CN105709998A - Light-sensitive material coating machine with polishing device - Google Patents
Light-sensitive material coating machine with polishing device Download PDFInfo
- Publication number
- CN105709998A CN105709998A CN201610249225.XA CN201610249225A CN105709998A CN 105709998 A CN105709998 A CN 105709998A CN 201610249225 A CN201610249225 A CN 201610249225A CN 105709998 A CN105709998 A CN 105709998A
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- CN
- China
- Prior art keywords
- polishing
- coating machine
- sensitive material
- light
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/10—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed before the application
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/002—Pretreatement
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/12—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by mechanical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2350/00—Pretreatment of the substrate
- B05D2350/30—Change of the surface
- B05D2350/50—Smoothing
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
The invention relates to equipment in the technical field of production of light-sensitive material plates, in particular to a light-sensitive material coating machine with a polishing device. The light-sensitive material coating machine comprises an inlet end of materials and an output end of a finished product, wherein a degreasing device, a neutralizing device, an electrolyzing device, an oxidizing device, a drying device and a coating device are sequentially arranged on the coating machine. The light-sensitive material coating machine is characterized in that the polishing device is arranged between the drying device and the coating device and comprises polishing rollers; the polishing rollers are connected with a power device; a silicone rubber layer is arranged outside each polishing roller; the outside of each polishing roller is in contact with a substrate which needs to be coated with a light-sensitive material after drying; a plurality of bosses are arranged on the outer surface of each silicone rubber layer; and the number of the polishing rollers is more. Products produced by the coating machine have the advantage of higher printing durability, long service life and high printing definition.
Description
Technical field
The present invention relates to the equipment of photosensitive material plate production technical field, concretely relate to photosensitive material plate coating machine.
Background technology
Photosensitive material plate includes substrate, substrate is coated with one layer of sensitive material form, photosensitive material plate is coated with on coating machine, coating machine has the upstream end of material and the outfan of finished product, coating machine is disposed with degreasing unit, in and device, electrolysis unit, oxidation unit, drying unit and apparatus for coating, described drying unit is exactly the device being undertaken the moisture on substrate drying, and described apparatus for coating is exactly be coated on the substrate processed by sensitive material;In prior art, not having polishing device between drying unit and apparatus for coating, the photosensitive material plate so produced has the shortcoming that press resistance rate is low, printing readability is low, have impact on the service life of photosensitive material plate and result of use.
Summary of the invention
The purpose of the present invention is aiming at disadvantages mentioned above, it is provided that the photosensitive material plate coating machine that a kind of resistance to print degree is higher, long service life, printing degree of cleaning are high has the photosensitive material plate coating machine of polishing device.
The technical solution used in the present invention is such that the photosensitive material plate coating machine with polishing device, outfan including the upstream end of material and finished product, coating machine is disposed with degreasing unit, neutralize device, electrolysis unit, oxidation unit, drying unit and apparatus for coating, it is characterized in that: between described drying unit and apparatus for coating, be additionally provided with polishing device, described polishing device includes polishing roller, polishing roller connecting power device, it is silastic-layer outside polishing roller, the outside contact of polishing roller needs the substrate of surface coating sensitive material after drying.
Say that there is outside described silastic-layer multiple projection further.
Saying further, described polishing roller is multiple.
The invention has the beneficial effects as follows: the product that such coating machine produces has that resistance to print degree is higher, long service life, average improve 1.2 1.3 times, the advantage that printing readability is high;Having multiple projection outside described silastic-layer, described polishing roller is multiple, it is possible to reach better effect.
Accompanying drawing explanation
The structural representation of Fig. 1 present invention.
Wherein: 1, upstream end 2, outfan 3, drying unit 4, apparatus for coating 5, polishing device 6, polishing roller 7, power set 8, silastic-layer 9, protruding.
Detailed description of the invention
Below in conjunction with accompanying drawing, the present invention is described further.
As shown in Figure 1, there is the photosensitive material plate coating machine of polishing device, outfan 2 including the upstream end 1 of material and finished product, coating machine is disposed with degreasing unit, in and device, electrolysis unit, oxidation unit, drying unit 3 and apparatus for coating 4, it is characterized in that: between described drying unit and apparatus for coating, be additionally provided with polishing device 5, described polishing device includes polishing roller 6, polishing roller connecting power device 7, being silastic-layer 8 outside polishing roller, the outside contact of polishing roller needs the substrate of surface coating sensitive material after drying.
The outside contact of polishing roller needs the substrate of surface coating sensitive material after drying, and refers in production, and the outside contact substrate of polishing roller wants the face of polishing.
So carrying out the substrate of polishing under equal conditions, the number of resistance to impression significantly improves, for instance when photosensitive layer unit mass is 2.0g/, without polishing, reaches 150,000 times, can reach 180,000 times through polishing.
Say outside described silastic-layer, have multiple protruding 9 further.
Saying further, described polishing roller is multiple.
The foregoing is only specific embodiments of the invention, but the architectural feature of the present invention is not limited to this, any those skilled in the art is in the field of the invention, and change or the modification made all are encompassed in the scope of the claims of the present invention.
Claims (3)
1. there is the photosensitive material plate coating machine of polishing device, outfan including the upstream end of material and finished product, coating machine is disposed with degreasing unit, in and device, electrolysis unit, oxidation unit, drying unit and apparatus for coating, it is characterized in that: between described drying unit and apparatus for coating, be additionally provided with polishing device, described polishing device includes polishing roller, polishing roller connecting power device, being silastic-layer outside polishing roller, the outside contact of polishing roller needs the substrate of surface coating sensitive material after drying.
2. coating machine according to claim 1, is characterized in that: have multiple projection outside described silastic-layer.
3. coating machine according to claim 1 and 2, is characterized in that: described polishing roller is multiple.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610249225.XA CN105709998A (en) | 2016-04-21 | 2016-04-21 | Light-sensitive material coating machine with polishing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610249225.XA CN105709998A (en) | 2016-04-21 | 2016-04-21 | Light-sensitive material coating machine with polishing device |
Publications (1)
Publication Number | Publication Date |
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CN105709998A true CN105709998A (en) | 2016-06-29 |
Family
ID=56161287
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610249225.XA Pending CN105709998A (en) | 2016-04-21 | 2016-04-21 | Light-sensitive material coating machine with polishing device |
Country Status (1)
Country | Link |
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CN (1) | CN105709998A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106865279A (en) * | 2017-04-14 | 2017-06-20 | 长葛市长润钢结构有限公司 | Waterproof material is applied and spreads anti-sticking powder device |
CN113960883A (en) * | 2021-11-25 | 2022-01-21 | 河南汇达印通科技股份有限公司 | Baking box for photosensitive material plate |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001192136A (en) * | 2000-01-05 | 2001-07-17 | Canon Inc | Image forming device |
JP2001228601A (en) * | 2000-02-17 | 2001-08-24 | Fuji Photo Film Co Ltd | Method for producing photosensitive planographic printing plate |
CN1326861A (en) * | 2000-05-15 | 2001-12-19 | 富士胶片株式会社 | Support body of lithographic printing plate and photosensitive resin lithographic plate |
JP2002282902A (en) * | 2001-03-28 | 2002-10-02 | Kawasaki Steel Corp | Method for tempering and rolling stainless steel sheet |
CN1950156A (en) * | 2004-05-07 | 2007-04-18 | 富士胶片株式会社 | Coating device and coating method |
CN203080361U (en) * | 2012-12-28 | 2013-07-24 | 厦门文仪电脑材料有限公司 | Steam humidifier of temperature-sensitive millboard |
CN204658150U (en) * | 2015-06-04 | 2015-09-23 | 马永峰 | Support roller rust remover |
CN205570707U (en) * | 2016-04-21 | 2016-09-14 | 长葛市汇达感光材料有限公司 | Photosensitive material board coating machine with burnishing device |
-
2016
- 2016-04-21 CN CN201610249225.XA patent/CN105709998A/en active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001192136A (en) * | 2000-01-05 | 2001-07-17 | Canon Inc | Image forming device |
JP2001228601A (en) * | 2000-02-17 | 2001-08-24 | Fuji Photo Film Co Ltd | Method for producing photosensitive planographic printing plate |
CN1326861A (en) * | 2000-05-15 | 2001-12-19 | 富士胶片株式会社 | Support body of lithographic printing plate and photosensitive resin lithographic plate |
JP2002282902A (en) * | 2001-03-28 | 2002-10-02 | Kawasaki Steel Corp | Method for tempering and rolling stainless steel sheet |
CN1950156A (en) * | 2004-05-07 | 2007-04-18 | 富士胶片株式会社 | Coating device and coating method |
CN203080361U (en) * | 2012-12-28 | 2013-07-24 | 厦门文仪电脑材料有限公司 | Steam humidifier of temperature-sensitive millboard |
CN204658150U (en) * | 2015-06-04 | 2015-09-23 | 马永峰 | Support roller rust remover |
CN205570707U (en) * | 2016-04-21 | 2016-09-14 | 长葛市汇达感光材料有限公司 | Photosensitive material board coating machine with burnishing device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106865279A (en) * | 2017-04-14 | 2017-06-20 | 长葛市长润钢结构有限公司 | Waterproof material is applied and spreads anti-sticking powder device |
CN113960883A (en) * | 2021-11-25 | 2022-01-21 | 河南汇达印通科技股份有限公司 | Baking box for photosensitive material plate |
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PB01 | Publication | ||
C10 | Entry into substantive examination | ||
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WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20160629 |
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WD01 | Invention patent application deemed withdrawn after publication |