CN106115609A - Micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method - Google Patents
Micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method Download PDFInfo
- Publication number
- CN106115609A CN106115609A CN201610490298.8A CN201610490298A CN106115609A CN 106115609 A CN106115609 A CN 106115609A CN 201610490298 A CN201610490298 A CN 201610490298A CN 106115609 A CN106115609 A CN 106115609A
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- Prior art keywords
- micro
- cancerous cell
- detection chip
- hole array
- cell detection
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Investigating Or Analysing Biological Materials (AREA)
Abstract
The present invention provides a kind of micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method, is subordinate to micro-nano technology field, and the method uses the technology of ultraviolet stamping, produces micro through hole array on high molecular film material.The thinking of the method is as light-shielding film at the ledge plating masking layer of transparent mold, process of being in the light when ultraviolet stamping so that it is can not solidify, and remainder is solidified into hole wall structure, cleans glue and prepare via membrane layer and be detection chip after the demoulding.Utilize this chip to may filter that out normal cell, stop the cancerous tumor cell that volume is bigger, then can screen cancerous cell and classification thereof further with existing ripe pathological analysis means.The method can mass low cost produce cancerous cell detection chip, the detection for early-stage cancer provides a kind of effective means.
Description
Technical field
The present invention relates to a kind of novel micro nanometer processing method, be specifically related to a kind of micro through hole array cancerous cell detection chip purple
External pressure print manufacture method, is subordinate to the category of micronano optical.
Background technology
Cancer is to threaten the most important disease of human health, and the 40% of the annual death toll in the whole world comes from cancer, cancer
The Average Survival time limit that people is found to death from detection is only about 2 years.The main factor that Cancer death rate is high is that cancer is examined
Surveying not in time, existing detection method is the most all for middle and advanced stage, and treatment difficulty is the biggest.Progress, human lives along with technology
The raising of level, people's concern to own health, more and more urgent to the demand of cancer detection in early days.
At present, utilize micro through hole array cancerous cell detection chip that cell filters the main method being to detect cancerous cell
One of.The action principle of micro through hole array cancerous cell detection chip swells mainly by the circulation in membrane filtration technique detection blood
Oncocyte and then judge whether cancer has occurred and that, the method is obtaining the extensive pass of academia and industrial circle
Note.Membrane filtration technique utilizes the through hole of silicon nitride or nucleopore membranes to be filtered by the normal cell of small volume in blood and removes, remaining
The cancerous cell that volume is bigger, then further detects cancerous cell to determine its kind.Wherein, silicon nitride through hole array
Chip uses the method for chemical wet etching to make, and the systematicness in hole is preferable, and detection performance is higher, but complex process, technique and material
Cost is the highest, and generally every chip price is up to nearly 1,000 yuan, and high cost limits its range of application so that the overwhelming majority
Crowd can't afford high testing cost.And nucleopore membranes technology is relatively low to the control accuracy of the size in hole, and the arrangement side in hole
, even there is the situation that porous is connected in formula completely random, and therefore accuracy of detection and the detection flux of this technology are the most relatively low, additionally,
Equipment used by nucleopore membranes technology is nuclear reactor or heavy ion avcceleration, and equipment cost is high and more rare.The present invention carries
For a kind of micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method, compared with existing ultraviolet stamping reproduction technology, can
To realize the making without primer through hole array, and all there is the problem that primer cannot directly be removed in prior art, thus realizes height
The controlled making of molecular material micro through hole array cancerous cell detection chip, detects in early days for cancerous cell, screens, diagnoses offer one
Effective solution.
Summary of the invention
For the deficiency in above-mentioned background technology, the present invention provides a kind of micro through hole array cancer based on macromolecular material thin
Born of the same parents' detection chip ultraviolet stamping manufacture method, thus solve existing micro through hole array cancerous cell detection chip manufacture method efficiency relatively
Low, poor controllability, the obtained problem that micro through hole array cancerous cell detection chip accuracy of detection is low, cost is high, for cancerous cell
Early stage detection a kind of effective solution is provided.
A kind of micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method provided by the present invention, the method step
For:
(1) making of imprint master: plating masking layer on transparent mold, thickness is 100nm～2um, then at metal
Coating photoresist, then baked and cured on masking layer, then photoetching development makes photoetching offset plate figure, then through wet etching by light
Figure in photoresist is transferred on metal shadowing layer, finally utilizes plasma etching to transfer on transparent mold by figure, etching
After the thickness of metal masking layer to be ensured more than 100nm, light transmittance is not more than 1%；
(2) impressing solidification: coating light-sensitive material uv glue on imprinting substrates, thickness is at below 100um, by made
Imprint master carries out ultraviolet stamping；
(3) demoulding: after having exposed, separates the imprinting substrates of band light-sensitive material with imprint master；
(4) development: show to fall by light-sensitive material developing liquid developing uncured under metal shadowing layer, obtain the light of band through hole
Quick material membrane；
(5) imprinting substrates separates with via membrane layer: separated with imprinting substrates by light-sensitive material film, obtains via membrane layer, should
Via membrane layer is micro through hole array cancerous cell detection chip.
Described transparent mold can be quartz, the pmma through releasing agent process, fluoride resin.
The mode of described plating masking layer can be the method for magnetron sputtering, electron beam evaporation, vacuum evaporation.
Described imprinting substrates can be aluminium foil, Copper Foil and water solublity uv glue-line.
Described photoetching offset plate figure is the column structure of diameter 6um～50um.
The etching rise of described plasma etching is 10um～30um.
Described developer solution is ethanol or special uv cleanout fluid.
The mode that described imprinting substrates separates with via membrane layer can be Typical physical stripping means or by imprinting substrates
Dissolve the mode leaving behind light-sensitive material film.
Through-hole aperture size in described micro through hole film is 6um～50um, and hole and gap size ratio are 1:1～1:20,
Hole is all-pass structure and arrangement mode can be square, hexagon.
The present invention provides a kind of micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method to have, and performance is good, cost
The feature that low, efficiency is high:
(1) existing silicon nitride micro through hole array uses lithographic etch process to make, and silicon nitride thickness is difficult to persistently reduce, difficult
To make high aspect ratio vias, the gap in hole is relatively big, and density is less, and the method that the present invention provides overcomes this shortcoming.
(2) existing nucleopore membranes technology uses synchrotron radiation light source to irradiate, and then development is made, and pore size differs, and filters
Precision is relatively low, and the present invention uses ultraviolet reproduction technology, light source to be easier to obtain, and aperture periodicity and size uniformity are the most simultaneously
Good, accuracy of detection is higher.
(3) there is the problem that primer cannot directly be removed in existing ultraviolet stamping reproduction technology, and the present invention can realize bottomless
The making of glue through hole array, and the macromolecular material price used is lower, processing technique cost is lower, is beneficial to produce high density
Kong Zhen, and then improve detection efficiency.
Accompanying drawing explanation
Fig. 1 is the flow process signal of micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method provided by the present invention
Figure, wherein, (1) is imprint master schematic diagram, and (2) are impressing solidification process schematic diagram, and (3) are knockout course schematic diagram, and (4) are
Developing process, (5) are via membrane layer and imprinting substrates separation process；Wherein, reference represents respectively: 1 metal shadowing layer,
2 transparent mold, 3 imprinting substrates, photosensitive material layer before 4 solidifications, 5 uv light, photosensitive material layer after 6 solidifications, 7 lead to
Pore membrane layer, 8 uncured light-sensitive materials.
Fig. 2 is the structural representation of micro through hole array cancerous cell detection chip, and wherein, (1) is through hole tetragon arrangement knot
Composition, (2) are through hole hexagon arrangement figure.
Detailed description of the invention
Below in conjunction with the accompanying drawings and embodiment is discussed in detail the present invention, but following example are only limitted to explain the present invention, this
Bright protection domain should include the full content of claim, and by following example, those skilled in the art
To realize the full content of the claims in the present invention.
Embodiment 1
The present embodiment provides a kind of micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method, uses modification transfer
Uv glue material is as photosensitive material layer, and imprinting substrates is that aluminium foil makes micro through hole array cancerous cell detection chip, is embodied as step
Rapid as follows:
(1) making of the transparent mold 2 of the making of imprint master, i.e. band metal shadowing layer 1.Utilize magnetic on a quartz substrate
Control sputter coating machine plates the thick layers of chrome of one layer of 2um, then at layers of chrome surface-coated az1500 photoresist, glue thickness 2um, on hot plate 100
DEG C front baking 10min, then under 365nm ultraviolet exposure machine, utilizes body diameter 6um, square arrangement mode, post and gap-ratio
For the mask plate of 1:20, use contact exposure method, exposure dose 100mJ/cm2, develop 30s, is copied into by mask graph
Photoetching offset plate figure, is placed in chrome liquor and the structure on photoresist is transferred in layers of chrome by wet etching.Wet etching is complete
Finish, the template that quartz is covered with photoresist and layers of chrome structure is put in plasma etching machine, use sulfur hexafluoride and trifluoro
Methane etches, and gas flow is respectively 6sccm, 40sccm, etches power 100w, etch period 6h, etching depth 10um, residue
Layers of chrome thickness is more than 100nm, produces imprint master, as shown in (1) in Fig. 1.
(2) impressing solidification.Imprinting substrates 3 coats the thick modified transfer uv glue 4 of 12um, is imprinted with die at uv light
5 times ultraviolet stampings, wherein ultraviolet light intensity is 12mw/cm2, time of exposure 5s, as shown in (2) in Fig. 1.
(3) demoulding.After having exposed, by with photosensitive material layer 6 and the imprinting substrates of uncured light-sensitive material 8 after solidification
Separate with imprint master, as shown in (3) in Fig. 1.
(4) development.Imprinting substrates is put in ethanol and develops, now by uv glue 8 uncured under metal shadowing layer
It is exactly uv adhesive film after the solidification of noresidue layer (bottom) on imprinting substrates, as shown in (4) in Fig. 1..
(5) imprinting substrates separates with via membrane layer.The uv glue of imprinting substrates He its noresidue layer adhered to above is put into
3min, uv glued membrane 7 and imprinting substrates natural separation in the hot water of 60 DEG C, as shown in (5) in Fig. 1, film now is through-hole structure
Film, in structure such as Fig. 2 shown in (1).
Embodiment 2
The present embodiment provides a kind of micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method, uses modification transfer
Uv glue material is as photosensitive material layer, and imprinting substrates is that Copper Foil makes micro through hole array cancerous cell detection chip, is embodied as step
Rapid as follows:
(1) making of imprint master, the i.e. making of the transparent mold of band metal shadowing layer.At the pmma processed through releasing agent
Utilize vacuum evaporating coating machine to plate the thick layers of chrome of one layer of 500nm in substrate, then at layers of chrome surface-coated SU8 photoresist, glue is thick
10um, 95 DEG C of front bakings 10min on hot plate, then under 365nm ultraviolet exposure machine, utilize Circularhole diameter 15um, hexagon to arrange
Mode, hole are the mask plate of 1:10 with gap-ratio, use contact exposure method, exposure dose 200mJ/cm2, middle baking 95 DEG C
10min, develop 60s, and mask graph is copied into photoetching offset plate figure, places into and passes through wet etching in chrome liquor by photoresist
Structure transfer in layers of chrome.Wet etching is complete, and the template that pmma is covered with photoresist and layers of chrome structure is put in plasma
In body etching machine, using sulfur hexafluoride and fluoroform etching, gas flow is respectively 6sccm, 40sccm, etches power
100w, etch period 4h, etching depth 20um, residue chromium masking layer thickness, more than 100nm, produces imprint master.
(2) impressing solidification.Imprinting substrates coats the thick modified transfer uv glue of 25um, by template ultraviolet stamping, its
Medium ultraviolet light intensity is 12mw/cm2, time of exposure 10s.
(3) demoulding.After having exposed, imprinting substrates is separated with template.
(4) development.Substrate is put in ethanol and shows by uv glue uncured under masking layer.Now on imprinting substrates
It it is exactly the uv adhesive film of noresidue layer (bottom).
(5) imprinting substrates separates with film layer.The uv glue of imprinting substrates He its noresidue layer adhered to above is put into copper rotten
Copper Foil substrate being dissolved away in erosion liquid, film now is the film of through-hole structure, in structure such as Fig. 2 shown in (2).
Embodiment 3
The present embodiment provides a kind of micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method, uses modification transfer
Uv glue material is as photosensitive material layer, and imprinting substrates is that water solublity uv glue material makes micro through hole array cancerous cell detection chip,
It is embodied as step as follows:
(1) making of imprint master, the i.e. making of the transparent mold of band metal shadowing layer.On fluorinated resin materials substrate
Electron beam evaporation deposition machine is utilized to plate the thick layers of chrome of one layer of 100nm, then in layers of chrome surface-coated SU8 photoresist, glue thickness 20um, heat
95 DEG C of front bakings 10min on plate, then under 365nm ultraviolet exposure machine, utilize Circularhole diameter 50um, tetragon arrangement mode, hole
It is the mask plate of 1:1 with gap-ratio, uses contact exposure method, exposure dose 300mJ/cm2, 95 DEG C of 10min of middle baking, development
90s, is copied into photoetching offset plate figure by mask graph, places in chrome liquor and the structure on photoresist is shifted by wet etching
In layers of chrome.Wet etching is complete, and the template that fluoride resin is covered with photoresist and layers of chrome structure is put in plasma etching
In machine, using sulfur hexafluoride and fluoroform etching, gas flow is respectively 6sccm, 40sccm, etches power 100w, etching
Time 10h, etching depth 30um, residue chromium masking layer thickness, more than 100nm, produces impression block.
(2) impressing solidification.Imprinting substrates coats the thick modified transfer uv glue of 35um, by template ultraviolet stamping, its
Medium ultraviolet light intensity is 12mw/cm2, time of exposure 15s.
(3) demoulding.After having exposed, imprinting substrates is separated with template.
(4) development.Substrate is put in uv cleanout fluid and shows by uv glue uncured under masking layer.Now imprint base
It it is exactly the uv adhesive film of noresidue layer (bottom) at the end.
(5) imprinting substrates separates with film layer.The uv glue of imprinting substrates He its noresidue layer adhered to above is put in water
Dissolving away at the bottom of water solublity uv gum base, film now is the film of through-hole structure.
Claims (9)
1. a micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method, it is characterised in that the method step is:
(1) making of imprint master: plating masking layer on transparent mold, thickness is 100nm～2um, then at metal shadowing
Coating photoresist, then baked and cured on Ceng, then photoetching development makes photoetching offset plate figure, then through wet etching by photoresist
On figure transfer on metal shadowing layer, finally utilize plasma etching to transfer on transparent mold by figure, etch complete
After the thickness of metal masking layer to be ensured more than 100nm, light transmittance is not more than 1%；
(2) impressing solidification: coating light-sensitive material uv glue on imprinting substrates, thickness is at below 100um, by made impressing
Die carries out ultraviolet stamping；
(3) demoulding: after having exposed, separates the imprinting substrates of band light-sensitive material with imprint master；
(4) development: show to fall by light-sensitive material developing liquid developing uncured under metal shadowing layer, obtain the photosensitive material of band through hole
Material film；
(5) imprinting substrates separates with via membrane layer: separated with imprinting substrates by light-sensitive material film, obtains via membrane layer, this through hole
Film layer is micro through hole array cancerous cell detection chip.
Micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method the most according to claim 1, it is characterised in that
Described transparent mold can be quartz, the pmma through releasing agent process, fluoride resin.
Micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method the most according to claim 1, it is characterised in that
The mode of described plating masking layer can be the method for magnetron sputtering, electron beam evaporation, vacuum evaporation.
Micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method the most according to claim 1, it is characterised in that
Described imprinting substrates can be aluminium foil, Copper Foil and water solublity uv glue-line.
Micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method the most according to claim 1, it is characterised in that
Described photoetching offset plate figure is the column structure of diameter 6um～50um.
Micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method the most according to claim 1, it is characterised in that
The etching rise of described plasma etching is 10um～30um.
Micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method the most according to claim 1, it is characterised in that
Described developer solution is ethanol or special uv cleanout fluid.
Micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method the most according to claim 1, it is characterised in that
The mode that described imprinting substrates separates with via membrane layer can be Typical physical stripping means or imprinting substrates dissolving be left behind
The mode of light-sensitive material film.
Micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method the most according to claim 1, it is characterised in that
Through-hole aperture size in described micro through hole film is 6um～50um, and hole and gap size ratio are 1:1～1:20, and hole is all-pass
Structure and arrangement mode can be square, hexagon.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201610490298.8A CN106115609A (en) | 2016-06-29 | 2016-06-29 | Micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method |
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| CN201610490298.8A CN106115609A (en) | 2016-06-29 | 2016-06-29 | Micro through hole array cancerous cell detection chip ultraviolet stamping manufacture method |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108732874A (en) * | 2017-04-19 | 2018-11-02 | 蓝思科技（长沙）有限公司 | The cleaning method of uv-curable glue is remained after a kind of nano impression |
| CN112611861A (en) * | 2020-11-23 | 2021-04-06 | 武汉世纪康敏生物科技有限公司 | Fluorescence immunoassay chip and preparation method thereof |
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Application publication date: 20161116 |