CN105731366A - Method for preparing ultrathin super resolution film based on dielectric microsphere - Google Patents
Method for preparing ultrathin super resolution film based on dielectric microsphere Download PDFInfo
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- CN105731366A CN105731366A CN201610113464.2A CN201610113464A CN105731366A CN 105731366 A CN105731366 A CN 105731366A CN 201610113464 A CN201610113464 A CN 201610113464A CN 105731366 A CN105731366 A CN 105731366A
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- film
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- thin
- microsphere
- medium microsphere
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- 239000004005 microsphere Substances 0.000 title claims abstract description 42
- 238000000034 method Methods 0.000 title abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 32
- 238000002360 preparation method Methods 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 239000011521 glass Substances 0.000 claims abstract description 13
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 239000002390 adhesive tape Substances 0.000 claims abstract description 8
- 239000002356 single layer Substances 0.000 claims abstract description 7
- 239000010408 film Substances 0.000 claims description 31
- 239000010409 thin film Substances 0.000 claims description 27
- 229920002120 photoresistant polymer Polymers 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000011345 viscous material Substances 0.000 abstract 1
- 239000002253 acid Substances 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 7
- 239000007788 liquid Substances 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000004205 dimethyl polysiloxane Substances 0.000 description 4
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 4
- 238000011160 research Methods 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- -1 polydimethylsiloxane Polymers 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- VKJLWXGJGDEGSO-UHFFFAOYSA-N barium(2+);oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[O-2].[Ti+4].[Ba+2] VKJLWXGJGDEGSO-UHFFFAOYSA-N 0.000 description 1
- 238000007596 consolidation process Methods 0.000 description 1
- 239000013039 cover film Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/00468—Releasing structures
- B81C1/00484—Processes for releasing structures not provided for in group B81C1/00476
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems
Abstract
The invention discloses a method for preparing an ultrathin super resolution film based on a dielectric microsphere. The method comprises the following steps: (1) adhering a low surface energy material on a glass substrate by using a double faced adhesive tape; (2) dissolving and dripping the dielectric microsphere on the surface of the low surface energy material by using a suction pipe, and heating the low surface energy material on a heating flat plate to deposit a single layer of dielectric microsphere; (3) pouring a film material on the surface of the single layer of dielectric microsphere, uniformly spry coating the film material by using a spin coater, and controlling the thickness of the film material by controlling the rotating speed; and (4) curing the spry coated film on the heating flat plate of 65 DEG C for 4h; and finally, stripping off the cured film from the low surface energy material to obtain the ultrathin super resolution film. According to the method disclosed by the invention, the low surface energy viscous material is used for directly replacing the cleaned glass to serve as the substrate, thereby not only simplifying the preparation procedure of the traditional super resolution film, but also effectively reducing the surface energy and the Young modulus of the film and the substrate and ensuring easier stripping of the super resolution film.
Description
Technical field
The preparation method that the present invention relates to a kind of ultra-distinguish film based on medium microsphere.
Background technology
Optical microscope is one of important scientific achievement of human history, is the important tool of scientific research.But, owing to being subject to the restriction of diffraction limit, the minimum dimension that conventional optical microscope can be differentiated in theory is only the half of illumination wavelengths, it is impossible to meet people's Research Requirements to microstructure.
The imaging system that development has hyperresolution is significant, has become breakthrough Diffraction Diffraction limit simple effective method the most based on medium lenticule super-resolution imaging.Low-refraction microsphere is placed in sample surfaces in atmosphere as medium lenticule and is under microscope and is capable of super-resolution, use liquid half submergence low-refraction microsphere can Enhanced Imaging contrast, high index of refraction microsphere wants to realize super-resolution to be needed to be totally submerged in a liquid.Due to liquid-immersed unstability and liquid volatile, research and propose use transparent dielectric layer (namely solid film) and replace liquid level.Become a kind of new trend of super-resolution imaging with advantage stable, convenient and repeatable based on the ultra-distinguish film of medium microsphere.If but the film thickness of preparation is big, it is likely to touching microscope objective when using high power objective to observe and damage equipment.
Single microsphere under big thickness thin film only has the visual field size of 1/4th diameters, limits under microscope observation ability on a large scale.Experiment is can large area observe, moves microsphere or whole thin film typically via microoperation.But microoperation process is complicated, process slow, and remain by single ball observation, substantially do not expand field range.Ultrathin thin film not only increases single ball observation visual field, and is close to microsphere imaging viewing field and can be stitched together, and effectively expands field range.
The ultra-distinguish film preparation being currently based on medium microsphere mainly has substrate cleaning, depositing them, cover film material and thin film to peel off four steps.The film thickness of preparation is mostly more than 200 μm.Wherein substrate many selections glass, the glass cleaned through strong acid has water-wet behavior, and surface presents high surface energy, if film thickness is little, is just difficult to completely strip from preparing large area substrate.
Summary of the invention
Peeling off this technical problem for solving existing ultra-distinguish film difficulty of preparing, the present invention provides a kind of and utilizes low-surface-energy not cohesive material as the ultra-distinguish film preparation method of substrate.
For achieving the above object, the technical solution used in the present invention is:
A kind of ultra-thin ultra-distinguish film preparation method based on medium microsphere, comprises the steps:
(1) double faced adhesive tape is used to be pasted on the glass substrate by low-surface-energy material;
(2) use suction pipe to be dissolved by medium microsphere and drop in low-surface-energy material surface, be placed on heating on heating flat board, deposit single-layer medium microsphere;
(3) topple over thin-film material at single-layer medium microsphere surface, use photoresist spinner uniformly to revolve;By rotating speed, control thin-film material thickness;
(4) it is placed on 65 ° of heating flat boards solidifies revolving complete thin film 4 hours;Finally the thin film solidified is peeled off from low-surface-energy material, obtain ultra-thin ultra-distinguish film.
Further, in described step (1), low-surface-energy material is label backing paper, transparent adhesive tape or plastic sheeting.The size of its low-surface-energy material can slightly larger than the size of substrate of glass.
Further, the refractive index of described medium microsphere is more than 1.8, and more than the refractive index of thin-film material in step (3).
Preferably, in described step (3), the thickness of thin-film material is more than 5 microns, less than 10 microns.
It is an advantage of the current invention that:
1, the present invention directly pastes with clean not cohesive material and processes at glass surface rather than strong acid cleaning, more simple compared with traditional preparation method, simplifies and cleans this long-time process of glass substrate with acid.
2, low-surface-energy material (such as label backing paper, transparent adhesive tape and plastic sheeting) presents hydrophobic property, and surface presents the not viscosity of low-surface-energy, and various adhesives are existed estranged characteristic by base stock, is beneficial to thin film to a certain extent and peels off.And the cleaned sheet glass of strong acid presents high surface energy, and it is unfavorable for that thin film is peeled off from substrate.The ultra-distinguish film preparation method that the present invention adopts low-surface-energy material to be soft substrate effectively reduces surface energy and the Young's modulus of thin film and substrate, makes ultra-distinguish film more be easily peeled.
3, by this method, it is possible to successfully prepare thickness ultra-distinguish film below 10 microns, there is large increase compared with the thin film of existing 200 μ m thick prepared.
4, the preparation method of the present invention, process is simple, it is easy to realize, with low cost.
5, the ultrathin film of preparation provides the method being close to the splicing of several microsphere imaging viewing fields to expand range of observation, has broken the limitation of single microsphere observation to a certain extent, provides advantage for strengthening coverage count sample capability.
Accompanying drawing explanation
Fig. 1 is the preparation flow figure of the inventive method.
Fig. 2 is the schematic diagram of the step 1 of preparation method of the present invention;
Fig. 3 is the schematic diagram of the step 2 medium microsphere deposition process of preparation method of the present invention;
Fig. 4 is the schematic diagram of the step 3 thin-film material spin coating process of preparation method of the present invention;
Fig. 5 is the schematic diagram of the step 4 thin film stripping of preparation method of the present invention.
Detailed description of the invention
For technological means and effect that the present invention take is expanded on further, it is described in detail below in conjunction with the preferred embodiments of the present invention and accompanying drawing thereof.
As it is shown in figure 1, the preparation method that the invention provides a kind of ultra-thin ultra-distinguish film, including:
Step 1, substrate surface cleaning process.
As in figure 2 it is shown, substrate surface cleaning processes as directly to paste common label base stock at substrate surface.At 2.5 × 2.5cm2Clean slide 101 on paste clean label backing paper 102 with double faced adhesive tape 108, label backing paper size, more preferably greater than microscope slide, is 3 × 3cm2。
It is noted that step 1 adopts common label base stock directly paste the process eliminating the long-time strong acid cleaning of substrate of glass at glass basic surface.The glass substrate cleaned with acid is contrary, and label backing paper not only has hydrophobic property but also in low-surface-energy, is beneficial to thin film to a certain extent and peels off.Label backing paper be the ultra-distinguish film preparation method of soft substrate effectively reduce thin film and substrate surface can and Young's modulus, make ultra-distinguish film more be easily peeled.
Step 2, with suction pipe, medium microsphere 103 solution is dropped on label backing paper 102 surface, be placed on 65 ° of heating on heating flat board, deposition single-layer medium microsphere.As shown in Figure 3.
Concrete, medium microsphere 103 selects Barium metatitanate. microsphere (BTG), and a kind of refractive index is the microsphere of 1.9.
Step 3, as shown in Figure 4, topples over polydimethylsiloxane 104 (PDMS) on label backing paper 102 surface having medium microsphere 103, after standing five minutes, uses photoresist spinner uniformly to revolve 40 seconds.By rotating speed, controlling thin-film material thickness is 7.5 μm.
Wherein, PDMS is the polydimethylsiloxane transparent material of refractive index 1.4, is formed according to the proportions of 10:1 by Sylgar184siliconeelastomer substrate liquid and Sylgar184curingagent consolidation liquid.Photoresist spinner rotating speed can be improved to reduce foamed film, to obtain the ultrathin film of below 10 microns.
Step 4, by revolve complete sample be placed on 65 ° heating flat boards on solidify 4 hours.Finally by tweezers or other instruments, the thin film 104 solidified is peeled off from transparent adhesive tape, as shown in Figure 5.
The ultrathin film 104 obtained there is scattered medium microsphere 103, has closely adjacent medium microsphere 105 simultaneously.This ultrathin film 104 can be directly used for super-resolution imaging system, and placing it in the surface of sample to be observed under microscope can observe.
In sum, the preparation method that the invention provides a kind of ultra-thin ultra-distinguish film based on medium microsphere, preparation is simple, it is easy to realize, and eliminates substrate strong acid and clean the process of this long period, makes thinner thin film be easier to from substrate and peels off.In this kind of ultra-thin ultra-distinguish film, tight adjacent microsphere visual field becomes big, increases range of observation function.
The above, for the person of ordinary skill of the art, it is possible to conceive according to technical scheme and technology and make corresponding change and deformation, but all these changes and deformation all should belong to the protection domain of appended claims of the present invention.
Claims (5)
1. the ultra-thin ultra-distinguish film preparation method based on medium microsphere, it is characterised in that comprise the steps:
(1) double faced adhesive tape is used to be pasted on the glass substrate by low-surface-energy material;
(2) use suction pipe to be dissolved by medium microsphere and drop in low-surface-energy material surface, be placed on heating on heating flat board, deposit single-layer medium microsphere;
(3) topple over thin-film material at single-layer medium microsphere surface, use photoresist spinner uniformly to revolve;By rotating speed, control thin-film material thickness;
(4) it is placed on 65 ° of heating flat boards solidifies revolving complete thin film 4 hours;Finally the thin film solidified is peeled off from low-surface-energy material, obtain ultra-thin ultra-distinguish film.
2. a kind of ultra-thin ultra-distinguish film preparation method based on medium microsphere according to claim 1, it is characterised in that in described step (1), low-surface-energy material is label backing paper, transparent adhesive tape or plastic sheeting.
3. a kind of ultra-thin ultra-distinguish film preparation method based on medium microsphere according to claim 1, it is characterised in that in described step (1), the size being slightly larger in dimension than substrate of glass of low-surface-energy material.
4. a kind of ultra-thin ultra-distinguish film preparation method based on medium microsphere according to claim 1, it is characterised in that the refractive index of described medium microsphere is more than 1.8, and more than the refractive index of thin-film material in step (3).
5. according to a kind of ultra-thin ultra-distinguish film preparation method based on medium microsphere one of Claims 1-4 Suo Shu, it is characterised in that in described step (3), the thickness of thin-film material is more than 5 microns, less than 10 microns.
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107229133A (en) * | 2017-07-11 | 2017-10-03 | 中国科学院光电技术研究所 | One kind is based on SiO2The super-resolution imaging method of medium microsphere |
GB2553420A (en) * | 2016-07-14 | 2018-03-07 | Lig Tech Limited | Objective lens attachment |
CN109765180A (en) * | 2019-01-03 | 2019-05-17 | 西安交通大学 | Medium microsphere auxiliary detection film and preparation method thereof and super-resolution detection method |
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2016
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Patent Citations (5)
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CN1742213A (en) * | 2003-01-22 | 2006-03-01 | 富士胶片株式会社 | Antireflection film, polarizing plate and display device |
CN101163993A (en) * | 2005-02-21 | 2008-04-16 | 大日本印刷株式会社 | Anti-glare optical multilayer body |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2553420A (en) * | 2016-07-14 | 2018-03-07 | Lig Tech Limited | Objective lens attachment |
GB2553420B (en) * | 2016-07-14 | 2019-02-06 | Lig Nanowise Ltd | Objective lens attachment |
CN107229133A (en) * | 2017-07-11 | 2017-10-03 | 中国科学院光电技术研究所 | One kind is based on SiO2The super-resolution imaging method of medium microsphere |
CN109765180A (en) * | 2019-01-03 | 2019-05-17 | 西安交通大学 | Medium microsphere auxiliary detection film and preparation method thereof and super-resolution detection method |
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