CN106066580A - A kind of workbench self adaptation levelling device - Google Patents
A kind of workbench self adaptation levelling device Download PDFInfo
- Publication number
- CN106066580A CN106066580A CN201610378576.0A CN201610378576A CN106066580A CN 106066580 A CN106066580 A CN 106066580A CN 201610378576 A CN201610378576 A CN 201610378576A CN 106066580 A CN106066580 A CN 106066580A
- Authority
- CN
- China
- Prior art keywords
- leveling board
- elastic
- elastic mechanism
- self adaptation
- elastic support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Machine Tool Units (AREA)
- Accommodation For Nursing Or Treatment Tables (AREA)
Abstract
The invention discloses a kind of workbench self adaptation levelling device, including moving mechanism and elastic mechanism, described moving mechanism includes leveling board, described elastic mechanism includes elastic support, elastic mechanism rotating shaft, multiple elastic mechanism elastomeric elements, the plurality of elastic mechanism parts are respectively arranged at the different forced position of described elastic support, described leveling board applies pressure to the elastic mechanism elastomeric element of certain forced position corresponding on described elastic support in the state of stress, the forced position beyond certain forced position described on described elastic support can rotate towards described leveling board around described elastic mechanism rotating shaft, and by corresponding elastic mechanism elastomeric element, elastic force is applied to described leveling board.Its volume of the present invention is little, light weight, and Stability Analysis of Structures is reliable, relates to contact photoetching machine equipment technical field, all applicable to manual alignment positioning and automatically alignment positioning.
Description
[technical field]
The present invention relates to a kind of workbench self adaptation levelling device.
[background technology]
Workbench of lithography machine contact photoetching self adaptation levelling gear is the pass in the core component Alignment stage of litho machine
Key mechanism, this mechanism directly embodies the technical merits such as the development of litho machine, production, manufacture, assembling, is the core skill of litho machine
Art.
The basic application principle of litho machine contact photolithography: self adaptation levelling gear is installed on Z workbench, self adaptation leveling
The slide holder placing wafer is installed in mechanism.Mask blank is fixed on above workbench；During work, by control Z work
Platform rises contact mask blank, it is desirable to wafer is in close contact mask blank, then by the lithography of mask to crystalline substance
On the coated face of disk；Require during lithography that wafer coated face is in close contact completely with mask graph face, could be at crystalline substance
The figure on preferable mask, otherwise, the figure and the figure on mask that duplicate on wafer is obtained on disk coated face
Shape deviant is bigger, causes waste product.Plane error due to manufacture, rigging error and mask blank, it is impossible to ensure crystalline substance
Disk firmly contacts with lithography mask version and fits completely, and wafer coated face exists a key groove with mask graph face, in order to
Eliminating this key groove, workbench must possess self adaptation levelling function, make up manufacture, processing equal error, it is ensured that wafer with
Lithography mask version is in close contact.
The levelling gear of current domestic litho machine configuration, structure is complicated, and volume is big, and quality weight, it is manually right to can be only applied to
Certainly position litho machine, is not suitable for automatically being directed on positioning litho machine.Automatically alignment positioning litho machine, its levelling gear is installed on
On the XY worktable platform that Electronic control moves.
[content of the invention]
In order to overcome the deficiencies in the prior art, the invention provides a kind of reliable and stable workbench self adaptation leveling dress
Put.
A kind of workbench self adaptation levelling device, including moving mechanism and elastic mechanism, described moving mechanism includes leveling
Plate, described elastic mechanism includes elastic support, elastic mechanism rotating shaft, multiple elastic mechanism elastomeric element, the plurality of elastic machine
Structure parts are respectively arranged at the different forced position of described elastic support, described leveling board in the state of stress to described elasticity
On bearing, the elastic mechanism elastomeric element of certain forced position corresponding applies pressure, certain the stress position described on described elastic support
Forced position beyond putting can rotate towards described leveling board around described elastic mechanism rotating shaft, and elastic by corresponding elastic mechanism
Parts apply elastic force to described leveling board.
In one embodiment,
Also including leveling board limiting component, described leveling board limiting component is used for limiting described leveling board puts down in setting height
On face.
In one embodiment,
Described elastic support includes three elastic support arms, and the angle between each elastic support arm is identical, described elasticity
Mechanism's elastomeric element is respectively arranged at the same position of each elastic support arm.
In one embodiment,
Described elastic mechanism also includes elastic mechanism guiding parts, and described guiding parts is used for preventing described elastic support from existing
Rotate in the plane parallel with described leveling board.
In one embodiment,
Described elastic mechanism also includes elastic mechanism guiding parts, and described elastic support is provided with pilot hole, described leveling
Installing described elastic mechanism guiding parts on plate, described elastic mechanism guiding parts is positioned at described pilot hole, prevents described bullet
Property bearing rotates in the plane parallel with described leveling board.
In one embodiment,
Also including substrate, described moving mechanism also includes angular contact bearing, and described substrate is provided with bearing guide type shoe, institute
State elastic mechanism to be arranged between described substrate and leveling board, described angular contact bearing be arranged on described leveling board with substrate phase
To one side, described bearing guide type shoe to described angular contact bearing make roll guide.
In one embodiment,
Also including leveling board limiting component, described leveling board limiting component is used for limiting described leveling board puts down in setting height
On face, described leveling board limiting component includes upper limit position block and lower position block, and described lower position block is fixing on the substrate, institute
Stating upper limit position block to be fixed on described leveling board, described upper limit position block stretches into the lower section of described lower position block.
In one embodiment,
Described angular contact bearing includes the angular contact bearing on three circumference being evenly distributed on leveling board, and described bearing is led
Include three corresponding bearing guide type shoes with three angular contact bearings respectively to bearing.
In one embodiment,
Described elastic mechanism elastomeric element includes ball stud, guide pin bushing, compression spring, spring end cap, on described elastic support
Being provided with guide pin bushing installing hole, described guide pin bushing is fixed in guide pin bushing installing hole, and the main body of described ball stud is positioned at described guide pin bushing and head
Described guide pin bushing is stretched out in portion, and described compression spring is arranged between described ball stud and spring end cap, and described spring end cap is fixed on
On described elastic support.
In one embodiment,
Also including bulb plunger and lower bulb plunger, described upper bulb plunger is fixed on described lower position block, described
Lower bulb plunger is fixed on described substrate, described upper bulb plunger and the lower bulb plunger upper table with described upper limit position block respectively
Face is relative with lower surface.
The invention has the beneficial effects as follows:
Its volume of the present invention is little, light weight, and Stability Analysis of Structures is reliable, relates to contact photoetching machine equipment technical field, opponent
Dynamic alignment positioning and automatically alignment positioning are all applicable.This apparatus structure is compact, easy care；Through experimental test, self adaptation leveling is steady
Fixed reliable.
[brief description]
Fig. 1 is the exploded perspective view of the workbench self adaptation levelling device of an embodiment of the present invention
Fig. 2 is the workbench self adaptation levelling device structural representation of Fig. 1
Fig. 3 is another visual angle exploded perspective view of the workbench self adaptation levelling device of Fig. 1
Fig. 4 is the moving mechanism exploded perspective view of the workbench self adaptation levelling device of Fig. 1
Fig. 5 is the pedestal exploded perspective view of the workbench self adaptation levelling device of Fig. 1
Fig. 6 is the elastic mechanism exploded perspective view of the workbench self adaptation levelling device of Fig. 1
Fig. 7 is the elastic mechanism structural representation of Fig. 6
Fig. 8 is another viewing angle constructions schematic diagram of elastic mechanism of Fig. 7
Fig. 9 is the elastic mechanism one viewing angle constructions schematic diagram of Fig. 6
Figure 10 is the A-A generalized section of the elastic mechanism structure of Fig. 9
Figure 11 is the workbench self adaptation levelling device partial structurtes schematic diagram of Fig. 1
Figure 12 is the workbench self adaptation levelling device structural representation of Fig. 1
Figure 13 is the workbench self adaptation levelling device B-B cross-sectional view of Figure 12
[detailed description of the invention]
Preferred embodiment to invention below is described in further detail.
If Fig. 1 is to shown in 13, the workbench self adaptation levelling device of a kind of embodiment includes: pedestal the 3rd, moving mechanism the 1st, bullet
Property mechanism 2 and slide holder 4.
Pedestal 3 includes substrate the 31st, upper bulb plunger the 35th, lower bulb plunger the 34th, lower limit fixed block the 33rd, locking screw
37th, lock screw the 38th, pad 39 and bearing guide type shoe 32.Lower bulb plunger 34 is installed on substrate 31, upper bulb plunger 35
Being installed on lower limit fixed block 33, in one embodiment, lower limit fixed block 33 has 3, is evenly distributed on substrate 31
Certain circumference on (between adjacent lower limit fixed block 33 become 120 °), (also will adjust for opposing connection motivation structure is spacing about 1
Flat board 11 is limited to setting height), control moving mechanism 1 moving amplitude；By the up-down adjustment of 3 upper bulb plungers 35, can
Opposing connection motivation structure 1 carries out preliminary plane leveling；Simultaneously by up-down adjustment bulb plunger, change the upper and lower displacement of moving mechanism
Amount, the reactive spring force of control elastic mechanism 2 opposing connection motivation structure 1, i.e. realize the contact of regulation moving mechanism 1 original state
Power.
Locking screw 37 is installed on lower limit fixed block 33, is carried out upper bulb plunger 35 certainly by its head
Lock, prevents the loosening of upper bulb plunger 35 that work long hours.
Bearing guide type shoe 32 can have 3, is individually fixed on substrate 31, centered on substrate axis, becomes 120 degree
Uniform, it becomes 60 ° of angles with upper bulb plunger 35, and (i.e. on certain, bulb plunger 35 is positioned at a certain group of adjacent bearing guide type shoe
Between 32).Bearing 12 on the medial surface opposing connection motivation structure 1 of bearing guide type shoe 32 is made scroll-up/down and is guided.Bearing guides and props up
The installing hole of seat 32 is waist-shaped hole, can regulate inwards during installation, eliminates between the bearing 12 in spigot surface and moving mechanism 1
Gap, it is to avoid moving mechanism 1 in moving process because gap rotates.
Bearing guide type shoe 32 is locked by lock screw 38 by compress gasket 39, it is to avoid Long-Time Service process axis
Hold guide type shoe 32 to be subjected to displacement.
Moving mechanism 1 includes leveling board the 11st, bearing block the 18th, eccentric head screw the 19th, alignment pin the 111st, interior hexagonal cylindrical head spiral shell
Silk the 110th, bearing latch the 16th, angular contact bearing the 12nd, bearing spacer the 17th, locking nut the 15th, upper limit position block 13 and guide finger 14 (bullet
Property mechanism guiding parts).
Having 3 groups of step surfaces on leveling board 11, centered on leveling board 11 axis, one-tenth 120 ° is uniform, is used for installing bearing block
18.Carry out precision positioning bearing block 18 by step side and alignment pin 111, use interior hexagonal cylindrical head screw 110 and bias
Head screw 19 is locked, and limits the bearing block 18 all directions free degree.Diagonally contact bearing 12 passes through bearing latch the 16th, axle
Hold spacer 17 to be installed on bearing block 18；Using locking nut 15 to lock, angular contact bearings 12 axially carries out prestretching, disappears
Except bearing clearance；In addition three groups of bearing setting height(from bottom)s are consistent, it is to avoid moving process causes precision unstable because there is guiding clearance.
Upper limit position block is installed on leveling board, and 120 degree uniform, becomes 60 degree of angles with angular contact bearing；By upper limit position block 13 switching peace
Dress mode carries out carrying out spacing to leveling board 11, simplifies leveling board 11 structure and compression integral installation space.Guide finger 14 is installed
On leveling board 11,120 ° centered on the axis of leveling board 11 uniform, with the spacing contact point on upper limit position block 13 in leveling
Same angle on plate 11.Guide finger 14 guides for the tilted upward of elastic mechanism 2, prevents elastic mechanism 2 from occurring when pressurized
Rotate, cause leveling board 11 stability under loading.
Elastic mechanism 2 includes elastic support the 2nd, guide pin bushing the 24th, ball stud the 25th, compression spring the 26th, spring end cap the 27th, rotary shaft
29th, spherical bearing block the 28th, spherical bearing the 22nd, bearing (ball) cover the 210th, spacer 212 and packing washer 211.Wherein, ball stud 25 and pressure
Contracting spring 26 constitutes elastomeric element.Elastic support 2 includes 3 elastic support arms, and the angle between each elastic support arm is identical
(being 120 °).
The main body of ball stud 25, compression spring 26 are installed in guide pin bushing 24, and ball stud 25 can stretch up and down, ball stud 25
Head stretch out guide pin bushing 24；By spring end cap 27, compression spring the 26th, ball stud the 25th, guide pin bushing 24 is fixed on elastic support 23
On；3 groups of ball studs become 120 degree uniform, namely the stress being respectively distributed to each elastic support arm (applies from leveling board 11
Pressure) position.Spherical bearing 22 is installed in spherical bearing block 28, is compressed the outer ring of spherical bearing 22 by bearing (ball) cover 210.
Rotary shaft 29 is connected elastic support 21 with the inner ring interference fits of spherical bearing 22, and centre is separated by spacer 212；Pass through clamping pad
Circle 211 is fixed on elastic support 21 in rotary shaft 29, makes whole elastic support 29 can rotate with rotary shaft 29 moving.Elastic machine
Spherical bearing block 28 on structure 2 is fixed on the substrate 11 of pedestal 1；Now the elastic support 29 on elastic construction 2 all upper and lower around
Move and rotate.
Moving mechanism 1 is installed on above elastic mechanism 2；Now moving mechanism 1 lower surface is by 3 balls on elastic mechanism 2
Head pin 25 supports, simultaneously by compression spring 26 upward reaction force below.It is installed on the lower position block 33 of pedestal 1 three groups
The downward opposing connection motivation structure 1 of upper bulb plunger 35 carries out spacing.Guide finger 14 in moving mechanism 1 and the elasticity on elastic mechanism 2
Waist-shaped hole matched in clearance in bearing 21, limits elastic mechanism 2 and radially (is rotating) rotation in the plane parallel with described leveling board
Turn, moving mechanism 1 stress otherwise can be caused unstable.On pedestal 3 between three groups of bearing guide type shoes 32 and angular contact bearing 12 0
Gap contacts, 120 degree of uniform positioning, limits moving mechanism 1 horizontal-shift and radial rotary.
When the leveling board 11 upper surface certain point stress of moving mechanism 1 extrudes, leveling board 11 run-off the straight of moving mechanism,
Below certain point, the elastic mechanism elastomeric element being positioned at corresponding forced position of elastic mechanism 2 is squeezed simultaneously；Former according to lever
Reason, when the current elastic mechanism elastomeric element stress of elastic mechanism 2 is downward-sloping, elastic support with spherical bearing 22 as fulcrum,
Remaining end of elastic support will be inclined upwardly, and apply relevant pressure to leveling board 11.Due to above moving mechanism 1 by upper ball head column
Filling in 35 spacing, moving mechanism 1 cannot shift up, so that each strong point of elastic mechanism 2 (elastic mechanism elastic force apparatus) is subject to
Identical active force, i.e. often organizes compression spring 26 identical with ball stud 25 stress, and elastic mechanism 2 remains flat with moving mechanism 1
Row state.Being experimentally confirmed, no matter on opposing connection motivation structure 1, any point applies pressure, and its upper surface is had a stress value equal
Approximation.
Slide holder 4 is installed in moving mechanism 1, with moving mechanism 1 moving, replaceable different size wafer-supporting platform.
This device is installed on Z workbench；During work, control Z axis rises, the high point of wafer upper surface coated face and light
Carving mask contact, now contact force is delivered in moving mechanism 1, and the extruding force suffered by moving mechanism 1 is transferred to elastic mechanism 2
On, the elastomeric element of elastic mechanism 2 is also with generation elastic deformation simultaneously；Z axis continues to rise, and wafer coated face and photoetching are covered
The key groove of film version is less and less, until key groove is 0；At Z axis uphill process, according to lever principle, three on elastic mechanism 2
The individual strong point to leveling board 11 (elastomeric element) is fulcrum with spherical bearing 22, Automatic adjusument, it is achieved three strong points are subject to
Dynamic balance.Moving mechanism 1 uses bearing to guide, and bearing is rolling friction, and coefficient of friction is little, in the frictional force that moving process produces
Can ignore.
Above content is to combine concrete preferred embodiment further description made for the present invention, it is impossible to assert
Being embodied as of the present invention is confined to these explanations.For general technical staff of the technical field of the invention,
On the premise of without departing from present inventive concept, some simple deduction or replace can also be made, all should be considered as belonging to the present invention by
The scope of patent protection that the claims submitted to determine.
Claims (10)
1. a workbench self adaptation levelling device, is characterized in that, including moving mechanism and elastic mechanism, described moving mechanism wraps
Including leveling board, described elastic mechanism includes elastic support, elastic mechanism rotating shaft, multiple elastic mechanism elastomeric element, the plurality of
Elastic mechanism parts are respectively arranged at the different forced position of described elastic support, described leveling board in the state of stress to institute
State certain forced position corresponding on elastic support elastic mechanism elastomeric element apply pressure, on described elastic support described certain
Forced position beyond forced position can rotate towards described leveling board around described elastic mechanism rotating shaft, and by corresponding elastic machine
Structure elastomeric element applies elastic force to described leveling board.
2. workbench self adaptation levelling device as claimed in claim 1, is characterized in that, also include leveling board limiting component, institute
State leveling board limiting component for limiting described leveling board in setting height plane.
3. workbench self adaptation levelling device as claimed in claim 1, is characterized in that, described elastic support includes three elasticity
Supporting-seat-arm, the angle between each elastic support arm is identical, and described elastic mechanism elastomeric element is respectively arranged at each elastic
The same position of seat arm.
4. workbench self adaptation levelling device as claimed in claim 1, is characterized in that, described elastic mechanism also includes elastic machine
Structure guiding parts, described guiding parts is for preventing described elastic support from rotating in the plane parallel with described leveling board.
5. workbench self adaptation levelling device as claimed in claim 3, is characterized in that, described elastic mechanism also includes elastic machine
Structure guiding parts, described elastic support is provided with pilot hole, and described leveling board is installed described elastic mechanism guiding parts, described
Elastic mechanism guiding parts is positioned at described pilot hole, prevents described elastic support from revolving in the plane parallel with described leveling board
Turn.
6. workbench self adaptation levelling device as claimed in claim 1, is characterized in that, also include substrate, described moving mechanism
Also including angular contact bearing, described substrate is provided with bearing guide type shoe, and described elastic mechanism is arranged on described substrate and leveling
Between plate, described angular contact bearing is arranged on the one side relative with substrate of described leveling board, and described bearing guide type shoe is to institute
State angular contact bearing to make to roll guiding.
7. workbench self adaptation levelling device as claimed in claim 6, is characterized in that, also include leveling board limiting component, institute
State leveling board limiting component and include the upper limit for limiting described leveling board at setting height plane, described leveling board limiting component
Position block and lower position block, described lower position block is fixing on the substrate, and described upper limit position block is fixed on described leveling board, institute
State upper limit position block and stretch into the lower section of described lower position block.
8. workbench self adaptation levelling device as claimed in claim 6, is characterized in that, described angular contact bearing includes three all
Angular contact bearing on the even circumference being distributed in leveling board, described bearing guide type shoe include three respectively with three angular contact axles
Hold corresponding bearing guide type shoe.
9. workbench self adaptation levelling device as claimed in claim 1, is characterized in that, described elastic mechanism elastomeric element includes
Ball stud, guide pin bushing, compression spring, spring end cap, described elastic support is provided with guide pin bushing installing hole, and described guide pin bushing is fixed on guide pin bushing
In installing hole, the main body of described ball stud is positioned at described guide pin bushing and head stretches out described guide pin bushing, and described compression spring is arranged on
Between described ball stud and spring end cap, described spring end cap is fixed on described elastic support.
10. workbench self adaptation levelling device as claimed in claim 7, is characterized in that, also include bulb plunger and lower ball
Headpin plug, described upper bulb plunger is fixed on described lower position block, and described lower bulb plunger is fixed on described substrate, described
Upper bulb plunger is relative with the upper and lower surface of described upper limit position block respectively with lower bulb plunger.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610378576.0A CN106066580B (en) | 2016-05-31 | 2016-05-31 | A kind of adaptive levelling device of workbench |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610378576.0A CN106066580B (en) | 2016-05-31 | 2016-05-31 | A kind of adaptive levelling device of workbench |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106066580A true CN106066580A (en) | 2016-11-02 |
| CN106066580B CN106066580B (en) | 2017-10-31 |
Family
ID=57420433
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610378576.0A Active CN106066580B (en) | 2016-05-31 | 2016-05-31 | A kind of adaptive levelling device of workbench |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106066580B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109050009A (en) * | 2018-09-14 | 2018-12-21 | 昆明理工大学 | A kind of packing tough cathode automatic code-spraying equipment |
| CN112649032A (en) * | 2021-01-08 | 2021-04-13 | 上海艾默优科技有限公司 | Automatic leveling base |
| CN112936203A (en) * | 2021-02-03 | 2021-06-11 | 大族激光科技产业集团股份有限公司 | Motion platform |
| US20220196525A1 (en) * | 2020-12-18 | 2022-06-23 | Vishal Khosla | Method and apparatus for maintaining constancy of force in contact between a test probe and test object, which are in a state of relative motion |
| CN116909108A (en) * | 2023-07-31 | 2023-10-20 | 苏州天准科技股份有限公司 | Non-contact exposure equipment and exposure method |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0968805A (en) * | 1995-09-04 | 1997-03-11 | Ushio Inc | Device for setting gap between mask and work |
| KR20040085983A (en) * | 2003-04-02 | 2004-10-08 | (주)네스디스플레이 | Mask align chamber |
| KR100738995B1 (en) * | 2006-06-21 | 2007-07-12 | 오에프티 주식회사 | Substrate stage leveling device for exposure device |
| CN104465449A (en) * | 2013-09-18 | 2015-03-25 | 上海微电子装备有限公司 | Rotation switching arm adaptive protection device and protection method thereof |
-
2016
- 2016-05-31 CN CN201610378576.0A patent/CN106066580B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0968805A (en) * | 1995-09-04 | 1997-03-11 | Ushio Inc | Device for setting gap between mask and work |
| KR20040085983A (en) * | 2003-04-02 | 2004-10-08 | (주)네스디스플레이 | Mask align chamber |
| KR100738995B1 (en) * | 2006-06-21 | 2007-07-12 | 오에프티 주식회사 | Substrate stage leveling device for exposure device |
| CN104465449A (en) * | 2013-09-18 | 2015-03-25 | 上海微电子装备有限公司 | Rotation switching arm adaptive protection device and protection method thereof |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109050009A (en) * | 2018-09-14 | 2018-12-21 | 昆明理工大学 | A kind of packing tough cathode automatic code-spraying equipment |
| US20220196525A1 (en) * | 2020-12-18 | 2022-06-23 | Vishal Khosla | Method and apparatus for maintaining constancy of force in contact between a test probe and test object, which are in a state of relative motion |
| CN112649032A (en) * | 2021-01-08 | 2021-04-13 | 上海艾默优科技有限公司 | Automatic leveling base |
| CN112649032B (en) * | 2021-01-08 | 2022-08-23 | 上海艾默优科技有限公司 | Automatic leveling base |
| CN112936203A (en) * | 2021-02-03 | 2021-06-11 | 大族激光科技产业集团股份有限公司 | Motion platform |
| CN116909108A (en) * | 2023-07-31 | 2023-10-20 | 苏州天准科技股份有限公司 | Non-contact exposure equipment and exposure method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106066580B (en) | 2017-10-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106066580A (en) | A kind of workbench self adaptation levelling device | |
| US9695707B2 (en) | Five-degree-of-freedom adjustment and positioning method and apparatus for assembly/measurement of rotor and stator of aircraft engine | |
| CN110094424A (en) | The hydrostatic gas-lubricated bearing device of the adjustable pivot angle of dissection type for rotor static balancing | |
| CN103072384B (en) | Plane trimming device and laser marking machine using plane trimming device | |
| CN106895830A (en) | A kind of Wedge-type precision levelling gear for optics load light axial adjustment | |
| CN116399513B (en) | Bearing multidirectional dynamic balance detection system | |
| CN106737478A (en) | Rotary workbench | |
| CN202533636U (en) | Connecting mechanism used for focusing and leveling | |
| CN106441898B (en) | A kind of test device of rolling bearing rotating accuracy | |
| CN205483592U (en) | Braking appearance is decided mechanical type accuse quick -mounting of rotational speed calibration and is put | |
| CN209543030U (en) | A kind of rotational structure and projector | |
| CN203587431U (en) | Upper pressure plate ball head pair structure of pressure testing machine | |
| KR102431340B1 (en) | Measuring device for runout of thrust block | |
| CN103048896B (en) | Manual litho machine Alignment stage Z-direction rough micro-moving mechanism mechanism | |
| CN209700984U (en) | A kind of solar wing stent car pose adjustment device for satellite ground experimental stage | |
| JP2024508058A (en) | Internally supported air suspension static balancing device and method for high-precision rotating ring-shaped parts | |
| CN212156471U (en) | Adjustable horizontal loading supporting device | |
| CN209440044U (en) | A kind of Bearing testing fixture convenient for adjusting | |
| CN109357691B (en) | Movable encoder interface with taper shank and double inclined planes for adjustment | |
| CN207390921U (en) | Detent mechanism, lockable mechanism and positioning turntable | |
| CN207131675U (en) | The conical surface is oriented to screw locking device | |
| CN115096552B (en) | Device and method for testing and adjusting inner direction of space camera | |
| CN116619010A (en) | Centering tool for disc parts | |
| CN221111620U (en) | Vacuum pump assembly fixture | |
| CN108747495A (en) | Flange clamp |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: Longgang District of Shenzhen City, Guangdong province 518000 city street in the center city City Industrial Park Road No. 3 building E Tefalongfei business building two floor Patentee after: Silicon electric semiconductor equipment (Shenzhen) Co., Ltd Address before: Longgang District of Shenzhen City, Guangdong province 518000 city street in the center city City Industrial Park Road No. 3 building E Tefalongfei business building two floor Patentee before: SHENZHEN SIDEA SEMICONDUCTOR EQUIPMENT Co.,Ltd. |
|
| CP01 | Change in the name or title of a patent holder |