CN105739248A - Optical component support structure, unit lens group, exposure optical system and photoetching machine - Google Patents
Optical component support structure, unit lens group, exposure optical system and photoetching machine Download PDFInfo
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- CN105739248A CN105739248A CN201610205482.3A CN201610205482A CN105739248A CN 105739248 A CN105739248 A CN 105739248A CN 201610205482 A CN201610205482 A CN 201610205482A CN 105739248 A CN105739248 A CN 105739248A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/026—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using retaining rings or springs
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
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- Environmental & Geological Engineering (AREA)
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- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses an optical component support structure used for supporting an optical component (22) of the unit lens group (21). The optical component support structure comprises lens bases (24), wherein each lens base (24) is a mechanical member with a symmetrical circumference, a support rod (246) extends towards the center of the lens base from an inner ring of the lens base (24) and has flexibility in an optical axial direction and a radial direction of the lens base, a support surface (247) is arranged at the tail end of the support rod (246) and is matched with the lower surface of the optical component (246) so that the optical component (22) is fixed on the lens base (24), the inner side of the support rod (246) is connected with a moving table (245), the moving table (245) is connected with an outer ring of the lens base (24) through a guide mechanism (243), and the guide mechanism (243) is used for guiding the movement of the moving table (245).
Description
Technical field
The invention belongs to high-accuracy optical lens manufacture and integration techno logy field, particularly relate to a kind of can compensate for the optical element support structure of face shape, unit mirror group, exposure optical system and litho machine.
Background technology
The design of high-end photoetching projection objective lens, processing, to manufacture and debug be very accurate, a complicated system engineering.Along with the extension of Moore's Law, semiconductor industry is more and more higher to the requirement of processor chips minimum feature resolution, in order to realize high-quality imaging performance, obtain higher resolution, it is desirable to optical component surface shape precision RMS value reaches 1nm～2nm level.Along with the NA value of projection lens of lithography machine optical system is gradually increased, in photoetching projection objective lens, the clear aperature of optical element is also increasing, and it is even bigger that the external diameter of lens often reaches 320mm.But, along with the increase of optical element outside dimension, external force is also further sensitive on the impact of optical component surface shape.If accurately do not controlled, gravity or fastening force the face shape error caused is likely to exceed 2～3 times even more than 10 times of expected value.
Except the face shape error of optical element self remnants in optical manufacturing process, the supporting construction processing such as picture frame the size, the form and position tolerance that cause can cause optical element discontinuity, also can produce face shape error；Additionally, when optical element is fixed in picture frame or microscope base, no matter is adopt viscose glue or the mode of clamping, all cannot realize the effect of " unstressed " completely, also can introduce face shape error；Finally, when all of optical element and picture frame are connected into a projection objective entirety, it is necessary to adopting certain fixing and connection measure, the stress produced in the process also can be passed on optical element, introduces a degree of face shape error.Optical component surface shape precision is produced the factor of impact referred to as static face shape influence factor by above-mentioned these.
In litho machine work process, after persistently exposure, each optical element of projection objective can absorb certain laser energy, and due to optical element size, thickness difference, the temperature variation that each optical element produces is different.Owing to large-aperture optical lens are more sensitive for the change of temperature, optical system imaging performance can be had adverse effect on by the change of the optical component surface shape that temperature contrast causes.Additionally, the change of ambient temperature, air pressure also results in the deterioration of projection objective imaging performance.The factor that projection objective imaging performance produces in above-mentioned litho machine work process interference can be described as dynamic shape influence factor.
In order to realize the resolution of higher precision, it is necessary to above-mentioned static face shape error and dynamic shape error are compensated.Patent US6392825B1 discloses a kind of frame structure with multiple elastic support unit, by the elastic impact offsetting extraneous stress deformation of support unit；Owing to elastic support unit is processed by light sheet material, it is difficult to micron-sized machining accuracy, and elastic support unit and picture frame are connected by the mode of welding or screw fastened, and welding stress and screw pretightning force also can reduce the final precision of elastic support unit.Patent US6229675B1 proposes a kind of version that interior housing deforms decoupling, this structure processing technology is bad, it is a kind of passive compensation way, although the extraneous stress impact on optical component surface shape precision can be eliminated, but cannot compensate dynamic shape error.Patent US7031082B2 discloses a kind of frame structure making optical element deform, it is also equipped with deformation monitoring unit, but the deformation adjustment part of this structure is assembled by multiple parts, structure is complicated, debug difficulty, it is difficult to realize the adjustment to optical component surface shape nano-precision.Patent US7193794B2 discloses the frame structure of a kind of Active Compensation optical component surface shape error, can compensating astigmatism and the SANYE impact on system imaging performance when not changing optical element locus；But, this mode is optical axis direction cloth set driver or drive mechanism vertically, takies larger space, it is difficult to realize the adjustment to each strong point place optical element stress, and cannot for the surface shape compensation of more optical elements in same object lens.
Summary of the invention
The present invention solves optical element static state face shape error and dynamic shape compensation of error problem in photoetching projection objective lens exposure optical system, ensure that in photoetching projection objective lens manufacture process, the high accuracy of optical element supports, orientation problem, a kind of optical element support structure that can compensate for or adjust optical component surface shape is proposed, this version is simple, good manufacturability, can compensate for mismachining tolerance, debug power and the factor impact on optical component surface shape precision such as ambient temperature change, object lens can be flexibly applied to and debug, test and multiple links such as work.
This invention address that the technical scheme that above-mentioned technical problem adopts is as follows:
A kind of optical element support structure is provided, optical element for support unit mirror group, including microscope base, described microscope base is the mechanical component that a circumference is symmetrical, in described microscope base, a circle support bar is stretched out at hoop center, and described support bar is radially respectively provided with certain flexibility at optical axis direction and microscope base, and described support bar end is provided with supporting surface, described supporting surface and optical element lower surface are mutually matched, to be fixed on described microscope base by optical element；The inner side of described support bar connects a sports platform, and described sports platform is connected with microscope base outer shroud by a guiding mechanism, and described guiding mechanism is for the motion guide of sports platform.
The optical element support structure of the present invention is applied in the unit mirror group of exposure optical system, in microscope base, a circle support bar is stretched out at hoop center, support bar is radially respectively provided with certain flexibility at optical axis direction and microscope base, support bar end is provided with supporting surface, supporting surface and optical element lower surface are mutually matched to be fixed on microscope base by optical element, the superhigh precision being not only able to realize optical element supports location, make support bar that certain deformation and displacement occur by actuation movement platform, all right effective compensation is due to external process, the face shape error that build-up tolerance causes, simultaneously can also ambient temperature in real-Time Compensation work process, pressure, the aberration that laser irradiation produces.Thus, this optical element support structure can ensure the overall picture element of photoetching projection objective lens exposure optical system in whole life cycle.It addition, the optical element support structure of the present invention takes up room little, can be integral type processing with the microscope base of exposure optical system, and it is low to be prone to processing and manufacturing, cost.Can when reducing optical element support microscope base size, Geometrical Tolerance Principle, mode compensating optical element manually or automatically is static and dynamic shape, finally realizes the requirement of optical element superhigh precision face shape.And this structure can be applied to all kinds optical element, and can use between compensation range widely, it is possible to ensure the final picture element requirement of exposure optical system.
According to one embodiment of present invention, the top of described microscope base and bottom are extended with adpting flange and lower adpting flange respectively.
According to one embodiment of present invention, described guiding mechanism is connected with the outer shroud of described microscope base and is formed with slit, the range of movement of the described sports platform wide constraint by slit.
According to the present invention, described optical element support structure is with the sports platform of guide frame, it is possible to radial displacement is converted into the face deformation of optical element, it is achieved the Active Compensation of object lens picture element, can drive manually or automatically.
According to one embodiment of present invention, described guiding mechanism is the parallel-ordinal shift structure being symmetric, described parallel-ordinal shift structure ensure that sports platform moves back and forth according to default radial direction, the radial dimension of described guiding mechanism is much smaller than its axial dimension and circumferential size, make its rigidity in the direction of the optical axis much larger than its rigidity in radial directions, and then make described guiding mechanism have the one-movement-freedom-degree of radial direction.Here, much smaller than referring to dimension scale less than 1:10；Much larger than referring to dimension scale more than 10:1.
According to one embodiment of present invention, described guiding mechanism is made up of four the thin plate springs, and four the thin plate springs relatively radially symmetrically formal distribution between two, to form pair of parallel quadric chain.
According to one embodiment of present invention, the one that surface is plane, concave surface or convex surface that described supporting surface and optical element lower surface are mutually matched, described support bar quantity is be more than or equal to 3, and described support bar is circumferential uniform arrangement around optical axis.
According to one embodiment of present invention, described supporting construction also includes multiple driving mechanism, described microscope base is formed multiple along the hole, location that microscope base radially extends, hole, described location is extended to by microscope base external annular surface and communicates with described slit, described driving mechanism inserts and is fixed in microscope base with this in hole, described location, described driving mechanism end contacts with sports platform, described driving mechanism end can export certain displacement and power, and it is transferred to sports platform so as to produce radial displacement, described support bar and sports platform are joined directly together, radial displacement produced by described sports platform can directly drive support bar to produce displacement and deformation, described support bar can by power and displacement transfer to optical element.The driving mechanism of the present invention has multiple choices, it is easy to accomplish the high-precision compensation adjustment of optical component surface shape.
It addition, present invention also offers a kind of unit mirror group, it includes above-mentioned optical element support structure.
It addition, present invention also offers a kind of exposure optical system, it is formed by multiple above-mentioned unit mirror groups are stacking.
Additionally, present invention also offers a kind of litho machine, it includes mask platform, above-mentioned exposure optical system and silicon wafer stage, and described exposure optical system is arranged between described mask platform and silicon wafer stage, for the figure in described mask platform realizes perfect imaging on silicon wafer stage.
Optical element support structure provided by the invention can realize any number of driving point and arrange, can not only compensate low order aberration, additionally it is possible to compensate higher order aberratons.The guiding mechanism of the present invention is simple, compact, for integral type structure, it is possible to the adjustment realizing more multicomponent in the space that lithographic objective is limited compensates.Mechanical processing technique of the present invention is good, it is easy to accomplish supporting surface high accuracy processing and detection.The optical element support structure of the present invention has versatility, it is possible to adapt to different purposes, different types of optical element.
Accompanying drawing explanation
Fig. 1 is the axonometric drawing of the unit mirror group that one embodiment of the invention provides；
Fig. 2 is the partial sectional view of the unit mirror group that one embodiment of the invention provides；
Fig. 3 is the partial top view of the unit mirror group that one embodiment of the invention provides；
Fig. 4 is the axonometric drawing of the unit mirror group that one embodiment of the invention provides；
Fig. 5 is the optical element surface face shape measure of the change figure of the unit mirror group that one embodiment of the invention provides；
Fig. 6 is the structural representation of the litho machine that one embodiment of the invention provides.
In figure: 1 mask platform, 2 exposure optical systems, 3 silicon wafer stages, 4 measure light, 5 surface shape measurement interferometers, 21 unit mirror groups, 22 optical elements, 23 driving mechanisms, 24 microscope bases, 25 optical axises, adpting flange on 241,242 times adpting flanges, 243 guiding mechanisms, 244 slits, 245 sports platforms, 246 support bars, 247 supporting surfaces, 248 holes, location.
Detailed description of the invention
In conjunction with Fig. 1 to Fig. 5, the optical element support structure that one embodiment of the invention provides, including microscope base 24 and driving mechanism 23.Microscope base 24 includes being integrally machined the upper adpting flange 241 of molding, lower adpting flange 242, guiding mechanism 243, slit 244, sports platform 245, support bar 246, supporting surface 247 and hole 248, location.
Such as Fig. 1, described optical element support structure is contained in unit mirror group 21, and described unit mirror group 21 is generally made up of optical element 22, driving mechanism 23 and microscope base 24.Generally the direction parallel with optical element 22 optical axis being defined as Z axis, coordinate system is centrally located at the center of optical element 22 upper surface or lower surface, and the plane vertical with Z axis is X/Y plane.The material of described optical element 1 is fused quartz, devitrified glass, ULE or the calcium fluoride commonly used in deep UV projection photoetching objective lens, it is also possible to be the conventional optical material adopted in common lens.Described microscope base 24 is a ring rotation symmetric metal component, and there is through hole at its center for placing optical element 22, and through-hole diameter scope is determined by optical element 22, is generally 50mm～350mm, in order to light can pass through.It is generally of certain gap, for assembling and the adjustment of optical element 22 between described microscope base 24 and optical element 22.Microscope base 24 need to adopt the material with higher-strength and stability, is generally metal material, as: rustless steel, aluminium alloy, copper alloy, indium steel, titanium alloy, high intensity tool steel etc..One or more optical elements 22 are generally placed, it is illustrated that example is placed an optical element 22 in described microscope base 24.
Such as Fig. 2, the top of described microscope base 24 and bottom are extended with adpting flange 241 and lower adpting flange 242 respectively, and the two can pass through, and screw or alternate manner are fixing with adjacent mirror group to be connected.Described microscope base 24 is extended with support bar 246 near central through hole place, and support bar 246 end has supporting surface 247, and the support for optical element 22 positions, the corresponding supporting surface 247 of each support bar 246.Described optical element 22 is fixed on supporting surface 247 by the mode that mechanical fasteners, elastic clamping (not providing detailed construction in this example), welding or adhesive are bonding, difference according to optical element 22 surface curvature, supporting surface 247 can be plane, concave surface or convex surface.Described supporting surface 247 is approximately rectangle, and its area can between 2mm × 2mm～10mm × 10mm, the different modes according to fixing optical element 22, optional different Area of bearing, optical element 22 can be made to be stabilized, be securely fixed in microscope base 24.Supporting surface 247 generally adopts the modes such as the processing of ultra-precise cutting, precise laser, Precision EDM processing, ultrasonic vibrating machining, accurate grinding to process.
Described support bar 246 is along the Z axis parallel with optical axis 25 strip structure in the same direction, it is L along the length of Z-direction, radially (point to microscope base 24 excircle from optical axis 25s, and it is perpendicular to optical axis 25) it is of a size of thickness T, circumferentially (tangent with microscope base 24 excircle, and it is perpendicular to optical axis 25 and radial direction) it is of a size of A.The size range that the size range that size range is 3mm～30mm, A is 1mm～20mm, T of L > A > T, L is 0.1mm～5mm in most cases.According to optical element 22 weight, size, material difference, the size of support bar 246 is also different so that its radially or optical axis direction there is certain flexibility.Support bar 246 is positioned on sports platform 245, for integral type processing structure or assembling structure.Described sports platform 245 has enough rigidity to carry support bar 246 and the weight of optical element 22.Sports platform 245 is connected with microscope base 24 outer shroud by guiding mechanism 243.
Such as Fig. 3, described guiding mechanism 243 is made up of four the thin plate springs, four the thin plate springs relatively radially symmetrically formal distribution between two, forms pair of parallel quadric chain.Difference according to optical element 22 and microscope base 24 size and weight, each the thin plate spring thickness is between 0.1mm～2mm, length, between 10mm～40mm, thus makes the thin plate spring thickness have certain flexibility diametrically, just can produce deformation radially under applied external force.Due to the guide effect of the thin plate spring parallel-ordinal shift, described sports platform 245 just can radially, and the R direction namely illustrated moves back and forth.The thin plate spring structure of described guiding mechanism 243 is through in the Z-direction parallel with optical axis, is connected to form one formula structure with sports platform 245 and microscope base 24.Described guiding mechanism 243 can be processed by modes such as Laser Processing, chemical attack, line cutting, electric sparks.Slit 244 is formed by the way after processing, the seam width of slit 244 is typically between 0.2mm～3mm, for limiting the range of movement of sports platform 245, it is prevented that cause that owing to movement travel is excessive the thin plate spring stress of guiding mechanism 243 is beyond its yield limit, and then recurring structure destroys.The leaf spring that described guiding mechanism 243 may be used without separate type assembles, for the motion guide of sports platform 245.Described guiding mechanism 243 is also configured as unsymmetric form, or parallel six-bar linkage or other there is the version of guide function.
The representative instance of described driving mechanism 23 is spiral micrometer, is fixed in hole 248, location, and its end contacts with sports platform 245, for power output and displacement.Driving mechanism 23 radially R arranges, its output displacement direction is also radially.The Z-direction position of driving mechanism 23 is in the middle part of sports platform 245, is substantially at same level with supporting surface 247, with ensure 245 generations of sports platform be parallel to R to motion, do not produce the displacement in other directions.Driving mechanism 23 may be used without other types displacement output mechanism, as: piezoelectric actuator, pneumatic element, hydraulic driving element, linear electric motors and magnetic device etc., type of drive both can adopt manual actuation, it is possible to adopts and automatically drives.
In representative instance, described driving mechanism 23 and sports platform 245, guiding mechanism 243, support bar 246 and supporting surface 247 one_to_one corresponding.Such as Fig. 4, above-mentioned driving mechanism 23 is uniform in circumference about the z axis with sports platform 245, guiding mechanism 243, support bar 246 and supporting surface 247, and according to different application occasion, its quantity is generally between 3～40.In other application examples, componental movement platform 245 can not comprise driving mechanism 23 and guiding mechanism 243, only retains support bar 246 and supporting surface 247.
Such as Fig. 5, by driving mechanism 23 along R to output displacement and power, just can actuation movement platform 245 along R to producing corresponding displacement, finally transfer a driving force to support bar 246 and supporting surface 247.Due to, supporting surface 247 is generally inclined-plane, and the driving force being delivered on this inclined-plane can be analyzed to the axial force along Z-direction, so that face, optical element 22 surface shape changes.Face, described optical element 22 surface shape can be controlled by driving mechanism 23, as: by two driving mechanisms 23 at 180 ° of interval are driven in same direction, optical element 22 surface can be made to produce astigmatism；By three driving mechanisms 23 at 120 ° of interval are driven in same direction, optical element 22 surface can be made to produce SANYE aberration；By 8 driving mechanisms 23 at 45 ° of interval are driven in same direction, optical element 22 surface can be made to produce four leaf aberrations.By that analogy, by the driving mechanism 23 of diverse location, quantity exports different directions and size drive displacement, just can artificially realizing the multiple aberration of face, optical element 22 surface shape, the big I of its aberration is realized by driving force or drive displacement.Face, the optical element 22 surface deformationization of described unit mirror group 21 can be irradiated measurement light 4 by surface shape measurement interferometer 5 to optical element and be detected.
Can be used for the picture element of exposure optical system 2 to compensate by face, above-mentioned optical element 22 surface shape produces expectation aberration and regulate.
As shown in Figure 6, mask platform 1, exposure optical system 2, silicon wafer stage 3 are large scale integrated circuit and manufacture the ingredient of equipment litho machine, and exposure optical system 2 for realizing perfect imaging by the figure in mask platform 1 on silicon wafer stage 3.Exposure optical system 2 is formed by multiple unit mirror groups 21 are stacking.In the course of the work, exposure optical system 2 is affected by ambient temperature, air pressure change, and certain drift can occur in its imaging focal position, and its internal optical component 22 absorbs the deformation that laser energy causes and also can produce different types of imaging aberration simultaneously.By the driving mechanism 23 of the diverse location of unit mirror group 21, quantity is controlled, just the image quality of exposure optical system 2 can be adjusted and compensate.
The operation principle of the above embodiment of the present invention is as follows:
In described unit mirror group, optical element is bonding by laser weld, adhesive or other mechanical interlocking mode is fixed on the supporting surface that multiple circumferences of microscope base are uniform, and supporting surface is connected with microscope base by support bar.Owing to the surface figure accuracy of optical element requires high; usually require that between 0.3nm～2nm; consider the impact of optical element deadweight; thus the Geometrical Tolerance Principle such as all support profiles tolerance of a surface is high; would generally be the even nano level requirement of submicron, even if adopting ultra-precise cutting to be also difficult to that its form and position tolerance is completely secured meet requirement.The above embodiment of the present invention is processed on microscope base or assembles described guiding mechanism and slit, just the sports platform being connected with support bar can be formed, make guiding mechanism according to the parallel-ordinal shift principle work being arranged symmetrically with, and then ensure that sports platform can radial direction desirably move back and forth.Described driving mechanism is fixed in the outer shroud of microscope base by positioning hole, and driving mechanism leading portion can require output displacement according to regulated quantity in the course of the work, promotes sports platform to produce desired quantity of motion and driving force.Driving mechanism both can be manual actuation can also be automatic driving, and its maximum output displacement is limited by the slit of guiding mechanism, and to avoid, guiding mechanism stress is excessive to be damaged.
In the present embodiment, the size that causes due to picture frame process and assemble, form and position tolerance can bring the support face shape error of optical element.Therefore, carry out unit mirror assemble join, integrated before it may first have to the face shape under its holding state is detected.Just the every error percentage in supporting surface shape can be recorded by face shape interferometer, as: astigmatism, coma, spherical aberration, SANYE and four leaves etc., by its zernike coefficient size is carried out Theoretical Calculation or simulation analysis, thus the compensation obtaining each driving mechanism regulates displacement.The regulated quantity of each driving mechanism exported respectively and is applied on sports platform, and then making optical element produce quantitative stress deformation by the transmission of support bar and supporting surface, offsetting the impact owing to processing, rigging error produce.The adjustment in this stage can be described as static support surface shape compensation.Hereafter, precision welding, adhesive need to be adopted bonding or optical element is fixed in microscope base by the mode of mechanical grip, subsequently, all of unit mirror group is connected into a projection objective exposure optical system, this process can be inevitably generated erection stress, also can introduce face shape error in various degree.Every error percentage of unit mirror group face shape is detected by same employing face shape interferometer.But now owing to optical element is already fixed in microscope base, due to stiffness coupling cause governor motion quantity needed for compensating same face shape error and output shift quantity compared with the static support surface shape compensation stage more accurate and be difficult to control to.It is, therefore, necessary to adopt the mode amount of being adjusted of monitoring in real time and the demarcation of compensation effect, optimum efficiency can be realized.Above-mentioned compensation is all implemented for static face shape error.Finally, in exposure optical system practical work process, a degree of picture element error all can be introduced due to ambient temperature, air pressure change and laser energy absorption, by system picture element is analyzed and simulates, just can calculate the optical element needing to compensate and face shape knots modification thereof, compensate by the displacement that the output of optical element respective drive mechanism is required just being realized the picture element of exposure optical system.Optical component surface shape precision is produced the factor of impact referred to as dynamic shape influence factor by above-mentioned these.
This brighter in optical element support structure, the number in exposure optical system 2 is not limited to one, and according to different application occasion, its quantity can be 4,6 or all.Obviously, above-described embodiment is only for clearly demonstrating example of the present invention, and is not the restriction to embodiments of the present invention.For those of ordinary skill in the field, can also make other changes in different forms on the basis of the above description.Here without also cannot all of embodiment be given exhaustive.And the apparent change that these spirit belonging to the present invention are extended out or variation are still among protection scope of the present invention.
Claims (10)
1. an optical element support structure, optical element (22) for support unit mirror group (21), it is characterized in that, including microscope base (24), described microscope base (24) is the mechanical component of circumference symmetry, support bar (246) is stretched out at the interior hoop microscope base center of described microscope base (24), described support bar (246) is radially respectively provided with flexibility at optical axis direction and microscope base, described support bar (246) end is provided with supporting surface (247), the lower surface of described supporting surface (247) and optical element (22) is mutually matched, so that optical element (22) is fixed on described microscope base (24)；The inner side of described support bar (246) is connected to a sports platform (245), described sports platform (245) is connected by the outer shroud of a guiding mechanism (243) with microscope base (24), and described guiding mechanism (243) is for the motion guide of sports platform (245).
2. optical element support structure according to claim 1, it is characterised in that the top of described microscope base (24) and bottom are extended with adpting flange (241) and lower adpting flange (242) respectively.
3. optical element support structure according to claim 1, it is characterized in that, described guiding mechanism (243) is connected with the outer shroud of described microscope base (24) and is formed with slit (244), the range of movement of described sports platform (245) wide constraint by described slit (244).
4. the optical element support structure according to any one of claim 1-3, it is further characterized in that, described guiding mechanism (243) is the parallel-ordinal shift structure being symmetric, described parallel-ordinal shift structure ensure that sports platform (245) moves back and forth according to default radial direction, the radial dimension of described guiding mechanism (243) is much smaller than its axial dimension and circumferential size, make its rigidity in the direction of the optical axis much larger than its rigidity in radial directions, and then make described guiding mechanism (243) have the one-movement-freedom-degree of radial direction.
5. the optical element support structure according to any one of claim 1-3, it is further characterized in that, described guiding mechanism (243) is made up of four the thin plate springs, and four the thin plate springs relatively radially symmetrically formal distribution between two, to form pair of parallel quadric chain.
6. the optical element support structure according to any one of claim 1-3, it is characterized in that, the one that surface is plane, concave surface or convex surface that described supporting surface (247) and optical element (22) lower surface are mutually matched, described support bar (246) quantity is be more than or equal to 3, and described support bar (246) is circumferential uniform arrangement around optical axis.
null7. the optical element support structure according to any one of claim 1-3，It is further characterized in that，Described supporting construction also includes multiple driving mechanism (23)，Described microscope base (24) is formed multiple along the hole, location (248) that microscope base (24) radially extends，Hole, described location (248) is extended to by microscope base (24) external annular surface and communicates with described slit (244)，Described driving mechanism (23) inserts in hole, described location (248) and is fixed in microscope base (24) with this，Described driving mechanism (23) end contacts with sports platform (245)，Described driving mechanism (23) end can export certain displacement and power，And it is transferred to sports platform (245) so as to produce radial displacement，Described support bar (246) and sports platform (245) are joined directly together，Radial displacement produced by described sports platform (245) can directly drive support bar (246) to produce displacement and deformation，Described support bar (246) can by power and displacement transfer to optical element (22).
8. a unit mirror group, it is characterised in that include the optical element support structure described in optical element (22) and claim 1-7 any one.
9. an exposure optical system, it is characterised in that unit mirror group described in some claim 8 is stacking to be formed.
10. a litho machine, it is characterized in that, including the exposure optical system (2) described in mask platform (1), claim 9 and silicon wafer stage (3), described exposure optical system (2) is arranged between described mask platform (1) and silicon wafer stage (3), for the figure in described mask platform (1) is above realized perfect imaging at silicon wafer stage (3).
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| CN201610205482.3A CN105739248B (en) | 2016-04-01 | 2016-04-01 | Optical element support structure, unit microscope group, exposure optical system and litho machine |
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| CN201610205482.3A CN105739248B (en) | 2016-04-01 | 2016-04-01 | Optical element support structure, unit microscope group, exposure optical system and litho machine |
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| CN105739248B CN105739248B (en) | 2018-01-09 |
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Cited By (5)
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| CN107145040A (en) * | 2017-06-30 | 2017-09-08 | 中国科学院长春光学精密机械与物理研究所 | Optical element motion support meanss, projection objective and litho machine |
| CN110908058A (en) * | 2019-10-31 | 2020-03-24 | 中国航空工业集团公司洛阳电光设备研究所 | Multi freedom optical axis timing device |
| CN111381359A (en) * | 2018-12-27 | 2020-07-07 | 上海微电子装备（集团）股份有限公司 | Image quality compensation device, optical system and photoetching machine |
| CN113933948A (en) * | 2020-06-29 | 2022-01-14 | 上海微电子装备（集团）股份有限公司 | Lens group adjusting mechanism, adjustable optical system and photoetching equipment |
| CN114993626A (en) * | 2022-06-16 | 2022-09-02 | 中国科学院长春光学精密机械与物理研究所 | High-precision detection method for large-aperture optical lens |
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| CN113933948A (en) * | 2020-06-29 | 2022-01-14 | 上海微电子装备（集团）股份有限公司 | Lens group adjusting mechanism, adjustable optical system and photoetching equipment |
| CN113933948B (en) * | 2020-06-29 | 2023-04-07 | 上海微电子装备（集团）股份有限公司 | Lens group adjusting mechanism, adjustable optical system and photoetching equipment |
| CN114993626A (en) * | 2022-06-16 | 2022-09-02 | 中国科学院长春光学精密机械与物理研究所 | High-precision detection method for large-aperture optical lens |
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