CN106221587A - A kind of alumina base chemical mechanical polishing liquid - Google Patents

A kind of alumina base chemical mechanical polishing liquid Download PDF

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Publication number
CN106221587A
CN106221587A CN201610705555.5A CN201610705555A CN106221587A CN 106221587 A CN106221587 A CN 106221587A CN 201610705555 A CN201610705555 A CN 201610705555A CN 106221587 A CN106221587 A CN 106221587A
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parts
sodium
acid
mass fraction
alumina base
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CN201610705555.5A
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CN106221587B (en
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蒲昌权
白韵竹
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SHENZHEN PARDANG TECHNOLOGY Co.,Ltd.
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Guang'an Power Electronic Technology Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents

Abstract

nullThe present invention relates to a kind of alumina base chemical mechanical polishing liquid，It is made up of the component of following mass fraction: alumina powder 16～20 parts、Decanoyl/octanoyl glycerides 18～22 parts、Tert-butyl group cellosolve 14～18 parts、Diethanolamine of fat acyl 12～16 parts、Alcohol ether mono sulfosuccinates 18～22 parts、Butyl carbitol 14～18 parts、Sodium polyphosphate 12～16 parts、Calcium sorbate 18～22 parts、Glycerol decanoate 14～18 parts、Oxalic acid 12～16 parts、Mercapto benzothiazole sodium 18～22 parts、Diethylene triamine pentamethylene phosphonic 14～18 parts、Nitrodracylic acid 14～18 parts、Sodium tetraborate decahydrate 12～16 parts、Silicon oxide powder 18～22 parts、Alpha-silicon nitride powders 14～18 parts、Bravo 12～16 parts、Triethanolamine 18～22 parts、Xanthan gum 14～18 parts、Imidazolidinyl urea 12～16 parts、Spermol 18～22 parts、Diethylene glycol dibenzoate 14～18 parts、TDE 12～16 parts、Water 10000～20000 parts.Product in the present invention has preferable polishing effect.

Description

A kind of alumina base chemical mechanical polishing liquid
Technical field
The present invention relates to a kind of alumina base chemical mechanical polishing liquid, belong to polishing agent technical field.
Background technology
Polishing fluid is a kind of without any sulfur, phosphorus, the water solublity polishing agent of chlorine additive, and polishing fluid has good deoiling Dirt, antirust, performance of cleaning and add lustre to, and metallic article can be made to exceed original gloss.Stable performance, nontoxic, to environment without dirt The effects such as dye.The effects such as these properties of product are stable, nontoxic, environmentally safe, light liquid using method: include ratchet spanner, open Mouth spanner, batch nozzle, box spanner, die nut, screwdriver etc., the metal product such as terne metal, kirsite after grinding, Re-using polishing agent and coordinate vibro-grinding light polishing machine, drum-type grinds light formula machine and is polished；1 polishing agent injected volume be (according to The size of different product, the size of light polishing machine and the product brightness requirement of each company carry out appropriately configured), 2: polishing time: State according to product is determined.3, once and dry by clean water after having polished.
Summary of the invention
It is an object of the invention to provide a kind of alumina base chemical mechanical polishing liquid, in order to alumina base is better achieved The function of chemical mechanical polishing liquid.
To achieve these goals, technical scheme is as follows.
A kind of alumina base chemical mechanical polishing liquid, is made up of the component of following mass fraction:, alumina powder 16～20 Part, decanoyl/octanoyl glycerides 18～22 parts, tert-butyl group cellosolve 14～18 parts, diethanolamine of fat acyl 12～16 parts, alcohol ether sulfo group Monomester succinate disodium salt 18～22 parts, butyl carbitol 14～18 parts, sodium polyphosphate 12～16 parts, calcium sorbate 18～22 Part, glycerol decanoate 14～18 parts, oxalic acid 12～16 parts, mercapto benzothiazole sodium 18～22 parts, diethylenetriamine five methene phosphine Acid 14～18 parts, Nitrodracylic acid 14～18 parts, sodium tetraborate decahydrate 12～16 parts, silicon oxide powder 18～22 parts, nitridation Si powder 14～18 parts, Bravo 12～16 parts, triethanolamine 18～22 parts, xanthan gum 14～18 parts, imidazolidinyl urea 12～ 16 parts, spermol 18～22 parts, diethylene glycol dibenzoate 14～18 parts, TDE 12～16 parts, water 10000～ 20000 parts.
Further, above-mentioned alumina base chemical mechanical polishing liquid, it is made up of the component of following mass fraction: alumina powder 16 parts of end, decanoyl/octanoyl glycerides 18 parts, tert-butyl group cellosolve 14 parts, diethanolamine of fat acyl 12 parts, alcohol ether 2-Sulfosuccinic acid list Ester disodium salt 18 parts, butyl carbitol 14 parts, sodium polyphosphate 12 parts, calcium sorbate 18 parts, glycerol decanoate 14 parts, oxalic acid 12 Part, 18 parts of mercapto benzothiazole sodium, diethylene triamine pentamethylene phosphonic 14 parts, Nitrodracylic acid 14 parts, sodium tetraborate decahydrate 12 parts, silicon oxide powder 18 parts, alpha-silicon nitride powders 14 parts, Bravo 12 parts, triethanolamine 18 parts, xanthan gum 14 parts, imidazolidine Base urea 12 parts, spermol 18 parts, diethylene glycol dibenzoate 14 parts, TDE 12 parts, 10000 parts of water.
Further, above-mentioned alumina base chemical mechanical polishing liquid, it is made up of the component of following mass fraction: alumina powder 18 parts of end, decanoyl/octanoyl glycerides 20 parts, tert-butyl group cellosolve 16 parts, diethanolamine of fat acyl 14 parts, alcohol ether 2-Sulfosuccinic acid list Ester disodium salt 20 parts, butyl carbitol 16 parts, sodium polyphosphate 14 parts, calcium sorbate 20 parts, glycerol decanoate 16 parts, oxalic acid 14 Part, 20 parts of mercapto benzothiazole sodium, diethylene triamine pentamethylene phosphonic 16 parts, Nitrodracylic acid 16 parts, sodium tetraborate decahydrate 14 parts, silicon oxide powder 20 parts, alpha-silicon nitride powders 16 parts, Bravo 14 parts, triethanolamine 20 parts, xanthan gum 16 parts, imidazolidine Base urea 14 parts, spermol 20 parts, diethylene glycol dibenzoate 16 parts, TDE 14 parts, 15000 parts of water.
Further, above-mentioned alumina base chemical mechanical polishing liquid, it is made up of the component of following mass fraction: alumina powder 20 parts of end, decanoyl/octanoyl glycerides 22 parts, tert-butyl group cellosolve 18 parts, diethanolamine of fat acyl 16 parts, alcohol ether 2-Sulfosuccinic acid list Ester disodium salt 22 parts, butyl carbitol 18 parts, sodium polyphosphate 16 parts, calcium sorbate 22 parts, glycerol decanoate 18 parts, oxalic acid 16 Part, 22 parts of mercapto benzothiazole sodium, diethylene triamine pentamethylene phosphonic 18 parts, Nitrodracylic acid 18 parts, sodium tetraborate decahydrate 16 parts, silicon oxide powder 22 parts, alpha-silicon nitride powders 18 parts, Bravo 16 parts, triethanolamine 22 parts, xanthan gum 18 parts, imidazolidine Base urea 16 parts, spermol 22 parts, diethylene glycol dibenzoate 18 parts, TDE 16 parts, 20000 parts of water.
Further, above-mentioned alumina base chemical mechanical polishing liquid preparation method step is as follows:
(1) by the alumina powder of described mass fraction, decanoyl/octanoyl glycerides, tert-butyl group cellosolve, fatty acyl diethanol Amine, alcohol ether mono sulfosuccinates, diethylene triamine pentamethylene phosphonic, Nitrodracylic acid, sodium tetraborate decahydrate, oxygen SiClx powder, alpha-silicon nitride powders, diethylene glycol dibenzoate, TDE add in the water of above-mentioned mass fraction, ultrasonic High speed dispersion, ultrasonic frequency is 20～40KHz, rate of dispersion 5000～5400r/min, and jitter time is 30～60min；
(2) add the butyl carbitol of described mass fraction, sodium polyphosphate, calcium sorbate, glycerol decanoate, oxalic acid, Mercapto benzothiazole sodium, ultrasonic high speed dispersion, ultrasonic frequency is 20～35KHz, rate of dispersion 4800～5200r/min, point The scattered time is 30～50min；
(3) Bravo of described mass fraction, triethanolamine, xanthan gum, imidazolidinyl urea, spermol are added, ultrasonic height Speed dispersion, ultrasonic frequency is 20～30KHz, rate of dispersion 4600～4800r/min, and jitter time is 20～40min；Mixing This product is prepared after uniformly.
This beneficial effect of the invention is: this alumina base chemical mechanical polishing liquid process of preparing is simple, the present invention In product there is preferable polishing effect, and there is preferable sterilizing function, its performance is the most excellent. to human injury Little.
Detailed description of the invention
Below in conjunction with embodiment, the detailed description of the invention of the present invention is described, in order to be better understood from the present invention.
Embodiment 1
Alumina base chemical mechanical polishing liquid in the present embodiment, is made up of the component of following mass fraction: alumina powder 16 parts of end, decanoyl/octanoyl glycerides 18 parts, tert-butyl group cellosolve 14 parts, diethanolamine of fat acyl 12 parts, alcohol ether 2-Sulfosuccinic acid list Ester disodium salt 18 parts, butyl carbitol 14 parts, sodium polyphosphate 12 parts, calcium sorbate 18 parts, glycerol decanoate 14 parts, oxalic acid 12 Part, 18 parts of mercapto benzothiazole sodium, diethylene triamine pentamethylene phosphonic 14 parts, Nitrodracylic acid 14 parts, sodium tetraborate decahydrate 12 parts, silicon oxide powder 18 parts, alpha-silicon nitride powders 14 parts, Bravo 12 parts, triethanolamine 18 parts, xanthan gum 14 parts, imidazolidine Base urea 12 parts, spermol 18 parts, diethylene glycol dibenzoate 14 parts, TDE 12 parts, 10000 parts of water.
Above-mentioned alumina base chemical mechanical polishing liquid preparation method step is as follows:
(1) by the alumina powder of described mass fraction, decanoyl/octanoyl glycerides, tert-butyl group cellosolve, fatty acyl diethanol Amine, alcohol ether mono sulfosuccinates, diethylene triamine pentamethylene phosphonic, Nitrodracylic acid, sodium tetraborate decahydrate, oxygen SiClx powder, alpha-silicon nitride powders, diethylene glycol dibenzoate, TDE add in the water of above-mentioned mass fraction, ultrasonic High speed dispersion, ultrasonic frequency is 20kHz, rate of dispersion 5400r/min, and jitter time is 60min；
(2) add the butyl carbitol of described mass fraction, sodium polyphosphate, calcium sorbate, glycerol decanoate, oxalic acid, Mercapto benzothiazole sodium, ultrasonic high speed dispersion, ultrasonic frequency is 20kHz, rate of dispersion 5200r/min, and jitter time is 50min；
(3) Bravo of described mass fraction, triethanolamine, xanthan gum, imidazolidinyl urea, spermol are added, ultrasonic height Speed dispersion, ultrasonic frequency is 20kHz, rate of dispersion 4800r/min, and jitter time is 40min；This is prepared after mix homogeneously Product.
Embodiment 2
Alumina base chemical mechanical polishing liquid in the present embodiment, is made up of the component of following mass fraction: alumina powder 18 parts of end, decanoyl/octanoyl glycerides 20 parts, tert-butyl group cellosolve 16 parts, diethanolamine of fat acyl 14 parts, alcohol ether 2-Sulfosuccinic acid list Ester disodium salt 20 parts, butyl carbitol 16 parts, sodium polyphosphate 14 parts, calcium sorbate 20 parts, glycerol decanoate 16 parts, oxalic acid 14 Part, 20 parts of mercapto benzothiazole sodium, diethylene triamine pentamethylene phosphonic 16 parts, Nitrodracylic acid 16 parts, sodium tetraborate decahydrate 14 parts, silicon oxide powder 20 parts, alpha-silicon nitride powders 16 parts, Bravo 14 parts, triethanolamine 20 parts, xanthan gum 16 parts, imidazolidine Base urea 14 parts, spermol 20 parts, diethylene glycol dibenzoate 16 parts, TDE 14 parts, 15000 parts of water.
Above-mentioned alumina base chemical mechanical polishing liquid preparation method step is as follows:
(1) by the alumina powder of described mass fraction, decanoyl/octanoyl glycerides, tert-butyl group cellosolve, fatty acyl diethanol Amine, alcohol ether mono sulfosuccinates, diethylene triamine pentamethylene phosphonic, Nitrodracylic acid, sodium tetraborate decahydrate, oxygen SiClx powder, alpha-silicon nitride powders, diethylene glycol dibenzoate, TDE add in the water of above-mentioned mass fraction, ultrasonic High speed dispersion, ultrasonic frequency is 30kHz, rate of dispersion 5200r/min, and jitter time is 45min；
(2) add the butyl carbitol of described mass fraction, sodium polyphosphate, calcium sorbate, glycerol decanoate, oxalic acid, Mercapto benzothiazole sodium, ultrasonic high speed dispersion, ultrasonic frequency is 27kHz, rate of dispersion 5000r/min, and jitter time is 40min；
(3) Bravo of described mass fraction, triethanolamine, xanthan gum, imidazolidinyl urea, spermol are added, ultrasonic height Speed dispersion, ultrasonic frequency is 25kHz, rate of dispersion 4700r/min, and jitter time is 30min；This is prepared after mix homogeneously Product.
Embodiment 3
Alumina base chemical mechanical polishing liquid in the present embodiment, is made up of the component of following mass fraction: alumina powder 20 parts of end, decanoyl/octanoyl glycerides 22 parts, tert-butyl group cellosolve 18 parts, diethanolamine of fat acyl 16 parts, alcohol ether 2-Sulfosuccinic acid list Ester disodium salt 22 parts, butyl carbitol 18 parts, sodium polyphosphate 16 parts, calcium sorbate 22 parts, glycerol decanoate 18 parts, oxalic acid 16 Part, 22 parts of mercapto benzothiazole sodium, diethylene triamine pentamethylene phosphonic 18 parts, Nitrodracylic acid 18 parts, sodium tetraborate decahydrate 16 parts, silicon oxide powder 22 parts, alpha-silicon nitride powders 18 parts, Bravo 16 parts, triethanolamine 22 parts, xanthan gum 18 parts, imidazolidine Base urea 16 parts, spermol 22 parts, diethylene glycol dibenzoate 18 parts, TDE 16 parts, 20000 parts of water.
Above-mentioned alumina base chemical mechanical polishing liquid preparation method step is as follows:
(1) by the alumina powder of described mass fraction, decanoyl/octanoyl glycerides, tert-butyl group cellosolve, fatty acyl diethanol Amine, alcohol ether mono sulfosuccinates, diethylene triamine pentamethylene phosphonic, Nitrodracylic acid, sodium tetraborate decahydrate, oxygen SiClx powder, alpha-silicon nitride powders, diethylene glycol dibenzoate, TDE add in the water of above-mentioned mass fraction, ultrasonic High speed dispersion, ultrasonic frequency is 40kHz, rate of dispersion 5000r/min, and jitter time is 30min；
(2) add the butyl carbitol of described mass fraction, sodium polyphosphate, calcium sorbate, glycerol decanoate, oxalic acid, Mercapto benzothiazole sodium, ultrasonic high speed dispersion, ultrasonic frequency is 35kHz, rate of dispersion 4800r/min, and jitter time is 30min；
(3) Bravo of described mass fraction, triethanolamine, xanthan gum, imidazolidinyl urea, spermol are added, ultrasonic height Speed dispersion, ultrasonic frequency is 30kHz, rate of dispersion 4600r/min, and jitter time is 20min；This is prepared after mix homogeneously Product.
Above-described embodiment sample is carried out Contrast on effect, and comparative sample is certain commercially available polishing fluid, comparing result such as table 1 institute Show.
Table 1 embodiment of the present invention product Contrast on effect
Wherein, polishing effect is given a mark: 4 represent, 3 represent preferably, and 2 represent qualified, and 1 represents poor.
Visible, in the present invention product, has preferable polishing effect, and has preferable sterilizing function, and its performance is also More excellent. little to human injury.
The above is the preferred embodiment of the present invention, it is noted that for those skilled in the art For, under the premise without departing from the principles of the invention, it is also possible to make some improvements and modifications, these improvements and modifications are also considered as Protection scope of the present invention.

Claims (5)

1. an alumina base chemical mechanical polishing liquid, it is characterised in that: be made up of the component of following mass fraction:, aluminium oxide Powder 16～20 parts, decanoyl/octanoyl glycerides 18～22 parts, tert-butyl group cellosolve 14～18 parts, diethanolamine of fat acyl 12～16 Part, alcohol ether mono sulfosuccinates 18～22 parts, butyl carbitol 14～18 parts, sodium polyphosphate 12～16 parts, mountain Pears acid calcium 18～22 parts, glycerol decanoate 14～18 parts, oxalic acid 12～16 parts, mercapto benzothiazole sodium 18～22 parts, divinyl Triamine five methylenephosphonic acid 14～18 parts, Nitrodracylic acid 14～18 parts, sodium tetraborate decahydrate 12～16 parts, silicon oxide powder 18 ～22 parts, alpha-silicon nitride powders 14～18 parts, Bravo 12～16 parts, triethanolamine 18～22 parts, xanthan gum 14～18 parts, imidazoles Ureine 12～16 parts, spermol 18～22 parts, diethylene glycol dibenzoate 14～18 parts, TDE 12～16 parts, Water 10000～20000 parts.
Alumina base chemical mechanical polishing liquid the most according to claim 1, it is characterised in that: described alumina base chemistry machine Tool polishing fluid is made up of the component of following mass fraction: alumina powder 16 parts, decanoyl/octanoyl glycerides 18 parts, tert-butyl group cellosolve 14 parts, diethanolamine of fat acyl 12 parts, alcohol ether mono sulfosuccinates 18 parts, butyl carbitol 14 parts, polyphosphoric acids 12 parts of sodium, calcium sorbate 18 parts, glycerol decanoate 14 parts, oxalic acid 12 parts, 18 parts of mercapto benzothiazole sodium, diethylenetriamine five first Fork phosphonic acids 14 parts, Nitrodracylic acid 14 parts, sodium tetraborate decahydrate 12 parts, silicon oxide powder 18 parts, alpha-silicon nitride powders 14 parts, hundred Clear 12 parts of bacterium, triethanolamine 18 parts, xanthan gum 14 parts, imidazolidinyl urea 12 parts, spermol 18 parts, diethylene glycol dibenzoate 14 Part, TDE 12 parts, 10000 parts of water.
3. according to the alumina base chemical mechanical polishing liquid described in claim 1 to 2, it is characterised in that: described alumina base Learn machine polishing liquor to be made up of the component of following mass fraction: alumina powder 18 parts, decanoyl/octanoyl glycerides 20 parts, the tert-butyl group are molten Fine agent 16 parts, diethanolamine of fat acyl 14 parts, alcohol ether mono sulfosuccinates 20 parts, butyl carbitol 16 parts, poly Sodium phosphate 14 parts, calcium sorbate 20 parts, glycerol decanoate 16 parts, oxalic acid 14 parts, 20 parts of mercapto benzothiazole sodium, diethylenetriamine Five methylenephosphonic acids 16 parts, Nitrodracylic acid 16 parts, sodium tetraborate decahydrate 14 parts, silicon oxide powder 20 parts, alpha-silicon nitride powders 16 Part, Bravo 14 parts, triethanolamine 20 parts, xanthan gum 16 parts, imidazolidinyl urea 14 parts, spermol 20 parts, diethylene glycol hexichol first Acid esters 16 parts, TDE 14 parts, 15000 parts of water.
4. according to the alumina base chemical mechanical polishing liquid described in claims 1 to 3, it is characterised in that: described alumina base Learn machine polishing liquor to be made up of the component of following mass fraction: alumina powder 20 parts, decanoyl/octanoyl glycerides 22 parts, the tert-butyl group are molten Fine agent 18 parts, diethanolamine of fat acyl 16 parts, alcohol ether mono sulfosuccinates 22 parts, butyl carbitol 18 parts, poly Sodium phosphate 16 parts, calcium sorbate 22 parts, glycerol decanoate 18 parts, oxalic acid 16 parts, 22 parts of mercapto benzothiazole sodium, diethylenetriamine Five methylenephosphonic acids 18 parts, Nitrodracylic acid 18 parts, sodium tetraborate decahydrate 16 parts, silicon oxide powder 22 parts, alpha-silicon nitride powders 18 Part, Bravo 16 parts, triethanolamine 22 parts, xanthan gum 18 parts, imidazolidinyl urea 16 parts, spermol 22 parts, diethylene glycol hexichol first Acid esters 18 parts, TDE 16 parts, 20000 parts of water.
Alumina base chemical mechanical polishing liquid the most according to claim 1, it is characterised in that: described alumina base chemistry machine Tool polishing fluid preparation method step is as follows:
(1) by the alumina powder of described mass fraction, decanoyl/octanoyl glycerides, tert-butyl group cellosolve, diethanolamine of fat acyl, alcohol Ether sulfosuccinic acid monoester disodium salt, diethylene triamine pentamethylene phosphonic, Nitrodracylic acid, sodium tetraborate decahydrate, silicon oxide Powder, alpha-silicon nitride powders, diethylene glycol dibenzoate, TDE add in the water of above-mentioned mass fraction, ultrasonic high speed Dispersion, ultrasonic frequency is 20～40KHz, rate of dispersion 5000～5400r/min, and jitter time is 30～60min；
(2) butyl carbitol of described mass fraction, sodium polyphosphate, calcium sorbate, glycerol decanoate, oxalic acid, sulfydryl are added Benzothiazole sodium, ultrasonic high speed dispersion, ultrasonic frequency is 20～35KHz, and rate of dispersion 4800～5200r/min, during dispersion Between be 30～50min；
(3) adding the Bravo of described mass fraction, triethanolamine, xanthan gum, imidazolidinyl urea, spermol, ultrasonic high speed is divided Dissipating, ultrasonic frequency is 20～30KHz, rate of dispersion 4600～4800r/min, and jitter time is 20～40min；Mix homogeneously Rear prepared this product.
CN201610705555.5A 2016-08-23 2016-08-23 A kind of alumina base chemical mechanical polishing liquid Active CN106221587B (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6150274A (en) * 1999-05-03 2000-11-21 Winbond Electronics Corp. Method of enhancing CMP removal rate of polymer-like material and improving planarization in integrated circuit structure
CN1560161A (en) * 2004-03-01 2005-01-05 长沙矿冶研究院 Water-based nano diamond polishing solution and preparation method thereof
CN101452873A (en) * 2007-12-06 2009-06-10 上海华虹Nec电子有限公司 Shallow trench isolation process
CN102337084A (en) * 2011-07-25 2012-02-01 郑州磨料磨具磨削研究所 Grinding fluid for processing LED (light-emitting diode) substrate and preparation method thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6150274A (en) * 1999-05-03 2000-11-21 Winbond Electronics Corp. Method of enhancing CMP removal rate of polymer-like material and improving planarization in integrated circuit structure
CN1560161A (en) * 2004-03-01 2005-01-05 长沙矿冶研究院 Water-based nano diamond polishing solution and preparation method thereof
CN101452873A (en) * 2007-12-06 2009-06-10 上海华虹Nec电子有限公司 Shallow trench isolation process
CN102337084A (en) * 2011-07-25 2012-02-01 郑州磨料磨具磨削研究所 Grinding fluid for processing LED (light-emitting diode) substrate and preparation method thereof

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