CN105328187A - Control device and method for achieving wide-range scanning of electron beam and additive manufacturing device - Google Patents
Control device and method for achieving wide-range scanning of electron beam and additive manufacturing device Download PDFInfo
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- CN105328187A CN105328187A CN201510814394.9A CN201510814394A CN105328187A CN 105328187 A CN105328187 A CN 105328187A CN 201510814394 A CN201510814394 A CN 201510814394A CN 105328187 A CN105328187 A CN 105328187A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
The invention discloses a control device and method for achieving wide-range scanning of an electron beam and a additive manufacturing device capable of achieving the wide-range scanning of the electron beam. The control device comprises a negative electrode, a grid electrode, a positive electrode, a focusing coil, a deflecting coil, an anastigmatic coil and a DA converter, wherein the anastigmatic coil is used for generating anastigmatic magnetism which can produce an anastigmatic magnetic field to control the astigmatic degree. According to the control device, the current of the focusing coil can be changed to achieve good focusing of the electron beam; in addition, the current of the anastigmatic coil can be changed to remove astigmatism of the electron beam, and thus beam spots can remain high quality; in addition, the formation quality of electron beam selective melting additive manufacturing (3D printing) can be greatly improved, and particularly the precision and quality of printed large parts can be improved. The control method is high in operability, and enables high-quality scanning of the electron beam in any route and within a wide range.
Description
Technical field
The present invention relates to and increase material and manufacture field, particularly a kind of can realize electron beam broad width scanning control device, method and the increasing material manufacturing equipment of electron beam broad width scanning can be realized.
Background technology
Increasing material manufacture (AdditiveManufacturing, AM) technology is the technology that the method adopting material to add up gradually manufactures entity component, relative to traditional material removal-Machining Technology for Cutting, is the manufacture method of a kind of " from bottom to top ".Recent two decades comes, AM technology achieves and develops fast, the different call of " rapid prototype manufacturing (RapidPrototyping) ", " 3 D-printing (3DPrinting) ", " entity freely manufactures (SolidFree-formFabrication) " and so on respectively never ipsilateral have expressed the feature of this technology.
Increasing material manufacture, is the manufacturing technology that a kind of material by fusing more than one thin layer continuously builds three-dimensional body.
And electron beam selective melting, be increase the one in material manufacturing technology, its basic processing step is as follows:
1) powder supplies with pave system by metal powder material at workbench upper berth generate thin layer, afterwards electron beam under alternating magnetic field drives on powder bed a cross section of scanning three-dimensional object;
2) workbench declines the distance of a layer thickness, at the powder that workbench upper berth one deck is new, and the next cross section of electron beam scanning three-dimensional body;
3) above step is repeated, until this three-dimensional body manufacture completes.
Because electron beam needs the cross section of scanning three-dimensional object, therefore, the three-dimensional body size that increasing material manufacturing technology can manufacture directly depends on the maximum magnitude that electron beam can scan.The broad width scanning of electron beam is the basis that the increasing material realizing large-scale part manufactures.Deflection angle during electron beam narrow scan is little, and the defocusing of electron beam, astigmatism are fainter, limited on the impact of workmanship; And deflection angle during electron beam broad width scanning is comparatively large, the defocusing of electron beam, astigmatism are larger.Defocus larger beam diameter comparatively large, resolution is limited.The electron beam ovalize that astigmatism is larger, the dim pattern of scanning.The impact of these factors on workmanship be can not ignore, and needs to solve.
Current Problems existing is, in the electron Beam Machining such as electron beam welding, electronic torch melting, the deflection angle of electron beam is less, and what electron beam significantly deflected and caused defocuses with astigmatism smaller, can not affect welding or Melting Quality.Therefore, in this electron beam process equipment, generally only have focus coil and deflection coil, therefore high-precision electron beam broad width scanning can not be realized.
Meanwhile, existing electron beam selective melting increases the electron beam generating device that material manufacturing equipment generally adopts electron beam welding, can not realize high-precision electron beam broad width scanning equally.
Summary of the invention
In view of this, the object of the present invention is to provide a kind of device that can realize electron beam broad width scanning.
Based on above-mentioned purpose, the invention provides a kind of control device realizing electron beam broad width scanning, comprising: negative electrode, grid, anode, focus coil, deflection coil, disappear astigmatism coil and D/A converter,
Described negative electrode, in order to produce electron beam, described electron beam is successively through grid, anode, the astigmatism coil that disappears, focus coil, deflection coil post deflection;
Described grid, in order to retrain the electronics in described electron beam, and changes the line of electron beam;
Described anode, in order to produce voltage with described negative electrode and to make Accelerating electron;
The described astigmatism coil that disappears, for regulating the astigmatism degree of described electron beam;
Described focus coil, in order to regulate the focal length of described electron beam;
Described deflection coil, in order to regulate electron beam in the X-axis direction with the amount of deflection in Y direction;
Described D/A converter, is connected with grid, for changing grid voltage; Astigmatism coil is connected with disappearing, for changing the electric current disappeared in astigmatism coil; Be connected with focus coil, for changing the electric current in focus coil; Deflection coil is connected, for changing the electric current in deflection coil on X-axis winding and Y-axis winding;
Described D/A converter, in order to the transformable voltage signal of output multi-channel.
Further, described disappearing image loose wire circle comprises at least two group windings, and described deflection coil comprises at least two group windings, and described focus coil comprises a Circular Winding;
Described D/A converter, respectively with two groups of winding switching on described disappearing image loose wire circle, in order to control the astigmatism of electron beam;
Described D/A converter, is connected with the Circular Winding on described focus coil, in order to control the focal length of electron beam.Described D/A converter, respectively with two groups of winding switching on described deflection coil, in order to control the deflection of electron beam.
Further, described D/A converter, at least comprises 6 voltage signal output channels, and the voltage signal output channel of described D/A converter reads the control voltage data in himself memory in order successively, and synchronism output voltage signal;
If the storage area in described D/A converter is not enough, described D/A converter voltage signal output channel reads the control voltage numerical value be stored in this locality or remote memory in order successively, and synchronism output voltage signal.
Further, described voltage signal is connected with grid by high voltage source, and described voltage signal is connected with winding by drive circuit, and described voltage signal is connected with focus coil by amplifying circuit.
The present invention also aims to provide a kind of increasing material manufacturing equipment that can realize high-precision electron beam broad width scanning.
Based on above-mentioned purpose, the invention allows for a kind of increasing material manufacturing equipment, comprise the control device and obturator that realize electron beam broad width scanning, and be arranged at powder feeding device, powder paving device, the forming platform of obturator inside;
When described electron beam from negative electrode produce after, successively through grid, anode, disappear astigmatism coil, focus coil and deflection coil, finally enters described obturator;
After described electron beam enters obturator, by described powder feeding device in order to store raw material to be manufactured, and by described powder paving device described raw material to be manufactured are laid in described forming platform and form powder bed;
After described electronics beam is on this metal powder layer, carries out scanning and draw out the cross section of the three-dimensional body that will manufacture or the profile in this cross section.
Further, described obturator is the vacuum chamber of pressure limit at 0.001-1Pa, and wherein the accelerating potential of electron beam is 60kV, and power is not more than 3kW.Further, described powder feeding device is a powder feeder be connected with vacuum chamber sidewall, described powder paving device is a Powder spreader being arranged on bottom vacuum chamber, described forming platform is made up of formation cylinder, piston plate, described formation cylinder is connected with described Powder spreader, and described formation cylinder bottom is provided with piston plate, described can in the vertical direction movable, when described piston plate declines a height, the height of this decline equals the thickness of powder bed.
Further, described powder bed comprises one or more in the multiple alloy of titanium alloy, titanium, aluminium alloy, aluminium, titanium-aluminium alloy, stainless steel, Co-Cr alloy.
Present invention also offers a kind of method being realized electron beam broad width scanning by described control device, after presetting threedimensional model, comprise the steps:
Scanning breadth chooses the known point of coordinate as calibration point;
By changing the control voltage exported, electron beam is made to drop on described calibration point, and in interpolation table, record the coordinate value of this calibration point, described control voltage comprises the control voltage of astigmatism, focusing, deflection, repeats until the control voltage of the coordinate value of all calibration points, astigmatism, focusing, deflection is all recorded in interpolation table;
Determine according to the cross section of threedimensional model the scanning pattern that electron beam will perform, get a scanning element along described scanning pattern every a segment distance;
For the described scanning element got, in interpolation table, interpolation operation is carried out according to its coordinate value, determine and record the control voltage of astigmatism corresponding to this scanning element, focusing, the control voltage of deflection and the electronic beam current of this scanning element, until store the control voltage of the electronic beam current of all scanning elements, astigmatism, focusing and deflection;
Synchronously read the data of record, and synchronism output voltage signal, obtain electron beam described in scanning pattern rear drive and scan along given route.
Further, on each scanning element, increase power control voltage value.
Further, described scanning breadth is square, is equidistantly split by this scanning breadth, obtain several lattices along X-axis unwrapping wire and Y direction, and the angle point of this grid is the calibration point on scanning breadth.
Further, the scanning pattern of described electron beam comprises: the cross section interstitial wire of three-dimensional body, cross section contour and three-dimensional manufacture in the interstitial wire in cross section of necessary supporting construction or outline line.
Further, described scanning pattern by equidistantly discrete be a series of scanning element, according to the coordinate of this scanning element, in interpolation table, carry out bilinear transformation interpolation operation, determine 5 control voltage values such as astigmatism, focusing, deflection that this scanning element is corresponding.
Beneficial effect of the present invention:
1) the present invention is except focus coil, deflection coil, also add the astigmatism coil that disappears; When deflection of a beam of electrons angle is larger, not only can makes electron beam well focussed by changing focus coil current, the astigmatism of electron beam can also be eliminated by changing the astigmatism coil current that disappears, make bundle spot still keep better quality.
2) the present invention improves the forming quality that electron beam selective melting increases material manufacture (3D printing) greatly, particularly prints precision and the quality of larger part.
3) give a kind of control method of electron beam broad width scanning, method is workable, and the electron beam enable realizes the fine scanning of free routing within the scope of wide cut.
4) by reference to the accompanying drawings 4,6 passages of the D/A converter in the present invention read the control voltage numerical value be stored in calculator memory, synchronously output voltage signal in order successively.
Accompanying drawing explanation
Fig. 1 is the schematic diagram realizing the control device of electron beam broad width scanning of the present invention.
Fig. 2 shows the embodiment having used increasing material manufacturing equipment of the present invention.
Fig. 3 shows method embodiment realizing electron beam broad width scanning of the present invention.
Fig. 4 shows data storing and the DA conversion regime of holder.
Detailed description of the invention
For making the object, technical solutions and advantages of the present invention clearly understand, below in conjunction with specific embodiment, and with reference to accompanying drawing, the present invention is described in more detail.
Fig. 1 is the control device schematic diagram of electron beam broad width scanning of the present invention.
Electronics produces from negative electrode 1, successively through grid 2, anode 3, the astigmatism coil 4 that disappears, focus coil 5, deflection coil 6.
Wherein, electronics is accelerated between negative electrode 1 and anode 3, and the electronics after acceleration can make fusion of metal powder.
Grid 2 is connected with high voltage source 8, and the electric field produced between grid 2 and negative electrode 1 can about beam electrons.When changing the voltage on grid 2, electronic beam current (i.e. power) can change thereupon.
Disappearing image loose wire circle 4 comprises the first winding 4-1 and the second winding 4-2, to produce the astigmatism magnetic field that disappears.
Focus coil 5 comprises a Circular Winding, in order to produce axisymmetric focusing magnetic field.
Deflection coil 6 comprises tertiary winding 6-1 and the 4th winding 6-2, produces the magnetic field of X, Y-direction respectively, makes deflection of a beam of electrons.
DA (digital-to-analogue conversion) device 7 has at least 6 passages, the described all exportable control voltage of 6 passages.The voltage signal that wherein first passage 7-1 produces is connected with high voltage source 8, to control electronic beam current; The voltage signal that wherein second channel 7-2, third channel 7-3 produce is connected with the 5th winding 4-1, the 6th winding 4-2 of disappearing image loose wire circle 4, with the electric current passed through in controlled winding respectively by the first drive circuit 9, second drive circuit 10; The voltage signal that wherein four-way 7-4 produces is connected with focus coil 5 by amplifying circuit 11, to control the electric current passed through in focus coil; The voltage that wherein Five-channel 7-5, Hexamermis spp 7-6 produce is connected with X winding 6-1, Y winding 6-2 on deflection coil 6 by the first amplifying circuit 13, second amplifying circuit 12, and with the electric current passed through in controlled winding, thus control electron beam 14 deflects.
Fig. 2 shows the embodiment having used increasing material of the present invention to manufacture (3 D-printing) equipment, and negative electrode 1 of the present invention, grid 2, anode 3, the astigmatism coil 4 that disappears, focus coil 5, deflection coil 6 etc. are positioned at the top of vacuum chamber 15.Powder feeder 16, Powder spreader 17, formation cylinder 18, piston plate 19 are also installed in vacuum chamber.Vacuum chamber 15 can keep vacuum environment by vacuum system, and this vacuum system comprises turbomolecular pump, vortex pump, ionic pump and multiple valve.After electron beam 14 leaves deflection coil 6, enter vacuum chamber 15, act on the dusty material 20 on piston plate 19, make it sinter or melt.In the present embodiment, the pressure of vacuum chamber can between the scope of 0.001-0.1Pa, and the accelerating potential of electron beam is 60kV, and power is 3kW to the maximum.
Powder feeder 16, Powder spreader 17 can form powder thin layer on piston plate 19, and electron beam 14, in the cross section of powder bed scanning three-dimensional model, makes powder sintered or fusing.Piston plate 19 can in the vertical direction motion, and piston plate 19 declines a height, and this highly equals the thickness of powder bed.Afterwards, powder feeder 16, Powder spreader 17 form the new powder of one deck on piston plate 19, the next cross section of electron beam 14 scanning three-dimensional model on powder bed, make powder sintered or fusing, and are combined with last layer.3D solid 21 is manufactured by the above-described method successively melted.This manufacture method dusty material used comprises simple metal or metal alloy, as titanium alloy, titanium, aluminium alloy, aluminium, titanium-aluminium alloy, stainless steel, Co-Cr alloy etc.Mode for reducing piston plate 19 comprises the structure such as rack-and-pinion, screw rod of servomotor or stepper motor drive.Described threedimensional model produces by cad tools.
Fig. 3 shows an embodiment of broad width scanning control method of the present invention.The scanning breadth 22 of electron beam is square, is positioned at above piston plate 19, and can not exceeds the size range of piston plate 19.The calibration point 23 that several become array distribution is chosen in scanning breadth.In the present embodiment, scanning book size is 200mm × 200mm, calibration point 23 totally 49, becomes the uniform array distribution of 7 × 7.
For each calibration point, change the output voltage of astigmatism in D/A converter 7, focusing, passage 7-2,7-3,7-4,7-5,7-6 that deflection is corresponding, electron beam is dropped on calibration point just, and focuses on good, there is no astigmatism.The coordinate value of this calibration point and the control voltage of corresponding astigmatism, focusing, deflection is recorded in interpolation table.Calibrate one by one, until the control voltage of the coordinate value of all calibration points and astigmatism, focusing, deflection is all recorded in interpolation table.Judge whether electron beam drops on calibration point, whether focus on well, whether the method for astigmatism can be visually observe, judged by image recognition after also can taking image by means of camera.
Afterwards, determine according to the cross section of threedimensional model the scanning pattern that electron beam will perform, this path can comprise one or more straight line, curve.Along this scanning pattern, get a scanning element every a segment distance.For the circular path 24 in Fig. 3, scanning element 25 is the scanning element on circular path.Thus, electron beam is actually point by point scanning, and for ensureing the continuous of powder smelting on scanning pattern, the molten bath on adjacent two scanning elements needs overlapping to some extent.Therefore, the interval of scanning element needs to determine according to the diameter in molten bath under actual process.In the present embodiment, if molten bath diameter is d, then scanning element be spaced apart d/4 ~ d.
For each scanning element, according to its coordinate value, in interpolation table, carry out interpolation operation, determine the control voltage of astigmatism that this scanning element is corresponding, focusing, deflection.In the present embodiment, scanning breadth 22 is divided into several square zonules by the calibration point 23 of array arrangement.For the scanning element determined, first determine which square zonule it drops among, and utilize be positioned at the astigmatism of 4 calibration points of square zonule angle point, focusing, deflection control voltage carry out interpolation operation.Can think, when the control voltage of the astigmatism that D/A converter output interpolation operation obtains, focusing, deflection, the positional precision of scanning element, focusing, astigmatism all reach optimum state.
One by one interpolation operation is carried out to all scanning elements, the control voltage of astigmatism, focusing, deflection is recorded in holder.Fig. 4 shows data storing and the DA conversion regime of holder.Memory 26 is that 6 passages of D/A converter have divided corresponding storage area 27,28,29,30,31,32.The control voltage of astigmatism comprises the control voltage of two windings, is kept in storage area 28,29; The control voltage focused on is kept in storage area 30; The control voltage of deflection comprises the control voltage of X, Y two windings, is kept in storage area 31,32.For each scanning element, also addition of a line control voltage, expression electron beam drops on the line (power) during this scanning element.Line control voltage is kept in storage area 27.
After the control voltage preservation of all scanning elements, 6 passages of D/A converter read the control voltage value in corresponding storage area respectively, and output voltage waveforms.6 passages read the control voltage value in storage areas and convert analog voltage to is synchronous, namely there is not some or certain several passage in advance or delayed situation.Synchronous method is by means of clock signal 33, and at rising or the trailing edge of clock signal, 6 passages are triggered simultaneously and read data, convert analog voltage to.
The frequency of clock signal 33 determines the frequency of output voltage waveforms, in the holdup time of each some when also namely have impact on electron beam point by point scanning, also namely determines the sweep speed of electron beam.For making electron beam rapid scanning, the sample frequency of D/A converter 7 need be tried one's best height.In the present embodiment, the sample frequency of D/A converter 7 is greater than 2Ms/s.The frequency of output voltage waveforms is high, and require high voltage source 8, drive circuit 9,10,11,12,13 has enough frequency response performance, in the present embodiment, the response frequency of high-tension electricity and drive circuit is higher than 20kHz.
In the present embodiment, the control voltage value of all scanning elements that will perform writes holder in advance once, and then read by D/A converter 7, output waveform.In the present embodiment, memory is 512Mb altogether, and each passage has the storage area of maximum 85Mb.Also can adopt less memory, the control voltage value of scanning element writes in batches.After D/A converter 7 reads a certain size memory space, the control voltage value of scanning element is write, until be full of storage area.Circulation like this, until the control voltage value of all scanning elements is written into and is converted into analog voltage.
Those of ordinary skill in the field are to be understood that: more than; describedly be only specific embodiments of the invention, be not limited to the present invention, within the spirit and principles in the present invention all; any amendment of making, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (10)
1. realize a control device for electron beam broad width scanning, it is characterized in that, comprising: negative electrode, grid, anode, focus coil, deflection coil, disappear astigmatism coil and D/A converter,
Described negative electrode, in order to produce electron beam, described electron beam is successively through grid, anode, the astigmatism coil that disappears, focus coil, deflection coil post deflection;
Described grid, in order to retrain the electronics in described electron beam, and changes the line of electron beam;
Described anode, in order to produce voltage with described negative electrode and to make Accelerating electron;
The described astigmatism coil that disappears, for regulating the astigmatism degree of described electron beam;
Described focus coil, in order to regulate the focal length of described electron beam;
Described deflection coil, in order to regulate electron beam in the X-axis direction with the amount of deflection in Y direction;
Described D/A converter, is connected with grid, for changing grid voltage; Astigmatism coil is connected with disappearing, for changing the electric current disappeared in astigmatism coil; Be connected with focus coil, for changing the electric current in focus coil; Be connected with deflection coil, for changing the electric current in deflection coil on X-axis winding and Y-axis winding;
Described D/A converter, in order to the transformable voltage signal of output multi-channel.
2. the control device realizing electron beam broad width scanning according to claim 1, is characterized in that, described disappearing image loose wire circle comprises at least two group windings, and described deflection coil comprises at least two group windings, and described focus coil comprises a Circular Winding;
Described D/A converter, respectively with two groups of winding switching on described disappearing image loose wire circle, in order to control the astigmatism of electron beam;
Described D/A converter, respectively with two groups of winding switching on described focus coil, in order to control the focal length of electron beam;
Described D/A converter, is connected with the Circular Winding on described deflection coil, in order to control the deflection of electron beam.
3. the control device realizing electron beam broad width scanning according to claim 2, it is characterized in that, described D/A converter, at least comprise 6 voltage signal output channels, the voltage signal output channel of described D/A converter, read the control voltage data in himself memory in order successively, and synchronism output voltage signal;
If the storage area in described D/A converter is not enough, described D/A converter voltage signal output channel reads the control voltage numerical value be stored in this locality or remote memory in order successively, and synchronism output voltage signal.
4. the control device realizing electron beam broad width scanning according to claim 3, it is characterized in that, described voltage signal is connected with grid by high voltage source, and described voltage signal is connected with winding by drive circuit, and described voltage signal is connected with focus coil by amplifying circuit.
5. one kind increases material manufacturing equipment, it is characterized in that, comprise the control device realizing electron beam broad width scanning as described in any one of Claims 1 to 4 and obturator, and be arranged at powder feeding device, powder paving device, the forming platform of obturator inside;
When described electron beam from negative electrode produce after, successively through grid, anode, disappear astigmatism coil, focus coil and deflection coil, finally enters described obturator;
After described electron beam enters obturator, by described powder feeding device in order to store raw material to be manufactured, and by described powder paving device described raw material to be manufactured are laid in described forming platform and form powder bed;
After described electronics beam is on this metal powder layer, carries out scanning and draw out the cross section of the three-dimensional body that will manufacture or the profile in this cross section.
6. increasing material manufacturing equipment as claimed in claim 5, it is characterized in that, described powder feeding device is a powder feeder be connected with vacuum chamber sidewall, described powder paving device is a Powder spreader being arranged on bottom vacuum chamber, and described forming platform is made up of formation cylinder, piston plate, and described formation cylinder is connected with described Powder spreader, described formation cylinder bottom is provided with piston plate, described can in the vertical direction movable, when described piston plate declines a height, the height of this decline equals the thickness of powder bed.
7. as claimed in claim 5 increase material manufacturing equipment, it is characterized in that, described powder bed comprise in the multiple alloy of titanium alloy, titanium, aluminium alloy, aluminium, titanium-aluminium alloy, stainless steel, Co-Cr alloy one or more.
8., by the method realizing electron beam broad width scanning of the control device described in any one of claim 1-4, after presetting threedimensional model, it is characterized in that, comprise the steps:
Scanning breadth chooses the known point of coordinate as calibration point;
By changing the control voltage exported, make electron beam drop on described calibration point, focus on well, there is no astigmatism, and in interpolation table, record the coordinate value of this calibration point, described control voltage comprises the control voltage of astigmatism, focusing, deflection, repeats until the control voltage of the coordinate value of all calibration points, astigmatism, focusing, deflection is all recorded in interpolation table;
Determine according to the cross section of threedimensional model the scanning pattern that electron beam will perform, get a scanning element along described scanning pattern every a segment distance;
For the described scanning element got, in interpolation table, interpolation operation is carried out according to its coordinate value, determine and record the control voltage of astigmatism corresponding to this scanning element, focusing, the control voltage of deflection and the electronic beam current of this scanning element, until store the control voltage of the electronic beam current of all scanning elements, astigmatism, focusing and deflection;
Synchronously read the data of record, and synchronism output voltage signal, obtain electron beam described in scanning pattern rear drive and scan along given route.
9. the method realizing electron beam broad width scanning according to claim 8, it is characterized in that, on each scanning element, increase power control voltage value, described scanning breadth is square, equidistantly split along X-axis unwrapping wire and Y direction by this scanning breadth, obtain several lattices, the angle point of this grid is the calibration point on scanning breadth.
10. the method realizing electron beam broad width scanning according to claim 8, is characterized in that,
The scanning pattern of described electron beam comprises: the cross section interstitial wire of three-dimensional body, cross section contour and three-dimensional manufacture in the interstitial wire in cross section of necessary supporting construction or outline line, described scanning pattern by equidistantly discrete be a series of scanning element, according to the coordinate of this scanning element, in interpolation table, carry out bilinear transformation interpolation operation, determine 5 control voltage values such as astigmatism, focusing, deflection that this scanning element is corresponding.
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| CN117331385A (en) * | 2023-12-01 | 2024-01-02 | 江苏美特林科特殊合金股份有限公司 | Temperature control method for smelting metal niobium by electron beam |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6534740B1 (en) * | 1998-11-23 | 2003-03-18 | Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and device for scanning the surface of an object with a laser beam |
| WO2013087515A1 (en) * | 2011-12-14 | 2013-06-20 | Alstom Technology Ltd | Method for additively manufacturing an article made of a difficult-to-weld material |
| CN203843168U (en) * | 2014-05-22 | 2014-09-24 | 华中科技大学 | Equipment for high-energy-beam additive manufacturing large-size metal parts |
| CN104404509A (en) * | 2014-11-28 | 2015-03-11 | 中南大学 | Metal laser melting additive manufacturing method |
| CN104635617A (en) * | 2014-12-19 | 2015-05-20 | 中国航空工业集团公司北京航空制造工程研究所 | Cold cathode electronic gun electromagnetic control system and control method thereof |
| CN104759623A (en) * | 2015-03-10 | 2015-07-08 | 清华大学 | Additive manufacturing device allowing electron beam and laser composite scanning |
-
2015
- 2015-11-21 CN CN201510814394.9A patent/CN105328187A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6534740B1 (en) * | 1998-11-23 | 2003-03-18 | Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and device for scanning the surface of an object with a laser beam |
| WO2013087515A1 (en) * | 2011-12-14 | 2013-06-20 | Alstom Technology Ltd | Method for additively manufacturing an article made of a difficult-to-weld material |
| CN203843168U (en) * | 2014-05-22 | 2014-09-24 | 华中科技大学 | Equipment for high-energy-beam additive manufacturing large-size metal parts |
| CN104404509A (en) * | 2014-11-28 | 2015-03-11 | 中南大学 | Metal laser melting additive manufacturing method |
| CN104635617A (en) * | 2014-12-19 | 2015-05-20 | 中国航空工业集团公司北京航空制造工程研究所 | Cold cathode electronic gun electromagnetic control system and control method thereof |
| CN104759623A (en) * | 2015-03-10 | 2015-07-08 | 清华大学 | Additive manufacturing device allowing electron beam and laser composite scanning |
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