CN105239038B - A kind of organic vapors film formation device and its film build method using figure nozzle - Google Patents
A kind of organic vapors film formation device and its film build method using figure nozzle Download PDFInfo
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- CN105239038B CN105239038B CN201410251897.5A CN201410251897A CN105239038B CN 105239038 B CN105239038 B CN 105239038B CN 201410251897 A CN201410251897 A CN 201410251897A CN 105239038 B CN105239038 B CN 105239038B
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Abstract
The invention discloses a kind of organic vapors film formation device using figure nozzle, the jet-printing head connected including evaporation cavity, with evaporation cavity and the baseplate carrier with jet-printing head at a distance of certain interval, the controlled relative jet-printing head of baseplate carrier move linearly along jet-printing head major axes orientation, with third direction vertical with horizontal direction in the horizontal direction and plane in jet-printing head main shaft vertical plane respectively.Jet-printing head includes jet-printing head matrix, the heating mantle for coating jet-printing head matrix, the figure nozzle positioned at jet-printing head matrix one end, the hybrid chamber connected with figure nozzle and the gas access of the connection evaporation cavity and hybrid chamber.The opening of figure nozzle has definite shape, evaporation cavity is used for the hybrid chamber that vaporizing solid organic material obtains gas phase organic material and enters jet-printing head by the gas access of jet-printing head, then it is ejected into by figure nozzle on the substrate of baseplate carrier, to prepare the opening shape identical graphic films with figure nozzle.
Description
Technical field
The invention belongs to organic vapor phase deposition film forming field, more particularly to a kind of organic gas using figure nozzle
Phase film formation device and its film build method.
Background technology
At present, the vacuum vapor deposition film build method of organic material is mainly vacuum thermal evaporation (Vacuum Thermal
Evaporation, VTE), its principle schematic as shown in Figure 1, in Fig. 1：Heating organic material is allowed to steam in the vacuum chamber
Hair, substrate is placed on top of hundreds of millimeters away from evaporation source, and the organic vapors material evaporated upwards passes through with certain figure
Graphical film is formed after shadowmask.This method must be noted that the size and position precision of shadowmask, otherwise deposit
Pattern errors it is big and uneven, simultaneously because most of organic material is adhered to cavity wall, its stock utilization only 5%, deposition
Particle contamination can be brought in the organic material of cavity wall, it is therefore desirable to periodic cleaning shadowmask.
Based on VTE technologies, organic vapor phase deposition (Organic Vapor Phase Deposition, OVPD) skill is developed
Art, the principle schematic of the technology as shown in Figure 2, in Fig. 2：After organic material heating evaporation, using inert gas by gas
Phase organic molecule sprays to substrate via spray head, and the shadow mask with certain figure opening is laid between spray head and substrate and is covered
Mould, as carrier gas, its stock utilization, up to 50%, it is traditional vacuum as a result of inert gas to obtain graphical film
10 times of thermal evaporation techniques.But graphic feature is defined, it is necessary to which shadowmask has higher dimensional precision, example by shadowmask
Such as, when requiring that figure has 40 μm of feature, it is necessary to using 10 μm~15 μm features metal shadow mask mask, while shadow mask is covered
Distance is about 10~15 μm between mould and substrate.In OVPD technologies, about 200~350 DEG C of its carrier gas temperature, shadowmask is caused to grow
Phase is under higher operating temperature, while the large area shadowmask jaw own wt of thinner thickness is larger, swollen in high warm
Under the swollen and collective effect of gravity, the shadowmask of thinner thickness easily deforms, and causes to influence dimensional accuracy and shape, together
When also influence gap between shadowmask and substrate.In addition, gas is by that can produce obvious lateral point after metal shutter
Dissipate so that widen into film pattern and center is thickening.3rd, its waste of material is still larger, up to 50%, and shadowmask
On also easy deposition organic matter, be also easy to produce particle contamination and need periodic cleaning shadowmask during film forming.
When VTE and OVPD technologies prepare graphical organic film, it is required for using shadowmask, is opened up in shadowmask
There is the opening that the machine material gas of being provided with passes through, these openings have predetermined shape.In both technologies, come from organic material
The organic vapors material of evaporation source is divided into two parts, and a portion deposits through the opening in shadowmask on substrate,
Being formed and have effigurate organic film, the shape of the organic film of formation is identical with the shape of shadowmask upper shed, this
It is achieved that graphical film forming；Another part is not passed through the opening in shadowmask, is directly deposited on shadowmask surface, just
The organic material for being deposited on shadowmask causes particle contamination, and so as to influence quality of forming film, therefore, it is necessary to periodic cleaning is shady
Cover mask.Meanwhile the organic material for being deposited on shadowmask surface is exactly to use the waste caused by shadowmask technology, in shade
On cover mask, the gross area of figure opening is far smaller than shadowmask total surface area, and this causes using the true of shadowmask
The stock utilization of empty thermal evaporation and organic vapor phase deposition technology is very low.
The content of the invention
For the disadvantages described above or Improvement requirement of prior art, the invention provides a kind of organic gas using figure nozzle
Phase film formation device and its film build method, its object is to gas phase organic material is sprayed by figure nozzle prepare figure with
The graphical film of opening shape identical of figure nozzle, the stock utilization that thus solves to bring using shadowmask is low,
The technical problems such as grain pollution.
To achieve the above object, according to one aspect of the present invention, there is provided a kind of organic vapors using figure nozzle
Film formation device, for preparing the organic film with certain figure, it includes evaporation cavity, positioned at described evaporation cavity one end and therewith
The jet-printing head of connection and the baseplate carrier with jet-printing head at a distance of certain interval, it is characterised in that：
The jet-printing head includes jet-printing head matrix, the heating mantle of the cladding jet-printing head matrix, positioned at shown jet-printing head base
The figure nozzle of body one end, connected with figure nozzle and positioned at the jet-printing head matrix centre position hybrid chamber, it is one
Hollow cavity, and positioned at the jet-printing head matrix other end and the gas access that is placed in jet-printing head matrix, its one end
Connected with the hybrid chamber, the other end connects with the evaporation cavity, is entered for the gas of evaporation cavity by the gas access
The hybrid chamber；
The figure nozzle has opening shape, and its shape is identical with the figure of prepared organic film；
The evaporation cavity is used for vaporizing solid organic material to obtain gas phase organic material, and is entered by the gas access
Enter the hybrid chamber, be then ejected into by the figure nozzle on the substrate of the baseplate carrier, schemed for preparing
Shape and the opening shape identical film of figure nozzle.
Further, the opening shape of the figure nozzle is the possible shape of any planar graph.
Further, the figure nozzle is removably connected on the jet-printing head matrix, its open amount be one or
Multiple, its all opening is respectively positioned in same plane, and where the plane at its opening place and the substrate of the baseplate carrier
Plane is parallel.
Further, the evaporation cavity includes：
Metal sleeve；
Heating mantle, the metal sleeve is enveloped, for heat temperature raising；
Cylinder of quartz glass, it is placed in the metal sleeve and positioned at the side of the metal sleeve, for housing solid
Organic material；
Gas passage, it is placed in the metal sleeve and positioned at the opposite side of the metal sleeve, the gas passage
It is adjacent with the cylinder of quartz glass and connected therewith with through hole, and the gas passage is parallel with the axis of cylinder of quartz glass, institute
State gas passage one end to connect with cylinder of quartz glass, the other end connects with the gas access of the jet-printing head；
Jettron, it is placed in the gas passage, for controlling the evaporation cavity and the jet-printing head hybrid chamber
Whether connect.
Further, the gas passage includes the larger macropore of the less aperture section of cross-sectional area and cross-sectional area
Section, the aperture section are connected with the cylinder of quartz glass with through hole, and the big hole section connects with the gas access of the jet-printing head,
The big hole section and aperture section junction have step surface, and the center line of the big hole section and aperture section overlaps.
Further, the cylindrically coiled spring that the jettron includes piston and one end is fixedly connected with the piston, it two
Person is placed in the big hole section of gas passage, and the cylindrically coiled spring other end is fixed on the gas access of the jet-printing head
Place；The piston is tabular, and its area is more than the aperture section cross-sectional area, is acted on by cylindrically coiled spring elastic force to push up
State the step surface of big hole section and aperture section junction in residence.
Further, the evaporation cavity quantity is one or more.
Further, in the cylinder of quartz glass of the evaporation cavity temperature in room temperature to adjustable in 500 DEG C.
Further, the controlled relative jet-printing head of the baseplate carrier is respectively along jet-printing head major axes orientation and jet-printing head master
The third direction vertical with horizontal direction rectilinear movement in horizontal direction and plane in axle vertical plane.
Further, the baseplate carrier includes：
Substrate supporting plate, for supporting the substrate above it；
Cooler bin, the cooler bin is located at below substrate supporting plate, and mutually fixes therewith；
Travel mechanism, the travel mechanism is located at below cooler bin, for supporting the cooler bin and mutually fixing therewith, uses
According to the external world instruction realize itself respectively along the horizontal direction in jet-printing head major axes orientation, the face vertical with jet-printing head main shaft with
And the third direction vertical with horizontal direction moves linearly in face.
Further, the cooler bin houses the container of cooling medium with pipeline communication with the external world.
Further, the travel mechanism realize substrate spacing on the figure nozzle and the baseplate carrier for 0 to
2000 micrometer ranges are adjustable.
Further, it also includes vacuum tank, and the vacuum tank houses the evaporation cavity, the jet-printing head and the base
Onboard.
Further, in addition to：
Carrier gas delivery line, its communication with carrier gas source of the gas and the evaporation cavity, the carrier gas delivery line have more, an institute
The corresponding evaporation cavity of carrier gas delivery line is stated, the conveyance conduit quantity is identical with the evaporation cavity quantity；
Carrier gas heater, the carrier gas heater are arranged on the carrier gas delivery line；
Pressure regulator valve, the pressure regulator valve are arranged on the carrier gas delivery line, positioned at carrier gas heater and carrier gas source of the gas it
Between；
Magnetic valve, the magnetic valve is arranged on carrier gas delivery line, between carrier gas heater and pressure regulator valve.
It is another aspect of this invention to provide that provide a kind of side that organic vapors film forming is carried out using devices discussed above
Method.
In general, by the contemplated above technical scheme of the present invention compared with prior art, due to being sprayed using figure
The design of mouth and evaporation cavity, following beneficial effect can be obtained：
1st, using figure nozzle, without using shadowmask, organic material can only be adhered to substrate surface, make without foregoing
The particle contamination and waste of material brought with shadowmask, so as to drastically increase stock utilization and quality of forming film, and nothing
The problem of cleaning shadowmask.
2nd, can be simultaneously by a variety of organic material heating and gasifyings, by controlling carrier gas gas using the design of multiple evaporation cavities
Size and the evaporation rate of organic material are pressed, to control the ratio for the organic material for entering jet-printing head hybrid chamber within the same period
Example, obtains the organic film with composite parts, drastically increase the efficiency of vacuum vapor deposition film forming, quality of forming film and
Film forming species.
3rd, different carrier gas delivery lines is corresponded to by setting different evaporation cavities, and is installed on each carrier gas delivery line
The magnetic valve of its opening and closing is can control, so as to which flexibly whether control different organic materials enter evaporation cavity, and it is controllable different organic
Material enters the time of evaporation cavity, finally can flexibly control the thickness and species of film forming.
Brief description of the drawings
Fig. 1 is the principle schematic of existing vacuum thermal evaporation technology；
Fig. 2 is the principle schematic of existing organic vapor phase deposition technology；
Fig. 3 is the structural representation of the organic vapors film formation device using figure nozzle of the present embodiment；
Fig. 4 (a) is the evaporation cavity gas passage of the present embodiment and the structural front view of jettron；
Fig. 4 (b) is the evaporation cavity gas passage of the present embodiment and the structure top view of jettron；
Fig. 5 (a) is the figure nozzle arrangements schematic diagram of the present embodiment；
Fig. 5 (b) is Fig. 5 (a) arrows A-A sectional view；
In all of the figs, identical reference is used for representing identical element or structure, wherein：
1- carrier gas source of the gas 2- pressure-reducing valve 3- gas transmission pipelines
4- gas circuit Y connection 5- pressure regulator valve 6- magnetic valves
7- carrier gas heater 8- sealing pipeline connector 9- outer frames
Pedestal 12- vacuum tanks in 10- gas pipelines 11-
13- closure 14- heating mantle 15- metal sleeves
16- cylinder of quartz glass 17- organic material 18- gas passage aperture sections
The big hole section 20- pistons 21- cylindrically coiled springs of 19- gas passages
22- jet-printing head matrix 23- hybrid chamber 24- figure nozzles
25- mixing gas phase material 26- substrate 27- substrate supporting plates
28- cooler bin 29- cooling medium 30- travel mechanisms
31- servomotor 32- container 33- pumps
The big hole section cavity walls of 34- pipeline 35- aperture section cavity walls 36-
37- figure nozzle opening 38- through hole 39- gas accesses
40- faces side wall 41- curved surface sidewall 42- vacuum chambers directly
43- cooling chamber 44- mounting holes.
Embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, it is right below in conjunction with drawings and Examples
The present invention is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, and
It is not used in the restriction present invention.As long as in addition, technical characteristic involved in each embodiment of invention described below
Conflict can is not formed each other to be mutually combined.
Fig. 3 is the structural representation of the organic vapors film formation device using figure nozzle of the present embodiment, in Fig. 3：
The inside of vacuum tank 12 is vacuum chamber 42, and vaccum-pumping equipment is connected to vacuum tank 12 to connect with the inside of vacuum chamber 42
It is logical, vaccum-pumping equipment is not drawn into figure, vaccum-pumping equipment is used for the vacuum for making the inside of vacuum chamber 42 keep setting.Vacuum tank 12
The window of window and closed window is offered on wall, can be entered by the window inside vacuum chamber 42, to complete each Machinery Ministry
Part disengaging vacuum tank, the loading of organic material and taking-up, substrate are movable into and out, and are not drawn into the window and window in Fig. 3.
The present embodiment carrier gas source of the gas 1 is high pressure nitrogen, but the species of carrier gas is not limited in the present invention, utilizes gas
Pipeline communication carrier gas source of the gas 1 and gas circuit Y connection 4, and in the gas pipeline between carrier gas source of the gas 1 and gas circuit Y connection 4
Pressure-reducing valve 2 is installed, for being depressurized to the high pressure carrier gas for carrying out self contained gas source of the gas, makes its moderate pressure, gas circuit Y connection 4
Multiple gas transmission pipelines 3 are connected, in this implementation, the quantity of gas transmission pipeline 3 is two, but gas is conveyed in the present invention
The quantity of pipeline is not limited.Each gas transmission pipeline 3 connect an evaporation cavity, the quantity of gas transmission pipeline 3 with
Evaporation cavity quantity is identical, but the quantity of evaporation cavity is not limited in the present invention.One is installed on each gas transfer pipeline
Individual carrier gas heater 7, magnetic valve 6 is installed in the porch of carrier gas heater 7, for controlling the opening and closing of gas transmission pipeline,
Pressure regulator valve 5 is installed, for further adjusting gas conveying on the gas transmission pipeline 3 between magnetic valve 6 and gas circuit Y connection 4
The pressure of carrier gas in pipeline 3.
Outer frame 9 is fixed on the vacuum tank 12 of the present embodiment film formation device, outer frame 9 is used to be secured across the gas of its own
Body conveyance conduit 3, and outer frame 9 and gas transmission pipeline 3 are tightly connected with seal for pipe joints joint 8.In the tank wall of vacuum tank 12
On offer for interior pedestal 11 and outer frame 9 connection mounting hole 44, the interior top of pedestal 11 pass through mounting hole 44 after, with outer base
Seat 9 is tightly connected.Closure 13 is positioned at the openend of metal sleeve 15 of sealing evaporation cavity, for sealing metal sleeve 15, sealing
Lid 13 is connected with interior pedestal 11, and the heat insulating mattress with several openings is provided between closure 13 and interior pedestal 11, is not drawn in Fig. 3
Go out, wherein, it is open and passes through for supplied gas.Gas pipeline 10 runs through outer frame 9, interior pedestal 11 and closure 13, one simultaneously
End connects with gas transmission pipeline 3, the gas passage of other end connection evaporation cavity, for by the load from gas transmission pipeline 3
Gas is delivered to the gas passage of evaporation cavity.
Evaporation cavity includes heating mantle 14, the metal sleeve 15 for being heated set cladding, is contained in metal sleeve in the present embodiment
Cylinder of quartz glass 16, gas passage in 15 and the jettron positioned at gas passage, the quantity of evaporation cavity in the present embodiment
For 2, but the quantity of evaporation cavity is not limited in the present invention.
Cylinder of quartz glass 16 is used to hold organic material 17, the bottom of cylinder of quartz glass 16 and side wall difference in the present embodiment
It is in close contact with the bottom of metal sleeve 15 and side wall, in the outer cladding heating mantle 14 of metal sleeve 15, for heating so that solid has
Machine material is heated to be evaporated to gas phase form.The same position of the side wall of metal sleeve 15 and cylinder of quartz glass 16 offers together respectively
Shaft through-hole, to form through hole 38, through hole 38 connects the gas passage of evaporation cavity, the organic material of gas phase being provided with cylinder of quartz glass 16
Material is entered by through hole 38 in the gas passage of evaporation cavity.Gas passage is located at the side wall of metal sleeve 15, and it is that cross section is round
The through hole shape of shape, including the less aperture section 18 of diameter and the big hole section 19 being relatively large in diameter, aperture section 18 are located at big hole section 19
Top, two sections contiguously square to have identical center line into step surface, big hole section 19 and aperture section 18.
Jettron in the present embodiment gas passage includes piston 20 and cylindrically coiled spring 21, and jettron is contained in
In the big hole section 19 of gas passage, the one end of cylindrically coiled spring 21 is fixedly connected with tabular piston 20, and the other end is connected to spray
Print at the gas access 39 in head matrix.
Fig. 4 (a) and Fig. 4 (b) is respectively the structural front view of the jettron of the present embodiment, top view.From gas passage
The top of aperture section 18 is overlooked, and the region that the contour line for facing side wall 40 and curved surface sidewall 41 directly of tabular piston 20 surrounds is more than gas
The cross-sectional area of body channel orifices section 18, while less than the cross-sectional area of the big hole section 19 of gas passage, the song of tabular piston 20
Coordinate between the cavity wall 35 of surface side wall 41 and the big hole section 19 of gas passage for gap, so that piston 20 is in ambient pressure or circle
Moved axially under post helical spring active force in the big hole section 19 of gas passage.
The present embodiment jet-printing head includes jet-printing head matrix 22, the heating mantle 14 of the cladding jet-printing head matrix, figure nozzle
24th, the hybrid chamber 23 connected with figure nozzle and the gas access 39 of connection evaporation cavity.Jet-printing head matrix 22 and evaporation cavity
Metal sleeve 15 links together.It is provided between jet-printing head matrix 22 and the metal sleeve 15 of evaporation cavity with several openings
Heat insulating mattress, it is not drawn into Fig. 3, it is open passes through for gas.The one end of gas access 39 and the big hole section 19 of evaporation cavity gas passage
Connection, the other end connect with hybrid chamber 23, and figure nozzle 24 is located at the lower section of hybrid chamber 23, and passes through the opening of figure nozzle
37 connect with hybrid chamber 23.
Fig. 5 (a) is the figure nozzle arrangements schematic diagram of the present embodiment, and Fig. 5 (b) is Fig. 5 (a) arrows A-A sectional view.
In the present embodiment, the shape of opening 37 of figure nozzle is circular, and quantity is one, but to the number of figure nozzle opening in the present invention
Amount and shape are not limited, and figure nozzle opening can be any possible flat shape in the present invention, and different openings
It is respectively positioned in same plane.
In the present embodiment, baseplate carrier includes substrate supporting plate 27, cooler bin 28 and travel mechanism 30.Substrate supporting plate 27
Upper placement substrate 26, cooler bin 28, which is located at the lower section of substrate supporting plate 27 and is attached thereto, to be integrated, and cooling is housed in cooler bin 28
Medium 29, by circulating cooling medium 29, to cool down substrate supporting plate 27, so as to realize in film forming procedure to substrate 26
Cooling, to realize sublimating and depositing for organic vapors material.Travel mechanism 30 be located at the lower section of cooler bin 28 and with cooler bin 28
Be fixed together, for support cooler bin 28 and substrate supporting plate 27 and according to the external world instruction respectively along jet-printing head major axes orientation,
Straight line shifting is carried out with third direction vertical with horizontal direction in the horizontal direction and plane in jet-printing head main shaft vertical plane
It is dynamic, so as to adjust the position of the substrate 26 in substrate supporting plate and jet-printing head.The material of substrate 26 is glass in the present embodiment
Glass, but the present invention is not limited the material of substrate 26.
The inside of cooler bin 28 has cooling chamber 43 in the present embodiment, is connected pump 33 by pipeline 34 and seal for pipe joints joint 8
Cooler bin 28 is connected to, is connected with the inside with cooling chamber 43, cooling medium 29 is under the pump action of pump 33, in container 32 and cold
But circulated between chamber 43, and the volume of container 32 is much larger than the volume of cooling chamber 43, to ensure to be situated between with enough coolings
Matter is used to cool down.Pipeline 34 itself has certain elasticity, by length of the control pipeline 34 inside vacuum chamber 42, to allow pipeline
34 part inside vacuum chamber 42 has flexibility, can be moved with the movement of cooler bin 28.
Three groups of leading screws are installed, three groups of leading screws are respectively with jet-printing head major axes orientation, with spraying in the present embodiment travel mechanism 30
Totally three directions overlap the third direction vertical with horizontal direction in horizontal direction and plane in print head main shaft vertical plane,
One shares 3 servomotors 31 in the present embodiment, and three servomotors correspond to three groups of guide screw movements of driving respectively, three groups of leading screws
The motion of the motion, also as whole baseplate carrier of travel mechanism is realized in motion.Pass through driver, motion control card and computer journey
Sequence controls the opening and closing of servomotor, and displacement of the motion 30 in 3 directions is detected by grating scale, utilizes grating
Reading head is read, and the data of reading is switched into signal and are delivered to computer program, by computer program judge current location whether with
Presetting position is consistent, and if not presetting position, motion continues to move, if presetting position, then
Instruction is sent to driver by motion control card, driver controls the servomotor of the direction to stop operating according to the instruction.
The transmission of leading screw on the rotation control different directions of servomotor on different directions, is finally translated into whole baseplate carrier edge
The movement of different directions.
The course of work of device is in the embodiment of the present invention：
Place organic material and vacuumize：Different organic materials, this reality are placed in the cylinder of quartz glass of two evaporation cavities
Apply in example one and share two evaporation cavities, left evaporation cavity and right evaporation cavity are respectively designated as according to position relationship, but to steaming in invention
The quantity of hair chamber is not limited.Vacuum chamber 42 is vacuumized, vacuum chamber 42 obtain vacuum during, all heating mantles and
Carrier gas heater is not worked, and corresponding magnetic valve 6 is closed respectively with two evaporation cavities, with left evaporation cavity and right evaporation
Corresponding piston 20 contacts chamber under the elastic force effect of cylindrically coiled spring 21 with the step surface of the gas passage of evaporation cavity respectively,
Gas passage aperture section 18 is completely enclosed.
Setting various parameters simultaneously heat：After the vacuum of vacuum chamber 42 reaches setting value, according to the characteristic of organic material and
Expected content range, left evaporation cavity and the respective predetermined temperature of right evaporation cavity are set respectively, to control the steaming of organic material 17
Send out speed.Heating is opened, before all temperature are not up to predetermined value, electromagnetism corresponding with left evaporation cavity and right evaporation cavity difference
Valve 6 is still within closed mode, bullet of the piston 20 corresponding with left evaporation cavity and right evaporation cavity difference in cylindrically coiled spring 21
Still contact simultaneously confining gas channel orifices section 18 under power effect with step surface, using right respectively with left evaporation cavity and right evaporation cavity
The pressure regulator valve 5 answered, left evaporation cavity and each self-corresponding carrier gas air pressure of right evaporation cavity is set respectively, to control stream pressure and stream
Speed, so as to control the content into hybrid chamber 14 for the gas phase organic material being driven.
Carry out film-forming process：After all temperature reach predetermined value, electromagnetism corresponding with left evaporation cavity and right evaporation cavity difference
Valve 6 is opened, and the carrier gas for having certain temperature after being heated by carrier gas heater 7 mixes into evaporation cavity with gas phase organic material
Obtain mixed carrier gas.Mixed carrier gas have certain pressure, and it acts on the surface of piston 20, when pressure overcomes cylindrically coiled spring 21
Elastic force when, piston 20 moves downwardly together with cylindrically coiled spring 21, gas passage aperture section 18 and the big hole section of gas passage
19 connection, mixed carrier gas from the gap faced directly between side wall 40 and the cavity wall 35 of hole section big with gas passage 19 of piston 20 by,
Into gas access 39, jet-printing head hybrid chamber 23 is subsequently entered.It is respectively derived from the organic vapors of left evaporation cavity and right evaporation cavity
Material is mixed to get mixing gas phase material 25 under carrier gas driving into jet-printing head hybrid chamber 23.Gas phase material 25 is mixed from figure
The effigurate figure opening 37 of tool in nozzle 24 sprays, and sprays to substrate 26, organic material composition therein is in substrate 26
Surface is sublimated and deposited, and forms the organic film with certain figure and two kinds of compositions, the figure and figure opening of organic film
37 shapes are identical.
Film thickness controls：By controlling the opening time of magnetic valve 6 to control organic film thickness, during the opening of magnetic valve 6
Between it is longer, the thickness of film forming is thicker.
In the present invention, particle contamination and waste of material are avoided using figure nozzle, using evaporation cavity and carrier gas delivery pipe
Road and the magnetic valve design on pipeline, effectively control film forming species, the composition and thickness of film.
As it will be easily appreciated by one skilled in the art that the foregoing is merely illustrative of the preferred embodiments of the present invention, not to
The limitation present invention, all any modification, equivalent and improvement made within the spirit and principles of the invention etc., all should be included
Within protection scope of the present invention.
Claims (15)
1. a kind of organic vapors film formation device using figure nozzle, for preparing the organic film with certain figure, it is wrapped
Include evaporation cavity, positioned at described evaporation cavity one end and jet-printing head in communication and with jet-printing head at a distance of certain interval for holding
The baseplate carrier of carried base board, it is characterised in that：
The evaporation cavity obtains gas phase organic material for vaporizing solid organic material；
The jet-printing head includes jet-printing head matrix, the heating mantle of the cladding jet-printing head matrix, positioned at shown jet-printing head matrix one
The figure nozzle at end, connected with figure nozzle and the hybrid chamber positioned at the jet-printing head matrix centre position, it is one hollow
Cavity, and positioned at the jet-printing head matrix other end and the gas access that is opened in jet-printing head matrix, its one end and institute
Hybrid chamber connection is stated, the other end connects with the evaporation cavity, passes through for the gas of evaporation cavity described in the entrance of the gas access
Hybrid chamber；
The figure nozzle has opening, and open cross-section shape is identical with the figure of prepared organic film, in hybrid chamber
Gas phase organic material be ejected into by the figure nozzle on the substrate of the baseplate carrier, you can prepare figure with figure
The opening shape identical film of shape nozzle,
Figure nozzle is that 0 to 2000 micrometer range is adjustable with the substrate spacing on the baseplate carrier.
A kind of 2. organic vapors film formation device using figure nozzle as claimed in claim 1, it is characterised in that the figure
The open cross-section shape of nozzle is and the various planar graph shapes of organic film shape identical to be prepared.
A kind of 3. organic vapors film formation device using figure nozzle as claimed in claim 2, it is characterised in that the figure
Nozzle is removably connected on the jet-printing head matrix, and its open amount is one or more, and its all opening is respectively positioned on same
In plane, and the plane at the place that is open is parallel with the plane where the substrate.
A kind of 4. organic vapors film formation device using figure nozzle as claimed in claim 3, it is characterised in that the evaporation
Chamber includes
Metal sleeve；
Heating mantle, it coats the metal sleeve, for heat temperature raising；
Cylinder of quartz glass, it is placed in the metal sleeve and positioned at the side of the metal sleeve, had for housing solid
Machine material；
Gas passage, it is opened in the metal sleeve and positioned at the opposite side of the metal sleeve, the gas passage with
The cylinder of quartz glass is adjacent and one end is connected with through hole therewith, and the gas passage is parallel with the axis of cylinder of quartz glass,
The gas passage other end connects with the gas access of the jet-printing head；
Jettron, it is placed in the gas passage, for controlling the cylinder of quartz glass and the jet-printing head hybrid chamber
Connection, gas phase organic material is delivered in the hybrid chamber of jet-printing head by gas passage with realizing.
A kind of 5. organic vapors film formation device using figure nozzle as claimed in claim 4, it is characterised in that the gas
Passage includes the larger big hole section of the less aperture section of cross-sectional area and cross-sectional area, the aperture section and the quartzy glass
Glass cylinder is connected with through hole, and the big hole section connects with the gas access of the jet-printing head, the big hole section and aperture section junction
With step surface, and the center line of the big hole section and aperture section overlaps.
6. a kind of organic vapors film formation device using figure nozzle as claimed in claim 5, it is characterised in that described pneumatic
The cylindrically coiled spring that switch includes piston and one end is fixedly connected with the piston, both of which are placed in the big hole section of gas passage
Interior, the cylindrically coiled spring other end is fixed at the gas access of the jet-printing head；
The piston is tabular, and its area is more than the aperture section cross-sectional area, can acted in cylindrically coiled spring elastic force
Under be pressed on closing that gas passage is realized on the step surface of the big hole section and aperture section junction and can be under external force
Spring-compressed and disengage it from step surface realize gas passage penetrate.
A kind of 7. organic vapors film formation device using figure nozzle as claimed in claim 6, it is characterised in that the evaporation
Chamber quantity is one or more.
A kind of 8. organic vapors film formation device using figure nozzle as claimed in claim 7, it is characterised in that the evaporation
In the cylinder of quartz glass of chamber temperature in room temperature to adjustable in 500 DEG C.
A kind of 9. organic vapors film formation device using figure nozzle as claimed in claim 1, it is characterised in that the substrate
The controlled relative jet-printing head of microscope carrier respectively along jet-printing head major axes orientation, with the horizontal direction in jet-printing head main shaft vertical plane and
The third direction vertical with horizontal direction rectilinear movement in plane.
10. a kind of organic vapors film formation device using figure nozzle as described in claim 1 or 9, it is characterised in that described
Baseplate carrier includes
Substrate supporting plate, for supporting the substrate above it；
Cooler bin, the cooler bin is located at below substrate supporting plate, and mutually fixes therewith；
Travel mechanism, the travel mechanism is located at below cooler bin, for supporting the cooler bin and mutually fixing therewith, for according to
Realize itself respectively along the horizontal direction in jet-printing head major axes orientation, the face vertical with jet-printing head main shaft and face according to external world's instruction
The interior third direction rectilinear movement vertical with horizontal direction.
11. a kind of organic vapors film formation device using figure nozzle as claimed in claim 10, it is characterised in that described cold
But case houses the container of cooling medium with pipeline communication with the external world.
A kind of 12. organic vapors film formation device using figure nozzle as claimed in claim 11, it is characterised in that the shifting
Motivation structure realizes that the figure nozzle is adjustable in 0 to 2000 micrometer range with the substrate spacing on the baseplate carrier.
13. a kind of organic vapors film formation device using figure nozzle as claimed in claim 1, it is characterised in that also include
Vacuum tank, the vacuum tank house the evaporation cavity, the jet-printing head and the baseplate carrier.
14. a kind of organic vapors film formation device using figure nozzle as claimed in claim 1, it is characterised in that also include
Carrier gas delivery line, its communication with carrier gas source of the gas and the evaporation cavity, the conveyance conduit quantity and the evaporation cavity quantity
It is identical；
Carrier gas heater, the carrier gas heater are arranged on the carrier gas delivery line；
Pressure regulator valve, the pressure regulator valve is arranged on the carrier gas delivery line, between carrier gas heater and carrier gas source of the gas；
Magnetic valve, the magnetic valve is arranged on carrier gas delivery line, between carrier gas heater and pressure regulator valve.
15. a kind of method that device applied as described in one of claim 1-14 carries out organic vapors film forming.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410251897.5A CN105239038B (en) | 2014-06-09 | 2014-06-09 | A kind of organic vapors film formation device and its film build method using figure nozzle |
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| CN201410251897.5A CN105239038B (en) | 2014-06-09 | 2014-06-09 | A kind of organic vapors film formation device and its film build method using figure nozzle |
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| Publication Number | Publication Date |
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| CN105239038A CN105239038A (en) | 2016-01-13 |
| CN105239038B true CN105239038B (en) | 2017-12-05 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1491653A2 (en) * | 2003-06-13 | 2004-12-29 | Pioneer Corporation | Evaporative deposition methods and apparatus |
| CN102414863A (en) * | 2009-05-01 | 2012-04-11 | 卡帝瓦公司 | Method and apparatus for organic vapor printing |
| KR101146982B1 (en) * | 2009-11-20 | 2012-05-22 | 삼성모바일디스플레이주식회사 | Aapparatus for thin layer deposition and method of manufacturing organic light emitting display apparatus |
| CN103003464A (en) * | 2010-07-22 | 2013-03-27 | 通用显示公司 | Organic vapor jet printing |
| CN203904443U (en) * | 2014-06-09 | 2014-10-29 | 华中科技大学 | Organic gaseous-phase film forming device with patterned nozzle |
-
2014
- 2014-06-09 CN CN201410251897.5A patent/CN105239038B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1491653A2 (en) * | 2003-06-13 | 2004-12-29 | Pioneer Corporation | Evaporative deposition methods and apparatus |
| CN102414863A (en) * | 2009-05-01 | 2012-04-11 | 卡帝瓦公司 | Method and apparatus for organic vapor printing |
| KR101146982B1 (en) * | 2009-11-20 | 2012-05-22 | 삼성모바일디스플레이주식회사 | Aapparatus for thin layer deposition and method of manufacturing organic light emitting display apparatus |
| CN103003464A (en) * | 2010-07-22 | 2013-03-27 | 通用显示公司 | Organic vapor jet printing |
| CN203904443U (en) * | 2014-06-09 | 2014-10-29 | 华中科技大学 | Organic gaseous-phase film forming device with patterned nozzle |
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| CN105239038A (en) | 2016-01-13 |
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