CN106292173A - A kind of selectivity adjusts the adding method of size figure - Google Patents
A kind of selectivity adjusts the adding method of size figure Download PDFInfo
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- CN106292173A CN106292173A CN201610704692.7A CN201610704692A CN106292173A CN 106292173 A CN106292173 A CN 106292173A CN 201610704692 A CN201610704692 A CN 201610704692A CN 106292173 A CN106292173 A CN 106292173A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
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- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The invention provides a kind of selectivity and adjust the adding method of size figure, light mask pattern is modified, including: calculate live width and the spacing of the pre-position, limit adding selectivity adjustment size figure；Adjust size graphics table according to selectivity set in advance the pre-limit adding selectivity adjustment size figure is moved in advance；Check live width and the spacing on the limit of the figure after moving in advance；Judge whether the position, limit of the figure after moving in advance violates set design rule；If it is not, then side-play amount is added according to described form in the limit of the figure after moving in advance, thus obtain targeted graphical；If it is, directly the limit violating design rule after movement is circulated retrogressing, until meeting design rule, thus obtain targeted graphical.After the present invention is to pre-movement, the place of side-play amount cannot be added for because design rule limits, side-play amount can be properly added, thus reduce fracture and the generation of bridge joint.
Description
Technical field
The present invention relates to technical field of semiconductors, be specifically related to a kind of selectivity and adjust the adding method of size figure.
Background technology
In advanced photoetching process, because of reducing of exposure figure size, the optics that photomask pattern is carried out in advance must be faced
Nearly effect correction (Optical Proximity Correction is called for short OPC), makes up by the finite resolving power of optical system
The optical approach effect caused.
Along with characteristic size constantly reduce and figure complexity becomes more and more higher, OPC technology also development with
Continuous produced problem during adapting to pattern imaging.Some key stratum needs by adding selectivity adjustment size
(SSA, selective size adjust) improves process window.After traditional SSA interpolation rule is to pre-interpolation SSA
While carry out live width (line) and the judgement of spacing (space) value, determine whether to add side-play amount (bias), add and limit bar
Part is: if adding bias, then adds after bias line and space value herein and can not be less than design rule, does not adds
Add.
Traditional SSA adding method is by examining line and the space value corresponding to this limit after pre-interpolation SSA
Looking into, the bias meeting design rule after the pre-bias of interpolation adds, otherwise without.This method is violated after pre-interpolation SSA and is set
The place of meter rule is because cannot add bias up, it may occur that ruptures or bridges.
Summary of the invention
In order to overcome problem above, it is desirable to provide a kind of selectivity adjusts the adding method of size, add pre-
After violating the local circulation of design rule after bias, returning certain bias until meeting design rule, reducing tradition adding method
In add or without specifying the process risk that brought of bias.
In order to achieve the above object, the invention provides a kind of selectivity and adjust the adding method of size figure, light is covered
Film pattern is modified, comprising:
Step 01: calculate live width and the spacing of the pre-position, limit adding selectivity adjustment size figure；
Step 02: adjust size graphics table according to selectivity set in advance and the pre-selectivity that adds is adjusted size figure
Limit move in advance；
Step 03: check live width and the spacing on the limit of the figure after moving in advance；
Step 04: judge whether the position, limit of the figure after moving in advance violates set design rule；If
No, then side-play amount is added according to described form in the limit of the figure after moving in advance, thus obtain targeted graphical；If it is, it is straight
Connect execution step 05；
Step 05: the limit violating design rule after movement is circulated retrogressing, until meeting design rule, thus obtains
Targeted graphical.
Preferably, described step 05 specifically includes:
Step 051: the limit of the figure after moving in advance and the limit before not moving accordingly are carried out mathematic interpolation, obtains one
The dimension difference of series；
Step 052: choose the maximum in a series of dimension difference；
Step 053: this maximum is set to the initial value of loopy moving；
Step 054: be circulated retrogressing with the limit that set initial value starts violating design rule after movement, until symbol
Close design rule.
Preferably, described maximum is the maximum of absolute value of dimension difference.
Preferably, in described step 02, described move in advance for by add in advance selectivity adjust size figure both sides to
Both sides are moved respectively.
Preferably, described method is applied to the correction of the OPC to light mask pattern.
The present invention uses the SSA adding method optimized, and after pre-interpolation SSA, cannot add for because design rule limits
Add the place of bias, bias can be properly added, thus reduce fracture and the generation of bridge joint.
Accompanying drawing explanation
Fig. 1 is the schematic flow sheet of the SSA adding method of a preferred embodiment of the present invention
Fig. 2 is the contrast schematic diagram that can not add SSA after existing pre-movement
Fig. 3 be a preferred embodiment of the present invention pre-movement after and add the contrast schematic diagram after side-play amount
Simulation figure and the SSA of a preferred embodiment of the present invention that the SSA adding method that Fig. 4 is conventional obtains add
The contrast schematic diagram of the simulation figure that method obtains
Detailed description of the invention
For making present disclosure more clear understandable, below in conjunction with Figure of description, present disclosure is made into one
Step explanation.Certainly the invention is not limited in this specific embodiment, the general replacement known to those skilled in the art is also
Contain within the scope of the present invention.
Below in conjunction with accompanying drawing 1-4 and specific embodiment, the present invention is described in further detail.It should be noted that, accompanying drawing is equal
Use the form simplified very much, use non-ratio accurately, and only in order to conveniently, clearly to reach to aid in illustrating the present embodiment
Purpose.
Referring to Fig. 1, the selectivity of the present embodiment adjusts the adding method of size figure, may be used for light mask pattern
Carry out OPC correction, including:
Step 01: calculate live width and the spacing of the pre-position, limit adding selectivity adjustment size figure；
Step 02: adjust size graphics table according to selectivity set in advance and the pre-selectivity that adds is adjusted size figure
Limit move in advance；
Concrete, moving in advance can be to be moved respectively to both sides on the both sides adding selectivity adjustment size figure in advance.
Step 03: check live width and the spacing on the limit of the figure after moving in advance；
Step 04: judge whether the position, limit of the figure after moving in advance violates set design rule；If
No, then side-play amount is added according to described form in the limit of the figure after moving in advance, thus obtain targeted graphical；If it is, it is straight
Connect and perform step 05:
Step 05: the limit violating design rule after movement is circulated retrogressing, until meeting design rule, thus obtains
Targeted graphical.
Concrete, this step 05 specifically includes:
Step 051: the limit of the figure after moving in advance and the limit before not moving accordingly are carried out mathematic interpolation, obtains one
The dimension difference of series；
Step 052: choose the maximum in a series of dimension difference；Here, maximum is the absolute value of dimension difference
Maximum；
Step 053: this maximum is set to the initial value of loopy moving；
Step 054: be circulated retrogressing with the limit that set initial value starts violating design rule after movement, until symbol
Close design rule, thus obtain targeted graphical.
Referring to Fig. 2, in conventional SSA adding method, shown in Fig. 2 left side, the spacing on intermediate pattern both sides was originally
A, after using conventional SSA to move side-play amount bias1 and bias2 in advance, the spacing on intermediate pattern both sides becomes b, intermediate pattern
The pre-movement in both sides after, its both sides spacing c respectively and between its upper and lower figure violates design rule, on the right of Fig. 2 shown in,
According to conventional SSA adding method, side-play amount cannot be added in the limit of this violation design rule.
Referring to Fig. 3, in the SSA adding method of the present embodiment, shown in Fig. 3 left side, the spacing on intermediate pattern both sides is former
Coming for a, after using conventional SSA to move side-play amount bias1 and bias2 in advance, the spacing on intermediate pattern both sides becomes b, middle
After the pre-movement in both sides of figure, spacing c between its both sides and its upper and lower figure violates design rule, shown on the right of Fig. 3,
The SSA adding method implemented according to this, with the addition of the most up and down on the both sides of intermediate pattern side-play amount bias3 and
Bias4, the intermediate pattern finally obtained is respectively e with the spacing of upper and lower figure, and the width of intermediate pattern is d, therefore, gram
Take conventional SSA adding method and with the addition of side-play amount, side-play amount bias3 non-pre-shifting at the location-appropriate that cannot add side-play amount
Side-play amount bias2 that side-play amount bias1 specified time dynamic, side-play amount bias4 non-pre-are specified when moving, that is to say the present embodiment
Method conventional method can not add the side-play amount the position of side-play amount added with pre-mobile time the side-play amount not phase added
With.
The simulation figure that the SSA adding method that place, two limits figure referring to Fig. 4, f indication is conventional obtains, g institute
Place, two limits figure referred to is the simulation figure obtained according to the SSA adding method of the present embodiment, g ＞ f, therefore, uses this
The figure that the method for embodiment obtains, it is possible to reduce the generation ruptured and bridge.
Although the present invention with preferred embodiment disclose as above, right described embodiment illustrate only for the purposes of explanation and
, it is not limited to the present invention, if those skilled in the art can make without departing from the spirit and scope of the present invention
Dry change and retouching, the protection domain that the present invention is advocated should be as the criterion with described in claims.
Claims (5)
1. selectivity adjusts an adding method for size figure, is modified light mask pattern, it is characterised in that including:
Step 01: calculate live width and the spacing of the pre-position, limit adding selectivity adjustment size figure；
Step 02: adjust size graphics table according to selectivity set in advance and the pre-selectivity that adds is adjusted the limit of size figure
Move in advance；
Step 03: check live width and the spacing on the limit of the figure after moving in advance；
Step 04: judge whether the position, limit of the figure after moving in advance violates set design rule；If it is not, then
Side-play amount is added according to described form in the limit of the figure after moving in advance, thus obtains targeted graphical；If it is, directly perform
Step 05；
Step 05: the limit violating design rule after movement is circulated retrogressing, until meeting design rule, thus obtains target
Figure.
Method the most according to claim 1, it is characterised in that described step 05 specifically includes:
Step 051: the limit of the figure after moving in advance and the limit before not moving accordingly are carried out mathematic interpolation, obtains a series of
Dimension difference；
Step 052: choose the maximum in a series of dimension difference；
Step 053: this maximum is set to the initial value of loopy moving；
Step 054: being circulated retrogressing with the limit that set initial value starts violating design rule after movement, setting until meeting
Meter rule.
Method the most according to claim 2, it is characterised in that described maximum is the maximum of the absolute value of dimension difference
Value.
Method the most according to claim 1, it is characterised in that in described step 02, described mobile for adding in advance in advance
Selectivity adjusts the both sides of size figure and moves respectively to both sides.
Method the most according to claim 1, it is characterised in that described method is applied to the OPC to light mask pattern and revises.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201610704692.7A CN106292173B (en) | 2016-08-22 | 2016-08-22 | A kind of adding method of selectivity adjustment dimensional graphics |
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| CN201610704692.7A CN106292173B (en) | 2016-08-22 | 2016-08-22 | A kind of adding method of selectivity adjustment dimensional graphics |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107706103A (en) * | 2017-10-20 | 2018-02-16 | 上海华力微电子有限公司 | A kind of solution method of polysilicon layer bridge joint open circuit |
| CN107831636A (en) * | 2017-11-10 | 2018-03-23 | 上海华力微电子有限公司 | Rule-based OPC methods |
| CN110727172A (en) * | 2018-07-17 | 2020-01-24 | 中芯国际集成电路制造(上海)有限公司 | Pattern optimization method and mask manufacturing method |
| CN111752088A (en) * | 2020-06-22 | 2020-10-09 | 上海华力微电子有限公司 | Method for unifying sizes of grid graphs, storage medium and computer equipment |
| CN113591193A (en) * | 2021-08-05 | 2021-11-02 | 广东三维家信息科技有限公司 | Graph position adjusting method and device, electronic equipment and storage medium |
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| CN102237265A (en) * | 2010-05-07 | 2011-11-09 | 海力士半导体有限公司 | Method for controlling pattern uniformity of semiconductor device |
| CN103676463A (en) * | 2013-11-29 | 2014-03-26 | 上海华力微电子有限公司 | Design and OPC (optical proximity correction) optimization method of test patterns |
| CN103941550A (en) * | 2014-03-24 | 2014-07-23 | 上海华力微电子有限公司 | Intellectualized selective target size adjusting method |
| CN103972057A (en) * | 2014-05-27 | 2014-08-06 | 上海华力微电子有限公司 | Formation method for fine feature size graph of semiconductor |
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2016
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| CN102237265A (en) * | 2010-05-07 | 2011-11-09 | 海力士半导体有限公司 | Method for controlling pattern uniformity of semiconductor device |
| CN103676463A (en) * | 2013-11-29 | 2014-03-26 | 上海华力微电子有限公司 | Design and OPC (optical proximity correction) optimization method of test patterns |
| CN103941550A (en) * | 2014-03-24 | 2014-07-23 | 上海华力微电子有限公司 | Intellectualized selective target size adjusting method |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107706103A (en) * | 2017-10-20 | 2018-02-16 | 上海华力微电子有限公司 | A kind of solution method of polysilicon layer bridge joint open circuit |
| CN107706103B (en) * | 2017-10-20 | 2019-11-26 | 上海华力微电子有限公司 | A kind of solution of polysilicon layer bridge joint open circuit |
| CN107831636A (en) * | 2017-11-10 | 2018-03-23 | 上海华力微电子有限公司 | Rule-based OPC methods |
| CN110727172A (en) * | 2018-07-17 | 2020-01-24 | 中芯国际集成电路制造(上海)有限公司 | Pattern optimization method and mask manufacturing method |
| CN110727172B (en) * | 2018-07-17 | 2023-10-27 | 中芯国际集成电路制造(上海)有限公司 | Pattern optimization method and mask manufacturing method |
| CN111752088A (en) * | 2020-06-22 | 2020-10-09 | 上海华力微电子有限公司 | Method for unifying sizes of grid graphs, storage medium and computer equipment |
| CN113591193A (en) * | 2021-08-05 | 2021-11-02 | 广东三维家信息科技有限公司 | Graph position adjusting method and device, electronic equipment and storage medium |
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| CN106292173B (en) | 2019-11-22 |
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Effective date of registration: 20200415 Address after: 201203 1060, room 1, 298 Cambridge East Road, Pudong New Area, Shanghai. Patentee after: SHANGHAI HUALI INTEGRATED CIRCUIT MANUFACTURING Co.,Ltd. Address before: 201210 No. 568, Gauss Road, Zhangjiang hi tech park, Pudong New Area, Shanghai Patentee before: Shanghai Huali Microelectronics Corp. |