CN106067470B - Oganic light-emitting display device - Google Patents

Oganic light-emitting display device Download PDF

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Publication number
CN106067470B
CN106067470B CN201511019279.9A CN201511019279A CN106067470B CN 106067470 B CN106067470 B CN 106067470B CN 201511019279 A CN201511019279 A CN 201511019279A CN 106067470 B CN106067470 B CN 106067470B
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layer
electrode
compensation
compensation layer
compensating material
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CN106067470A (en
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许峻瑛
金英美
朴容敏
郑允燮
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LG Display Co Ltd
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LG Display Co Ltd
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Priority claimed from KR1020150135682A external-priority patent/KR102366022B1/en
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

The present invention relates to a kind of oganic light-emitting display devices.One aspect of the present invention provides a kind of oganic light-emitting display device, comprising: the first electrode on substrate；Organic luminous layer on the substrate；With on the organic luminous layer include at least two layers of second electrode, described at least two layers include the compensating material with different compositions.Another aspect provides a kind of oganic light-emitting display devices, wherein first electrode includes two or more layers, described two or more layers include the compensating material with different compositions, so that forming the compensation layer of thin bilayer on two surfaces of organic luminous layer.

Description

Oganic light-emitting display device
Cross reference to related applications
This application claims enjoy the South Korea patent application No.10-2015-0057471 and 2015 submitted on April 23rd, 2015 The priority on September 24, the South Korea patent application No.10-2015-0135682 submitted of, these patent application documents are for institute Purposefully be incorporated into herein it is for reference, as fully expounding herein.
Technical field
It is aobvious that the present invention relates to the organic light emissions including foreign matter compensation layer (foreign body compensation layer) Show equipment.
Background technique
With the development of Information society, various display equipment for displaying images are needed increasingly to increase. Recently, various display equipment are used for, for example LCD (liquid crystal display), PDP (plasma display panel), OLED (have Machine light-emitting display apparatus) or organic electro-luminescence display device.Various display equipment include corresponding display panel.
In display panel, thin film transistor (TFT) is formed in each pixel region, is controlled by the electric current of thin film transistor (TFT) Specific pixel region processed.Thin film transistor (TFT) is made of gate electrode and source/drain electrodes.
Organic light emitting display includes the luminescent layer formed between two Different electrodes.When the electricity generated by an electrode Son and be injected into luminescent layer by the hole that another electrode generates, injected electrons and hole are bonded to each other, with generate swash Son.Then, generated exciton shines while transitting to ground state from excitation state, therefore shows image.
However, during the manufacturing process of oganic light-emitting display device, molecule is possibly into display equipment, this Grain is referred to as foreign matter.When should when between each electrode for keeping state of insulation there are when foreign matter, may hair between each electrode Raw short circuit, this short circuit may damage specific pixel.Therefore, the short circuit as caused by foreign matter in order to prevent can sprawl thick Material.However, sprawling thick material may be decreased the visibility of oganic light-emitting display device.In addition, due to needing additional technique, It is possible that increasing cost or may be decreased process efficiency.Therefore, it is necessary to one kind to prevent while keeping process efficiency The only construction of foreign matter.
Summary of the invention
In this context, one aspect of the present invention is in order to prevent due to oganic light-emitting display device or display Defect caused by the foreign matter of panel.
Another aspect of the present invention is that side includes foreign matter compensation layer under the cathode, which is for preventing from working as Due to the foreign matter between cathode and anode when being formed thinly cathode in top lighting structure in order to improve the transmissivity of cathode Caused short circuit.
Another aspect of the present invention is the incidence in order to reduce the dim spot as caused by the short circuit between cathode and anode, And thus improve the efficiency of display panel.
Another aspect of the present invention is the short circuit as caused by foreign matter in order to prevent, and is also prevented due to square under the cathode Including for compensating decrease in transmission caused by the compensation layer of foreign matter.
According to an aspect of the present invention, a kind of oganic light-emitting display device includes: in first electrode substantially；It is organic Luminescent layer, the organic luminous layer is on the substrate；And second electrode, the second electrode is in the organic luminous layer On, the second electrode includes at least two layers, and described at least two layers include the compensating material with different compositions.
According to another aspect of the present invention, a kind of oganic light-emitting display device is provided, so that second electrode includes compensation Layer and electrode layer, the compensation layer and electrode layer are sequentially to be arranged since organic luminous layer, and include in compensation layer Compensating material composition ratio be greater than electrode layer in include compensating material composition ratio.
According to another aspect of the present invention, a kind of oganic light-emitting display device is provided, so that second electrode includes compensation Layer, and first electrode includes electrode layer and compensation layer, and the electrode layer and compensation layer are sequentially arranged since substrate, The composition ratio of the compensating material of the compensation layer is greater than the composition ratio of the compensating material of the electrode layer.
According to another aspect of the present invention, a kind of oganic light-emitting display device includes: substrate；First electrode, described One electrode is on the substrate；Organic luminous layer, the organic luminous layer is on the first electrode；And second electrode, institute State the composition of the compensating material of second electrode close to the organic luminous layer the first interface and with first boundary It is different at the opposite second contact surface in face.
According to another aspect of the present invention, a kind of oganic light-emitting display device is provided, so that the compensation in second electrode The composition ratio of compensating material of the composition ratio of material in first interface highest, the second electrode is described It is minimum at second interface.
According to another aspect of the present invention, a kind of oganic light-emitting display device is provided, comprising: substrate；First electrode, institute State first electrode on the substrate；Organic luminous layer, the organic luminous layer is on the first electrode；And second electricity Pole, for the second electrode on the organic luminous layer, the second electrode includes at least two layers, at least two layers of packet Containing the compensating material with different compositions.
According to another aspect of the present invention, a kind of oganic light-emitting display device is provided, comprising: substrate；First electrode, institute State first electrode on the substrate；Organic luminous layer, the organic luminous layer is on the first electrode；And second electricity Pole, the second electrode is on the organic luminous layer, wherein at least one of the first electrode and the second electrode are wrapped Two or more layers are included, described two or more layers include the compensating material with composition different from each other.
According to another aspect of the present invention, a kind of oganic light-emitting display device is provided, comprising: substrate；First electrode, institute State first electrode on the substrate；Organic luminous layer, the organic luminous layer is on the first electrode；And second electricity Pole, the second electrode is on the organic luminous layer, wherein at least one of the first electrode and the second electrode are wrapped The first interface close to the upper surface of the organic luminous layer and the second contact surface opposite with first interface are included, it is described The compensating material of first interface and the second contact surface has composition different from each other.
As described above, according to the present invention it is possible to a kind of oganic light-emitting display device is realized, including for compensating foreign matter Compensation layer.Furthermore it is possible to include being used to form compensation by being distinguished during the technique for forming second electrode (such as cathode) The composition ratio or composition of the gas of the compensating material of layer, carry out sedimentary compensation layer.
It is according to the present invention, by the second electrode including compensation layer and electrode layer, can prevent as caused by foreign matter Short circuit between cathode and anode.In addition, foring the compensation layer for ensuring the transmissivity of second electrode, therefore can be improved organic The light efficiency of light-emitting display apparatus.
According to the present invention, by the first electrode including compensation layer and electrode layer, the compensation layer of second electrode can be thinned, Therefore it can be further improved the light efficiency of oganic light-emitting display device.
According to the present invention, during forming layer for compensating foreign matter, since second electrode (such as yin can be being formed Pole) or first electrode (such as anode) during only control compensating material (such as oxygen and ozone) intrinsic standoff ratio without additional Equipment, thus process efficiency can be improved, and process costs can be reduced.
Detailed description of the invention
Above-mentioned and other purposes of the invention, feature and advantage will become clear by following detailed description of the accompanying drawings Chu, in which:
Fig. 1 is the schematic diagram for showing the display equipment of embodiment according to the present invention；
Fig. 2 is the view for showing the structure that can apply organic luminous layer of the invention, first electrode and second electrode；
Fig. 3 is the view of the construction below the second electrode being shown in further detail in the construction of Fig. 2；
Fig. 4 to 6 is the view for showing the cross section of display panel, is provided with including an embodiment party according to the present invention The second electrode of the foreign matter compensation layer of formula；
Fig. 7 to 10 is the cross-sectional view of the display panel of first embodiment according to the present invention；
Figure 11 to 13 is intrinsic standoff ratio, the Yi Jiji for showing the compensating material for being used to form second electrode shown in Fig. 7 to 9 In the view of the composition ratio of the compensating material of intrinsic standoff ratio in the second electrode；
Figure 14 is the cross-sectional view of the display panel of second embodiment according to the present invention；
Figure 15 to 17 is the chart of the composition ratio of the Rep_Comp in the construction for showing Figure 14；
Figure 18 is the cross-sectional view of the display panel of third embodiment according to the present invention；
Figure 19 is that show third embodiment according to the present invention includes the compensation layer of two kinds of materials and the benefit of second electrode Repay the view of material distribution；
Figure 20 to 22 is the view for showing the cross section of display panel, is provided with including another implementation according to the present invention The first electrode of the foreign matter compensation layer of mode；
Figure 23 to 27 is the cross-sectional view of display panel, and the first electrode including foreign matter compensation layer has been shown in particular in each view Embodiment；
Figure 28 is the Cath_Comp for being shown as being used to form the material of second electrode and mends as sputtering to be formed Repay the chart of the relationship between the Rep_Comp of the material of layer；
Figure 29 is that the sheet resistance shown according to an embodiment of the present invention increases according to the intrinsic standoff ratio of Rep_Comp Chart；
Figure 30 is to show the transmissivity chart reduced according to the increase of the thickness for the second electrode for including compensation layer；And
Figure 31 is to show in existing panel and which includes between the panel of the foreign matter compensation layer proposed in the present invention The view compared.
Specific embodiment
Hereinafter, illustrate embodiments of the present invention with reference to the accompanying drawings.When indicating element in figure by appended drawing reference, Identical element will be indicated by identical appended drawing reference, although they are to show in various figures.For further, at this Invention is illustrated below, when the detailed description for the known function and construction that herein are related to may cause subject of the present invention When not knowing, this detailed description will be omitted.
In addition, the art of such as first, second, A, B, (a), (b) or the like may be used when describing component of the invention Language.Each of these terms be not used to limit corresponding component essence, grade or sequence, and be only used for by Corresponding component is distinguished with other component.It is being described to a certain structural detail and another structural detail " connection ", " coupling " or " knot Close " situation in, it should be understood that another structural detail can pass through intermediary element and multiple structural details " connection ", " coupling " Or " combination ", a certain structural detail can also be directly connected to another structural detail or directly contact.
Fig. 1 is the schematic diagram for showing the display equipment of embodiment according to the present invention.
It include wherein being formed along first direction (such as vertical direction) according to the display equipment 100 of embodiment referring to Fig. 1 The display panel of a plurality of First Line VL1 a plurality of second line HL1 to HLn of (such as horizontal direction) formation to VLm and in a second direction 110, for providing the first signal to the first driving unit 120 of a plurality of First Line VL1 to VLm, for second signal to be mentioned It is supplied to the second driving unit 130 of a plurality of second line HL1 to HLn, and single for controlling the first driving unit 120 and the second driving The sequence controller 140 of member 130.
When a plurality of First Line VL1 formed along first direction (such as vertical direction) to VLm and in a second direction (such as water Square to) formed a plurality of second line HL1 to HLn it is intersected with each other when, multiple pixel P are defined in display panel 110.
Each of above-mentioned first driving unit 120 and the second driving unit 130 may include output for image At least one drive integrated circult of the signal of display.
It for example can be vertically in display panel 110 along a plurality of First Line VL1 to VLm that first direction is formed What (first direction) was formed is used to for data voltage (the first signal) being transmitted to the data line of vertical pixel column, the first driving unit 120 can be for providing data voltage to the data drive unit of data line.
In addition, a plurality of second line HL1 to HLn formed in a second direction in display panel 110 can be along level side What is formed to (second direction) is used to for scanning signal (the first signal) being transmitted to the grid line of horizontal lines, and the second driving is single Member 130 can be for providing scanning signal to the drive element of the grid of grid line.
In addition, going back configuration in display panel 110 to access the first driving unit 120 and the second driving unit 130 Welding disk.When the first driving unit 120 provides the first signal to a plurality of First Line VL1 to VLm, welding disk is by the first signal It is transmitted to display panel 110.In an identical manner, when the second driving unit 130 provides second signal to a plurality of second line HL1 When to HLn, second signal is transmitted to display panel 110 by welding disk.
Each pixel includes at least one sub-pixel.Sub-pixel indicates the list that can wherein form a kind of specific colour filter Member, or do not form colour filter wherein but emit a kind of unit of the light of specific color by organic luminescent device.In sub-pixel The color of middle restriction may include red, green and blue, and the property of can choose include white.However, the present invention is unlimited In this.Because each sub-pixel includes additional thin film transistor (TFT) and the electrode that connect with thin film transistor (TFT), hereinafter, The sub-pixel for constituting pixel is referred to as a pixel region.
The electrode that the thin film transistor (TFT) luminous with control of each pixel region in display panel is connect is referred to as first Electrode.It is arranged in the front surface of display panel or is set as including that the electrodes of two or more pixel regions is referred to as second Electrode.When first electrode is anode electrode, second electrode is cathode electrode, and vice versa.It hereinafter, will be with anode electrode Embodiment and cathode electrode as first electrode as describing this specification based on the embodiment of second electrode, but It is that the invention is not limited thereto.
Meanwhile oganic light-emitting display device includes top light emitting, bottom-emission, bidirectional luminescence etc..Although may be selected to appoint What emission type, but in the large-area displays panel for increasing display panel area, the region that should execute technique broadens, Therefore a possibility that foreign matter enters is increased.In particular, the first short-circuit electricity originally should not occur in process when foreign matter enters When region between pole and second electrode, it may occur however that short circuit, therefore corresponding pixel area may be used as dim spot (dark spot) Work.
Fig. 2 is the view for showing the structure that can apply organic luminous layer of the invention, first electrode and second electrode.Have Machine luminescent layer is arranged between first electrode 210 and second electrode 290.Display panel can have as shown in appended drawing reference 201 One organic luminous layer can have as shown in appended drawing reference 202 there are two organic luminous layer, can also be such as 203 institute of appended drawing reference Showing tool, there are three organic luminous layers.
In the situation of appended drawing reference 201, organic luminous layer 220 emits white light.
In the situation of appended drawing reference 202, the first luminescent layer 230 can emit blue light, and the second organic luminous layer 240 can To emit any one of green light or yellow-green light.
In the situation of appended drawing reference 203, the first luminescent layer 250 can emit blue light, and the second organic luminous layer 260 can To emit any one of green light or yellow-green light, third luminescent layer 270 can emit both red light and blue light.
The dopant of specific color can be adulterated, in the configuration in figure 2 to emit the light of specific color.
Each luminescent layer in appended drawing reference 201,202 and 203 can be selected with embodiment according to the present invention and differently Various colors combination, and the invention is not limited thereto.
In the configuration in figure 2, first electrode 210 can be as the electrically conducting transparent material with high conductivity and high work function Tin indium oxide (ITO), the indium zinc oxide (IZO), IGZO, SnO of material2, ZnO etc..In addition, when first electrode 210 includes having When the metal of low work function, first electrode 210 can be Al, Ag, Mg, Li, Ca etc., and but not limited to this.Second electrode 290 It can be above-mentioned transparent conductive material ITO, IZO, IGZO, SnO with high work function2, ZnO etc..In addition, when the second electricity When pole 290 includes the metal with low work function, second electrode 290 can be Al, Ag, Mg, Li, Ca etc., but be not limited to This.
Fig. 3 is the view of the construction below the second electrode being shown in further detail in the construction of Fig. 2.
Organic luminous layer described above can be divided into luminescent layer (EML), electron injecting layer (EIL), electron-transport Layer (ETL), hole transmission layer (HTL), hole injection layer (HIL) etc..In addition, when including two or more in organic luminous layer It when more EML, can be set charge generation layer (CGL), CGL is used to the Charge controlled between upper and lower two organic luminous layers be flat Weighing apparatus.
And the construction of the luminescent layer 220,240 and 270 below second electrode include buffer layer 318, EIL316, ETL314, The EML312 and HIL310 of specific color.
In figs 2 and 3, when foreign matter enters the region between first electrode 210 and second electrode 290, to due to foreign matter And when leading to occur between first electrode 210 and second electrode 290 short circuit, respective pixel does not shine.When in order to prevent this When putting and being formed very thick by the region between first electrode 210 and second electrode 290, such as increase the thickness of buffer layer 318 Degree, it may occur that the problem of light efficiency reduces.
It include the organic hair for being used to compensate the compensation layer of foreign matter below second electrode by description in this explanation below Photosphere.In particular, compensation layer can formed second electrode technique during make constitute compensation layer compensating material in include Gas composition ratio or composition amounts it is different, without additional technique.
According to embodiment of the present invention, constituent can according to second electrode and buffer layer distance and It is different.More specifically, second electrode can be divided into electrode layer and compensation layer.Alternatively, second electrode It may be formed so that the composition material adjacent to the second electrode of the interface of buffer layer is different from the boundary far from buffer layer The composition material of second electrode at face.For this purpose, including in the present invention compensating material, in the lower part of second electrode High resistance area is formed, forms low resistance region in the upper part of second electrode, middle-lower part is close to buffer layer Region, upper part are the regions far from buffer layer.Therefore, high resistance area is used as the compensation layer of compensation foreign matter, low resistance region As the electrode layer for receiving basic electric power.
Fig. 4 to 6 is the view for showing the cross section of display panel, is provided with including an embodiment party according to the present invention The second electrode of the foreign matter compensation layer of formula.The construction of Fig. 4 can be applied to the appended drawing reference 201 of Fig. 2.The construction of Fig. 5 can be with It is applied to the appended drawing reference 202 of Fig. 2.The construction of Fig. 6 can be applied to the appended drawing reference 203 of Fig. 2.
In Fig. 4 to 6, sectional shows each layer.Organic luminous layer described above may include ETL, EML and HTL, and selectively can include EIL and HIL according to the position of first electrode 210 and second electrode 490.In addition, CGL It can be arranged between organic luminous layer.
In Fig. 4 to 6, the number for being shown in which organic luminous layer is one, two or three situation as real Mode is applied, but the invention is not restricted to this.In Fig. 5, the first luminescent layer 240 can emit yellow-green light or green light, the Two luminescent layers 230 can emit blue light, and can emit white light by combining these colors.Even if, can also in Fig. 6 To emit white light by the color for combining three kinds of luminescent layers 250,260 and 270.In the construction of Fig. 4 to 6, second electrode It is divided into two layers including compensation layer.In addition, even if in the situation that wherein thinly should sprawl second electrode, second Electrode also includes the compensation layer for preventing the short circuit of the K-A as caused by foreign matter.In addition, in order to improve the luminous effect of white light Rate, in the present invention, below second electrode formed ensure second electrode transmissivity compensation layer to improve light efficiency, without It is to form the compensation layer with low transmission rate.
In Fig. 4 to 6, second electrode 400 is divided into electrode layer 490 and compensation layer 480.Two above-mentioned layers can root It is distinguished according to the composition ratio for the compensating material for forming compensation layer.Therefore, the interface between two layers may not be to be apparent. That is, electrode layer 490 and compensation layer 480 may not be to be distinguished by an accurate interface in second electrode 400.So And second electrode 400 may include high resistance area and the low resistance region as two regions, the wherein distribution of compensating material Higher high resistance area may be used as the compensation layer 480 of compensation foreign matter, and the lower low resistance region of the distribution of compensating material It may be used as receiving the electrode layer 490 of electric power.
In Fig. 4 to 6, compensation layer 480 can be by controlling compensation gas during the technique for forming second electrode 400 Injection rate is formed.For example, initially a large amount of injections are used for shape while sputtering is used to form the material of second electrode 400 At the compensating material of compensation layer 480, injection rate then can be progressively decreased.Therefore, in the region adjacent to buffer layer 318 Form the compensation layer 480 of high resistance area.In addition, after reducing the injection rate of compensating material, it can be on compensation layer 480 Form electrode layer 490.Compensating material described above can be combined with the electrode material for forming electrode layer 490.In addition, conduct One embodiment, compensating material described above can be the material of the resistance for improving electrode layer 490.
Second electrode 400 may include electrode material and compensating material, they are two kinds of materials.Unquestionably, Every kind of material can be the compound of another material.In second electrode 400, in compensation layer or high resistance area 480 Ratio between electrode material and compensating material is different from electrode material and compensation material in electrode layer or low resistance region 490 Ratio between material.
Hereinafter, for ease of description, electrode material is expressed as " Cath_Comp ", and compensating material is expressed as " Rep_ Comp".The configuration for forming " Rep_Comp " of compensation layer 480 and electrode layer 490 can be close with the configuration of " Rep_Comp " Increase in the upper interface of second electrode 400.Alternatively, the composition ratio of " Rep_Comp " can be in compensation layer 480 and electrode It is clearly distinguished out in layer 490.
Cath_Comp as electrode material can be SnO2, ITO, IZO, IGZO etc., but not limited to this.In addition, When using at least two materials, in order to distinguish these materials, serial number can be added, as Cath_Comp1, Cath_Comp2, Cath_Comp3 etc..
Rep_Comp as compensating material is combined with conductive material, thus has high-resistance property.As one Embodiment, Rep_Comp can be O2、O3、CO2、CH4、CH4O、CCl4、NO、N2、H2S etc., but not limited to this.In addition, If using two or more materials, in order to distinguish these materials, serial number can be added, as Rep_Comp1, Rep_Comp2, Rep_Comp3 etc..
In addition, can be write side by side corresponding when combining two or more materials in such as technique of sputtering etc Material.For example, if Cath_Comp and Rep_Comp be such as sputtering etc technique in deposit two kinds of materials when, The combination of Cath_Comp and Rep_Comp is expressed as Cath_Comp+Rep_Comp.When the composition ratio of every kind of material has been determined When, bracket can be used and write composition ratio side by side, such as Cath_Comp (90%)+Rep_Comp (10%).
As first embodiment of the invention, the example for wherein distinguishing compensation layer 480 and electrode layer 490 is described.Root According to the distribution or composition ratio of compensating material, compensation layer 480 may include two or more different layers.
Fig. 7 to 10 is the cross-sectional view of the display panel of first embodiment according to the present invention.For ease of description, do not show The EIL of the lower section of buffer layer 318 is to first electrode 210 out.
Fig. 7 show wherein do not include in the electrode layer 490a of first embodiment according to the present invention compensating material configuration 411, and the wherein compensation layer configuration 412 different with the composition ratio of the compensating material in electrode layer.
In Fig. 7, one layer can be deposited during the sputtering method in the technique for forming second electrode 400a and 400b Cath_Comp.Sputter Cath_Comp and Rep_Comp, and shape in the state of wherein increasing the intrinsic standoff ratio of Rep_Comp At compensation layer 480a and 480b, the intrinsic standoff ratio of Rep_Comp is then reduced.Alternatively, can only sputter Cath_Comp come into Row deposition, without sputtering Rep_Comp.However, even if depositing Cath_Comp only wherein to form the feelings of electrode layer 490a In shape, since a small amount of Rep_Comp kept in process chamber still may be used in electrode layer 490b as shown in appended drawing reference 412 It can include Rep_Comp.It does not wherein include Rep_Comp as compensating material in electrode layer 490a that appended drawing reference 411, which is shown, Situation.
As an embodiment of appended drawing reference 412, when Cath_Comp is IZO and Rep_Comp is O2When, O2's Intrinsic standoff ratio can increase, to form the compensation layer 480b as InZnOy.Furthermore it is possible to form electrode layer with InZnOx 490b.Here, the relationship of " x < y " is formed.Due to O2Or O3Intrinsic standoff ratio it is lower in sputtering technology, therefore InZnOx constitute Low resistance film, thus become electrode layer.Due to O2Or O3Intrinsic standoff ratio it is higher in sputtering technology, therefore InZnOy constitute it is high Resistive film, thus become compensation layer." x " can have value 1 to 2, and " y " can have value 2 to 3.Here, as an embodiment party Formula, in Ar and O2Ratio in increase O2It is formed after compensation layer 480b under the state (for example, 16%) of partial pressure, in Ar and O2 Ratio in reduce O2Electrode layer 490b is formed under the state (for example, 9%) of partial pressure.Therefore, the O of compensation layer 480b is formed2's Ratio (for example, A%) is higher than the O for forming electrode layer 490b2Ratio (for example, B%).
Intrinsic standoff ratio indicates the ratio of the Rep_Comp among the indoor various gases of processing in sputtering technology, the ratio It is not the composition ratio for the Rep_Comp being utterly equal in compensation layer 480b.However, since intrinsic standoff ratio is higher, Rep_Comp Composition ratio it is higher, therefore sputtering technology can be executed, so that the intrinsic standoff ratio of the Rep_Comp in compensation layer is higher than electrode The intrinsic standoff ratio of Rep_Comp in layer.
Fig. 8 shows the configuration of the compensation layer including first embodiment according to the present invention, and here, compensation layer includes it Two different layers of the composition ratio of middle Rep_Comp.
Cath_Comp is deposited on buffer layer 318, Rep_Comp is deposited with conventional intrinsic standoff ratio.Form wherein Rep_Comp Constitute the first compensation layer 480c of C%.Rep_Comp is set on the first compensation layer 480c with reduced intrinsic standoff ratio, to form it Middle Rep_Comp constitutes the second compensation layer 480d of D%.Next, not sputtering Rep_Comp, Cath_Comp is only deposited.
In fig. 8, the first compensation layer 480c and the second compensation layer 480d includes identical Rep_Comp, in depositing operation Intrinsic standoff ratio has differences, and the composition ratio of the Rep_Comp of the first compensation layer 480c becomes C%, the Rep_ of the second compensation layer 480d The composition ratio of Comp becomes D%, therefore the first compensation layer 480c and the second compensation layer 480d has the relationship of " C > D ".
Fig. 9 show wherein first embodiment according to the present invention compensation layer include Rep_Comp composition ratio it is different The configuration of three layers.It is identical as Fig. 7 and 8, Cath_Comp is deposited on buffer layer 318.By by the first rank in three phases Section reduces the intrinsic standoff ratio of Rep_Comp to deposit Rep_Comp, forms the first compensation layer 480e.By being reduced in second stage The intrinsic standoff ratio of Rep_Comp and Rep_Comp is deposited on the first compensation layer 480e, to form the second compensation layer 480f.Pass through The intrinsic standoff ratio that Rep_Comp is reduced in the phase III forms third compensation layer 480g on the second compensation layer 480f.Next, not Rep_Comp is sputtered, Cath_Comp is only deposited.Technique can be executed as follows: as Rep_Comp is close to electricity Pole layer 490d and reduce intrinsic standoff ratio, and the relationship of the composition ratio of the Rep_Comp in each compensation layer can have " E > F > The relationship of G ".
Simultaneously as although not sputtering Rep_Comp, Rep_Comp is likely to remain in process chamber, so forming electricity The material of pole layer 490d can be Cath_Comp+Rep_Comp (P%).In this case, P can be less than G.As one Embodiment, E, F, G and P can have the relationship of " P < < G < F < E ".
Since different compensating materials in Fig. 7 to 9 forms the second electrode 400 in each layer, so a large amount of wherein Ground prevents the cathode-as caused by the foreign matter being externally entering in the compensation layer 480 comprising the high resistance area of compensating material Anode in short circuit, thus a possibility that preventing dim spot.
Interface between compensation layer and electrode layer or the boundary between compensation layer are being shown in a manner of dotted line in Fig. 4 to 9 Face is in order to which the composition ratio for being shown at the front and back region at these interfaces as the Rep_Comp of compensating material may be gradually Variation.Compensating material distribution of 0 description at two interfaces 910 and 920 referring to Fig.1.
In Figure 10, the Ref_Comp 1010 of the second compensation layer 480f is made of very high density, i.e. F%.Meanwhile The composition ratio of Ref_Comp 1010 in third compensation layer 480g is G%, lower than the Ref_Comp in the second compensation layer 480f 1010 composition ratio.In addition, the composition ratio of the Ref_Comp 1010 in electrode layer 490d is P%, it is one low-down Ratio.Here, the composition density of Ref_Comp 1010 can be different based on interface 910 and 920, but composition density may It is not clearly to distinguish, and may be gradually lowered.This is because even if in the process chamber for executing sputtering technology no longer In the situation for depositing Ref_Comp, still the ratio of components of Ref_Comp can be led to due to Ref_Comp remaining in process chamber Rate may have mistake.Present invention can apply to whole embodiments, such as two based on second electrode interfaces, adjacent to The embodiment of the compensating material for compensating foreign matter between the interface of buffer layer and the interface of separate buffer layer, such as formed The material of high resistance membrane is gradually lowered composition ratio or with the reduction of ladder type.
Figure 11 to 13 is intrinsic standoff ratio, the Yi Jiji for showing the compensating material for being used to form second electrode shown in Fig. 7 to 9 In the view of the composition ratio of the compensating material of intrinsic standoff ratio in the second electrode.
The appended drawing reference 1101 of Figure 11 is the intrinsic standoff ratio of the Rep_Comp in the technique for forming second electrode 400b, is equivalent to The appended drawing reference 412 of Fig. 7.Appended drawing reference 1102 is shown to be equal to the second electrode 400b that the intrinsic standoff ratio of appended drawing reference 1101 is formed In Rep_Comp composition ratio.In appended drawing reference 1102, the composition ratio of Rep_Comp is in second electrode 400b Interface between compensation layer 480b and electrode layer 490b rapidly reduces.At the interface contacted with buffer layer 318 and with second Between the interface of electrode 490b contact, compensation layer 480b is formed.After forming buffer layer 318, sputtering forms second electrode The Cath_Comp material of 490b, and can sputter to be used as in the sputtering technology of Cath_Comp material and be used to form compensation layer The Rep_Comp of the material of 480b.
The appended drawing reference 1201 of Figure 12 is the Rep_Comp during the technique for forming second electrode 400c as shown in Figure 8 Intrinsic standoff ratio.The Rep_ that appended drawing reference 1202 is shown to be equal in the second electrode 400c that the intrinsic standoff ratio of appended drawing reference 1201 is formed The composition ratio of Comp.In appended drawing reference 1202, first compensation of the composition ratio of Rep_Comp in second electrode 400c The interface between interface and the second compensation layer 480d and electrode layer 490c between layer 480c and the second compensation layer 480d is fast It reduces fastly.
The appended drawing reference 1301 of Figure 13 is the Rep_Comp during the technique for forming second electrode 400d as shown in Figure 9 Intrinsic standoff ratio.The Rep_ that appended drawing reference 1302 is shown to be equal in the second electrode 400d that the intrinsic standoff ratio of appended drawing reference 1301 is formed The composition ratio of Comp.In appended drawing reference 1302, first compensation of the composition ratio of Rep_Comp in second electrode 400d The interface between interface and the second compensation layer 480f and electrode layer 490d between layer 480e and the second compensation layer 480f is fast It reduces fastly.
After forming buffer layer 318, Rep_Comp and Cath_Comp is sputtered, by such as passing through 1301 institute of appended drawing reference Show reduces intrinsic standoff ratio to deposit Rep_Comp, to form first, second, and third compensation layer 480e, 480f and 480g stage by stage. However, may include residue Rep_ in electrode layer 490d even if sputtering Cath_Comp only to form electrode layer 490d Comp.Therefore, the Rep_Comp of very low amount such as P% may have also been remained in second electrode 490d.
The intrinsic standoff ratio being distributed in compensation layer and electrode layer is corresponding to the appended drawing reference 1101 in Figure 11 to 13,1201 and 1301.Therefore, as formed compensation layer material Rep_Comp distribution (or composition ratio) compensation layer 480b, It is higher in the region of 480c, 480d, 480e, 480f and 480g, and the distribution (or composition ratio) of Rep_Comp is in electrode layer It is lower in 490b, 490c and 490d.
As described above, according to the present invention, due to that may not necessarily be individually formed compensation layer, and the property of can choose input Formed compensation layer material, therefore can produce can simplify technique and can not need additional materials or technique and The display panel and display equipment of foreign matter are compensated in the case where equipment investment.Furthermore it is possible to reduced by foreign matter compensation layer by The ratio of defects of dim spot occurs caused by foreign matter, therefore the quality of display panel can be improved.
As second embodiment of the present invention, provides one kind and be wherein gradually lowered benefit in compensation layer and electrode layer Repay the distribution of material or the example of composition ratio.In first embodiment described above, in sputtering technology stage by stage Control the intrinsic standoff ratio of the Rep_Comp as compensating material.Therefore, in this second embodiment, do not formed and wherein constitute compensation layer There is the interface of sharply difference with the composition ratio of the compound of electrode layer, but be gradually lowered Rep_Comp.Therefore, according to Second embodiment forms second electrode, rather than forms the compensation layer individually distinguished.Second electrode can be formed to make The composition ratio for obtaining Rep_Comp is higher in the interface close to buffer layer, and the composition ratio of Rep_Comp is on opposite boundary It is lower at face.
Figure 14 is the cross-sectional view of the display panel of second embodiment according to the present invention.For ease of description, it is not shown The EIL of the lower section of buffer layer 318 is to first electrode 210.In order to show the composition ratio or distribution of Rep_Comp, Rep_ is constituted The molecule of Comp is shown as appended drawing reference 1410.In second electrode 1490, the composition ratio of Rep_Comp 1410 with it is slow Rush higher in the region of the interface 1490a of the contact of layer 318, and the composition ratio of Rep_Comp 1410 is between buffer layer 318 It separates and lower in the region of the interface 1490b far from buffer layer 318.Therefore, the shape in the region close to buffer layer 318 At high resistance membrane, thus to provide the function of compensation layer close to the region of buffer layer 318, and in separate buffer layer 318 Low resistance film is formed in region, thus provides the function of electrode layer for the region far from buffer layer 318.Therefore, electrode is led It is electrically improved in low resistance film, the function for compensating foreign matter improves in high resistance membrane.More specifically, close to having The composition of compensating material at first interface 1490a of machine luminescent layer is different from second boundary opposite with the first interface 1490a The composition of compensating material at the 1490b of face.As described in referring to Fig.1 0, the composition ratio of compensating material 1010 is at random interface Different situations also reflects the embodiment of Figure 14 in 910 and 920.
Figure 15 to 17 is the chart of the composition ratio of the Rep_Comp in the construction for showing Figure 14.It shows by sputtering In gradually control the intrinsic standoff ratio of Rep_Comp and the Rep_ between two the interfaces 1490a and 1490b of second electrode that are formed The composition ratio of Comp.
As third embodiment of the present invention, at least two Rep_Comp materials can be used and form compensation layer.For example, Rep_Comp1 and Rep_Comp2 can be used and form compensation layer, to improve the performance of foreign matter compensation.Rep_Comp1 can be with Cath_Comp is deposited together, to form high resistance membrane.Rep_Comp2 can be deposited together with Cath_Comp to form its resistance The low resistance film of resistance lower than Rep_Comp1.
Figure 18 is the cross-sectional view of the display panel of third embodiment according to the present invention.Appended drawing reference 1801 is two of them Compensating material forms the embodiment of second electrode 1800a, second electrode 1800a include two layers of compensation layer 1881 and 1882 with And electrode layer 490.Rep_Comp1 forms the resistive film of resistance of its resistance higher than Rep_Comp2.Appended drawing reference 1802 is wherein Three kinds of compensating materials form the embodiment of second electrode 1800b, second electrode 1800b include three layers compensation layer 1883, 1884 and 1885 and electrode layer 490.Rep_Comp3 forms the resistive film of resistance of its resistance higher than Rep_Comp4.Rep_ Comp4 forms the resistive film of resistance of its resistance higher than Rep_Comp5.As set forth above, it is possible in electrode layer 490, with benefit It includes compensating material that layer, which is repaid, compared to low-down ratio.
Figure 19 is that show third embodiment according to the present invention includes the compensation layer of two kinds of materials and the benefit of second electrode Repay the view of the distribution of material.The Rep_Comp1 for constituting the first compensation layer 1881 of the appended drawing reference 1801 of Figure 18 is marked as Appended drawing reference 1910, the Rep_Comp2 for constituting the second compensation layer 1882 of the appended drawing reference 1801 of Figure 18 are marked as attached drawing mark Note 1920.First compensation layer 1881 forms high resistance membrane.Second compensation layer 1882 forms the resistance that its resistance is lower than high resistance membrane Resistive film.Electrode layer 490 forms low resistance film, and resistance is lower than the electricity of the resistive film formed by the second compensation layer 1882 Resistance.It may include a small amount of Rep_Comp2 in electrode layer 490.High resistance membrane is formed in the region close to buffer layer 318, Thus to provide the function of compensation layer close to the region of buffer layer 318, and formed in the region far from buffer layer 318 low Resistive film, thus the function of electrode layer is provided for the region far from buffer layer 318.Therefore, the electric conductivity of electrode is in low resistance It is improved in film, the function for compensating foreign matter improves in high resistance membrane.More specifically, close to the of organic luminous layer The composition of compensating material in first compensation layer 1881 of one interface is different from the second contact surface opposite with the first interface The second compensation layer 1882 in compensating material composition.
Meanwhile when the second electrode as described above formed including compensation layer, transmissivity is dropped according to the thickness of compensation layer It is low, therefore the performance of oganic light-emitting display device may deteriorate.That is, due to the thickness for the high resistance membrane that ought be formed in the second electrode When degree increases to improve the compensation performance for foreign matter, decrease in transmission, therefore the thickness of high resistance membrane can be reduced, and this may It will lead to the effect deterioration for preventing foreign matter from entering again.
Therefore, in order to solve the problems, such as the decrease in transmission when forming single compensation layer, the present invention provides a kind of more excellent The oganic light-emitting display device of choosing, wherein double-deck thin compensation layer is formed on two surfaces of organic luminous layer, thus can Decrease in transmission is prevented, and can prevent foreign matter from entering.
Figure 20 to 22 is the view for showing the cross section of display panel, wherein another embodiment according to the present invention is having Thin foreign matter compensation layer is formed on two surfaces of machine luminescent layer, and the view of the cross section of display panel is shown, wherein setting It is equipped with the second electrode including foreign matter compensation layer and the first electrode including foreign matter compensation layer.The construction of Figure 20 is applied to Fig. 2 Construction 201, the construction of Figure 21 is applied to the construction 202 of Fig. 2, and the construction of Figure 22 is applied to the construction 203 of Fig. 2.
In Figure 20 to 22, show the first electrode 2000 being arranged between first electrode 2000 and second electrode 400, Second electrode 400 and organic luminous layer.Second electrode 400 is divided into electrode layer 490 and compensation layer 480.Figure 20 to 22 is shown Wherein the number of organic luminous layer is one, two or three example, and but the invention is not restricted to this.
In Figure 20 to 22, first electrode 2000 is divided into electrode layer 2010 and compensation layer 2020.First electrode 2000 Electrode layer 2010 and compensation layer 2020 it is different from each other based on the composition ratio of compensating material for constituting each of which layer.That is, electric Pole layer 2010 and compensation layer 2020 are distinguished by the clear interface in first electrode 2000.However, first electrode 2000 includes High resistance area and low resistance region, wherein the higher high resistance area of distribution of compensating material is used as the compensation layer of compensation foreign matter 2020, wherein the lower low resistance region of distribution of compensating material is used as the electrode layer 2010 for being applied electric power.
In Figure 20 to 22, by controlling the injection rate of compensation gas in the technique for forming first electrode 2000, formed The compensation layer 2020 of first electrode 2000.For example, initially injection is used when sputtering is used to form the material of first electrode 2000 In the material (hereinafter, being denoted as " An_Comp ") for forming electrode layer 2010, it is then gradually increased as compensating material The injection rate of Rep_Comp.As a result, being formed the compensation layer 2020 of high resistance area adjacent to the region of organic luminous layer.
Al, Ag, ITO etc. are used as the An_Comp of the electrode material of first electrode 2000, but An_Comp is not It is limited to this.First electrode 2000 can be formed with two or more layers, and including reflection electrode layer.
The compensating material for being used to form the compensation layer 2020 of first electrode 2000 is that have height by combination conductive material The O of resistance characteristic2、O3、CO2、CH4、CH4O、CCl4、NO、N2、H2S etc., but not limited to this.It is used to form first electrode The compensating material of 2000 compensation layer 2020 can be equal to or the compensation layer 480 different from being used to form second electrode 400 Compensating material.When the compensating material of first electrode 2000 is material identical with the compensating material of second electrode 400, provide The advantages of identical material can be used in the sputtering technology for being used to form first electrode 2000 and second electrode 400.
Therefore, another embodiment according to the present invention, by formed have two of composition ratio different from each other or More layers forms compensation layer 2020 in first electrode 2000, it is thus possible to the compensation layer 480 of second electrode 400 be thinned The function of compensation foreign matter is realized simultaneously.
Hereinafter, the reality for being formed with the first electrode 2000 of compensation layer 2020 will be specifically described referring to Figure 23 to 25 Apply mode.For ease of description, buffer layer 318 above organic luminous layer 220 is not shown to first electrode 400.
Figure 23 show wherein do not include in electrode layer 2010 compensating material configuration 2301, and wherein compensation layer and electricity The composition ratio of the compensating material of pole layer configuration 2302 different from each other.
In Figure 23, in the technique for forming first electrode 2000a or 2000b, An_ is deposited in a manner of sputtering Comp.That is, forming electrode layer 2010a or 2010b, and in the partial pressure for increasing Rep_Comp while sputtering An_Comp Compensation layer 2020a or 2020b are formed than later.
Do not include Rep_Comp in electrode layer 2010, but is increasing the intrinsic standoff ratio of Rep_Comp to form compensation layer It may partly include Rep_Comp in electrode layer 2010 during 2020.
Figure 24 shows the configuration that wherein first electrode 2000 includes two layers, and the compensating material of the two layers has each other not Same composition ratio.
An-Comp is deposited to form electrode layer 2010c, increases the intrinsic standoff ratio of Rep_Comp then to form compensation layer 2020c and 2020d.By depositing Rep_Comp with constant intrinsic standoff ratio, to form wherein Rep_Comp have composition ratio J% The first compensation layer 2020c, and the intrinsic standoff ratio by increasing Rep_Comp deposits Rep_Comp, forms wherein Rep_Comp The second compensation layer 2020d with composition ratio K%.
In Figure 24, the first compensation layer 2020c and the second compensation layer 2020d are formed to include identical Rep_Comp, But intrinsic standoff ratio has differences during deposition, so that the first compensation layer 2020c includes having composition ratio J% Rep_Comp, the second compensation layer 2020d include that have the relationship between Rep_Comp, J and the K of composition ratio K% be K > J.
Figure 25 is illustrated in detail in the distribution of the compensating material in two interfaces 2410 and 2420 of Figure 24.
In Figure 25, the Rep_Comp 2510 for including in the second compensation layer 2020d has very high composition density K%, The Rep_Comp 2510 for including in first compensation layer 2020c has composition relatively low compared with the second compensation layer 2020d close Spend J%.The composition density of Rep_Comp 2510 has differences around interface 2410 and 2420, but this species diversity is not It clearly distinguishes, composition density is incrementally decreased.Do not include Rep_Comp 2510 in electrode layer 2010c, but is increasing Add the intrinsic standoff ratio of Rep_Comp 2510 to form compensation layer during may include a small amount of Rep_Comp 2510.
That is, another embodiment according to the present invention, by be similar to the benefit for forming compensation foreign matter on the second electrode The mode for repaying layer forms the compensation layer of compensation foreign matter on the first electrode, forms thin compensation layer on the second electrode.Therefore, i.e., Make to form compensation layer on the second electrode, due to the thickness of compensation layer, can also prevent the deterioration of transmissivity.
In above described embodiment, describes and wherein increase (by stages) step by step when forming first electrode A kind of situation of the intrinsic standoff ratio of compensating material.According to another embodiment, by the intrinsic standoff ratio shape for being incrementally increased compensating material Compensation layer is formed at compensation layer, and by using two or more compensating materials.
Figure 26 is to show to be incrementally increased compensating material during forming first electrode according to another embodiment Intrinsic standoff ratio situation view.
As shown in figure 26, when being incrementally increased compensating material, first electrode 2600 is formd, in first electrode 2600 In, from the interface 2690a far from organic luminous layer 220 to the interface 2690b adjacent to organic luminous layer 220, it is incrementally increased Compensating material 2610.Therefore, high resistance membrane is formed in the region adjacent to organic luminous layer 220, for use as compensation layer, and Low resistance film is formed, in the region far from organic luminous layer 220 for use as electrode layer.
Figure 27 shows the first electrode that compensation layer is wherein formed by two or more compensating materials, and first electrode is logical It crosses using Rep_Comp62710 and Rep_Comp72720 formation.Rep_Comp72720 forms resistance ratio Rep_Comp62710 High high resistance membrane.
In Figure 27, by sputtering An_Comp, electrode layer 2010 is formed.By sputtering An_Comp and Rep_ Comp62710 forms the first compensation layer 2020e, by sputtering An_Comp and Rep_Comp72720, forms the second compensation layer 2020f.Second compensation layer 2020f forms high resistance membrane, and the first compensation layer 2020e forms resistance and is lower than the second compensation layer 2020f Low resistance film, electrode layer 2010 formed resistance be lower than the first compensation layer 2020e low resistance film.Adjacent to organic luminous layer High resistance membrane is formed in 220 region, for use as compensation layer, and forms low electricity in the region far from organic luminous layer 220 Film is hindered, for use as electrode layer.
Therefore, in another embodiment of the present invention, the compensation layer with thin bilayer formed on organic luminous layer For preventing foreign matter from entering, and first electrode and second electrode including compensation layer are formed in various ways.For further, It can only include in the first electrode compensation layer, therefore prevent foreign matter to enter, and ensure the highly transmissive of second electrode Rate.
Figure 28 is the Cath_Comp for being shown as being used to form the material of second electrode and mends as sputtering to be formed Repay the chart of the relationship between the Rep_Comp of the material of layer.It as shown in figure 28, can be according to the Cath_ for forming second electrode Comp differently selects and is formed the Rep_Comp as the material for forming compensation layer.Furthermore it is possible to select two or more Rep_Comp illustrates this point to form compensation layer, with reference to Figure 18 and 19.In this case, with buffer layer neighboringly It deposited and be used to form after the material of the Rep_Comp1 of the relatively high high resistance membrane of resistance, can sink on Rep_Comp1 The material of the Rep_Comp2 of resistance of its resistance of product lower than Rep_Comp1.
In addition, as shown in figure 28, due to even in the Cath_Comp as the electrode material and Rep_ as compensating material The relationship graph for promoting the formation of compensation layer is formd in terms of relationship between Comp, therefore can choose such compensation material Material: can be more easier to deposit the compensation function of the compensating material or the compensating material according to the selection of specific electrode material It can be very outstanding.
Figure 29 is that the sheet resistance shown according to an embodiment of the present invention increases according to the intrinsic standoff ratio of Rep_Comp Chart.If when Rep_Comp is O2When intrinsic standoff ratio increase, then the O for including in the compensation layer of second electrode2Amount also increases.Separately Outside, sheet resistance is according to O2Increase and increase.However, the deviation generated according to thickness is not high.
Figure 30 is to show the transmissivity chart reduced according to the increase of the thickness for the second electrode for including compensation layer.Work as packet When including the second electrode of compensation layer and being formed with a certain thickness or higher thickness to prevent foreign matter from entering, it was demonstrated that transmissivity meeting It reduces.The present invention provides forming single high resistance membrane wherein to compensate the basic embodiment of foreign matter, but as shown in figure 30, It additionally provides and wherein forms the compensation layer of thin bilayer and dropped come transmissivity caused by preventing the thickness increase due to single compensation layer Low embodiment.
Figure 31 is to show in existing panel and which includes between the panel of the foreign matter compensation layer proposed in the present invention The view compared.In Figure 31, appended drawing reference 3110 indicates the foreign matter penetrated into panel process.In appended drawing reference 3101, When the infiltration of foreign matter 3110 does not wherein include the second electrode 290 of compensation layer, between first electrode 210 and second electrode 290 Short circuit occurs.In contrast, as passed through shown in appended drawing reference 3102, even if it includes compensation layer 480 and electricity that foreign matter 3110, which penetrates into, The second electrode 400 of pole layer 490 will not be occurred short between first electrode 210 and second electrode 490 by compensation layer 480 Road.Therefore, the defect of such as dim spot etc is not generated.For further, such as appended drawing reference 3103, first electrode 2000 includes mending Layer 2020 and electrode layer 2010 are repaid, so that forming thin compensation layer 480 and 2020 on two surfaces of organic luminous layer 220. For example, each of compensation layer 480 and 2020 is formed with only is forming compensation layer 480 in second electrode 400 Situation in compensation layer 480 a half thickness.In this case, pass through the shape on two surfaces of organic luminous layer 220 At compensation layer 480 and 2020, it is therefore prevented that the short circuit between first electrode 2000 and second electrode 400, and by by second The compensation layer 480 of electrode 400 is formed to have very thin thickness, it is therefore prevented that the transmission caused by the thickness of compensation layer 480 Rate reduces.
Table 1 is the table for showing foreign matter compensation performance according to the present invention.
[table 1]
As disclosed in table 1, do not applying in reference example 1 of the invention, reference example 2 and reference example 3, it is generated dark The average number of point is 242.3, and among these, the number of the dim spot as caused by foreign matter is 181.3.However, according to this hair Bright, the total number of generated dim spot is 125, and the number of the dim spot as caused by foreign matter is 93.Therefore, the present invention, which has, incites somebody to action The number of dim spot reduces half or even more effects.
It includes compensation layer to prevent the electrode as caused by foreign matter that embodiments of the present invention, which provide in display panel, Between short circuit structure.In particular, in transparent conductive oxide (TCO) conduct of deposition such as IZO, ITO and IGZO etc Foreign matter compensation layer is formed in the technique of second electrode, foreign matter compensation layer forms high resistance membrane.It is used as foreign matter compensation layer by reducing Compensating material (that is, Rep_Comp) distribution, in the case where not needing additional technique or extras, one handle Indoor formation second electrode and foreign matter compensation layer.It, can be the oxidation film of the transparent cathode of OLED will likely be become in addition to TCO (such as WO and MO) is applied to second electrode, and the present invention is not limited to the certain material of second electrode.
According to the present invention, because height can be formed without additional technique when there is foreign matter or protrusion on the electrode Resistive film, therefore prevent the short circuit between first electrode (such as anode) and second electrode (such as cathode).Therefore, it reduces Dim spot probability of happening, and increase panel yield.In the present specification, by the technique for forming transparent second electrode Control is used to form the distribution ratio of the compensating material of high resistance membrane, in identical technique or can simultaneously form second Electrode and high resistance membrane.The control of distribution ratio for compensating material described above may include being gradually lowered compensation material The method of the distribution ratio of material discretely forms compensating material and is distributed so that the side that foreign matter compensation layer and second electrode are clearly distinguished Method, etc..Further, it is possible to use two or more foreign matter compensating materials form the high resistance membrane of foreign matter compensation layer, have greatly Cause the resistive film and second electrode of interlaminated resistance.
When sputtering second electrode on panel, due to before compensating material is splashed to second electrode or sputtering In technique, squeezed according to predetermined intrinsic standoff ratio in upper panel point with sedimentary compensation material, so without additional and individual Technique and equipment can include foreign matter collocation structure in the panel.
Description and accompanying drawings described above are intended solely for illustrative purposes and provide the example of technical concept of the invention. Those of ordinary skill in technical field belonging to the present invention is not it is understood that inner characteristic of the invention can departed from In the case where various variant and change in way of realization, such as the combination, separation, displacement and the change that construct.Therefore, in this hair Embodiment disclosed in bright is limited only to describe technical spirit of the invention.Further come It says, the range of technical spirit of the invention is not only restricted to these embodiments.The scope of the present invention should be considered as with such side Formula is based on the appended claims: belonging to this hair being equivalent in each the scope of the claims all technical concepts for including It is bright.

Claims (17)

1. a kind of oganic light-emitting display device, comprising:
Substrate；
First electrode, the first electrode is on the substrate；
Organic luminous layer, the organic luminous layer is on the first electrode；And
Second electrode, for the second electrode on the organic luminous layer, the second electrode includes the first compensation layer, the second benefit Layer and electrode layer are repaid, first compensation layer, the second compensation layer and electrode layer are sequentially set since the organic luminous layer It sets,
Wherein first compensation layer and second compensation layer include the compensating material with different compositions to improve described the The resistance of two electrodes,
Wherein the second compensating material in the first compensating material and second compensation layer in first compensation layer is different ,
Wherein first compensation layer has the resistance higher than the resistance of second compensation layer, wherein near organic hair The compensation layer of photosphere is first compensation layer, and first compensation layer the organic luminous layer and the electrode layer it Between layer among have highest resistance.
2. oganic light-emitting display device according to claim 1, wherein first compensation layer and second compensation layer Each in include compensating material composition ratio be greater than the electrode layer in include compensating material composition ratio.
3. oganic light-emitting display device according to claim 1, wherein the organic luminous layer includes:
First luminescent layer, first luminescent layer is on the first electrode；
Transport layer, the transport layer is on first luminescent layer；And
Second luminescent layer, second luminescent layer in the transport layer,
Wherein correspond to white light from the light that the first luminescent layer of combination with one another and the second luminescent layer emit.
4. oganic light-emitting display device according to claim 1, wherein the compensating material is O2、O3、CO2、CH4、CH4O、 CCl4、NO、N2Or H2Any one of S.
5. oganic light-emitting display device according to claim 1, wherein the first electrode include have it is different from each other Two or more compensation layers of composition.
6. oganic light-emitting display device according to claim 5, wherein the first electrode includes electrode layer and compensation layer, The electrode layer and compensation layer of the first electrode are sequentially arranged since the substrate, the compensation layer of the first electrode Compensating material composition ratio be greater than the first electrode electrode layer compensating material composition ratio.
7. oganic light-emitting display device according to claim 5, wherein the first electrode includes electrode layer, the first compensation Layer and the second compensation layer, the electrode layer of the first electrode, the first compensation layer and the second compensation layer are suitable since the substrate Sequence it is arranged, the compensating material for including in the first compensation layer of the first electrode is different from the second benefit of the first electrode Repay the compensating material for including in layer.
8. oganic light-emitting display device according to claim 5, wherein the first electrode includes the first compensation layer and the Two compensation layers, the compensating material for including in the first compensation layer of the first electrode are equal to the second compensation of the first electrode The compensating material for including in layer.
9. oganic light-emitting display device according to claim 1, wherein the first electrode includes close to described organic First interface of the upper surface of luminescent layer and the second contact surface opposite with first interface, first interface and described The compensating material of second interface has composition different from each other.
10. a kind of oganic light-emitting display device, comprising:
Substrate；
First electrode, the first electrode is on the substrate；
Organic luminous layer, the organic luminous layer is on the first electrode；And
Second electrode, the composition of the compensating material of the second electrode are and described for improving the resistance of the second electrode Composition is not in the first interface close to the organic luminous layer and at the second contact surface opposite with first interface With,
The electrode material for wherein forming the second electrode is IZO, and the compensating material is O2、O3、N2And H2One of S,
Wherein the second electrode includes the first compensation layer, the second compensation layer and electrode layer, first compensation layer, the second compensation Layer and electrode layer are sequentially arranged since the organic luminous layer, wherein first compensation layer has than described second The high resistance of the resistance of compensation layer, wherein the compensation layer near the organic luminous layer is first compensation layer, and institute Stating the first compensation layer has highest resistance among the layer between the organic luminous layer and the electrode layer.
11. oganic light-emitting display device according to claim 10, wherein the group of the compensating material in the second electrode At the composition ratio of compensating material of the ratio in first interface highest, the second electrode at the second contact surface It is minimum.
12. oganic light-emitting display device according to claim 10, wherein the composition ratio of the first compensating material is described First interface highest,
The composition ratio of second compensating material highest at the region between first interface and the second contact surface, and
The composition ratio of first compensating material and second compensating material is minimum at the second contact surface.
13. oganic light-emitting display device according to claim 10, wherein the first electrode include tool there are two or more More compensation layers, described two or more compensation layers include the compensating material with composition different from each other.
14. oganic light-emitting display device according to claim 13, wherein the first electrode includes electrode layer and compensation Layer, the electrode layer and compensation layer are sequentially arranged since the substrate, the composition of the compensating material of the compensation layer Ratio is greater than the composition ratio of the compensating material of the electrode layer.
15. a kind of oganic light-emitting display device, comprising:
Substrate；
First electrode, the first electrode is on the substrate；
Organic luminous layer, the organic luminous layer is on the first electrode；And
Second electrode, the second electrode is on the organic luminous layer, wherein the first electrode and the second electrode At least one include at least the first compensation layer, the second compensation layer and the electrode that are sequentially arranged since the organic luminous layer Layer, wherein first compensation layer and second compensation layer include having the compensating material of composition different from each other to improve At least one described resistance of first electrode and the second electrode is stated,
Wherein the second compensating material in the first compensating material and second compensation layer in first compensation layer is different ,
Wherein first compensation layer is arranged between the organic luminous layer and second compensation layer, and described first mends Layer is repaid with the resistance higher than the resistance of second compensation layer, wherein the compensation layer near the organic luminous layer is described First compensation layer, and first compensation layer has highest among the layer between the organic luminous layer and the electrode layer Resistance.
16. oganic light-emitting display device according to claim 15, wherein first compensation layer and second compensation The composition ratio of the compensating material of each of layer is greater than the composition ratio of the compensating material of the electrode layer.
17. a kind of oganic light-emitting display device, comprising:
Substrate；
First electrode, the first electrode is on the substrate；
Organic luminous layer, the organic luminous layer is on the first electrode；And
Second electrode, the second electrode is on the organic luminous layer, wherein the first electrode and the second electrode At least one include the first interface and opposite with first interface second close to the upper surface of the organic luminous layer The compensating material of interface, first interface and the second contact surface has composition different from each other to improve the first electrode With the resistance at least one described in the second electrode,
Wherein at least one described of the first electrode and the second electrode includes the sequence since the organic luminous layer The first compensation layer, the second compensation layer and the electrode layer of ground setting,
Wherein the second compensating material in the first compensating material and second compensation layer in first compensation layer is different ,
Wherein first compensation layer is arranged between the organic luminous layer and second compensation layer, and described first mends Layer is repaid with the resistance higher than the resistance of second compensation layer, wherein the compensation layer near the organic luminous layer is described First compensation layer, and first compensation layer has highest among the layer between the organic luminous layer and the electrode layer Resistance.
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