CN106338379A - Miniature projection system wave aberration detection system and wave aberration detection method - Google Patents
Miniature projection system wave aberration detection system and wave aberration detection method Download PDFInfo
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- CN106338379A CN106338379A CN201510962446.7A CN201510962446A CN106338379A CN 106338379 A CN106338379 A CN 106338379A CN 201510962446 A CN201510962446 A CN 201510962446A CN 106338379 A CN106338379 A CN 106338379A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0207—Details of measuring devices
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Abstract
The invention provides a miniature projection system wave aberration detection system and a wave aberration detection method. The miniature projection system wave aberration detection system comprises a point diffraction interferometer, a miniature projection system and a spherical reflection system which is positioned on a same optical path as the point diffraction interferometer, wherein the miniature projection system is arranged between the point diffraction interferometer and the spherical reflection system, and the point diffraction interferometer, the miniature projection system and the spherical reflection system are sequentially arranged on the same optical path from top to bottom. Moreover, the invention provides the wave aberration detection method based on the miniature projection system wave aberration detection system. The miniature projection system wave aberration detection system provided by the invention is sensitive to variation of mechanical structures, can be quickly converged in the assembling and debugging process, and is precise in wave aberration detection.
Description
Technical field
The invention belongs to technical field of optical detection, it is related to a kind of wave aberration detection system, more particularly, to
A kind of micro optical projection system wave aberration detection system and wave aberration detection method.
Background technology
Optical system emergent pupil face wave aberration is to weigh the key index of optical system imaging quality, characterizes
Deviation between actual corrugated and preferable corrugated, is to evaluate one kind of an optical system imaging quality relatively
For convenience with intuitively method.
Extreme ultraviolet lithography is built upon the Next Generation Lithography on the basis of conventional optical lithography, it
Inherit the development result of current optical lithography to greatest extent.The operation wavelength of extreme ultraviolet photolithographic is
The extreme ultraviolet waveband of 13～14nm, in light source technology, optical system, multiplayer films in EUV technology, anti-
Penetrate formula mask technique, superhigh precision control technology, Resist Technology, optical element processing/detection technique
Etc. aspect all have great difference with traditional optical lithography.
Extreme ultraviolet photolithographic is due to carrying out Imagewise exposure, nearly all material using the extreme ultraviolet of 13.5nm
All opaque to this wavelength.Therefore, in order to be implemented as picture, and improve optical system output as much as possible,
Optical projection system must adopt full reflected system.Micro optical projection system is the extreme ultraviolet photolithographic imaging of small field of view
System, including two non-spherical reflector elements, the quality of its emergent pupil face wave aberration and the success or failure of photoetching
Closely bound up.
Therefore, the wave aberration of micro optical projection system is detected, become the ripple ensureing micro optical projection system
Aberration meets the requirements, and then ensures the important detection process of photoetching success or failure.But, in existing ripple picture
In the middle of difference detecting system, adopt one way optical test path system more；Within the system, wave aberration is to machinery
The change sensitivity of structure is relatively low, is unfavorable for debuging the Fast Convergent of process, increased micro projection system
That unites debugs the time.
Content of the invention
It is contemplated that overcoming in prior art, due to using one way optical test path system, caused
Wave aberration is insensitive to frame for movement change and is unfavorable for that debuging the technology such as the Fast Convergent of process asks
Topic, provide a kind of can sensitive to the reacting condition of frame for movement, debug process energy Fast Convergent and
Wave aberration detects the high micro optical projection system wave aberration detection system of degree of accuracy.
For achieving the above object, the present invention employs the following technical solutions:
The invention provides a kind of micro optical projection system wave aberration detection system, including point-diffraction interferometer,
Micro optical projection system and be in the spherical reflecting system in same light path with point-diffraction interferometer, described
Micro optical projection system is placed between point-diffraction interferometer and spherical reflecting system, described point-diffraction interferometer,
Micro optical projection system and spherical reflecting system are successively set in same light path from top to bottom.
In one embodiment, described micro optical projection system include along light path set gradually from top to bottom time
Mirror, secondary mirror support meanss, main supporting plate, primary lens regulating mechanism, primary mirror support device and primary mirror, institute
State secondary mirror to be arranged in secondary mirror support meanss, described secondary mirror support meanss are arranged on Main shoe plate upper table
Face, the upper end of described primary lens regulating mechanism is arranged on described Main shoe plate lower surface, and described primary mirror is adjusted
The lower end of whole mechanism is connected with described primary mirror support device, and described primary mirror is arranged on primary mirror support device.
In one embodiment, described secondary mirror support meanss include secondary mirror support member and secondary mirror support ring, institute
State the top that secondary mirror is arranged on secondary mirror support member, the low side of described secondary mirror support member is arranged on described secondary mirror
In support ring, described secondary mirror support ring is arranged on Main shoe plate upper surface.
In one embodiment, described primary mirror support device includes primary mirror support ring and primary mirror support part, institute
The upper end stating primary mirror support ring is connected with the lower end of described primary lens regulating mechanism, described primary mirror support part
Upper end is arranged on the lower end of primary mirror support ring, and described primary mirror is arranged on the lower end of described primary mirror support part.
In one embodiment, described spherical reflecting system includes spherical reflector and is used for installing and adjusts
The governor motion of whole described spherical reflector.
Present invention also offers a kind of wave aberration detection method, comprise the following steps:
Step 1, establishment micro optical projection system wave aberration detection system provided by the present invention, detect micro
The wave aberration of optical projection system；
Step 2, the wave aberration of the micro optical projection system being recorded according to step 1, by soft in code v
Set up the x, y, z direction of primary lens regulating mechanism in part and x direction tilt and y direction tilt with micro-
Corresponding relation between contracting optical projection system wave aberration, carries out precision to micro optical projection system and debugs；
Step 3, step 2 is carried out precision debug after micro optical projection system carry out wave aberration detection；
Step 4, set up the mould that spherical reflecting system affects on micro optical projection system wave aberration testing result
Type, and derive the impact to micro optical projection system wave aberration testing result for the spherical reflecting system；
Step 5, according in step 4 derive spherical reflecting system to micro optical projection system wave aberration detect
The impact of result, the wave aberration detecting gained to step 3 is modified, and obtains final micro projection
System wave aberration.
In one embodiment, in step 1, assembling secondary mirror, secondary successively from top to bottom on three coordinate machine
Mirror support meanss, main supporting plate, primary lens regulating mechanism, primary mirror support device and primary mirror, to set up
Micro optical projection system.
In one embodiment, in step 1, by integral translation micro optical projection system and spheric reflection system
System, is completed the visual field positioning of micro optical projection system, and completes light path adjustment, and then complete to be spread out based on point
The establishment of the micro optical projection system wave aberration detection system of Rhizoma Belamcandae interferometer.
In one embodiment, in step 4, on the basis of the model set up, in spherical reflecting system
Spherical reflector on be loaded into calibrated component side shape, using in code v software light transmission work(
Can, after the spherical reflector in analysis spherical reflecting system is loaded into the component side shape of demarcation, micro is thrown
The phase place change in shadow system emergent pupil face, and then derive spherical reflecting system to micro optical projection system wave aberration
The impact of testing result.
The beneficial effects of the present invention is: the micro optical projection system wave aberration detection system that the present invention provides,
The test light being sent by point-diffraction interferometer, after micro optical projection system, via spherical reflecting system
After reflection, through micro optical projection system, then converge to point-diffraction interferometer, the ginseng with point-diffraction interferometer
Examine light to be interfered, obtain interference fringe, and then complete the wave aberration detection of micro optical projection system.On
State in micro optical projection system wave aberration detection system, passed through by the test light that point-diffraction interferometer sends micro-
After contracting optical projection system, after spherical reflecting system reflection, through micro optical projection system, return again to a little spread out
Rhizoma Belamcandae interferometer, constitutes round trip light path, the micro optical projection system wave aberration detection based on this round trip light path
System, improves the sensitivity to frame for movement for the wave aberration, is beneficial to the Fast Convergent debuging process；
Meanwhile, based on this micro optical projection system wave aberration detection system, it is capable of to micro optical projection system
The accurate detection of wave aberration.Meanwhile, the wave aberration detection method providing in conjunction with the present invention, through step 1
Detect the wave aberration obtaining, by setting up the x, y, z side of primary lens regulating mechanism in code v software
To and x direction tilt and y direction tilt and micro optical projection system wave aberration between corresponding relation,
Carry out precision to micro optical projection system to debug, then wave aberration two is carried out to the micro optical projection system after debuging
Secondary detection；In addition, further according to the impact of the model in step 4 and derivation, obtaining to step 3 detection
Wave aberration be modified, the wave aberration higher to obtain final degree of accuracy.
Brief description
Fig. 1 is the composition of the micro optical projection system wave aberration detection system that one embodiment of the invention provides
Schematic diagram.
Fig. 2 is that in one embodiment of the invention, spherical reflecting system detects to micro optical projection system wave aberration
The model of result impact.
Reference:
Secondary mirror 1；Secondary mirror support member 2；Secondary mirror support ring 3；Main supporting plate 4；Primary lens regulating mechanism 5；
Primary mirror support ring 6；Primary mirror support part 7；Primary mirror 8；Spherical reflector 9；Governor motion 10.
Specific embodiment
Embodiments of the invention are described below in detail, the example of described embodiment is shown in the drawings, its
In from start to finish same or similar label represent same or similar element or there is same or like work(
The element of energy.Embodiment below with reference to Description of Drawings is exemplary it is intended to be used for explaining this
Invention, and be not considered as limiting the invention.
" " center ", " longitudinal ", " horizontal ", " long it is to be understood that term in describing the invention
Degree ", " width ", " thickness ", " on ", D score, "front", "rear", "left", "right", " vertical ", " water
Flat ", " top ", " bottom " " interior ", the orientation of instruction such as " outward " or position relationship be based on side shown in the drawings
Position or position relationship, are for only for ease of and describe the present invention and simplify description, rather than instruction or hint
The device of indication or element must have specific orientation, with specific azimuth configuration and operation, therefore
It is not considered as limiting the invention.
Additionally, term " first ", " second " are only used for describing purpose, and it is not intended that indicating or implying
Relative importance or the implicit quantity indicating indicated technical characteristic.Thus, define " first ",
The feature of " second " can be expressed or implicitly include one or more this feature.The present invention's
In description, " multiple " are meant that two or more, unless otherwise expressly limited specifically.
In the present invention, unless otherwise clearly defined and limited, term " installation ", " setting ", " company
Connect ", the term such as " fixation " should be interpreted broadly, for example, it may be being fixedly connected or removable
Unload connection, or be integrally connected；Can be to be mechanically connected or electrically connect；Can be direct
It is connected it is also possible to be indirectly connected to by intermediary, can be the connection of two element internals.For
For those of ordinary skill in the art, above-mentioned term can be understood as the case may be in the present invention
Concrete meaning.
The invention provides a kind of micro optical projection system wave aberration detection system, including point-diffraction interferometer,
Micro optical projection system and be in the spherical reflecting system in same light path with point-diffraction interferometer, described
Micro optical projection system is placed between point-diffraction interferometer and spherical reflecting system, described point-diffraction interferometer,
Micro optical projection system and spherical reflecting system are successively set in same light path from top to bottom.
As shown in figure 1, point-diffraction interferometer (not shown) is located at the top of in figure, light
In place of gathering；This point-diffraction interferometer is used for sending test light and reference light, receives anti-by sphere simultaneously
Penetrate the reflected light that systematic reflection is returned, interfered by the reference light with point-diffraction interferometer, obtain
Interference fringe, and then complete the wave aberration detection of micro optical projection system.
Above-mentioned point-diffraction interferometer, micro optical projection system and spherical reflecting system are in same light path
On, this light path is meant that, the detection being sent by point-diffraction interferometer, through micro optical projection system,
It is sent in spherical reflecting system, and reflected by this spherical reflecting system, then through micro optical projection system,
Finally received by point-diffraction interferometer.Wherein, be from top to bottom according to the direction in Fig. 1 for,
The top that point-diffraction interferometer is located in Fig. 1, spherical reflecting system is and bottom, and micro is thrown
Shadow system is then located at the centre position between point-diffraction interferometer and spherical reflecting system；Hereinafter top
Represent that top represents upper end, and low side represents lower end for upper and lower in Fig. 1 with low side.
The micro optical projection system wave aberration detection system that the present invention provides, is sent by point-diffraction interferometer
Test light, after micro optical projection system, after spherical reflecting system reflection, projects system through micro
System, then converge to point-diffraction interferometer, interfered with the reference light of point-diffraction interferometer, obtained dry
Relate to striped, and then complete the wave aberration detection of micro optical projection system.Above-mentioned micro optical projection system wave aberration
In detecting system, the test light being sent by point-diffraction interferometer after micro optical projection system, via ball
Face reflex system reflection, then pass through micro optical projection system, finally return that point-diffraction interferometer, constitute
Round trip light path, based on the micro optical projection system wave aberration detection system of this round trip light path, improves ripple picture
The sensitivity to frame for movement for the difference, is beneficial to the Fast Convergent debuging process；Meanwhile, based on this micro
Optical projection system wave aberration detection system, is capable of the accurate detection of the wave aberration to micro optical projection system.
Above-mentioned point-diffraction interferometer, the spherical wave of the approximate ideal producing by pinhole difiration is as reference
Ripple, eliminates the impact with reference to wave surface error for the Conventional interferometers, greatly improves accuracy of detection.With
The continuous improvement of optical detection requirement, point-diffraction interferometer increasingly shows its advantage, and widely
It is applied in high-precision optical detection, be the high accuracy inspection of extreme ultraviolet lithography projection objective system wave aberration
Survey provides probability.More specifically, in Fig. 1, the point-diffraction interferometer aperture of the top sends
Test light, after micro optical projection system, via spherical reflecting system return, through micro project system
System, finally converges at point-diffraction interferometer aperture, is reflected into point-diffraction interferometer through aperture plate,
Interfered with the reference light of point-diffraction interferometer, obtain interference fringe, complete micro optical projection system
Wave aberration detects.
As a preferred embodiment of the present invention, above-mentioned micro optical projection system is included along light path from up to
Under set gradually secondary mirror 1, secondary mirror support meanss, main supporting plate 4, primary lens regulating mechanism 5, primary mirror
Support meanss and primary mirror 8, wherein, secondary mirror 1 is arranged in secondary mirror support meanss, and secondary mirror support meanss are pacified
It is contained in the upper surface of main supporting plate 4, the upper end of primary lens regulating mechanism 5 is arranged under main supporting plate 4
Surface, the lower end of primary lens regulating mechanism 5 is connected with primary mirror support device, and primary mirror 8 is arranged on primary mirror and props up
On support arrangement.
Wherein, above-mentioned secondary mirror 1 converges to the light reflecting back from primary mirror, and secondary mirror support meanss
It is used for fixing above-mentioned secondary mirror；More specifically, secondary mirror support meanss include secondary mirror support member 2 and secondary mirror props up
Pushing out ring 3, secondary mirror support member 2 is fixedly connected in secondary mirror support ring 3 by screw, and secondary mirror support ring
It is fixed by screws on main supporting plate 4.It is complete that above-mentioned primary lens regulating mechanism 5 passes through micro-displacement driver
Primary mirror support device is become to tilt, in x, y, z direction and x direction, the adjustment tilting with y direction, main
Mirror guiding mechanism 5 is fixed by screw with primary mirror support device, and primary mirror support device 5 includes primary mirror and props up
Support member 7 and primary mirror support ring 6, primary mirror support part 6 is fixedly connected by screw with primary mirror support ring 7.
The detection light being sent by point-diffraction interferometer, the centre bore through secondary mirror 1 reaches primary mirror 8, via primary mirror
Detection light is reflexed on secondary mirror 1 by 8, and detection light is converged by secondary mirror 1, through the centre bore of primary mirror 8,
Reach spherical reflecting system, under the reflection of spherical reflecting system, then through secondary mirror 1 and primary mirror 8
Reflection, return point-diffraction interferometer, received by point-diffraction interferometer.
More specifically, as shown in figure 1, another preferred embodiment as the present invention, secondary mirror props up
Support arrangement includes secondary mirror support member 2 and secondary mirror support ring 3, and secondary mirror 1 is arranged on the top of secondary mirror support member 2
End, the low side of described secondary mirror support member 2 is arranged in described secondary mirror support ring 3, and described secondary mirror supports
Ring 3 is arranged on the upper surface of main supporting plate 4.
As one embodiment of the present of invention, as shown in figure 1, described primary mirror support device includes primary mirror
Support ring 6 and primary mirror support part 7, the upper end of described primary mirror support ring 6 and described primary lens regulating mechanism 5
Lower end connect, the upper end of described primary mirror support part 7 is arranged on the lower end of primary mirror support ring 6, described
Primary mirror 8 is arranged on the lower end of described primary mirror support part 7.
As another embodiment of the present invention, as shown in figure 1, described spherical reflecting system includes ball
Face reflecting mirror 9 and the governor motion 10 for installing and adjusting described spherical reflector.Specifically,
Above-mentioned governor motion 10 includes the mounting platform for mounting spherical reflecting mirror, and installs for adjustment
In the regulation handle of platform movement, such as Fig. 1, bottom is located at four knobs of governor motion 10 surrounding,
It is used for adjusting the horizontal level of spherical reflector 9.
Present invention also offers a kind of wave aberration detection method, comprise the following steps:
The micro optical projection system wave aberration detection system that step 1, the establishment present invention provide, detection micro is thrown
The wave aberration of shadow system；
Step 2, the wave aberration of the micro optical projection system being recorded according to step 1, by soft in code v
Set up the x, y, z direction of primary lens regulating mechanism in part and x direction tilt and y direction tilt with micro-
Corresponding relation between contracting optical projection system wave aberration, carries out precision to micro optical projection system and debugs；
Step 3, step 2 is carried out precision debug after micro optical projection system carry out wave aberration detection；
Step 4, set up the mould that spherical reflecting system affects on micro optical projection system wave aberration testing result
Type, and derive the impact to micro optical projection system wave aberration testing result for the spherical reflecting system；
Step 5, according in step 4 derive spherical reflecting system to micro optical projection system wave aberration detect
The impact of result, the wave aberration detecting gained to step 3 is modified, and obtains final micro projection
System wave aberration.
The wave aberration detection method that the present invention provides, through step 1 wave aberration that obtains of detection, by
The x, y, z direction of primary lens regulating mechanism set up in code v software and x direction tilt and y side
To the corresponding relation tilting and micro optical projection system wave aberration between, precision is carried out to micro optical projection system
Debug, then wave aberration secondary detection is carried out to the micro optical projection system after debuging；In addition, further according to step
Model in rapid 4 and the impact of derivation, the wave aberration that step 3 detection is obtained is modified, with
To the higher wave aberration of final degree of accuracy.
As a preferred embodiment of the present invention, in the step 1 of above-mentioned wave aberration detection method,
On three coordinate machine, assembling secondary mirror 1, secondary mirror support meanss, main supporting plate 4, primary mirror are adjusted successively from top to bottom
Whole mechanism 5, primary mirror support device and primary mirror 8, to set up micro optical projection system.More specifically, lead to
Cross adjustment primary lens regulating mechanism 5 and be in dead-center position, the relative position of adjustment primary mirror 8 and secondary mirror 1 is closed
System, makes the spacing of primary mirror 8 and secondary mirror 1 close to design load, and ensures the same of primary mirror 8 and secondary mirror 1
Axle degree and offset.
In one embodiment of the present of invention, in the step 1 of above-mentioned wave aberration detection method, by entirety
Translation micro optical projection system and spherical reflecting system, complete the visual field positioning of micro optical projection system, and complete
Become light path adjustment, and then complete the micro optical projection system wave aberration detection system based on point-diffraction interferometer
Establishment.Above-mentioned complete light path adjustment refer to be combined above-mentioned each part, realize each part on edge
Light path place path, installs from top to bottom successively so that the detection light that sends of point-diffraction interferometer, according to
Secondary energy passes through the centre bore of secondary mirror 1 to reach primary mirror 8, reflexes on secondary mirror 1 via primary mirror 8 by detection light,
Detection light is converged by secondary mirror 1, through the centre bore of primary mirror 8, reaches spherical reflecting system, in sphere
Under the reflection of reflex system, then the reflection through secondary mirror 1 and primary mirror 8, return point-diffraction interferometer.
After system component, wave aberration is detected by point-diffraction interferometer.
In one embodiment of the present of invention, in the step 4 of above-mentioned wave aberration detection method, set up
On the basis of model, calibrated component side shape is loaded on the spherical reflector of spherical reflecting system, adopts
With the light transfer function in code v software, analyze and be loaded on the spherical reflector of spherical reflecting system
After the component side shape demarcated, the phase place change in micro optical projection system emergent pupil face, and then derive spheric reflection
The impact to micro optical projection system wave aberration testing result for the system.
Specific embodiment.
As illustrated in fig. 1 and 2, a kind of micro optical projection system wave aberration detection system, does including point diffraction
Interferometer (not shown), this point-diffraction interferometer sends detection light, along detection light light path from top to bottom according to
Secondary be provided with secondary mirror 1, secondary mirror support member 2, secondary mirror support ring 3, main supporting plate 4, primary mirror adjustment machine
Structure 5, primary mirror support ring 6, primary mirror support part 7 and primary mirror 8, and the sphere being located at below primary mirror is anti-
Penetrate mirror 9 and the governor motion 10 for installing and adjusting spherical reflector.This micro optical projection system ripple picture
Difference detecting system includes three parts, i.e. point-diffraction interferometer, micro optical projection system and spheric reflection system
System.More specifically, secondary mirror 1 is arranged on the top of secondary mirror support member 2, the low side of secondary mirror support member 2
It is arranged in secondary mirror support ring 3, secondary mirror support ring 3 is arranged on the upper surface of main supporting plate 4；Main
Primary lens regulating mechanism 5 is provided with the lower surface of fagging 4, the lower end of primary lens regulating mechanism 5 is provided with master
Mirror support ring 6, primary mirror support ring 6 lower end primary mirror support part 7 is installed, primary mirror 8 is arranged on master
The lower end of mirror support member 7.
The detection light being sent by point-diffraction interferometer, the centre bore sequentially passing through secondary mirror 1 reaches primary mirror 8,
Via primary mirror 8, detection light is reflexed on secondary mirror 1, detection light is converged by secondary mirror 1, through primary mirror 8
Centre bore, reach spherical reflecting system, under the reflection of spherical reflecting system, then through secondary mirror 1
With the reflection of primary mirror 8, return point-diffraction interferometer, received by point-diffraction interferometer, and with a diffraction
Reference light in interferometer is interfered, and obtains interference fringe, to complete the ripple to micro optical projection system
Aberration detects.
The mechanical assembly of above-mentioned micro optical projection system wave aberration detection system is completed on three coordinate machine；Again
By integral translation micro optical projection system, spherical reflector 9 and governor motion 10, carry out micro projection
System visual field positioning, and complete light path adjustment after, by point-diffraction interferometer to this micro project system
The wave aberration of system wave aberration detection system is detected.
After obtaining the wave aberration of micro optical projection system that above-mentioned steps record, by code v software
Set up the x, y, z direction of primary lens regulating mechanism and x direction tilts and y direction tilts and micro throwing
Corresponding relation between shadow system wave aberration, carries out precision to micro optical projection system and debugs.Precision is debug
Afterwards, detect the wave aberration of micro optical projection system again.
Meanwhile, setting up spherical reflector according to Fig. 2 affects on micro optical projection system wave aberration testing result
Model, on the basis of this model, calibrated component side shape is loaded on spherical reflector；Adopt
With the light transfer function (beam synthesis propagation) in code v software, analyze sphere
After reflecting mirror loading surface shape, the phase place change in micro optical projection system emergent pupil face, derives spherical reflector pair
The impact of micro optical projection system wave aberration testing result；Further according to above-mentioned spherical reflector, micro is projected
The impact of system wave aberration testing result, is modified to the wave aberration recording, and obtains accurate ripple picture
Difference information, completes wave aberration detection.
In this embodiment, on the one hand pass through the system component of round trip light path, improve system wave aberration pair
The sensitivity of frame for movement, is conducive to debuging the Fast Convergent of process；On the other hand, in detection process
In, by detection, the accurate process debug, detect again, revise again, improve and above-mentioned micro is thrown
The degree of accuracy of the wave aberration detection of shadow system.
In the description of this specification, reference term " embodiment ", " some embodiments ", " example ",
The description of " specific example " or " some examples " etc. means the concrete spy with reference to this embodiment or example description
Levy, structure, material or feature are contained at least one embodiment or the example of the present invention.At this
In description, identical embodiment or example are not necessarily referring to the schematic representation of above-mentioned term.
And, the specific features of description, structure, material or feature can be in any one or more realities
Apply in example or example and combine in an appropriate manner.
Although embodiments of the invention have been shown and described above it is to be understood that above-mentioned reality
Applying example is exemplary it is impossible to be interpreted as limitation of the present invention, and those of ordinary skill in the art exists
Within the scope of the invention can be to above-described embodiment in the case of principle without departing from the present invention and objective
It is changed, changes, replacing and modification.
Claims (9)
1. a kind of micro optical projection system wave aberration detection system is it is characterised in that include point-diffraction interference
Instrument, micro optical projection system and be in the spherical reflecting system in same light path with point-diffraction interferometer,
Described micro optical projection system is placed between point-diffraction interferometer and spherical reflecting system, and described diffraction is done
Interferometer, micro optical projection system and spherical reflecting system are successively set in same light path from top to bottom.
2. micro optical projection system wave aberration detection system according to claim 1 it is characterised in that
Secondary mirror that described micro optical projection system includes setting gradually from top to bottom along light path, secondary mirror support meanss,
Main supporting plate, primary lens regulating mechanism, primary mirror support device and primary mirror, described secondary mirror is arranged on secondary mirror and props up
On support arrangement, described secondary mirror support meanss are arranged on Main shoe plate upper surface, and described primary mirror adjusts machine
The upper end of structure is arranged on described Main shoe plate lower surface, the lower end of described primary lens regulating mechanism with described
Primary mirror support device connects, and described primary mirror is arranged on primary mirror support device.
3. micro optical projection system wave aberration detection system according to claim 2 it is characterised in that
Described secondary mirror support meanss include secondary mirror support member and secondary mirror support ring, and described secondary mirror is arranged on secondary mirror and props up
The top of support member, the low side of described secondary mirror support member is arranged in described secondary mirror support ring, described secondary mirror
Support ring is arranged on Main shoe plate upper surface.
4. micro optical projection system wave aberration detection system according to claim 2 it is characterised in that
Described primary mirror support device includes primary mirror support ring and primary mirror support part, the upper end of described primary mirror support ring
It is connected with the lower end of described primary lens regulating mechanism, the upper end of described primary mirror support part is arranged on primary mirror support
The lower end of ring, described primary mirror is arranged on the lower end of described primary mirror support part.
5. micro optical projection system wave aberration detection system according to claim 1 it is characterised in that
Described spherical reflecting system includes spherical reflector and for installing and adjusting described spherical reflector
Governor motion.
6. a kind of wave aberration detection method is it is characterised in that comprise the following steps:
Step 1, the micro optical projection system wave aberration detection set up described in claim 1-5 any one are
System, the wave aberration of detection micro optical projection system；
Step 2, the wave aberration of the micro optical projection system being recorded according to step 1, by soft in code v
Set up the x, y, z direction of primary lens regulating mechanism in part and x direction tilt and y direction tilt with micro-
Corresponding relation between contracting optical projection system wave aberration, carries out precision to micro optical projection system and debugs；
Step 3, step 2 is carried out precision debug after micro optical projection system carry out wave aberration detection；
Step 4, set up the mould that spherical reflecting system affects on micro optical projection system wave aberration testing result
Type, and derive the impact to micro optical projection system wave aberration testing result for the spherical reflecting system；
Step 5, according in step 4 derive spherical reflecting system to micro optical projection system wave aberration detect
The impact of result, the wave aberration detecting gained to step 3 is modified, and obtains final micro projection
System wave aberration.
7. wave aberration detection method according to claim 6 is it is characterised in that in step 1,
On three coordinate machine, assembling secondary mirror, secondary mirror support meanss, main supporting plate, primary mirror are adjusted successively from top to bottom
Whole mechanism, primary mirror support device and primary mirror, to set up micro optical projection system.
8. wave aberration detection method according to claim 6 is it is characterised in that in step 1,
By integral translation micro optical projection system and spherical reflecting system, the visual field completing micro optical projection system is fixed
Position, and complete light path adjustment, and then complete the micro optical projection system wave aberration based on point-diffraction interferometer
The establishment of detecting system.
9. wave aberration detection method according to claim 6 is it is characterised in that in step 4,
On the basis of the model set up, calibrated unit is loaded on the spherical reflector in spherical reflecting system
Part face shape, using the light transfer function in code v software, analyzes the sphere in spherical reflecting system
After the component side shape of demarcation is loaded on reflecting mirror, the phase place change in micro optical projection system emergent pupil face, and then
Derive the impact to micro optical projection system wave aberration testing result for the spherical reflecting system.
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