CN105598460B - For manufacturing the high-temperature evaporator of micro/nano level metal dust - Google Patents
For manufacturing the high-temperature evaporator of micro/nano level metal dust Download PDFInfo
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- CN105598460B CN105598460B CN201610162116.4A CN201610162116A CN105598460B CN 105598460 B CN105598460 B CN 105598460B CN 201610162116 A CN201610162116 A CN 201610162116A CN 105598460 B CN105598460 B CN 105598460B
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- main body
- metal dust
- plasma gun
- nano level
- level metal
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/12—Making metallic powder or suspensions thereof using physical processes starting from gaseous material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Abstract
The invention belongs to metal dust manufacturing equipment technical field,It is related to the high-temperature evaporator for manufacturing micro/nano level metal dust,There is the concave up upper lid of the main body of opening and the middle part covered in main body upper end open including upper end,Steam vent is provided with upper lid,The plasma gun being centrally located and the internal channel or groove of spaced more than three,The air inlet of each internal channel or groove is opened on lid lower surface,Gas outlet is opened on upper interior surface,Gas outlet is less than steam vent,The spout lower surface of plasma gun is flushed or extended with the upper surface of main body in the main body under main body upper surface,Under shed has been centrally located on the bottom wall of main body,The downside of under shed is blocked with graphite block,Air through hole that is penetrating from the bottom to top and being docked one by one with the lower end air inlet of internal channel or groove is circumferentially arranged at intervals with the side wall of main body,Advantage is：Temperature field and gas field in main body is stable, the high yield rate of product, suitable for the manufacture of micro/nano level metal dust.
Description
Technical field
The invention belongs to metal dust manufacturing equipment technical field, refers in particular to a kind of for manufacturing micro/nano level metal dust
High-temperature evaporator.
Background technology
Existing metal dust evaporator, a kind of method therein be in container using wait caused by plasma gun from
After solid metallic is heated into metallic vapour by daughter transferred arc, regathers the metallic particles generated in metallic vapour and obtain metal powder
Last product, but, it is necessary to metallic vapour be extracted in circulating current from container, due to following during metal dust is collected
The flowing of ring air-flow and the disturbance to feed to temperature field and gas field, do not formed in container stable METAL HEATING PROCESS evaporating area and
Current-carrying gas excessively stream area, cause the temperature field in the air-flow in current-carrying gas excessively stream area not uniform enough, the temperature height in some regions, have
The temperature in a little regions is low, and the metallic particles that the metallic vapour of these different temperatures is formed in follow-up metallic vitellarium
Then size is uneven, and then causes defect rate high, and yield rate is low, low production efficiency.
The content of the invention
It is an object of the invention to provide a kind of high-temperature evaporator for being used to manufacture micro/nano level metal dust.
The object of the present invention is achieved like this：
For manufacturing the high-temperature evaporator of micro/nano level metal dust, including there is the main body of opening upper end and covered in main body
The concave up upper lid in middle part on end opening, the plasma gun for be provided with steam vent on upper lid, being centrally located and interval setting
The internal channel or groove of more than three, the air inlet of each internal channel or groove is opened on lid lower surface, gas outlet opening
In upper interior surface, gas outlet is less than steam vent, and the spout lower surface of plasma gun flushes or extended with the upper surface of main body
In main body under main body upper surface, under shed has been centrally located on the bottom wall of main body, the downside of under shed is blocked with graphite block,
Circumferentially it is arranged at intervals with penetrating from the bottom to top in the side wall of main body and is docked one by one with the lower end air inlet of internal channel or groove
Air through hole.
The sectional area sum of all air through hole lower ends air inlet and the gas outlet sectional area of all internal channels or groove it
With the ratio between be 1:3~10, the ratio between the sectional area sum of all air through hole lower ends air inlet and the sectional area of steam vent are 1:2~
5。
The ratio between above-mentioned upper cover cavity height and internal diameter of main body upper end open are 1:1~5, body height is high with upper cover cavity
The ratio between degree is 1:0.3~2.
Above-mentioned main body is made up of the protective layer of the high-temperature-resistant layer of internal layer, middle supporting layer, outer layer, described high temperature resistant
Layer is made using the aluminum oxide or magnesia or zirconium oxide type oxide ceramic material or graphite material with upper lid homogeneity, described
Supporting layer aluminum oxide or magnesia or zirconia material are filled, indeformable graphite type material under described protective layer used high temperature
It is made, the inclined outside upright that described air through hole is arranged on protective layer gross thickness is set.
Above-mentioned internal channel or groove is circumferentially distributed in the sector region of 90~180 degree of lid side, and described is interior logical
The height of road or groove is 10~40mm, and described steam vent is arranged on the upper lid of sector region offside.
When above-mentioned plasma gun is extended in the main body under main body upper surface, the spout lower surface of plasma gun with
The distance between upper surface of main body is 0~50mm.
Charge door is provided with above-mentioned upper lid, continuous charging structure, the continuous charging structure are provided with charge door
Including loading hopper, connected between the discharging opening and charge door of loading hopper bottom by conduit, at least interval is set on described conduit
Two are equipped with manually or electrically to switch.
1 is provided between through-hole inner surface on the outer surface of above-mentioned plasma gun and the upper lid of installation plasma gun
~25mm airspace.
Above-mentioned plasma gun is connected by the negative pole or positive pole of wire and dc source, and described graphite block passes through wire
It is connected with the negative or positive electrode of dc source, graphite block, dc source, plasma gun, plasma caused by plasma gun
Metal or/and metal liquid, graphite block in body transferred arc, main body form power circuit.
The present invention is prominent and beneficial compared with prior art to be had the technical effect that：
1st, the METAL HEATING PROCESS evaporating area for the stabilization that structure of the invention is formed and current-carrying gas excessively stream area can cause metal
The evaporation of metal in heating evaporation area and the gas in current-carrying gas excessively stream area, which flow, is independent of each other or influences very small, the temperature field in each area
It is stable with gas field, be advantageous to the formation of high quality of products.
2nd, due to there is stable gas temperature field, therefore the current-carrying in main body in the current-carrying gas excessively stream area of the present invention
Gaseous metal in gas excessively stream area is not easy to form metallic, but complete in the stable metallic vitellarium of following temperature
Form metallic, and the metal dust of long great achievement designed size (micro/nano level) together, high yield rate in portion.
3rd, the gas that the present invention is entered in body lumen using the waste-heat of main body wall so that the gas in body lumen
Temperature is kept approximately constant so that the stability of product is good, high yield rate.
4th, the present invention is by charge door continuous charging to the main body of main body, the temperature in METAL HEATING PROCESS evaporating area in main body
Spend constant, the generation of same specification gaseous metal is not only improved, by the gold for all forming designed size in metallic vitellarium
After belonging to particle, the metal dust of obtained high-purity, high-quality can be continuously collected from collector again.
5th, the present invention is applied to the manufacture of micro/nano level metal dust.
Brief description of the drawings
Fig. 1 is the principle schematic diagram (being arranged at intervals on upper lid fluted) of the present invention.
Fig. 2 is Fig. 1 A-A to sectional view.
Fig. 3 is Fig. 1 B-B direction sectional view.
Fig. 4 is the principle schematic diagram (being arranged at intervals with internal channel on upper lid) of the present invention.
Embodiment
With specific embodiment, the invention will be further described below in conjunction with the accompanying drawings, referring to Fig. 1-Fig. 4：
For manufacturing the high-temperature evaporator of micro/nano level metal dust, including there is the main body 18 of opening upper end and covered in main body
The concave up upper lid 13 in middle part in 18 upper end opens, the plasma gun for being provided with steam vent 10, being centrally located on upper lid 13
11 and the internal channel 30 or groove 15 of spaced more than three, the air inlet of each internal channel 30 or groove 15 be opened on
The lower surface of lid 13, gas outlet 14 are opened on the inner surface 31 of lid 13, and gas outlet 14 is less than steam vent 10, the spray of plasma gun 11
Mouth lower surface is flushed or extended with the upper surface of main body 18 in the main body 18 under the upper surface of main body 18, is occupied on the bottom wall of main body 18
In be provided with shed 25, the downside graphite block 24 of under shed 25 blocks, be circumferentially arranged at intervals with the side wall of main body 18 by
Under supreme insertion and the air through hole 22 docked one by one with the lower end air inlet of internal channel or groove 15.
The sectional area S1 sums of all lower end air inlets of air through hole 22 and the gas outlet of all internal channels 30 or groove 15
The ratio between 14 sectional area S2 sums are 1:3~10, the sectional area S1 sums and steam vent of all lower end air inlets 23 of air through hole 22
The ratio between 10 sectional area S3 is 1:2~5.
The ratio between the above-mentioned cavity heights h of upper lid 13 and internal diameter D2 of the upper end open of main body 18 is 1:1~5, the height H of main body 18 with
The ratio between upper cavity heights h of lid 13 is 1:0.3~2.
Above-mentioned main body 18 is made up of the protective layer 21 of the high-temperature-resistant layer 19 of internal layer, middle supporting layer 20, outer layer, described
High-temperature-resistant layer 19 using and the upper homogeneity of lid 13 aluminum oxide or magnesia or zirconium oxide type oxide ceramic material or graphite material
Material is made, and described supporting layer 20 is filled with aluminum oxide or magnesia or zirconia material, and described protective layer 21 is with high temperature
Indeformable graphite type material is made, and the inclined outside upright that described air through hole 22 is arranged on the gross thickness of protective layer 21 is set.
Above-mentioned internal channel 30 or groove 15 is circumferentially distributed in the sector region M of the 90~180 degree of side of lid 13, described
Internal channel 30 or the height of groove 15 be 10~40mm, described steam vent 10 is arranged on the upper lid 13 of sector region M offsides
On.
When above-mentioned plasma gun 11 is extended in the main body 18 under the upper surface of main body 18, the spout of plasma gun 11
The distance between lower surface and the upper surface 26 of main body 18 are 0~50mm.
Charge door 12 is provided with above-mentioned upper lid 13, continuous charging structure is provided with charge door 12, it is described continuously to add
Material structure includes loading hopper, is connected between the discharging opening and charge door 12 of loading hopper bottom by conduit, described conduit is up to
Two are arranged at intervals with less manually or electrically to switch；When high-temperature evaporator running hours, can from charge door 12 continuously to
Fed in main body 18, you can the metal dust of obtained micro/nano level is continuously obtained from collector, two are manually or electrically opened
The alternation switch of pass, the granular material in loading hopper can be caused continuously to enter in crucible, the temperature in crucible will not be made again
Fluctuation is produced due to charging, charging lid is provided with loading hopper, in order to the further insulation to the temperature in crucible.
Between through-hole inner surface on the outer surface of above-mentioned plasma gun 11 and the upper lid 13 of installation plasma gun 11
It is provided with 1~25mm airspace J.
Above-mentioned plasma gun 11 is connected by wire 27 with the negative pole or positive pole of dc source 28, described graphite block 24
Be connected by wire 27 with the negative or positive electrode of dc source 28, graphite block 24, dc source 28, plasma gun 11, etc. from
Plasma transferred arc 16, the metal in main body 18 or/and metal liquid 32, graphite block 24, which are formed, caused by sub- spray gun 11 is powered
Loop, to make it be evaporated to gaseous metal on the metal in main body 18 or/and the heating of metal liquid 32.
Because the spout lower surface of plasma gun 11 with the upper surface 26 of main body 18 flushes or extended the upper surface of main body 18
In main body 18 under 26, plasma gun 11 work when so that the upper surface of main body 18 below 26 or metal liquid 32 liquid
The METAL HEATING PROCESS evaporating area of 17 stabilization formed below of face, and air-flow enters from all lower end air inlets 23 of air through hole 22, passed through
Flowed out again from steam vent 10 after crossing in the upper lid 13 of the entrance of gas outlet 14 of all internal channels or groove 15 and take away METAL HEATING PROCESS steaming
Gaseous metal to the metallic vitellarium evaporated in hair area, and the liquid level more than 17 of the metal liquid 32 in main body 18 or main
The upper surface more than 26 of body 18, the inner surface of upper lid 13 form current-carrying gas excessively stream area with lower part.
Due to continuously evaporating gaseous metal out of METAL HEATING PROCESS evaporating area, air-flow (such as nitrogen or argon gas or helium
Deng inert gas) by current-carrying gas excessively stream area continuously bring the gaseous metal evaporated in METAL HEATING PROCESS evaporating area into metal
Particle growth area is again to collecting metal dust in metal dust collector, during this, the gas stream in current-carrying gas excessively stream area
It is dynamic do not disturb or less interference METAL HEATING PROCESS evaporating area in plasma gun 11 to the antipyretic of metal and evaporate gaseous metal,
Form so that gaseous metal is left with air-flow with the reduction of gas flow temperature in metallic vitellarium behind current-carrying gas excessively stream area
Metallic particles smaller and of uniform size, be made high quality, high standard micro/nano level metal dust；At the same time, air-flow
During all air through hole 22, all internal channels 30 or groove 15 enter in upper lid 13, by main body 18 and upper lid
The heating of 13 residual temperatures so that gas temperature is almost identical with the temperature in upper lid 13, in upper lid 13 temperature change influence compared with
It is small, be advantageous to gaseous metal and flow and form in flow velocity and the metastable metallic vitellarium of temperature smaller and big with gas
Small uniform metallic particles so that produce high quality, the metal dust of high standard has reliable technical support；In addition, from adding
The continuous continuous charging a small amount of into main body 18 of material mouth 12, the temperature change in upper lid 13 influence smaller, and cover on ensureing
One of temperature stabilization in 13, the uniform measure of fineness of the gaseous metal of evaporation, is advantageous to the generation of same specification gaseous metal,
Also turn into and produce high quality, the reliable technical support of the metal dust of high standard.
Above-described embodiment is only presently preferred embodiments of the present invention, is not limited the scope of the invention according to this, therefore：It is all according to
The equivalence changes that structure, shape, the principle of the present invention is done, all should be covered by within protection scope of the present invention.
Claims (8)
1. the high-temperature evaporator for manufacturing micro/nano level metal dust, it is characterised in that：Including upper end have opening main body and
The concave up upper lid in the middle part covered in main body upper end open, the plasma gun for being provided with steam vent, being centrally located on upper lid
And the internal channel or groove of spaced more than three, the air inlet of each internal channel or groove be opened on lid lower surface,
Gas outlet is opened on upper interior surface, and gas outlet is less than steam vent, the spout lower surface of plasma gun and the upper surface of main body
Flush or extend in the main body under main body upper surface, under shed has been centrally located on the bottom wall of main body, the downside of under shed is used
Graphite block blocks, be circumferentially arranged at intervals with the side wall of main body it is penetrating from the bottom to top and with the lower end air inlet of internal channel or groove
The air through hole that mouth docks one by one；
Described internal channel or groove is circumferentially distributed in the sector region of 90~180 degree of lid side；
The sectional area sum of all air through hole lower ends air inlet and the gas outlet sectional area sum of all internal channels or groove it
Than for 1:3~10, the ratio between the sectional area sum of all air through hole lower ends air inlet and the sectional area of steam vent are 1:2~5.
2. the high-temperature evaporator according to claim 1 for being used to manufacture micro/nano level metal dust, it is characterised in that：It is described
The ratio between upper cover cavity height and internal diameter of main body upper end open are 1:1~5, the ratio between body height and upper cover cavity height are 1:
0.3~2.
3. the high-temperature evaporator according to claim 1 for being used to manufacture micro/nano level metal dust, it is characterised in that：It is described
Main body be made up of the protective layer of the high-temperature-resistant layer of internal layer, middle supporting layer, outer layer, described high-temperature-resistant layer use and upper lid
The aluminum oxide or magnesia or zirconium oxide type oxide ceramic material or graphite material of homogeneity are made, the oxidation of described supporting layer
Aluminium or magnesia or zirconia material are filled, and indeformable graphite type material is made under described protective layer used high temperature, described
The inclined outside upright that air through hole is arranged on protective layer gross thickness is set.
4. the high-temperature evaporator according to claim 1 for being used to manufacture micro/nano level metal dust, it is characterised in that：It is described
Internal channel or the height of groove be 10~40mm, described steam vent is arranged on the upper lid of sector region offside.
5. the high-temperature evaporator according to claim 1 for being used to manufacture micro/nano level metal dust, it is characterised in that：It is described
Plasma gun when extending in the main body under main body upper surface, the spout lower surface of plasma gun and the upper surface of main body
The distance between be 0~50mm.
6. the high-temperature evaporator according to claim 1 for being used to manufacture micro/nano level metal dust, it is characterised in that：It is described
Upper lid on be provided with charge door, continuous charging structure is provided with charge door, the continuous charging structure includes loading hopper, added
Connected between the discharging opening and charge door of feed hopper bottom by conduit, be at least arranged at intervals with described conduit two manually or
Motor switch.
7. the high-temperature evaporator according to claim 1 for being used to manufacture micro/nano level metal dust, it is characterised in that：It is described
1~25mm ventilation is provided between through-hole inner surface on the outer surface of plasma gun and the upper lid of installation plasma gun
Gap.
8. the high-temperature evaporator for being used to manufacture micro/nano level metal dust according to any one of claim 1-7, its feature
It is：The plasma gun by the negative pole or positive pole of wire and dc source connect, described graphite block by wire with
The negative or positive electrode connection of dc source, graphite block, dc source, plasma gun, plasma caused by plasma gun
Metal or/and metal liquid, graphite block in transferred arc, main body form power circuit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610162116.4A CN105598460B (en) | 2016-03-21 | 2016-03-21 | For manufacturing the high-temperature evaporator of micro/nano level metal dust |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610162116.4A CN105598460B (en) | 2016-03-21 | 2016-03-21 | For manufacturing the high-temperature evaporator of micro/nano level metal dust |
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| Publication Number | Publication Date |
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| CN105598460A CN105598460A (en) | 2016-05-25 |
| CN105598460B true CN105598460B (en) | 2018-03-06 |
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| CN107807065B (en) * | 2017-09-21 | 2019-02-01 | 西北工业大学 | For studying the experimental provision of Al-O-C system kinetics under the conditions of slag deposition |
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| CN214260701U (en) * | 2021-01-08 | 2021-09-24 | 江苏博迁新材料股份有限公司 | Conductive crucible high-temperature evaporator heated by plasma transferred arc |
| CN214260700U (en) * | 2021-01-08 | 2021-09-24 | 江苏博迁新材料股份有限公司 | High-temperature evaporator heated by using plasma transferred arc |
| WO2022156227A1 (en) * | 2021-01-25 | 2022-07-28 | 钟笔 | High-temperature-resistant liquid reflux and air outlet structure for preparing fine powder by gas-phase method |
| CN115351286B (en) * | 2022-08-08 | 2023-07-14 | 杭州新川新材料有限公司 | High-temperature evaporation furnace for metal powder production |
| CN115770882A (en) * | 2022-11-02 | 2023-03-10 | 杭州新川新材料有限公司 | Method and device for manufacturing superfine spherical metal powder |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1250701A (en) * | 1999-11-18 | 2000-04-19 | 华中理工大学 | Process and equipment for preparing superfine powder by heating and evaporation |
| US6379419B1 (en) * | 1998-08-18 | 2002-04-30 | Noranda Inc. | Method and transferred arc plasma system for production of fine and ultrafine powders |
| CN1382547A (en) * | 2002-02-08 | 2002-12-04 | 宁波广博纳米材料有限公司 | Equipment for preparing nano metal powder |
| CN104302427A (en) * | 2012-04-20 | 2015-01-21 | 昭荣化学工业株式会社 | Method for manufacturing metal powder |
| CN104722764A (en) * | 2015-03-11 | 2015-06-24 | 江永斌 | Cyclically-cooled metal powder evaporation preparation device |
| CN205414418U (en) * | 2016-03-21 | 2016-08-03 | 台州市金博超导纳米材料科技有限公司 | A high temperature evaporimeter for making micro -nano level metal powder |
-
2016
- 2016-03-21 CN CN201610162116.4A patent/CN105598460B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6379419B1 (en) * | 1998-08-18 | 2002-04-30 | Noranda Inc. | Method and transferred arc plasma system for production of fine and ultrafine powders |
| CN1250701A (en) * | 1999-11-18 | 2000-04-19 | 华中理工大学 | Process and equipment for preparing superfine powder by heating and evaporation |
| CN1382547A (en) * | 2002-02-08 | 2002-12-04 | 宁波广博纳米材料有限公司 | Equipment for preparing nano metal powder |
| CN104302427A (en) * | 2012-04-20 | 2015-01-21 | 昭荣化学工业株式会社 | Method for manufacturing metal powder |
| CN104722764A (en) * | 2015-03-11 | 2015-06-24 | 江永斌 | Cyclically-cooled metal powder evaporation preparation device |
| CN205414418U (en) * | 2016-03-21 | 2016-08-03 | 台州市金博超导纳米材料科技有限公司 | A high temperature evaporimeter for making micro -nano level metal powder |
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Address after: 318000 1st floor, building 4, No. 888, Donghuan Avenue, Jiaojiang District, Taizhou City, Zhejiang Province Patentee after: Taizhou Jinbo New Material Co.,Ltd. Address before: 318000 1st floor, building 4, No. 888, Donghuan Avenue, Jiaojiang District, Taizhou City, Zhejiang Province Patentee before: TAIZHOU JIN BO SUPER NANOMETER MATERIAL TECHNOLOGY Co.,Ltd. |
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