CN105792605B - A kind of three-dimensional space network porous high-efficiency radiator and application - Google Patents
A kind of three-dimensional space network porous high-efficiency radiator and application Download PDFInfo
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- CN105792605B CN105792605B CN201610162581.8A CN201610162581A CN105792605B CN 105792605 B CN105792605 B CN 105792605B CN 201610162581 A CN201610162581 A CN 201610162581A CN 105792605 B CN105792605 B CN 105792605B
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/20009—Modifications to facilitate cooling, ventilating, or heating using a gaseous coolant in electronic enclosures
- H05K7/20136—Forced ventilation, e.g. by fans
- H05K7/20154—Heat dissipaters coupled to components
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/20218—Modifications to facilitate cooling, ventilating, or heating using a liquid coolant without phase change in electronic enclosures
- H05K7/20263—Heat dissipaters releasing heat from coolant
Abstract
A kind of three-dimensional space network porous high-efficiency radiator and application, the radiator includes the porous radiator of three-dimensional space network, shell, heat-exchange fluid, driving equipment, the porous radiator of three-dimensional space network is made up of foam metal skeleton, high heat conduction strengthening layer, the high heat conduction strengthening layer is by chemical gaseous phase depositing process uniform deposition in foam metal skeleton surface, the one kind of the high heat conduction strengthening layer in diamond film, graphene coated diamond, CNT cladding diamond, carbon nano tube/graphene cladding diamond.Radiator in high-efficiency radiator produced by the present invention forms the entirety of a full-mesh in a seamless fashion, uniformly it is distributed in the form of three-dimensional network in shell, comparing traditional heat sinks has the excellent continuous capacity of heat transmission, liquid can be introduced in spatial network or gaseous fluid strengthens radiating, can be widely applied in the national economy such as heat management, electronics, the energy, traffic field.
Description
Technical field
The invention discloses a kind of three-dimensional space network porous high-efficiency radiator and application, belongs to thermal management device technology neck
Domain.
Background technology
As complexity and function increase with surprising rapidity, the power of microelectronics system is constantly increasing, volume
But constantly reduce.Electronic component is also thermal source in itself, is in the peak of whole equipment temperature, and too high temperature rise often causes
Electronic system malfunction and the lethal factor of failure.To make electronic system (particularly sensitive circuit and component) can be sustainedly and stably
Work, it is carried out effectively reliable radiating obviously it is particularly significant therefore, research and develop efficient electronic radiation material and
Oneself is very urgent for correlation technique.
Diamond is one of thermal conductivity highest material (room temperature is up to 2200W/mK) in nature, while its thermal expansion system
Number and density are only 0.8 × 10-6/ K and 3.52g/cm3, it is mutually compound with high-thermal conductive metal using diamond as enhancing, ensureing to gather around
While having preferable thermal coefficient of expansion and low-density, more excellent heat conductivility can be obtained.It is most thin, strong as what is had now been found that
A kind of novel nano-material that degree is maximum, electrical and thermal conductivity performance is most strong, graphene is referred to as " dark fund ", is " king of new material ",
Scientist even foretells that graphene " will thoroughly change 21 century ".Foam metal material has a preferable thermal conductivity, and
And itself is light, inexpensive, there is more superior future and market in terms of heat sink material exploitation.
Highly heat-conductive material is compound with foam metal, this advanced composite material (ACM) have density is small, intensity is big, high temperature resistant,
The advantages that anticorrosive, radioresistance, high heat conduction, small thermal coefficient of expansion.Radiator is made with this material, its thermal conductivity is high, production
Product stable performance, the service efficiency of electronic equipment can be effectively improved, extend the service life of electronic equipment.
The content of the invention
It is an object of the invention to overcome the deficiency of prior art, there is provided a kind of simple and reasonable, good heat conductivity, in
Electronic package material can be as the three-dimensional space network porous high-efficiency radiator and application that electronic package material uses after combining.This
Invention, by building continuous diamond three-dimensional network in metal foam surface, is become using the network blackboard of metal foam
High heat conduction isolated island is high heat conduction passage, greatly improves the radiating efficiency for dissipating device.
A kind of three-dimensional space network porous high-efficiency radiator of the present invention, it is porous scattered that the radiator includes three-dimensional space network
Hot body, shell, heat-exchange fluid, driving equipment, the porous radiator of three-dimensional space network are arranged in shell, heat exchange flow
Body is under the pressure driving of driving equipment, and the fluid passage set along shell enters shell inner cavity and flowed out along passage, and heat is handed over
Change of current body flows through the porous radiator of three-dimensional space network in shell inner cavity, realizes heat exchange with radiator, it is characterised in that described
The porous radiator of three-dimensional space network is made up of foam metal skeleton, high heat conduction strengthening layer, the passing through of high heat conduction strengthening layer
Learn CVD method uniform deposition and be selected from diamond film, graphene in foam metal skeleton surface, the high heat conduction strengthening layer
One kind in cladding diamond, CNT cladding diamond, carbon nano tube/graphene cladding diamond.
A kind of three-dimensional space network porous high-efficiency radiator of the present invention, heat-exchange fluid is air or coolant, and driving is set
Standby is fan or circulating pump.
A kind of three-dimensional space network porous high-efficiency radiator of the present invention, fans drive air are porous scattered with three-dimensional space network
Hot body carries out heat exchange and forms open heat-exchange system；Circulating pump driving coolant is entered with the porous radiator of three-dimensional space network
Row heat exchange forms closed type hot exchange system；Closed type hot exchange system is by circulating pump, the fluid passage on shell, pipe
Road is formed.
A kind of three-dimensional space network porous high-efficiency radiator of the present invention, the foam metal skeleton are selected from nickel foam, foam
One kind in copper, titanium foam, foam chromium, foam ferronickel.
A kind of three-dimensional space network porous high-efficiency radiator of the present invention, in the foam metal skeleton, foam aperture is
0.01~10mm, percent opening 40%~99%, foam cells are uniformly distributed or random distribution；Foam framework is planar structure or three
Tie up stereochemical structure.
A kind of three-dimensional space network porous high-efficiency radiator of the present invention, the high heat conduction strengthening layer thickness is 1nm~2mm.
A kind of three-dimensional space network porous high-efficiency radiator of the present invention, the porous radiator of three-dimensional space network are used with lower section
It is prepared by method：
After the cleaning of foam framework substrate, drying, Buddha's warrior attendant is grown in foam framework surface in situ using chemical vapor deposition
Stone film, obtain the porous radiator of three-dimensional space network of the uniform diamond film in surface；Deposition parameter is：
Depositing diamond film：
It is 0.5-10.0% that carbonaceous gas, which accounts for all gas mass flow percentage in stove,；Growth temperature is 600-1000
DEG C, grow air pressure 103-104Pa；
Or
After the cleaning of foam framework substrate, drying, graphite is grown in foam framework surface in situ using chemical vapor deposition
Alkene cladding diamond, CNT cladding diamond, carbon nano tube/graphene cladding diamond, in foam bone in deposition process
Apply plasma asistance growth on frame substrate, and it is by adding magnetic field in substrate bottom that plasma confinement is near in foam framework
Surface, strengthen bombardment of the plasma to foam framework surface, make graphene or/and perpendicular to foam framework superficial growth, formed
Graphene wall, obtain the uniform graphene coated diamond in surface, CNT cladding diamond or carbon nano tube/graphene cladding
The porous radiator of three-dimensional space network of diamond；Depositing operation is：
Deposited graphite alkene cladding diamond：
First, it is in substrate surface depositing diamond, deposition parameter using chemical vapour deposition technique：Carbonaceous gas accounts for stove
Interior all gas mass flow percentage is 0.5-10.0%；Growth temperature is 600-1000 DEG C, and growth air pressure is 103-104Pa；
Then, then in diamond surface deposited graphite alkene wall, graphene grown perpendicular to diamond surface, form graphene wall, deposition
Parameter is：It is 0.5-80% that carbonaceous gas, which accounts for all gas mass flow percentage in stove,；Growth temperature is 400-1200 DEG C, raw
Long air pressure is 5-105Pa；Plasma electric current density is 0-50mA/cm2；In deposition region magnetic field intensity be 100 Gausses to 30 it is special this
Draw；
Deposition of carbon nanotubes cladding diamond：
First, it is in substrate surface depositing diamond, deposition parameter using chemical vapour deposition technique：Carbonaceous gas accounts for stove
Interior all gas mass flow percentage is 0.5-10.0%；Growth temperature is 600-1000 DEG C, and growth air pressure is 103-104Pa；
Then, in diamond surface using in plating, chemical plating, evaporation, magnetron sputtering, chemical vapor deposition, physical vapour deposition (PVD)
A kind of method deposits nickel, copper, one kind of cobalt or composite catalytic layer in deposition surface；Redeposited CNT, deposition parameter are：Contain
It is 5-50% that carbon gas, which accounts for all gas mass flow percentage in stove,；Growth temperature is 400-1300 DEG C, and growth air pressure is
103-105Pa；Plasma electric current density is 0-30mA/cm2；Magnetic field intensity is 100 Gausses to 30 teslas in deposition region；
Deposition of carbon nanotubes/graphene coated diamond：
First, it is in substrate surface depositing diamond, deposition parameter using chemical vapour deposition technique：Carbonaceous gas accounts for stove
Interior all gas mass flow percentage is 0.5-10.0%；Growth temperature is 600-1000 DEG C, and growth air pressure is 103‐104Pa；
Then, deposited in diamond surface using plating, chemical plating, evaporation, magnetron sputtering, chemical vapor deposition, physical vapour deposition (PVD)
In a kind of method deposit nickel, copper, one kind of cobalt or composite catalytic layer in deposition surface；Redeposited CNT woods, graphene
Wall；CNT woods deposition parameter is：It is 5-50% that carbonaceous gas, which accounts for all gas mass flow percentage in stove,；Growth temperature
For 400-1300 DEG C, growth air pressure is 103‐105Pa；Plasma electric current density is 0-30mA/cm2；Magnetic field intensity in deposition region
For 100 Gausses to 30 teslas；Graphene wall deposition parameter is：Carbonaceous gas accounts for all gas mass flow percentage in stove
0.5-80%；Growth temperature is 400-1200 DEG C, and growth air pressure is 5-105Pa；Plasma electric current density is 0-50mA/cm2；It is heavy
Magnetic field intensity is 100 Gausses to 30 teslas in product region.
A kind of three-dimensional space network porous high-efficiency radiator of the present invention, after the cleaning of foam framework substrate, drying, first using electricity
A kind of method in plating, chemical plating, evaporation, magnetron sputtering, chemical vapor deposition, physical vapour deposition (PVD) deposits in substrate surface
One kind or complex metal layer in nickel, copper, tungsten, molybdenum, titanium, silver, chromium, then, it is placed in the mixing of nanocrystalline and micron diamond
In the suspension of grain, shake, be uniformly dispersed in ultrasonic wave, obtain mesh surface and adsorb nanocrystalline and micron diamond particle
Foam framework substrate；It is former on foam framework surface or diamond particle surfaces using chemical vapor deposition to bubble facial bone frame substrate
Position growing diamond film, graphene coated diamond, CNT cladding diamond, carbon nano tube/graphene cladding diamond,
Obtain the porous radiator of three-dimensional space network.
A kind of application of three-dimensional space network porous high-efficiency radiator of the present invention, is to dissipate three-dimensional space network porous high-efficiency
Hot device shell is connected with electronic package material, as the electronic package material for possessing self heat dissipation function.
This patent, as substrate, is existed from foam metal that is easily prepared and being seamlessly connected using chemical vapour deposition technique
Its surface prepares High Quality Diamond Films layer, constructs diamond three-dimensional network skeleton, passes through three dimensions made from this method
The porous radiator of network can intactly replicate the structure of foam metal, and the highly heat-conductive material deposited on radiator is to be seamlessly connected
Mode form the entirety of a full-mesh, there is the excellent continuous capacity of heat transmission so that the thermal conductivity of radiator compares biography
System radiator is greatly improved, it will is a kind of very promising new radiator, can be widely applied in heat management, electricity
The national economy such as son, the energy, traffic field.
Figure of description
Accompanying drawing 1 is that fans drive air of the present invention radiator progress heat exchange composition porous with three-dimensional space network is open
Heat-exchange system structural representation.
Accompanying drawing 2 is that circulating pump of the present invention drives coolant radiator progress heat exchange composition porous with three-dimensional space network to seal
Enclosed heat-exchange system structural representation.
Embodiment
Embodiment one：
(1) foam Cu substrates are carried out into acetone ultrasound respectively to wash, dilute sulfuric acid ultrasound is washed, and deionized water ultrasound is washed.Then exist
It is used above magnetically controlled sputter method and is sputtering Mo film layers thereon, and wherein Mo film thicknesses are 100nm；
(2) HF CVD depositing diamond film, deposition process parameters will be used on foam Cu substrates obtained by step (1)：Heated filament
Apart from substrate 6mm, 850 DEG C of substrate temperature, 2200 DEG C, deposition pressure 3KPa of hot-wire temperature, sedimentation time 50 hours, CH4/H2Body
Product flow-rate ratio 1:99；Obtain the porous radiator of three dimensions diamond network.
(3) by three-dimensional space network porous high-efficiency radiator load it is suitable with its volume, inwall it is in close contact therewith outside
Shell, a radiator is formed, radiator is connected with electronic package material, as the electronic package material for possessing self heat dissipation function.
Embodiment two：
(1) foam Ti substrates are carried out into acetone ultrasound respectively to wash, dilute sulfuric acid ultrasound is washed, and deionized water ultrasound is washed.Then exist
It is used above magnetically controlled sputter method and is sputtering W film layers thereon, and wherein W film thicknesses are 300nm；
(2) HF CVD deposited graphite alkene film, deposition process parameters will be used on foam Ti substrates obtained by step (1)：Heated filament
Apart from substrate 6mm, 900 DEG C of substrate temperature, 2200 DEG C, deposition pressure 4KPa of hot-wire temperature, plasma electric current density 40mA/cm2
Sedimentation time 30 hours, CH4/H2Volume flow ratio 6:94, obtain the porous radiator of three dimensions graphene network.
(3) gained radiator one side is combined closely with copper coin, another side installs fan, forms air-cooled radiator.
Embodiment three：
(1) foam Ti substrates are carried out into acetone ultrasound respectively to wash, dilute sulfuric acid ultrasound is washed, and deionized water ultrasound is washed.Then exist
It is used above the method for vacuum evaporation and is sputtering Ni film layers thereon, and wherein Ni film thicknesses are 500nm；
(2) HF CVD deposition of carbon nanotubes film, depositing operation ginseng will be used obtained by step (1) on modified foam Ti substrates
Number：Heated filament is apart from substrate 8mm, 900 DEG C of substrate temperature, 2200 DEG C, deposition pressure 6KPa of hot-wire temperature, plasma electric current density
20mA/cm2, sedimentation time 2 hours, CH4/H2Volume flow ratio 15:85.
(3) gained three-dimensional porous material loads suitable with its volume, and inwall is in close contact therewith, and both sides are provided with Inlet and outlet water
In the copper mold in hole, circulating water cooling system is connected in holes, forms water-filled radiator.
Example IV：
(1) it is to fix one block of 20mm foamed plastics in the polished high-purity copper plates of 5mm in thickness, by CrO3+H2SO4It is molten
Liquid oxidation is roughened, then through over cleaning, reduction, in SnCl2Sensitized treatment in+HCl solution, in PdCl2In+HCl solution at activation
Reason, immerse CuSO4Chemical plating in electrolyte, thickness of coating are 10 μm.Pass through progress hydrogen reduction at 800 DEG C again and prepare by annealing copper
The foam copper of plate support.
(2) copper coin support foam copper is placed in acetone and be cleaned by ultrasonic, dilute sulfuric acid ultrasound is washed, and ultrasound is washed in deionized water.
High-temp glue is sticked on copper coin surface, then sputters one layer of Cr film layer in foam segment, the thickness of Cr layers is 800nm.
(3) obtained by above-mentioned (2) on substrate, using the honeycomb substrate surface depositing diamond film of HF CVD after modification,
Deposition process parameters：Heated filament distance 6mm, 800 DEG C of substrate temperature, 2200 DEG C of hot-wire temperature, deposition pressure 3KPa, CH4/H2Volume
Flow-rate ratio 1:99, deposition is after 30 hours, and it is 1000 DEG C to change substrate temperature, deposition pressure 5KPa, CH4/H2Volume ratio 5:95, etc.
Ion current density 15mA/cm2, the Gauss of magnetic field intensity 1000 in deposition region.Induced growth graphene film, time 1h.Remove
Copper coin surface high-temp glue is removed, obtains the porous radiator of three-dimensional space network.
The porous radiator of three-dimensional space network is combined with electronic package material without the side surface of copper coin one and fan is installed, can
Form air-cooled radiator.
Claims (8)
1. a kind of three-dimensional space network porous high-efficiency radiator, the radiator includes the porous radiator of three-dimensional space network, outer
Shell, heat-exchange fluid, driving equipment, the porous radiator of three-dimensional space network are arranged in shell, and heat-exchange fluid is driving
Under the pressure driving of dynamic equipment, the fluid passage set along shell enters shell inner cavity and flowed out along passage, heat-exchange fluid
The porous radiator of three-dimensional space network is flowed through in shell inner cavity, realizes heat exchange with radiator, it is characterised in that the three-dimensional space
Between the porous radiator of network be made up of foam metal skeleton, high heat conduction strengthening layer, the high heat conduction strengthening layer passes through chemical gaseous phase
For deposition process uniform deposition on foam metal skeleton surface, the high heat conduction strengthening layer is selected from diamond film, graphene coated gold
One kind in hard rock, CNT cladding diamond, carbon nano tube/graphene cladding diamond.
A kind of 2. three-dimensional space network porous high-efficiency radiator according to claim 1, it is characterised in that：Heat-exchange fluid
For air or coolant, driving equipment is fan or circulating pump.
A kind of 3. three-dimensional space network porous high-efficiency radiator according to claim 2, it is characterised in that：Fans drive is empty
Gas carries out heat exchange with the porous radiator of three-dimensional space network and forms open heat-exchange system；Circulating pump drives coolant and three
The porous radiator of dimension space network carries out heat exchange and forms closed type hot exchange system；Closed type hot exchange system by circulating pump,
Fluid passage on shell, pipeline are formed.
A kind of 4. three-dimensional space network porous high-efficiency radiator according to claim 1, it is characterised in that：The foam gold
Belong to the one kind of skeleton in nickel foam, foam copper, titanium foam, foam chromium, foam ferronickel.
A kind of 5. three-dimensional space network porous high-efficiency radiator according to claim 4, it is characterised in that：The foam gold
Belong in skeleton, foam aperture is 0.01 ~ 10mm, and percent opening 40% ~ 99%, foam cells are uniformly distributed or random distribution；Foam bone
Frame is planar structure or 3-D solid structure.
A kind of 6. three-dimensional space network porous high-efficiency radiator according to claim 1, it is characterised in that：The high heat conduction
Strengthening layer thickness is 1nm ~ 2mm.
A kind of 7. three-dimensional space network porous high-efficiency radiator according to claim 1, it is characterised in that：Three dimensions net
The porous radiator of network is prepared using following methods：
After the cleaning of foam framework substrate, drying, using chemical vapor deposition in foam framework surface in situ growing diamond film,
Obtain the porous radiator of three-dimensional space network of the uniform diamond film in surface；Deposition parameter is：
Depositing diamond film：
It is 0.5-10.0% that carbonaceous gas, which accounts for all gas mass flow percentage in stove,；Growth temperature is 600-1000 DEG C, growth
Air pressure 103-104Pa；
Or
After the cleaning of foam framework substrate, drying, graphene bag is grown in foam framework surface in situ using chemical vapor deposition
Diamond, CNT cladding diamond, carbon nano tube/graphene cladding diamond are covered, is served as a contrast in deposition process in foam framework
Apply plasma asistance growth on bottom, and by adding magnetic field plasma confinement in the nearly table of foam framework in substrate bottom
Face, strengthen bombardment of the plasma to foam framework surface, graphene or/and CNT is given birth to perpendicular to foam framework surface
It is long, graphene wall is formed, obtains the uniform graphene coated diamond in surface, CNT cladding diamond or CNT/stone
The porous radiator of three-dimensional space network of black alkene cladding diamond；Depositing operation is：
Deposited graphite alkene cladding diamond：
First, it is in substrate surface depositing diamond, deposition parameter using chemical vapour deposition technique：Carbonaceous gas accounts for complete in stove
Portion's gas mass flow percentage is 0.5-10.0%；Growth temperature is 600-1000 DEG C, grows air pressure 103-104Pa；Then, then
In diamond surface deposited graphite alkene wall, graphene grows perpendicular to diamond surface, forms graphene wall, and deposition parameter is：
It is 5-80% that carbonaceous gas, which accounts for all gas mass flow percentage in stove,；Growth temperature is 400-1200 DEG C, growth air pressure 5-
105Pa；Plasma electric current density 0-50mA/cm2；Magnetic field intensity is 100 Gausses to 30 teslas in deposition region；
Deposition of carbon nanotubes cladding diamond：
First, it is in substrate surface depositing diamond, deposition parameter using chemical vapour deposition technique：Carbonaceous gas accounts for complete in stove
Portion's gas mass flow percentage is 0.5-10.0%；Growth temperature is 600-1000 DEG C, grows air pressure 103-104Pa；Then, exist
Diamond surface is using a kind of method in plating, chemical plating, evaporation, magnetron sputtering, chemical vapor deposition, physical vapour deposition (PVD)
Nickel, copper, one kind of cobalt or composite catalytic layer are deposited in deposition surface；Redeposited CNT, deposition parameter are：Carbonaceous gas accounts for
All gas mass flow percentage is 5-50% in stove；Growth temperature is 400-1300 DEG C, grows air pressure 103-105Pa；Deng from
Electron current density 0-30mA/cm2；Magnetic field intensity is 100 Gausses to 30 teslas in deposition region；
Deposition of carbon nanotubes/graphene coated diamond：
First, it is in substrate surface depositing diamond, deposition parameter using chemical vapour deposition technique：Carbonaceous gas accounts for complete in stove
Portion's gas mass flow percentage is 0.5-10.0%；Growth temperature is 600-1000 DEG C, grows air pressure 103-104Pa；Then, exist
Diamond surface deposition is using one kind in plating, chemical plating, evaporation, magnetron sputtering, chemical vapor deposition, physical vapour deposition (PVD)
Method deposits nickel, copper, one kind of cobalt or composite catalytic layer in deposition surface；Redeposited CNT woods, graphene wall；Carbon nanometer
Pipe woods deposition parameter is：It is 5-50% that carbonaceous gas, which accounts for all gas mass flow percentage in stove,；Growth temperature is 400-1300
DEG C, grow air pressure 103-105Pa；Plasma electric current density 0-30mA/cm2；Magnetic field intensity is 100 Gausses to 30 in deposition region
Tesla；Graphene wall deposition parameter is：It is 5-80% that carbonaceous gas, which accounts for all gas mass flow percentage in stove,；Growth temperature
Spend for 400-1200 DEG C, growth air pressure 5-105Pa；Plasma electric current density 0-50mA/cm2；Magnetic field intensity is in deposition region
100 Gausses to 30 teslas.
A kind of 8. three-dimensional space network porous high-efficiency radiator according to claim 7, it is characterised in that：Foam framework serves as a contrast
After bottom cleaning, drying, first using one in plating, chemical plating, evaporation, magnetron sputtering, chemical vapor deposition, physical vapour deposition (PVD)
The one kind or complex metal layer of kind method in substrate surface deposits nickel, copper, tungsten, molybdenum, titanium, silver, chromium, then, are placed in nanocrystalline
In the suspension of micron diamond hybrid particles, shake, be uniformly dispersed in ultrasonic wave, obtain mesh surface and be adsorbed with to receive
Meter Jing and micron diamond particle foam framework substrate；To bubble facial bone frame substrate using chemical vapor deposition in foam framework
Surface or diamond particle surfaces growth in situ diamond film, graphene coated diamond, CNT cladding diamond, carbon are received
Mitron/graphene coated diamond, obtain the porous radiator of three-dimensional space network.
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|---|---|---|---|---|
| US10995192B2 (en) | 2016-03-21 | 2021-05-04 | Central South University | Composite material reinforced by foamed skeleton and preparation method and uses thereof |
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