CN105511072A - Optical filter, and analytical instrument and optical apparatus using the optical filter - Google Patents
Optical filter, and analytical instrument and optical apparatus using the optical filter Download PDFInfo
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/28—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals
- G02B6/293—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means
- G02B6/29346—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means operating by wave or beam interference
- G02B6/29361—Interference filters, e.g. multilayer coatings, thin film filters, dichroic splitters or mirrors based on multilayers, WDM filters
Abstract
The invention relates to an optical filter, and an analytical instrument and optical apparatus using the optical filter. The optical filter includes a first substrate, a second substrate, a first reflecting film disposed on a first opposed surface of the first substrate, a second reflecting film disposed on a second opposed surface of the second substrate, a first electrode provided to the first substrate at a peripheral position of the first reflecting film in a plan view, and a second electrode provided to the second substrate and opposed to the first electrode, at least one of the first opposed surface and the second opposed surface is provided with a step section, and an initial gap between the first reflecting film and the second reflecting film is formed so as to be smaller than an initial gap between the first electrode and the second electrode, thereby controlling the gap between the reflecting films with good accuracy.
Description
The divisional application that the application is application number is 201110057787.1, the applying date is on March 8th, 2011, application people is Seiko Epson Corp, denomination of invention is the application for a patent for invention of " optical filter and use its analytical equipment and light device ".
Technical field
The present invention relates to optical filter and use its analytical equipment and light device etc.
Background technology
Now propose to make through wavelength variable interference filter (patent documentation 1).As shown in Fig. 3 of patent documentation 1, possess: by a pair substrate kept in parallel to each other, the one-to-many tunic (reflectance coating) formed according to mutually opposing on this pair substrate and there is the gap of certain intervals mode, a pair electrostatic drive electrodes for control gap.This variable-wavelength interference filter can utilize the voltage to electrostatic drive electrodes applies to produce electrostatic attraction, and control gap, makes the center wavelength variation through light.
Patent documentation 1: Japanese Unexamined Patent Publication 11-142752 publication
The problem of this variable-wavelength interference filter is, utilizes the gap that electrostatic actuator controls between a pair reflectance coating accurately.Since using the wavelength of light as object, this gap precision is exactly nanometer unit.When the wave length variable filter of the wavelength chooses in wave band wide especially can be realized, need under limited driving voltage, not only can realize large gap displacement (movable range), but also the high-precision clearance control of infinitesimal deflection can be realized.
Summary of the invention
In several mode of the present invention, provide and electrostatic actuator can be utilized to carry out the optical filter of the control in the gap between a pair reflectance coating accurately and employ its analytical equipment and light device.
(1) feature of the optical filter of a mode of the present invention is, comprising:
First substrate;
Second substrate, it is opposed with described first substrate;
First reflectance coating, it is arranged at first opposed faces opposed with described second substrate of described first substrate;
Second reflectance coating, it is arranged at second opposed faces opposed with described first substrate of described second substrate, and opposed with described first reflectance coating;
First electrode, it is when overlooking, and the position around described first reflectance coating is arranged at described first opposed faces of described first substrate; And
Second electrode, it is arranged at described second opposed faces of described second substrate, and with described first electrode contraposition,
End difference is formed at least one party of described first opposed faces and described second opposed faces,
Gap between described first reflectance coating and described second reflectance coating is less than primary clearance between described first electrode and described second electrode.
In a mode of the present invention, the primary clearance between the first reflectance coating and the second reflectance coating is made to be less than primary clearance between the first electrode and the second electrode.Here, electrostatic attraction F can be expressed as:
F＝(1/2)ε(V/G)
2S……(1)
In formula (1), ε: specific inductive capacity, V: apply voltage, G: interelectrode gap, S: electrode contraposition area.
That is, electrostatic attraction F and first, second interelectrode clearance G (the second clearance G 2) is square inversely proportional.Thus, in the region that first, second interelectrode gap G is little, electrostatic attraction is large relative to the variation delta D of gap variation delta G, as long as clearance G changes slightly, electrostatic attraction F will change sharp, and the clearance control thus for the electrostatic attraction F obtaining regulation is very difficult.Different with it, if as a mode of the present invention, make interelectrode gap G larger than the gap between first, second reflectance coating, then can reduce the change of electrostatic attraction F relative to the unit change amount of interelectrode gap.Just easily can control the size of electrostatic attraction F thus.
(2) in a mode of the present invention, also can be, above-mentioned first opposed faces of above-mentioned first substrate is configured at the surrounding of above-mentioned first surface and has second of ladder difference with above-mentioned first surface when comprising first surface and overlook, in above-mentioned first surface, form above-mentioned first reflectance coating, in above-mentioned second, form above-mentioned first electrode.
That is, by arranging ladder difference in the first opposed faces of first substrate, the primary clearance between the first reflectance coating and the second reflectance coating just can be made to be less than primary clearance between the first electrode and the second electrode.And in this situation, what call due to first, second substrate is movable a pair counter substrate of at least one party, therefore the side being formed with ladder difference in opposed faces can be called first substrate, the opposing party not forming ladder is called second substrate.No matter first substrate is that fixing base or movable substrate can.
(3) in a mode of the present invention, also can be, above-mentioned first opposed faces of above-mentioned first substrate is configured at the surrounding of above-mentioned first surface and has second of ladder difference with above-mentioned first surface when comprising first surface and overlook, above-mentioned first reflectance coating is formed in above-mentioned first surface, above-mentioned first electrode is formed in above-mentioned second
Above-mentioned second opposed faces of above-mentioned second substrate comprise the 3rd and overlook time be configured at the surrounding of above-mentioned 3rd and have the fourth face of ladder difference with above-mentioned 3rd mask, in above-mentioned 3rd, form above-mentioned second reflectance coating, in above-mentioned fourth face, form above-mentioned second electrode.
That is, by arranging ladder difference in the first opposed faces of first substrate and the second opposed faces both sides of second substrate, the primary clearance between the first reflectance coating and the second reflectance coating just can be made to be less than primary clearance between the first electrode and the second electrode.
(4) in a mode of the present invention, also can be, above-mentioned second substrate is supported movably relative to above-mentioned first substrate, and the region that the wall thickness being configured with the region of above-mentioned second reflectance coating of above-mentioned second substrate is formed than being configured with above-mentioned second electrode is thick.
Like this, make it by the region of formation second reflectance coating is formed as heavy wall to be difficult to flexure, the second reflectance coating just can be made to change gap with keeping flatness.Now, ladder difference is set in second substrate, this ladder can be utilized, the region being configured with the second reflectance coating is formed with heavy wall.And, because the region being formed with the second electrode can be formed with thin-walled, it is hereby ensured the flexibility of second substrate.
(5) in a mode of the present invention, can be set to, above-mentioned first electrode to be split in electrical resistance independently at least K (K is the integer of more than 2) individual segment electrode, and above-mentioned second electrode is the public electrode being in same potential.
In this optical filter, common electric voltage (such as ground voltage etc.) is applied to the second electrode of the surrounding being configured in the second reflectance coating when overlooking, independently voltage is applied to each electrode of K segment electrode of formation first electrode of the surrounding being configured in the first reflectance coating when overlooking, makes the size in the gap between first, second reflectance coating variable.Applying voltage is DC voltage.Like this, by make to the size of the voltage that K segment electrode applies and from K segment electrode in order to apply these 2 Parameters variation of segment electrode number that voltage is selected, control the size in the gap between first, second reflectance coating.
If as patent documentation 1, parameter is only the kind of voltage, be then difficult to take into account large gap movable range and the muting sensitivity to the variation in voltage caused by noise etc.By as a mode of the present invention, except the parameter that number of electrodes is such, can also by each segment electrode application with only by the applying voltage range that voltage-controlled situation is identical, and in large gap movable range, produce the electrostatic attraction of having finely tuned further, thus meticulous gap adjustment can be carried out.
Here, alive maximal value will be executed and be set to Vmax, and make gap variable with N level.When the first electrode is not split into multiple, need maximum voltage Vmax to distribute applying voltage with being divided into N part.Now, the minimum value of the voltage variety between different applying voltage is set to Δ V1min.On the other hand, in present embodiment, as long as maximum voltage Vmax be divided into (N/K) part fifty-fifty to the applying voltage of each electrode of K segment electrode and distribute.Now, for each electrode of K segment electrode, the minimum value of the voltage variety between the different applying voltage applied same segment electrode is set to Δ Vkmin.In this situation, obviously, Δ V1min< Δ Vkmin sets up.
That is, for executing each voltage alive to K segment electrode, using the maximum voltage supplied to potential difference (PD) control part as full scale distribute as a result, the minimum value Δ Vkmin of the voltage variety between each applying voltage of applying same segment electrode can be made larger.As a comparison, if different from a mode of the present application, by the voltage minimum change between each applying voltage of N level when forming the first electrode with unitary electrode compared with Δ V1min, then obviously, Δ V1min< Δ Vkmin sets up.Like this, if can guarantee that the minimum change of voltage is very large, even if then make slightly to change the applying voltage of segment electrode because depending on the noise of power supply variation or environment etc., gap variation also can diminish.That is, diminish to the sensitivity of noise, in other words, namely voltage sensitivity diminishes.Like this, just can realize high-precision clearance control, not necessarily need to carry out FEEDBACK CONTROL to gap as patent documentation 1.In addition, even if carried out FEEDBACK CONTROL to gap, due to little to the sensitivity of noise, therefore also can make it stable as soon as possible.
(6) in a mode of the present invention, can be set to, above-mentioned first electrode to be split in electrical resistance independently at least K (K is the integer of more than 2) individual segment electrode, above-mentioned second electrode is the public electrode being in same potential, an above-mentioned K segment electrode at least has first, second segment electrode, this first, second segment electrode comprises the ring electrode portion configured with concentric annular by the center relative to above-mentioned first reflectance coating respectively, above-mentioned first paragraph electrode is configured at the inner circumferential side of above-mentioned second segment electrode.
Like this, each electrode of first, second segment electrode configures symmetrically relative to the longitudinal centre line formation line of first, second reflectance coating.Thus, by acting on Variable driving force (electrostatic attraction) centered by first, second reflectance coating symmetrically, first, second reflectance coating just can make Variable therebetween while keeping parallelism degree.
(7) in a mode of the present invention, can be set to, the first lead-out wiring is connected with at above-mentioned first paragraph electrode place, in above-mentioned second segment electrode, be provided with discontinuous first slit in above-mentioned ring electrode portion making above-mentioned second segment electrode, above-mentioned first lead-out wiring is through above-mentioned first slit and draws to the foreign side of above-mentioned second segment electrode.
Like this, when first, second segment electrode is set to ring electrode portion respectively, the first slit in the second segment electrode being formed at outside can be utilized, guarantee the taking-up path of the first lead-out wiring of the first paragraph electrode of inner side.
(8) in a mode of the present invention, can be set to, above-mentioned second electrode be configured in the above-mentioned second substrate conjugated relative to above-mentioned first substrate has the 3rd, the 4th segment electrode, three, the 4th segment electrode comprises the ring electrode portion configured with concentric annular relative to the center of above-mentioned second reflectance coating respectively, above-mentioned 3rd segment electrode and above-mentioned first paragraph electrode contraposition, above-mentioned 4th segment electrode and above-mentioned second segment electrode contraposition, and be electrically connected between the 3rd, the 4th segment electrode.
Like this, because the electrode area be formed in movable second substrate is reduced into minimum required limit, therefore the rigidity of second substrate reduces, and can guarantee to bend easiness.
(9), in a mode of the present invention, the above-mentioned ring electrode portion of above-mentioned 4th segment electrode can be formed continuously in the position opposed with above-mentioned first slit.Owing to configuring the first lead-out wiring in this first slit, the electrostatic attraction acted on and between first lead-out wiring of first paragraph electrode same potential of inner side and the 4th segment electrode in outside therefore can be produced in the first slit.As its advantage, such as, when with first, second segment electrode of voltage driven identical in fact, impartial electrostatic attraction can be produced in the roughly all-round of the 4th segment electrode in outside.
(10) also can replace, also there is in the position opposed with above-mentioned first slit discontinuous second slit in above-mentioned ring electrode portion making above-mentioned 4th segment electrode.Like this, just there is not the electrode opposed with the first lead-out wiring.Thus, such as, when only driving the first paragraph electrode of inner side, can stop to produce in the first slit to act on and the first paragraph electrode of inner side is unwanted electrostatic attraction between the first lead-out wiring of same potential and the 4th segment electrode in outside.
(11), in a mode of the present invention, at least one party of first, second substrate above-mentioned can be set to and there is first and second cornerwise rectangular substrate.In this situation, when above-mentioned first lead-out wiring is set to first direction along the direction that above-mentioned first diagonal line extends out from above-mentioned first paragraph electrode, be connected with at above-mentioned second segment electrode place and be in above-mentioned first direction the second lead-out wiring that rightabout second direction extends on above-mentioned first diagonal line, the above-mentioned 3rd, 4th segment electrode place is connected with connecting between two electrodes along the 3rd lead-out wiring that above-mentioned second cornerwise third direction extends, the above-mentioned 3rd, 4th segment electrode place is connected with connecting between two electrodes and is being in above-mentioned third direction the 4th lead-out wiring that rightabout fourth direction extends on above-mentioned second diagonal line, when overlooking, the position of the corner of above-mentioned rectangular substrate is provided with the first ~ four connecting electrode portion that above-mentioned first ~ four lead-out wiring is connected.
Like this, would not have and be formed at first, second lead-out wiring in first substrate and the situation being formed at the 3rd in second substrate, the 4th lead-out wiring superposes when overlooking, can not parallel pole be formed.Thus, meaningless electrostatic attraction would not be produced between first, second lead-out wiring and the 3rd, the 4th lead-out wiring, also can not have meaningless electric capacity.In addition, the length of arrangement wire being extended down to the first ~ four lead-out wiring in the first ~ four connecting electrode portion respectively can become the shortest.Thus, routing resistance and the wiring capacitance of the first ~ four lead-out wiring diminish, can by the first ~ four segment electrode discharge and recharge at high speed.
(12), in a mode of the present invention, the ring width of above-mentioned second segment electrode can be made to be greater than the ring width of above-mentioned first paragraph electrode.
Due to electrostatic attraction and electrode area in direct ratio, therefore can increase the electrostatic attraction utilizing second segment electrode to produce.This is because the electrostatic attraction produced by the second segment electrode in outside is required to be greater than the electrostatic attraction produced by the first paragraph electrode of inner side.
(13), in a mode of the present invention, can be set to, be configured at the surrounding in above-mentioned 2-1 face when above-mentioned second face of above-mentioned first substrate comprises 2-1 face and overlooks and have the 2-2 face of ladder difference with above-mentioned 2-1 mask,
Above-mentioned first paragraph electrode is configured in above-mentioned 2-1 face, above-mentioned second segment electrode is configured in above-mentioned 2-2 face, makes the primary clearance between above-mentioned second segment electrode from above-mentioned second electrode different with the primary clearance between above-mentioned first paragraph electrode and above-mentioned second electrode.
Here, if 2-1 face is with 2-2 face flush and the initial value in each gap is identical, then in the middle of first, second segment electrode, the interelectrode gap of driven side will be larger than the interelectrode gap of driven side afterwards at first.This is because, reduce together with the interelectrode gap of driven side and the interelectrode gap of driven side at first afterwards.Thus, for a driven side at first in the middle of first, second segment electrode, compared with a driven side afterwards, just must because primary clearance is large by too much for the setting of initial electrostatic attraction.If make the initial value of each interelectrode gap different, just this disadvantage can be overcome.
(14), in a mode of the present invention, can be set to, the primary clearance between above-mentioned first paragraph electrode and above-mentioned second electrode is less than the primary clearance between above-mentioned first paragraph electrode and above-mentioned second electrode.
As described later, drive the second segment electrode in outside at first advantageously, corresponding with it, the primary clearance between second segment electrode and the second electrode can be reduced.
(15) in a mode of the present invention, can be set to, also there is the potential difference (PD) control part of each potential difference (PD) between each electrode and above-mentioned second electrode controlling an above-mentioned K segment electrode, above-mentioned potential difference (PD) control part applies the magnitude of voltage to each electrode setting of an above-mentioned K segment electrode to each electrode of an above-mentioned K segment electrode, by first potential difference (PD) of above-mentioned each potential difference (PD) from each electrode setting to an above-mentioned K segment electrode, switch to second potential difference (PD) larger than above-mentioned first potential difference (PD), three potential difference (PD) larger than above-mentioned second potential difference (PD) respectively.
Like this, potential difference (PD) control part, by each potential difference (PD) between each electrode of K segment electrode and the second electrode, according to the mode making this potential difference (PD) become large successively, at least switches to the potential difference (PD) of 3 values.Like this, at least with 3 × K level, the Variable between first, second reflectance coating can be made and makes through peak wavelength variable.In other words, to the first potential difference (PD) of each electrode setting by K segment electrode, the second potential difference (PD) and the 3rd potential difference (PD) in order to each gap obtained between each first, second reflectance coating through peak wavelength needed for realization determines.
Here, such as when switching to first potential difference (PD) less than the second potential difference (PD) from the second potential difference (PD), then due to electrostatic attraction when recuperability during the second potential difference (PD) is greater than the first potential difference (PD), therefore caused by the generation of toning (overshoot) etc. the time of the decay free vibration of substrate will be elongated, thus Wavelength variable action rapidly cannot be implemented.In contrast, because potential difference (PD) control part can be switched to second potential difference (PD) larger than the first potential difference (PD) from the first potential difference (PD), then be switched to the 3rd potential difference (PD) larger than the second potential difference (PD), therefore can suppress the decay free vibration of substrate, thus Wavelength variable action rapidly can be implemented.
(16) in a mode of the present invention, can be set to, also there is the inner circumferential side potential difference (PD) controlled respectively between above-mentioned first paragraph electrode and above-mentioned second electrode, the potential difference (PD) control part of the outer circumferential side potential difference (PD) between above-mentioned second segment electrode and above-mentioned second electrode, above-mentioned potential difference (PD) control part is to above-mentioned first, each electrode of second segment electrode applies by above-mentioned first, the magnitude of voltage of each electrode setting of second segment electrode, can by above-mentioned inner circumferential side potential difference (PD) and above-mentioned outer circumferential side potential difference (PD) from by above-mentioned first, first potential difference (PD) of each electrode setting of second segment electrode, switch to second potential difference (PD) larger than above-mentioned first potential difference (PD) respectively, three potential difference (PD) larger than above-mentioned second potential difference (PD).
Like this, by controlling the magnitude of voltage applied first, second segment electrode adjacent inside and outside in the middle of K segment electrode, each potential difference (PD) of inner circumferential side potential difference (PD) and outer circumferential side potential difference (PD) is just made this potential difference (PD) become successively greatly, at least switches to the potential difference (PD) of 3 values.
(17) in a mode of the present invention, can be set to, above-mentioned potential difference (PD) control part is when being set to above-mentioned first potential difference (PD) by above-mentioned inner circumferential side potential difference (PD), first paragraph voltage is applied to above-mentioned first paragraph electrode, when above-mentioned inner circumferential side potential difference (PD) is set to above-mentioned second potential difference (PD), second segment voltage is applied, when above-mentioned inner circumferential side potential difference (PD) is set to above-mentioned 3rd potential difference (PD) to above-mentioned first paragraph electrode, 3rd section of voltage is applied to above-mentioned first paragraph electrode
When above-mentioned outer circumferential side potential difference (PD) is set to above-mentioned first potential difference (PD), 4th section of voltage is applied to above-mentioned second segment electrode, when above-mentioned outer circumferential side potential difference (PD) is set to above-mentioned second potential difference (PD), 5th section of voltage is applied to above-mentioned second segment electrode, when above-mentioned outer circumferential side potential difference (PD) is set to above-mentioned 3rd potential difference (PD), the 6th section of voltage is applied to above-mentioned second segment electrode.
Like this, each potential difference (PD) of inner circumferential side potential difference (PD) and outer circumferential side potential difference (PD) is set as respectively by each electrode setting of first, second segment electrode the first ~ three potential difference (PD) (that is, the first ~ three potential difference (PD), respectively equal with the first ~ three potential difference (PD) as outer circumferential side potential difference (PD) so long as not as inner circumferential side potential difference (PD)) time, respectively the first ~ three section of voltage is applied to first paragraph electrode, the four ~ six section of voltage is applied to second segment electrode.Determine based on the inner circumferential side and outer circumferential side potential difference (PD) for obtaining each gap that can realize between required each first, second reflectance coating through peak wavelength to the applying voltage of first, second segment electrode.
(18) in a mode of the present invention, can be set to, for each potential difference (PD) of above-mentioned inner circumferential side potential difference (PD) and above-mentioned outer circumferential side potential difference (PD), the absolute value of the difference of above-mentioned second potential difference (PD) and above-mentioned 3rd potential difference (PD) is made to be less than the absolute value of the difference of above-mentioned first potential difference (PD) and above-mentioned second potential difference (PD).
Electrostatic attraction and potential difference (PD) square in direct ratio.So, on the direction that potential difference (PD) becomes large, when switching to the first potential difference (PD), the second potential difference (PD), the 3rd potential difference (PD), when the absolute value of the first potential difference (PD) and the difference of the second potential difference (PD) is identical with the difference of the absolute value of the second potential difference (PD) and the 3rd potential difference (PD), electrostatic attraction will increase sharp, becomes the reason causing toning.So, make the absolute value of the difference of the second potential difference (PD) and the 3rd potential difference (PD) be less than the absolute value of the difference of the first potential difference (PD) and the second potential difference (PD).Like this, the increase sharply of electrostatic attraction when just can suppress gap turn narrow, can suppress toning further, can realize Wavelength variable action more rapidly.And, the size of the absolute value of the difference between each potential difference (PD) be to depend on for first, second reflectance coating of required mensuration wavelength between the size in gap, drawer at movable side substrate rigidity, determine corresponding to the substrate area in the region of first, second reflectance coating or substrate thickness etc.
(19) in a mode of the present invention, can be set to, for each potential difference (PD) of above-mentioned inner circumferential side potential difference (PD) and above-mentioned outer circumferential side potential difference (PD), grow during being set as above-mentioned first potential difference (PD) during making to be set as above-mentioned second potential difference (PD), grow during being set as above-mentioned second potential difference (PD) during making to be set as above-mentioned 3rd potential difference (PD).
Due to when being set to second potential difference (PD) larger than the first potential difference (PD), or when being set to three potential difference (PD) larger than the second potential difference (PD), the recuperability of substrate also can become large, therefore has substrate and reaches static time elongated situation.That is, the gap had between first, second reflectance coating be stable at constant position before time elongated situation.Be directed to this, grow during being set as the first potential difference (PD) during making to be set as the second potential difference (PD), grow during being set as the second potential difference (PD) during making to be set as the 3rd potential difference (PD), gap just can be made to be stable at setting.And, the length during voltage applies be to depend on for first, second reflectance coating of required mensuration wavelength between the size in gap, drawer at movable side substrate rigidity, determine corresponding to the substrate area in the region of first, second reflectance coating or substrate thickness etc.
(20) in a mode of the present invention, can be set to, when above-mentioned outer circumferential side potential difference (PD) is set as above-mentioned first potential difference (PD) by above-mentioned potential difference (PD) control part, between above-mentioned first reflectance coating and above-mentioned second reflectance coating, be set to the first interval,
When above-mentioned outer circumferential side potential difference (PD) is set as above-mentioned second potential difference (PD) by above-mentioned potential difference (PD) control part, between above-mentioned first reflectance coating and above-mentioned second reflectance coating, be set to second interval less than above-mentioned first interval,
When above-mentioned outer circumferential side potential difference (PD) is set as above-mentioned 3rd potential difference (PD) by above-mentioned potential difference (PD) control part, between above-mentioned first reflectance coating and above-mentioned second reflectance coating, be set to three interval less than above-mentioned second interval,
The absolute value of the difference at above-mentioned first interval and above-mentioned second interval is set as equal with the absolute value of difference at above-mentioned second interval and above-mentioned 3rd interval.
Like this, by make the size in the gap between first, second reflectance coating successively constriction a certain amount of be changed to the first interval, the second interval and the 3rd interval, also successively shorten with certain value through peak wavelength.
(21) in a mode of the present invention, can be set to, above-mentioned outer circumferential side potential difference brought is above-mentioned 3rd potential difference (PD) and makes the potential difference (PD) change of above-mentioned inner circumferential side by above-mentioned potential difference (PD) control part,
When above-mentioned inner circumferential side potential difference (PD) is set as above-mentioned first potential difference (PD) by above-mentioned potential difference (PD) control part, between above-mentioned first reflectance coating and above-mentioned second reflectance coating, be set to the 4th interval,
When above-mentioned inner circumferential side potential difference (PD) is set as above-mentioned second potential difference (PD) by above-mentioned potential difference (PD) control part, between above-mentioned first reflectance coating and above-mentioned second reflectance coating, be set to five interval less than above-mentioned 4th interval,
When above-mentioned inner circumferential side potential difference (PD) is set as above-mentioned 3rd potential difference (PD) by above-mentioned potential difference (PD) control part, between above-mentioned first reflectance coating and above-mentioned second reflectance coating, be set to six interval less than above-mentioned 5th interval,
The absolute value of the difference at above-mentioned 4th interval and above-mentioned 5th interval is set as equal with the absolute value of difference at above-mentioned 5th interval and above-mentioned 6th interval.
Like this, by being that the 3rd potential difference (PD) makes inner circumferential side potential difference (PD) be changed to the first ~ three potential difference (PD) by outer circumferential side potential difference brought, just can make the size in the gap between first, second reflectance coating successively constriction be changed to four interval less than the 3rd interval, the 5th interval and the 6th interval a certain amount ofly, also can successively shorten with certain value through peak wavelength thus.
And for the size in the gap between first, second reflectance coating, compared with outer circumferential side potential difference (PD), the impact based on the electrostatic attraction of inner circumferential side potential difference (PD) is larger.Like this, after first making inner circumferential side potential difference (PD) change, even if while inner circumferential side potential difference brought is certain value, outer circumferential side potential difference (PD) is changed, because the electrostatic attraction caused by the potential difference (PD) of inner circumferential side is overriding, the gap thus between first, second reflectance coating also can not change as outer circumferential side potential difference (PD).So, after first making outer circumferential side potential difference (PD) change, while outer circumferential side potential difference brought is certain value, make inner circumferential side potential difference (PD) change.
(22) in a mode of the present invention, can be set to, above-mentioned outer circumferential side potential difference brought, after above-mentioned 3rd potential difference (PD) as above-mentioned outer circumferential side potential difference (PD) reaches outer circumferential side maximum potential difference, is that above-mentioned outer circumferential side maximum potential difference makes the potential difference (PD) change of above-mentioned inner circumferential side by above-mentioned potential difference (PD) control part.
Like this, just can from the gap between first, second reflectance coating set with outer circumferential side maximum potential difference, the applying of recycling inner circumferential side potential difference (PD) realizes the gap change of 1 step.And due to after the potential difference (PD) of applying inner circumferential side, outer circumferential side has reached maximum outer circumferential side potential difference (PD), therefore just does not need to make outer circumferential side potential difference (PD) change.Like this owing to not needing to make outer circumferential side potential difference (PD) change after making inner circumferential side potential difference (PD) change, the harmful effect of the overriding electrostatic attraction when making outer circumferential side potential difference (PD) change caused by the potential difference (PD) of inner circumferential side therefore can be eliminated.
(23) in a mode of the present invention, can be set to, at above-mentioned potential difference (PD) control part using when being set as inner circumferential side maximum potential difference as above-mentioned 3rd potential difference (PD) of above-mentioned inner circumferential side potential difference (PD), be set to minimum interval between above-mentioned first reflectance coating and above-mentioned second reflectance coating, each potential difference (PD) of above-mentioned outer circumferential side maximum potential difference and above-mentioned inner circumferential side maximum potential difference can be made equal in fact in the scope being no more than the maximum voltage supplied to above-mentioned potential difference (PD) control part.
Like this, due to for executing each voltage alive to first, second segment electrode, the maximum voltage supplied can be distributed as full scale, above-mentioned voltage minimum change therefore can be made larger than ever to potential difference (PD) control part.Thus, the sensitivity to noise can just be reduced.
(24) in a mode of the present invention, can be set to, above-mentioned potential difference (PD) control part passes through to apply voltage successively to each electrode of an above-mentioned K segment electrode, and to amount to the variable spaced that N level makes above-mentioned first reflectance coating and above-mentioned second reflectance coating,
When the minimum value of the voltage variety between each applying voltage applied to the same segment electrode in an above-mentioned K segment electrode is set to Δ Vkmin, compared with the voltage minimum change Δ V1min between each applying voltage of N level when forming above-mentioned first electrode with unitary electrode, Δ V1min< Δ Vkmin is set up.Thus, as implied above, the sensitivity to noise can be reduced.
(25) another mode of the present invention defines a kind of analytical equipment comprising above-mentioned optical filter.As this kind of analytical equipment, can by make by analyzed object reflection, absorption, through or the light that sends inject wavelength variable optical filter, utilize photo detector reception through the light of each wavelength of optical filter, utilize computing circuit computing from the signal of photo detector, just can measurement example as the intensity of each wavelength, analyze color, being mixed in gas graded.
(26) another mode of the present invention defines a kind of light device comprising above-mentioned optical filter.As this kind of light device, such as, can enumerate the transmitter of the optical multiplexing communication system such as Optical Code Division Multiplexing (OCDM:OpticalCodeDivisionMultiplexing) or Wave division multiplexing (WDM:WavelengthDivisionMultiplexing).In WDM, the wavelength of the light pulse forming light pulse signal is utilized to identify passage.OCDM utilizes by the Model Comparison of light pulse signal that encodes to identify passage, and the light pulse forming light pulse signal comprises the light component of different wavelength.Thus, in the transmitter of optical multiplexing communication system, just need the light using multiple wavelength, if use the optical filter of a mode of the present invention, just can obtain the light of multiple wavelength from the light from single light source.
Accompanying drawing explanation
Fig. 1 is the sectional view not applying voltage status of the optical filter representing one embodiment of the present of invention.
Fig. 2 is the sectional view of the applying voltage status representing the optical filter shown in Fig. 1.
Fig. 3 is the performance plot of the relation representing electrostatic attraction and interelectrode gap.
Fig. 4 (A) is the vertical view of the second electrode, and Fig. 4 (B) is the vertical view of the first electrode.
Fig. 5 (A) (B) is the vertical view of the overlap condition of first, second electrode seen from second substrate side.
Fig. 6 represents from second substrate side perspective second substrate the vertical view that the wiring of the first ~ four lead-out wiring is arranged.
Fig. 7 is the applying voltage control system block diagram of optical filter.
Fig. 8 is the performance plot of the example representing voltage table data.
Fig. 9 be according to voltage table data realize execute alive sequential chart.
Figure 10 be represent optical filter first, second reflectance coating between gap and the performance plot through the relation of peak wavelength.
Figure 11 is the performance plot of the relation representing first, second interelectrode potential difference (PD) and electrostatic attraction.
Figure 12 is the performance plot of the data of the embodiment represented about the potential difference (PD) shown in Fig. 8, gap and variable wavelength.
Figure 13 is the performance plot of the relation representing the applying voltage shown in Figure 12 and gap.
Figure 14 represents the applying voltage shown in Figure 12 and the performance plot through the relation of peak wavelength.
Figure 15 (A) (B) is the vertical view of first, second electrode representing comparative example.
Figure 16 is the performance plot of the data of the comparative example represented about potential difference (PD), gap and variable wavelength.
Figure 17 is the performance plot of the relation representing the applying voltage shown in Figure 16 and gap.
Figure 18 represents the applying voltage shown in Figure 16 and the performance plot through the relation of peak wavelength.
Figure 19 is the sectional view not applying voltage status of the optical filter representing another embodiment of the invention.
Figure 20 is the block diagram of the analytical equipment as another embodiment of the invention.
Figure 21 is the process flow diagram of the spectral photometry action represented in the device shown in Figure 20.
Figure 22 is the block diagram of the light device as another embodiment of the invention.
Figure 23 is the sectional view of the optical filter of the another embodiment of the invention being provided with ladder difference in movable substrate.
Figure 24 is the sectional view of the optical filter of the another embodiment of the invention being provided with ladder difference in first, second substrate both sides.
Symbol description in figure: wherein, 10 optical filters, 20 first substrates, 20A first opposed faces, 20A1 first surface, 20A2 second, 20A21 2-1 face, 20A22 2-2 face, 22, 24 ladders are poor, 23 supports, 30 second substrates, 30A second opposed faces, 30A1 first surface, 30A2 second, 32 heavy sections, 34 thinner wall section, 38 ladders are poor, 40 first reflectance coatings, 50 second reflectance coatings, 60 first electrodes, 62 first paragraph electrodes, 62A first ring electrode, 62B first lead-out wiring, 64 second segment electrodes, 64A second ring electrode, 64B second lead-out wiring, 64C first slit, 70, 70 ' second electrode, 72 the 3rd segment electrodes, 72A the 3rd ring electrode, 74, 74 ' the 4th segment electrode, 74A, 74A ' the 4th ring electrode, 76A the 3rd lead-out wiring, 76B the 4th lead-out wiring, 78 second slits, 80 first Variable drive divisions (electrostatic actuator), 90 second Variable drive divisions (electrostatic actuator), 101 ~ 104 the first ~ four external connecting electrodes, 110 potential difference (PD) control parts, 112 first paragraph drive divisions, 114 second segment drive divisions, 116 digital control portions, 120 power supplys, 200 analytical equipments (colour examining device), 300 light devices, G1 first gap, G2 second gap, L center line, Δ Vseg1 inner circumferential side potential difference (PD), Δ Vseg2 outer circumferential side potential difference (PD), W1, W2 ring width.
Embodiment
Below, be preferred embodiment described in detail to of the present invention.And the mode that the present embodiment below illustrated not limits undeservedly to the content of the present invention recorded in the scope of technical scheme, all formations illustrated in present embodiment not necessarily must be used as solution route of the present invention.
1. optical filter
1.1. the filtering part of optical filter
1.1.1. the summary of filtering part
Fig. 1 is the sectional view not applying voltage status of the optical filter 10 of present embodiment, and Fig. 2 is the sectional view applying voltage status.Optical filter 10 shown in Fig. 1 and Fig. 2 comprises first substrate 20, the second substrate 30 opposed with first substrate 20.In present embodiment, first substrate 20 is set to fixing base, second substrate 30 is set to movable substrate or barrier film, as long as but either or both is movable.
In present embodiment, be such as integrally formed with first substrate 20 support 23 movably supported by second substrate 30.Support 20 both can be located in second substrate 30, also can be formed independently with first, second substrate 20,30.
First, second substrate 20,30 is such as formed by various glass or crystals etc. such as soda-lime glass, crystallinity glass, quartz glass, lead glass, potash glass, borate glass, alkali-free glasss respectively.In the middle of them, as the constituent material of each substrate 20,30, such as preferably containing the alkali-metal glass such as sodium (Na) or potassium (K), by utilizing this glass to form each substrate 20,30, just can improve reflectance coating described later 40,50, bond strength between each electrode 60,70 between closely bonding property, substrate.In addition, the joints such as the surface activation joint of plasma polymerization film are such as employed by being utilized by these 2 substrates 20,30, and by its integration.First, second substrate 20,30 is made into be such as on one side the square of 10mm separately, and the maximum gauge of the part played a role as barrier film is such as 5mm.
First substrate 20 is such as that 500 μm of glass baseplates formed are formed by utilizing etching to process thickness.In the first surface 20A1 of the central authorities of first substrate 20 in the first opposed faces 20A opposed with second substrate 30, be formed with the first such as circular reflectance coating 40.Similarly, second substrate 30 is formed with thickness such as 200 μm glass baseplates formed by utilizing etching to process.Second substrate 30, at the middle position of the second opposed faces 30A opposed with first substrate 20, is formed with such as circular second reflectance coating 50 opposed with the first reflectance coating 40.
And first, second reflectance coating 40,50 is such as formed by the circle being about 3mm with diameter.This first, second reflectance coating 40,50 is the reflectance coatings utilizing AgC individual layer to be formed, and the methods such as sputtering can be utilized to be formed in first, second substrate 20,30.The thickness size of AgC individual layer reflectance coating is such as by with 0.03 μm of formation.In present embodiment, as first, second reflectance coating 40,50, provide and use and by the example of the reflectance coating of the AgC individual layer of visible ray Zone Full light splitting, but can be not limited thereto, also following multilayer dielectric film can be used, although that is, can the wavelength region may of light splitting narrow, but compared with AgC individual layer reflectance coating, the transmitance of the light be split is large, the half breadth of transmitance is also narrow, and resolution is good, such as, be by TiO
2with SiO
2stacked film to be laminated.
In addition, with the face of first, second opposed faces 20A of first, second substrate 20,30,30A opposite side, not shown antireflection film (AR) can formed with first, second reflectance coating 40,50 corresponding positions.This antireflection film by by low refractive index film and high refractive index film alternatively stacked and formed, make the reflectance reduction of the visible ray in the interface of first, second substrate 20,30, transmitance increased.
These first, second reflectance coatings 40,50 are not applying under voltage status by arranged opposite across the first clearance G 1 shown in Fig. 1.And, in present embodiment, first reflectance coating 40 is set to fixed mirror, the second reflectance coating 50 is set to movable mirror, but also accordingly the either or both in first, second reflectance coating 40,50 can be set to movably with the mode of first, second above-mentioned substrate 20,30.
Position when overlooking around the first reflectance coating 40, and in the second opposed faces 20A2 around the first opposed faces 20A1 of first substrate 20, such as, be formed with the first electrode 60.Similarly, in the opposed faces 30A of second substrate 30, be provided with the second electrode 70 oppositely with the first electrode 60.First electrode 60 and the second electrode 70 are by arranged opposite across the second clearance G 2.And, the surface dielectric film of first, second electrode 60,70 can be covered.
In present embodiment, the first substrate 20 first opposed faces 20A opposed with second substrate 30 has: be formed with the first surface 20A1 of the first reflectance coating 40, be configured at the surrounding of first surface 20A1 when overlooking and be formed with second 20A2 of the first electrode 60.First surface 20A1 and second 20A2 is not the same face, has ladder and differ from 22 between first surface 20A1 and second 20A2, is set in a side of first surface 20A1 than the position of second 20A2 closer to second substrate 30.Like this, under the initial value under the non-applying state of voltage, namely set up the relation of the first clearance G 1< second clearance G 2.
Here, according to above-mentioned formula (1), the clearance G (the second clearance G 2) between electrostatic attraction F and first, second electrode 60,70 square inversely proportional.By shown in Figure 3 for the relation table of the variation delta G of the clearance G between the variation delta F of electrostatic attraction F and first, second electrode 60,70.In Fig. 3, indicate the gap variation delta G2 (=Δ G1) in the region that the gap variation delta G1 in the region that interelectrode gap G is little, interelectrode gap G are large.In the region that interelectrode gap G is little, as long as gap changes with gap variation delta G1, then electrostatic attraction F will changes delta F1 significantly.Different with it, in the region that interelectrode gap G is large, even if change with the gap variation delta G2 identical with gap variation delta G1, the variable quantity of electrostatic attraction F is also smaller Δ F2.
Like this, in the region that interelectrode gap G is narrow, as long as gap changes minutely, electrostatic attraction F will change sharp, thus the extremely difficult clearance control realized for obtaining stable electrostatic attraction F.Different with it, in the region that interelectrode gap G is wider, electrostatic attraction F is little relative to the change of gap change unit quantity.It can thus be appreciated that the side in the smooth region (region that interelectrode gap G is wider) that the change of the electrostatic attraction F in the middle of the F-G family curve employing Fig. 3 is little more easily to utilize between voltage clearance G to control the size of electrostatic attraction F.
On the other hand, variable wavelength object be such as 380 ~ 700nm as described later through wavelength range, the first clearance G 1 between first, second reflectance coating 40,50 is little of 140 ~ 300nm.So, as shown in Figure 1, be set as the first clearance G 1< second clearance G 2, the size of electrostatic attraction F is easily controlled.
First electrode 60 to be such as split in electrical resistance independently at least K (K is the integer of more than 2) individual segment electrode, has first, second electrode 62,64 in present embodiment as the example of K=2.That is, K segment electrode 62,64 can be set as different voltage respectively, and on the other hand, the second electrode 30 is the public electrodes being in same potential.And, when K >=3, the relation be described as follows can be applicable to adjacent any 2 segment electrodes for first, second electrode 62,64.And the present invention is not limited to the first electrode 60 to be divided into K segment electrode.For not by the embodiment that the first electrode 60 is split, describe in Figure 15 ~ Figure 18 below.
For the optical filter 10 of this structure, the region being formed with reflectance coating (first, second reflectance coating 40,50) together from first, second substrate 20,30 and the region being formed with electrode (first, second electrode 60,70) become different regions when overlooking, do not have the situation that reflectance coating and electrode as patent documentation 1 are stacked.Thus, even if at least one party's (being second substrate 30 in present embodiment) of first, second substrate 20,30 is set to movable substrate, because reflectance coating and electrode are not stacked, therefore movable substrate also can be guaranteed to bend easiness.And, different from patent documentation 1, owing to not forming reflectance coating on first, second electrode 60,70, even if therefore utilize the optical filter 10 as infiltration type or reflection-type variable-wavelength interference filter, the restriction first, second electrode 60,70 being set to transparency electrode also can not be there is.And, even transparency electrode also can impact through characteristic, therefore by not forming reflectance coating on first, second electrode 60,70, the optical filter 10 as infiltration type variable-wavelength interference filter can obtain required through or reflection characteristic.
In addition, in this optical filter 10, by applying common electric voltage (such as ground voltage) to the second electrode 70 of the surrounding being configured at the second reflectance coating 50 when overlooking, independently voltage is applied separately to K the segment electrode 62,64 of formation first electrode 60 of the surrounding being configured at the first reflectance coating 40 when overlooking, as illustrated in fig. 2 at electrostatic attraction F1, F2 that opposite electrode intercropping represents in order to arrow, the first clearance G 1 between first, second reflectance coating 40,50 just can be made variable according to the mode reaching the gap less than the size of primary clearance.
That is, as represented, voltage applies shown in Fig. 2 of the optical filter 10 of state, and the first Variable drive division (electrostatic actuator) 80 be made up of first paragraph electrode 62 and the second opposed with it electrode 70, the second Variable drive division (electrostatic actuator) 90 be made up of second segment electrode 64 and the second opposed with it electrode 70 are driven independently of one another.
Like this, independently multiple (K) Variable drive division 80,90 of the surrounding of first, second reflectance coating 40,50 is only configured at when overlooking by having, just by making the size to the voltage that K segment electrode 62,64 applies, central in order to apply these 2 Parameters variation of segment electrode number that voltage is selected from K segment electrode 62,64, the size in the gap between first, second reflectance coating 40,50 can be controlled.
If as patent documentation 1, parameter is only the kind of voltage, be then difficult to large gap movable range and taken into account relative to the muting sensitivity of the variation in voltage caused by noise etc.By as present embodiment, add the parameter that number of electrodes is such, just can by by be only applied to each segment electrode by the applying voltage range that voltage-controlled situation is identical, and in large gap movable range, produce the electrostatic attraction of having finely tuned further, carry out meticulous gap adjustment.
Here, alive maximal value will be executed and be set to Vmax, gap will be set to N level variable.When the first electrode 60 is not split into multiple, need maximum voltage Vmax to split N part to distribute applying voltage.Now, the minimum value of the voltage variety between different applying voltage is set to Δ V1min.On the other hand, in present embodiment, as long as maximum voltage Vmax carried out (N/K) segmentation fifty-fifty to the applying voltage of each electrode of K segment electrode and distribute.Now, for each electrode of K segment electrode, the minimum value of the voltage variety between the different applying voltage be applied on same segment electrode is set to Δ Vkmin.In this situation, obviously, Δ V1min< Δ Vkmin sets up.
Like this, if can guarantee that voltage minimum change Δ Vkmin is comparatively large, even if then make slightly to change the applying voltage of K first, second electrode 62,64 because depending on the noise of power supply variation or environment etc., gap variation also can diminish.That is, the sensitivity for noise is little, and in other words, voltage sensitivity diminishes.Like this, just can realize high-precision clearance control, not necessarily need to carry out FEEDBACK CONTROL to gap as patent documentation 1.In addition, even if carried out FEEDBACK CONTROL to gap, because the sensitivity for noise is little, therefore also can make it stable soon.
In present embodiment, be set to non-driven region by the region of first, second reflectance coating 40,50 by center side, be set to drive area by around it, maintain the depth of parallelism of first, second reflectance coating 40,50.It is important technology essential factor that the depth of parallelism of first, second reflectance coating 40,50 utilizes for carrying out multipath reflection between first, second reflectance coating 40,50 the Fabry Perot type interference filter of interfering and making not need the optical attenuation of wavelength.
In present embodiment, in order to ensure the flexibility of the second substrate 30 as movable substrate, as shown in Figure 1, the region being formed with the second electrode 70 is set to the thinner wall section 34 that such as gauge is about 50 μm.This thinner wall section 34 is formed by with the wall thickness thinner than the heavy section 32 in region and the heavy section 36 in region that contacts with support 23 that are configured with the second reflectance coating 40.In other words, the second opposed faces 30A being formed with the second reflectance coating 40 and the second electrode 70 of second substrate 30 is tabular surfaces, in the first area being configured with the second reflectance coating 40, form heavy section 32, in the second area being formed with the second electrode 70, form thinner wall section 34.Like this, by while guaranteeing flexibility by thinner wall section 34, make heavy section 32 be difficult to flexure, the second reflectance coating 40 makes Variable with just can keeping flatness.To describe later for the example arranging ladder or arrange heavy section partly in second substrate 30.
And, in present embodiment, although independently multiple (K) Variable drive division formed with the electrostatic actuator be made up of pair of electrodes respectively, but also they at least one can be replaced into other the actuator such as piezoelectric element.But provide the interference of the electrostatic actuator of attractive force between multiple Variable drive divisions few non-contactly, be suitable in control gap accurately.Unlike this, such as when 2 piezoelectric elements are configured between first, second substrate 20,30, the piezoelectric element do not driven being produced and become the situation hindering the gap displacement caused by other the piezoelectric element that drive, bringing disadvantage for driving independently the mode of multiple Variable drive division.Consider from this point, preferably multiple Variable drive division electrostatic actuator is formed.
1.1.2. the first electrode
Form K the segment electrode 62,64 of the first electrode 60 as shown in Fig. 4 (A), can configure with concentric annular relative to the center of the first reflectance coating 40.That is, first paragraph electrode 62 has the first ring-type electrode section 62A, and second segment electrode 64 has the second ring electrode portion 64A in the outside of ring electrode portion 62A, and each ring electrode portion 62A, 64A are formed with concentric annular by relative to the first reflectance coating.And so-called " ring-type " is following term, that is, be not limited to closed-loop, also comprise discontinuous ring-shaped, be not limited to circular rings, also comprise straight-flanked ring or polygon ring etc.
Like this, namely as shown in Figure 2, relative to the centre line L of the first reflectance coating 40, the balanced configuration of first, second segment electrode each self-forming line.Like this, act on symmetrically relative to centre line L 1 line of the first reflectance coating 40 owing to acting on electrostatic attraction F1, F2 between first, second electrode 60,70 when applying voltage, therefore the depth of parallelism of first, second reflectance coating 40,50 improves.
And, as shown in Fig. 4 (A), the ring width W2 of second segment electrode 64 wider than the ring width W1 of first paragraph electrode 62 (W2>W1) can be made.This is because, electrostatic attraction and electrode area in direct ratio, require that the electrostatic attraction F1 that the side Billy of electrostatic attraction F2 utilizing second segment electrode 64 to produce produces with first paragraph electrode 62 is large.More particularly, the second segment electrode 64 in outside is set as than first paragraph electrode 62 closer to playing most substrate supporting portion 23 as hinge part.Thus, second segment electrode 64 needs the large electrostatic attraction F2 producing the resistance overcome in hinge part 22.The second segment electrode 64 in outside is large with the first paragraph electrode 62 phase diameter group of inner side, even if width W 1=width W 2, the area of second segment electrode 64 is also larger.Thus, although also width W 1=width W 2 can be set to, but by widening ring width W2 further, just can area increased and produce large electrostatic attraction F2 further.Particularly, as aftermentioned, when the second segment electrode 64 in outside is first driven than the first paragraph electrode 62 of inner side, because the primary clearance G2 between second segment electrode 64 and the second electrode 70 is large, therefore produce the area of second segment electrode 64 can be increased large electrostatic attraction F2 in be also favourable.In this situation, when the driving of the first paragraph electrode 62 of inner side, as long as the driving condition of second segment electrode 64 is maintained, gap will diminish, even if the therefore little disadvantage also do not had in driving of the ring width W1 of first paragraph electrode 62.
Here, connect the first lead-out wiring 62B at first paragraph electrode 62 place respectively, connect the second extraction electrode 64B at second segment electrode 64 place.These first, second extraction electrodes 62B, 64B are such as formed extended at both sides towards radiation direction by the center from the first reflectance coating 40.Be provided with the discontinuous first slit 64C of the second ring electrode portion 64A making second segment electrode 64.The the first lead-out wiring 62B extended out from the first paragraph electrode 62 of inner side is through the first slit 64C in the second segment electrode 64 being formed at outside, and the outside to second segment electrode 64 is drawn.
Like this, when first, second electrode 62,64 is set to ring electrode portion 62A, 64A respectively, the first slit 64C in the second segment electrode 64 being formed at outside can be utilized, guarantee the taking-up path of the first lead-out wiring 62B of the first paragraph electrode 62 of inner side easily.
1.1.3. the second electrode
The second electrode 70 be configured in second substrate 30 can be formed at comprising in the region in the region opposed with the first electrode 60 (first, second segment electrode 62,64) be formed in first substrate 20 in second substrate 30 as ordinary electrode.This is because the second electrode 70 is the public electrodes being set to same voltage.
Also can be different with it, and as present embodiment, be set to K segment electrode by identical with the first electrode 60 for the second electrode 70 be configured in the second substrate 30 that conjugates relative to first substrate 20.This K segment electrode also can configure with concentric annular relative to the center of the second reflectance coating 50.At this moment, because the electrode area be formed in movable second substrate 30 is reduced into minimum required limit, therefore the rigidity step-down of second substrate 30, can guarantee to bend easiness.
K the segment electrode forming the second electrode 70 as shown in Figure 1, Figure 2 and shown in Fig. 4 (B), can have the 3rd segment electrode 72 and the 4th segment electrode 74.3rd segment electrode 72 has the 3rd ring electrode portion 72A, and the 4th segment electrode 74 has the 4th ring-type electrode section 74A in the outside of the 3rd ring electrode portion 62A, and each ring electrode portion 72A, 74A are formed with concentric annular by relative to the second reflectance coating.The meaning of " concentric annular " is identical with the situation for the first electrode 60.3rd segment electrode 72 is opposed with first paragraph electrode 62, and the 4th segment electrode 74 is opposed with second segment electrode 64.Like this, in present embodiment, the ring width (identical with the ring width W2 of second segment electrode 64) of the 4th segment electrode 74 is greater than the ring width (identical with the ring width W1 of first paragraph electrode 62) of the 3rd segment electrode 72.
In addition, also can be electrically connected between the 3rd, the 4th segment electrode 72,74, be set as same current potential.In this situation, the such as the 3rd, the 4th extraction electrode 76A, 76B be such as formed extended at both sides from the center of the second reflectance coating 50 towards radiation direction.Three, the 4th extraction electrode 76A, 76B is electrically connected by with the 3rd segment electrode 72 of inner side and the 4th segment electrode 74 both sides in outside separately.And the 3rd, the 4th segment electrode 72,74 as public electrode also can be utilized 1 extraction electrode and connect, but multiple by being set to by extraction electrode, just can reduce routing resistance, accelerates the charge/discharge rates of public electrode.
1.1.4. the overlapping region of first, second electrode
Fig. 5 (A) represents overlap condition during overlooking of first, second electrode 60,70 of the present embodiment seen from second substrate 30 side.In Fig. 5 (A), the first electrode 60 being positioned at downside, due to the 3rd, the 4th segment electrode 72,74 opposed of first, second segment electrode 62,64 and the second electrode, therefore can not manifest from overlooking viewed from second substrate 30 side.Be positioned at the first electrode of downside as shown in shade, only first, second lead-out wiring 62B, 64B is displaying from overlooking viewed from second substrate 30 side.First lead-out wiring 62B due to the 3rd ring electrode portion 74A of the second electrode 70 be continuous print at circumferencial direction, therefore zone line 62B1 is opposed with the opposed region 74A1 of the 3rd ring electrode portion 74A.
In present embodiment, as shown in Fig. 4 (A), the second segment electrode 64 in the outside in the first electrode 20, owing to having the first slit 64C, therefore can not act on the electrostatic attraction F2 (with reference to Fig. 2) based on the voltage applied second segment electrode 64 in the region of this slit 64C.
On the other hand, owing to being configured with the first lead-out wiring 62B in this first slit 64C as shown in Fig. 4 (A), therefore can producing in the first slit 64C and to act on and the first paragraph electrode 62 of inner side is electrostatic attraction F1 (with reference to Fig. 2) between the first lead-out wiring 62B of same potential and the 4th segment electrode 74 in outside.As its advantage, such as when first, second segment electrode 62,64 being used voltage driven identical in fact, impartial electrostatic attraction can be produced in roughly all-round (the comprising the opposed region 74A1 with the first slit 64C) of the 4th segment electrode 74 in outside.
Fig. 5 (B) represents overlap condition during overlooking of first, second electrode 60,70 ' as variation seen from second substrate 30 side.The aspect that second electrode 70 ' of Fig. 5 (B) is different from second electrode 70 of Fig. 5 (A) is, 4th segment electrode 74, in the opposed position of the first slit 64C with the first electrode 60, also has and makes discontinuous second slit 78 of the 4th ring-type electrode section 74A '.In remaining, second electrode 70 ' of Fig. 5 (B) is identical with second electrode 70 of Fig. 5 (A).
Like this, the electrode opposed with the first lead-out wiring 62B would not be there is.Thus, such as when driving the first paragraph electrode 62 of inner side, can stop to produce in the first slit 64C to act on and the first paragraph electrode 62 of inner side is unwanted electrostatic attraction between the first lead-out wiring 62B of same potential and the 4th segment electrode 74 ' in outside.
1.1.5. lead-out wiring
Fig. 6 is the vertical view from second substrate 30 side perspective second substrate 30, represents that the wiring of the first ~ four lead-out wiring 62B, 64B, 76A, 76B is arranged.In Fig. 6, at least one party of first, second substrate 20,30 is set as has first and second cornerwise rectangular substrate.In present embodiment, first, second substrate 20,30 is made into be such as the square of 10mm separately.When the first lead-out wiring 62B is set to first direction D1 along the direction that the first diagonal line extends out from first paragraph electrode 62A, then the second lead-out wiring 64B just extends along the second direction D2 becoming the direction contrary with first direction D1 on the first diagonal line.3rd lead-out wiring 76A is extending on second cornerwise third direction D3.4th lead-out wiring 76B extends along the fourth direction D4 becoming the direction contrary with third direction D3 on the second diagonal line.In addition, the position of the corner of rectangular substrate 20,30 when overlooking, is provided with the first ~ four connecting electrode portion 101 ~ 104 of connection the first ~ four lead-out wiring 62B, 64B, 76A, 76B.
Like this, first, be formed at first, second lead-out wiring 62B, 64B in first substrate 20 and be formed at the 3rd in second substrate 30, the 4th lead-out wiring 76A, 76B would not superpose when overlooking, and can not form parallel pole.Thus, be just difficult to produce meaningless electrostatic attraction between first, second lead-out wiring 62B, 64B and the 3rd, the 4th lead-out wiring 76A, 76B, in addition, meaningless electric capacity can be reduced.In addition, the length of arrangement wire being extended down to the first ~ four lead-out wiring 62B, 64B, 76A, the 76B in the first ~ four connecting electrode portion 101 ~ 104 respectively becomes the shortest.Like this, routing resistance and the wiring capacitance of the first ~ four lead-out wiring 62B, 64B, 76A, 76B will diminish, thus can by the first ~ four electrode 62,64,72,74 discharge and recharge at high speed.
And the first ~ four external connecting electrode portion 101 ~ 104 also respectively can arrange a part in the either or both of first, second substrate 20,30.When only arranging the first ~ four external connecting electrode portion 101 ~ 104 in any one party of first, second substrate 20,30, can electric conductivity paste etc. be utilized to be connected with the external connecting electrode portion in the substrate being formed at a side lead-out wiring be configured in the opposing party of first, second substrate 20,30.And the first ~ four external connecting electrode portion 101 ~ 104 is connected with outside by by connecting portions such as lead-in wire or wire-bonded.
In addition, the first ~ four lead-out wiring 62B, 64B, 76A, 76B also can intersect with the such as plasma polymerization film engaged by first, second substrate 20,30.Or, also can via be located at first, second substrate 20,30 composition surface a side in groove portion, the first ~ four lead-out wiring 62B, 64B, 76A, 76B is crossed composition surface and externally draws.
1.2. the voltage control system of optical filter
1.2.1. the summary of voltage control system module is applied
Fig. 7 is the applying voltage control system block diagram of optical filter 10.As shown in Figure 7, optical filter 10 has the potential difference (PD) control part 110 of the potential difference (PD) between control first electrode 60 and the second electrode 70.In present embodiment, because the second electrode 70 (the 3rd, the 4th segment electrode 72,74) as public electrode is fixed to certain common electric voltage, such as ground voltage (0V), therefore potential difference (PD) control part 110 makes the applying change in voltage of first, second segment electrode 62,64 to K the segment electrode as formation first electrode 60, controls the inner circumferential side potential difference (PD) Δ Vseg1 of first, second segment electrode 62,64 separately and between the second electrode 70 and outer circumferential side potential difference (PD) Δ Vseg2 respectively.And the second electrode 70 also can apply the common electric voltage beyond ground voltage, in this situation, potential difference (PD) control part 110 also can control the applying of common electric voltage/do not apply to the second electrode 70.
In Fig. 7, potential difference (PD) control part 110 comprises: the first paragraph electrode drive portion be connected with first paragraph electrode 62, such as the first digital-analog convertor (DAC1) 112; The second segment electrode drive portion be connected with second segment electrode 64, such as the second D/A digital-to-analog converter (DAC2) 114; They are controlled, such as, carries out numerically controlled digital control portion 116.The voltage from power supply 120 is supplied to first, second digital-analog convertor 112,114.First, second digital-analog convertor 112,114 accepts the supply from the voltage of power supply 120, and exports the analog voltage corresponding with the digital value from digital control portion 116.Power supply 120 can utilize the power supply equipped in the analytical equipment or light device of installing at optical filter 10, but the power supply that optical filter 10 also can be used special.
1.2.2. the driving method of optical filter
Fig. 8 is the performance plot of an example of the voltage table data of the source data represented as the control in the digital control portion 116 shown in Fig. 7.These voltage table data both can be located in digital control portion 116 self, also can be equipped in optical filter 10 in the analytical equipment that is mounted or light device.
Fig. 8 is as amount to the voltage table data that N level makes the Variable between first, second reflectance coating 40,50, indicating the example of N=9 by separately applying voltage successively to K segment electrode 62,64.And, in Fig. 8, when each potential difference (PD) between first, second segment electrode 62,64 both sides and second electrode 70 is all 0V, be not contained in the Variable scope of N level.Fig. 8 only represents the situation at least one party of first, second segment electrode 62,64 being applied to the magnitude of voltage beyond to the magnitude of voltage (0V) of the common electric voltage that the second electrode 70 applies.But, be defined as through peak wavelength maximum when can be also all 0V by each potential difference (PD) between first, second segment electrode 62,64 both sides and second electrode 70.
Potential difference (PD) control part 110, according to the voltage table data shown in Fig. 8, applies the magnitude of voltage of each setting of pressing K segment electrode (first, second segment electrode 62,64) respectively to K segment electrode (first, second segment electrode 62,64).Fig. 9 is by realize execute alive sequential chart with the driving of the data number of the voltage table data shown in Fig. 8 order.
As can be seen from figures 8 and 9, to first paragraph electrode 62, apply L=4 kind voltage (VI1 ~ VI4:VI1<VI2<VI3<V I4), to second segment electrode 64, apply M=5 kind voltage (VO1 ~ VO5:VO1<VO2<VO3<V O4<VO5), make the first clearance G 1 between first, second reflectance coating 40,50 variable with this 9 (N=L+M=9) level of g0 ~ g8.
Utilize this Control of Voltage, in optical filter 10, the wavelength shown in Figure 10 can be realized through characteristic.The wavelength when size of the first clearance G 1 between Figure 10 represents first, second reflectance coating 40,50 is such as changed to g0 ~ g3 is through characteristic.In optical filter 10, when the size of the first clearance G 1 between first, second reflectance coating 40,50 is such as set as can be changed into g0 ~ g3 (g0>g1>g2>g3) time, namely determine accordingly through peak wavelength with the size of this first clearance G 1.Namely, for the wavelength X of the light through optical filter 10, the integer (n) of its half-wavelength (λ/2) doubly consistent with the first clearance G 1 (n × λ=2G1), doubly inconsistent with the first clearance G 1 light of the integer (n) of half-wavelength (λ/2) is attenuated being undertaken by first, second reflectance coating 40,50 mutually interfering in the process of multipath reflection, can not be through.
So, as shown in Figure 10, by make the size reduction of the first clearance G 1 between first, second reflectance coating 40,50 be g0, g1, g2, g3 change, through the light of optical filter 10, namely λ 0, λ 1, λ 2, λ 3 (λ 0> λ 1> λ 2> λ 3) will be changed to shortening successively through peak wavelength.
Here, the value of L, M, N can at random change, but is preferably set to the integer of L >=3, M >=3, N >=6.When being set to L >=3, M >=3, N >=6, just inner circumferential side potential difference (PD) Δ Vseg1 and outer circumferential side potential difference (PD) Δ Vseg2 can be switched to the second potential difference (PD) Δ V2 larger than the first potential difference (PD) Δ V1, the three potential difference (PD) Δ V3 larger than the second potential difference (PD) Δ V2 from the first potential difference (PD) Δ V1 of each setting by first, second segment electrode 62,64 respectively.
As shown in Figure 8, first potential difference (PD) control part 110 applies voltage VO1 ~ voltage VO5 successively to the second segment electrode 64 in outside.Because the second electrode 70 is 0V, therefore the potential difference (PD) between the second electrode 70 and second segment electrode 64 can be become the first potential difference (PD) VO1, the second potential difference (PD) VO2, the 3rd potential difference (PD) VO3, the 4th potential difference (PD) VO4, increase outer circumferential side potential difference (PD) Vseg2 successively the 5th potential difference (PD) VO5.Like this, the size of the first clearance G 1 between first, second reflectance coating 40,50 will constriction be g0 → g1 → g2 → g3 → g4 successively.Consequently, through the light of optical filter 10, be namely changed to λ 0 → λ 1 → λ 2 → λ 3 → λ 4 with shortening successively through peak wavelength.
Then, while the applying that potential difference (PD) control part 110 maintains as illustrated in fig. 8 to the maximum applying voltage VO5 of second segment electrode 64, potential difference (PD) control part 110 applies voltage VI1 ~ voltage VI4 successively to the first paragraph electrode 62 of inner side.Because the second electrode 70 is 0V, therefore the potential difference (PD) between the second electrode 70 and first paragraph electrode 62 can be become the first potential difference (PD) VI1, the second potential difference (PD) VI2, increase inner circumferential side potential difference (PD) Vseg1 successively the 3rd potential difference (PD) VI3, the 4th potential difference (PD) VI4.Like this, the size of the first clearance G 1 between first, second reflectance coating 40,50 will diminish successively as g5 → g6 → g7 → g8.Consequently, through the light of optical filter 10, be namely changed to λ 5 → λ 6 → λ 7 → λ 8 with shortening successively through peak wavelength.
Potential difference (PD) control part 110 couples of outer circumferential side potential difference (PD) Vseg2, at least be switched to the second potential difference (PD) VO2 larger than the first potential difference (PD) VO1 from the first potential difference (PD) VO1, then the 3rd potential difference (PD) VO3 larger than the second potential difference (PD) VO2 is switched to, to inner circumferential side potential difference (PD) Vseg1, at least be switched to the second potential difference (PD) VI2 larger than the first potential difference (PD) VI1 from the first potential difference (PD) VI1, then the 3rd potential difference (PD) VI3 larger than the second potential difference (PD) VI2 is switched to, therefore can suppress the decay free vibration of the second substrate 30 of drawer at movable side, thus Wavelength variable action rapidly can be implemented.And, potential difference (PD) control part 110 is to the respective voltage (also can comprise voltage 0) above as 3 values of first, second segment electrode 62,64, first paragraph voltage VI1, second segment voltage VI2 and the 3rd section of voltage VI3 are at least applied to first paragraph electrode 62, first paragraph voltage VO1, second segment voltage VO2 and the 3rd section of voltage VO3 are at least applied to second segment electrode 64.Like this, as long as drive each one of first, second electrode 62,64, just can realize the Variable of more than 3 grades respectively, not need the segment electrode number vainly increasing the first electrode 60.
1.2.3. voltage variety (absolute value etc. of the difference of the first potential difference (PD) and the second potential difference (PD))
Potential difference (PD) control part 110 can, to inner circumferential side potential difference (PD) Vseg1 and outer circumferential side potential difference (PD) Vseg2, make the absolute value of the difference of the second potential difference (PD) and the 3rd potential difference (PD) be less than the absolute value of the difference of the first potential difference (PD) and the second potential difference (PD) respectively.Because the second electrode 70 is that common electric voltage 0V remains unchanged in present embodiment, therefore the such as so-called absolute value as first potential difference (PD) of outer circumferential side potential difference (PD) Vseg2 and the difference of the second potential difference (PD), as can be seen from figures 8 and 9, be voltage variety Δ VO1 equivalence between first paragraph voltage VO1 that second segment electrode 64 is applied and second segment voltage VO2.As can be seen from figures 8 and 9, the voltage variety of outer circumferential side potential difference (PD) Vseg2 is in the relation that Δ VO1> Δ VO2> Δ VO3> Δ VO4 diminishes successively, and inner circumferential side potential difference (PD) Vseg1 voltage variety is also in the relation that Δ VI1> Δ VI2> Δ VI3 diminishes successively.
The reason being in this relation is as follows.According to above-mentioned formula (1), the potential difference (PD) (being the applying voltage V to the first electrode 60 in present embodiment) between electrostatic attraction F and first, second electrode 60,70 square in direct ratio.Figure 11 is the performance plot (F=V with square directly proportional electrostatic attraction F of potential difference (PD) V
2figure).As shown in figure 11, on the direction that potential difference (PD) V becomes large, when switching to the first potential difference (PD), the second potential difference (PD), the 3rd potential difference (PD), when the difference Δ V2 of the absolute value of the absolute value delta V1 of the first potential difference (PD) and the difference of the second potential difference (PD), the second potential difference (PD) and the 3rd potential difference (PD) is identical (in Figure 11 Δ V1=Δ V2), the recruitment Δ F of electrostatic attraction will increase to Δ F2 sharp from Δ F1, causes toning.
So, make the absolute value delta V2 of the difference of the second potential difference (PD) and the 3rd potential difference (PD) be less than the absolute value delta V2 of the difference of the first potential difference (PD) and the second potential difference (PD).Like this, the increase sharply of electrostatic attraction when just can suppress gap turn narrow, can suppress toning further, can realize Wavelength variable action more rapidly.
During 1.2.4. voltage applies
Potential difference (PD) control part 110 is for inner circumferential side potential difference (PD) Vseg1 and outer circumferential side potential difference (PD) Vseg2, can make respectively, to long during comparison first potential difference (PD) setting during the second potential difference (PD) setting, to make long during comparison second potential difference (PD) setting during the 3rd potential difference (PD) setting.In present embodiment, as shown in Figure 9, for outer circumferential side potential difference (PD) Vseg2, during second potential difference (PD) VO1, TO2 is longer than TO1 during the first potential difference (PD) VO1, during 3rd potential difference (PD) VO3, TO3 is longer than TO2 during the second potential difference (PD) VO2, is in the relation that TO1<TO2<TO3<TO4LE ssT.LTssT.LTTO5 is elongated successively.Similarly, as shown in Figure 9, for inner circumferential side potential difference (PD) Vseg1, during second potential difference (PD) VI1, TI2 is longer than TI1 during the first potential difference (PD) VI1, during 3rd potential difference (PD) VI3, TI3 is longer than TI2 during the second potential difference (PD) VI2, is in the relation that TI1<TI2<TI3<TI4LE ssT.LTssT.LTTI5 is elongated successively.
When being set to second potential difference (PD) larger than the first potential difference (PD), or when being set to three potential difference (PD) larger than the second potential difference (PD), the recuperability of second substrate 30 also can become large.Thus, second substrate 30 reach static before time elongated.That is, it is elongated that the first clearance G 1 between first, second reflectance coating 40,50 reaches the time being stable at fixed position former.Different with it, by as present embodiment, be set as making, to long during comparison first potential difference (PD) setting during the second potential difference (PD) setting, to long during comparison second potential difference (PD) setting during the 3rd potential difference (PD) setting, the first clearance G 1 just can be made to be stable at setting.
1.2.5. the embodiment 1 of potential difference (PD), gap and variable wavelength
Figure 12 is the performance plot of data of embodiment 1 representing the potential difference (PD) shown in Fig. 8, gap and variable wavelength.The data number 1 ~ 9 of Figure 12 is identical with the data number 1 ~ 9 of Fig. 8.Figure 13 is the performance plot of the relation representing the applying voltage shown in Figure 12 and gap.Figure 14 represents the applying voltage shown in Figure 12 and the performance plot through the relation of peak wavelength.
In Figure 12, in order to make through peak wavelength with variable from 9 grades of maximum wavelength λ 0=700nm to the minimum wavelength λ 8=380nm through peak wavelength, and the first clearance G 1 between first, second reflectance coating 40,50 is made to can be changed into from maximal clearance g0=300nm to minimum clearance g8=140nm these 9 grades (also with reference to Figure 13).Corresponding with it, can be changed into 8 these 9 grades (also with reference to Figure 14) from maximum wavelength λ 0 to minimum wavelength λ through peak wavelength.And, in Figure 12, by being set as at equal intervals (=40nm) by the gap g0 ~ g8 of 9 from maximal clearance g0 to minimum clearance g8 grade, from maximum wavelength λ 0 to minimum wavelength λ, the wavelength X 0 ~ λ 8 of 9 grades of 8 also becomes at equal intervals (=40nm).Like this, by make the size of the first clearance G 1 between first, second reflectance coating successively successively constriction a certain amount of change, also successively to shorten certain value through peak wavelength.
Outer circumferential side potential difference (PD) Vseg2 is set as VO1=16.9V, VO2=21.4V, VO3=25V, VO4=27.6V, VO5=29.8V by potential difference (PD) control part 110 successively, while being maintained VO5=29.8V, inner circumferential side potential difference (PD) Vseg1 is set as VI1=16.4V, VI2=22.2V, VI3=26.3V, VI4=29.3V successively.
And, for the size of the first clearance G 1 between first, second reflectance coating 40,50, compared with the electrostatic attraction F2 based on outer circumferential side potential difference (PD) Vseg2, large on the impact of the electrostatic attraction F1 based on inner circumferential side potential difference (PD) Vseg1.Thus, after first making inner circumferential side potential difference (PD) Vseg1 change, even if while inner circumferential side potential difference (PD) Vseg1 is maintained certain value, outer circumferential side potential difference (PD) Vseg2 is changed, the electrostatic attraction F1 caused by inner circumferential side potential difference (PD) Vseg1 is also overriding, and the gap between first, second reflectance coating 40,50 can not change as outer circumferential side potential difference (PD) Vseg2.So, in present embodiment after first making outer circumferential side potential difference (PD) Vseg2 change, while outer circumferential side potential difference (PD) Vseg2 is maintained certain value, inner circumferential side potential difference (PD) Vseg1 is changed.
Outer circumferential side potential difference (PD) Vseg2, after outer circumferential side potential difference (PD) Vseg2 arrives outer circumferential side maximum potential difference VO5, is maintained outer circumferential side maximum potential difference VO5 and inner circumferential side potential difference (PD) Vseg1 is changed by potential difference (PD) control part 110.At this moment, just from the first clearance G 1 set by outer circumferential side maximum potential difference VO5, then the gap change of 1 step caused by the applying of inner circumferential side potential difference (PD) Vseg1 can be realized.And, after applying inner circumferential side potential difference (PD) Vseg1, owing to reaching the maximum outer circumferential side potential difference (PD) VO5 of outer circumferential side, therefore just do not need outer circumferential side potential difference (PD) Vseg2 is changed again.Thus, when making outer circumferential side potential difference (PD) Vseg2 change, the harmful effect of the overriding electrostatic attraction F2 caused by inner circumferential side potential difference (PD) Vseg1 can not be produced.
When inner circumferential side potential difference (PD) Vseg1 is set as inner circumferential side maximum potential difference VI4 by potential difference (PD) control part 110, the first clearance G 1 between first, second reflectance coating 40,50 is just set to minimum interval g8.Outer circumferential side maximum potential difference VO5 and each leisure of inner circumferential side maximum potential difference VI4 can be made to be no more than in the scope of the maximum voltage Vmax supplied to potential difference (PD) control part 110 equal in fact.In present embodiment, supply such as maximum voltage Vmax=30V from the power supply 120 shown in Fig. 7 to potential difference (PD) control part 110.Now, outer circumferential side maximum potential difference VO5 is set to the 29.8V being no more than maximum voltage Vmax (30V), and inner circumferential side maximum potential difference VI4 is also set to the 29.3V being no more than maximum voltage Vmax (30V).
In Figure 12, although there is the small difference of 0.5V between outer circumferential side maximum potential difference VO5 and inner circumferential side maximum potential difference VI4, but can say it is substantially identical.This small difference be to inner circumferential side potential difference (PD) Vseg1 and outer circumferential side potential difference (PD) Vseg2 separately according in the full scale of scope being no more than maximum voltage Vmax (30V) (with reference to Figure 13 and Figure 14) obtain the result of the equally spaced patten's design through peak wavelength.For making outer circumferential side maximum potential difference VO5 and inner circumferential side maximum potential difference VI4 strictly consistent, the area ratio etc. of first, second segment electrode 62,64 can be adjusted, but it is not high to make it strictly consistent necessity.And, in the driving method of present embodiment, there is following advantage, namely, by making outer circumferential side maximum potential difference VO5 and inner circumferential side maximum potential difference VI4 substantially equal, just can as shown in explanation in Fig. 5 (A), roughly all-round (the comprising the opposed region 74A1 with the first slit 64C) of the 4th segment electrode 74 in outside produces impartial electrostatic attraction.
In present embodiment, potential difference (PD) control part 110 by applying voltage successively separately to K=2 first, second segment electrode 62,64, and makes the first clearance G 1 between first, second reflectance coating 40,50 variable to amount to N=9 level.Now, the minimum value of the voltage variety between each applying voltage applied the same segment electrode 62 (or 64) in K=2 first, second segment electrode 62,64 is defined as Δ Vkmin.In the example of Fig. 8 and Figure 12, for first paragraph electrode 62, Δ Vkmin=Δ VI3=3.0V, for second segment electrode 64, Δ Vkmin=Δ VO4=2.2V.If consider that power noise is about 0.1V, then according to more also can being clear that of following comparative example, the sensitivity of this minimum amount of voltage that Δ Vkmin to noise is little.
1.2.6. the embodiment 2 of potential difference (PD), gap and variable wavelength
In embodiment 2, as shown in Figure 15 (A) (B), replace the first electrode 60 of embodiment 1 and use the first electrode 61 shown in Figure 15 (A), replace the second electrode 70 of embodiment 1 and use the second electrode 71 shown in Figure 15 (B).That is, first, second electrode 61,71 of embodiment 2 is not by the section of carrying out segmentation.
Figure 16 is the performance plot of the data representing potential difference (PD) between first, second electrode 61,71 shown in Figure 15 (A) (B) and the gap utilizing it to obtain and variable wavelength.The data number 1 ~ 9 of Figure 16 is identical with the data number 1 ~ 9 of Fig. 8 and Figure 12.Figure 17 is the performance plot of the relation representing the applying voltage shown in Figure 16 and gap.Figure 18 represents the applying voltage shown in Figure 16 and the performance plot through the relation of peak wavelength.
In Figure 16 be also, in order to make through peak wavelength with variable from 9 grades of maximum wavelength λ 0=700nm to the minimum wavelength λ 8=380nm through peak wavelength, and the first clearance G 1 between first, second reflectance coating 40,50 is made to can be changed into from maximal clearance g0=300nm to minimum clearance g8=140nm these 9 grades (also with reference to Figure 16).Corresponding with it, can be changed into 8 these 9 grades (also with reference to Figure 17) from maximum wavelength λ 0 to minimum wavelength λ through peak wavelength.
But, in embodiment 2, the voltage of 9 grades that the first electrode 61 as unitary electrode is applied must be set in the middle of the full scale of maximum voltage Vmax (30v).
As described in Example 2, the voltage minimum change between each applying voltage of N=9 level when forming the first electrode 61 with unitary electrode is defined as Δ V1min.In the example of Figure 16, Δ V1min=0.9V.If consider that power noise is about 0.1V, then the sensitivity of voltage minimum change Δ V1min to noise of embodiment 2 is large.
If compared the voltage minimum change Δ Vkmin of the embodiment 1 and voltage minimum change V1min of embodiment 2, then Δ V1min< Δ Vkmin sets up, and can make the sensitivity of noise less in embodiment 1.
2. the variation of optical filter
Figure 19 represents the optical filter 11 different from the optical filter 10 of Fig. 1.Second 20A2 being formed with the first electrode 60 in FIG of the first substrate 21 shown in Figure 19 comprises: be formed with the 2-1 face 20A21 of the surrounding of the first surface 20A1 of the first reflectance coating 40 when overlooking, be configured at the surrounding of 2-1 face 20A21 and and there is the 2-2 face 20A22 that ladder differs from 24 between the 20A21 of 2-1 face when overlooking.
First paragraph electrode 62 is configured in the 20A21 of 2-1 face, second segment electrode 64 is configured in the 20A22 of 2-2 face, and the initial clearance G 22 between second segment electrode 64 and the second electrode 70 is different from the initial clearance G 21 between first paragraph electrode 62 and above-mentioned second electrode 70.
The reason being in this relation is as follows.The initial clearance G 22 corresponding with driven such as second segment electrode 64 at first in initial clearance G 21, G22 narrows because of the electrostatic attraction acted between this second segment electrode 64 and second electrode.Now, clearance G 21 also side by side narrows, and diminishes compared with primary clearance.Thus, when driving first paragraph electrode 62, clearance G 21 diminishes compared with initial value.
Here, suppose that 2-1 face 20A21 flushes with 2-2 face 20A22 and the initial value of clearance G 21, G22 is identical.In this situation, such as, clearance G 22 when driving second segment electrode 64 at first will be larger than the clearance G 21 during its rear drive first paragraph electrode 62.Thus, just electrostatic attraction when driving second segment electrode 64 at first exceedingly must be set to the electrostatic attraction be greater than when the first electrode 64 is driven.
Like this, in this case preferably as shown in figure 19, the initial value of clearance G 22 is made to be less than the initial value of clearance G 21.And, when driving first paragraph electrode 62 at first, as long as make the initial value of clearance G 21 be less than the initial value of clearance G 22.
3. analytical equipment
Figure 20 is the block diagram of the schematic configuration of the colour examining device of an example of the analytical equipment represented as an embodiment of the invention.
In Figure 20, colour examining device 200 possesses light supply apparatus 202, spectroscopic measurement device 203, colour examining control device 204.This colour examining device 200 penetrates such as white light from light supply apparatus 202 to check object A, makes the check object light as the light reflected by check object A be injected into spectroscopic measurement device 203.After this, utilize spectroscopic measurement device 203 by the light splitting of check object light, the dichroism implementing the light quantity of the light of each wavelength measuring light splitting measures.In other words, make the check object light as the light reflected by check object A be injected into etalon (etalon) 10 as optical filter, implement to measure from etalon 10 through the dichroism of the light quantity through light measure.After this, colour examining control device 204, based on the dichroism of gained, carries out the colour examining process of check object A, that is, analyzes the color which kind of degree to contain which wavelength with.
Light supply apparatus 202 possesses light source 210, multiple lens 212 (only describing 1 in Fig. 1), penetrates white light to check object A.In addition, in multiple lens 212, comprise collimation lens, the white light of injection from light source 210 utilizes collimation lens to be set to directional light by light supply apparatus 202, and never illustrated projection lens penetrates to check object A.
Spectroscopic measurement device 203 as shown in figure 20, possesses etalon 10, the light accepting part 220 as light accepting part, driving circuit 230, control circuit portion 240.In addition, spectroscopic measurement device 203, in the position opposed with etalon 10, possesses the not shown beam incident optical lens of reflected light (determination object light) the guiding inside reflected by check object A.
Light accepting part 220 is made up of multiple photoelectricity exchange component, generates the electric signal corresponding with light income.In addition, light accepting part 220 is connected by with control circuit portion 240, is exported by generated electric signal as by light signal to control circuit portion 240.
Driving circuit 230 is connected by with first electrode 60, second electrode 70 and control circuit portion 240 of etalon 10.This driving circuit 230, based on the drive control signal inputted from control circuit portion 240, applies driving voltage between the first electrode 60 and the second electrode 70, makes second substrate 30 move to the index position of regulation.As driving voltage, as long as apply according to the mode producing required potential difference (PD) between the first electrode 60 and the second electrode 70, such as, also can apply the voltage of regulation to the first electrode 60, the second electrode 70 is set to earthing potential.As driving voltage, preferably use DC voltage.
Control circuit portion 240 controls the molar behavior of spectroscopic measurement device 203.This control circuit portion 240 as shown in figure 20, such as, is made up of CPU250, storage part 260 etc.In addition, CPU350, based on the various programs be stored in storage part 260, various data, implements spectral photometry process.Storage part 260 such as possesses the storage medium such as storer or hard disk, various program, various data etc. can be stored with reading rightly.
Here, in storage part 260, as program, store Voltage Cortrol portion 261, clearance checking portion 262, light quantity identification part 263 and determination part 264.And clearance checking portion 262 also can omit as described above.
In addition, in storage part 260, store the voltage table data 265 shown in Fig. 8 that the magnitude of voltage that applies electrostatic actuator 80,90 interval in order to adjust the first clearance G 1 and time of applying this magnitude of voltage associated.
Colour examining control device 204 is connected by with spectroscopic measurement device 203 and light supply apparatus 202, implements the control of light supply apparatus 202, the colour examining process based on the dichroism utilizing spectroscopic measurement device 203 to obtain.As this colour examining control device 204, such as, can use general personal computer, mobile information terminal, colour examining special purpose computer etc. can be used in addition.
In addition, colour examining control device 204 as shown in figure 20, possesses light source control portion 272, dichroism obtaining section 270 and colour examining handling part 271 etc.
Light source control portion 272 is connected by with light supply apparatus 202.In addition, light source control portion 272 such as inputs based on the setting of user, exports the control signal of regulation, penetrate the white light of the brightness of regulation from light supply apparatus 202 to light supply apparatus 202.
Dichroism obtaining section 270 is connected by with spectroscopic measurement device 203, obtains the dichroism inputted from spectroscopic measurement device 203.
Colour examining handling part 271, based on dichroism, implements the colour examining process of the colourity measuring check object A.Such as, the dichroism pictorialization that colour examining handling part 271 will obtain from spectroscopic measurement device 203, implements to process such as output unit output such as not shown printer or displays.
Figure 21 is the process flow diagram of the spectral photometry action representing spectroscopic measurement device 203.First, the CPU250 in control circuit portion 240 makes Voltage Cortrol portion 261, light quantity identification part 263 and determination part 264 start.In addition, CPU250, as original state, will measure time parameter n initialization (being set as n=0) (step S1).And, measure the value that time parameter n gets the integer of more than 0.
Afterwards, determination part 264 in an initial condition, that is, under not executing alive state to electrostatic actuator 80,90, measures the light quantity (step S2) of the light through etalon 10.And the size of the first clearance G 1 under this original state such as also can measure when the manufacture of spectroscopic measurement device in advance, is stored in storage part 260.After this, the light quantity through light of the original state here obtained and the first clearance G 1 size are exported to colour examining control device 204.
Then, the voltage table data 265 be stored in storage part 260 are read in (step S3) by Voltage Cortrol portion 261.In addition, Voltage Cortrol portion 261 adds " 1 " (step S4) on mensuration time parameter n.
Afterwards, Voltage Cortrol portion 261, from voltage table data 265, obtains data (step S5) during the voltage data of first, second electrode 62,64 corresponding with measuring time parameter n and voltage apply.After this, Voltage Cortrol portion 261 exports drive control signal to driving circuit 230, implements data according to voltage table data 265 to drive the process (step S6) of electrostatic actuator 80,90.
In addition, determination part 264, when through application time when, implements spectral photometry process (step S7).That is, determination part 264 utilizes light quantity identification part 263 to measure light quantity through light.In addition, determination part 264 carries out the control exporting the spectral photometry result light quantity through light determined and the wavelength through light are associated with to colour examining control device 204.And, for the mensuration of light quantity, also can by repeatedly or the data in advance of the light quantity of all number of times be stored in storage part 260, after the data of the data or all light quantities that obtain light quantity each time repeatedly, concentrate measure each light quantity.
Afterwards, CPU250 judges that whether measure time parameter n reaches maximal value N (step S8), when being judged as that measuring time parameter n is N, namely terminates a series of spectral photometry action.On the other hand, in step s 8, when mensuration time parameter n is less than N, getting back to step S4, implementing, measuring the process time parameter n adding " 1 ", repeatedly to carry out the process of step S5 ~ step S8.
4. light device
Figure 22 is the block diagram of the schematic configuration of the transmitter of the Wave division multiplexing communication system of an example of the light device represented as an embodiment of the invention.In Wave division multiplexing (WDM:WavelengthDivisionMultiplexing) communication, if the characteristic that the signal utilizing wavelength different can not be interfered mutually, the multiple light signals using wavelength different to multichannel in an optical fiber, then improve the transmission quantity of data with can not setting up fibre circuit.
In Figure 22, Wave division multiplexing transmitter 300 has the optical filter 10 be launched into from the light of light source 301, from optical filter 10 through multiple wavelength X 0, λ 1, λ 2 ... light.Transmitter 311,312,313 is arranged to each wavelength.Merge into 1 from the light pulse signal of multiple passages of transmitter 311,312,313 by Wave division multiplexing device 321 and send to a fiber optics transmission line 331.
The present invention also can similarly be applied in Optical Code Division Multiplexing (OCDM:OpticalCodeDivisionMultiplexing) transmitter.OCDM utilizes the Model Comparison of the light pulse signal encoded to identify passage, this is because the light pulse forming light pulse signal contains the light component of different wavelength.
Although be illustrated several embodiment above, but can understand easily to those skilled in the art, substantially can not depart from a lot of distortion of new item of the present invention and effect.This variation is all contained in scope of the present invention.Such as, in instructions or accompanying drawing, can be this different term at any site substitution of instructions or accompanying drawing by the term recorded together from the different terms of broader or synonym at least one times.
In the present invention, be not limited to the situation that ladder difference is only set in first substrate 20, ladder difference can be formed at least one party of first, second substrate 20,30.Such as, in FIG, although the first substrate 20 being formed with ladder difference is set to fixing base, but also first substrate 20 can be set to movable substrate.Other embodiments of the present invention that ladder differs from 38 that are provided with in the second substrate 30 of movable substrate at Fig. 1 are shown in Figure 23.As shown in figure 23, Tu23Zhong, the second substrate 30 second opposed faces 30A opposed with first substrate 20 has: be formed with the first surface 30A1 of the second reflectance coating 40, be configured at the surrounding of first surface 30A1 when overlooking and be formed with second 30A2 of the second electrode 70.First surface 30A1 and second 30A2 is not the same face, has ladder and differ from 38 between first surface 30A1 and second 30A2, is set in first surface 3,0A1 mono-side than the position of second 30A2 closer to first substrate 20.Like this, under the initial value under the non-applying state of voltage, set up the relation of the first clearance G 1< second clearance G 2.
Here, if be set to tabular surface in fig 23 by second substrate 30 with the face of the second opposed faces 30A opposite side, then ladder can be utilized to differ from 38, the region being formed with the second reflectance coating 50 is set to heavy section 32.Like this, make second substrate 30 movable with just can maintaining the depth of parallelism of the second reflectance coating 50.
And, as mentioned above, the side being formed with ladder difference in a pair counter substrate 20,30 first substrate can be called, also second substrate 30, second reflectance coating 50 and the second electrode 70 first substrate, the first reflectance coating and the first electrode can be called in fig 23.In addition, in the embodiment of Figure 23, also in second substrate 30 side, or 24 suitable ladders can be differed from first, second substrate 20,30 both sides formation with the ladder of Figure 19.Now, preferably according to the mode region being formed with the second electrode 70 being set to thinner wall section 34, second substrate 30 with the face of the second opposed faces 30A opposite side in also form ladder difference.
Figure 24 represents the another embodiment of the invention being respectively equipped with the ladder 22,38 shown in Fig. 1 and Figure 23 in first, second substrate 20,30.Even so, under the initial value under the non-applying state of voltage, the relation of the first clearance G 1< second clearance G 2 is also set up.In the embodiment of Figure 24, also can in second substrate 30 side, or in first, second substrate 20,30 both sides, form that to differ from 24 suitable ladders with the ladder of Figure 19 poor.
Claims (11)
1. a driving method for optical filter, is characterized in that,
Comprising the first reflecting part and the second reflecting part, controlling, in the driving method of the optical filter at the first interval between above-mentioned first reflecting part and above-mentioned second reflecting part, to comprise:
To the first electrode and and the second electrode of above-mentioned first electrode contraposition between apply the step of the first voltage; And
To be configured between above-mentioned first electrode and above-mentioned first reflecting part and and to apply the step of the second voltage between the 3rd electrode of above-mentioned second electrode contraposition and above-mentioned second electrode.
2. the driving method of optical filter according to claim 1, is characterized in that,
Above-mentioned first interval is narrower than the second interval between above-mentioned first electrode and above-mentioned second electrode.
3. the driving method of optical filter according to claim 1, is characterized in that,
Above-mentioned second voltage is applied during above-mentioned first voltage of applying.
4. the driving method of optical filter according to claim 3, is characterized in that,
Above-mentioned first voltage puts on the maximum voltage in the voltage between above-mentioned first electrode and above-mentioned second electrode.
5. the driving method of optical filter according to claim 4, is characterized in that,
After above-mentioned first voltage becomes above-mentioned maximum voltage, apply above-mentioned second voltage.
6. an optical filter, is characterized in that, comprising:
First reflecting part;
Second reflecting part, it is opposed with above-mentioned first reflecting part;
First electrode;
Second electrode, itself and above-mentioned first electrode contraposition;
3rd electrode, it is configured between above-mentioned first electrode and above-mentioned first reflecting part, and with above-mentioned second electrode contraposition,
Wherein, the first interval between above-mentioned first reflecting part and above-mentioned second reflecting part is narrower than the second interval between above-mentioned first electrode and above-mentioned second electrode.
7. optical filter according to claim 6, is characterized in that, also comprises:
First substrate, it is configured to via above-mentioned first reflecting part opposed with above-mentioned second reflecting part; And
Second substrate, it is configured to via above-mentioned second reflecting part opposed with above-mentioned first reflecting part.
8. optical filter according to claim 7, is characterized in that,
Above-mentioned first reflecting part is configured on the first surface of above-mentioned first substrate,
Above-mentioned first electrode and above-mentioned 3rd electrode are configured on second of above-mentioned first substrate,
Above-mentioned first substrate has and above-mentioned first surface and above-mentioned second the 3rd of intersecting between above-mentioned first surface and second.
9. optical filter according to claim 7, is characterized in that,
In above-mentioned second substrate, the thickness in the region that the Thickness Ratio in the region overlapping with above-mentioned second reflecting part is overlapping with above-mentioned second electrode is thick.
10. an analytical equipment, is characterized in that,
Comprise the optical filter described in any one in claim 6 to 9.
11. 1 kinds of light devices, is characterized in that,
Comprise the optical filter described in any one in claim 6 to 9.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010-058301 | 2010-03-15 | ||
| JP2010058301A JP6010275B2 (en) | 2010-03-15 | 2010-03-15 | Optical filter and analytical instrument and optical instrument using the same |
| CN201110057787.1A CN102207615B (en) | 2010-03-15 | 2011-03-08 | Optical filter and use its analytical equipment and light device |
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| CN201110057787.1A Division CN102207615B (en) | 2010-03-15 | 2011-03-08 | Optical filter and use its analytical equipment and light device |
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| CN105511072A true CN105511072A (en) | 2016-04-20 |
| CN105511072B CN105511072B (en) | 2019-06-11 |
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| CN201610034338.8A Active CN105511072B (en) | 2010-03-15 | 2011-03-08 | Optical filter and the analytical equipment and light device for using it |
| CN201110057787.1A Active CN102207615B (en) | 2010-03-15 | 2011-03-08 | Optical filter and use its analytical equipment and light device |
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| CN201110057787.1A Active CN102207615B (en) | 2010-03-15 | 2011-03-08 | Optical filter and use its analytical equipment and light device |
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| US (3) | US8917449B2 (en) |
| EP (2) | EP2367035B1 (en) |
| JP (1) | JP6010275B2 (en) |
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Also Published As
| Publication number | Publication date |
|---|---|
| CN102207615B (en) | 2016-02-17 |
| US8917449B2 (en) | 2014-12-23 |
| CN102207615A (en) | 2011-10-05 |
| TWI510829B (en) | 2015-12-01 |
| CN105511072B (en) | 2019-06-11 |
| JP6010275B2 (en) | 2016-10-19 |
| US9606276B2 (en) | 2017-03-28 |
| EP2367035B1 (en) | 2015-09-09 |
| US20150070768A1 (en) | 2015-03-12 |
| US20110222158A1 (en) | 2011-09-15 |
| JP2011191554A (en) | 2011-09-29 |
| US9134470B2 (en) | 2015-09-15 |
| US20150346407A1 (en) | 2015-12-03 |
| TW201200920A (en) | 2012-01-01 |
| KR20110103887A (en) | 2011-09-21 |
| EP2977800A1 (en) | 2016-01-27 |
| EP2367035A1 (en) | 2011-09-21 |
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