CN105278155B - 量子点彩膜基板的制作方法 - Google Patents
量子点彩膜基板的制作方法 Download PDFInfo
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- CN105278155B CN105278155B CN201510860705.5A CN201510860705A CN105278155B CN 105278155 B CN105278155 B CN 105278155B CN 201510860705 A CN201510860705 A CN 201510860705A CN 105278155 B CN105278155 B CN 105278155B
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- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
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- G02F2202/00—Materials and properties
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
本发明提供一种量子点彩膜基板的制作方法,借由含光催化剂的润湿性变化层经紫外光照射后其润湿性会变好的特点,形成高精细的量子点图形,简化量子点图形制作工艺的同时提升了量子点图形的精度,制作工艺简单,且减少了量子点材料的浪费,节约成本,所制得的量子点彩膜基板可有效提升显示装置的色饱和度与色域,增强显示面板的色彩表现能力。
Description
技术领域
本发明涉及显示技术领域,尤其涉及一种量子点彩膜基板的制作方法。
背景技术
随着显示技术的不断发展,人们对显示装置的显示质量要求也越来越高。量子点(Quantum Dots,简称QDs)通常是由Ⅱ-Ⅵ、或Ⅲ-Ⅴ族元素组成的球形或类球形的半导体纳米微粒,粒径一般在几纳米至数十纳米之间。由于QDs的粒径尺寸小于或者接近相应体材料的激子波尔半径,会产生量子限域效应,其能级结构从体材料的准连续变为量子点材料的离散结构,导致QDs展示出特殊的受激辐射发光的性能。随着QDs的尺寸减小,其能级带隙增加,相应的QDs受激所需要的能量以及QDs受激后回到基态放出的能量都相应的增大,表现为QDs的激发与荧光光谱的“蓝移”现象,通过控制QDs的尺寸,使其发光光谱可以覆盖整个可见光区域。如硒化镉(CdSe)的尺寸从6.6nm减小至2.0nm,其发光波长从红光区域635nm“蓝移”至蓝光区域的460nm。
量子点材料具有发光光谱集中,色纯度高、且发光颜色可通过量子点材料的尺寸、结构或成分进行简易调节等优点,利用这些优点将其应用在显示装置中可有效地提升显示装置的色域及色彩还原能力。如专利CN 102944943A、及专利US20150002788A1均提出了用具有图案结构的量子点层替代彩色滤光膜(Color Filter)以达到彩色显示目的的技术方案,但是该些专利并未对量子点层图形化的方法进行说明。
专利CN103226260A提供了一种把量子点分散于光刻胶中,通过光刻工艺图形化量子点层的方法,但量子点分散于光刻胶中,由于光刻胶中具有起始剂(initiation)、聚合物单体(monomer)、聚合物(polymer)、添加剂(additive)等多种高分子材料,量子点的表面化学环境复杂,对量子点的发光效率影响很大。除上述方法以外,还可以通过转印、网印等方法来制作量子点图形,但是转印的方法所得到的量子点图形分辨率不高,图形边缘呈现锯齿状,并且量子点层与基体的黏着力有待提高;而喷墨打印形成图形化量子点层的方法对喷墨打印设备要求很高,如何保证喷墨墨滴的稳定性及打印精度仍有技术壁垒,仍不能大规模生产。
发明内容
本发明的目的在于提供一种量子点彩膜基板的制作方法,借由含光催化剂的润湿性变化层经紫外光照射后其润湿性会变好的特点,形成高精细的量子点图形,制作工艺简单、量子点层图形精度高。
为实现上述目的,本发明提供了量子点彩膜基板的制作方法,包括如下步骤:
步骤1、提供彩膜基板,所述彩膜基板包括衬底基板、位于所述衬底基板上的黑色矩阵、及彩色滤光层,所述彩色滤光层包括红色色阻层、绿色色阻层、及透明光阻层;
步骤2、提供润湿变化剂,所述润湿变化剂包括以下组分:光催化剂、有机聚硅氧烷、及溶剂;在所述黑色矩阵、及彩色滤光层上涂布一层润湿性变化剂,并随后对该层润湿性变化剂做真空干燥处理,以去除其中的溶剂,得到润湿变化层;
步骤3、提供光罩,利用所述光罩对所述润湿变化层做紫外光曝光处理,其中,所述光罩上对应所述红色色阻层、绿色色阻层的部分为透光的部分,所述润湿变化层对应所述红色色阻层、绿色色阻层的第一部分在该步骤中受到紫外光照射,其内发生反应,使其润湿性得到改善,所述光罩上对应所述透明光阻层的部分为不透光的部分,所述润湿变化层对应所述透明光阻层的第二部分在该步骤中未受到紫外光照射,其润湿性没有发生改变;
步骤4、在所述润湿变化层上涂布一层量子点涂布液,所述量子点涂布液包括以下组分:量子点、与量子点表面进行配位的量子点配体、溶剂、及添加剂;由于所述润湿变化层的第一部分经紫外光处理后润湿性得以提高,相对的,所述润湿变化层的第一部分比第二部分的润湿性好,量子点涂布液在所述润湿变化层的第二部分的表面具有很大的润湿角无法很好地润湿,而量子点涂布液在所述润湿变化层的第一部分的表面能够很好地润湿,在重力的综合作用下该层量子点涂布液不会停留在所述润湿变化层的第二部分上,而会分布在所述润湿变化层的第一部分上,从而形成量子点图形;
步骤5、对形成量子点图形的量子点涂布液进行加热处理,使其固化,得到图形化的量子点层;
步骤6、在所述量子点层上形成透明导电层;进而完成量子点彩膜基板的制作。
所述润湿变化剂中,所述光催化剂为TiO2、ZnO、或SnO2,所述光催化剂的粒径为10-50nm。
所述润湿变化剂中,所述有机聚硅氧烷为含氟烷基的聚硅氧烷。
所述润湿变化剂中,所述溶剂为甲醇、乙醇、异丙醇、丙酮、乙二醇二甲醚、乙二醇单***、醋酸甲酯、醋酸乙酯、醋酸丁酯、甲苯、二甲苯中的一种或多种的组合。
所述量子点涂布液中,所述量子点为核壳结构,所述量子点的材料选自Ⅱ-Ⅵ族半导体材料、Ⅲ-Ⅴ族半导体材料、和Ⅳ-Ⅵ族纳米半导体材料。
所述量子点涂布液中,所述量子点的粒径为1-10nm之间。
所述量子点涂布液中,所述量子点配体为三正辛基膦、或三正辛基氧化膦。
所述量子点涂布液中,所述溶剂为二甲苯、甲苯、环己基苯、三甲苯、吡啶、吡咯、己烷、戊烷、环己烷中的一种或多种的组合。
所述量子点涂布液中,所述量子点包括分别发红光、绿光的红色量子点、与绿色量子点。
所述步骤6中所得到的量子点彩膜基板用于背光为蓝光的显示装置中
本发明的有益效果:本发明提供了一种量子点彩膜基板的制作方法,借由含光催化剂的润湿性变化层经紫外光照射后其润湿性会变好的特点,形成高精细的量子点图形,简化量子点图形制作工艺的同时提升了量子点图形的精度,制作工艺简单,且减少了量子点材料的浪费,节约成本,所制得的量子点彩膜基板可有效提升显示装置的色饱和度与色域,增强显示面板的色彩表现能力。
附图说明
下面结合附图,通过对本发明的具体实施方式详细描述,将使本发明的技术方案及其他有益效果显而易见。
附图中,
图1为本发明的量子点彩膜基板的制作方法的流程示意图;
图2为本发明的量子点彩膜基板的制作方法的步骤2的示意图;
图3为本发明的量子点彩膜基板的制作方法的步骤3的示意图;
图4为本发明的量子点彩膜基板的制作方法的步骤4的示意图;
图5为本发明的量子点彩膜基板的制作方法的步骤5的示意图;
图6为本发明的量子点彩膜基板的制作方法的步骤6的示意图;
图7为本发明制得的量子点彩膜基板用于显示装置中进行彩色显示的示意图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果,以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图1,本发明提供一种量子点彩膜基板的制作方法,包括如下步骤:
步骤1、提供彩膜基板,所述彩膜基板包括衬底基板11、位于所述衬底基板11上的黑色矩阵12、及彩色滤光层13,所述彩色滤光层13包括红色色阻层131、绿色色阻层132、及透明光阻层133;
具体的,所述衬底基板11为玻璃基板。
步骤2、提供润湿变化剂,所述润湿变化剂包括以下组分:光催化剂、有机聚硅氧烷、及溶剂;如图2所示,在所述黑色矩阵12、及彩色滤光层13上涂布一层润湿性变化剂,并随后对该层润湿性变化剂做真空干燥处理,以去除其中的溶剂,得到润湿变化层14;
具体的,所述润湿变化剂中,所述光催化剂选用TiO2、ZnO、SnO2、或其他等光催化剂,其粒径优选为10-50nm;所述有机聚硅氧烷优选为含氟烷基的聚硅氧烷,此类聚硅氧烷具有很低的表面能,可有效提升润湿性变化层14的抗液性;所述溶剂可在甲醇、乙醇、异丙醇、丙酮、乙二醇二甲醚、乙二醇单***、醋酸甲酯、醋酸乙酯、醋酸丁酯、甲苯、二甲苯等中选择一种或多种混合使用。
步骤3、如图3所示,提供光罩50,利用所述光罩50对所述润湿变化层14做紫外光曝光处理,其中,所述光罩50上对应所述红色色阻层131、绿色色阻层132的部分为透光的部分,所述润湿变化层14对应所述红色色阻层131、绿色色阻层132的第一部分141在该步骤中受到紫外光照射,其内发生反应,使其润湿性得到改善,所述光罩50上对应所述透明光阻层133的部分52为不透光的部分,所述润湿变化层14对应所述透明光阻层133的第二部分142在该步骤中未受到紫外光照射,其润湿性没有发生改变;
具体的,所述润湿变化层14的第一部分141在该步骤中受到紫外光照射其内发生反应,使其润湿性得到改善的原理为:润湿性变化层14的第一部分141中的光催化剂在紫外光的照射下产生电子-空穴对,这些电子-空穴对与周边物质发生反应生成超氧化自由基或羟基自由基等活性氧种,这些活性氧种与聚硅氧烷作用使其润湿性得到改善,进而使润湿性变化层14的第一部分141的润湿性得到改善。
步骤4、如图4所示,在所述润湿变化层14上涂布一层量子点涂布液,所述量子点涂布液包括以下组分:表面配位有量子点配体的量子点、溶剂、及添加剂;由于所述润湿变化层14的第一部分141经紫外光处理后润湿性得以提高,相对的,所述润湿变化层14的第一部分141比第二部分142的润湿性好,量子点涂布液在所述润湿变化层14的第二部分142的表面具有很大的润湿角无法很好地润湿,而量子点涂布液在所述润湿变化层14的第一部分141的表面能够很好地润湿,在重力的综合作用下该层量子点涂布液不会停留在所述润湿变化层14的第二部分142上,而会分布在所述润湿变化层14的第一部分141上,从而形成量子点图形;
具体的,所述量子点涂布液中,溶剂主要由二甲苯、甲苯、环己基苯、三甲苯、吡啶、吡咯、己烷、戊烷、环己烷等溶剂中的一种或多种组成;量子点主要由Ⅱ-Ⅵ族半导体材料(如:CdS、CdSe、HgTe、ZnS、ZnSe、ZnTe、HgS等)、Ⅲ-Ⅴ族半导体材料(如:InP、InAs、GaP、GaAs等)或Ⅳ-Ⅵ族纳米半导体材料组成的核壳结构的量子点,上述量子点的粒径最优选在1-10nm之间;量子点配体可选择常用的量子点配体如三正辛基膦(TOP)、三正辛基氧化膦(TOPO)等中的一种。
步骤5、如图5所示,对形成量子点图形的量子点涂布液进行加热处理,使其固化,得到图形化的量子点层15;
步骤6、如图6所示,在所述量子点层15上形成透明导电层16;进而完成量子点彩膜基板10的制作。
具体的,提供TFT基板20,在所述量子点彩膜基板10与TFT基板20上分别设置上偏光片41与下偏光片42;并经过液晶成盒制程后可得到量子点显示面板;具体的,所述量子点显示面板的结构简图如图7所示,包括量子点彩膜基板10、与所述量子点彩膜基板10相对设置的TFT基板20、密封于所述量子点彩膜基板10与TFT基板20之间的液晶层30、位于所述量子点彩膜基板10一侧的上偏光片41、及位于所述TFT基板20一侧的下偏光片42;其中,所述上偏光片41采用内置式的偏光片,如染料系偏光片等,所述上偏光片41设置于所述量子点彩膜基板10面对所述TFT基板20的一侧;所述下偏光片42采用内置式或外置式,所述下偏光片设置于所述TFT基板20面对或远离所述量子点彩膜基板10的一侧;所述下偏光片42的偏振方向与上偏光片41的偏振方向垂直。
具体的,所述量子点涂布液中,所述量子点包括分别发红光、绿光的红色量子点与绿色量子点,即所形成的量子点层14中包含红色量子点与绿色量子点;所述步骤6中所得到的量子点彩膜基板10用于背光为蓝光的显示装置中,如图7所示,包括量子点彩膜基板10的显示面板用于背光为蓝光的显示装置中进行显示时,背光模组2发出蓝光背光,在蓝色背光的激发下,混有红色与绿色量子点的量子点层14会发出半高宽很窄的红、绿混合光,该混合光随后经过红色色阻层131、绿色色阻层132后分别被滤成高纯度的红色与绿色单色光而分别显红色、绿色;而对应透明光阻层133位置由于没有量子点层覆盖而直接透过蓝色背光而显蓝色;最终提供了彩色显示所需的红、绿、蓝三原色,实现了彩色显示,并能够有效提高显示色域指数,且所述量子点层14内不包含蓝色量子点材料,将蓝光背光与透明光阻层的搭配使用,在提高光利用率的情况下同时缩减了材料成本。
综上所述,本发明提供了一种量子点彩膜基板的制作方法,借由含光催化剂的润湿性变化层经紫外光照射后其润湿性会变好的特点,形成高精细的量子点图形,简化量子点图形制作工艺的同时提升了量子点图形的精度,制作工艺简单,且减少了量子点材料的浪费,节约成本,所制得的量子点彩膜基板可有效提升显示装置的色饱和度与色域,增强显示面板的色彩表现能力。
以上所述,对于本领域的普通技术人员来说,可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形,而所有这些改变和变形都应属于本发明权利要求的保护范围。
Claims (10)
1.一种量子点彩膜基板的制作方法,其特征在于,包括如下步骤:
步骤1、提供彩膜基板,所述彩膜基板包括衬底基板(11)、位于所述衬底基板(11)上的黑色矩阵(12)、及彩色滤光层(13),所述彩色滤光层(13)包括红色色阻层(131)、绿色色阻层(132)、及透明光阻层(133);
步骤2、提供润湿变化剂,所述润湿变化剂包括以下组分:光催化剂、有机聚硅氧烷、及溶剂;在所述黑色矩阵(12)、及彩色滤光层(13)上涂布一层润湿性变化剂,并随后对该层润湿性变化剂做真空干燥处理,以去除其中的溶剂,得到润湿变化层(14);
步骤3、提供光罩(50),利用所述光罩(50)对所述润湿变化层(14)做紫外光曝光处理,其中,所述光罩(50)上对应所述红色色阻层(131)、绿色色阻层(132)的部分为透光的部分,所述润湿变化层(14)对应所述红色色阻层(131)、绿色色阻层(132)的第一部分(141)在该步骤中受到紫外光照射,其内发生反应,使其润湿性得到改善,所述光罩(50)上对应所述透明光阻层(133)的部分(52)为不透光的部分,所述润湿变化层(14)对应所述透明光阻层(133)的第二部分(142)在该步骤中未受到紫外光照射,其润湿性没有发生改变;
步骤4、在所述润湿变化层(14)上涂布一层量子点涂布液,所述量子点涂布液包括以下组分:量子点、与量子点表面进行配位的量子点配体、溶剂、及添加剂;由于所述润湿变化层(14)的第一部分(141)经紫外光处理后润湿性得以提高,相对的,所述润湿变化层(14)的第一部分(141)比第二部分(142)的润湿性好,量子点涂布液在所述润湿变化层(14)的第二部分(142)的表面具有很大的润湿角无法很好地润湿,而量子点涂布液在所述润湿变化层(14)的第一部分(141)的表面能够很好地润湿,在重力作用下该层量子点涂布液不会停留在所述润湿变化层(14)的第二部分(142)上,而会分布在所述润湿变化层(14)的第一部分(141)上,从而形成量子点图形;
步骤5、对形成量子点图形的量子点涂布液进行加热处理,使其固化,得到图形化的量子点层(15);
步骤6、在所述量子点层(15)上形成透明导电层(16);进而完成量子点彩膜基板(10)的制作。
2.如权利要求1所述的量子点彩膜基板的制作方法,其特征在于,所述润湿变化剂中,所述光催化剂为TiO2、ZnO、或SnO2,所述光催化剂的粒径为10-50nm。
3.如权利要求1所述的量子点彩膜基板的制作方法,其特征在于,所述润湿变化剂中,所述有机聚硅氧烷为含氟烷基的聚硅氧烷。
4.如权利要求1所述的量子点彩膜基板的制作方法,其特征在于,所述润湿变化剂中,所述溶剂为甲醇、乙醇、异丙醇、丙酮、乙二醇二甲醚、乙二醇单***、醋酸甲酯、醋酸乙酯、醋酸丁酯、甲苯、二甲苯中的一种或多种的组合。
5.如权利要求1所述的量子点彩膜基板的制作方法,其特征在于,所述量子点涂布液中,所述量子点为核壳结构,所述量子点的材料选自Ⅱ-Ⅵ族半导体材料、Ⅲ-Ⅴ族半导体材料、和Ⅳ-Ⅵ族纳米半导体材料。
6.如权利要求5所述的量子点彩膜基板的制作方法,其特征在于,所述量子点涂布液中,所述量子点的粒径为1-10nm之间。
7.如权利要求1所述的量子点彩膜基板的制作方法,其特征在于,所述量子点涂布液中,所述量子点配体为三正辛基膦、或三正辛基氧化膦。
8.如权利要求1所述的量子点彩膜基板的制作方法,其特征在于,所述量子点涂布液中,所述溶剂为二甲苯、甲苯、环己基苯、三甲苯、吡啶、吡咯、己烷、戊烷、环己烷中的一种或多种的组合。
9.如权利要求1所述的量子点彩膜基板的制作方法,其特征在于,所述量子点涂布液中,所述量子点包括分别发红光、绿光的红色量子点、与绿色量子点。
10.如权利要求9所述的量子点彩膜基板的制作方法,其特征在于,所述步骤6中所得到的量子点彩膜基板(10)用于背光为蓝光的显示装置中。
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CN105733557B (zh) * | 2016-04-22 | 2017-12-29 | 深圳市华星光电技术有限公司 | 配体修饰量子点材料、液晶显示面板的制作方法及液晶显示面板 |
CN105845028A (zh) * | 2016-05-19 | 2016-08-10 | 信利(惠州)智能显示有限公司 | 一种透明导电薄膜和纳米银线在显示器中的应用 |
CN106356463B (zh) * | 2016-10-11 | 2017-12-29 | 深圳市华星光电技术有限公司 | Qled显示装置的制作方法 |
KR102282060B1 (ko) * | 2017-05-23 | 2021-07-27 | 삼성디스플레이 주식회사 | 표시 장치 및 그 제조 방법 |
CN109266350B (zh) * | 2017-07-17 | 2020-11-24 | 京东方科技集团股份有限公司 | 配体修饰量子点组合物及其制备方法、量子点发光二极管 |
KR102504559B1 (ko) | 2017-11-17 | 2023-03-02 | 삼성디스플레이 주식회사 | 표시 장치 및 이의 제조 방법 |
CN109786431B (zh) * | 2019-02-25 | 2021-10-22 | 京东方科技集团股份有限公司 | 显示基板及其制备方法、和显示装置 |
CN111061084B (zh) * | 2019-12-05 | 2020-12-04 | Tcl华星光电技术有限公司 | 彩膜基板的制备方法及彩膜基板 |
CN112342013B (zh) * | 2019-12-30 | 2022-03-29 | 广东聚华印刷显示技术有限公司 | 量子点薄膜及其制备方法和应用 |
CN112965287B (zh) * | 2020-05-08 | 2022-11-29 | 重庆康佳光电技术研究院有限公司 | 一种彩膜基板的制备方法、显示装置与显示背板 |
WO2022177222A1 (ko) * | 2021-02-17 | 2022-08-25 | 한국과학기술원 | 증발 역학과 표면에너지 제어를 활용한 균일한 표면의 다중 나노입자 프린팅 방법 |
CN113359343A (zh) * | 2021-06-11 | 2021-09-07 | 深圳市华星光电半导体显示技术有限公司 | 量子点彩色滤光片及制作方法、显示面板及制作方法 |
CN113956517A (zh) * | 2021-10-13 | 2022-01-21 | 淮阴工学院 | 一种多功能被动辐射冷却薄膜的制备方法 |
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