easily can prevent various
Adhesion in the Fine Machinery device used under environment.
Description of the drawings
Figure 1A is the sectional view of the configuration example for representing the Fine Machinery device in embodiments of the present invention.
Figure 1B is the sectional view of the local configuration example for representing the Fine Machinery device in embodiments of the present invention.
Fig. 2A is manufacture method, the expression midway operation that the Fine Machinery device in embodiments of the present invention is described
The sectional view of state.
Fig. 2 B is manufacture method, the expression midway operation that the Fine Machinery device in embodiments of the present invention is described
The sectional view of state.
Fig. 2 C is manufacture method, the expression midway operation that the Fine Machinery device in embodiments of the present invention is described
The sectional view of state.
Fig. 2 D is manufacture method, the expression midway operation that the Fine Machinery device in embodiments of the present invention is described
The sectional view of state.
Fig. 2 E is manufacture method, the expression midway operation that the Fine Machinery device in embodiments of the present invention is described
The sectional view of state.
Fig. 2 F is manufacture method, the expression midway operation that the Fine Machinery device in embodiments of the present invention is described
The sectional view of state.
Fig. 2 G is manufacture method, the expression midway operation that the Fine Machinery device in embodiments of the present invention is described
The sectional view of state.
Fig. 2 H is manufacture method, the expression midway operation that the Fine Machinery device in embodiments of the present invention is described
The sectional view of state.
Fig. 3 A is that the film for representing the amorphous nickel/phosphorus/aluminium oxide using AFM to being formed by atomic layer deposition method is seen
Examine the photo of the result of gained.
Fig. 3 B is the film calcining for representing the amorphous nickel/phosphorus/aluminium oxide using AFM to will be formed by atomic layer deposition method
And the state after crystallization carries out the photo of the result for observing gained.
Fig. 3 C is to represent to the solution of aluminium coat organo-metallic compound and to be calcined and made using transmission electron microscope
Amorphous oxide aluminium film crystallization after state section carry out observe gained result photo.
Fig. 4 A is the cross-sectional perspective view of the local composition for representing pressure sensor.
Fig. 4 B is the cross-sectional perspective view of the local composition for representing pressure sensor.
Fig. 4 C is the cross-sectional perspective view of the local composition for representing pressure sensor.
Specific embodiment
Below, with reference to Figure 1A, Figure 1B, embodiments of the present invention are illustrated.Figure 1A is the enforcement for representing the present invention
The sectional view of the configuration example of the Fine Machinery device in mode.Additionally, Figure 1B is to represent fine in embodiments of the present invention
The sectional view of the local configuration example of mechanical device.Figure 1B is that the part to Figure 1A is amplified representing.
The Fine Machinery device includes movable part 103, and the movable part 103 is bearing in substrate 101 by support 102
On, separate configuration with substrate 101 in movable area 121, and can be towards 101 direction displacement of substrate in movable area 121.Can
Dynamic portion 103 is fixed on support 102 by the fixed part around movable area 121.For example, support 102 is integrally formed
On substrate 101.Furthermore, also support 102 can be formed with that side of movable part 103 with movable part 103.
The Fine Machinery device is, for example, pressure sensor of the movable part 103 for diaphragm.For example, substrate 101 and movable part
103 are made up of sapphire, also, although not shown, but each relative face of the gap between movable part 103 and substrate 101
On be formed with electrode.Towards 101 direction displacement of substrate, thus, the interval occurred of each electrode changes pressurized movable part 103, so as to
So that electric capacity changes.The pressure suffered by movable part 103 is determined by the capacitance variations.If electrode forming region is set
For vacuum, then can be used as determining the pressure sensor of absolute pressure.
With regard to the Fine Machinery device of composition as described above is set to, in embodiments, include the 1st convex portion 104 first,
1st convex portion 104 is formed on the face 101a of relative substrate 101 in movable area 121, with movable part 103
The relative flat upper surface 104a of face 103a.1st convex portion 104 is, for example, to be set to circular pillar when overlooking, and diameter is set to 1～
Tens of μm.Additionally, in this embodiment, including multiple 1st convex portions 104, the interval of the 1st adjacent convex portion 104 is for example set to a 0.5mm left side
Right.
Additionally, the Fine Machinery device includes：Multiple 2nd convex portions 105, they are formed at the upper surface of the 1st convex portion 104
104a；And multiple 3rd convex portions 106, they are formed at the region relative with the 1st convex portion 104 of the face 103a of movable part 103
In 122, size is identical with the 2nd convex portion 105.Multiple 2nd convex portions 105 formed in the border circular areas that 1～tens of μm of diameter exist
The height of diameter and section during vertical view is the size of several nm～hundreds of nm.By multiple 2nd convex portions 105, the 1st convex portion
104 upper surface 104a is formed with the concave-convex surface of the surface roughness of several nm～hundreds of nm.
As the 2nd convex portion 105, multiple 3rd convex portions 106 formed in the border circular areas that 1～tens of μm of diameter are being bowed
The height of the diameter of apparent time and section size also for number nm～hundreds of nm.By multiple 3rd convex portions 106, movable part
The region 122 of 103 face 103a is formed with the concave-convex surface of the surface roughness of several nm～hundreds of nm.
The 2nd convex portion 105 and the 3rd convex portion 106 in above-mentioned embodiment be by will be containing constituting substrate 101 and movable part
The material membrane of the composition of 103 material is heated and is calcined to make material membrane aggegation and crystallization and be formed.Such according to including
The 2nd convex portion 105 for being formed and the embodiment of the 3rd convex portion 106, the size not being formed with by microfabrication below Asia μm
Minute asperities, so as to can more easily prevent the adhesion in the Fine Machinery device for using under circumstances.
In addition, in order to the action such as measure, being applied with voltage between substrate 101 and movable part 103, it is known that this is outer
Making alive can cause the generation of adhesive phenomenon and become problem.Although the surface roughness of local is the surface of several nm～hundreds of nm
Concavo-convex suppress adhesion, but under the surface roughness, height at most also only number nm～hundreds of nm or so, it is impossible to prevent above-mentioned
Adhesive phenomenon.In contrast, by being equipped with height for several μm of the 1st convex portion 104, above-mentioned adhesive phenomenon can be suppressed.
Below, using Fig. 2A～Fig. 2 H, the manufacture method to the Fine Machinery device in embodiments of the present invention is carried out
Explanation.Fig. 2A～Fig. 2 H be illustrate Fine Machinery device in embodiments of the present invention manufacture method, represent
The sectional view of the state of way operation.
First, as shown in Figure 2 A, formed with flat on the face 101a of relative substrate 101 in movable area 121
Upper surface 104a the 1st convex portion 104 (the 1st operation).Upper surface 104a be formed as after assembling in the state of with movable part 103
The relative state of face 103a.For example, by using known photoetching technique and etching technique by the face 101a pattern of substrate 101
Change to form the 1st convex portion 104.In the formation of the 1st convex portion 104 of the pattern for μm rank, it is not required in photo-mask process
Device, the system of the costliness such as reduced projection exposure device or electron beam lithography system is wanted, using equimultiple exposure device, will not
Cause cost increase.
Then, as shown in Figure 2 B, formed in the whole region of the face 101a of the upper surface 104a for including the 1st convex portion 104
1st material membrane 201 of the composition containing the material for constituting substrate 101 and movable part 103.For example, the 1st material membrane 201 is by amorphous
Aluminum oxide (aluminum oxide with the crystalline phase beyond α phase) is constituted.For example, the 1st material membrane 201 passes through atomic layer deposition method, sputter
In method, chemical vapour deposition technique any one and formed.Additionally, the 1st material membrane 201 also can be by using containing aluminium ion
Colloidal sol sol-gal process being formed.Additionally, the 1st material membrane 201 can also pass through to by the metal alkoxide containing aluminium atom, gold
Any one film for constituting in category complex compound, metal organic acid salt is calcined and is formed.
Then, the 1st material membrane 201 is patterned by known photoetching technique and etching technique, as shown in Figure 2 C, is set to
Upper surface 104a only in the 1st convex portion 104 is formed with the state (the 2nd operation) of the 1st material membrane 202.In the patterning, pattern
Size is also μm rank, and equimultiple exposure device used in photo-mask process is not result in cost increase.Additionally, amorphous oxygen
Change aluminium chemical proofing compared with the aluminum oxide of crystal state is relatively low, can carry out the development treatment using acid or alkali etc., pattern
Change is relatively easy to.
By heating and calcining the 1st material membrane 202 making 202 aggegation of the 1st material membrane and crystallization, as shown in Figure 2 D, exist
The upper surface 104a of the 1st convex portion 104 forms multiple 2nd convex portions 105 (the 3rd operation).
Then, prepare to become the material substrate 203 of movable part 103, and the table as shown in Fig. 2 E in material substrate 203
Face forms the 2nd material membrane 204 of the composition containing the material for constituting substrate 101 and movable part 103.For example, the 2nd material membrane 204
It is made up of amorphous nickel/phosphorus/aluminium oxide (aluminum oxide with the crystalline phase beyond α phase).For example, the 2nd material membrane 204 passes through ald
In method, sputtering method, chemical vapour deposition technique any one and formed.Additionally, the 2nd material membrane 204 also can be by using containing
There is the sol-gal process of aluminum ions colloidal sol to be formed.Additionally, the 2nd material membrane 204 can also pass through to by the gold containing aluminium atom
Any one film for constituting in category alkoxide, metal complex, metal organic acid salt is calcined and is formed.
Then, the 2nd material membrane 204 is patterned by known photoetching technique and etching technique, as shown in Figure 2 F, is set to
The state (the 4th operation) of the 2nd material membrane 205 is formed with predetermined region.2nd material membrane 205 is formed at shape after assembling
Under state in the region 122 relative with the 1st convex portion 104.In the patterning, pattern dimension is also μm rank, in photo-mask process
Using equimultiple exposure device, cost increase is not result in.Additionally, amorphous nickel/phosphorus/aluminium oxide is resistance to compared with the aluminum oxide of crystal state
Chemicals are relatively low, can carry out the development treatment using acid or alkali etc., and patterning is relatively easy to.
Then, by heating and calcining the 2nd material membrane 205 making 205 aggegation of the 2nd material membrane and crystallization, as Fig. 2 G institute
Show, in region 122, form size and multiple 3rd convex portions 106 (the 5th operation) of 105 identical of the 2nd convex portion.Then, by material base
Plate 203 is thin layer, as illustrated in figure 2h, is set to shape in the region 122 relative with the 1st convex portion 104 of the face 103a of movable part 103
Becoming has the state of multiple 3rd convex portions 106.With regard to thin layer, for example, in the case of pressure sensor, to be measured with corresponding to
Pressure and produce the bending of appropriate amount mode take the circumstances into consideration to implement thin layer.Thereafter, the electrode of regulation is formed, and will be movable
Portion 103 is fitted with substrate 101, and thus, the Fine Machinery device in embodiment is completed.
Herein, by the film of the amorphous nickel/phosphorus/aluminium oxide using AFM (AFM) to being formed by atomic layer deposition method
And by the calcining of the film of the amorphous nickel/phosphorus/aluminium oxide both the states after crystallization carry out observing gained result be shown in Fig. 3 A,
Fig. 3 B.As shown in Figure 3A, the surface of amorphous oxide aluminium film forms relatively flat.In contrast, as shown in Figure 3 B, in calcining
Afterwards, fine crystal growth is got up and is defined concavo-convex.Surface roughness (Rz) is changed into 10 times of 9.2nm from 0.9nm.
Additionally, will be made to applying the solution of organo-metallic compound and being calcined using transmission electron microscope
State after amorphous oxide aluminium film crystallization carries out observing the result of gained and is shown in Fig. 3 C.Fig. 3 C utilizes transmitted electron for representing
Microscope carries out the photo of the result for observing gained to the section of the state after crystallization.As shown in Figure 3 C, it is formed with about
20nm's is concavo-convex.
Furthermore, above-mentioned in, be that the 1st convex portion 104 is formed at that side of substrate 101, but be not limited to this, can also be formed at
That side of movable part 103.1st convex portion 104 is formed in movable area 121 in relative substrate 101 and movable part 103
The surface of side.Additionally, the 1st convex portion 104 has relative with the surface of the opposing party in substrate 101 or movable part 103 putting down
Smooth upper surface 104a, and multiple 2nd convex portions 105 are formed with upper surface 104a.Additionally, the 3rd convex portion is formed at base
In the region relative with the 1st convex portion 104 on the surface of the opposing party in plate 101 or movable part 103.
As mentioned above, by then pass through will be containing constituting the substrate of Fine Machinery device and the constituent material of movable part
The material membrane of composition heat and calcine to make material membrane aggegation and crystallization and form small jut, therefore small prominent
The formation for rising is relatively easy to, so as to can more easily prevent the adhesion in the Fine Machinery device for using under circumstances.
For example, it is installed in manufacture device using the electrostatic capacitive diaphragm gauge of fine diaphragm, and then, the manufacture
Device is arranged on production scene and becomes operating condition.Be attached to stage of manufacture device, device maintenance medium, above-mentioned
Vacuum meter can expose in an atmosphere, from the point of view of the use of vacuum meter, be disposed under abnormal high pressure, for being susceptible to adhesion
State.For example, if sticking together in maintenance and non-restoring, normal measure cannot be implemented using vacuum meter, causes to system
Make technique and produce harmful effect.In contrast, according to the present invention, due to being not susceptible to adhesion and for easily restoring from adhesion
State, therefore can suppress the generation of problem as described above.
Furthermore, the present invention is not limited to the implementation described above, it is clear that can be usual by having in the field
The personnel of knowledge implement a large amount of deformation in the technological thought of the present invention and combine.
Symbol description
101 substrates
101a face
102 supports
103 movable parts
103a face
104 the 1st convex portions
104a upper surface
105 the 2nd convex portions
106 the 3rd convex portions
121 movable area
122 regions.
Claims (6)
1. a kind of manufacture method of Fine Machinery device, the Fine Machinery device include movable part, the movable part by
Bearing portion is bearing on substrate, separates configuration in the movable area with the substrate, and can be in the movable area towards described
Orientation substrate displacement, the manufacture method of the Fine Machinery device be characterised by, including：
1st operation, the surface of the wherein side in the movable area in the relative substrate and the movable part are formed
1st convex portion, the 1st convex portion have the flat upper table relative with the surface of the opposing party in the substrate or the movable part
Face；
2nd operation, forms the 1st material membrane in the upper surface of the 1st convex portion, and it is described that the 1st material membrane contains composition
The composition of the material of substrate and the movable part；
3rd operation, heats and calcines the 1st material membrane, thus makes the 1st material membrane aggegation and crystallization, so as in institute
The upper surface for stating the 1st convex portion forms multiple 2nd convex portions；
4th operation, in the region relative with the 1st convex portion on the surface of the opposing party in the substrate or the movable part
The 2nd material membrane is formed, the 2nd material membrane contains the composition of the material for constituting the substrate and the movable part；And
5th operation, heats and calcines the 2nd material membrane, thus makes the 2nd material membrane aggegation and crystallization, so as in institute
State in region and form size and multiple 3rd convex portions of the 2nd convex portion identical.
2. the manufacture method of Fine Machinery device according to claim 1, it is characterised in that
The material for constituting the substrate and the movable part is sapphire or aluminium oxide ceramics,
1st material membrane and the 2nd material membrane are made up of amorphous nickel/phosphorus/aluminium oxide.
3. the manufacture method of Fine Machinery device according to claim 2, it is characterised in that
1st material membrane and the 2nd material membrane be by atomic layer deposition method, sputtering method, chemical vapour deposition technique
Any one and formed.
4. the manufacture method of Fine Machinery device according to claim 2, it is characterised in that
1st material membrane and the 2nd material membrane are formed by sol-gal process.
5. the manufacture method of Fine Machinery device according to claim 2, it is characterised in that
1st material membrane and the 2nd material membrane be by calcining by metal alkoxide, metal complex, metal organic acid salt
In any one constitute film and formed.
6. a kind of Fine Machinery device, it is characterised in that include：
Movable part, its pass through support and are bearing on substrate, separate configuration with the substrate in movable area, and can be in institute
State in movable area towards the orientation substrate displacement；
1st convex portion, its are formed at the wherein side's in the movable area in the relative substrate and the movable part
Surface, with the flat upper surface relative with the surface of the opposing party in the substrate or the movable part；
Multiple 2nd convex portions, they are formed at the upper surface of the 1st convex portion；And
Multiple 3rd convex portions, they be formed at the substrate or the movable part in the opposing party surface with the 1st convex portion
In relative region, size is identical with the 2nd convex portion,
2nd convex portion and the 3rd convex portion are the compositions by the material by the composition substrate and the movable part is contained
Material membrane heat and calcine to make the material membrane aggegation and crystallization and be formed.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015-171855 | 2015-09-01 | ||
| JP2015171855A JP6587870B2 (en) | 2015-09-01 | 2015-09-01 | Micromechanical device and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
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| CN110662949A (en) * | 2017-06-21 | 2020-01-07 | 松下知识产权经营株式会社 | Physical quantity sensor |
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| JP6587870B2 (en) | 2019-10-09 |
| KR101876045B1 (en) | 2018-07-06 |
| JP2017047495A (en) | 2017-03-09 |
| KR20170027278A (en) | 2017-03-09 |
| TWI617793B (en) | 2018-03-11 |
| CN106477511B (en) | 2018-08-07 |
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