CN105939566A - Achromatic double-magnet deflection device - Google Patents
Achromatic double-magnet deflection device Download PDFInfo
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
- H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
- H05H2007/046—Magnet systems, e.g. undulators, wigglers; Energisation thereof for beam deflection
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Abstract
The invention belongs to an accelerator design technology, and particularly relates to an achromatic double-magnet deflection device. The achromatic double-magnet deflection device comprises two deflection magnets which are symmetrically arranged, wherein a beam passes through a spatial range between opposite magnetic pole surfaces of the two deflection magnets; an outlet edge angle beta2 of the first deflection magnet and an inlet edge angle beta3 of the second deflection magnet achieve the achromatic function; and the beam is transversely focused by an inlet edge angle beta1 of the first deflection magnet and an outlet edge angle beta4 of the second deflection magnet, so that matching transmission of the beam is achieved. By the achromatic double-magnet deflection device, long-distance and multi-deflection transmission of the beam, and large-aperture and large-emittance beam transmission and screening can be achieved; and meanwhile, the system complexity and the engineering difficulty are reduced.
Description
Technical Field
The invention belongs to the accelerator technology, and particularly relates to an achromatic double-magnet deflection device.
Background
The accelerator is widely applied to the fields of scientific research, national defense and military, security and anti-terrorism, industrial and agricultural production, environmental protection, medical treatment and health, food safety and the like, and is high and new technical equipment. The accelerators have various types, and the main function of the accelerators is to form high-energy charged particle beams after charged particles absorb the energy of an electrostatic field or an electromagnetic field, and then the high-energy charged particle beams are applied to various fields.
The process of the charged particles absorbing energy is called an acceleration process, and the process of particle motion without acceleration is called a transport process. In order to accelerate and apply the charged particles, the moving direction of the charged particle beam often needs to be deflected. In the acceleration process of the charged particles, the acceleration electric fields sensed by different particles are often different, so that the energy of the accelerated particles is different. When particles with different energies pass through the same deflection magnetic field, the motion trajectories are different, and the phenomenon is called chromatic aberration. Chromatic aberration can cause beam envelope or beam spot expansion during acceleration and application of particles, and adverse effects are brought to stable and efficient operation of an accelerator and normal application of beam current. Therefore, in the design and debugging process of the accelerator, the achromatic effect of beam deflection needs to be realized.
At present, the methods and devices for achromatization are more, and mainly include two main types, namely a symmetric system and an asymmetric system. Achromatic devices of symmetric systems are commonly used and are of many types, including the chicane structure, the Varian structure, the k.l.brown structure, the alpha magnet, etc. The chicane structure adopts three uniform field deflection magnets with the same deflection angle and radius, the entrance edge angle and the exit edge angle of each magnet are zero, namely the particle incidence and exit directions are vertical to the magnet boundary, the deflection direction of the middle pair of particles is opposite to that of the two sides, and the deflection directions of the magnets on the two sides are the same. The Varian structure also adopts three uniform field deflection magnets with the same deflection angle and radius, and is different from the chimane structure in two points, namely that the deflection directions of the three magnets are the same, and the edge angles of the inlet and the outlet of each magnet are not zero, namely that the incident and emergent directions of particles are not vertical to the boundary of the magnets. The K.L.Brown structure adopts two uniform field deflection magnets with the same deflection angle, direction and radius, a quadrupole magnet is clamped in the middle, and the edge angle of an inlet and an outlet of each deflection magnet can be zero or not. The alpha magnet is a single deflection magnet, the magnetic field is an inhomogeneous magnetic field, the gradient index of the magnetic field is generally 1, and the deflection angle of the beam current is fixed 278.58 degrees. The above-mentioned symmetry systems are all plane-symmetric, i.e. symmetric about a straight line in the X-Z deflection plane. There is also an antisymmetric achromatic system which is symmetric about a straight line in three dimensions and about a point in the X-Z deflection plane. Since the antisymmetric system requires the beam spot to be reduced to one point at the symmetric point, the influence on the beam quality is not good, and the application is less. The symmetric system and the antisymmetric system are composed of three and more than three magnets except for the alpha magnet. If the beam needs to be deflected only once or several times, it is acceptable for the achromatic system to consist of more than three magnets, but if it needs to be deflected tens of times, or even hundreds of times, it is desirable to reduce the number of magnets of the achromatic deflection system in order to reduce engineering complexity and difficulty. Although the alpha magnet only has one magnet, the deflection angle of the alpha magnet can only be about 270 degrees, in addition, the aperture of the beam current which can be received by the alpha magnet is not large, the beam current is difficult to deflect for large-size beam spots, the transverse matching of the beam current is not flexible enough, in addition, the alpha magnet has high requirements on machining and installation accuracy, and the engineering implementation difficulty is large. The asymmetric achromatic apparatus has an ACEL deflection system and a Philips-type deflection system. The ACEL deflection system is invented by Hutcheon, adopts 2 deflection magnets, is mainly used for 270-degree deflection, and needs to be additionally provided with a quadrupole lens to complete matching transmission of an optical path; the Philips-type deflection system consists of 3 deflection magnets. Asymmetric systems, which can also use two deflection magnets, cannot be used for multiple deflections of the beam.
In some scientific experiments or engineering applications, particles with large divergence angle and large emittance need to be collected and screened, if three or more deflection magnets are adopted, the transmission space is large, the edge field effect is complex, and the defects of insufficient particle screening and the like exist, so that the design difficulty is extremely high and even is difficult to complete.
Disclosure of Invention
The invention aims to provide an achromatic double-magnet deflection device aiming at the defects of the prior art, so that long-distance and multiple deflection transmission of beam current and large-aperture and large-emittance beam current transmission and screening are realized, and the complexity of a system and the engineering difficulty are reduced.
The invention has the technical scheme that the achromatic double-magnet deflection device comprises two symmetrically arranged deflection magnets, a beam passes through a space range between opposite magnetic pole surfaces of the two deflection magnets, and an outlet edge angle β of a first deflection magnet2The entrance edge angle β of the second deflection magnet3The entrance edge angle β of the first deflection magnet to achieve achromatic function1Outlet edge angle β of second deflection magnet4And transversely focusing the beam flow to realize the matching transmission of the beam flow.
Further, the achromatic twin-magnet deflector device as described above, wherein the two deflecting magnets are identical in shape, and the exit edge angle β of the first deflecting magnet2And entrance edge angle β of second deflection magnet3Are equal in size.
Further, in order to achieve complete achromatization of the optical path, the achromatic double-magnet deflection device as described above should satisfy the following relationship between the edge angle of the deflection magnet and the deflection angle of the beam current:
(cos(xα)-1)tanβ2＝xsin(xα)
in the formula,
n is the field gradient index of the deflection magnet;
alpha is the deflection angle of the deflection magnet to the beam current;
β2is the exit edge angle of the first deflection magnet;
when n is equal to 0, the compound is,
β2＝α/2-π。
further, the achromatic double-magnet deflection device as above, wherein when the deflection transmission of the beam with small emittance is required for many times, the two symmetrically arranged deflection magnets are arranged along the beam transmission line for many times. By adopting the optical paths of a plurality of sets of secondary double-magnet deflection devices, the chromatic aberration item of the transmission matrix of each double-magnet deflection device can be not zero, namely the chromatic aberration item does not need to completely satisfy the formula. As long as the transmission matrix chromatic aberration item of the single double-magnet deflection device is less than 0.1, after deflection for multiple times, the chromatic aberration item of the transmission matrix of the whole optical path has the effect of reducing, and the more deflection times, the more reduction, namely the chromatic aberration effect can be ignored.
Further, the achromatic double-magnet deflection device as described above, wherein for the deflection of the beam with a large emittance, the deflection of the beam is realized by increasing the distance between the magnetic pole faces of the two deflection magnets facing each other.
The invention has the following beneficial effects: the double-magnet deflection device provided by the invention can realize simultaneous focusing of beam in transverse X and Y directions, thereby eliminating other transverse focusing elements such as quadrupole magnets and the like, reducing the number of magnets, and only the deflection magnet is arranged in the whole deflection transmission system. The double-magnet deflection device can realize the achromatization or the approaching achromatization of beam transmission, and improves the transmission efficiency of the beam. The two deflection magnets adopted by the invention can be symmetrical, namely the two magnets are completely the same, and the whole transmission system for multiple deflection only needs one deflection magnet, thereby greatly reducing the processing complexity of the magnets.
Drawings
FIG. 1 is a schematic diagram of the achromatic principle of a double deflection magnet;
FIG. 2 is a schematic diagram of a three-dimensional spatial relationship between a magnetic pole surface of a deflection magnet and a beam motion trajectory;
fig. 3 is a diagram of a dual deflection magnet beam envelope;
fig. 4 is a diagram of the envelope of four deflected beam currents;
fig. 5 is a diagram of the beam envelope of a large gap deflection magnet.
Detailed Description
The invention is described in detail below with reference to the figures and examples.
The achromatic double-magnet deflection device provided by the invention adopts the symmetrical arrangement of the two deflection magnets 1, the shapes of the two deflection magnets 1 can be completely the same, the beam current 4 passes through the space range between the opposite magnetic pole surfaces of the two deflection magnets, and the outlet edge angle β of the first deflection magnet is utilized2And the entrance edge angle β of the second deflection magnet3Achromatic first deflection magnet entrance edge angle β1Outlet edge angle β of second deflection magnet4The beam current is transversely focused to realize the matching transmission of the beam current, as shown in figure 1, the edge angle of the deflection magnet refers to the included angle between the normal of the edge plane of the deflection magnet and the incident beam streamline, and is also the included angle between the edge plane of the deflection magnet and the beam current radius at the inlet and the outlet, and because the two deflection magnets are the same in shape and are symmetrically arranged, the outlet edge angle β of the first deflection magnet2And entrance edge angle β of second deflection magnet3Equal in size, the entrance edge angle β of the first deflection magnet1And exit edge angle β of second deflection magnet4Are equal in size.
The field gradient index n of the deflection magnet can be zero, namely, the field gradient index n is a uniform deflection field, and can also be non-zero or even more than 1, so that the transverse matching of the beam current is realized.
The chromatic aberration is caused by momentum dispersion in the deflection direction, and the transmission matrix of the deflection magnet in the three-dimensional phase space after considering the fringe field is as follows:
wherein,the subscript X denotes the X-direction of the rectangular coordinate system, which is the beam deflection direction, ρ is the deflection radius, α is the beam deflection angle of the deflection magnet with respect to the beam, if the optical path of fig. 1 is symmetrical, provided that the X-X' subphase space transmission matrix R is described abovexR of (A) to (B)x13Achromatism is achieved with zero matrix elements, i.e. (cos: (C:)xα)-1)tanβ2＝xsin(xα)。Rx13A matrix element of zero means that the position coordinates of the outlet particles are independent of the energy dispersion of the inlet particles, which means that an achromatic realization of the position coordinates and an achromatic realization of the angle coordinates are achieved by symmetry of the system when n is 0 the relation between the edge angle and the deflection angle satisfies β2Achromatization can be achieved at α/2-pi.
For small-emittance beam current, complete achromatization or incomplete achromatization can be realized as long as a matrix element R of a total transmission matrix of the small-emittance beam current16And R26Is less than 0.1, because the influence of chromatic aberration on the beam envelope is small as long as the absolute value of (a) is less than 0.1. In some application occasions, the small-emittance beam needs to be subjected to deflection transmission for many times, only an achromatic double-magnet deflection device needs to be arranged along the beam transmission line for many times, and other transverse focusing elements such as a focusing quadrupole magnet do not need to be added.
Some applications first use the particle beam output by the accelerator to bombard the target material to generate secondary particles, and the emission degree of the secondary particles to be collected and transported is very large. The beam pore channel required by the beam with large emittance has large transverse size, so that the magnetic pole spacing of the required deflection magnet is large. An achromatic system using two deflection magnets can solve this problem well.
Example 1
FIG. 1 is a schematic two-dimensional diagram of a principle structure using two deflection magnets, wherein α is the deflection angle of the deflection magnets to the beam current, β1、β2、β3And β4Is the edge angle of the deflection magnet, β shown in the figure1And β4Is a positive value, β2And β3The negative value is that the actual designed edge angle can be either positive or negative or zero. Fig. 2 is a three-dimensional space relationship diagram of the pole faces of a deflection magnet and the motion track of a beam, wherein the beam 4 passes through the space range between the opposite pole faces of two deflection magnets 1, and an excitation coil 5 is used for magnetic field excitation.
FIG. 3 shows an envelope diagram of a beam path of a deflection magnet beam calculated by design, wherein the deflection angle α adopted by the design is 45 degrees and β degrees1And β4At-18.66 degrees, β2And β320.34 degrees, magnet deflection radius of 50mm, deflection magnetic fieldThe field index is-0.16. The gap between the pole heads of the deflection magnets is about 20 mm. Both the inlet and outlet beam streams are parallel beams. Total beam current transmission matrix element R16＝0.086，R26The calculated edge angle in the previous formula is less than zero, whereas β for the present design2And β3Values greater than zero may also substantially achieve achromatism. In the figure, 1 is a deflection magnet, 2 is beam envelope in X direction, 3 is beam envelope in Y direction, and 4 is beam central track. The beam center trajectory in fig. 1 is a curve, and is set as a straight line in the simulation calculation.
The simulated calculation optical path using 4 deflection magnet systems is shown in fig. 4, and the optical path can be used for an electron helical accelerator (see chinese patent application 201410202889.1), and the size of the beam envelope is well controlled. Beam transmission matrix element R16＝0.025，R26The chromatic aberration becomes smaller after several deflections, namely 0.015.
Example 2
For the beam deflection with a large emittance, a large magnetic pole gap is needed to deflect the beam, and the magnetic pole gap adopted by the beam light path envelope diagram shown in fig. 5 is 700 mm. In the figure, 1 is a deflection magnet, 2 is an X-direction envelope of beam deflection, 3 is a Y-direction beam envelope, and 4 is a beam central track.
Because the deflection system only realizes the achromatization function through the edge angle, if the deflection angle α is small, the needed edge angle is large, although the achromatization in the X direction and the control of beam envelope can be realized, the defocusing effect on the Y direction is large, and the beam envelope diffusion in the Y direction is large, therefore, the deflection angle α adopted by the embodiment is 90 degrees, and the achromatization edge angle β is2And β3At-52.07 degrees, β1And β4The deflection radius of the magnet is 1.59 meters, and the index of the deflection magnetic field is 1.027. Beam transmission matrix element R16And R26Zero, i.e. complete achromatization of the beam current is achieved.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is intended to include such modifications and variations.
Claims (5)
1. An achromatic double-magnet deflecting device is characterized by comprising two symmetrically arranged deflecting magnets, a beam passes through a space range between opposite magnetic pole surfaces of the two deflecting magnets, and an outlet edge angle β of a first deflecting magnet2The entrance edge angle β of the second deflection magnet3The entrance edge angle β of the first deflection magnet to achieve achromatic function1Outlet edge angle β of second deflection magnet4And transversely focusing the beam flow to realize the matching transmission of the beam flow.
2. The achromatic twin magnet deflection apparatus of claim 1, wherein said two deflection magnets are identical in shape, and the exit edge angle β of the first deflection magnet2And entrance edge angle β of second deflection magnet3Are equal in size.
3. An achromatic twin magnet deflection apparatus as defined in claim 1, wherein: the edge angle of the deflection magnet and the deflection angle of the beam current satisfy the following relationship for realizing complete achromatism:
(cos(xα)-1)tanβ2＝xsin(xα)
in the formula,
n is the field gradient index of the deflection magnet;
alpha is the deflection angle of the deflection magnet to the beam current;
β2is the exit edge angle of the first deflection magnet;
when n is equal to 0, the compound is,
β2＝α/2-π。
4. an achromatic dual-magnet deflection unit as claimed in claim 1 or 2, wherein: when the small-emittance beam needs to be subjected to deflection transmission for multiple times, the two symmetrically arranged deflection magnets are arranged along the beam transmission line for multiple times, complete achromatization of each group of double-magnet deflection devices is not needed, and the dispersion effect of the whole optical path can be ignored when the chromatic aberration item of the transmission matrix is less than 0.1.
5. An achromatic dual-magnet deflection unit as claimed in claim 1 or 2, wherein: aiming at the beam deflection with large emittance, the beam deflection is realized by increasing the distance between the magnetic pole surfaces opposite to the two deflection magnets.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107789749A (en) * | 2017-11-23 | 2018-03-13 | 上海联影医疗科技有限公司 | Charged particle beam deflection device and treatment system |
| CN108696981A (en) * | 2018-05-31 | 2018-10-23 | 北京鑫智能技术股份有限公司 | A kind of α magnet for irradiation accelerator |
| CN110812713A (en) * | 2019-11-27 | 2020-02-21 | 中国原子能科学研究院 | Beam flow line layout structure of rotating frame and self-eliminating chromatic aberration normal-temperature proton treatment equipment |
| CN111093315A (en) * | 2019-12-25 | 2020-05-01 | 中国原子能科学研究院 | Isochronous cyclotron with non-dispersive linear segment, and injection and extraction method |
| CN117295223A (en) * | 2023-11-27 | 2023-12-26 | 青岛四方思锐智能技术有限公司 | Sectional type radio frequency acceleration system and ion implanter |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107789749A (en) * | 2017-11-23 | 2018-03-13 | 上海联影医疗科技有限公司 | Charged particle beam deflection device and treatment system |
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| CN108696981A (en) * | 2018-05-31 | 2018-10-23 | 北京鑫智能技术股份有限公司 | A kind of α magnet for irradiation accelerator |
| CN110812713A (en) * | 2019-11-27 | 2020-02-21 | 中国原子能科学研究院 | Beam flow line layout structure of rotating frame and self-eliminating chromatic aberration normal-temperature proton treatment equipment |
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| CN117295223A (en) * | 2023-11-27 | 2023-12-26 | 青岛四方思锐智能技术有限公司 | Sectional type radio frequency acceleration system and ion implanter |
| CN117295223B (en) * | 2023-11-27 | 2024-04-05 | 青岛四方思锐智能技术有限公司 | Sectional type radio frequency acceleration system and ion implanter |
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