CN106374331B - Multi-pass laser amplifier - Google Patents
Multi-pass laser amplifier Download PDFInfo
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- CN106374331B CN106374331B CN201611072856.5A CN201611072856A CN106374331B CN 106374331 B CN106374331 B CN 106374331B CN 201611072856 A CN201611072856 A CN 201611072856A CN 106374331 B CN106374331 B CN 106374331B
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- 230000003321 amplification Effects 0.000 claims abstract description 15
- 238000002955 isolation Methods 0.000 claims abstract description 15
- 238000003199 nucleic acid amplification method Methods 0.000 claims abstract description 15
- 238000007493 shaping process Methods 0.000 claims abstract description 11
- 238000002347 injection Methods 0.000 claims description 20
- 239000007924 injection Substances 0.000 claims description 20
- 239000004973 liquid crystal related substance Substances 0.000 claims description 14
- 230000003287 optical effect Effects 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 7
- 238000003384 imaging method Methods 0.000 claims description 3
- 238000005259 measurement Methods 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 5
- 230000028161 membrane depolarization Effects 0.000 description 5
- 238000005086 pumping Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000012937 correction Methods 0.000 description 2
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000002918 waste heat Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
- H01S3/10023—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by functional association of additional optical elements, e.g. filters, gratings, reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
- H01S3/10015—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by monitoring or controlling, e.g. attenuating, the input signal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/1065—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using liquid crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1123—Q-switching
- H01S3/115—Q-switching using intracavity electro-optic devices
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Laser Beam Processing (AREA)
- Lasers (AREA)
Abstract
The invention discloses a multi-path laser amplifier, which consists of a near field shaping module I, an isolation and input/output module II, a multi-Cheng Fang large-scale cavity module III and a wavefront measuring module IV, wherein the near field shaping module I shapes the near field of an input light spot, the isolation and input/output module II is used for finishing the input and output of main laser, the multi-Cheng Fang large-scale cavity module III is mainly used for carrying out high-quality amplification on the main laser, the wavefront measuring module IV is used for measuring the wavefront of the output laser and is matched with a wavefront corrector to finish the wavefront control.
Description
Technical Field
The invention relates to the technical field of high-power solid laser amplifiers under the condition of repeated frequency operation, in particular to a multi-path laser amplifier.
Background
High-efficiency high-repetition-frequency high-power solid-state lasers have very wide application in the fields of material processing, particle acceleration, strong X-ray generation, laser inertial confinement fusion and the like, and a multi-pass laser amplifier is paid attention as an important component part. The energy storage in the amplifier is extracted for many times, so that the energy extraction efficiency of the laser amplifier is greatly improved, but for the multi-pass laser amplifier under the heavy frequency operation, a large amount of waste heat generated in the operation of the amplifier cannot be discharged in time, an obvious thermally induced birefringence phenomenon occurs in the gain medium of the amplifier, so that the laser is subjected to thermal depolarization and thermally induced wave front distortion, and when the laser passes through the amplifier for many times, the thermal depolarization and the thermally induced wave front distortion are overlapped for many times and further deteriorated, and finally the output laser energy is reduced, and the quality of the output laser beam is deteriorated. At present, a multi-pass laser amplifier with heavy frequency mainly adopts a slice amplifier based on Zag-gag, and can realize laser output with high heavy frequency and high energy by utilizing a better heat dissipation characteristic of a slice structure and matching with a good thermal management system, but the quality of an output beam is not ideal.
A high quality multi-pass laser amplifier design with high repetition frequency is therefore a need.
Disclosure of Invention
Aiming at the problems in the prior art, the invention provides the multi-pass laser amplifier suitable for high-energy and heavy-frequency operation, solves the problem of non-ideal quality of laser output beams in the traditional multi-pass laser amplifier, and can further improve the efficiency of the laser amplifier through a multi-pass controllable amplification technology.
In order to achieve the above purpose, the present invention provides the following technical solutions: the utility model provides a multi-pass laser amplifier, includes near field plastic module I, isolation and input output module II and many Cheng Fang big ware cavity module III along the laser injection direction, isolation and input output module II department is provided with wavefront measurement module IV, simultaneously from isolation and input output module II output a beam of measuring light to wavefront measurement module IV
Further, the near field shaping module I is provided with a polaroid (101), a spatial light modulator (102) and a polaroid (103) in sequence along the laser injection direction, and is used for improving the near field quality of output laser.
Further, the spatial light modulator (102) is an electrically addressed liquid crystal, an optically addressed liquid crystal or a phase plate.
Further, the isolation and input/output module II is provided with a polaroid (201), a half wave plate (202), a first 45-degree Faraday rotator (203) and a polaroid (204) in sequence along the laser injection direction, an included angle between an optical axis of the half wave plate (202) and the horizontal direction is 22.5 degrees, and the rotation direction of the first 45-degree Faraday rotator (203) is opposite to the setting direction of the half wave plate.
Further, the multi-Cheng Fang large cavity module III consists of a main light path along the laser injection direction and a side light path parallel to the laser injection direction, wherein the main light path is sequentially provided with a polaroid (301), a quarter wave plate (302), an electro-optical switch (303), a first spatial filter (304), a second 45-degree Faraday rotator (305), a laser amplifying head (306), a third 45-degree Faraday rotator (307), a second spatial filter (308) and a wavefront corrector (309) along the laser injection direction, and the measuring light path is provided with a total reflection mirror (310).
Further, an included angle between the optical axis of the quarter wave plate (302) in the multi-Cheng Fang large cavity module III and the horizontal direction is 45 degrees.
Further, the electro-optical switch (303) in the multi-Cheng Fang large cavity module III operates at a quarter wave voltage.
Further, the wavefront corrector (309) in the multi Cheng Fang macro cavity module III is a deformable mirror, a phase conjugate mirror, or a liquid crystal light modulator.
Further, the wavefront measurement module IV is composed of a polarizer (402) and a wavefront sensor (401).
Further, the first spatial filter (304) and the second spatial filter (308) satisfy an imaging conjugate relationship, and the spatial light modulator, the laser amplification head center, the wavefront corrector, the total reflection mirror, and the wavefront sensor are imaged with each other through the first spatial filter and the second spatial filter.
The beneficial effects of the invention are as follows:
1. compared with the prior art, the invention adopts a multi-pass controllable amplification technology based on the quarter wave plate and the electro-optical switch, so that the amplification times of laser in the amplifier cavity can be controlled, the output energy of the amplifier can be flexibly changed, and the energy extraction efficiency of the laser amplifier can be improved.
2. Compared with the prior art, the near field shaping module based on the spatial light modulator and the strict image transmission technology are adopted, so that the near field quality of output laser is obviously improved.
3. Compared with the prior art, the wavefront measuring module IV provided by the invention adopts the wavefront real-time measurement and wavefront active control technology, so that the real-time correction of wavefront distortion is realized, and the far-field quality of output laser is improved.
4. Compared with the prior art, the method of adding two 45-degree Faraday rotators to a single laser amplifying head is adopted, so that the complete compensation of thermal depolarization is realized, and the thermal problem of heavy frequency operation is solved.
Drawings
FIG. 1 is a schematic diagram of an apparatus of the present invention;
FIG. 2 is a graph showing laser output waveforms for different amplification runs in accordance with the present invention;
FIG. 3 is a near field spot pattern of laser output in accordance with the present invention;
in the figure: 101-polarizer, 102-spatial light modulator, 103-polarizer, 201-polarizer, 202-quarter wave plate, 203-first 45 ° faraday rotator, 204-polarizer, 301-polarizer, 302-quarter wave plate, 303-electro-optical switch, 304-first spatial filter, 305-second 45 ° faraday rotator, 306-laser amplifier, 307-third 45 ° faraday rotator, 308-second spatial filter, 309-wavefront corrector, 310-total reflection mirror, 401-wavefront sensor, 402-polarizer;
in end In fig. 1 is a laser injection end, an arrow parallel to the optical path at the polarizing plate 101 indicates an injection direction of laser light, and Out end is a laser output end, and an arrow perpendicular to the optical path at the polarizing plate 402 indicates an output direction of laser light.
Detailed Description
In order to make the technical solution of the present invention better understood by those skilled in the art, the technical solution of the present invention will be clearly and completely described below with reference to the accompanying drawings, and based on the embodiments in the present application, other similar embodiments obtained by those skilled in the art without making creative efforts should fall within the scope of protection of the present application.
Embodiment one:
as shown in fig. 1, a multi-path laser amplifier includes a near field shaping module I, an isolation and input/output module II, and a multi-Cheng Fang amplifier cavity module III along a laser injection direction, where a wavefront measurement module IV is disposed at the isolation and input/output module II, and a beam of measurement light is output from the isolation and input/output module II to the wavefront measurement module IV. The near field shaping module I is sequentially provided with a polaroid 101, a spatial light modulator 102 and a polaroid 103 along the laser injection direction, the near field quality of output laser is obviously improved by adopting the near field shaping module based on the spatial light modulator and a strict image transmission technology, and the spatial light modulator 102 is an electric addressing liquid crystal, an optical addressing liquid crystal or a phase plate.
The isolation and input/output module II is provided with a polaroid 201, a half wave plate 202, a first 45-degree Faraday rotator 203 and a polaroid 204 in sequence along the laser injection direction, the included angle between the optical axis of the half wave plate 202 and the horizontal direction is 22.5 degrees, and the rotation direction of the first 45-degree Faraday rotator (203) is opposite to the setting direction of the half wave plate.
The multi-Cheng Fang large cavity module III consists of a main light path along the laser injection direction and a side light path parallel to the laser injection direction, wherein the main light path is sequentially provided with a polaroid 301, a quarter wave plate 302, an electro-optical switch 303, a first spatial filter 304, a second 45-degree Faraday rotator 305, a laser amplifying head 306, a third 45-degree Faraday rotator 307, a second spatial filter 308 and a wavefront corrector 309 along the laser injection direction, and the measuring light path is provided with a total reflection mirror 310; the included angle between the optical axis of the quarter wave plate 302 in the multi Cheng Fang large cavity module III and the horizontal direction is 45 degrees; the voltage of the electro-optical switch 303 in the multi-Cheng Fang large cavity module III when working is quarter wave voltage; the wavefront corrector 309 in the multi Cheng Fang macro cavity module III is a deformable mirror, a phase conjugate mirror, or a liquid crystal light modulator. The wavefront measuring module IV is constituted by a polarizer 402 and a wavefront sensor 401. The first spatial filter 304 and the second spatial filter 308 satisfy the imaging conjugation relationship, and the spatial light modulator, the center of the laser amplification head, the wavefront corrector, the total reflection mirror and the wavefront sensor are imaged with each other through the first spatial filter and the second spatial filter, so that the module mainly performs high-quality amplification on main laser.
This embodiment describes the present invention using very broad application of neodymium glass as a gain medium for a laser amplifier. The gain medium adopts a square rod with the cross section of 8mm multiplied by 8mm and the length of 15cm, the laser amplification head adopts LD as a pumping source, the pumping mode is four-side symmetrical pumping, the pumping power is 60kW, the spatial light modulator 102 is electrically addressed liquid crystal, and the resolution of the liquid crystal is as follows: 1024×768, the wavefront corrector 309 is a deformable mirror of 25 drivers, the wavefront detector is a Hartmann wavefront sensor 401, the two lens focal length ratio of the first spatial filter 304 is 2:1, and the two lens focal length ratio of the second spatial filter 308 is 1:4.
Seed laser is injected from an In end, enters a multi-pass amplifier cavity module III after being subjected to electric addressing liquid crystal shaping through an isolation and input/output module II, and the multi-Cheng Fang amplifier cavity module III consists of a total reflection mirror 310, a polaroid 301, a deformable mirror and optical elements between the total reflection mirror and the deformable mirror, wherein a quarter wave plate 302 and an electro-optical switch 303 are used for controlling the number of laser amplifying passes, so that the amplifying times of the laser In an amplifier cavity can be controlled, the output energy of the amplifier can be flexibly changed, and the energy extraction efficiency of the laser amplifier can be improved; the second 45 ° faraday rotator 305 and the third 45 ° faraday rotator 307 are used for thermal depolarization compensation; the deformable mirror is used for correcting wave front distortion; the first spatial filter 304 and the second spatial filter 308 are used for high-frequency filtering, image transmission and beam caliber transformation, the first spatial filter 304 transmits the image on the electric addressing liquid crystal 102 and the full-reflection mirror 310 to the center of the laser amplification head 306, and simultaneously, the beam caliber is contracted by 2:1, the second spatial filter 308 images the center of the laser amplification head 306 on the surface of the deformable mirror, and simultaneously, the beam caliber is expanded by 1:4 so as to meet the optimal wavefront correction caliber.
In the operation process of the laser amplifier, the amplification process number is firstly determined, then the time sequence and the operation time of the electro-optical switch 303 are adjusted, the output laser time sequence is observed from the output end, and when a single pulse is presented in the laser time sequence and the process number of the laser running in the cavity of the amplifier is the set process number, the operation can be completed. Fig. 2 shows pulse time waveforms with different amplification ranges, for amplification of any range, only one pulse is used for outputting laser waveform, which indicates that extinction ratio and thermal depolarization of the system are complete, then under the condition that a deformable mirror is not applied with voltage, a Hartmann wavefront sensor 401 is used for measuring wavefront distortion of output laser, then an iterative algorithm is used for slowly applying voltage to the deformable mirror, when the wavefront distortion measured by the Hartmann wavefront sensor 401 is small, stopping, and finally an electric addressing liquid crystal 102 is used for shaping an injected laser near field to match gain uniformity of a gain medium, and outputting a light spot with uniform near field. FIG. 3 shows an eight-pass amplified near field pattern exhibiting a standard high order Gaussian flat top near field, with a uniform near field.
Furthermore, it should be understood that although the present disclosure describes embodiments, not every embodiment is provided with a separate embodiment, and that this description is provided for clarity only, and that the disclosure is not limited to the embodiments described in detail below, and that the embodiments described in the examples may be combined as appropriate to form other embodiments that will be apparent to those skilled in the art.
Claims (5)
1. The multi-path laser amplifier is characterized by comprising a near field shaping module I, an isolation and input/output module II and a multi-Cheng Fang large cavity module III along the laser injection direction, wherein a wavefront measuring module IV is arranged at the isolation and input/output module II, and a beam of measuring light is output from the isolation and input/output module II to the wavefront measuring module IV;
in the working process of the laser amplifier, firstly determining the amplification range number, then adjusting the time sequence and the working time of the electro-optical switch 303 positioned in the multi-range amplifier cavity module III, observing the output laser time sequence from an output end, and completing the process when a single pulse is presented in the laser time sequence and the range number of the laser in the amplifier cavity is the set range number;
the near field shaping module I is sequentially provided with a polaroid (101), a spatial light modulator (102) and a polaroid (103) along the laser injection direction, and is used for improving the near field quality of output laser;
the isolation and input/output module II is sequentially provided with a polaroid (201), a half wave plate (202), a first 45-degree Faraday rotator (203) and a polaroid (204) along the laser injection direction, wherein an included angle between an optical axis of the half wave plate (202) and the horizontal direction is 22.5 degrees, and the rotation direction of the first 45-degree Faraday rotator (203) is opposite to the setting direction of the half wave plate;
the multi-Cheng Fang large cavity module III consists of a main light path along the laser injection direction and a side light path parallel to the laser injection direction, wherein the main light path is sequentially provided with a polaroid (301), a quarter wave plate (302), an electro-optical switch (303), a first spatial filter (304), a second 45-degree Faraday rotator (305), a laser amplifying head (306), a third 45-degree Faraday rotator (307), a second spatial filter (308) and a wavefront corrector (309) along the laser injection direction, and the side light path is provided with a full-reflection mirror (310);
an included angle between an optical axis of the quarter wave plate (302) in the multi-Cheng Fang large cavity module III and the horizontal direction is 45 degrees;
the first spatial filter (304) and the second spatial filter (308) satisfy an imaging conjugate relationship.
2. A multipass laser amplifier according to claim 1, wherein the spatial light modulator (102) is an electrically addressed liquid crystal, an optically addressed liquid crystal or a phase plate.
3. A multipass laser amplifier according to claim 1, wherein the electro-optical switch (303) in the multipass Cheng Fang amplifier cavity module III is operated at a quarter wave voltage.
4. The multi-pass laser amplifier of claim 1, wherein the wavefront corrector (309) in the multi-Cheng Fang amplifier cavity module III is a deformable mirror, a phase conjugate mirror or a liquid crystal light modulator.
5. A multi-pass laser amplifier according to claim 1, characterized in that the wavefront measuring module IV is constituted by a polarizer (402) and a wavefront sensor (401).
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| Application Number | Priority Date | Filing Date | Title |
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| CN201611072856.5A CN106374331B (en) | 2016-11-29 | 2016-11-29 | Multi-pass laser amplifier |
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| CN201611072856.5A CN106374331B (en) | 2016-11-29 | 2016-11-29 | Multi-pass laser amplifier |
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| CN106374331A CN106374331A (en) | 2017-02-01 |
| CN106374331B true CN106374331B (en) | 2024-03-08 |
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Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107171170A (en) * | 2017-04-12 | 2017-09-15 | 沈阳理工大学 | A kind of laser beam reshaping device with closed-loop adaptation mechanism |
| CN107196182B (en) * | 2017-07-19 | 2023-08-15 | 中国工程物理研究院激光聚变研究中心 | Off-axis eight-pass laser amplifying device |
| CN111082298B (en) * | 2020-01-17 | 2020-12-18 | 中国工程物理研究院激光聚变研究中心 | Automatic light path collimation method of off-axis eight-pass amplification laser system |
| CN114858291B (en) * | 2022-07-05 | 2022-09-20 | 中国工程物理研究院激光聚变研究中心 | Laser link segmented wavefront detection method and device based on point diffraction |
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| US4734911A (en) * | 1986-03-14 | 1988-03-29 | Hughes Aircraft Company | Efficient phase conjugate laser |
| JP2005268506A (en) * | 2004-03-18 | 2005-09-29 | Japan Atom Energy Res Inst | Solid laser amplifier |
| CN103094821A (en) * | 2013-01-31 | 2013-05-08 | 中国工程物理研究院激光聚变研究中心 | Regenerative amplification system used for laser amplification |
| CN206302051U (en) * | 2016-11-29 | 2017-07-04 | 中国工程物理研究院激光聚变研究中心 | A kind of Multi-pass laser amplifier |
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2016
- 2016-11-29 CN CN201611072856.5A patent/CN106374331B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4734911A (en) * | 1986-03-14 | 1988-03-29 | Hughes Aircraft Company | Efficient phase conjugate laser |
| JP2005268506A (en) * | 2004-03-18 | 2005-09-29 | Japan Atom Energy Res Inst | Solid laser amplifier |
| CN103094821A (en) * | 2013-01-31 | 2013-05-08 | 中国工程物理研究院激光聚变研究中心 | Regenerative amplification system used for laser amplification |
| CN206302051U (en) * | 2016-11-29 | 2017-07-04 | 中国工程物理研究院激光聚变研究中心 | A kind of Multi-pass laser amplifier |
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| Title |
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| 新型LD泵浦振荡器与多程放大***联机实验;邓青华, 隋展, 李明中, 景峰, 陈绍和, 彭志涛, 赵润昌, 刘华, 张清泉, 王方, 徐隆波, ***, 吴登生, 张雄军, 程晓峰, 左明;强激光与粒子束;20041115(第11期);全文 * |
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