CN106191784B - Crucible for vapor plating - Google Patents
Crucible for vapor plating Download PDFInfo
- Publication number
- CN106191784B CN106191784B CN201610586769.5A CN201610586769A CN106191784B CN 106191784 B CN106191784 B CN 106191784B CN 201610586769 A CN201610586769 A CN 201610586769A CN 106191784 B CN106191784 B CN 106191784B
- Authority
- CN
- China
- Prior art keywords
- heating chamber
- crucible
- vapor plating
- compacting component
- head cover
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention provides a kind of crucible for vapor plating, including heating chamber, the head cover that is arranged at the top of the heating chamber and material cleaning plant, the liftable top being arranged in heating chamber of the material cleaning plant, and can pass through the evaporation material that whereabouts is compacted in heating chamber.Crucible for vapor plating provided by the invention, can be out of control to avoid the evaporation rate of evaporation material, so as to improve the stability of technique.
Description
Technical field
The present invention relates to display technology fields, and in particular, to a kind of crucible for vapor plating.
Background technology
The main way that OLED products are current is made using evaporation coating method.In order to realize volume production, production efficiency is improved, just
The volume of increase crucible is needed, but this can have the following problems：During heating evaporation material using evaporated device, when
When evaporation material is subliming type material, since the thermal conductivity of subliming type material is bad, often cause in crucible at different location
Evaporation material usage amount is different or the Density Distribution of evaporation material is uneven, to cause the steaming of evaporation material in crucible
It is out of control to send out rate.
As shown in Figure 1, for before heating, the sectional view of evaporation material in crucible.Steaming in crucible at different location at this time
Plating material is evenly distributed substantially, that is, the surfacing of evaporation material, and Density Distribution is uniform.After beginning to warm up, crucible
Interior evaporation material starts constantly to volatilize, and since the thermal conductivity of subliming type material is bad, material volatilization is uneven, is susceptible to
Phenomenon as shown in Figures 2 and 3：Evaporation rate close to the material of crucible internal walls is very fast, and the evaporation speed of intermediate material
Rate is slower, so as to cause causing the evaporation rate of crucible out of control.Alternatively, the Density Distribution of evaporation material is uneven, inside go out
The phenomenon that existing crackle.
Invention content
The present invention is directed at least solve one of the technical problems existing in the prior art, it is proposed that a kind of crucible for vapor plating,
It can be out of control to avoid the evaporation rate of evaporation material, so as to improve the stability of technique.
A kind of crucible for vapor plating, including heating chamber and setting are provided to achieve the purpose of the present invention on the heating chamber top
The head cover in portion further includes material cleaning plant, the liftable top being arranged in the heating chamber of material cleaning plant,
And the evaporation material being compacted in the heating chamber that falls can be passed through.
Optionally, the material cleaning plant includes：
It is compacted component, the evaporation material for being compacted in the heating chamber；
Elevating mechanism, for driving the compacting component to rise or declining.
Preferably, the periphery wall of the compacting component and the internal perisporium of the heating chamber slidably coordinate.
Preferably, it is respectively correspondingly provided on the internal perisporium in the periphery wall of the compacting component with the heating chamber recessed
Slot and sliding block, wherein
The groove is vertically arranged；
The sliding block is located in the groove, and when the compacting component rises or declines, and is slided along the groove.
Preferably, the opening width of the groove is less than the bottom width of the groove；
The cross-sectional shape of the sliding block is corresponding with the cross-sectional shape of the groove.
Preferably, it is provided with the first material launch hole on the head cover, the second material is provided on the compacting component
Expect launch hole, the first material launch hole is identical with the diameter of the second material launch hole, and is coaxially disposed, to be discharged
Gas in the heating chamber.
Preferably, the elevating mechanism includes：
Traction motor is arranged in the outside of the heating chamber；
Draught line, one end of the draught line are connect with the traction motor, and the other end of the draught line runs through vertically
The head cover, and connect with the compacting component.
Preferably, the elevating mechanism further includes pulley, and the pulley is arranged in the top of the head cover, the draught line
The part for stretching out the head cover bypasses the pulley, and either tilts upward or extend obliquely downward in the horizontal direction, and with
The traction motor connection.
Preferably, the elevating mechanism includes at least two sets, and at least two sets of elevating mechanisms are perpendicular relative to the head cover
The upward distribution substantially symmetrical about its central axis of histogram.
Preferably, material used by the compacting component includes ceramics or metal.
Preferably, when the compacting component is located at the top in the heating chamber, the overhead height of the compacting component
The first pre-determined distance lower than the overhead height of the heating chamber；First pre-determined distance is on the heating chamber vertical direction
/ 10th of total length；
Bottom level the second pre-determined distance higher than the bottom level of the heating chamber of the compacting component；Described second is pre-
If distance is 1/20th of the total length on the heating chamber vertical direction.
Preferably, further include：
Upper heater strip is circumferentially positioned at around the heating chamber, and at the top of the heating chamber, described to heat
In heating chamber, material cleaning plant region；
Lower heater strip, is circumferentially positioned at around the heating chamber, and positioned at the bottom of the heating chamber, to heat
It states in heating chamber, the evaporation material region.
The invention has the advantages that：
Material cleaning plant, the material is arranged by the top in its heating chamber in crucible for vapor plating provided by the invention
The evaporation material expected that cleaning plant is liftable, and can be compacted by whereabouts in heating chamber, so as to so as to be steamed in crucible
The surfacing of material is plated, and Density Distribution at different locations is uniform, and then can be to avoid the evaporation rate of evaporation material
It is out of control, improve the stability of technique.
Description of the drawings
Fig. 1 is the schematic diagram of evaporation material in the preceding crucible of heating；
Fig. 2 is the schematic diagram of evaporation material evaporation rate unevenness；
Fig. 3 is the schematic diagram of evaporation material Density Distribution unevenness；
Fig. 4 A are the sectional view for the crucible for vapor plating that first embodiment of the invention provides；
Fig. 4 B are the sectional view along line A-A in Fig. 4 A；
Fig. 5 is sectional view of the crucible for vapor plating that provides of first embodiment of the invention when material clean device works；With
And
Fig. 6 is the sectional view for the crucible for vapor plating that second embodiment of the invention provides.
Specific implementation mode
To make those skilled in the art more fully understand technical scheme of the present invention, come below in conjunction with the accompanying drawings to the present invention
The crucible for vapor plating of offer is described in detail.
Fig. 4 A are the sectional view for the crucible for vapor plating that first embodiment of the invention provides.Fig. 4 B are in Fig. 4 A along line A-A
Sectional view.Fig. 5 is sectional view of the crucible for vapor plating that provides of first embodiment of the invention when material clean device works.It please one
And refering to Fig. 4 A, Fig. 4 B and Fig. 5, crucible for vapor plating includes heating chamber 10, be arranged 10 top of the heating chamber head cover 11 and
Material cleaning plant.Wherein, heating chamber 10 is used to heat the evaporation material for holding inside it.Heating chamber 10 and head cover
11 are tightly connected, so that the inside of heating chamber 10 can form vacuum environment.
The liftable top being arranged in heating chamber 10 of material cleaning plant, and heating chamber 10 can be compacted by whereabouts
Interior evaporation material.So-called compacting refers to gravity or acceleration effect of the material cleaning plant by itself, falls to
On evaporation material, to apply downward pressure to the evaporation material, which can make the surfacing of the evaporation material, and
Density Distribution at different location is uniform.
Material cleaning plant includes compacting component 12 and elevating mechanism.Wherein, compacting component 12 is for being compacted heating chamber 10
Interior evaporation material, the heat-resisting material that ceramics or metal etc. may be used make.Elevating mechanism is compacted for driving
Component 12 rises or declines.When being heated to evaporation material, compacting component 12 can be driven to rise by elevating mechanism
Position into Fig. 4 A, that is, the top in heating chamber 10.When needing to clear up evaporation material, such as in heating process
It finds that the temperature in heating chamber 10 fluctuates in if, heating can be suspended, and compacting component 12 is driven by elevating mechanism
Fall to the position in Fig. 5, that is, fall on evaporation material, to realize the cleaning to evaporation material.
Specifically, in the present embodiment, heating chamber 10 is cylindrical ring body, corresponding, and compacting component 12 is circle
Cylinder, and the internal diameter of heating chamber 10 is adapted with the outer diameter of compacting component 12, to realize the periphery wall of compacting component 12 and add
The internal perisporium of hot chamber 10 can slidably coordinate, to when compacting component 12 is fallen on evaporation material, be compacted component 12
Lower surface the upper surface of evaporation material can be completely covered, so as to equably be compacted evaporation material.Certainly, it is actually answering
In, heating chamber 10 and compacting not only 12 can also use any other structure, as long as the periphery of compacting component 12 can be realized
Wall and the internal perisporium of heating chamber 10 slidably coordinate.
Preferably, as shown in Figure 4 B, respectively correspondingly on the internal perisporium in the periphery wall of compacting component 12 with heating chamber 10
Fluted 121 and sliding block 101 are set, wherein groove 121 is vertically arranged, and sliding block 101 is located in the groove 121, and
When being compacted the rising of component 12 or declining, slided along the groove 121.It, can be in compacting component by groove 121 and sliding block 101
When 12 risings or decline, guiding role is played to compacting component 12, limitation compacting component 12 reverses or inclination.
It is further preferred that the opening width of above-mentioned groove 121 is less than the bottom width of groove 121, it is as shown in Figure 4 B, recessed
The cross-sectional shape of the cross-sectional shape of slot 121 similar " dovetail groove ".Moreover, the cross-sectional shape of sliding block 101 and groove 121
Cross-sectional shape is corresponding, is also the cross-sectional shape of similar " dovetail groove ".By making the opening width of groove 121 be less than groove
121 bottom width, can make groove 121 limit sliding block 101 compacting component 12 one-movement-freedom-degree radially, so as to
It is detached from groove 121 to avoid sliding block 101, to improve the stability of structure.
In the present embodiment, it is provided with the first material launch hole 112 on head cover 11, the is provided on compacting component 12
Two material launch holes 122, the first material launch hole 112 is identical with the diameter of the second material launch hole 122, and is coaxially disposed.?
When being heated to evaporation material, compacting component 12 is located at the position in Fig. 4 A, and the gas that evaporation material evaporates is from bottom to top
Pass sequentially through the second material launch hole 122 and the first material launch hole 112 discharge heating chamber 10.Moreover, by making the first material
Launch hole 112 is identical with the diameter of the second material launch hole 122, and is coaxially disposed, and can keep the stability of air-flow, so as to
To ensure the uniformity of film forming.
Preferably, when compacting component 12 is located at the position in Fig. 4 A, the overhead height of component 12 is compacted than heating chamber 10
Low first pre-determined distance of overhead height, first pre-determined distance be the total length on 10 vertical direction of heating chamber ten/
One.That is, when compacting component 12 is located at the position in Fig. 4 A, it is compacted the upper end of the upper surface and heating chamber 10 of component 12
Between vertical spacing be 1/10th of the total length on 10 vertical direction of heating chamber.Meanwhile the bottom for being compacted component 12 is high
Degree second pre-determined distance higher than the bottom level of heating chamber 10, which is the overall length on 10 vertical direction of heating chamber
/ 20th of degree.That is, when compacting component 12 is located at the position in Fig. 4 A, it is compacted the upper surface of component 12 and adds
Vertical spacing between the lower end of hot chamber 10 is 1/20th of the total length on 10 vertical direction of heating chamber.By testing
Card, when heating evaporation material, such set-up mode can not only play the role of the temperature at 10 top of stable heating chamber, from
And evaporation material is avoided to assemble, but also can be excessively high to avoid the temperature of 10 bottom of heating chamber.
In the present embodiment, elevating mechanism includes traction motor 14, draught line 13 and pulley 15.Wherein, traction motor 14
It is arranged in the top of head cover 11, and positioned at its periphery, to avoid the flowing for the gas that interference is discharged from the first material launch hole 112
Direction.Moreover, being additionally provided with towing pad 111, draught line 13 on head cover 11, and positioned at the periphery of the first material launch hole 112
One end connect with traction motor 14, the other end of draught line 13 passes vertically through head cover 11 by towing pad 111, and with compacting portion
Part 12 connects.Pulley 15 is arranged at the top of head cover 11, and the part that draught line 13 stretches out head cover 11 bypasses pulley 15, and along level
Direction extends, and is connect with traction motor 14.
When needing to clear up evaporation material, traction motor 14 releases draught line 13 by rotating in the forward direction, and makes compacting
Component 12 falls.Then, traction motor 14 recycles draught line 13 by reverse rotation, extremely adds so that compacting component 12 gos up again
Top in hot chamber 10.
By pulley 15, the part that draught line 13 stretches out head cover 11 can be changed under the premise of not wearing draught line 13
Direction, traction motor 14 is arranged in the periphery of head cover 11 so as to realize, to avoid interference from the first material launch hole
The flow direction of the gas of 112 discharges.
In addition, in practical applications, different relative to the height of head cover 11 according to traction motor 14, draught line 13 stretches out top
The part of lid 11 after around pulley 15, can also along tilting upward or direction diagonally downward extends, and with traction horse
Up to 14 connections.
In the present embodiment, above-mentioned elevating mechanism includes two sets, and two sets of elevating mechanisms are relative on 11 vertical direction of head cover
Distribution substantially symmetrical about its central axis so that compacting component 12 uniform force.Certainly, in practical applications, elevating mechanism can also wrap
Three sets or four sets or more are included, and relative to the distribution substantially symmetrical about its central axis on 11 vertical direction of head cover.
In conclusion crucible for vapor plating provided in an embodiment of the present invention, is arranged material by the top in its heating chamber
Expect cleaning plant, which is liftable, and the evaporation material that can be compacted by whereabouts in heating chamber, to
It can make the surfacing of evaporation material in crucible, and Density Distribution at different locations is uniform, and then can be to avoid vapor deposition
The evaporation rate of material is out of control, improves the stability of technique.
Fig. 6 is the sectional view for the crucible for vapor plating that second embodiment of the invention provides.Referring to Fig. 6, real above-mentioned first
On the basis of applying example, crucible for vapor plating provided in this embodiment further includes upper heater strip 16 and lower heater strip 17.Wherein, upper heating
Silk 16 is circumferentially positioned at around 10 inner space of heating chamber, and positioned at 10 top of heating chamber, to heat in heating chamber 10, material
Expect cleaning plant region.Lower heater strip 17 is circumferentially positioned at around 10 inner space of heating chamber, and is located at heating chamber 10
Bottom, to heat in heating chamber 10, evaporation material region.
When being heated to evaporation material, compacting component 12 can be driven to rise to the position in Fig. 4 A by elevating mechanism
It sets, that is, then the top in heating chamber 10 is connected lower heater strip 17, heated to evaporation material.It is needing to evaporation material
When being cleared up, then suspend heating, and drive compacting component 12 to fall to the position in Fig. 5 by elevating mechanism, that is, fall to
On evaporation material, to realize the cleaning to evaporation material.Then, by elevating mechanism drive compacting component 12 go up again to
Top in heating chamber 10, and upper heater strip 16 is connected, compacting component 12 is heated, so that the material adhered to it is waved
Hair.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, however the present invention is not limited thereto.For those skilled in the art, in the essence for not departing from the present invention
In the case of refreshing and essence, various changes and modifications can be made therein, these variations and modifications are also considered as protection scope of the present invention.
Claims (12)
1. a kind of crucible for vapor plating, including heating chamber and the head cover that is arranged at the top of the heating chamber, which is characterized in that further include
Material cleaning plant, the liftable top being arranged in the heating chamber of material cleaning plant, and whereabouts can be passed through
The evaporation material being compacted in the heating chamber.
2. crucible for vapor plating according to claim 1, which is characterized in that the material cleaning plant includes：
It is compacted component, the evaporation material for being compacted in the heating chamber；
Elevating mechanism, for driving the compacting component to rise or declining.
3. crucible for vapor plating according to claim 2, which is characterized in that the periphery wall of the compacting component and the heating
The internal perisporium of chamber slidably coordinates.
4. crucible for vapor plating according to claim 3, which is characterized in that respectively correspondingly in the periphery of the compacting component
Fluted and sliding block is arranged on the internal perisporium of the heating chamber in wall, wherein
The groove is vertically arranged；
The sliding block is located in the groove, and when the compacting component rises or declines, and is slided along the groove.
5. crucible for vapor plating according to claim 4, which is characterized in that the opening width of the groove is less than the groove
Bottom width；
The cross-sectional shape of the sliding block is corresponding with the cross-sectional shape of the groove.
6. crucible for vapor plating according to claim 2, which is characterized in that be provided with the transmitting of the first material on the head cover
Hole is provided with the second material launch hole, the first material launch hole and second material transmitting on the compacting component
The diameter in hole is identical, and is coaxially disposed, the gas in the heating chamber is discharged.
7. according to the crucible for vapor plating described in claim 2-6 any one, which is characterized in that the elevating mechanism includes：
Traction motor is arranged in the outside of the heating chamber；
Draught line, one end of the draught line are connect with the traction motor, and the other end of the draught line is vertically through described
Head cover, and connect with the compacting component.
8. crucible for vapor plating according to claim 7, which is characterized in that the elevating mechanism further includes pulley, the cunning
Wheel is arranged at the top of the head cover, and the part that the draught line stretches out the head cover bypasses the pulley, and in the horizontal direction
It either tilts upward or extends obliquely downward, and connect with the traction motor.
9. crucible for vapor plating according to claim 7, which is characterized in that the elevating mechanism includes at least two sets, described
At least two sets of elevating mechanisms are relative to the distribution substantially symmetrical about its central axis on the head cover vertical direction.
10. according to the crucible for vapor plating described in claim 2-6 any one, which is characterized in that the compacting component is used
Material include ceramics or metal.
11. according to the crucible for vapor plating described in claim 2-6 any one, which is characterized in that when the compacting component is located at
When top in the heating chamber, the overhead height of the compacting component it is lower than the overhead height of the heating chamber first it is default away from
From；First pre-determined distance is 1/10th of the total length on the heating chamber vertical direction；
Bottom level the second pre-determined distance higher than the bottom level of the heating chamber of the compacting component；Described second it is default away from
From being 1/20th of total length on the heating chamber vertical direction.
12. according to the crucible for vapor plating described in claim 1-6 any one, which is characterized in that further include：
Upper heater strip is circumferentially positioned at around the heating chamber, and at the top of the heating chamber, to heat the heating
Intracavitary, material cleaning plant region；
Lower heater strip, is circumferentially positioned at around the heating chamber, and positioned at the bottom of the heating chamber, to heat described add
Hot intracavitary, the evaporation material region.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610586769.5A CN106191784B (en) | 2016-07-22 | 2016-07-22 | Crucible for vapor plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610586769.5A CN106191784B (en) | 2016-07-22 | 2016-07-22 | Crucible for vapor plating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106191784A CN106191784A (en) | 2016-12-07 |
| CN106191784B true CN106191784B (en) | 2018-10-30 |
Family
ID=57492478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610586769.5A Active CN106191784B (en) | 2016-07-22 | 2016-07-22 | Crucible for vapor plating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106191784B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106987807B (en) * | 2017-06-01 | 2019-04-26 | 京东方科技集团股份有限公司 | A kind of evaporation source, evaporation coating device and evaporation coating method |
| CN111206228A (en) * | 2020-02-28 | 2020-05-29 | 苏州泓沵达仪器科技有限公司 | High-efficiency nano vacuum evaporation source |
| CN114717518A (en) * | 2022-05-10 | 2022-07-08 | 福建华佳彩有限公司 | Evaporation crucible and taking and placing device thereof |
| CN116770234B (en) * | 2023-06-25 | 2023-12-15 | 苏州佑伦真空设备科技有限公司 | Crucible device for preventing material mixing |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102337502A (en) * | 2010-07-19 | 2012-02-01 | 鸿富锦精密工业（深圳）有限公司 | Film material processing device and vapor deposition equipment with same |
| CN102337504A (en) * | 2010-07-19 | 2012-02-01 | 鸿富锦精密工业（深圳）有限公司 | Membrane material processing device and evaporation deposition equipment with the membrane material processing device |
| CN102337503A (en) * | 2010-07-19 | 2012-02-01 | 鸿富锦精密工业（深圳）有限公司 | Film material processing device and evaporating device with film material processing device |
| CN104018121A (en) * | 2014-05-14 | 2014-09-03 | 深圳市华星光电技术有限公司 | Heating container for preventing leakage of high-temperature metal material and manufacturing method thereof |
-
2016
- 2016-07-22 CN CN201610586769.5A patent/CN106191784B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102337502A (en) * | 2010-07-19 | 2012-02-01 | 鸿富锦精密工业（深圳）有限公司 | Film material processing device and vapor deposition equipment with same |
| CN102337504A (en) * | 2010-07-19 | 2012-02-01 | 鸿富锦精密工业（深圳）有限公司 | Membrane material processing device and evaporation deposition equipment with the membrane material processing device |
| CN102337503A (en) * | 2010-07-19 | 2012-02-01 | 鸿富锦精密工业（深圳）有限公司 | Film material processing device and evaporating device with film material processing device |
| CN104018121A (en) * | 2014-05-14 | 2014-09-03 | 深圳市华星光电技术有限公司 | Heating container for preventing leakage of high-temperature metal material and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106191784A (en) | 2016-12-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106191784B (en) | Crucible for vapor plating | |
| CN206257934U (en) | The uniform tea drier of one kind drying | |
| WO2010005021A1 (en) | Freeze-drying device and freeze-drying method | |
| CN205957669U (en) | Chrysanthemum tea rapid dryer | |
| WO2010005018A1 (en) | Freeze-drying device and freeze-drying method | |
| CN107928440A (en) | The equipment that food is made using hot-air | |
| CN108878319A (en) | A kind of rotating etching device and wet etching machine bench | |
| JP2017145507A (en) | Direct liquid deposition | |
| JP6572464B2 (en) | Heating apparatus and heating method using superheated steam | |
| RU2634541C1 (en) | Method and device for balls heat treatment | |
| JP4545797B2 (en) | Multi-nozzle crucible device for organic light emitting diode deposition process | |
| JP2017029978A (en) | Filament extension type atomizer | |
| CN113817908B (en) | Annealing furnace | |
| CN205052809U (en) | Cylinder device of coffee beans curer | |
| KR101109690B1 (en) | Downward type linear source and device for depositing thin film using the same | |
| CN206375995U (en) | A kind of vacuum deposition apparatus | |
| CN205482147U (en) | Tea leaf drying machine | |
| EP2484785B1 (en) | Method and apparatus for the spray cooling of mechanical parts, particularly for large mechanical parts, in execution of thermal treatments | |
| JP2017029977A (en) | Filament extension type atomizer | |
| CN104529180B (en) | The production method of a kind of electric heating lamina membranacea and the equipment of production | |
| CN207532812U (en) | A kind of spray dryer of uniform drying | |
| CN207564776U (en) | A kind of drying machine for plastic particles | |
| CN105491887B (en) | Steam generating system | |
| CN104383823B (en) | Emulsifying machine capable of controlling temperature for processing catalyst | |
| RU2457413C1 (en) | Device for gas distribution in mine grain dryer |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |