CN105296927A - Cleaning method for inner cavity of optical vacuum coating machine - Google Patents
Cleaning method for inner cavity of optical vacuum coating machine Download PDFInfo
- Publication number
- CN105296927A CN105296927A CN201510723567.6A CN201510723567A CN105296927A CN 105296927 A CN105296927 A CN 105296927A CN 201510723567 A CN201510723567 A CN 201510723567A CN 105296927 A CN105296927 A CN 105296927A
- Authority
- CN
- China
- Prior art keywords
- vacuum coating
- optical
- fixture
- inner chamber
- coating equipment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to the field of vacuum coating of optical elements and particularly relates to a cleaning method for an inner cavity of an optical vacuum coating machine. The cleaning method particularly comprises the following steps: (1) cleaning up the inner cavity and a fixture of the optical vacuum coating machine; (2) loading an optical element with qualified boundary dimension and non-required other technical indexes, and plating an isolating membrane in the optical vacuum coating machine, wherein the isolating membrane can be dissolved in an acidy aqueous cleaning liquid, and the thickness of the isolating membrane is 20nm-200nm; (3) taking the optical element coated with the isolating membrane down, loading a qualified optical element, and plating a film layer in the optical vacuum coating machine according to technical requirements; (4) taking the inner cavity and the fixture of the optical vacuum coating machine down after reaching cleaning cycles, cleaning the inner cavity and the fixture in the acidy aqueous cleaning liquid, so as to remove sediments on the surfaces of the inner cavity and the fixture; (5) removing residual acidy aqueous cleaning liquid on the surfaces of the inner cavity and the fixture, baking or drying the inner cavity and the fixture, and mounting the inner cavity and the fixture into the optical vacuum coating machine; and (6) carrying out the next production and cleaning cycle according to the steps (2) to (5). Compared with conventional methods of sand blasting or abrasive cloth polishing and the like, the cleaning method is convenient and rapid, and the damage caused to the inner cavity and the fixture of the optical vacuum coating machine is less.
Description
Technical field
The present invention relates to optical element field of vacuum coating, especially a kind of optical vacuum coating equipment inner chamber cleaning method.
Background technology
In optical element vacuum plating process, while the Coating Materials steam sent by coating source is deposited to plated optical element, also partly can sputters and deposit to coating equipment inner chamber and chucking surface, and with coating times and the increase of time, more tired thicker.And these settlings inner chamber and chucking surface attachment and built on the sand, be very easily shed in optical element film coated process on plated optical element, cause the coating defects of plated optical element.The important component part of optical element vacuum plating work is become by cleaning cycle removing coating equipment inner chamber and chucking surface settling.
Adopting the materials such as silicon-dioxide, titanium dioxide, zirconium dioxide optical element film coated more, general acid cleaning process is adopted to be difficult to removing, the means such as sandblasting, emery cloth polishing must be adopted could to clean totally, not only efficiency low and also to coating equipment inner chamber and fixture damage larger.
Summary of the invention
The object of the invention is to, solve that existing optical element vacuum plating unit inner chamber and fixture are clean must adopt the means such as sandblasting, emery cloth polishing, efficiency is low and to coating equipment inner chamber and the larger problem of fixture damage.A kind of method of convenient and swift clean optics vacuum plating unit inner chamber is provided.
Optical vacuum coating equipment inner chamber cleaning method concrete steps of the present invention are as follows:
(1) optical vacuum coating equipment inner chamber and fixture are cleaned clean;
(2) load profile size qualification and other technical indicator do not make the optical element that requires, are coated with barrier film in optical vacuum coating equipment;
(3) optical element being coated with barrier film is taken off, load qualified optical element, in optical vacuum coating equipment, be coated with rete by its technical requirements;
(4) after optical vacuum coating equipment inner chamber and fixture reach cleaning cycle, optical vacuum coating equipment inner chamber is taken off and fixture cleans in acidic aqueous scavenging solution, removing inner chamber and chucking surface settling;
(5) remove the acidic aqueous scavenging solution of optical vacuum coating equipment inner chamber and chucking surface remnants, dry or dry optical vacuum coating equipment inner chamber and fixture, inner chamber and fixture are loaded optical vacuum coating equipment;
(6) next is produced and cleaning cycle to carry out optical element vacuum plating by step (2) ~ (5).
Barrier film of the present invention is dissolve in the composition of one or more in the metallic membrane of acidic aqueous scavenging solution, oxide film or fluoride films, and thicknesses of layers is 20 ~ 200nm.
Embodiment
Not implement example below in conjunction with tool, set forth the present invention further.
Embodiment 1
Optical vacuum coating equipment inner chamber cleaning method concrete steps are as follows:
(1) will optical vacuum coating equipment inner chamber and fixture that cleaning cycle need clean be reached, remove resistates with emery cloth removing surface deposits with tap water, clean clean;
(2) load profile size qualification but the underproof optical element of other technical indicator, is coated with the aluminium barrier film that thickness is 50 ± 10nm in optical vacuum coating equipment;
(3) optical element being coated with aluminium barrier film is taken off, load qualified optical element, in optical vacuum coating equipment, be coated with rete by its technical requirements;
(4) after optical vacuum coating equipment inner chamber and fixture reach the cleaning cycle of 15 days, take off optical vacuum coating equipment inner chamber and fixture is clean in the aqueous hydrochloric acid of 5% in mass percentage concentration, aluminium barrier film and hydrochloric acid react, and inner chamber and chucking surface settling come off;
(5) use tap water rinse three times, and with speckling with dehydrated alcohol wiping, the hydrochloric acid of removing optical vacuum coating equipment inner chamber and chucking surface remnants, dries optical vacuum coating equipment inner chamber and fixture, inner chamber and fixture are loaded optical vacuum coating equipment;
(6) next is produced and cleaning cycle to carry out optical element vacuum plating by step (2) ~ (5).
Present method removing optical vacuum coating equipment inner chamber and chucking surface settling are without the need to sandblasting or emery cloth polishing, convenient and swift, and damage less to coating equipment inner chamber and fixture.
Embodiment 2
Optical vacuum coating equipment inner chamber cleaning method concrete steps are as follows:
(1) will reach optical vacuum coating equipment inner chamber and fixture that cleaning cycle need clean, sandblasting removing surface deposits also removes resistates with tap water, clean clean;
(2) load profile size qualification but the underproof optical element of other technical indicator, is coated with the zinc oxide barrier film that thickness is 150 ± 10nm in optical vacuum coating equipment;
(3) optical element being coated with aluminium barrier film is taken off, load qualified optical element, in optical vacuum coating equipment, be coated with rete by its technical requirements;
(4) after optical vacuum coating equipment inner chamber and fixture reach the cleaning cycle of 15 days, take off optical vacuum coating equipment inner chamber and fixture is clean in the aqueous hydrochloric acid of 4% in mass percentage concentration, zinc oxide barrier film and hydrochloric acid react, and inner chamber and chucking surface settling come off;
(5) spend pure water rinsing three times, the hydrochloric acid of removing optical vacuum coating equipment inner chamber and chucking surface remnants, dry optical vacuum coating equipment inner chamber and fixture, inner chamber and fixture are loaded optical vacuum coating equipment;
(6) next is produced and cleaning cycle to carry out optical element vacuum plating by step (2) ~ (5).
Present method removing optical vacuum coating equipment inner chamber and chucking surface settling are without the need to sandblasting or emery cloth polishing, convenient and swift, and damage less to coating equipment inner chamber and fixture.
Claims (3)
1. an optical vacuum coating equipment inner chamber cleaning method, is characterized in that this cleaning method concrete steps are as follows:
(1) optical vacuum coating equipment inner chamber and fixture are cleaned clean;
(2) load profile size qualification and other technical indicator do not make the optical element that requires, are coated with barrier film in optical vacuum coating equipment;
(3) optical element being coated with barrier film is taken off, load qualified optical element, in optical vacuum coating equipment, be coated with rete by its technical requirements;
(4) after optical vacuum coating equipment inner chamber and fixture reach cleaning cycle, optical vacuum coating equipment inner chamber is taken off and fixture cleans in acidic aqueous scavenging solution, removing inner chamber and chucking surface settling;
(5) remove the acidic aqueous scavenging solution of optical vacuum coating equipment inner chamber and chucking surface remnants, dry or dry optical vacuum coating equipment inner chamber and fixture, inner chamber and fixture are loaded optical vacuum coating equipment;
(6) next is produced and cleaning cycle to carry out optical element vacuum plating by step (2) ~ (5).
2. optical vacuum coating equipment inner chamber cleaning method as claimed in claim 1, is characterized in that described barrier film is dissolve in the composition of one or more in the metallic membrane of acidic aqueous scavenging solution, oxide film or fluoride films.
3. optical vacuum coating equipment inner chamber cleaning method as claimed in claim 1, is characterized in that described barrier film thicknesses of layers is 20 ~ 200nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510723567.6A CN105296927A (en) | 2015-10-29 | 2015-10-29 | Cleaning method for inner cavity of optical vacuum coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510723567.6A CN105296927A (en) | 2015-10-29 | 2015-10-29 | Cleaning method for inner cavity of optical vacuum coating machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105296927A true CN105296927A (en) | 2016-02-03 |
Family
ID=55194728
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510723567.6A Pending CN105296927A (en) | 2015-10-29 | 2015-10-29 | Cleaning method for inner cavity of optical vacuum coating machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105296927A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106702319A (en) * | 2017-03-30 | 2017-05-24 | 京东方科技集团股份有限公司 | Evaporation method |
| CN108517494A (en) * | 2018-05-22 | 2018-09-11 | 桑尼光电技术（安徽）有限公司 | A kind of optical vacuum coating machine inner cavity clean method |
| CN112011759A (en) * | 2020-08-24 | 2020-12-01 | 宁波中骏森驰汽车零部件股份有限公司 | PVD vacuum coating machine and electroplating cleaning process |
| CN112144036A (en) * | 2020-08-24 | 2020-12-29 | 宁波中骏森驰汽车零部件股份有限公司 | PVD vacuum coating machine |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103290355A (en) * | 2012-02-14 | 2013-09-11 | 金文焕 | Cleaning method of part of physical vapor deposition reaction chamber |
| CN103406300A (en) * | 2007-06-28 | 2013-11-27 | 量子全球技术有限公司 | Method and apparatus for cleaning deposition chamber parts using selective spray etch |
| US20140299058A1 (en) * | 2010-12-27 | 2014-10-09 | Sharp Kabushiki Kaisha | Deposition device, and collection device |
-
2015
- 2015-10-29 CN CN201510723567.6A patent/CN105296927A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103406300A (en) * | 2007-06-28 | 2013-11-27 | 量子全球技术有限公司 | Method and apparatus for cleaning deposition chamber parts using selective spray etch |
| US20140299058A1 (en) * | 2010-12-27 | 2014-10-09 | Sharp Kabushiki Kaisha | Deposition device, and collection device |
| CN103290355A (en) * | 2012-02-14 | 2013-09-11 | 金文焕 | Cleaning method of part of physical vapor deposition reaction chamber |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106702319A (en) * | 2017-03-30 | 2017-05-24 | 京东方科技集团股份有限公司 | Evaporation method |
| CN108517494A (en) * | 2018-05-22 | 2018-09-11 | 桑尼光电技术（安徽）有限公司 | A kind of optical vacuum coating machine inner cavity clean method |
| CN112011759A (en) * | 2020-08-24 | 2020-12-01 | 宁波中骏森驰汽车零部件股份有限公司 | PVD vacuum coating machine and electroplating cleaning process |
| CN112144036A (en) * | 2020-08-24 | 2020-12-29 | 宁波中骏森驰汽车零部件股份有限公司 | PVD vacuum coating machine |
| CN112011759B (en) * | 2020-08-24 | 2022-06-21 | 宁波中骏森驰汽车零部件股份有限公司 | PVD vacuum coating machine |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6686164B2 (en) | Coated semiconductor processing components having chlorine and fluorine plasma corrosion resistance, and complex oxide coatings therefor | |
| CN105296927A (en) | Cleaning method for inner cavity of optical vacuum coating machine | |
| TWI601637B (en) | Rare-earth oxide based erosion resistant coatings for semiconductor application | |
| TWI403368B (en) | Immersive oxidation and etching process for cleaning silicon electrodes | |
| JP5324160B2 (en) | Wet clean process for regenerating anodizing chamber parts | |
| CN101381877B (en) | Method for cleaning precision parts | |
| CN100566859C (en) | A kind of removal is attached to the cleaning method of anodised aluminium piece surface thin polymer film | |
| TW200905745A (en) | Methodology for cleaning of surface metal contamination from electrode assemblies | |
| CN109092792A (en) | A kind of ceramic substrate surface processing method | |
| CN101219429A (en) | Method for cleaning quartz parts surface in polycrystal etching cavity | |
| CN107400842B (en) | The electric arc combined coat processing method of semiconductor device | |
| CN101205621B (en) | Method for cleaning aluminium parts | |
| CN105648412A (en) | Glass surface treatment technology | |
| CN114211405A (en) | Cleaning method for removing fluoride on surface of aluminum substrate | |
| CN103160843A (en) | Process for removing welding stopping agent in TC4 titanium alloy superplastic forming | |
| JP6902559B2 (en) | Cleaning process to precipitate oxyfluoride | |
| CN102087954A (en) | Wafer cleaning method | |
| CN105092348A (en) | Application method of novel 1-series aluminium alloy (pure aluminium series) erosion solution | |
| TW583149B (en) | Quartz article having sand blast-treated surface and method for cleaning the same | |
| TWI509108B (en) | Selective etching of reactor surfaces | |
| TW201325744A (en) | Method for treating pollutant of workpiece provided with yttrium oxide coating layer | |
| KR101629336B1 (en) | Method for cleaning aluminum member | |
| CN109490051A (en) | A kind of etching pit method of 5A06 aluminium alloy | |
| TW201446346A (en) | Wet cleaning of chamber component | |
| CN103305888A (en) | Anodic oxidation treatment method for aerial aluminum alloy surface |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20160203 |
|
| WD01 | Invention patent application deemed withdrawn after publication |