CN106179871B - Apparatus for coating and cleaning method - Google Patents

Apparatus for coating and cleaning method Download PDF

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Publication number
CN106179871B
CN106179871B CN201510405949.4A CN201510405949A CN106179871B CN 106179871 B CN106179871 B CN 106179871B CN 201510405949 A CN201510405949 A CN 201510405949A CN 106179871 B CN106179871 B CN 106179871B
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China
Prior art keywords
leacheate
nozzle
supplying tubing
coating
flow velocity
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CN106179871A (en
Inventor
时枝大佐
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Dainippon Screen Manufacturing Co Ltd
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Dainippon Screen Manufacturing Co Ltd
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  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning In General (AREA)

Abstract

The present invention provides a kind of apparatus for coating and cleaning method, and the leacheate for being applied material is lower than using viscosity, is efficiently cleaned to the material that is applied for the inner wall for being attached to supplying tubing.The apparatus for coating (1) includes the nozzle (20) of ejecting fluid and selectively supplies the feed mechanism (60) for being applied material and leacheate to nozzle (20).Feed mechanism (60) includes the supplying tubing (68,70) connecting with nozzle (20), and the switch valve (71,72) being set on the path of supplying tubing (68,70).Control unit (50) switchs switch valve (71,72) when supplying leacheate from feed mechanism (60) to nozzle (20).Then, in supplying tubing (68,70), the flow velocity of leacheate changes.The material that is applied on the inner wall for being attached to supplying tubing (68,70) can efficiently be cleaned as a result,.

Description

Apparatus for coating and cleaning method
Technical field
The apparatus for coating and the painting that material is coated on the face for becoming process object will be applied the present invention relates to a kind of The cleaning method of cloth apparatus.
Background technique
Currently, in liquid crystal display device glass substrate, semiconductor wafer, Plasmia indicating panel (plasma Display panel, PDP) with glass substrate, photomask glass substrate, colored filter substrate, recording disc base Plate, substrate used for solar batteries, Electronic Paper (electronic paper) manufacture of the precision electronic devices substrate such as substrate In process, it is used in the apparatus for coating that surface coating photoresist of substrate etc. is applied material.About existing apparatus for coating, Such as it is recorded in patent document 1.The apparatus for coating of patent document 1 is to move nozzle relatively relative to substrate, one While from the ejiction opening for the slit-shaped being set on nozzle, the surface that material will be applied is ejected to substrate.
[existing technical literature]
[patent document]
[patent document 1] Japanese Patent Laid-Open 2007-253093 bulletin
In this apparatus for coating, need periodically to carry out clearly the inside of nozzle and the inside for the piping connecting with nozzle It washes.In cleaning, by leacheates such as organic solvents via piping supply to the inside of nozzle.When the viscosity for being applied material is low, And it is applied the poor hour of the viscosity of material and the viscosity of leacheate, is easily rinsed out using leacheate and is attached to nozzle Inside or the inner wall of piping be applied material.
However, when using it is highly viscous be applied material when, then the leacheate that low viscosity is difficult to be utilized, which rinses out, to be attached to The inner wall of the inside or piping of nozzle is applied material.Therefore, cleaning expends the time, and the dosage of leacheate increases.And And when using it is highly viscous be applied material when, in order to ensure being applied the mobility of material, need to increase the internal diameter of piping. Accordingly, it is difficult to contact leacheate with the entire inner wall of the piping of major diameter.
In recent years, it in flexible device (flexible device) or the manufacturing process of battery, is applied highly viscous The demand that material is coated on the device on the face as process object improves.It is accompanied by this, to being attached with highly viscous be applied The technology that the nozzle of material and the inside of piping are efficiently cleaned increases importance.
Summary of the invention
The present invention be in view of situation as described above and complete, and it is an object of the present invention to provide one kind can be using viscosity lower than being applied The leacheate of cloth material to the inner wall for being attached to supplying tubing be applied apparatus for coating that material is efficiently cleaned and Cleaning method.
In order to solve described problem, the 1st form of the invention is a kind of apparatus for coating, will be applied material as fluid It is coated on the face as process object, the apparatus for coating includes: nozzle, the ejiction opening comprising ejecting fluid;Feed mechanism, Material and leacheate are applied described in supplying to the nozzle selection, the leacheate is that viscosity is applied material lower than described in The fluid of material;And control unit, the feed mechanism is controlled, and the feed mechanism includes: supplying tubing, with institute State nozzle connection;And flow velocity switching element, so that the speed of fluid is changed in the supplying tubing, the control unit exists Act the flow velocity switching element when supplying the leacheate.
2nd form of the invention is according to the apparatus for coating of the 1st form, wherein the flow velocity switching element includes being set to institute State the switch valve in supplying tubing.
3rd form of the invention is according to the apparatus for coating of the 1st form, wherein the flow velocity switching element includes being set to institute State the pump in supplying tubing.
4th form of the invention is according to the apparatus for coating of the 1st form any form into the 3rd form, wherein the control Portion acts the flow velocity switching element repeatedly every the defined time when supplying the leacheate.
5th form of the invention is according to the apparatus for coating of the 1st form any form into the 4th form, further includes: discharge is matched Pipe, for gas to be discharged from the nozzle;And the mechanism of decompressor, make to generate negative pressure, and the control in the discharge piping Portion acts the mechanism of decompressor when supplying the leacheate.
6th form of the invention is according to the apparatus for coating of the 5th form, wherein the mechanism of decompressor includes being connected to the row The relief groove of the end in the downstream side being piped out, the leacheate for flowing into the discharge piping from the nozzle lodge in described subtract In indent, and the apparatus for coating further includes supplying the leacheate lodged in the relief groove again to the supply machine The circulation mechanism of structure.
7th form of the invention is according to the apparatus for coating of the 5th form or the 6th form, wherein the ejiction opening is to be set to The opening of the slit-shaped of the lower part of the nozzle, the discharge piping are connect with the outlet on the top for being set to the nozzle.
8th form of the invention is a kind of cleaning method, is supplied in the material that is applied that will be used as fluid from supplying tubing To nozzle and from the apparatus for coating that the ejiction opening of the nozzle is sprayed, using leacheate to the supplying tubing and described Nozzle is cleaned, and the leacheate is viscosity lower than the fluid for being applied material, and the cleaning method includes following work Sequence: a) start to supply the leacheate from the supplying tubing to the nozzle;And b) after the process a), make described The flow velocity of the leacheate in supplying tubing changes.
9th form of the invention is according to the cleaning method of the 8th form, wherein making the leacheate in the process b) Flow velocity repeatedly change every the defined time.
10th form of the invention further includes following process according to the cleaning method of the 8th form or the 9th form: c) making to arrange Negative pressure is generated in piping out, the discharge piping is for being discharged gas from the nozzle.
11st form of the invention further includes following process according to the cleaning method of the 10th form: d) will be in the process C) leacheate that the discharge piping is flowed into is supplied again to the upstream side of the supplying tubing.
1st form~the 11st form according to the present invention can make the flow velocity of leacheate change in supplying tubing.By This, can efficiently clean the material that is applied for the inner wall for being attached to supplying tubing.
In particular, the 2nd form according to the present invention, can not make the composition of feed mechanism complicate and make the flow velocity of leacheate It changes.
In particular, the 3rd form according to the present invention, can be selected by the pressure to pump become the flow velocity of leacheate For required value.
In particular, the 4th form according to the present invention and the 9th form, can further improve the cleaning effect using leacheate.
In particular, the 5th form according to the present invention and the 10th form, flow into discharge by the leacheate that feed mechanism supplies In piping.The inside of discharge piping can be cleaned as a result,.
In particular, the 6th form according to the present invention and the 11st form, can recycle used leacheate for the time being. The dosage of leacheate can be reduced as a result,.
In particular, the 7th form according to the present invention, the leacheate supplied to the inside of nozzle flows to the outlet on top. Therefore, leacheate mitigates the pressure for being applied material of blocking ejiction opening.Its result make can cleaning down fall blocking Ejiction opening is applied material.Thus it is not easy to become the situation for only spraying leacheate from a part of the ejiction opening of slit-shaped.
Detailed description of the invention
Fig. 1 is the perspective view of apparatus for coating.
Fig. 2 is the perspective view of gap nozzle.
Fig. 3 is the figure for indicating the flow path of inside of gap nozzle.
Fig. 4 is the figure for indicating the composition for the piping system connecting with gap nozzle.
Fig. 5 is the block diagram connected and composed for indicating each portion of control unit and piping system.
Fig. 6 is the flow chart for indicating the process of cleaning treatment.
Fig. 7 is the figure (present embodiment) of the appearance in the gap nozzle during indicating cleaning treatment.
Fig. 8 is the figure (comparative example) of the appearance in the gap nozzle during indicating cleaning treatment.
Fig. 9 is the exemplary time diagram for indicating the switch motion of the 3rd switch valve or the 4th switch valve.
Figure 10 is the figure of the composition of the piping system in the apparatus for coating for indicate variation.
[explanation of symbol]
1: apparatus for coating
9: substrate
10: platform
11: substrate retaining surface
20: gap nozzle
21: nozzle body
22: supply mouth
23: ejiction opening
24: outlet
30: nozzle maintaining part
31: crosslinking section
32: support sector
33: elevating mechanism
40: travelling mechanism
41: travel rail
42: linear motor
50: control unit
51: arithmetic processing section
52: memory
53: storage unit
60: feed mechanism
61: being applied material supplies
62: the 1 supplying tubings
63: the 1 switch valves
64: leacheate supply source
65: the 2 supplying tubings
66: the 2 switch valves
67: deaerating tank
68: main supplying tubing
69: supply pump
70: branch's supplying tubing
71: the 3 switch valves
72: the 4 switch valves
73: the 1 air supply sources
74: the 1 air supplying tubings
75: the 1 air switch valves
76: oscillating pump
80: output mechanism
81: discharge piping
82: the 5 switch valves
83: relief groove
84: drawdown pump
90: circulation mechanism
91: circulation piping
92: the 6 switch valves
93: the 2 air supply sources
94: the 2 air supplying tubings
95: the 2 air switch valves
210: flow path
211: nozzle arrangement
212: nozzle arrangement
213: side plate
214: side plate
421: fixed cell
422: mobile unit
M: it is applied material
S1~S5: step
Specific embodiment
Hereinafter, embodiments of the present invention will be described on one side on one side referring to attached drawing.Furthermore hereinafter, for the ease of saying It is bright, the moving direction of the gap nozzle 20 in apparatus for coating is known as " front-rear direction ", by the level side orthogonal with front-rear direction To referred to as " left and right directions ".
<1. composition about apparatus for coating>
Fig. 1 is the perspective view of the apparatus for coating 1 of one embodiment of the present invention.The apparatus for coating 1 is in flexible device Manufacturing process in, coating has mobility on the upper surface of the carrier substrate (carrier substrate) 9 of glass system It is applied the device of material (for example, the resins such as polyimides).The material that is applied for being coated on the upper surface of substrate 9 passes through behind Solidify and becomes film.Also, the pattern of electrode etc. is formed on the surface of the film, and peels the film from substrate 9, Flexible device is consequently formed.
As shown in Figure 1, the apparatus for coating 1 of present embodiment includes platform 10, gap nozzle 20, nozzle maintaining part 30, moves Row mechanism 40 and control unit 50.
Platform 10 is the holding station for the substantially rectangular parallelepiped that substrate 9 is loaded and kept.Platform 10 for example by The stone material of one is formed.The upper surface of platform 10 becomes flat substrate retaining surface 11.In substrate retaining surface 11, it is provided with Multiple vacuum absorption holes (illustration omitted).When substrate 9 is placed in substrate retaining surface 11, by the suction of vacuum absorption holes, The lower surface of substrate 9 is adsorbed in substrate retaining surface 11.Substrate 9 is fixed on platform 10 with flat-hand position as a result,.Also, The inside of platform 10 is provided with multiple jacking pins (lift pin).When moving out substrate 9 from platform 10, multiple jacking pins are protruded In in substrate retaining surface 11.As a result, substrate 9 can be removed from substrate retaining surface 11.
Gap nozzle 20 is to spray the nozzle for being applied material.Gap nozzle 20 includes nozzle master long in the lateral direction Body 21.In the lower end of nozzle body 21, it is provided with the ejiction opening 23 of the slit-shaped extended in left-right direction.23 direction of ejiction opening It is placed in the upper surface of the substrate 9 on platform 10.When supplying quilt into nozzle body 21 from following feed mechanisms 60 (referring to Fig. 4) When coating material, is sprayed from the ejiction opening 23 of gap nozzle 20 to the upper surface for the substrate 9 for becoming process object and be applied material. Furthermore the more detailed construction about gap nozzle 20 is described further below.
Nozzle maintaining part 30 is the mechanism for gap nozzle 20 to be held in the top of substrate retaining surface 11.Nozzle is kept Portion 30 includes: crosslinking section 31, is extended in left-right direction;And the support sector 32 of a pair of columnar, support the both ends of crosslinking section 31. Gap nozzle 20 is installed on the lower surface of crosslinking section 31.Also, each support sector 32 include to the height of the end of crosslinking section 31 into The elevating mechanism 33 that row is adjusted.When acting the elevating mechanism 33 of left and right, together to the height of crosslinking section 31 and gap nozzle 20 Degree and posture are adjusted.
Travelling mechanism 40 is the mechanism for moving gap nozzle 20 along the longitudinal direction.Travelling mechanism 40 includes a pair of moves Row track 41 and a pair of of linear motor (linear motor) 42.The side of left and right of a pair of of travel rail 41 in platform 10 is attached Closely, extend along the longitudinal direction.Travel rail 41 supports a pair of of support sector 32 respectively on one side, on one side to the lower end of each support sector 32 Portion guides along the longitudinal direction.That is, a pair of of travel rail 41 is limited to front and back as by the moving direction of a pair of of support sector 32 The Linear guide (linear guide) in direction and play a role.
Linear motor 42 includes: fixed cell 421, is fixed on platform 10;And mobile unit 422, it is fixed on support sector 32.Fixed cell 421 extends in the longitudinal direction along the side edge part of the left and right of platform 10.When apparatus for coating 1 is run, solid Magnetic attraction or magnetic bounce are generated between order member 421 and mobile unit 422.Mobile unit 422, nozzle are kept as a result, Portion 30 and gap nozzle 20 move along the longitudinal direction as one.
Control unit 50 is the element for carrying out action control to each portion in apparatus for coating 1.As schematically shown in figure 1, Control unit 50 is by including arithmetic processing sections 51, arbitrary access such as central processing unit (central processing unit, CPU) The computer institute structure of the storage units such as memories 52 and hard disk drive 53 such as memory (random access memory, RAM) At.Control unit 50 is not electrically connected with each section in the apparatus for coating 1 such as the jacking pin, elevating mechanism 33, linear motor 42. Also, control unit 50 and pump and switch valve set in following feed mechanisms 60, output mechanism 80 and circulation mechanism 90 are also electric Property connection.Control unit 50 is temporarily read by by the computer program being stored in storage unit 53 and data to memory 52, and Calculation process is carried out according to the computer program and data by arithmetic processing section 51, each portion in apparatus for coating 1 is carried out Action control.The coating process and following cleaning treatments to substrate 9 are carried out as a result,.
<2. construction about gap nozzle>
Secondly, the more detailed construction to gap nozzle 20 is illustrated.Fig. 2 is the perspective view of gap nozzle 20.Fig. 3 is Indicate the figure of the flow path 210 of the inside of gap nozzle 20.
As shown in Fig. 2, the nozzle body 21 of gap nozzle 20 includes a pair of nozzles component 211, nozzle arrangement 212 and one To side plate 213, side plate 214.Nozzle arrangement 211, nozzle arrangement 212 and side plate 213, side plate 214 material be, for example, to use aluminium Equal metals.If a pair of nozzles component 211, nozzle arrangement 212 are fixed to each other, and by a pair of side plates 213, side plate 214 are installed on the both ends of its left and right, then form the internal nozzle body 21 with flow path 210.
On nozzle body 21, it is provided with the ejiction opening 23 of a pair of of supply mouth 22 and 1 slit-shaped.A pair of of supply mouth 22 is divided It is not set to a pair of side plates 213, side plate 214.1 ejiction opening 23 is in the lower end and rear of the nozzle arrangement 211 in front Opening is formed in slit-shaped between the lower end of nozzle arrangement 212.When apparatus for coating 1 is run, from a pair of of supply mouth 22 to spray The supply of flow path 210 in mouth main body 21 is applied material.Then, material will be applied from 23 direction of ejiction opening in flow path 210 The lower section of nozzle body 21 is sprayed.
Also, as shown in Fig. 2, the nozzle body 21 of present embodiment includes 1 outlet 24.Outlet 24 is set to spray The upper surface of mouth main body 21.The bubble being mixed into when cleaning gap nozzle 20 into the flow path 210 in nozzle body 21 and elution Liquid is discharged via outlet 24 to following discharges piping 81 together.Bubble is subject to from the flow path 210 in nozzle body 21 as a result, Removal.
<3. composition about the piping system being connect with gap nozzle>
Then, the composition of the related piping system of the supply and discharge that are applied material and leacheate is illustrated. Fig. 4 is the figure for indicating the composition for the piping system connecting with gap nozzle 20.As shown in figure 4, the apparatus for coating 1 of present embodiment Including feed mechanism 60, output mechanism 80 and circulation mechanism 90.
Feed mechanism 60 is for selectively supplying the mechanism for being applied material and leacheate to gap nozzle 20.Supply Mechanism 60 includes being applied material supplies 61, the 1st supplying tubing 62, the 1st switch valve 63, leacheate supply source the 64, the 2nd to supply The 65, the 2nd switch valve 66, deaerating tank 67, main supplying tubing 68, supply pump 69, Liang Gen branch supplying tubing the 70, the 3rd is piped to switch Valve 71, the 4th switch valve 72, the 1st air supply source 73, the 1st air supplying tubing 74 and the 1st air switch valve 75.
The upper surface that should be coated on substrate 9 is contained on being applied material supplies 61 is applied material.It is applied Material is, for example, using molten resins such as highly viscous fluid, that is, polyimides.Be applied material viscosity be, for example, thousands of cP~ 10000 cP or so.It is applied material supplies 61 and is connect with deaerating tank 67 by the 1st supplying tubing 62.Also, in the 1st supply On the path of piping 62, inserted with the 1st switch valve 63.Therefore, it when opening the 1st switch valve 63, is supplied from material is applied Source 61 is applied material to the supply of deaerating tank 67 by the 1st supplying tubing 62.Also, when closing the 1st switch valve 63, stop Material is applied to the supply of deaerating tank 67 from material supplies 61 are applied.
It is contained in leacheate supply source 64 for gap nozzle 20 and the piping being connect with gap nozzle 20 progress The leacheate of cleaning.Leacheate is to be lower than the fluid (for example, pure water or organic solvent) for being applied material using viscosity.Leacheate Viscosity be, for example, 1cP~number cP or so.Leacheate supply source 64 is connect with deaerating tank 67 by the 2nd supplying tubing 65.And And on the path of the 2nd supplying tubing 65, inserted with the 2nd switch valve 66.Therefore, when opening the 2nd switch valve 66, from leaching Washing lotion supply source 64 supplies leacheate to deaerating tank 67 by the 2nd supplying tubing 65.Also, when the 2nd switch valve 66 is closed, Stop supplying leacheate from leacheate supply source 64 to deaerating tank 67.
Deaerating tank 67 is the temporary container for accumulating and being applied material or leacheate.It is applied contained in material or leacheate Bubble or dissolved gas are removed in deaerating tank 67.Deaerating tank 67 is supplied via the 1st air supplying tubing 74 with the 1st air Source 73 connects.Accumulation has pressurized air in the 1st air supply source 73.Also, in the path of the 1st air supplying tubing 74 On, inserted with the 1st air switch valve 75.When opening the 1st air with switch valve 75, pass through from the 1st air supply source 73 1st air supplying tubing 74 supplies pressurized air into deaerating tank 67.It is lodged in deaerating tank 67 as a result, and is applied material The liquid level of material or leacheate is pressurizeed.Furthermore it also can replace pressurized air, and by indifferent gas such as pressurized nitrogen Body is supplied to deaerating tank 67.
The end of the upstream side of main supplying tubing 68 is connect with the bottom of deaerating tank 67.In the downstream side of main supplying tubing 68 End, respectively connected the end of the upstream side of Liang Gen branch supplying tubing 70.Also, under Liang Gen branch supplying tubing 70 The end of trip side is connected to two supply mouths 22 of gap nozzle 20.Main supplying tubing 68 and branch's supplying tubing 70 it is interior Diameter has for the highly viscous sufficient size for being applied material flowing.
On the path of main supplying tubing 68, it is provided with supply pump 69.Also, on each road of Liang Gen branch supplying tubing 70 On diameter, it is respectively arranged with the 3rd switch valve 71 and the 4th switch valve 72.When supplying leacheate, by the 1st air switch valve 75, 3 switch valves 71 and the 4th switch valve 72 are opened.Then, the leaching in deaerating tank 67 will be lodged in by the pressurization in deaerating tank 67 Washing lotion is squeezed out to main supplying tubing 68.Then, the leacheate is passed through into main supplying tubing 68 and Liang Gen branch supplying tubing 70 It supplies to the flow path 210 in gap nozzle 20.Also, when supply is applied material, air switch valve the 75, the 3rd is switched Valve 71 and the 4th switch valve 72 are opened, and act supply pump 69.Then, by the pressurization and supply pump 69 in deaerating tank 67 Effect and the material that is applied lodged in deaerating tank 67 is supplied by main supplying tubing 68 and Liang Gen branch supplying tubing 70 To the flow path 210 in gap nozzle 20.
Output mechanism 80 is to be expelled to external machine for will accumulate the gas near the outlet 24 of gap nozzle 20 Structure.Output mechanism 80 includes the 81, the 5th switch valve 82 of discharge piping, relief groove 83 and drawdown pump 84.The upstream side of discharge piping 81 End connect with the outlet 24 of gap nozzle 20.The end in the downstream side of discharge piping 81 is connect with relief groove 83.Also, The 5th switch valve 82 is provided on the path of discharge piping 81.
When carrying out following cleanings, leacheate is supplied from feed mechanism 60 to gap nozzle 20, and by the 5th switch valve 82 It opens, acts drawdown pump 84.Then, the pressure decline in the relief groove 83 being connect with drawdown pump 84.It is piped as a result, in discharge Also negative pressure is generated in 81.That is, being to constitute the mechanism of decompressor by relief groove 83 and drawdown pump 84 in the present embodiment.When being discharged When generating negative pressure in piping 81, the gas and the leacheate together row of being discharged near the outlet 24 of gap nozzle 20 are accumulated It is piped 81 out.Also, the leacheate and gas accumulation for being expelled to discharge piping 81 from gap nozzle 20 are in relief groove 83.
Furthermore in order to decline the pressure in relief groove 83, the vacuum generator of wonderful moral (convum) etc. also can be used To replace drawdown pump 84.
Circulation mechanism 90 is for being supplied the leacheate lodged in relief groove 83 again to the mechanism of deaerating tank 67.It follows Ring mechanism 90 includes the 91, the 6th switch valve 92 of circulation piping, the 2nd air supply source 93, the 2nd air supplying tubing 94 and the 2nd air With switch valve 95.The end of the upstream side of circulation piping 91 is connect with the bottom of relief groove 83.The downstream side of circulation piping 91 End is connect with deaerating tank 67.Also, the 6th switch valve 92 is provided on the path of circulation piping 91.Also, relief groove 83 passes through It is connect by the 2nd air supplying tubing 94 with the 2nd air supply source 93.Accumulation has pressurized in the 2nd air supply source 93 Air.Also, inserted with the 2nd air switch valve 95 on the path of the 2nd air supplying tubing 94.
Therefore, when stopping drawdown pump 84, and the 6th switch valve 92 and the 2nd air being opened with switch valve 95, from the 2 air supply sources 93 supply pressurized air into relief groove 83 by the 2nd air supplying tubing 94.Then, by decompression Pressurization in slot 67 and the leacheate in relief groove 83 is squeezed out to circulation piping 91.Then, the leacheate is passed through into circulation Piping 91 is supplied again to deaerating tank 67.Furthermore it also can replace pressurized air, and by indifferent gas such as pressurized nitrogen Body is supplied to relief groove 83.
Fig. 5 is the block diagram connected and composed for indicating each portion of control unit 50 and piping system.As shown in figure 5, control unit 50 It is switched with the 1st switch valve 63, the 2nd switch valve 66, supply pump 69, the 3rd switch valve 71, the 4th switch valve 72, the 1st air Valve 75, the 5th switch valve 82, drawdown pump 84, the 6th switch valve 92 and the 2nd air switch valve 95 are electrically connected.Control unit 50 According to preset computer program or from external order, action control is carried out to each portion.It is coated as a result, Coating process and cleaning treatment in device 1.
<4. about gap nozzle and the cleaning of piping>
In the apparatus for coating 1, when carrying out being applied the coating process of material, in deaerating tank 67, main supplying tubing 68, the inside of Liang Gen branch supplying tubing 70 and gap nozzle 20, which is attached with, highly viscous is applied material.Therefore, apparatus for coating 1 needs after coating process, next time before coating process or regularly starts the cleaning processing.Hereinafter, on one side referring to Fig. 6's Flow chart is on one side illustrated the cleaning treatment.
When starting the cleaning processing, firstly, the 2nd switch valve 66 is opened, and from leacheate supply source 64 to deaerating tank 67 Supply leacheate.Lodge in leacheate in deaerating tank 67 (step S1).It is attached to being applied for the inner wall of deaerating tank 67 Material is removed by being dissolved in accumulated leacheate.At this moment, the 1st air switch valve 75 is opened.Therefore, it borrows By the air that is supplied from the 1st air supply source 73 and to pressurizeing in deaerating tank 67.
Secondly, control unit 50 opens the 3rd switch valve 71 and the 4th switch valve 72.Then, by the pressure in deaerating tank 67 Power starts to supply leacheate (step S2) from deaerating tank 67 to gap nozzle 20.Leacheate in deaerating tank 67 passes through main supply 68 and Liang Gen branch supplying tubing 70 is piped by force feed to 20 side of gap nozzle, and is sprayed from a pair of of supply mouth 22 supply to slit Flow path 210 in mouth 20.It is attached in main supplying tubing 68 and Liang Gen branch supplying tubing 70 and is applied material by by interior The leacheate in portion slowly rinses out.Also, it is attached to the material that is applied in gap nozzle 20 to be also leached liquid and slowly rinse out.
Secondly, control unit 50 makes drawdown pump 84 start to act.Make to generate negative pressure in relief groove 83 and discharge piping 81 as a result, (step S3).Then, the leacheate in gap nozzle 20 flows into discharge with gas of the accumulation near outlet 24 together and matches Pipe 81.Gas is removed from the flow path 210 in gap nozzle 20 as a result,.Moreover, to be also leached liquid clear for the inside of discharge piping 81 It washes.Thereafter, leacheate lodges in relief groove 83.
Fig. 7 is the figure of the appearance in the gap nozzle 20 for indicating that step S3 is later.Fig. 8 be making drawdown pump 84 be failure to actuate and The figure (comparative example) of the appearance in gap nozzle 20 when continuing to supply leacheate.In the example of fig. 8, by supply to slit The leacheate of the inside of nozzle 20, in a manner of the ejiction opening 23 for blocking gap nozzle 20 and that adheres to is applied material M such as Apply crunch shown in dotted arrow.Therefore, it as shown in the figure of the middle section of Fig. 8 and lower section, easily becomes following state: being applied A part of cloth material M through penetrating through, thus locate to flow out downwards by leacheate.So, the water flow of leacheate is concentrated on and is applied The part through penetrating through of cloth material M, therefore rinse out and be attached to other materials that are applied of ejiction opening 23 and become extremely difficult.
In contrast, in the present embodiment, as shown in fig. 7, supplying to the leacheate of the flow path 210 in gap nozzle 20 As the dotted line arrows, the outlet 24 on top is flowed to.It therefore, will not be by the elution of supply to the inside of gap nozzle 20 Liquid applies crunch to the material M that is applied adhered in a manner of the ejiction opening 23 for blocking gap nozzle 20.Therefore, may be used Mass erosion is carried out to the surface for being applied material M using leacheate.So, it is not easy to become one that is applied material M The state of lease making perforation.Also, even if a part for being applied material M can also be come through penetrating through by discharge piping 81 is attracted to Leacheate is inhibited to be concentrated to the part.As a result, the quilt for being attached to the ejiction opening 23 of gap nozzle 20 can be removed thoroughly Coating material.
Then, control unit 50 continues to supply leacheate on one side, on one side switchs the 3rd switch valve 71 and the 4th switch valve 72.By This makes the flow velocity of leacheate change (step S4) in main supplying tubing 68 and Liang Gen branch supplying tubing 70.Work as elution When the flow velocity of liquid changes, leacheate can be produced relative to the touching mode for being applied material for the inner wall for being attached to the piping It is raw strong and weak.Also, leacheate is easy the entire surface of touching to the inner wall being piped.It can will be attached to the quilt of the inner wall of piping as a result, Coating material efficiently rinses out.As a result, the amount of the leacheate used to obtain required cleanliness can be reduced, And the cleaning spent time can also be shortened.
Fig. 9 is the exemplary time diagram for indicating the switch motion of the 3rd switch valve 71 or the 4th switch valve 72.In step s 4, As shown in figure 9, switching the 3rd switch valve 71 and the 4th switch valve 72 repeatedly every the defined time.Therefore, with only carry out one The case where secondary closing and the movement of opening, is compared, and can further improve the cleaning effect using leacheate.3rd switch valve 71 and The interval of the switch motion of 4 switch valves 72 and number can be according to the properties for being applied material or required cleanliness that should be removed Carry out any setting.
As described above, being to make main supplying tubing 68 using the 3rd switch valve 71 and the 4th switch valve 72 in the present embodiment And the flow velocity of the leacheate in Liang Gen branch supplying tubing 70 changes.That is, in the present embodiment, the 3rd switch valve and the 4th Switch valve plays a role as flow velocity switching element.If being complicated using switch valve in the composition for not making feed mechanism 60 In the case where the flow velocity of leacheate can be made to change.
Thereafter, control unit 50 stops drawdown pump 84, and the 6th switch valve 92 and the 2nd air switch valve 95 are opened. Then, by the pressurization in relief groove 83, and the leacheate lodged in relief groove 83 is supplied again via circulation piping 91 To deaerating tank 67 (step S5).Supplied again leacheate to deaerating tank 67 with from the newly supplied elution of leacheate supply source 64 Liquid together, is supplied by main supplying tubing 68 and Liang Gen branch supplying tubing 70 to gap nozzle 20.In this way, in this embodiment party In the apparatus for coating 1 of formula, used leacheate circulation for the time being can be made and recycled.Thus, it is possible to which elution is greatly lowered The dosage of liquid.
<5. variation>
More than, one embodiment of the present invention is illustrated, but the present invention is not limited to the embodiments.
Figure 10 is the figure of the composition of the piping system in the apparatus for coating 1 for indicate a variation.In the example in Figure 10, exist Oscillating pump 76 is provided on the path of main supplying tubing 68.Oscillating pump 76 for example Bellofram can be used to pump (bellofram Pump), diaphragm pump (diaphragm pump), bellowspump (bellows pump) etc..When one side is from deaerating tank 67 to slit Nozzle 20 supplies leacheate, and when on one side acting oscillating pump 76, in the inside of main supplying tubing 68, the flow velocity of leacheate can the period Change to property.Therefore, the water flow of leacheate can be assigned without the switch of the 3rd switch valve 71 and the 4th switch valve 72 Power is given, the inner wall of piping is attached to efficiently to clean and is applied material.
As described above, in the example in Figure 10, using oscillating pump 76 as flow velocity switching element.As long as utilizing oscillating pump 76, the flow velocity of the leacheate in piping can be made to become required value by the output pressure of selection oscillating pump 76.Therefore, according to It is applied the viscosity or property of material, the variation of the flow velocity of leacheate can be set as optimum state.
Also, other than switch valve or oscillating pump, for example, it is also possible to using can be to the ratio electricity that flow is adjusted Magnet valve makes the flow velocity of leacheate change.Also, the multiple element can also be combined, make the flow velocity of leacheate It changes.The flow velocity of leacheate in supplying tubing can need not maintain the stream towards positive (plus) of 20 side of gap nozzle Speed.That is, leacheate can also be become temporarily to the shape of 67 side adverse current of deaerating tank during the flow velocity of leacheate changes State.
It also, in said embodiment, is to be supplied from two supply mouths 22 of gap nozzle 20 into gap nozzle 20 It is applied material.It, can also be only by one in the 3rd switch valve 71 and the 4th switch valve 72 but when supply is applied material It opens, and is only supplied from one in two supply mouths 22 into gap nozzle 20 and be applied material.Also, in cleaning slit spray When mouth 20 and piping, both the 3rd switch valve 71 and the 4th switch valve 72 can also be opened, from both two supply mouths 22 to narrow It stitches and supplies leacheate in nozzle 20.
It also, in said embodiment, is that will be applied material and leacheate to pass through shared supplying tubing 68, supply In 70 supply to gap nozzle 20 of piping.But it is also possible to be set as that material and elution will be applied using mutually different piping Liquid is supplied to gap nozzle 20.It is applied for example, it is also possible to be set as in addition being arranged in the discharge piping 81 of gap nozzle 20 The supplying tubing of material supplies quilt into gap nozzle 20 from the supplying tubing via discharge piping 81 and outlet 24 Coating material.Also, it also can be set to when cleaning gap nozzle 20, will be set in the supplying tubing for being applied material Switch valve is closed, and the 3rd switch valve 71 and the 4th switch valve 72 are opened, from branch's supplying tubing 70 via a pair of of supply mouth 22 and supply leacheate into gap nozzle 20.
It also, is in said embodiment, by being pressurizeed from relief groove to deaerating tank again in relief groove Leacheate is supplied, but the feeding method of the leacheate in circulation mechanism is also possible to the side other than the pressurization in relief groove Method.For example, it is also possible to be set as that pump is arranged on the path of circulation piping, recycle leacheate by the pump movement is made.And And the filter (filter) for removing foreign matter can also be set on the path of circulation piping.
Also, the apparatus for coating 1 is the device used in the processing procedure of the substrate itself of manufacture flexible device, but this The apparatus for coating of invention can be used in the processing procedure that the surface of the substrate after device is formed forms protective film.Also, this hair Bright apparatus for coating can be used in the manufacturing process of the liquid crystal display device or semiconductor substrate other than flexible device.And And apparatus for coating of the invention can be also used in the manufacturing process of the batteries such as lithium-ions battery or fuel cell.
Also, it, can also be different from composition shown in each figure of the invention about the discreet portions of apparatus for coating.For example, In order to promote bubble to be discharged from gap nozzle, gradient can also be set in the rising wood of the flow path in gap nozzle.Also, Each element occurred in the embodiment or variation can be suitably combined in the range of not generating contradiction.

Claims (11)

1. the material that is applied as fluid is coated on the face as process object by a kind of apparatus for coating, the painting is arranged It sets and includes:
Nozzle, the ejiction opening comprising ejecting fluid;
Feed mechanism, supply to Xiang Suoshu nozzle selection it is described be applied material and leacheate, the leacheate is that viscosity is low In the fluid for being applied material;And
Control unit controls the feed mechanism, and
The feed mechanism includes:
Supplying tubing is connect with the nozzle;And
Flow velocity switching element makes the speed of fluid change in the supplying tubing,
It is being cleaned in the supplying tubing and the cleaning treatment of the nozzle by the leacheate, the control unit is on one side by institute It states feed mechanism to continue to supply the leacheate, the flow velocity switching element is made to act and send out the speed of the leacheate on one side Changing.
2. apparatus for coating according to claim 1, in which:
The flow velocity switching element includes the switch valve being set in the supplying tubing.
3. apparatus for coating according to claim 1, in which:
The flow velocity switching element includes the pump being set in the supplying tubing.
4. apparatus for coating according to any one of claim 1 to 3, in which:
The control unit acts the flow velocity switching element repeatedly every the defined time when supplying the leacheate.
5. apparatus for coating according to any one of claim 1 to 3, further includes:
Discharge piping, for gas to be discharged from the nozzle;And
The mechanism of decompressor makes to generate negative pressure in the discharge piping, and
The control unit acts the mechanism of decompressor when supplying the leacheate.
6. apparatus for coating according to claim 5, in which:
The mechanism of decompressor includes the relief groove for being connected to the end in downstream side of the discharge piping,
The leacheate for flowing into the discharge piping from the nozzle lodges in the relief groove,
The apparatus for coating further include:
Circulation mechanism supplies the leacheate lodged in the relief groove again to the feed mechanism.
7. apparatus for coating according to claim 6, in which:
The ejiction opening is the opening for being set to the slit-shaped of lower part of the nozzle,
The discharge piping is connect with the outlet on the top for being set to the nozzle.
8. a kind of cleaning method, supplied from supplying tubing to nozzle and from the nozzle in the material that is applied that will be used as fluid In the apparatus for coating that ejiction opening is sprayed, the supplying tubing and the nozzle are cleaned using leacheate, the leaching Washing lotion is viscosity lower than the fluid for being applied material, and the cleaning method comprises the following steps:
A) start to supply the leacheate from the supplying tubing to the nozzle;And
B) after the process a), continue to supply the leacheate on one side, make the elution in the supplying tubing on one side The flow velocity of liquid changes.
9. cleaning method according to claim 8, in which:
In the process b), the flow velocity of the leacheate is made repeatedly to change every the defined time.
10. cleaning method according to claim 8 or claim 9, further includes following process:
C) make to generate negative pressure in discharge piping, the discharge piping is for being discharged gas from the nozzle.
11. cleaning method according to claim 10, further includes following process:
D) leacheate that the discharge piping is flowed into the process c) is supplied again to the supplying tubing Upstream side.
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JP2016064381A (en) 2016-04-28
TWI568505B (en) 2017-02-01

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