CN106283051A - Composite structure and preparation method thereof - Google Patents
Composite structure and preparation method thereof Download PDFInfo
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- CN106283051A CN106283051A CN201610644909.XA CN201610644909A CN106283051A CN 106283051 A CN106283051 A CN 106283051A CN 201610644909 A CN201610644909 A CN 201610644909A CN 106283051 A CN106283051 A CN 106283051A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
- C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
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- Engineering & Computer Science (AREA)
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- Electrochemistry (AREA)
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- Electroplating Methods And Accessories (AREA)
Abstract
The present invention relates to a kind of composite structure and preparation method thereof, composite structure includes plastic basic unit, PVD layers, the first electrodeposited coating, the second electrodeposited coating and the 3rd electrodeposited coating.PVD layers includes the first deposition layering and the second deposition layering, and the first deposition layering fits on plastic basic unit, and the second deposition layering fits in the first deposition and is layered away from the side of plastic basic unit.First electrodeposited coating fits on the second deposition layering side away from the first deposition layering.Second electrodeposited coating fits on first electrodeposited coating side away from the second deposition layering.3rd electrodeposited coating fits on second electrodeposited coating side away from the first electrodeposited coating.Above-mentioned composite structure arranges plastic basic unit, PVD layers, the first electrodeposited coating, the second electrodeposited coating and the 3rd electrodeposited coating by being sequentially overlapped, enable to the adhesion between each Rotating fields higher, adhesive force is more preferable, and when preparing above-mentioned composite structure, toxicity is less.
Description
Technical field
The present invention relates to frosting processing technology field, particularly relate to a kind of composite structure and preparation side thereof
Method.
Background technology
At present, on plastic basis material surface, it is possible not only to increase attractive in appearance by implementing metallized technique, and compensates and mould
The shortcoming of material, gives the character of metal, the unified characteristic combining plastics and metal.
Further, carry out metallized technique on plastic basis material surface and mainly have a two ways: tradition water power depositing process
And physical gas-phase deposition, but, it is respectively adopted both technique for realizing the plastic basis material equal existing defects of metallization.
Wherein, tradition water power plating electroless nickel layer has that adhesive force is strong, adhesion is high, the performance characteristics of good conductivity, it is possible to
Process for plastic surface and a kind of stable ripe pre-treating technology is provided.But, tradition water power plating chemical nickel technique need through
Hydrophilic, be roughened, neutralize, palladium water, dispergation, chemical nickel electroplating work procedure, it is relatively big that it produces water consumption, the chemical agent kind of interpolation
Many, it is unfavorable for utilization and the protection of water resource environment；And, depositing of the plating sexavalence layers of chrome operation being particularly due in this structure
, Cr VI toxicity is big, the most carcinogenic, the drawback that sewage disposal expense is high, and product can not meet European Union WEEE and ROHS
Command request, causes outlet difficulty, it is impossible to the real cleaning realizing plating produces.
Wherein, physical gas-phase deposition is owing to lacking the treatment process to plastic rubber substrate, and the film layer that it is formed is attached
Put forth effort to be insufficient for requirement with adhesion aspect, although this deficiency by adding varnished making up, but can cause
Cost great number is difficult to popularization and application.According to the varnished replacement scheme combined with physical vapour deposition (PVD) film layer, but this
Scheme with high costs, batch production is limited accordingly.
Summary of the invention
Based on this, it is necessary to provide a kind of can toxicity is less and adhesion between each Rotating fields is stronger composite
Structure and preparation method thereof.
A kind of composite structure, including:
Plastic basic unit,
PVD layers, including the first deposition layering and the second deposition layering, described first deposition layering fits in
On described plastic basic unit, described second deposition layering fits in the described first deposition layering side away from described plastic basic unit
On；
First electrodeposited coating, fits on the described second deposition layering side away from described first deposition layering；
Second electrodeposited coating, fits on described first electrodeposited coating side away from described second deposition layering；And
3rd electrodeposited coating, fits on described second electrodeposited coating side away from described first electrodeposited coating.
Wherein in an embodiment, described first deposition is layered as titanium sedimentary.
Wherein in an embodiment, described second deposition is layered as copper metal deposition layer.
Wherein in an embodiment, described first electrodeposited coating is copper electrodeposition of metals.
Wherein in an embodiment, described second electrodeposited coating includes that the multilamellar second stacked gradually electroplates layering.
Wherein in an embodiment, described second plating is layered as light nickel electrodeposited coating, half light nickel electrodeposited coating or pearl nickel
Electrodeposited coating.
Wherein in an embodiment, described 3rd electrodeposited coating is trivalent chromium plating layer.
Wherein in an embodiment, the material of described plastic rubber substrate is acrylonitrile-butadiene-styrene (ABS) plastics, poly-carbon
Acid esters, Merlon, acrylonitrile-butadiene-phenylethene copolymer alloy, nylon, polyphenylene oxide, polybutylene terephthalate
Ester, polyphenylene oxide, polybutylene terephthalate (PBT), the nylon of glass fiber reinforcement, the poly terephthalic acid of glass fiber reinforcement
Any one in the nylon that butanediol ester, the Merlon of glass fiber reinforcement and breeze strengthen.
The preparation method of a kind of composite structure, comprises the steps:
By injection operation, obtain plastic basic unit；
Described plastic basic unit is carried out pretreatment；
Described plastic basic unit carries out physical vapor deposition operation, sequentially forms the first deposition layering and the second deposition point
Layer；
Described second deposition layering carries out electro-coppering operation, obtains the first electrodeposited coating；
Described first electrodeposited coating carries out electronickelling operation, obtains the second electrodeposited coating；
Described second electrodeposited coating carries out electrodeposited chromium operation, obtains the 3rd electrodeposited coating.
Wherein in an embodiment, described pretreatment operation specifically includes following steps:
Described plastic basic unit is carried out hydrocarbon vacuum removal operation；
Described plastic basic unit is carried out baking operation；
Described plastic basic unit is carried out plasma cleaning operation.
Above-mentioned composite structure by be sequentially overlapped arrange plastic basic unit, PVD layers, the first electrodeposited coating, the
Two electrodeposited coatings and the 3rd electrodeposited coating, it is possible to make the adhesion between each Rotating fields higher, adhesive force is more preferable, and prepares above-mentioned multiple
During condensation material structure, toxicity is less.
Accompanying drawing explanation
Fig. 1 is the structural representation of the composite structure of an embodiment of the present invention；
Fig. 2 is the flow chart of steps of the preparation method of the composite structure of an embodiment of the present invention.
Detailed description of the invention
Understandable, below in conjunction with the accompanying drawings to the present invention for enabling the above-mentioned purpose of the present invention, feature and advantage to become apparent from
Detailed description of the invention be described in detail.Elaborate a lot of detail in the following description so that fully understanding this
Bright.But the present invention can implement to be much different from alternate manner described here, and those skilled in the art can be not
Doing similar improvement in the case of running counter to intension of the present invention, therefore the present invention is not limited by following public specific embodiment.
Referring to Fig. 1, composite structure 10 includes: plastic basic unit 100, PVD layers the 200, first electrodeposited coating
300, the second electrodeposited coating 400 and the 3rd electrodeposited coating 500, plastic basic unit 100, PVD layers the 200, first electrodeposited coating 300,
Second electrodeposited coating 400 and the 3rd electrodeposited coating 500 are sequentially overlapped setting.
Referring to Fig. 1, plastic basic unit 100, as the basal layer of composite structure 10, plays the integrally-built work of support
With.Such as, the material of described plastic rubber substrate is alkene nitrile-butadiene-styrene plastics (ABS), Merlon (PC), Merlon
With acrylonitrile-butadiene-phenylethene copolymer alloy (PC/ABS), nylon (PA6/PA66), polyphenylene oxide (PPO), poly-to benzene two
Formic acid butanediol ester (PBT), polyphenylene oxide, polybutylene terephthalate (PBT), the nylon of glass fiber reinforcement, glass fiber reinforcement
Polybutylene terephthalate (PBT), any one in the nylon that strengthens of the Merlon of glass fiber reinforcement and breeze；Again
As, the material of described plastic rubber substrate is alkene nitrile-butadiene-styrene plastics (ABS), alkene nitrile-butadiene-styrene plastics
(ABS) structural strength is higher, not only has excellent combination property, it is easy to machine-shaping, and its surface is prone to corrode and obtain
Binding force of cladding material that must be higher, forms PVD layers 200 when using physical gas-phase deposition on plastic basic unit 100
On, plastic basic unit 100 and the good bonding strength of PVD layers 200, it is not necessary to additionally spray varnished between
As intermediate layer.
Refer to Fig. 1, PVD layers 200 include first deposition layering 210 and second deposition layering 220, first
Deposition layering 210 fits on plastic basic unit 100, and the second deposition layering 220 fits in the first deposition layering 210 away from plastics base
On the side of layer 100, such as, the first deposition layering 210 and the second deposition layering 220 employing physical gas-phase deposition (PVD)
Sequentially form at plastic basic unit 100.Being appreciated that the first deposition layering has two sides, one fits on plastic basic unit, separately
One is the side away from plastic basic unit, fits in the second deposition layering, and remaining embodiment is by that analogy.
In order to improve described first deposition layering and the adhesion of described plastic basic unit, and described first deposition layering with
Adhesion between described second deposition layering, such as, described first deposition is layered as titanium sedimentary, and described titanium sinks
Lamination uses physical gas-phase deposition to be formed on described plastic basic unit；And for example, described second deposition be layered as copper metal sink
Lamination, copper metal deposition layer uses physical gas-phase deposition to be formed in described titanium sedimentary；And for example, described first sinks
The long-pending chromium metal deposition layer that is layered as, described chromium metal deposition layer employing physical gas-phase deposition shape on described plastic basic unit
Become；And for example, described first deposition layering is as the prime coat of bulk metal structure sheaf, and described second deposition layering is as conduction
Layer, for playing the effect of conduction, so, it is possible the adhesion improving described first deposition layering with described plastic basic unit, with
And the adhesion between described first deposition layering and described second deposition layering.
Referring to Fig. 1, the first electrodeposited coating 300 fits in the second deposition layering 220 side away from the first deposition layering 210
On, such as, the first electrodeposited coating 300 uses electroplating technology to be formed in the second deposition layering 220, so, the first electrodeposited coating 300 with
The good bonding strength of the second deposition layering 220.
Such as, described first electrodeposited coating is copper electrodeposition of metals, and described copper electrodeposition of metals passes through electroplating technology described
Formed on copper metal deposition layer.
In order to improve the adhesion of described first coating and described PVD layers, such as, described first further
Electrodeposited coating is nickel electrodeposition of metals and copper electrodeposition of metals composite bed, and described nickel electrodeposition of metals is sunk second by electroplating technology
Being formed on integration layer, e.g., described nickel electrodeposition of metals is formed on described copper metal deposition layer, on described nickel electrodeposition of metals
Continuing plating and form copper electrodeposition of metals, described nickel electrodeposition of metals is combined formation composite bed with described copper electrodeposition of metals, as
This, can improve the combination of described first coating and described PVD layers further by introducing nickel electrodeposition of metals
Power.And for example, described nickel electrodeposition of metals is watt nickel dam, can promote adhesion by watt nickel dam.
Such as, for improving the adhesion of described sedimentary and the first electrodeposited coating further, described first electrodeposited coating is nickel gold
Belonging to electrodeposited coating and copper electrodeposition of metals composite bed, described nickel electrodeposition of metals passes through electroplating technology on described copper metal deposition layer
Being formed, described copper electrodeposition of metals is formed by electroplating technology on described nickel electrodeposition of metals, and both thickness ratio is for 1:(25
～40), i.e. the thickness of nickel electrodeposition of metals and copper electrodeposition of metals is than for 1:25～1:40.
Referring to Fig. 1, the second electrodeposited coating 400 fits in first electrodeposited coating 300 side away from the second deposition layering 220
On, such as, the second electrodeposited coating 400 uses electroplating technology to be formed on the first electrodeposited coating 300, so, and the second electrodeposited coating 400 and
The good bonding strength of one electrodeposited coating 300.
In order to improve thickness and the hardness of described second electrodeposited coating, for improving the overall thick of described composite structure
Degree and integral hardness, such as, described second electrodeposited coating includes that the multilamellar second stacked gradually electroplates layering；And for example, described
Two plating are layered as light nickel electrodeposited coating, half light nickel electrodeposited coating or pearl nickel electroplating layer, in such manner, it is possible to improve described second electrodeposited coating
Thickness and hardness, adhesion and Corrosion Protection, thus improve integral thickness and the entirety of described composite structure
Hardness, adhesion and Corrosion Protection.
And for example, the second plating hierarchical sequence is half light nickel dam, light nickel or Margarita nickel dam, sealing nickel dam or crackle nickel, three
Thickness than for 30:(9～16): (9～16), so, it is possible to improve integral thickness and the entirety of described composite structure
Hardness, adhesion and Corrosion Protection.
In order to improve thickness and the hardness of described second electrodeposited coating further, for improving described composite further
The integral thickness of structure and integral hardness, such as, described second electrodeposited coating includes six layers of described second plating layering, by described
Second deposition layering is initial, is followed successively by light nickel electrodeposited coating, pearl nickel electroplating layer, half light nickel electrodeposited coating, pearl nickel electroplating layer, Margarita
Nickel electrodeposited coating and half light nickel electrodeposited coating, the thickness of six is than for (1～2.5): (1.6～3.5): (0.1～0.15): (2.1～
2.3): (1.8～3.1): (1.6～1.8)；And for example, described second electrodeposited coating includes six layers of described second plating layering, by described
Second deposition layering is initial, is followed successively by light nickel electrodeposited coating, pearl nickel electroplating layer, half light nickel electrodeposited coating, pearl nickel electroplating layer, Margarita
Nickel electrodeposited coating and half light nickel electrodeposited coating, the thickness of six, than for 1.8:3.1:0.12:2.2:2.5:1.7, uses above-mentioned thickness ratio
Each second plating layering, on the one hand can improve thickness and the hardness of described second electrodeposited coating, for improving institute further
State integral thickness and the integral hardness of composite structure；On the other hand, additionally it is possible to optimize and make full use of each second plating
The structure and material characteristic of layering, it is possible to greatly strengthen the knot between each described second plating layering in described second electrodeposited coating
Make a concerted effort.
Referring to Fig. 1, the 3rd electrodeposited coating 500 fits on second electrodeposited coating 400 side away from the first electrodeposited coating 300,
Such as, the 3rd electrodeposited coating 500 uses electroplating technology to be formed on the second electrodeposited coating 400, so, and the 3rd electrodeposited coating 500 and second
The good bonding strength of electrodeposited coating 400.
In order to reduce toxicity when manufacturing described composite structure, and strengthen described 3rd electrodeposited coating and described second electricity
Adhesion between coating, such as, described 3rd electrodeposited coating is trivalent chromium plating layer, and described trivalent chromium plating layer uses physics gas
Phase depositing operation is formed on described second electrodeposited coating, so, it is possible to reduce toxicity when manufacturing described composite structure, and
Strengthen the adhesion between described 3rd electrodeposited coating and described second electrodeposited coating.
Above-mentioned composite structure 10 arranges plastic basic unit 100, PVD layers 200, first by being sequentially overlapped
Electrodeposited coating the 300, second electrodeposited coating 400 and the 3rd electrodeposited coating 500, it is possible to make the adhesion between each Rotating fields higher, attachment
Power is more preferable, and when preparing above-mentioned composite structure 10, toxicity is less.
In order to be more fully understood that above-mentioned composite structure, another example is, the preparation side of a kind of composite structure
Method, for preparing the composite structure described in any of the above-described embodiment.
Refer to Fig. 2, the preparation method of the composite structure of an embodiment, comprise the steps:
S110: by injection operation, obtains plastic basic unit.
S120: described plastic basic unit is carried out pretreatment.
In order to preferably described plastic basic unit be carried out pretreatment, obtain preferable cleaning performance, such as, described pretreatment
Operation specifically includes following steps: described plastic basic unit carries out hydrocarbon vacuum removal operation；Described plastic basic unit is dried
Roasting operation；Described plastic basic unit is carried out plasma cleaning operation, so, by above-mentioned preprocessing process, it is possible to preferably go
Impurity except described plastic basic unit surface, it is simple to carry out follow-up physical vapor deposition operation.
S130: carry out physical vapor deposition operation on described plastic basic unit, sequentially forms the first deposition layering and second
Deposition layering.
S140: carry out electro-coppering operation in described second deposition layering, obtain the first electrodeposited coating.
Such as, after described first electrodeposited coating is by carrying out electro-coppering or electronickelling, again carries out electro-coppering operation and obtain.
S150: carry out electronickelling operation on described first electrodeposited coating, obtain the second electrodeposited coating.
S160: carry out electrodeposited chromium operation on described second electrodeposited coating, obtain the 3rd electrodeposited coating.
In order to illustrate the preparation method of above-mentioned composite structure further, another example is, a kind of compound
The preparation method of material structure, for preparing the composite structure described in any of the above-described embodiment.
Such as, the preparation method of a kind of composite structure, comprise the steps:
S10: injection operation: corresponding plastic material is provided, described plastic material is put into high-performance injection-moulding device, and
And the good suitable injection parameters of debugging, carry out injection operation, obtain plastic basic unit, and when described plastic basic unit is stood one section
Between, standby.
S20: pretreatment operation: be positioned in baking box by described plastic basic unit and toast, the temperature in baking box is
75 DEG C～79 DEG C, 80 DEG C or 81 DEG C～85 DEG C, the baking operation persistent period is 55 minutes～59 minutes, 60 minutes or 61 points
Clock～65 minutes, for removing described plastic basic unit surface or the moisture content of inside, for carrying out subsequent physical vapour deposition behaviour
When making, it is to avoid moisture content evaporates pollution vacuum environment；Then, described plastic basic unit is positioned in plating stove and carries out intermediate frequency ionization
Clean, for removing the impurity such as the dust on described plastic basic unit surface, for lifting and the first deposition layering being subsequently formed
Adhesive force and adhesion, now, complete physical vapour deposition (PVD) operation pretreatment operation；Certainly, after carrying out baking operation, also may be used
To use following operation to carry out Impurity removal operation: described plastic basic unit to be carried out hydrocarbon vacuum removal operation；By described plastics
Basic unit carries out baking operation；Described plastic basic unit is carried out plasma cleaning operation.
S30: physical vapor deposition operation: use physical gas-phase deposition at the surface titanium deposition of described plastic basic unit
Or chromium (Cr), for improving the adhesion of entirety, connects as prime coat as the first deposition layering, the i.e. first deposition layering (Ti)
, use copper deposited by physical vapour deposition (PVD) (Cu) as the second deposition layering on the surface of described first deposition layering, connect
, carry out vacuum packaging and preserve, be used for avoiding air oxidation.
Such as, described first deposition layering uses titanium (Ti) to deposit, and described second deposition layering uses copper (Cu) to enter
Row deposition, carries out the technique ginseng that the physical vapour deposition (PVD) (PVD) of described first deposition layering and described second deposition layering operates
Number is shown in Table 1.
Table 1
By using above-mentioned technological parameter to carry out described physical gas-phase deposition, it is possible to obtain the institute that performance is more excellent
Stating the first deposition layering and described second deposition layering, e.g., adhesion and adhesive force between each layer are preferable.
It is pointed out that and find under study for action, as between each parameter of physical gas-phase deposition, there is relatedness,
Change between the most each parameter has vital impact to the performance of physical deposition layering, and such as, above-mentioned each parameter is PVD
The preferable parameter of technique, it is possible to deposition obtains the described first deposition layering of better performances and described second deposition layering.
Such as, the choosing method of above-mentioned parameter specifically includes following steps:
A, choose multiple default PVD parameter area；
B, multiple described default PVD parameter areas are carried out positive quadraturing design test, specifically setting of described positive quadraturing design test
Meter information is shown in Table 2, and wherein, table 2 lists six factors, the orthogonal test of three levels, totally 18 groups of tests.
Table 2
C, according to positive quadraturing design test result, wherein, described positive quadraturing design test the results are shown in Table 3, table 4 and table 5, and profit
Use SPSS data analysis software, search out the expection PVD parameter area meeting PVD, e.g., search out and meet PVD replacement water
The expection PVD parameter area of plating posttreatment technique, obtains each expection PVD parameter area in table 1.
Table 3
Table 4
Table 5
By using the choosing method of above-mentioned parameter, and combine SPSS data analysis software, obtain intended physical vapor
The technological parameter that deposition (PVD) operates, refers to table 1, when each parameter in table 1 is applied to physical gas-phase deposition, and energy
Enough depositions obtain the described first deposition layering of better performances and described second deposition layering.
D, electroplating operations；
Wherein, the described plastic basic unit of described first deposition layering and described second deposition layering is had to activate to deposition
Process, then, carry out copper facing operation, or after carrying out copper facing or nickel plating, then carry out copper facing operation, form the first electrodeposited coating, it
After, it is carried out continuously repeatedly nickel plating operation, e.g., described nickel plating operation includes light nickel electroplating operations, half light nickel electroplating operations or Margarita
Nickel electroplating operations, forms the second electrodeposited coating, finally, carries out trivalent chromium plating operation, form the 3rd electrodeposited coating.
The toxicity of the preparation method of above-mentioned composite structure is less, and uses the preparation method of above-mentioned composite structure
The composite structure prepared, adhesion and adhesive force between each Rotating fields are good.
Each technical characteristic of embodiment described above can combine arbitrarily, for making description succinct, not to above-mentioned reality
The each piece of all possible combination of technical characteristic executed in example is all described, but, as long as the combination of these technical characteristics is not deposited
In contradiction, all it is considered to be the scope that this specification is recorded.
The above embodiment only have expressed the several embodiments of the present invention, and it describes more concrete and detailed, but
Therefore the restriction to the scope of the claims of the present invention can not be interpreted as.It should be pointed out that, for the ordinary skill people of this area
For Yuan, without departing from the inventive concept of the premise, it is also possible to make some deformation and improvement, these broadly fall into the present invention's
Protection domain.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (10)
1. a composite structure, it is characterised in that including:
Plastic basic unit,
PVD layers, including the first deposition layering and the second deposition layering, described first deposition layering fits in described
On plastic basic unit, described second deposition layering fits on the described first deposition layering side away from described plastic basic unit；
First electrodeposited coating, fits on the described second deposition layering side away from described first deposition layering；
Second electrodeposited coating, fits on described first electrodeposited coating side away from described second deposition layering；And
3rd electrodeposited coating, fits on described second electrodeposited coating side away from described first electrodeposited coating.
Composite structure the most according to claim 1, it is characterised in that described first deposition is layered as titanium deposition
Layer.
Composite structure the most according to claim 1, it is characterised in that described second deposition is layered as copper metal deposit
Layer.
Composite structure the most according to claim 1, it is characterised in that described first electrodeposited coating is copper metal plating
Layer.
Composite structure the most according to claim 1, it is characterised in that described second electrodeposited coating includes stacking gradually
Multilamellar second electroplates layering.
Composite structure the most according to claim 5, it is characterised in that described second plating is layered as the plating of light nickel
Layer, half light nickel electrodeposited coating or pearl nickel electroplating layer.
Composite structure the most according to claim 1, it is characterised in that described 3rd electrodeposited coating is trivalent chromium plating
Layer.
Composite structure the most according to claim 1, it is characterised in that the material of described plastic rubber substrate be acrylonitrile-
Butadiene-styrene plastics, Merlon, Merlon, acrylonitrile-butadiene-phenylethene copolymer alloy, nylon, polyphenyl
Ether, polybutylene terephthalate (PBT), polyphenylene oxide, polybutylene terephthalate (PBT), the nylon of glass fiber reinforcement, glass fibers
Any one in the nylon that polybutylene terephthalate (PBT) that dimension strengthens, the Merlon of glass fiber reinforcement and breeze strengthen
Kind.
9. the preparation method of a composite structure, it is characterised in that comprise the steps:
By injection operation, obtain plastic basic unit；
Described plastic basic unit is carried out pretreatment；
Described plastic basic unit carries out physical vapor deposition operation, sequentially forms the first deposition layering and the second deposition layering；
Described second deposition layering carries out electro-coppering operation, obtains the first electrodeposited coating；
Described first electrodeposited coating carries out electronickelling operation, obtains the second electrodeposited coating；
Described second electrodeposited coating carries out electrodeposited chromium operation, obtains the 3rd electrodeposited coating.
The preparation method of composite structure the most according to claim 9, it is characterised in that described pretreatment operation has
Body comprises the steps:
Described plastic basic unit is carried out hydrocarbon vacuum removal operation；
Described plastic basic unit is carried out baking operation；
Described plastic basic unit is carried out plasma cleaning operation.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610644909.XA CN106283051B (en) | 2016-08-08 | 2016-08-08 | Composite structure and preparation method thereof |
| DE102016120411.0A DE102016120411A1 (en) | 2016-08-08 | 2016-10-26 | Composite article and method for its production |
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| CN201610644909.XA CN106283051B (en) | 2016-08-08 | 2016-08-08 | Composite structure and preparation method thereof |
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| CN106283051A true CN106283051A (en) | 2017-01-04 |
| CN106283051B CN106283051B (en) | 2019-04-19 |
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| DE (1) | DE102016120411A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107557830A (en) * | 2017-09-11 | 2018-01-09 | 江阴市羽项汽车饰件有限公司 | A kind of double-colored electroplating technology |
| CN109576748A (en) * | 2018-12-27 | 2019-04-05 | 惠州建邦精密塑胶有限公司 | Wet process electroplated metal layer lacquer spraying technique |
| WO2023178825A1 (en) * | 2022-03-25 | 2023-09-28 | 江阴纳力新材料科技有限公司 | Copper brush plating process for plastic film |
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|---|---|---|---|---|
| CN102127764A (en) * | 2011-01-28 | 2011-07-20 | 厦门建霖工业有限公司 | Method for implementing semi-dry plating on surface of plastic substrate |
| CN102152541A (en) * | 2010-12-10 | 2011-08-17 | 厦门建霖工业有限公司 | Method for preparing composite interlayer coating film on surface of engineering plastics |
| CN103818047A (en) * | 2014-02-28 | 2014-05-28 | 厦门建霖工业有限公司 | Surface coating structure of engineering plastic and preparation method thereof |
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2016
- 2016-08-08 CN CN201610644909.XA patent/CN106283051B/en active Active
- 2016-10-26 DE DE102016120411.0A patent/DE102016120411A1/en not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102152541A (en) * | 2010-12-10 | 2011-08-17 | 厦门建霖工业有限公司 | Method for preparing composite interlayer coating film on surface of engineering plastics |
| CN102127764A (en) * | 2011-01-28 | 2011-07-20 | 厦门建霖工业有限公司 | Method for implementing semi-dry plating on surface of plastic substrate |
| CN103818047A (en) * | 2014-02-28 | 2014-05-28 | 厦门建霖工业有限公司 | Surface coating structure of engineering plastic and preparation method thereof |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107557830A (en) * | 2017-09-11 | 2018-01-09 | 江阴市羽项汽车饰件有限公司 | A kind of double-colored electroplating technology |
| CN109576748A (en) * | 2018-12-27 | 2019-04-05 | 惠州建邦精密塑胶有限公司 | Wet process electroplated metal layer lacquer spraying technique |
| WO2023178825A1 (en) * | 2022-03-25 | 2023-09-28 | 江阴纳力新材料科技有限公司 | Copper brush plating process for plastic film |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106283051B (en) | 2019-04-19 |
| DE102016120411A1 (en) | 2018-02-08 |
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