CN105698726A - Method and device for measuring and calibrating motion platform positioning precision - Google Patents
Method and device for measuring and calibrating motion platform positioning precision Download PDFInfo
- Publication number
- CN105698726A CN105698726A CN201610073230.XA CN201610073230A CN105698726A CN 105698726 A CN105698726 A CN 105698726A CN 201610073230 A CN201610073230 A CN 201610073230A CN 105698726 A CN105698726 A CN 105698726A
- Authority
- CN
- China
- Prior art keywords
- motion platform
- motion
- step pitch
- positioning precision
- chi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
A device for measuring and calibrating motion platform positioning precision is disclosed and comprises a motion platform, a high precision scaling ruler fixed on the motion platform, a measuring camera arranged above the high precision scaling ruler and a motion control module used for controlling the motion platform, wherein the motion platform runs the step pitch preset by the motion control module, the measuring camera obtains graduation line change information of the high precision scaling ruler by taking photos within a preset step pitch period, and the motion control module is used for calculating the actual travel distance within the step pitch period according to the graduation line change information of the high precision scaling ruler and is used for adjusting the preset step pitch according to the deviation value between the actual travel distance and the preset step pitch. The technical solution of the method and device for measuring and calibrating the motion platform positioning precision is characterized by simplicity, practicality, and measuring cost which is greatly reduced.
Description
Technical field
The present invention relates to measure of precision field, particularly relate to measure and calibrate the method and apparatus of motion platform positioning precision。
Background technology
In some automation equipments, the requirement of processing precision of products is more and more higher, and in equipment, the positioning precision of motion platform will determine that whether product quality is qualified, and positioning precision deficiency will cause that fraction defective rises。The overall performance of automation equipment is played conclusive effect by the positioning precision of motion platform。As workpiece is being carried out in cutting processing process by the motion platform in laser cutting device, it is necessary to the position being accurately positioned workpiece could realize high-precision cutting, and the positioning precision of motion platform directly affects the machining accuracy to workpiece。
At present, it is generally adopted the positioning precision that laser interferometer is measured and calibrated motion platform, but laser interferometer is not expensive, complicated operation, portable, be not suitable for batch production and the inspection of equipment。
Summary of the invention
Based on this, it is necessary to provide a kind of and measure and the method and apparatus of calibration motion platform positioning precision, measure that instrument is expensive, complicated operation, not portative problem solving prior art。
A kind of device measured and calibrate motion platform positioning precision, including motion platform, the demarcation chi being fixed on described motion platform, being located at the measurement camera above described demarcation chi and for controlling the motion-control module of described motion platform, the positioning precision of described demarcation chi is higher than the positioning precision of described motion platform；The step pitch operating that described motion platform is preset according to described motion-control module, the picked-up of described measurement camera is the graduation mark change information of interior described demarcation chi during presetting step pitch, and described motion-control module calculates the actual travel distance in during certain predetermined step pitch by the graduation mark change information of described demarcation chi and presets step pitch according to the deviation value adjustment between described actual travel distance and default step pitch。
Preferably, the graduation mark of described demarcation chi includes a central point and the sideline extended out from this central point。
Preferably, the graduation mark graphic designs on described demarcation chi is "×" shape。
Preferably, if described demarcation chi is inconsistent with the direction of motion of described motion platform: first measure the length value that the length in the sideline that described "×" shape graduation mark extends is corresponding with the direction of motion, calculate the angle theta between the direction of motion and described "×" shape graduation mark again through Pythagorean theorem；Then, the range ability of described demarcation chi is multiplied by the cosine value of angle theta and is the actual motion distance of motion platform。
Preferably, described measurement camera adopts overall situation exposure CCD camera, and the pixel of described measurement camera is 1600x1200, and each pixel is of a size of 4.4um, and configuration enlargement ratio is the microlens of 10 times。
A kind of method measured and calibrate motion platform positioning precision, including:
Sending enabled instruction makes motion platform to set step pitch operating to motion platform；
Obtain the demarcation chi graduation mark change information during certain predetermined step pitch being fixed on motion platform；
Calculating the actual travel distance of motion platform in certain predetermined step pitch according to the graduation mark information demarcating chi of described acquisition, the positioning precision of described demarcation chi is higher than the positioning precision of described motion platform；
Described actual travel distance and described default step pitch are compared acquisition deviation value；
The deviation value calibration obtained is utilized to adjust the step pitch of described motion platform。
Preferably, described motion platform is provided with drive motor and is controlled by motion-control module, and described motion-control module is used for starting, closing described motion platform and set step pitch for described motion platform。
Preferably, the graduation mark graphic designs on described demarcation chi is "×" shape。
Preferably, calculate the actual travel distance in certain predetermined step pitch according to the graduation mark information demarcating chi of described acquisition, including:
Measure the length value that the length in the sideline that described "×" shape graduation mark extends is corresponding with the direction of motion；
Two length values that measurement obtains are utilized to calculate the angle theta between the direction of motion and described "×" shape graduation mark according to Pythagorean theorem；
The cosine value that the actual travel distance of described demarcation chi is multiplied by angle theta obtains the actual motion distance of motion platform。
Preferably, the deviation value calibration obtained is utilized to adjust the step pitch of described motion platform, including:
The stride value that described motion platform sets is adjusted by described deviation value；
The motor that stride value instruction after described adjustment sends to described motion platform performs。
At least one technical scheme above-mentioned that the embodiment of the present application adopts can reach following beneficial effect: fixes a high-precision calibrating chi on the moving platform, the actual displacement of described motion platform in default step pitch is calculated by calculating the actual displacement of described high-precision calibrating chi in certain predetermined step pitch, thus the deviation value drawn between described actual displacement and default step pitch, and the precision of described motion platform is calibrated with this deviation value, solve laser interferometer in prior art expensive, complicated operation, not portable, be not suitable for the batch production of equipment and the problem of inspection。
Accompanying drawing explanation
Fig. 1 is the schematic layout pattern that the application measured and calibrated motion platform positioning precision device；
Fig. 2 is the plan view demarcating chi that the application measured and calibrated motion platform positioning precision；
Fig. 3 is the flow chart that the application measured and calibrated motion platform positioning precision method。
Detailed description of the invention
Understandable for enabling the above-mentioned purpose of the present invention, feature and advantage to become apparent from, below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail。Elaborate a lot of detail in the following description so that fully understanding the present invention。But the present invention can implement being much different from alternate manner described here, and those skilled in the art can do similar improvement when without prejudice to intension of the present invention, therefore the present invention is by the restriction of following public specific embodiment。
It should be noted that be referred to as " being fixed on ", " being arranged at " another element when element, it can directly on another element or can also there is element placed in the middle。When an element is considered as " connection " another element, it can be directly to another element or may be simultaneously present centering elements。For illustrative purposes only, being not offered as is unique embodiment for term as used herein " vertical ", " level ", "left", "right" and similar statement。
Embodiment 1
As it is shown in figure 1, the device of the measurement of the embodiment of the present application 1 and calibration motion platform positioning precision includes motion platform 301, the high-precision calibrating chi 101 that is fixed on described motion platform 301, be located at and measure camera 201 and for controlling the motion-control module C1 of described motion platform 301 above described high-precision calibrating chi 101。Described motion-control module C1 has computing and controls function, described motion platform 301 is driven by motor and does rectilinear motion, described motion-control module C1 receives the measurement data of measurement camera 201 and calculates the kinematic error value of motion platform, then error amount sends the motor of motion platform 301 to calibrate the mobile accuracy of motion platform 301 to。
After described high-precision calibrating chi 101 is fixed on described motion platform 301, namely the amount of movement of described motion platform 301 is the amount of movement of high-precision calibrating chi 101。The accuracy class of described high-precision calibrating chi 101 is higher than the positioning precision of described motion platform 301, most preferred embodiment is the positioning precision of described high-precision calibrating chi 101 is ten times of motion platform 301, the gauge block adopting microscope to demarcate in the present embodiment, may be used without other type of calibrating block in other embodiments。
Refer to shown in Fig. 2, location figure on described high-precision calibrating chi 101 is designed as "×" shape, when described high-precision calibrating chi 101 when mounted and motion platform 301 direction of motion is not parallel cause existing measurement error time: first pass through the angle theta between sideline and the direction of motion of measuring described "×" shape graduation mark, namely measure the length value that the length in the sideline that described "×" shape graduation mark extends is corresponding with the direction of motion, then calculate the angle theta between the direction of motion and described "×" shape graduation mark by Pythagorean theorem；Now, the range ability L*cos θ of described high-precision calibrating chi 101 is the actual motion distance of motion platform 301。
In other embodiments, the graduation mark on described high-precision calibrating chi 101 is not limited to "×" shape, and graduation mark possesses a central point and the sideline extended outward from this central point。
Have only to after high-precision calibrating chi 101 anglec of rotation retighten when needing the positioning precision measuring the motion platform 301 in other direction。
Described measurement camera 201 adopts the CCD camera of overall situation exposure, it is possible to capturing swiftly passing object, motion platform 301 can move continuously and stop without one step pitch of every stepping, improves and measures and the efficiency of calibration motion platform positioning precision。The pixel of described measurement camera 201 is 1600x1200, each pixel is of a size of 4.4um and the microlens that configuration enlargement ratio is 10 times, so, each pixel corresponds to and is of a size of 4.4um/10=0.44um on high-precision calibrating chi 101, and namely the Pixel-level resolution of system is 0.44um。So, the measurement visual field of described measurement camera is: 1600x4.4um=7040um, 1200x4.4um=5280um。
After described motion-control module C1 starts motor actuation movement platform 301 operating of described motion platform 301, described motion platform 301 operates according to the motion-control module C1 step pitch set；Described measurement camera 201 shoots the graduation mark change information of described high-precision calibrating chi 101, and is sent to motion-control module C1；Described motion-control module C1 calculates the high-precision calibrating chi 101 actual travel distance after described motion platform 301 presets step pitch action according to described graduation mark change information, and is compared with the described motion-control module C1 step pitch set by this actual travel distance and obtain deviation value Σ δ d；Described motion-control module C1 utilizes this deviation value Σ δ d to compensate described motion platform 301, post-compensation is negated in described motion-control module C1 by deviation value, setting stride value such as motion-control module C1 is 10mm, the actual travel distance obtained after measurement is 10.05mm, then deviation value Σ δ d is 0.05mm, so 0.05mm is negated and be given to motion-control module C1 for-0.05mm, motion-control module C1 sends 10-0.05=9.95mm instruction, and then calibrates and promote the positioning precision of described motion platform 301。
Embodiment 2
The measurement of the embodiment of the present application 2 offer and the flow chart of the method for calibration motion platform positioning precision are provided, refer to by fixing the precision high-precision calibrating chi 101 higher than described motion platform 301 on motion platform 301, measure preset the actual travel distance of high-precision calibrating chi 101 in step pitch again through measuring camera 201, and calculate deviation value complement and fill to described motion platform 301 with calibration accuracy。Comprise the following steps:
S11, transmission enabled instruction make motion platform to set step pitch operating to motion platform。
Described in this step, motion platform is driven by motor, and described motion-control module controls the operating of described motion platform by described motor, including starting, close described motion platform and setting step pitch etc. for described motion platform。
The graduation mark change information during certain predetermined step pitch of the high-precision calibrating chi on motion platform is fixed in S12, acquisition。
High accuracy table scale described in this step is fixed on described motion platform in the movement direction, and this step is to obtain the described high accuracy table scale graduation mark change information in certain predetermined step pitch by the camera shooting of measuring being positioned at above described high-precision calibrating chi。Described certain predetermined step pitch can be the period of the period in described motion platform one default step pitch of operating or several default step pitch。
The precision of described high-precision calibrating chi, more than the precision of described motion platform, the gauge block adopting microscope to demarcate in the present embodiment, may be used without other type of calibrating block in other embodiments。
Described measurement camera 201 adopts the CCD camera of overall situation exposure, it is possible to capturing swiftly passing object, motion platform 301 can move continuously and stop without one step pitch of every stepping, improves and measures and the efficiency of calibration motion platform positioning precision。The pixel of described measurement camera 201 is 1600x1200, each pixel is of a size of 4.4um and the microlens that configuration enlargement ratio is 10 times, so, each pixel corresponds to and is of a size of 4.4um/10=0.44um on high-precision calibrating chi 101, and namely the Pixel-level resolution of system is 0.44um。So, the measurement visual field of described measurement camera is: 1600x4.4um=7040um, 1200x4.4um=5280um。
S13, graduation mark information according to the high-precision calibrating chi of described acquisition calculate the actual travel distance in certain predetermined step pitch。
In this step, known during distance between the graduation mark on described high-precision calibrating chi, according to the actual travel distance that the mobile quantity of described graduation mark can calculate in this step pitch。
S14, described actual travel distance and described default step pitch are compared acquisition deviation value。
This step is to obtain difference after described actual travel distance and described default step pitch being compared, and described difference can just can be born, and namely described plus or minus difference is deviation value Σ δ d。
The deviation value calibration that S15, utilization obtain adjusts the step pitch of described motion platform。
This step includes:
The stride value that described motion platform sets is adjusted by described deviation value；
The motor that stride value instruction after described adjustment sends to described motion platform performs。
Refer to shown in Fig. 2, location figure on described high-precision calibrating chi 101 is designed as "×" shape, when described high-precision calibrating chi 101 when mounted and motion platform 301 direction of motion is not parallel cause existing measurement error time: first pass through the angle theta between sideline and the direction of motion of measuring described "×" shape graduation mark, namely measure the length value that the length in the sideline that described "×" shape graduation mark extends is corresponding with the direction of motion, then calculate the angle theta between the direction of motion and described "×" shape graduation mark by Pythagorean theorem；Now, the range ability L*cos θ of described high-precision calibrating chi 101 is the actual motion distance of motion platform 301。
In other embodiments, the graduation mark on described high-precision calibrating chi 101 is not limited to "×" shape, and graduation mark possesses a central point and the sideline extended outward from this central point。
The application measures and the method and apparatus of calibration motion platform positioning precision fixes a high-precision calibrating chi on the moving platform, the actual displacement of described motion platform in default step pitch is calculated by calculating the actual displacement of described high-precision calibrating chi in certain predetermined step pitch, thus the deviation value drawn between described actual displacement and default step pitch, and the precision of described motion platform is calibrated with this deviation value, solve laser interferometer in prior art expensive, complicated operation, not portable, be not suitable for the batch production of equipment and the problem of inspection。
Each technical characteristic of embodiment described above can combine arbitrarily, for making description succinct, the all possible combination of each technical characteristic in above-described embodiment is not all described, but, as long as the combination of these technical characteristics is absent from contradiction, all it is considered to be the scope that this specification is recorded。
Embodiment described above only have expressed the several embodiments of the present invention, and it describes comparatively concrete and detailed, but can not therefore be construed as limiting the scope of the patent。It should be pointed out that, for the person of ordinary skill of the art, without departing from the inventive concept of the premise, it is also possible to making some deformation and improvement, these broadly fall into protection scope of the present invention。Therefore, the protection domain of patent of the present invention should be as the criterion with claims。
Claims (10)
1. the device measured and calibrate motion platform positioning precision, it is characterized in that, including motion platform, the demarcation chi being fixed on described motion platform, being located at the measurement camera above described demarcation chi and for controlling the motion-control module of described motion platform, the positioning precision of described demarcation chi is higher than the positioning precision of described motion platform；The step pitch operating that described motion platform is preset according to described motion-control module, the picked-up of described measurement camera is the graduation mark change information of interior described demarcation chi during presetting step pitch, and described motion-control module calculates the actual travel distance in during certain predetermined step pitch by the graduation mark change information of described demarcation chi and presets step pitch according to the deviation value adjustment between described actual travel distance and default step pitch。
2. the device of measurement according to claim 1 and calibration motion platform positioning precision, it is characterised in that the graduation mark of described demarcation chi includes a central point and the sideline extended out from this central point。
3. the device of measurement according to claim 2 and calibration motion platform positioning precision, it is characterised in that the graduation mark graphic designs on described demarcation chi is "×" shape。
4. the device of measurement according to claim 3 and calibration motion platform positioning precision, it is characterized in that, if described demarcation chi is inconsistent with the direction of motion of described motion platform: first measure the length value that the length in the sideline that described "×" shape graduation mark extends is corresponding with the direction of motion, calculate the angle theta between the direction of motion and described "×" shape graduation mark again through Pythagorean theorem；Then, the range ability of described demarcation chi is multiplied by the cosine value of angle theta and is the actual motion distance of motion platform。
5. the device of measurement according to claim 1 and calibration motion platform positioning precision, it is characterized in that, described measurement camera adopts overall situation exposure CCD camera, and the pixel of described measurement camera is 1600x1200, each pixel is of a size of 4.4um, and configuration enlargement ratio is the microlens of 10 times。
6. the method measured and calibrate motion platform positioning precision, it is characterised in that including:
Sending enabled instruction makes motion platform to set step pitch operating to motion platform；
Obtain the demarcation chi graduation mark change information during certain predetermined step pitch being fixed on motion platform；
The actual travel distance of motion platform in certain predetermined step pitch is calculated according to the graduation mark information demarcating chi of described acquisition；The positioning precision of described demarcation chi is higher than the positioning precision of described motion platform；
Described actual travel distance and described default step pitch are compared acquisition deviation value；
The deviation value calibration obtained is utilized to adjust the step pitch of described motion platform。
7. the method for measurement according to claim 6 and calibration motion platform positioning precision, it is characterized in that, described motion platform is provided with drive motor and is controlled by motion-control module, and described motion-control module is used for starting, closing described motion platform and set step pitch for described motion platform。
8. the method for measurement according to claim 6 and calibration motion platform positioning precision, it is characterised in that the graduation mark graphic designs on described demarcation chi is "×" shape。
9. the method for measurement according to claim 8 and calibration motion platform positioning precision, it is characterised in that calculate the actual travel distance in certain predetermined step pitch according to the graduation mark information demarcating chi of described acquisition, including:
Measure the length value that the length in the sideline that described "×" shape graduation mark extends is corresponding with the direction of motion；
Two length values that measurement obtains are utilized to calculate the angle theta between the direction of motion and described "×" shape graduation mark according to Pythagorean theorem；
The cosine value that the actual travel distance of described demarcation chi is multiplied by angle theta obtains the actual motion distance of motion platform。
10. the method for measurement according to claim 7 and calibration motion platform positioning precision, it is characterised in that utilize the deviation value calibration obtained to adjust the step pitch of described motion platform, including:
The stride value that described motion platform sets is adjusted by described deviation value；
The motor that stride value instruction after described adjustment sends to described motion platform performs。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610073230.XA CN105698726B (en) | 2016-02-02 | 2016-02-02 | Measure and calibrate the method and apparatus of motion platform positioning accuracy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610073230.XA CN105698726B (en) | 2016-02-02 | 2016-02-02 | Measure and calibrate the method and apparatus of motion platform positioning accuracy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105698726A true CN105698726A (en) | 2016-06-22 |
| CN105698726B CN105698726B (en) | 2018-07-31 |
Family
ID=56229078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610073230.XA Active CN105698726B (en) | 2016-02-02 | 2016-02-02 | Measure and calibrate the method and apparatus of motion platform positioning accuracy |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105698726B (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108081219A (en) * | 2017-12-07 | 2018-05-29 | 曹建 | The calibration method and system of operation console positioning accuracy |
| CN108802594A (en) * | 2017-04-28 | 2018-11-13 | 精工爱普生株式会社 | Electronic unit carrying device and electronic component inspection device |
| CN108961342A (en) * | 2018-05-02 | 2018-12-07 | 珠海市微半导体有限公司 | A kind of calibration method and system of light stream sensor |
| CN109186969A (en) * | 2018-07-28 | 2019-01-11 | 西安交通大学 | A kind of servo feed movement dynamic property visible detection method |
| CN110919238A (en) * | 2019-12-03 | 2020-03-27 | 东莞王氏港建机械有限公司 | Automatic welding method and welding device |
| CN112325816A (en) * | 2020-09-15 | 2021-02-05 | 沈阳和研科技有限公司 | Device and method for measuring geometric precision and compensating errors of scribing machine |
| CN113670230A (en) * | 2020-05-15 | 2021-11-19 | 全研科技有限公司 | XXY alignment platform inspection method |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102152007A (en) * | 2011-03-15 | 2011-08-17 | 北京金橙子科技有限公司 | Precision vibration mirror correction system and method |
| CN103197599A (en) * | 2013-03-25 | 2013-07-10 | 东华大学 | System and method for numerical control (NC) workbench error self correction based on machine vision |
| CN103454903A (en) * | 2013-09-23 | 2013-12-18 | 哈尔滨工程大学 | Time interval measuring calibrating device and method based on optical octave |
| CN104742137A (en) * | 2015-04-08 | 2015-07-01 | 常州铭赛机器人科技股份有限公司 | Method for performing locus compensating after replacing actuator of four-axis movement platform |
| CN104786036A (en) * | 2014-12-31 | 2015-07-22 | 宁波大正工业机器人技术有限公司 | Automobile instrument automatic pointer pressing system |
| CN104865893A (en) * | 2014-02-24 | 2015-08-26 | 大族激光科技产业集团股份有限公司 | Control system and error calculation method of movement platform |
| CN205561757U (en) * | 2016-02-02 | 2016-09-07 | 深圳中科光子科技有限公司 | Motion platform positioning accuracy's device is measured and calibrated |
-
2016
- 2016-02-02 CN CN201610073230.XA patent/CN105698726B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102152007A (en) * | 2011-03-15 | 2011-08-17 | 北京金橙子科技有限公司 | Precision vibration mirror correction system and method |
| CN103197599A (en) * | 2013-03-25 | 2013-07-10 | 东华大学 | System and method for numerical control (NC) workbench error self correction based on machine vision |
| CN103454903A (en) * | 2013-09-23 | 2013-12-18 | 哈尔滨工程大学 | Time interval measuring calibrating device and method based on optical octave |
| CN104865893A (en) * | 2014-02-24 | 2015-08-26 | 大族激光科技产业集团股份有限公司 | Control system and error calculation method of movement platform |
| CN104786036A (en) * | 2014-12-31 | 2015-07-22 | 宁波大正工业机器人技术有限公司 | Automobile instrument automatic pointer pressing system |
| CN104742137A (en) * | 2015-04-08 | 2015-07-01 | 常州铭赛机器人科技股份有限公司 | Method for performing locus compensating after replacing actuator of four-axis movement platform |
| CN205561757U (en) * | 2016-02-02 | 2016-09-07 | 深圳中科光子科技有限公司 | Motion platform positioning accuracy's device is measured and calibrated |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108802594A (en) * | 2017-04-28 | 2018-11-13 | 精工爱普生株式会社 | Electronic unit carrying device and electronic component inspection device |
| CN108081219A (en) * | 2017-12-07 | 2018-05-29 | 曹建 | The calibration method and system of operation console positioning accuracy |
| CN108961342A (en) * | 2018-05-02 | 2018-12-07 | 珠海市微半导体有限公司 | A kind of calibration method and system of light stream sensor |
| CN108961342B (en) * | 2018-05-02 | 2020-12-15 | 珠海市一微半导体有限公司 | Calibration method and system of optical flow sensor |
| CN109186969A (en) * | 2018-07-28 | 2019-01-11 | 西安交通大学 | A kind of servo feed movement dynamic property visible detection method |
| CN110919238A (en) * | 2019-12-03 | 2020-03-27 | 东莞王氏港建机械有限公司 | Automatic welding method and welding device |
| CN113670230A (en) * | 2020-05-15 | 2021-11-19 | 全研科技有限公司 | XXY alignment platform inspection method |
| CN112325816A (en) * | 2020-09-15 | 2021-02-05 | 沈阳和研科技有限公司 | Device and method for measuring geometric precision and compensating errors of scribing machine |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105698726B (en) | 2018-07-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105698726A (en) | Method and device for measuring and calibrating motion platform positioning precision | |
| CN205561757U (en) | Motion platform positioning accuracy's device is measured and calibrated | |
| EP3384239B1 (en) | Method for controlling and/or calibrating a horizontal axis of a rotation laser | |
| US10234274B2 (en) | Method for thickness measurement on measurement objects and device for applying the method | |
| CN102642385B (en) | Calibration method for positioning reference of full-automatic multi-camera silk screen printing equipment and calibration device | |
| EP3384236B1 (en) | Method for controlling and/or calibrating a vertical axis of a rotation laser | |
| CN111070387B (en) | Automatic precise adjusting device, method and system for precast beam body template | |
| CN103837093B (en) | spectral confocal sensor calibration system and method | |
| US10684512B2 (en) | Cell forming device and alignment method | |
| EP2765458A3 (en) | Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method | |
| CN111376254B (en) | Plane ranging method and system and plane adjusting method and system for mechanical arm | |
| KR101798322B1 (en) | shape measuring device, processing device and reforming method of shape measuring device | |
| CN105335941A (en) | Optical axis verticality adjustment apparatus and adjustment method adopting same | |
| CN102305599A (en) | Tire section structure surveying instrument and method | |
| CN103984361A (en) | Image obtaining apparatus and stage control method | |
| CN110918389B (en) | Dispensing device and dispensing method | |
| CN113910756B (en) | Compensation control method, device, equipment and medium based on screen printing alignment | |
| CN105783710A (en) | Position calibrating method and position calibrating device | |
| CN104048602A (en) | Complete imaging vision measurement device | |
| CN202582486U (en) | Positioning reference calibration device for fully automatic multi-camera screen printing equipment | |
| TWI493638B (en) | Electrical parameter adjusting device and adjusting method | |
| KR101383111B1 (en) | Auto focus regulator and auto focus regulating method of camera module | |
| KR100660032B1 (en) | A position correction method for flux processor and ball attach process of semiconductor element | |
| JP2007064698A (en) | Image processing system and calibration method for image processing system | |
| CN105180810A (en) | Cam follower motion law calibration device and method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20220614 Address after: 523000 Room 301, building 9, No.1 Taoyuan Road, Songshanhu Park, Dongguan City, Guangdong Province Patentee after: Guangdong Zhongke Weijing photonics Manufacturing Technology Co.,Ltd. Address before: Room 480-482, Block B, Qingxiang Road, Qinghu Science Park, Qinghu Community, Longhua Street, Longhua New District, Shenzhen City, Guangdong Province Patentee before: SHENZHEN MICROMACH TECHNOLOGY Co.,Ltd. |
|
| TR01 | Transfer of patent right |