CN105505312A - Preparation method for grinding material - Google Patents
Preparation method for grinding material Download PDFInfo
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- CN105505312A CN105505312A CN201510417887.9A CN201510417887A CN105505312A CN 105505312 A CN105505312 A CN 105505312A CN 201510417887 A CN201510417887 A CN 201510417887A CN 105505312 A CN105505312 A CN 105505312A
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- zirconia particles
- grinding
- cerium salt
- zirconates
- abrasive substance
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Abstract
A related preparation method for a grinding material comprises the following steps: dryly crushing zirconium oxide, a cerium salt and a zirconium salt particle; employing an acid, an alkali or a salt to adjust the pH value of the mixture of the zirconium oxide particle, the cerium salt and the zirconium salt to 1-4, and adding a chelating agent, a surfactant, an antiseptic, a mildew inhibitor or an antirust agent; and discharging the used grinding mixture from a grinding device, temporally recovering the mixture in a container, and supplying the mixture to the grinding device from the container again. The grinding material is relatively applicable to grinding of hard and crisp materials such as sapphire, silicon nitride, silicon carbide, silicon oxide, glass, gallium nitride, gallium arsenide, indium arsenide, indium phosphide and the like. The grinding material prepared according to the disclosed preparation method is relatively applicable to grinding of hard and crisp materials such as sapphire, silicon nitride, silicon carbide, silicon oxide, glass, gallium nitride, gallium arsenide, indium arsenide, indium phosphide and the like.
Description
Technical field
The present invention relates to metal grinding technical field, more particularly, relate to a kind of abrasive substance preparation method.
Background technology
In the process of the hard and fragile material such as grinding sapphire, silicon nitride, silicon carbide, silicon oxide, glass, gan, gallium arsenide, indium arsenide, indium phosphide, generally can use abrasive substance and composition for polishing.For the composition for polishing used in the purposes of the substrate such as glass substrate, photomask synthetic quartz substrate of grinding hard disk glass substrate, display panels, in order to improve the quality of the substrate after grinding, be strongly required the few surface defects as cut on the substrate after the little and grinding of the surfaceness of substrate after grinding.In addition, in order to shorten the time spent by grinding operation, also require that the grinding rate (removal speed) of substrate is high.
Summary of the invention
The technical problem to be solved in the present invention is, for the above-mentioned defect of prior art, provides a kind of abrasive substance preparation method.
The technical solution adopted for the present invention to solve the technical problems is:
Construct a kind of abrasive substance preparation method, comprise zirconia particles, cerium salt and zirconates; Wherein, comprise the following steps:
Zirconium white, cerium salt and zirconates particle dry type are pulverized;
Acid, alkali or salt is adopted to regulate the pH value of described zirconia particles, cerium salt and zirconates composition to 1-4;
Add sequestrant, tensio-active agent, sanitas, mould inhibitor or rust-preventive agent;
The composition for polishing of finishing using of discharging from milling apparatus is temporarily recovered in container, again supplies to milling apparatus from container.
Abrasive substance preparation method of the present invention, wherein, by weight described, the portfolio ratio of described zirconia particles and described cerium salt is 7-5:3-5.
Abrasive substance preparation method of the present invention, wherein, described zirconia particles has 1 ~ 10m
2the specific surface area of/g, described zirconia particles has the average primary particle diameter of less than 0.2 μm.
Abrasive substance preparation method of the present invention, wherein, contains in the aqueous dispersions of the zirconia particles of 1% quality at every 1mL, the number among described zirconia particles with the particle of the aggregate particle size of more than 4 μm is less than 20000000.
Abrasive substance preparation method of the present invention, wherein, the portfolio ratio of described zirconia particles, described cerium salt and described zirconates is 7-5:2-4:1.
Abrasive substance preparation method of the present invention, wherein, the portfolio ratio of described zirconia particles, described cerium salt and described zirconates is 7:2:1.
Beneficial effect of the present invention is: abrasive substance prepared by the inventive method is suitable in the grinding of the hard and fragile material such as sapphire, silicon nitride, silicon carbide, silicon oxide, glass, gan, gallium arsenide, indium arsenide, indium phosphide more.
Embodiment
In order to make the object of the embodiment of the present invention, technical scheme and advantage clearly, clear, complete description is carried out below in conjunction with the technical scheme in the embodiment of the present invention, obviously, described embodiment is section Example of the present invention, instead of whole embodiment.Based on embodiments of the invention, the every other embodiment that those of ordinary skill in the art obtain under the prerequisite not paying creative work, all belongs to protection scope of the present invention.
The abrasive substance preparation method of present pre-ferred embodiments, comprises zirconia particles, cerium salt and zirconates; Wherein, comprise the following steps: zirconium white, cerium salt and zirconates particle dry type are pulverized; Acid, alkali or salt is adopted to regulate the pH value of described zirconia particles, cerium salt and zirconates composition to 1-4; Add sequestrant, tensio-active agent, sanitas, mould inhibitor or rust-preventive agent; The composition for polishing of finishing using of discharging from milling apparatus is temporarily recovered in container, again supplies to milling apparatus from container.
Zirconia particles can be both the particle formed by crystalline zirconium whites such as isometric system, tetragonal spheroidal, oblique systems, also can be the particle formed by amorphousness zirconium white.As abrasive substance preferably tetragonal spheroidal, monoclinic zirconium white.Zirconia particles also can comprise calcium, magnesium, hafnium, yttrium, silicon etc.
Wherein, the purity of zirconia particles is preferably as far as possible high, specifically, is preferably more than 99%, is more preferably more than 99.5%, and more preferably more than 99.8%.Uprise along with in scope more than 99% of the purity of zirconia particles, the grinding rate based on the hard and fragile material of composition for polishing improves.In this, if the purity of zirconia particles is more than 99%, being more than 99.5% furthermore, is further more than 99.8%, then become and easily make the grinding rate based on the hard and fragile material of composition for polishing bring up to level suitable especially in practical.
Preferably, by weight described, the portfolio ratio of described zirconia particles and described cerium salt is 7-5:3-5.
Zirconia particles has 1 ~ 10m
2the specific surface area of/g, described zirconia particles has the average primary particle diameter of less than 0.2 μm.Contain in the aqueous dispersions of the zirconia particles of 1% quality at every 1mL, the number among described zirconia particles with the particle of the aggregate particle size of more than 4 μm is less than 20000000.
Preferably, the portfolio ratio of above-mentioned zirconia particles, described cerium salt and described zirconates is 7-5:2-4:1.
Preferably, the portfolio ratio of above-mentioned zirconia particles, described cerium salt and described zirconates is 7:2:1.
Impurity in zirconia particles can be measured by powder X-ray diffractometry.2 θ of the powder x-ray diffraction device mensuration such as the MiniFlex using such as RigakuCorporation to manufacture are that the intensity of the diffraction peak near 26.5 ° is preferably below 200cps.
More preferably there is not diffraction peak near 26.5 ° in 2 θ, and this represents zirconia particles in fact not containing the quartz silica as impurity.
In addition, if use powder x-ray diffraction device, then zirconic crystallite dimension can be measured.Preferably based on 2 θ be crystallite dimension that the diffracted intensity near diffracted intensity near 28.0 ° and 31.0 ° calculates be above, this represents that zirconic crystallographic system is oblique system, and this crystallite dimension is large.
The specific surface area of zirconia particles is preferably 1m
2/ more than g, is more preferably 2m
2/ more than g.In addition, the specific surface area of zirconia particles is preferably 15m
2/ below g, is more preferably 13m
2/ below g, more preferably 9m
2/ below g.If the specific surface area of zirconia particles is 1 ~ 15m
2the scope of/g, then become and easily make the grinding rate based on the hard and fragile material substrate of composition for polishing bring up to level suitable in practical.
Should be understood that, for those of ordinary skills, can be improved according to the above description or convert, and all these improve and convert the protection domain that all should belong to claims of the present invention.
Claims (6)
1. an abrasive substance preparation method, comprises zirconia particles, cerium salt and zirconates; It is characterized in that, comprise the following steps:
Zirconium white, cerium salt and zirconates particle dry type are pulverized;
Acid, alkali or salt is adopted to regulate the pH value of described zirconia particles, cerium salt and zirconates composition to 1-4;
Add sequestrant, tensio-active agent, sanitas, mould inhibitor or rust-preventive agent;
The composition for polishing of finishing using of discharging from milling apparatus is temporarily recovered in container, again supplies to milling apparatus from container.
2. abrasive substance preparation method according to claim 1, is characterized in that, by weight described, and the portfolio ratio of described zirconia particles and described cerium salt is 7-5:3-5.
3. abrasive substance preparation method according to claim 2, is characterized in that, described zirconia particles has 1 ~ 10m
2the specific surface area of/g, described zirconia particles has the average primary particle diameter of less than 0.2 μm.
4. abrasive substance preparation method according to claim 1, it is characterized in that, contain in the aqueous dispersions of the zirconia particles of 1% quality at every 1mL, the number among described zirconia particles with the particle of the aggregate particle size of more than 4 μm is less than 20000000.
5. abrasive substance preparation method according to claim 2, is characterized in that, the portfolio ratio of described zirconia particles, described cerium salt and described zirconates is 7-5:2-4:1.
6. abrasive substance preparation method according to claim 3, is characterized in that, the portfolio ratio of described zirconia particles, described cerium salt and described zirconates is 7:2:1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510417887.9A CN105505312A (en) | 2015-07-16 | 2015-07-16 | Preparation method for grinding material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510417887.9A CN105505312A (en) | 2015-07-16 | 2015-07-16 | Preparation method for grinding material |
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| CN105505312A true CN105505312A (en) | 2016-04-20 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109280492A (en) * | 2017-07-21 | 2019-01-29 | 天津西美科技有限公司 | A kind of inp wafer polishing fluid |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1263868A (en) * | 1999-02-15 | 2000-08-23 | 上海跃龙有色金属有限公司 | Nm-class compound Ce-Zr oxide and its preparing process and application |
| CN102559064A (en) * | 2011-12-15 | 2012-07-11 | 上海华明高纳稀土新材料有限公司 | Cerium-zirconium praseodymium sosoloid and preparation method thereof |
| CN103402705A (en) * | 2011-01-27 | 2013-11-20 | 福吉米株式会社 | Polishing material and polishing composition |
-
2015
- 2015-07-16 CN CN201510417887.9A patent/CN105505312A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1263868A (en) * | 1999-02-15 | 2000-08-23 | 上海跃龙有色金属有限公司 | Nm-class compound Ce-Zr oxide and its preparing process and application |
| CN103402705A (en) * | 2011-01-27 | 2013-11-20 | 福吉米株式会社 | Polishing material and polishing composition |
| CN102559064A (en) * | 2011-12-15 | 2012-07-11 | 上海华明高纳稀土新材料有限公司 | Cerium-zirconium praseodymium sosoloid and preparation method thereof |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109280492A (en) * | 2017-07-21 | 2019-01-29 | 天津西美科技有限公司 | A kind of inp wafer polishing fluid |
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Application publication date: 20160420 |