CN105974617A - Substrate and manufacturing method thereof - Google Patents
Substrate and manufacturing method thereof Download PDFInfo
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- CN105974617A CN105974617A CN201610292570.1A CN201610292570A CN105974617A CN 105974617 A CN105974617 A CN 105974617A CN 201610292570 A CN201610292570 A CN 201610292570A CN 105974617 A CN105974617 A CN 105974617A
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- prevention structure
- electrostatic prevention
- electrostatic
- substrate
- graphics field
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
Abstract
The invention relates to the technical field of display, and discloses a substrate and a manufacturing method thereof. The substrate comprises at least a graph region which is to form a display substrate. The set region on the periphery of each graph region is provided with a first anti-static structure used to release static electricity, so that the path for electrostatic discharge is increased. Since the periphery of the graph region is provided with large-area blank area, a large-area anti-static structure can be formed, so as to release static rapidly, and effectively ensure quality and yield rate of products.
Description
Technical field
The present invention relates to Display Technique field, particularly relate to a kind of substrate and preparation method thereof.
Background technology
In the manufacturing process of liquid crystal display device, particularly to the friction matching before box, all can produce and amass
Tired large-area electrostatic, if release electrostatic not in time, damage by static electricity can cause display bad.
For release electrostatic, electrostatic ring is typically set in the viewing area of array base palte and carrys out release electrostatic.But,
The non-display area that viewing area is peripheral, is but not provided with electrostatic discharge protective circuit, after by damage by static electricity also
Display can be caused bad.And also temporarily without electrostatic discharge protective circuit on color membrane substrates, it is impossible to release electrostatic in time.
Summary of the invention
The present invention provides a kind of substrate and preparation method thereof, in order to solve the most effectively release substrate manufacturing process
The problem of the electrostatic of middle generation.
For solving above-mentioned technical problem, providing a kind of substrate in the embodiment of the present invention, described substrate includes at least
The graphics field of one display base plate to be formed, the peripheral setting regions in each described graphics field is provided with the
One electrostatic prevention structure.
Substrate as above, it is preferred that described substrate also includes being positioned at the sky that each graphics field is peripheral
White region, described setting regions is positioned at the periphery of described white space.
Substrate as above, it is preferred that described setting regions is provided with multiple described first antistatic knot
Structure.
Substrate as above, it is preferred that described first electrostatic prevention structure is the conductive pattern of Guan Bi, or
Described first electrostatic prevention structure has at least one tip for electric discharge.
Substrate as above, it is preferred that described graphics field includes alignment films figure.
Substrate as above, it is preferred that described display base plate to be formed is thin-film transistor array base-plate,
Described first electrostatic prevention structure is by wherein layer, times in transparency conducting layer, grid metal level, source and drain metal level
The composite bed of the composite bed of two or three of anticipating prepares.
Substrate as above, it is preferred that described display base plate to be formed is color membrane substrates.
Substrate as above, it is preferred that each described graphics field includes viewing area and is positioned at display
The non-display area of area periphery, described non-display area includes that sealing area, each described graphics field set
The second electrostatic prevention structure being equipped with between sealing area and viewing area, described second electrostatic prevention structure with
Described first electrostatic prevention structure electrical connection.
The embodiment of the present invention also provides for the manufacture method of a kind of substrate as above, described substrate include to
The graphics field of a few display base plate to be formed, described manufacture method includes:
The setting regions peripheral in each described graphics field forms the first electrostatic prevention structure.
Manufacture method as above, it is preferred that described manufacture method also includes:
Form alignment films figure in each described graphics field, and alignment film rubbing is orientated；
Specifically before described alignment film rubbing is orientated, the setting regions peripheral in each described graphics field
Forming described first electrostatic prevention structure, described first electrostatic prevention structure is used for being released in alignment film rubbing orientation
Time produce electrostatic.
Manufacture method as above, it is preferred that described display base plate to be formed is thin film transistor (TFT) array
Substrate；
By to wherein a layer in transparency conducting layer, grid metal level and source and drain metal level, the answering of any two
The composite bed closing layer or three is patterned technique, forms described first electrostatic prevention structure.
Manufacture method as above, it is preferred that described display base plate to be formed is color membrane substrates；
By transparency conducting layer is patterned technique, form described first electrostatic prevention structure.
Manufacture method as above, it is preferred that described manufacture method also includes:
When alignment films is carried out friction orientation, neutralize electrostatic charge also by electrostatic neutralization method.
Manufacture method as above, it is preferred that each described graphics field includes viewing area and is positioned at
The non-display area that viewing area is peripheral, described non-display area includes sealing area, and described manufacture method is also
Including:
The second electrostatic prevention structure, institute is formed between sealing area and the viewing area of each described graphics field
State the second electrostatic prevention structure to electrically connect with described first electrostatic prevention structure.
Having the beneficial effect that of the technique scheme of the present invention:
In technique scheme, when making display base plate, formed anti-in the periphery, graphics field of display base plate
Electrostatic structure, adds the path of Electro-static Driven Comb, owing to periphery, described graphics field has large-area blank
Region, it is possible to form large-area described electrostatic prevention structure, quick release electrostatic, the matter of product is effectively ensured
Amount and yield.
Accompanying drawing explanation
In order to be illustrated more clearly that the embodiment of the present invention or technical scheme of the prior art, below will be to enforcement
In example or description of the prior art, the required accompanying drawing used is briefly described, it should be apparent that, describe below
In accompanying drawing be only some embodiments of the present invention, for those of ordinary skill in the art, do not paying
On the premise of going out creative work, it is also possible to obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 represents the structural representation one of substrate in the embodiment of the present invention；
Fig. 2 represents the structural representation two of substrate in the embodiment of the present invention；
Fig. 3 represents the structural representation of each graphics field of substrate in the embodiment of the present invention；
Fig. 4 represents the manufacture method flow chart of substrate in the embodiment of the present invention.
Detailed description of the invention
Below in conjunction with drawings and Examples, the detailed description of the invention of the present invention is described in further detail.
Following example are used for illustrating the present invention, but are not limited to the scope of the present invention.
In the actual production process of display device, multiple display base plate can be made on one piece of substrate simultaneously
Figure, and after to box technique, cut, form multiple independent display floater.Described display base plate
Can be liquid crystal display substrate, it is also possible to for oled display substrate, be specifically as follows array base palte, also
Can be color membrane substrates or base plate for packaging, box-like be become to show by array base palte with color membrane substrates (or base plate for packaging)
Show panel.
Shown in Fig. 1 and Fig. 2, in order to effectively discharge the electrostatic produced in processing technology, in the present embodiment
Thering is provided a kind of substrate, described substrate includes the graphics field 100 of at least one display base plate to be formed, each
The setting regions 200 of periphery, graphics field 100 is provided with the first electrostatic prevention structure 1, for release electrostatic,
Add the path of Electro-static Driven Comb.Owing to the periphery of graphics field 100 has large-area white space, energy
Large-area first electrostatic prevention structure 1, quick release electrostatic are enough set, the quality of product and good is effectively ensured
Rate.
Wherein, the first electrostatic prevention structure 1 can be the conductive pattern of Guan Bi, or has at least one for putting
Electricity tip, can release electrostatic, play the effect of electrostatic protection.Certainly, the first electrostatic prevention structure 1
Structure be not limited thereto, it is also possible to can the structure of release electrostatic for other.
First electrostatic prevention structure 1 of the present embodiment is the conductive pattern of Guan Bi, is specifically as follows the conduction of Guan Bi
Ring, arranges the conducting ring of multiple Guan Bi, as shown in Figure 1 in setting regions 200.First electrostatic prevention structure 1
Can also be for covering the conducting layer figure of whole setting regions 200, area is very big, and the effect of release electrostatic is more
Good, as shown in Figure 2.The material of the first electrostatic prevention structure 1 can select metal or other conductive materials.
For liquid crystal display device, in order to make liquid crystal molecule correct orientation, in addition it is also necessary to form alignment films, described
Alignment films is after friction orientation, and surface can form orientation groove, provides certain tilt angle for liquid crystal molecule.
Described alignment films is exposed to the outermost of display base plate, after to box technique, injects liquid crystal, described alignment films
Contact setting with liquid crystal molecule, liquid crystal molecule is orientated.Friction orientation technique can produce substantial amounts of
Electrostatic, and in the present embodiment, friction running roller can touch the first electrostatic prevention structure of periphery when friction orientation
1, the first electrostatic prevention structure 1 can be quickly releasing in the electrostatic produced when being orientated alignment film rubbing, makes to show
Show that the inside of substrate is few to be affected by frictional static, improve product yield.
In the present embodiment, as it is shown on figure 3, be additionally provided with the second electrostatic prevention structure 2 in graphics field 100,
The electrostatic produced in the processing technology be released in display base plate.Second electrostatic prevention structure 2 can be Guan Bi
Conductive pattern, or there is at least one tip for electric discharge, or other can the structure of release electrostatic.
Optionally, the second electrostatic prevention structure 2 is electrically connected with the first electrostatic prevention structure 1, increase inside display floater
The release way of the electrostatic produced, makes the first electrostatic prevention structure 1 play more preferable electrostatic protective function.Second
Electrostatic prevention structure 2 is generally arranged between the sealing area 103 of display base plate and viewing area 101.Seal
Region 103 is positioned at non-display area 102, to can form encapsulant in box technique in this region, it is achieved close
Envelope is to box.
For the ease of the para-position of follow-up cutting technique, design described substrate and also include being positioned at each graphics field
The white space 300 of 100 peripheries, setting regions 200 is positioned at the periphery of white space 300, thus right
Described substrate cuts, when forming independent display floater, it is possible to rapid-aligning, in conjunction with Fig. 1 and Fig. 2
Shown in.And before being cut, multiple first electrostatic prevention structures 1 that setting regions 200 is arranged can be used for
Release electrostatic, it is achieved the effect of electrostatic protection.
When the display base plate to be formed in the present embodiment is thin-film transistor array base-plate, graphics field 100
Including each film layer pattern of thin-film transistor array base-plate, such as: pixel electrode, grid line, data wire, and
The gate electrode of thin film transistor (TFT), source electrode and drain electrode.First electrostatic prevention structure 1 can by transparency conducting layer,
The composite bed of wherein one layer, the composite bed of any two or three in grid metal level, source and drain metal level prepares,
Wherein, described transparency conducting layer be additionally operable to formed pixel electrode, described grid metal level be additionally operable to formed gate electrode,
Grid metal etc., described source and drain metal level is additionally operable to form source electrode, drain electrode and data wire etc., thus thin
The processing technology of film transistor array base palte concurrently forms the first electrostatic prevention structure 1, it is not necessary to increase individually
Processing technology, reduce production cost.And the first antistatic knot that i.e. completed before making alignment films
Structure 1, when alignment films is carried out friction orientation, the first electrostatic prevention structure 1 can quickly discharge friction and produce
Electrostatic.Further, as it is shown on figure 3, graphics field 100 includes viewing area 101 and non-display area
Territory 102, and it is positioned at the sealing area 103 of non-display area 102, in sealing area 103 and viewing area
Arranging the second electrostatic prevention structure 2 between territory 101, the second electrostatic prevention structure 2 is used for discharging thin film transistor (TFT) battle array
The electrostatic produced in the processing technology of row substrate.Preferably, at a certain conductive layer forming viewing area 101
During figure, such as: grid metal layer image, utilize described a certain conductive layer in viewing area 101 and seal area
Form the second electrostatic prevention structure 2 between territory 103, simplify processing technology, reduce production cost.Forming the
After two electrostatic prevention structures 2, the second electrostatic prevention structure 2 just can discharge the electrostatic produced in subsequent manufacturing processes,
Prevent the inside of electrostatic damage display base plate, improve product yield.
Display base plate to be formed in the present embodiment can also be color membrane substrates or base plate for packaging, the first antistatic
Structure 1 can discharge the electrostatic produced in the processing technology of color membrane substrates or base plate for packaging, especially to coloured silk
The alignment films of film substrate carries out the electrostatic of generation during friction orientation, prevents after to box, and electrostatic is introduced display
Panel itself, causes damage, overcomes and does not has electrostatic prevention structure on color membrane substrates or base plate for packaging, it is impossible to releases
The problem putting the electrostatic produced in processing technology.Further, when being formed with public electrode on color membrane substrates,
First electrostatic prevention structure 1 can be prepared by same transparency conducting layer with described public electrode, simplifies processing technology.
Shown in Fig. 1 and Fig. 2, described in the present embodiment, substrate specifically includes:
The graphics field 100 of at least one display base plate to be formed, the periphery of each graphics field 100 has
White space 300, is provided with big face in other regions 200 except graphics field 100 and white space 300
The first long-pending electrostatic prevention structure 1, the first electrostatic prevention structure 1 is the conductive pattern of Guan Bi；
Each graphics field 100 includes viewing area 101 and non-display area 102, and is positioned at non-display
The sealing area 103 in region 102, is provided with second between sealing area 103 and viewing area 101 and prevents
Electrostatic structure 2, the second electrostatic prevention structure 2 is the conductive pattern of Guan Bi, the second electrostatic prevention structure 2 and first
Electrostatic prevention structure 1 electrically connects；
Each graphics field 100 includes alignment films (not shown), when alignment film rubbing is orientated,
First electrostatic prevention structure 1 is used for discharging frictional static.
As for other film layer patterns of graphics field 100, depend on the type of described display base plate to be formed,
As: array base palte, color membrane substrates, refer to prior art, be not described in detail in this.
Based on same inventive concept, as shown in Figure 4, the present embodiment also provides for a kind of substrate as above
Manufacture method, described substrate includes the graphics field of at least one display base plate to be formed, described making side
Method includes:
The setting regions peripheral in each described graphics field forms the first electrostatic prevention structure.
The first electrostatic prevention structure formed by above-mentioned manufacture method, adds the path of Electro-static Driven Comb.Meanwhile,
Owing to large-area first electrostatic prevention structure, quick release electrostatic can be formed, the quality of product is effectively ensured
And yield.
When described display base plate to be formed is liquid crystal display substrate, as shown in Figure 4, described manufacture method is also
Including:
Form alignment films figure in each described graphics field, and alignment film rubbing is orientated.
Large-area electrostatic can be produced, if can not quick, effective must discharge when alignment film rubbing is orientated
Electrostatic, can cause badly damaged to display base plate inside.In order to solve this technical problem, the present embodiment has
Body is before being orientated described alignment film rubbing, and the setting regions peripheral in each described graphics field forms institute
State the first electrostatic prevention structure.Owing to the periphery of described graphics field has large-area white space, it is possible to shape
Become large-area described first electrostatic prevention structure, when alignment film rubbing is orientated, friction running roller and described the
One electrostatic prevention structure contact, the electrostatic that described first electrostatic prevention structure produces when can effectively discharge friction orientation.
Owing to substantial amounts of electrostatic can be produced when alignment film rubbing is orientated, in order to increase the release way of electrostatic,
Described manufacture method also includes:
When alignment films is carried out friction orientation, neutralize electrostatic charge also by electrostatic neutralization method.
It should be noted that electrostatic neutralisation is to utilize the charged ion in air to carry out the quiet of corrective surface
The method of electricity electric charge, specifically can utilize ion blower or X-ray to distribute setting of charged particle in air
Standby, with the electrostatic charge of corrective surface effectively, or provide the air ambient (> 30%Rh that humidity is higher)
Also there is the effect that electrostatic neutralizes.
The present embodiment also forms the second electrostatic prevention structure in described graphics field, is used for being released in be formed showing
Show the electrostatic produced in the processing technology of substrate.Optionally, described second electrostatic prevention structure and first are prevented quiet
Electricity structure electrical connection, increases the release way of the internal electrostatic produced of display floater, makes described first antistatic
Structure plays more preferable electrostatic protective function.Generally shape between the sealing area and viewing area of display base plate
Become described second electrostatic prevention structure.Described sealing area is positioned at non-display area, to box technique Zhong Huigai district
Territory forms encapsulant, it is achieved seal box.
When the display base plate described to be formed in the present embodiment is thin-film transistor array base-plate, described making
Method also includes: form each film layer pattern of thin-film transistor array base-plate in described graphics field, such as: as
Element electrode, grid line, data wire, and the gate electrode of thin film transistor (TFT), source electrode and drain electrode.Optionally,
By to wherein a layer in transparency conducting layer, grid metal level and source and drain metal level, the composite bed of any two
Or the composite bed of three is patterned technique, form described first electrostatic prevention structure.Wherein, to described transparent
The patterning processes that conductive layer is carried out is additionally operable to form pixel electrode, the patterning processes carrying out described grid metal level
Being additionally operable to form gate electrode, grid metal etc., the patterning processes carrying out described source and drain metal level is additionally operable to be formed
Source electrode, drain electrode and data wire etc., thus shape simultaneously in the processing technology of thin-film transistor array base-plate
Become described first electrostatic prevention structure, it is not necessary to increase single processing technology, reduce production cost.And
I.e. complete before making alignment films described first electrostatic prevention structure, when alignment films is carried out friction orientation,
Described first electrostatic prevention structure can quickly discharge fricative electrostatic.Further, described manufacture method
Also include:
The second electrostatic prevention structure is formed between sealing area and viewing area.
After forming described second electrostatic prevention structure by above-mentioned steps, described second electrostatic prevention structure can discharge
The electrostatic produced in subsequent manufacturing processes, prevents the inside of electrostatic damage display base plate, improves product yield.
Wherein, in the technique making thin-film transistor array base-plate, described second electrostatic prevention structure is by being formed at first
Conductive layer formed, such as: grid metal level.Described second electrostatic prevention structure and grid line and gate electrode are with layer shape
Become, simplify processing technology, reduce production cost.
The manufacture method of substrate described in the present embodiment specifically includes:
Large area is formed on the substrate except other regions 200 of graphics field 100 and white space 300
The conductive pattern of Guan Bi, the conductive pattern of described Guan Bi form the first electrostatic prevention structure 1, in conjunction with Fig. 1
Shown in Fig. 2；
The conduction of Guan Bi is formed between the sealing area 103 and viewing area 101 of each graphics field 100
Figure, is formed the second electrostatic prevention structure 2 by the conductive pattern closed, and the second electrostatic prevention structure 2 and first is prevented
Electrostatic structure 1 electrically connects, as shown in Figure 3；
Alignment films (not shown) is formed in each graphics field 100, when alignment film rubbing is orientated,
First electrostatic prevention structure 1 is used for discharging frictional static.
As for the processing technology of other film layer patterns of graphics field 100, depend on described display base to be formed
The type of plate, such as: array base palte, color membrane substrates, refer to prior art, is not described in detail in this.
The above is only the preferred embodiment of the present invention, it is noted that common for the art
For technical staff, on the premise of without departing from the technology of the present invention principle, it is also possible to make some improvement and replace
Changing, these improve and replace and also should be regarded as protection scope of the present invention.
Claims (14)
1. a substrate, described substrate includes the graphics field of at least one display base plate to be formed, and it is special
Levying and be, the setting regions of periphery, each described graphics field is provided with the first electrostatic prevention structure.
Substrate the most according to claim 1, it is characterised in that described substrate also includes being positioned at each
The white space that graphics field is peripheral, described setting regions is positioned at the periphery of described white space.
Substrate the most according to claim 1, it is characterised in that described setting regions is provided with multiple
Described first electrostatic prevention structure.
Substrate the most according to claim 1, it is characterised in that described first electrostatic prevention structure is for closing
Close conductive pattern, or described first electrostatic prevention structure have at least one for electric discharge tip.
Substrate the most according to claim 1, it is characterised in that described graphics field includes alignment films
Figure.
Substrate the most according to claim 5, it is characterised in that described display base plate to be formed is thin
Film transistor array base palte, described first electrostatic prevention structure is by transparency conducting layer, grid metal level, source and drain metal
The composite bed of wherein one layer, the composite bed of any two or three in Ceng prepares.
Substrate the most according to claim 5, it is characterised in that described display base plate to be formed is color
Film substrate, described first electrostatic prevention structure is prepared by transparency conducting layer.
8. according to the substrate described in any one of claim 1-7, it is characterised in that each described graphics field
Including the non-display area that viewing area is peripheral with being positioned at viewing area, described non-display area includes seal area
Territory, the second electrostatic prevention structure that each described graphics field is provided with between sealing area and viewing area,
Described second electrostatic prevention structure electrically connects with described first electrostatic prevention structure.
9. a manufacture method for the substrate described in any one of claim 1-8, described substrate includes at least one
The graphics field of individual display base plate to be formed, it is characterised in that described manufacture method includes:
The setting regions peripheral in each described graphics field forms the first electrostatic prevention structure.
Manufacture method the most according to claim 9, it is characterised in that described manufacture method also includes:
Form alignment films figure in each described graphics field, and alignment film rubbing is orientated；
Specifically before described alignment film rubbing is orientated, the setting regions peripheral in each described graphics field
Forming described first electrostatic prevention structure, described first electrostatic prevention structure is used for being released in alignment film rubbing orientation
Time produce electrostatic.
11. manufacture methods according to claim 10, it is characterised in that described display base to be formed
Plate is thin-film transistor array base-plate；
By to wherein a layer in transparency conducting layer, grid metal level and source and drain metal level, the answering of any two
The composite bed closing layer or three is patterned technique, forms described first electrostatic prevention structure.
12. manufacture methods according to claim 10, it is characterised in that described display base to be formed
Plate is color membrane substrates；
By transparency conducting layer is patterned technique, form described first electrostatic prevention structure.
13. manufacture methods according to claim 10, it is characterised in that described manufacture method is also wrapped
Include:
When alignment films is carried out friction orientation, neutralize electrostatic charge by electrostatic neutralization method.
14. according to the manufacture method described in any one of claim 9-13, it is characterised in that each described figure
Shape region includes viewing area and is positioned at the non-display area that viewing area is peripheral, and described non-display area includes
Sealing area, described manufacture method also includes:
The second electrostatic prevention structure, institute is formed between sealing area and the viewing area of each described graphics field
State the second electrostatic prevention structure to electrically connect with described first electrostatic prevention structure.
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| CN201610292570.1A CN105974617A (en) | 2016-05-05 | 2016-05-05 | Substrate and manufacturing method thereof |
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| WO2019057062A1 (en) * | 2017-09-22 | 2019-03-28 | 惠科股份有限公司 | Active switch array substrate and liquid crystal display panel |
| WO2019179151A1 (en) * | 2018-03-23 | 2019-09-26 | 武汉华星光电技术有限公司 | Array substrate and display panel |
| US10901280B2 (en) | 2018-03-23 | 2021-01-26 | Wuhan China Star Optoelectronics Technology Co., Ltd. | Array substrate and display panel |
| CN113079686A (en) * | 2021-04-08 | 2021-07-06 | 业成科技（成都）有限公司 | Display module and electronic equipment |
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Application publication date: 20160928 |