CN105731365A - PDMS elastomer micro-nano processing method based on crosslinking control control transfer printing - Google Patents
PDMS elastomer micro-nano processing method based on crosslinking control control transfer printing Download PDFInfo
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- CN105731365A CN105731365A CN201610112350.6A CN201610112350A CN105731365A CN 105731365 A CN105731365 A CN 105731365A CN 201610112350 A CN201610112350 A CN 201610112350A CN 105731365 A CN105731365 A CN 105731365A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
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Abstract
The invention discloses a PDMS elastomer micro-nano processing method based on crosslinking control control transfer printing. The PDMS elastomer micro-nano processing method comprises the following steps: preparing a PDMS film to serve as a transfer printing substrate by using a pouring method; preparing a PDMS film with a surface microstrucutre to serve as a transfer printing stamp by using a replica casting method; importing a cohesive energy (soft/hard) difference between the PDMS stamp and the planar PDMS substrate by different crosslinking agent contents in the process of preparing the substrate and the stamp; and simultaneously carrying out an OP treatment on the prepared substrate and the stamp for 0.5 min, immediately adhering the substrate and the stamp, and carrying out a heating treatment to improve the contact adhesion of the substrate and the stamp, taking off the stamp, generating cohesive energy breakage on the soft party during the separation to transfer PDMS ink to the hard party, so as to obtain a PDMS film with concave or convex patterns on the surface. The PDMS elastomer micro-nano processing method disclosed by the method is simple and convenient to operate, low in cost, and is used for avoiding the defects of limited applicable range of other related technology and simple processing patterns.
Description
Technical field
The present invention relates to the micro-nano process technology of soft material, be specifically related to a kind of process utilizing crosslinking control trans-printing method to carry out PDMS patterned surface.
Background technology
Polydimethylsiloxane (PDMS) is a kind of most widely used silica-based organic polymer material.PDMS is as a kind of organic silicon rubber, and the aspect such as insulant, gap filler, lubricant, human body shaping implantation has a lot of purposes out of doors, what is more important its in minute manufacturing, have the application prospect of uniqueness.On micro/nano-scale, PDMS thickness/thin film is widely used in Soft lithograph technology, micro-/to receive fluid control, micro-/numerous areas such as naiio-electro-meclianical systems, bio-sensing.These application all rely on the surface micro-structure of PDMS.But the micro-nano process technology of PDMS elastomer is extremely limited at present, and it is limited to form processing, is difficult to prepare complicated fine surface patterning.Meanwhile, print process is as a kind of simple, convenient, attention that suitability patterning techniques widely is increasingly subject to academia.
Summary of the invention
For above-mentioned prior art, the present invention provides a kind of micrometastasis print process controlled based on crosslinking, prepares PDMS microwave structure pattern.The present invention selects plane PDMS sheet to be substrate, with surface prepared by backed stamper casting with the PDMS of simple micro structured pattern for trans-printing seal, by the difference of content of crosslinking agent in PDMS seal and substrate preparation process being introduced cohesive energy (" soft/hard ") difference, shift " ink " side compared with " soft " in seal or substrate, thus realizing the controllable patterned of plane PDMS substrate surface.This process avoids the operating procedure of the use of expensive instrument and very complicated, be a kind of general PDMS micro-nano processing method.
In order to solve above-mentioned technical problem, a kind of PDMS elastomer micro-nano processing method controlling trans-printing based on crosslinking that the present invention proposes, comprise the following steps:
Step one, utilize the preparation of backed stamper casting with the PDMS film of surface micro-structure as the seal of trans-printing: by PDMS performed polymer and cross-linking agent in mass ratio for m:1 mixing, wherein, m=10 or 20；It is sufficiently stirred for the uniform prepolymer of formation with Glass rod；Above-mentioned prepolymer after degassed 1 hour, is poured on caster in the multiplex vacuum pump of circulating water type；At 70 DEG C, heat 4h solidify；The film taken off is gained；
Step 2, casting method is utilized to prepare the substrate as trans-printing of the PDMS film: PDMS performed polymer and cross-linking agent to be mixed for n:1 in mass ratio, wherein n=5～30, and m=n+10 or m=n-10；It is sufficiently stirred for the uniform prepolymer of formation with Glass rod；Above-mentioned prepolymer after degassed 1 hour, is poured in surface plate in the multiplex vacuum pump of circulating water type；At 70 DEG C, heat 4h solidify；Obtain the adjustable PDMS film of thickness；
Step 3, the seal that step one is prepared or the substrate that step 2 is prepared carry out oxygen plasma surface activation process 0.5min simultaneously, immediately after the seal after above-mentioned process and substrate are pasted and be incorporated in air dry oven at 100 DEG C heating and thermal insulation 1h, cool to room temperature with the furnace, take off seal, surface must be arrived there is the PDMS film of depression or raised design.
Further, in step 2, PDMS performed polymer is different from PDMS performed polymer in step one and cross-linking agent mass ratio with the mass ratio of cross-linking agent, thus obtaining the combination of one group of embossing seal chapter/flexible subserate or the combination of one group of soft seal/hard substrate.
If seal being prepared by step one and step 2 prepared the mass ratio of PDMS performed polymer and cross-linking agent in the process of substrate and is designated as: crosslinking parameter being PDMS(m:1)/PDMS(n:1), in the present invention, preferred crosslinking parameter is as follows: PDMS(10:1)/PDMS(20:1)、PDMS(10:1)/PDMS(30:1)、PDMS(20:1)/PDMS(5:1)、PDMS(20:1)/PDMS(10:1)。
Compared with prior art, the invention has the beneficial effects as follows:
In preparation method of the present invention, regulate and control PDMS " ink " shift direction by regulating content of crosslinking agent in PDMS seal and substrate preparation process in advance, thus what reach PDMS planar substrates is controllable patterned.The method of the present invention has simply, convenient, applied widely feature.Especially can realize the finely regulating of PDMS picture on surface simply by change content of crosslinking agent, this is that current other technologies are unapproachable.
Accompanying drawing explanation
Fig. 1 is the atomic force microscope images of the PDMS seal that the embodiment of the present invention 1 obtains；
Fig. 2 is the atomic force microscope images of the patterned surface PDMS substrate that the embodiment of the present invention 1 obtains；
Fig. 3 is the atomic force microscope images of the patterned surface PDMS substrate that the embodiment of the present invention 2 obtains.
Detailed description of the invention
Below in conjunction with the drawings and specific embodiments, technical solution of the present invention being described in further detail, the present invention is only explained by described specific embodiment, not in order to limit the present invention.
Embodiment 1: preparing the PDMS film of patterned surface, step is as follows:
Step one, utilize the preparation of backed stamper casting with the PDMS of surface micro-structure as the seal of trans-printing: first, PDMS performed polymer and crosslinking aid S ylgard184 (purchased from American Dow Corning Corporation) are mixed for 10:1 in mass ratio, is sufficiently stirred for the uniform prepolymer of formation with Glass rod；Above-mentioned prepolymer after degassed 1 hour, is poured in the silicon template (i.e. caster) with cylindrical-array, builds thickness and be about 1mm in the multiplex vacuum pump of circulating water type；At 70 DEG C, heat 4h solidify；The PDMS film taken off carefully in this silicon template is PDMS seal, the PDMS with surface micro-structure prepared by this backed stamper casting(10:1)The surface texture of seal is as shown in Figure 1.
Step 2, casting method is utilized to prepare the PDMS thick film substrate as trans-printing that thickness is about 1mm；Particular content is: first, PDMS performed polymer and crosslinking aid S ylgard184 (purchased from American Dow Corning Corporation) is mixed for 20:1 in mass ratio, is sufficiently stirred for the uniform prepolymer of formation with Glass rod；Above-mentioned prepolymer after degassed 1 hour, is poured in surface plate, builds thickness and be about 1mm in the multiplex vacuum pump of circulating water type；At 70 DEG C, heat 4h solidify；Obtain plane PDMS substrate.
Step 3, the above-mentioned PDMS seal prepared and substrate are carried out oxygen plasma surface active (OP) simultaneously process 0.5min；Immediately after the two patch is incorporated in air dry oven at 100 DEG C and heats 1h；Cool to room temperature with the furnace, take off PDMS seal, obtain the PDMS film of patterned surface.
Crosslinking parameter in the present embodiment 1 preparation method is denoted as PDMS(10:1)/PDMS(20:1).Measured by atomic force microscope, this regular depression round dot pattern of PDMS film surface band.Shown in the atom of the present embodiment 1 gained patterning PDMS film such as Fig. 2 is tried hard to.
Embodiment 2: prepare the PDMS film of patterned surface, preparation process is substantially the same manner as Example 1, is different only in that, changes the mass ratio of PDMS performed polymer and cross-linking agent in step one into 20:1, changing the mass ratio of PDMS performed polymer and cross-linking agent in step 2 into 10:1, namely crosslinking parameter is by PDMS(10:1)/PDMS(20:1)Change PDMS into(20:1)/PDMS(10:1), shown in the atom of the final surface obtained PDMS film such as Fig. 3 with regular round dot raised design is tried hard to.
Ibid, parameter is namely cross-linked by changing content of crosslinking agent in preparation process, such as: can be PDMS(10:1)/PDMS(20:1)、PDMS(10:1)/PDMS(30:1)、PDMS(20:1)/PDMS(5:1)、PDMS(20:1)/PDMS(10:1)In any group of.
To sum up, the inventive method introduces cohesive energy between PDMS seal and PDMS substrate (namely soft/hard) difference mainly by the difference of content of crosslinking agent in PDMS preparation process, and improve seal by surface active and heat treated and contact adhesive attraction between substrate, when making the two separate, " soft side " is utilized to occur cohesive energy fracture provide PDMS " ink " and transfer to " firmly square " by contact, thus realizing the controlled fine patterning of plane PDMS substrate.Combined by the difference " soft/hard " of seal and substrate and repeatedly printing can obtain complicated fine PDMS surface micro-structure.This method not only avoids other correlation technique restricted applications, the simple shortcoming of processing graphic pattern, and avoids the use of complex and expensive instrument, and therefore, it is applied widely, easy and simple to handle, and cost is low, can as a kind of micro-nano process technology of general PDMS.
Although above in conjunction with figure, invention has been described; but the invention is not limited in above-mentioned detailed description of the invention; above-mentioned detailed description of the invention is merely schematic; rather than it is restrictive; those of ordinary skill in the art is under the enlightenment of the present invention; without deviating from the spirit of the invention, it is also possible to make many variations, these belong within the protection of the present invention.
Claims (2)
1. the PDMS elastomer micro-nano processing method controlling trans-printing based on crosslinking, it is characterised in that comprise the following steps:
Step one, utilize the preparation of backed stamper casting with the PDMS film of surface micro-structure as the seal of trans-printing:
PDMS performed polymer and cross-linking agent are mixed for m:1 in mass ratio, wherein, m=10 or 20；It is sufficiently stirred for the uniform prepolymer of formation with Glass rod；Above-mentioned prepolymer after degassed 1 hour, is poured on caster in the multiplex vacuum pump of circulating water type；At 70 DEG C, heat 4h solidify；The film taken off is gained seal；
Step 2, casting method is utilized to prepare the substrate as trans-printing of the PDMS film:
PDMS performed polymer and cross-linking agent are mixed for n:1 in mass ratio, wherein n=5～30, and m=n+10 or m=n-10；It is sufficiently stirred for the uniform prepolymer of formation with Glass rod；Above-mentioned prepolymer after degassed 1 hour, is poured in surface plate in the multiplex vacuum pump of circulating water type；At 70 DEG C, heat 4h solidify；Obtain the adjustable PDMS film of thickness；
Step 3, the seal that step one is prepared or the substrate that step 2 is prepared carry out oxygen plasma surface activation process 0.5min simultaneously, immediately after the seal after above-mentioned process and substrate are pasted and be incorporated in air dry oven at 100 DEG C heating and thermal insulation 1h, cool to room temperature with the furnace, take off seal, surface must be arrived there is the PDMS film of depression or raised design.
2. a kind of based on cross-linking the PDMS elastomer micro-nano processing method controlling trans-printing according to claim 1, it is characterized in that, in step 2, PDMS performed polymer is different from PDMS performed polymer in step one and cross-linking agent mass ratio with the mass ratio of cross-linking agent, thus obtaining the combination of one group of embossing seal chapter/flexible subserate or the combination of one group of soft seal/hard substrate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201610112350.6A CN105731365B (en) | 2016-02-29 | 2016-02-29 | PDMS elastomer micro-nano processing method based on crosslinking control control transfer printing |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107522163A (en) * | 2016-09-26 | 2017-12-29 | 西北工业大学 | A kind of high guarantor's type transfer method of PDMS structures |
| CN109021270A (en) * | 2017-06-11 | 2018-12-18 | 吴浪 | PDMS elastomer micro-nano processing method based on crosslinking control trans-printing |
| CN109808319A (en) * | 2017-11-20 | 2019-05-28 | Tcl集团股份有限公司 | A kind of seal and preparation method thereof and quantum dot transfer method |
| CN111268640A (en) * | 2020-03-04 | 2020-06-12 | 电子科技大学 | Adaptive super-hydrophobic surface and preparation method thereof |
| CN114953797A (en) * | 2022-06-22 | 2022-08-30 | 合肥工业大学 | Anti-distortion transfer printing method and transfer printing device for micro-nano structure |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1684902A (en) * | 2002-08-28 | 2005-10-19 | 伊利诺斯大学理事会 | Decal transfer microfabrication |
| CN1686781A (en) * | 2005-04-28 | 2005-10-26 | 上海交通大学 | Method for making epoxy resin microstructure device |
| KR100879790B1 (en) * | 2007-07-23 | 2009-01-22 | 한국과학기술원 | Method for fabricating various fine patterns using a polymer mold |
| KR20090111249A (en) * | 2008-04-21 | 2009-10-26 | 경희대학교 산학협력단 | Manufacturing method of stamp for electron emitting element and Manufacturing method of electron emitting element using the stamp |
| CN102491254A (en) * | 2011-12-14 | 2012-06-13 | 天津大学 | Method for wrinkling polydimethylsiloxane (PDMS) elastomer in selective area |
| CN102795592A (en) * | 2012-07-13 | 2012-11-28 | 天津大学 | Selective etching reparation method and application of PDMS (polydimethylsiloxane) elastomer surface hard film layer |
| CN105170209A (en) * | 2015-10-15 | 2015-12-23 | 华中科技大学 | Surface patterning-modified substrate and preparation method therefor |
-
2016
- 2016-02-29 CN CN201610112350.6A patent/CN105731365B/en not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1684902A (en) * | 2002-08-28 | 2005-10-19 | 伊利诺斯大学理事会 | Decal transfer microfabrication |
| CN1686781A (en) * | 2005-04-28 | 2005-10-26 | 上海交通大学 | Method for making epoxy resin microstructure device |
| KR100879790B1 (en) * | 2007-07-23 | 2009-01-22 | 한국과학기술원 | Method for fabricating various fine patterns using a polymer mold |
| KR20090111249A (en) * | 2008-04-21 | 2009-10-26 | 경희대학교 산학협력단 | Manufacturing method of stamp for electron emitting element and Manufacturing method of electron emitting element using the stamp |
| CN102491254A (en) * | 2011-12-14 | 2012-06-13 | 天津大学 | Method for wrinkling polydimethylsiloxane (PDMS) elastomer in selective area |
| CN102795592A (en) * | 2012-07-13 | 2012-11-28 | 天津大学 | Selective etching reparation method and application of PDMS (polydimethylsiloxane) elastomer surface hard film layer |
| CN105170209A (en) * | 2015-10-15 | 2015-12-23 | 华中科技大学 | Surface patterning-modified substrate and preparation method therefor |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107522163A (en) * | 2016-09-26 | 2017-12-29 | 西北工业大学 | A kind of high guarantor's type transfer method of PDMS structures |
| CN109021270A (en) * | 2017-06-11 | 2018-12-18 | 吴浪 | PDMS elastomer micro-nano processing method based on crosslinking control trans-printing |
| CN109808319A (en) * | 2017-11-20 | 2019-05-28 | Tcl集团股份有限公司 | A kind of seal and preparation method thereof and quantum dot transfer method |
| CN109808319B (en) * | 2017-11-20 | 2020-09-22 | Tcl科技集团股份有限公司 | Stamp and preparation method thereof and quantum dot transfer printing method |
| CN111268640A (en) * | 2020-03-04 | 2020-06-12 | 电子科技大学 | Adaptive super-hydrophobic surface and preparation method thereof |
| CN114953797A (en) * | 2022-06-22 | 2022-08-30 | 合肥工业大学 | Anti-distortion transfer printing method and transfer printing device for micro-nano structure |
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Address after: 300350 District, Jinnan District, Tianjin Haihe Education Park, 135 beautiful road, Beiyang campus of Tianjin University Patentee after: Tianjin University Address before: 300072 Tianjin City, Nankai District Wei Jin Road No. 92 Patentee before: Tianjin University |
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