CN105910963B - Metal particle research method and device based on addition of space charge by third electrode - Google Patents
Metal particle research method and device based on addition of space charge by third electrode Download PDFInfo
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- CN105910963B CN105910963B CN201610224569.5A CN201610224569A CN105910963B CN 105910963 B CN105910963 B CN 105910963B CN 201610224569 A CN201610224569 A CN 201610224569A CN 105910963 B CN105910963 B CN 105910963B
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- 239000002923 metal particle Substances 0.000 title claims abstract description 20
- 238000011160 research Methods 0.000 title claims abstract description 20
- 238000000034 method Methods 0.000 title claims abstract description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 15
- 230000005684 electric field Effects 0.000 claims abstract description 13
- 238000002347 injection Methods 0.000 claims abstract description 10
- 239000007924 injection Substances 0.000 claims abstract description 10
- 239000002184 metal Substances 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims abstract description 5
- 238000002474 experimental method Methods 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 12
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 5
- 238000013461 design Methods 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 238000006073 displacement reaction Methods 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000012774 insulation material Substances 0.000 claims 1
- 238000007789 sealing Methods 0.000 abstract description 4
- 230000000704 physical effect Effects 0.000 abstract 1
- 230000015556 catabolic process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/12—Testing dielectric strength or breakdown voltage ; Testing or monitoring effectiveness or level of insulation, e.g. of a cable or of an apparatus, for example using partial discharge measurements; Electrostatic testing
- G01R31/1218—Testing dielectric strength or breakdown voltage ; Testing or monitoring effectiveness or level of insulation, e.g. of a cable or of an apparatus, for example using partial discharge measurements; Electrostatic testing using optical methods; using charged particle, e.g. electron, beams or X-rays
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Dispersion Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
The invention relates to a metal particle research method and a device based on adding space charge to a third electrode, wherein the device comprises: the device comprises a quartz glass sealed tank body, a space charge adding device and a rotary distance-adjusting flat electrode; the space charge adding device includes: the device comprises a first rotating handle, a second rotating handle, a rotating sealing structure, a sliding sealing structure, a perforated flat electrode, a metal shielding baffle and a charge injection electrode. The space charge adding device can inject space charge into the cavity under the condition of not influencing the electric field of the original flat plate electrode, and the base of the device can be adjusted. The invention can be used for the research of the physical property, the electrical property and the like of the metal particles in the gas medium under the action of space charge.
Description
Technical field
The present invention relates to metal particle research devices, particularly, are related to a kind of based on third electrode addition space charge
Metal particle research device.
Background technique
GIS/GIL is widely used because of its good insulation performance and high operational reliability, still, in recent years,
The dielectric breakdown accident due to caused by metal particle is commonplace.Mostly there is a large amount of space charge, spaces inside GIS/GIL
Charge has an important influence particle take-off and gap breakdown, therefore, studies under space charge effect, and the movement of particle is special
Property and electrology characteristic for detection of particulates, understanding particle take-off process and puncture mechanism inside equipment it is meaningful.
To existing metal particle research device, third electrode is mostly used to infuse the technique study space charge of space charge in advance
Influence for particle take-off and breakdown.But pre- injecting electrode is arranged between original electrode more, it can be right in experimentation
Original electrode forms electric field distortion, so that electric field is not able to satisfy uniform electric field or slightly uneven electric field item between original electrode
Part deviates actual conditions.
Summary of the invention
This patent proposes new solution for the problem present on.
This patent provides a kind of metal particle research device based on third electrode addition space charge, and the device is available
Metal particle is by the physical characteristic under space charge effect and the research in terms of electrology characteristic in gas medium.Device can simultaneously
With in the case where not influencing original electrode uniform electric field or slightly uneven electric field to cavity Injection Space charge.
According to the present invention, a kind of metal particle research device based on third electrode addition space charge is provided, it is described
Inflatable metal particle research device includes:
Quartz glass seals tank body 10, space charge adding set and rotation roll adjustment plate electrode 6；
The space charge adding set include: the first rotating handle 1, the second rotating handle 4, rotary seal structure 3,
It is slidingly sealed structure 5, apertured plate electrode 7, metallic shield baffle 2, charge injecting electrode.
In a preferred embodiment, first rotating handle 1, the second rotating handle 4 use teflon insulation
The screw thread of vertical direction is carved with to increase stiction in material, surface；First rotating handle 1 passes through rotation by metal screw
Turn sealing structure 3 to be fixedly connected with metallic shield baffle 2.
In a preferred embodiment, the rotary seal structure 3 guarantees junction while screw rod rotates horizontally
Leakproofness；Relative rotary displacement is generated between metallic shield baffle 2 and apertured plate electrode 7, convenient for stretching for charge injecting electrode
Out with shielding.
In a preferred embodiment, the structure 5 that is slidingly sealed is while charge injecting electrode carries out rotary extension
Guarantee the leakproofness of junction；Charge injecting electrode carries out the distance on vertical direction by the second rotating handle 4 and adjusts；It is needing
It is protruded into when adding space charge inside quartz glass seals tank body 10, with one spacing of formation between rotation roll adjustment plate
It is less than particle take-off voltage from guarantee charge injecting voltage；After charge injection, by the second rotating handle 4 charge is injected
Electrode is hidden in inside apertured plate electrode 7.
In a preferred embodiment, it slots in the apertured plate electrode 7, the slot and the metallic shield baffle
2 size, shape are identical；It is described to be hidden in slot when metallic shield baffle 2 is overlapped with the slot.
In a preferred embodiment, the slot end uses chamfer design, convenient for the back-out of metallic shield baffle；It is described
It is closely connected between apertured plate electrode 7 and metallic shield baffle 2, gap is less than 0.05mm.
In a preferred embodiment, charge injecting electrode end using aciculiform design, with rotation roll adjustment plate 6 it
Between constitute severe non-uniform electric field, for the space charge for injecting positive-negative polarity inside quartz glass seals tank body 10；Rotation is adjusted
Anomaly plate electrode 6 carries out the adjusting of electrode distance by insulated rotary handle 8.
In a preferred embodiment, rotation 6 diameter of roll adjustment plate electrode is identical as 10 internal diameter of quartz glass seals tank body,
Guarantee that particle does not deviate by between pole plate in hopping process.
In a preferred embodiment, four angles of pedestal 12 are using the bolt arrangement 13 that can carry out vertical direction adjusting.
The invention also provides a kind of experiment sides of metal particle research device based on third electrode addition space charge
Method, comprising:
Step 1: before experiment starts, required space charge being filled with to experiment cavity；
Step 2: the first rotating handle 1 of rotation drives metallic shield baffle 2 that the hole in apertured plate electrode 7 is revealed
Out；
Step 3: the charge injecting electrode that the second insulated handle 4 of rotation makes protrudes into 10 inside of quartz glass seals tank body and rotation
Modulation anomaly plate 6 forms certain distance；
Step 4: applying certain voltage in charge injecting electrode, so that space charge is injected into quartz glass seals tank body
Among 10；
Step 5: the second insulated handle 4 of rotation retracts charge injecting electrode in apertured plate electrode 7；
Step 6: the first insulated handle 1 of rotation drives metallic shield baffle 2 to cover hole, completes the injection of space charge
Journey.
Detailed description of the invention
Fig. 1 is that the present invention is based on the structures of the metal particle research device research device of third electrode addition space charge to show
It is intended to；
Fig. 2 is the structural schematic diagram of metallic shield baffle of the present invention；
Fig. 3 is the structural schematic diagram of apertured plate electrode of the present invention.
Specific embodiment
In order to be easy to understand the technical means, the creative features, the aims and the efficiencies achieved by the present invention, tie below
Specific attached drawing is closed to be described in further details structural principle and working principle of the invention:
Metal particle research device based on third electrode addition space charge as illustrated in FIG. 1, the inflatable gold
Belonging to particle research device includes:
Quartz glass seals tank body 10, space charge adding set and rotation roll adjustment plate electrode 2 are constituted；Pedestal can carry out
Level tune.
The space charge adding set includes: that rotating handle 1 and rotating handle 4, rotary seal structure 3, sliding are close
Seal structure 5, apertured plate electrode 7, metallic shield baffle 2, charge injecting electrode.
Using the insulation system of polytetrafluoroethylene (PTFE), vertical direction is carved on surface for the rotating handle 1 and rotating handle 4
Screw thread increases stiction；Rotating handle 1 passes through rotary seal structure 3 and the fixed company of metallic shield baffle 2 by metal screw
It connects, wherein rotary seal structure 3 guarantees the leakproofness of junction while screw rod rotates horizontally.Metallic shield baffle 2 with open
Relative rotary displacement is generated between hole plate electrode 7, convenient for the stretching and shielding of charge injecting electrode.
The sealing for being slidingly sealed structure 5 and guaranteeing junction while charge injecting electrode carries out rotary extension
Property；Charge injecting electrode can carry out the adjusting of the distance on vertical direction by rotating handle 4.Needing to add space charge
When protrude into experiment cavity in, rotation roll adjustment plate between formation certain distance guarantee charge injecting voltage less than particle rise
Jump voltage.After charge injection, by rotating handle 4 charge injecting electrode is hidden in inside apertured plate electrode 7.
As shown in Figure 2,3, be provided in the apertured plate electrode 7 with the equiform slot of metallic shield baffle 2, in gold
Belonging to when shielding baffle 2 covers hole can be hidden in slot, and it is 0.4mm that the depth of slot is identical as metallic shield baffle；
The end of slot uses chamfer design, convenient for the back-out of metallic shield baffle.It is adopted between apertured electrodes and metallic shield baffle simultaneously
With close connection, clearance distance is less than 0.05mm.This structure can be designed so that after charge injection, between plate electrode
There is no electric field distortion.
The tip of charge injecting electrode is designed using aciculiform, constitutes severe non-uniform electric field between rotation roll adjustment plate 6, can
To inject the space charge of positive-negative polarity to inside cavity；Rotation roll adjustment plate electrode 6 can be carried out by insulated rotary handle 8
The adjusting of electrode distance increases the scope of application of device.6 diameter of roll adjustment plate electrode and 10 internal diameter phase of sealed shell of tank are rotated simultaneously
Together, guarantee that particle does not deviate by between pole plate in hopping process.
Sealed shell of tank 10 is made of quartz glass, can carry out grinding for the optical characteristics of particle movement characteristic and electric discharge generation
Study carefully；Four angles of pedestal 12 guarantee that experiment starts preceding metal particle and exists using the bolt arrangement 13 that can carry out vertical direction adjusting
Relative position on plate electrode, while the inclined degree of adjustable device.
Before experiment starts, required space charge need to be filled with to experiment cavity, at this moment rotating handle 1 drives metal screen
Covering baffle 2 exposes the hole in apertured electrodes 7, and rotating insulated handle 4 makes charge injecting electrode protrude into experiment chamber later
Internal portion and rotation roll adjustment plate 6 form certain distance, apply certain voltage in charge injecting electrode, so that space charge is infused
Enter among experiment cavity, rotating insulated handle 4 retracts charge injecting electrode in apertured plate electrode later.Finally rotation is exhausted
Edge handle 1 drives metallic shield baffle to cover hole, completes the injection process of space charge.
Disclosure above-described embodiment can be used for metal particle in gas medium compared with traditional metal particle research device
By the physical characteristic under space charge effect and the research in terms of electrology characteristic.Device can be not influence original electrode equal simultaneously
To cavity Injection Space charge in the case where even electric field or slightly uneven electric field.
The foregoing is merely the preferred embodiments of the invention patent, are not limited to patent of invention, for this field
For technical staff, the invention patent can have various modifications and variations.It is all the invention patent spirit and principle within, institute
Any modification, equivalent substitution, improvement and etc. of work, should be included within the scope of protection of the patent of the present invention.
Claims (9)
1. the metal particle research device based on third electrode addition space charge, which is characterized in that described device includes: quartz
Glass capsulation tank body (10), space charge adding set and rotation roll adjustment plate electrode (6)；
The space charge adding set includes: the first rotating handle (1), the second rotating handle (4), rotary seal structure
(3), structure (5), apertured plate electrode (7), metallic shield baffle (2), charge injecting electrode are slidingly sealed；
First rotating handle (1), the second rotating handle (4) use Teflom Insulation Material, and vertical side is carved on surface
To screw thread to increase stiction；First rotating handle (1) passes through rotary seal structure (3) and gold by metal screw
Belong to shielding baffle (2) to be fixedly connected.
2. the apparatus according to claim 1, it is characterised in that: what the rotary seal structure (3) rotated horizontally in screw rod
Guarantee the leakproofness of junction simultaneously；Relative rotary displacement is generated between metallic shield baffle (2) and apertured plate electrode (7),
Convenient for the stretching and shielding of charge injecting electrode (15).
3. the apparatus according to claim 1, it is characterised in that: it is described be slidingly sealed structure (5) charge injecting electrode into
Guarantee the leakproofness of junction while row rotary extension；Charge injecting electrode carries out vertical side by the second rotating handle (4)
Upward distance is adjusted；It is internal that quartz glass seals tank body (10) is protruded into when needing to add space charge, is adjusted with rotation
Formation certain distance between anomaly plate guarantees that charge injecting voltage is less than particle take-off voltage；After charge injection, by the
It is internal that two rotating handles (4) make charge injecting electrode (15) be hidden in apertured plate electrode (7).
4. the apparatus according to claim 1, it is characterised in that: slot in the apertured plate electrode (7), the slot with
Size, the shape of the metallic shield baffle (2) are identical；The metallic shield baffle (2) is hidden in slot when being overlapped with the slot
It is interior.
5. device according to claim 4, it is characterised in that: the slot end uses chamfer design, is convenient for metallic shield
The back-out of baffle；It is closely connect between the apertured plate electrode (7) and metallic shield baffle (2), gap is less than 0.05mm.
6. the apparatus according to claim 1, it is characterised in that: charge injecting electrode end is designed using aciculiform, with
Severe non-uniform electric field is constituted between rotation roll adjustment plate (6), for injecting positive and negative anodes to quartz glass seals tank body (10) is internal
The space charge of property；Rotate the adjusting that roll adjustment plate electrode (6) carry out electrode distance by insulated rotary handle (8).
7. device according to claim 6, it is characterised in that: rotation roll adjustment plate electrode (6) diameter and quartz glass are close
Sealed cans body (10) internal diameter is identical, guarantees that particle does not deviate by between pole plate in hopping process.
8. the apparatus according to claim 1, it is characterised in that: four angles use of pedestal (12) can carry out vertical direction tune
The bolt arrangement (13) of section.
9. a kind of experiment side of the metal particle research device described in claim 1 based on third electrode addition space charge
Method, it is characterised in that:
Step 1: before experiment starts, required space charge being filled with to experiment cavity；
Step 2: rotation the first rotating handle (1) drives metallic shield baffle (2) to make the hole on apertured plate electrode (7)
Expose；
Step 3: rotation the second insulated handle (4) makes charge injecting electrode protrude into quartz glass seals tank body (10) inside and rotation
Modulation anomaly plate (6) forms certain distance；
Step 4: applying certain voltage in charge injecting electrode, so that space charge is injected into quartz glass seals tank body (10)
Among；
Step 5: rotation the second insulated handle (4) retracts charge injecting electrode in apertured plate electrode (7)；
Step 6: rotation the first insulated handle (1) drives metallic shield baffle (2) to cover hole, completes the injection of space charge
Journey.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610224569.5A CN105910963B (en) | 2016-04-12 | 2016-04-12 | Metal particle research method and device based on addition of space charge by third electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610224569.5A CN105910963B (en) | 2016-04-12 | 2016-04-12 | Metal particle research method and device based on addition of space charge by third electrode |
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| Publication Number | Publication Date |
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| CN105910963A CN105910963A (en) | 2016-08-31 |
| CN105910963B true CN105910963B (en) | 2018-12-04 |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108242196B (en) * | 2018-01-30 | 2023-05-05 | 中国科学院上海技术物理研究所 | Particle injection mechanism used in microgravity environment for space science experiment |
| CN110554254B (en) * | 2019-09-23 | 2021-02-02 | 华北电力大学 | Observing device for metal dust adsorption and accumulated charges of GIS or GIL equipment |
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| US6327021B1 (en) * | 1998-07-06 | 2001-12-04 | Mitsubishi Denki Kabushiki Kaisha | Mask inspection system and method of manufacturing semiconductor device |
| CN102680574A (en) * | 2012-05-14 | 2012-09-19 | 云南电力试验研究院（集团）有限公司电力研究院 | GIS (Gas Insulated Switchgear) inner particle detecting method adopting polarity-reversal direct-current voltage |
| CN103091609A (en) * | 2013-01-09 | 2013-05-08 | 中国电力科学研究院 | Performance detecting system and method thereof of gas insulated substation (GIS) partial discharge on-line monitoring device |
| CN203178423U (en) * | 2013-03-29 | 2013-09-04 | 国家电网公司 | Apparatus for testing poor contact caused by metal particles on basin-type insulator |
| CN105203859A (en) * | 2015-09-11 | 2015-12-30 | 华北电力大学 | Rotary charge measurement mechanism considering metal particle influence |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4094249B2 (en) * | 2001-06-12 | 2008-06-04 | 三菱電機株式会社 | Gas detector |
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2016
- 2016-04-12 CN CN201610224569.5A patent/CN105910963B/en active Active
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| US6327021B1 (en) * | 1998-07-06 | 2001-12-04 | Mitsubishi Denki Kabushiki Kaisha | Mask inspection system and method of manufacturing semiconductor device |
| CN102680574A (en) * | 2012-05-14 | 2012-09-19 | 云南电力试验研究院（集团）有限公司电力研究院 | GIS (Gas Insulated Switchgear) inner particle detecting method adopting polarity-reversal direct-current voltage |
| CN103091609A (en) * | 2013-01-09 | 2013-05-08 | 中国电力科学研究院 | Performance detecting system and method thereof of gas insulated substation (GIS) partial discharge on-line monitoring device |
| CN203178423U (en) * | 2013-03-29 | 2013-09-04 | 国家电网公司 | Apparatus for testing poor contact caused by metal particles on basin-type insulator |
| CN105203859A (en) * | 2015-09-11 | 2015-12-30 | 华北电力大学 | Rotary charge measurement mechanism considering metal particle influence |
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| Title |
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