CN105416973A - Substrate conveying device and substrate edge exposure method - Google Patents
Substrate conveying device and substrate edge exposure method Download PDFInfo
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- CN105416973A CN105416973A CN201510718566.2A CN201510718566A CN105416973A CN 105416973 A CN105416973 A CN 105416973A CN 201510718566 A CN201510718566 A CN 201510718566A CN 105416973 A CN105416973 A CN 105416973A
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- substrate
- edge
- sun
- registration mast
- delivery platform
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G13/00—Roller-ways
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2201/00—Indexing codes relating to handling devices, e.g. conveyors, characterised by the type of product or load being conveyed or handled
- B65G2201/02—Articles
- B65G2201/0214—Articles of special size, shape or weigh
- B65G2201/022—Flat
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention provides a substrate conveying device and a substrate edge exposure method. The substrate conveying device is provided with a first edge exposure module (21), a second edge exposure module (22), a first positioning column (31) and a second positioning column (32), wherein the first edge exposure module (21) and the second edge exposure module (22) are located above a conveying platform (1), and the first positioning column (31) and the second positioning column (32) are located below the conveying platform (1). The peripheral edge of a substrate can be exposed by means of the first edge exposure module (21) and the second edge exposure module (22) through the cooperation of the first positioning column (31) and the second positioning column (32) in the conveying process of the substrate, so that residual light resistance on the peripheral edge of the substrate (4) is removed; an edge exposure machine does not need to be purchased additionally, and thus the machine cost is reduced. According to the substrate edge exposure method, the edge of the substrate (4) is exposed while the substrate (4) is conveyed through the mutual cooperation of the first edge exposure module (21), the second edge exposure module (22), the first positioning column (31) and the second positioning column (32), the residual light resistance on the peripheral edge of the substrate (4) is removed, and the machine cost is reduced.
Description
Technical field
The present invention relates to technique of display field, particularly relate to a kind of base plate transfer device and substrate and to expose to the sun limit method.
Background technology
In technique of display field, Liquid Crystal Display (LiquidCrystalDisplay, LCD) with organic light emitting diode display (OrganicLightEmittingDiode, etc. OLED) flat-panel monitor has progressively replaced CRT monitor, is widely used in LCD TV, mobile phone, personal digital assistant, digital camera, computer screen or notebook PC screen etc.
For the display panel of LCD, its structure is by a colored filter substrate (ColorFilter, CF), a thin-film transistor array base-plate (ThinFilmTransistorArraySubstrate, TFTArraySubstrate) and a liquid crystal layer (LiquidCrystalLayer) be configured between two substrates formed, principle of work is by applying the rotation that driving voltage controls the liquid crystal molecule of liquid crystal layer in TFT substrate and CF substrate, the light refraction of backlight module out being produced picture.In the manufacturing process of LCD display panel and OLED display panel, often can use lithographic process: the surface be specially scribbling photoresist places mask plate, then utilize exposure machine to base board to explosure, exposure machine sends UV ultraviolet light by opening extra-high-pressure mercury vapour lamp, graphicinformation on mask plate being transferred to scribbles on the substrate surface of photoresist, based on the pattern of mask plate, photoresist has the part be exposed and the part be not exposed; Recycling developer solution develops to photoresist, the part that photoresist is exposed can be removed, retain the part that photoresist is not exposed, or the part that removal photoresist is not exposed, retain the part that photoresist is exposed, thus make photoresist form required figure; Finally etch, substrate is formed corresponding pattern.
In lithographic process, the edge of substrate often has photoresistance (i.e. photoresist) and remains, and generally can be exposed by the edge of limit machine to substrate of exposing to the sun, to be removed by residual photoresistance.The limit machine that exposes to the sun is arranged separately usually in manufacturing line, and limit machine price comparison of exposing to the sun is expensive, and this just causes the rising of board cost.
Summary of the invention
The object of the present invention is to provide a kind of base plate transfer device, can realize exposing the edge of substrate while transmitting substrate, to remove the residual photoresistance in substrate edge, without the need to additionally buying the limit machine that exposes to the sun, saving board cost.
Another object of the present invention is to provide a kind of substrate to expose to the sun limit method, can realize exposing to the sun limit to substrate while transmission substrate, the photoresistance that removing substrate edge is residual, saves board cost.
For achieving the above object, the invention provides a kind of base plate transfer device, comprise delivery platform, be relatively located at above delivery platform both sides first, second limit module and be located at first, second registration mast below delivery platform along the direction of transfer interval of delivery platform of exposing to the sun;
Described delivery platform is for transmitting substrate; Described substrate has first, second, third, fourth edge, and described first edge is relative with the 4th edge and vertical with the direction of transfer of delivery platform, and described second edge is relative with the 3rd edge, and consistent with the direction of transfer of delivery platform; Described first, second, third, fourth edge has residual photoresistance to be exposed;
Described first registration mast exposes to the sun between the module of limit at first, second; First, second registration mast described can relative to delivery platform rise and fall; Distance between first, second registration mast described and substrate size in the transmission direction adapt;
When substrate rests against the first registration mast place, the first edge of substrate is positioned at the below of first, second limit module that exposes to the sun; When delivery platform drives substrate to move to the second registration mast through the first registration mast, second, third edge of substrate exposes to the sun respectively through first, second below of limit module; When substrate rests against the second registration mast place, the 4th edge of substrate is positioned at the below of first, second limit module that exposes to the sun; Thus realize being exposed by first, second limit module residual photoresistance to first, second, third, fourth edge of substrate that exposes to the sun in the transport process of substrate.
The described light source that first, second exposes to the sun limit module is mercury-arc lamp.
Multiple rollers that described delivery platform comprises spaced and parallel several rotating shaft and is located at respectively in described several rotating shaft.
First, second registration mast described lays respectively between two adjacent rotating shafts.
First, second registration mast described respectively connects a cylinder, controls first, second registration mast rise and fall described by described cylinder.
The present invention also provides a kind of substrate to expose to the sun limit method, comprises the steps:
Step 1, provide a base plate transfer device and substrate;
Described base plate transfer device comprises delivery platform, be relatively located at above delivery platform both sides first, second limit module and be located at first, second registration mast below delivery platform along the direction of transfer interval of delivery platform of exposing to the sun;
Described first registration mast exposes to the sun between the module of limit at first, second; First, second registration mast described can relative to delivery platform rise and fall; Distance between first, second registration mast described and substrate size in the transmission direction adapt;
Described substrate has first, second, third, fourth edge, and described first edge is relative with the 4th edge and vertical with the direction of transfer of delivery platform, and described second edge is relative with the 3rd edge and consistent with the direction of transfer of delivery platform; Described first, second, third, fourth edge has residual photoresistance to be exposed;
Step 2, described substrate is positioned on described delivery platform and transmits, and control the first registration mast and rise;
Step 3, described substrate are stopped by the first registration mast, rest against the first registration mast place, control first limit module or second first edge of limit module to substrate that expose to the sun that expose to the sun and expose;
After first edge exposure of step 4, described substrate, control the first registration mast to decline, delivery platform continues to transmit substrate, exposes in transport process respectively by first, second limit module second, third edge to substrate that exposes to the sun, and controls the second registration mast rising;
Second, third edge exposure of step 5, described substrate is complete, and substrate is stopped by the second registration mast, rests against the second registration mast place, controls first limit module or second four edge of limit module to substrate that expose to the sun that expose to the sun and exposes;
4th edge exposure of step 6, described substrate is complete, controls the second registration mast and declines, by delivery platform, the substrate behind limit of exposing to the sun is sent to next processing procedure.
The described light source that first, second exposes to the sun limit module is mercury-arc lamp.
Multiple rollers that described delivery platform comprises spaced and parallel several rotating shaft and is located at respectively in described several rotating shaft.
First, second registration mast described lays respectively between two adjacent rotating shafts.
First, second registration mast described respectively connects a cylinder, controls first, second registration mast rise and fall described by described cylinder.
Beneficial effect of the present invention: a kind of base plate transfer device provided by the invention, first, second limit module that exposes to the sun is provided with above delivery platform, first, second registration mast is provided with in the below of delivery platform, first, second registration mast can be coordinated in the transport process of substrate, exposed by first, second limit module edge to substrate of exposing to the sun, to remove the residual photoresistance in substrate edge, without the need to additionally buying the limit machine that exposes to the sun, save board cost.A kind of substrate provided by the invention exposes to the sun limit method, to be exposed to the sun cooperatively interacting of limit module and first, second registration mast by first, second being arranged in base plate transfer device, realize exposing to the sun limit to substrate while transmission substrate, the photoresistance that removing substrate edge is residual, saves board cost.
Accompanying drawing explanation
In order to further understand feature of the present invention and technology contents, refer to following detailed description for the present invention and accompanying drawing, but accompanying drawing only provides reference and explanation use, is not used for being limited the present invention.
In accompanying drawing,
Fig. 1 is the structural representation of base plate transfer device of the present invention;
Fig. 2 is the schematic top plan view of the substrate on limit to be exposed to the sun;
Fig. 3 is that the substrate of base plate transfer device of the present invention exposes to the sun the schematic diagram of step 3 of limit method;
Fig. 4 is that the substrate of base plate transfer device of the present invention exposes to the sun the schematic diagram of step 5 of limit method.
Detailed description of the invention
For further setting forth the technological means and effect thereof that the present invention takes, be described in detail below in conjunction with the preferred embodiments of the present invention and accompanying drawing thereof.
Refer to Fig. 1, Fig. 2, first the present invention provides a kind of base plate transfer device, comprises delivery platform 1, is relatively located at above delivery platform 1 both sides first, second expose to the sun limit module 21,22 and first, second registration mast 31,32 of being located at along the direction of transfer interval of delivery platform 1 below delivery platform 1.
Described delivery platform 1 is for transmitting substrate 4.Described substrate 4 has first, second, third, fourth edge 41,42,43,44, described first edge 41 is relative with the 4th edge 44 and vertical with the direction of transfer of delivery platform 1, and described second edge 42 is relative with the 3rd edge 43 and consistent with the direction of transfer of delivery platform 1; Described first, second, third, fourth edge 41,42,43,44 has residual photoresistance to be exposed.
Described first registration mast 31 exposes to the sun between limit module 21,22 at first, second; First, second registration mast 31,32 described can relative to delivery platform 1 rise and fall.Distance between first, second registration mast 31,32 described and substrate 4 size in the transmission direction adapt.
Particularly, when substrate 4 rests against the first registration mast 31 place, the first edge 41 of substrate 4 is positioned at the below of first, second limit module 21,22 that exposes to the sun; When delivery platform 1 drives substrate 4 to move to the second registration mast 32 through the first registration mast 31, second, third edge 42,43 of substrate 4 exposes to the sun respectively through first, second below of limit module 21,22; When substrate 4 rests against the second registration mast 32 place, the 4th edge 44 of substrate 4 is positioned at the below of first, second limit module 21,22 that exposes to the sun; Thus realize being exposed by the residual photoresistance at first, second, third, fourth edge 41,42,43,44 of first, second limit module 21,22 pairs of substrates 4 that expose to the sun in the transport process of substrate 4.
Particularly, the described light source that first, second exposes to the sun limit module 21,22 is mercury-arc lamp, can send UV ultraviolet light and expose photoresistance.
Particularly, described delivery platform 1 multiple rollers 12 of comprising spaced and parallel several rotating shafts 11 and being located at respectively in described several rotating shaft 11.First, second registration mast 31,32 described lays respectively between two adjacent rotating shafts 11.
Particularly, first, second registration mast 31,32 described respectively connects a cylinder (not shown), controls first, second registration mast 31,32 rise and fall described by described cylinder.
Aforesaid substrate conveyer is provided with first, second limit module 21,22 that exposes to the sun above delivery platform 1, first, second registration mast 31,32 is provided with in the below of delivery platform 1, first, second registration mast 31,32 can be coordinated in the transport process of substrate 4, the edge of exposing to the sun limit module 21,22 pairs of substrates 4 by first, second exposes, to remove the residual photoresistance in substrate 4 edge, without the need to additionally buying the limit machine that exposes to the sun, save board cost.
Refer to Fig. 3, Fig. 4, composition graphs 1 and Fig. 2, the present invention also provides a kind of substrate to expose to the sun limit method, comprises the steps:
Step 1, provide a base plate transfer device as shown in Figure 1 and substrate 4 as shown in Figure 2.
Described base plate transfer device comprises delivery platform 1, be relatively located at above delivery platform 1 both sides first, second expose to the sun limit module 21,22 and first, second registration mast 31,32 of being located at along the direction of transfer interval of delivery platform 1 below delivery platform 1.
Described first registration mast 31 exposes to the sun between limit module 21,22 at first, second; First, second registration mast 31,32 described can relative to delivery platform 1 rise and fall; Distance between first, second registration mast 31,32 described and substrate 4 size in the transmission direction adapt.
Described substrate 4 has first, second, third, fourth edge 41,42,43,44, described first edge 41 is relative with the 4th edge 44 and vertical with the direction of transfer of delivery platform 1, and described second edge 42 is relative with the 3rd edge 43 and consistent with the direction of transfer of delivery platform 1; Described first, second, third, fourth edge 41,42,43,44 has residual photoresistance to be exposed.
Step 2, described substrate 4 is positioned on delivery platform 1 and transmits, and control the first registration mast 31 and rise.
Step 3, as shown in Figure 3, described substrate 4 is stopped by the first registration mast 31, rests against the first registration mast 31 place, controls first expose to the sun the first edge 41 of limit module 22 pairs of substrates 4 of limit module 21 or the second that exposes to the sun and exposes.
After first edge 41 exposure of step 4, described substrate 4, control the first registration mast 31 to decline, delivery platform 1 continues to transmit substrate 4, expose respectively by second, third edge 42,43 of first, second limit module 21,22 pairs of substrates 4 that expose to the sun in transport process, and control the second registration mast 32 and rise.
Step 5, as shown in Figure 4, second, third edge 42,43 exposure of described substrate 4 is complete, substrate 4 is stopped by the second registration mast 32, rests against the second registration mast 32 place, controls first expose to the sun the 4th edge 44 of limit module 22 pairs of substrates 4 of limit module 21 or the second that exposes to the sun and exposes.
4th edge 44 of step 6, described substrate 4 exposes complete, controls the second registration mast 32 and declines, by delivery platform 1, the substrate 4 behind limit of exposing to the sun is sent to next processing procedure.
Particularly, the described light source that first, second exposes to the sun limit module 21,22 is mercury-arc lamp, can send UV ultraviolet light and expose photoresistance.
Particularly, described delivery platform 1 multiple rollers 12 of comprising spaced and parallel several rotating shafts 11 and being located at respectively in described several rotating shaft 11.First, second registration mast 31,32 described lays respectively between two adjacent rotating shafts 11.
Particularly, first, second registration mast 31,32 described respectively connects a cylinder, controls first, second registration mast 31,32 rise and fall described by described cylinder.
Aforesaid substrate exposes to the sun limit method, to be exposed to the sun cooperatively interacting of limit module 21,22 and first, second registration mast 31,32 by first, second being arranged in base plate transfer device, realize exposing to the sun limit to substrate 4 while transmission substrate 4, the photoresistance that removing substrate 4 edge is residual, saves board cost.
In sum, base plate transfer device of the present invention, first, second limit module that exposes to the sun is provided with above delivery platform, first, second registration mast is provided with in the below of delivery platform, first, second registration mast can be coordinated in the transport process of substrate, be exposed by first, second limit module edge to substrate of exposing to the sun, to remove the residual photoresistance in substrate edge, without the need to additionally buying the limit machine that exposes to the sun, save board cost.Substrate of the present invention exposes to the sun limit method, to be exposed to the sun cooperatively interacting of limit module and first, second registration mast by first, second being arranged in base plate transfer device, realize exposing to the sun limit to substrate while transmission substrate, the photoresistance that removing substrate edge is residual, saves board cost.
The above; for the person of ordinary skill of the art; can make other various corresponding change and distortion according to technical scheme of the present invention and technical conceive, and all these change and be out of shape the protection domain that all should belong to the accompanying claim of the present invention.
Claims (10)
1. a base plate transfer device, it is characterized in that, comprise delivery platform (1), be relatively located at first, second the limit module that exposes to the sun (21,22) above delivery platform (1) both sides and be located at along the direction of transfer interval of delivery platform (1) delivery platform (1) below first, second registration mast (31,32);
Described delivery platform (1) is for transmitting substrate (4); Described substrate (4) has first, second, third, fourth edge (41,42,43,44), described first edge (41) is relative with the 4th edge (44) and vertical with the direction of transfer of delivery platform (1), and described second edge (42) is relative with the 3rd edge (43) and consistent with the direction of transfer of delivery platform (1); (41,42,43,44) have residual photoresistance to be exposed at described first, second, third, fourth edge;
Described first registration mast (31) is positioned between first, second limit module that exposes to the sun (21,22); First, second registration mast described (31,32) can relative to delivery platform (1) rise and fall; Distance between first, second registration mast described (31,32) and substrate (4) size in the transmission direction adapt;
When substrate (4) rests against the first registration mast (31) place, first edge (41) of substrate (4) is positioned at the below of first, second limit module that exposes to the sun (21,22); When delivery platform (1) drives substrate (4) when the first registration mast (31) is mobile to the second registration mast (32), second, third edge (42,43) of substrate (4) is respectively through the below of first, second limit module that exposes to the sun (21,22); When substrate (4) rests against the second registration mast (32) place, the 4th edge (44) of substrate (4) is positioned at the below of first, second limit module that exposes to the sun (21,22); Thus realize in the transport process of substrate (4), by first, second limit module that exposes to the sun (21,22), the residual photoresistance on first, second, third, fourth edge (41,42,43,44) of substrate (4) is exposed.
2. base plate transfer device as claimed in claim 1, it is characterized in that, the light source of first, second limit module that exposes to the sun (21,22) described is mercury-arc lamp.
3. base plate transfer device as claimed in claim 1, it is characterized in that, multiple rollers (12) that described delivery platform (1) comprises spaced and parallel several rotating shafts (11) and is located at respectively on described several rotating shaft (11).
4. base plate transfer device as claimed in claim 3, it is characterized in that, first, second registration mast described (31,32) lays respectively between two adjacent rotating shafts (11).
5. base plate transfer device as claimed in claim 1, is characterized in that, first, second registration mast described (31,32) respectively connects a cylinder, controls described first, second registration mast (31,32) rise and fall by described cylinder.
6. substrate exposes to the sun a limit method, it is characterized in that, comprises the steps:
Step 1, provide a base plate transfer device and substrate (4);
Described base plate transfer device comprise delivery platform (1), be relatively located at first, second the limit module that exposes to the sun (21,22) above delivery platform (1) both sides and be located at along the direction of transfer interval of delivery platform (1) delivery platform (1) below first, second registration mast (31,32);
Described first registration mast (31) is positioned between first, second limit module that exposes to the sun (21,22); First, second registration mast described (31,32) can relative to delivery platform (1) rise and fall; Distance between first, second registration mast described (31,32) and substrate (4) size in the transmission direction adapt;
Described substrate (4) has first, second, third, fourth edge (41,42,43,44), described first edge (41) is relative with the 4th edge (44) and vertical with the direction of transfer of delivery platform (1), and described second edge (42) is relative with the 3rd edge (43) and consistent with the direction of transfer of delivery platform (1); (41,42,43,44) have residual photoresistance to be exposed at described first, second, third, fourth edge;
Step 2, described substrate (4) is positioned on described delivery platform (1) and transmits, and control the first registration mast (31) and rise;
Step 3, described substrate (4) are stopped by the first registration mast (31), rest against the first registration mast (31) place, control first limit module (21) or second first edge (41) of limit module (22) to substrate (4) that expose to the sun that expose to the sun and expose;
After first edge (41) exposure of step 4, described substrate (4), control the first registration mast (31) to decline, delivery platform (1) continues to transmit substrate (4), expose respectively by first, second limit module that exposes to the sun (21,22) second, third edge (42,43) to substrate (4) in transport process, and control the second registration mast (32) rising;
Second, third edge (42,43) of step 5, described substrate (4) exposes complete, substrate (4) is stopped by the second registration mast (32), rest against the second registration mast (32) place, control first limit module (21) or second four edge (44) of limit module (22) to substrate (4) that expose to the sun that expose to the sun and expose;
4th edge (44) of step 6, described substrate (4) exposes complete, controls the second registration mast (32) and declines, by delivery platform (1), the substrate (4) behind limit of exposing to the sun is sent to next processing procedure.
7. substrate as claimed in claim 6 exposes to the sun limit method, and it is characterized in that, the light source of first, second limit module that exposes to the sun (21,22) described is mercury-arc lamp.
8. substrate as claimed in claim 6 exposes to the sun limit method, it is characterized in that, multiple rollers (12) that described delivery platform (1) comprises spaced and parallel several rotating shafts (11) and is located at respectively on described several rotating shaft (11).
9. substrate as claimed in claim 6 exposes to the sun limit method, and it is characterized in that, first, second registration mast described (31,32) lays respectively between two adjacent rotating shafts (11).
10. substrate as claimed in claim 6 exposes to the sun limit method, and it is characterized in that, first, second registration mast described (31,32) respectively connects a cylinder, controls described first, second registration mast (31,32) rise and fall by described cylinder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510718566.2A CN105416973B (en) | 2015-10-29 | 2015-10-29 | Base plate transfer device and substrate expose side method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510718566.2A CN105416973B (en) | 2015-10-29 | 2015-10-29 | Base plate transfer device and substrate expose side method |
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| CN105416973A true CN105416973A (en) | 2016-03-23 |
| CN105416973B CN105416973B (en) | 2017-11-28 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108663831A (en) * | 2017-03-27 | 2018-10-16 | 平田机工株式会社 | Manufacture system and manufacturing method |
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|---|---|---|---|---|
| DE8524382U1 (en) * | 1985-08-26 | 1987-08-27 | Klimsch & Co KG, 6000 Frankfurt | Device for double-sided exposure of printed circuit boards |
| US20110069294A1 (en) * | 2005-12-29 | 2011-03-24 | Lg Display Co., Ltd. | Apparatus and method for exposing edge of substrate |
| CN102897535A (en) * | 2012-10-17 | 2013-01-30 | 深圳市华星光电技术有限公司 | Substrate-conveying system and substrate positioner |
| JP5311006B2 (en) * | 2008-07-24 | 2013-10-09 | 凸版印刷株式会社 | Peripheral exposure apparatus and peripheral exposure method |
| CN104310059A (en) * | 2014-08-27 | 2015-01-28 | 深圳市华星光电技术有限公司 | Glass substrate edge-exposure manufacturing procedure and system |
-
2015
- 2015-10-29 CN CN201510718566.2A patent/CN105416973B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE8524382U1 (en) * | 1985-08-26 | 1987-08-27 | Klimsch & Co KG, 6000 Frankfurt | Device for double-sided exposure of printed circuit boards |
| US20110069294A1 (en) * | 2005-12-29 | 2011-03-24 | Lg Display Co., Ltd. | Apparatus and method for exposing edge of substrate |
| JP5311006B2 (en) * | 2008-07-24 | 2013-10-09 | 凸版印刷株式会社 | Peripheral exposure apparatus and peripheral exposure method |
| CN102897535A (en) * | 2012-10-17 | 2013-01-30 | 深圳市华星光电技术有限公司 | Substrate-conveying system and substrate positioner |
| CN104310059A (en) * | 2014-08-27 | 2015-01-28 | 深圳市华星光电技术有限公司 | Glass substrate edge-exposure manufacturing procedure and system |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108663831A (en) * | 2017-03-27 | 2018-10-16 | 平田机工株式会社 | Manufacture system and manufacturing method |
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| CN105416973B (en) | 2017-11-28 |
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