CN105228488A - Non-woven fabrics facial mask and corresponding cosmetic treatment method - Google Patents
Non-woven fabrics facial mask and corresponding cosmetic treatment method Download PDFInfo
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- CN105228488A CN105228488A CN201380074597.8A CN201380074597A CN105228488A CN 105228488 A CN105228488 A CN 105228488A CN 201380074597 A CN201380074597 A CN 201380074597A CN 105228488 A CN105228488 A CN 105228488A
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- facial mask
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- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D44/00—Other cosmetic or toiletry articles, e.g. for hairdressers' rooms
- A45D44/002—Masks for cosmetic treatment of the face
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/02—Cosmetics or similar toiletry preparations characterised by special physical form
- A61K8/0212—Face masks
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q19/00—Preparations for care of the skin
- A61Q19/08—Anti-ageing preparations
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- Gerontology & Geriatric Medicine (AREA)
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Abstract
Non-woven fabrics of the present invention comprises: the substrate (14) marking off centre bore (16), for being connected to the first side Connection Element (18) and the second side Connection Element (20) of user ear (22).Substrate (14) is made up of elastic nonwoven materials, substrate (14) is configured to, when being greater than 10% when stretching along horizontal axis, be greater than 40mm along horizontal axis (A-A ') to the distance at the center of centre bore (16) and be less than first place of 75mm, first pressure is applied on NARIKO mask, and, substrate (14) is configured to, when being greater than 10% when stretching along horizontal axis (A-A '), to be greater than 35 ° and the distance of the angle being advantageously less than 80 ° in horizontal axis A-A ' below to the center of centre bore (16) is greater than 65mm and is less than the second point place of 100mm, second pressure is applied on NARIKO mask.Second pressure is equal to or greater than the first pressure.
Description
Technical field
The present invention relates to and be applied in user's non-woven fabrics facial mask on the face, comprising:
Mark off the substrate of centre bore, described centre bore is for holding user's oral area, and described substrate is limit
The fixed horizontal axis through the center of described centre bore;
For being connected to the first side Connection Element and the second side Connection Element of user ear.
In order to provide cosmetic treatments to user face, this facial mask is applied in user on the face.Particularly, this facial mask for by cosmetic applications at user's skin.
This facial mask is advantageously impregnated with cosmetics, such as anti-aging cosmetics.
Cosmetics are, such as gel, frost, oil, toner, emulsion or powder.
Background technology
In implication of the present invention, " cosmetics " specifically on November 30th, 2009 European Parliament and council European Union regulations N ° 1223/2009 in the product of relevant cosmetics of definition.
Non-woven fabrics facial mask is well-known for applying the application of cosmetics.Some facial masks are directly packaging together with the cosmetics of dipping facial mask.
Or, dried noodle film is packed.After the packaging opening facial mask, cosmetics are placed on facial mask by user.
In another modification, cosmetics were applied directly in user face before applying facial mask.
At present, can obtain has two class non-woven fabrics facial masks for user.
Classical non-woven fabrics facial mask directly applies on the face, and does not have mechanism to skin.These facial masks are normally non-stretchable and be only applied on user's skin, and can not produce mechanical force and or pressure.The main concern of women is cutis laxa (skinsagginess).
Also known non-woven fabrics can stretch facial mask, this facial mask when be placed on user on the face time must be stretched.Typically, the stretching of facial mask is irreversible.User opens packaging, catches the opposite end of facial mask, and the facial mask when it is placed on the face between stretching opposite end, irreversibly to increase its width.
The example of known face facial mask is disclosed in JP3120502, WO2009/135336, WO2009/116118, EP2103424, EP1813167, JP2004/097585, JP2010/259621, JP2011/136019, JP2009/112803, US2010/324509, JP2004/149533, JP2009/297572, JP2009/147824, JP2009/113585, JP2010/25962 or JP2011/172732.
Some examples in these facial masks are stretchable.But stretching is irreversible, and be very difficult correctly adjusting it on the face.Described facial mask not with or interact with user's skin hardly, such as extend and the mechanism of pressure especially for producing.In addition, the formula ratio being discharged into skin is very low.
Summary of the invention
An object of the present invention is to provide and be a kind ofly applied in user's non-woven fabrics facial mask on the face, this facial mask provides the beautification function strengthened user's skin.
For this reason, the present invention relates to facial mask as above, wherein, described substrate is made up of elastic nonwoven materials, described substrate is configured to, when being greater than 10% when stretching along described horizontal axis, be greater than 40mm along this horizontal axis to the distance at the center of centre bore and be less than first place of 75mm, first pressure is applied on NARIKO mask (NARIKOfacedummy), and, wherein said substrate is configured to, when being greater than 10% when stretching along described horizontal axis, to be greater than 35 ° and the distance of the angle being advantageously less than 80 ° in described horizontal axis A-A ' below to the center of centre bore is greater than 65mm and is less than the second point place of 100mm, second pressure is applied on NARIKO mask, wherein, second pressure is equal to or greater than the first pressure.
It is one or more that facial mask according to the present invention comprises in following characteristics, described feature can individually or according to technical may be combined into exercise use:
-substrate stretches along this horizontal axis;
-the first pressure is between 3mmHg and 35mmHg;
-the second pressure is between 3mmHg and 35mmHg;
-substrate comprises: for receiving the absorption nonwoven layer of cosmetics and being attached to the elasticity support nonwoven layer of this absorbed layer;
-described absorbed layer is the spunlace non-woven cloth layer (spunlacenon-wovenlayer) advantageously comprising regenerated fiber; Described supporting layer is the melt-blown nonwoven layer of cloth (meltblownnon-wovenlayer) be advantageously made up of polyolefine fiber;
-described first Connection Element and the second Connection Element include the side connecting hole for receiving the corresponding ear of user;
-at least one sidepiece connecting hole is along the side opening axis elongation tilted relative to described horizontal axis;
-be made up of the outer section of the side connecting hole axis above described horizontal axis and this horizontal axis angle-
Between 30 ° and 135 °, advantageously between 30 ° and 90 °;
-each side connecting hole limits top and bottom, the top distance that the upper end of the upper end of the first side connecting hole and the second side connecting hole separates is greater than the bottom distance separated the lower end of the lower end of the first side connecting hole and the second side connecting hole;
-described substrate comprises: at least one integration region that non-woven fabrics fiber merges at least partly and at least one region that non-woven fabrics fiber does not merge;
-at least one integration region extends through the first Connection Element and/or passes the second Connection Element;
-it comprises by the cosmetics of this substrate bearing, described cosmetics advantageously anti-aging product.
The invention still further relates to the cosmetic treatment method of user face, comprise the following steps:
-facial mask is as above provided;
-along horizontal axis elastic stretching facial mask, be advantageously greater than 10%;
-facial mask is applied in user face, make user's oral area be positioned in the face of this central opening;
-the first side Connection Element and the second side Connection Element are connected respectively to user ear;
Wherein, when being greater than 10% when stretching along horizontal axis, the first pressure, being greater than 40mm along described horizontal axis to the distance at the center of described centre bore and being less than first place of 75mm, is applied in described user face by described substrate; And, when being greater than 10% when stretching along this horizontal axis, this substrate is to be greater than 35 ° and the distance of the angle being advantageously less than 80 ° in described horizontal axis A-A ' below to the center of described centre bore is greater than 65mm and is less than the second point place of 100mm, second pressure is applied in described user face, and described second pressure is equal to or greater than described first pressure.
Accompanying drawing explanation
With reference to accompanying drawing, reading the following description only exemplarily adopted will understand the present invention better, wherein:
Fig. 1 is the front view according to the first facial mask of the present invention;
Fig. 2 is the decomposition partial view of the facial mask substrate of Fig. 1;
Fig. 3 is the schematic diagram can measuring the device being applied to the pressure on NARIKO mask by the facial mask of Fig. 1;
Fig. 4 is by face's view of the position of the sensor be placed on NARIKO mask;
Fig. 5 is the front view that facial mask is applied to this user face of user face;
Fig. 6 is the side view of Fig. 5, and the side of the user face of application facial mask is shown;
Fig. 7 to 11 illustrates according to other facial masks some of the present invention.
Figure 12 to 15 illustrates the specific dimensions of NARIKO mask.
Detailed description of the invention
First non-woven fabrics facial mask 10 according to the present invention is shown in Figure 1.This facial mask 10 is for being applied to the user face 12 schematically shown in figs. 5 and 6.
This facial mask 10 comprises: limit the substrate 14 of the centre bore 16 passed through for user's oral area, facial mask be connected to the first side Connection Element 18 and the second side Connection Element 20 of user ear 22.
Advantageously, facial mask 14 carries when being applied on user's skin by facial mask 14, the cosmetics 24 contacted with user face.
Cosmetics 24 are, such as gel, frost, oil, toner, emulsion or powder.Cosmetics 24 can comprise any active component.Preferably, aging ingredient.
It contains such as adenosine, strained polymer, anti-ageing plant component.Alternatively, or as a supplement, cosmetics contain whitening agent, agent of releiving, antiinflammatory and anti-acne agents.
The example of the activating agent contained in cosmetics 24 is ascorbic acid, ascorbic acid gluconate (ascorbicguluconate), niacinamide (niacineamide), ethylascorbyl, ellagic acid (elagicacid), GK2, salicylic acid, tocopherol acetate.
Substrate 14 is made up of nonwoven cloth material.In implication of the present invention, " non-woven fabrics " refer to bag fibrous base material, wherein, independent fiber or long filament are arranged in laminated structure with disordered fashion, and they neither (woven) of tatting neither be knitting (knit).The fiber of non-woven body usually under the impact of mechanism (such as, acupuncture, jet, water spray etc.) or under the impact of heat effect, or is connected to each other by adding adhesive.
Such nonwoven cloth material such as, be defined as by rubbing and/or the net of fiber of interior poly-and/or the orientation that adheres to and combine or random orientation or sheet by ISO9092 standard, but do not comprise paper or by tatting, knitting, tufting or sew up with line or binder filaments the product obtained.
Nonwoven cloth material is different in used fibre length from paper.In paper, fiber is shorter.But, also have nonwoven cloth material based on undertaken producing by wet processing and the cellulose fibre had as short fiber identical in paper.Difference between nonwoven cloth material and paper is normally: there is not hydrogen bond between the fiber in nonwoven cloth material.
Non-woven body is made up of fiber.
Advantageously, the mass percent of the meldable fibre contained in non-woven fabric plate is greater than 0.5% and is less than or equal to 100%, advantageously between 5% and 80%.
Meldable fibre is: such as, polyolefine fiber, such as polyethylene (PE), polypropylene (PP), PETG (PET), or acrylic fiber, such as polymethyl methacrylate (PMMA), polyurethane fiber, or following thermoplastic fibre: polyvinyl chloride (PVC), styrene polymer (such as polystyrene PS, expandable polystyrene EPS, acrylonitrile-butadiene-styrene (ABS) ABS terpolymer, SAN, styrene-butadiene SB polymer), polyamide (PA), Merlon (PC), saturated polyester (such as, polyethylene terephthalate polyester PET, polybutylene terephthalate (PBT) PBT), polyacetals (such as, polyformaldehyde POM, metaformaldehyde ethylene oxide copolymer), polyvinyl alcohol (PVA), or fluorinated polymer (such as, polytetrafluoroethylene PTFE, polyvinylidene fluoride PVDF and polytrifluorochloroethylene PCTFE) fiber.
Forming other fiber of main body is such as, synthetic petroleum derivative fiber, natural plants or animal fiber, and/or such as from for the formation of the process of fiber or the modified natural fibers of renovation process.
Non-woven body can be formed by one or more consolidation fibre net.
In the embodiment illustrated in fig. 2, the substrate 14 that nonwoven cloth material is formed comprises: receive the absorption nonwoven layer 30 of cosmetics 24 and be attached to the elasticity support nonwoven layer 32 absorbed in nonwoven layer 30.
Absorbed layer 30 is such as formed by spunlace non-woven cloth layer, and this spunlace non-woven cloth layer comprises from for the formation of the process of fiber or the modified natural fibers of renovation process.Particularly, absorbed layer can comprise RAYON.
Absorbed layer 30 also can comprise synthetic petroleum derivative fiber, and such as polyolefine fiber, is specially PETG, and/or polyethylene fibre.In favourable embodiment, the mass percent of synthetic fibers is between 0% and 70%, and the mass percent of modified natural fibers is between 0% and 100%.
Absorbed layer 30 can receive cosmetics 24 and hold it in substrate 14.Its object is to contact with user face 12.
Elastic layer 32 is such as melt-blown nonwoven layer of cloths.Its advantageously complete synthetic petroleum derivative fiber by such as polyolefine fiber is made.
Elastic layer 32 is advantageously non-absorbent.
" absorption " refers to that layer 30 can absorb the liquid of at least 10 % by weight when measuring according to WSP101-W-08fThree standard (WSP101-W-08fThreestandard).
Relative to the weight of facial mask 10, the mass percent of cosmetics between 20% and 3000%, and preferably between 200% and 1000%.
" non-absorbent " refers to that the absorption of non-woven fabrics does not increase to over the residual humidity (residual humidity RH%) contained at first in non-woven fabrics.This often means that, layer 32 can absorb by above-mentioned standard record at the most 10 % by weight liquid.
These layers 30,32 are laminated on together.Patterning heat bonding is advantageously used in manufacture lamination.
Substrate 14 has the shape of elongation, advantageously round, along axis A-A ' extend through the center 34 of centre bore 16 and pass the first side Connection Element 18 and the second side Connection Element 20.
As shown in Figure 1, axis A-A ' be " level ", that is, when the nose of user soon enters in the centre bore 16 of facial mask, axis A-A ' be advantageously located at horizontal direction.
" width " of facial mask 10, or more at large, term " width " be parallel to or along axis A-A ' distance assert.
" highly " of facial mask 10, or more at large, term " highly " is perpendicular to axis A-A ' distance assert." thickness " of facial mask is the distance between the first surface of facial mask 10 and second of relative facial mask 10.
Substrate 14 extends between the first end 40 on Fig. 1 left side and the second end 42 on the right of Fig. 1.
In the example of fig. 1, substrate 14 has the shape of circular.Which define and be usually located at axis A-A ' side top edge 44 and be usually located at axis A-A ' the lower limb 46 of opposite side.In FIG, top edge 44 and lower limb 46 include the center concave regions 48 between two convex side regions 50,52.
The nonwoven cloth material forming substrate 14 is flexible.According to WSP110.4-X standard method of test detect, it can advantageously along or the A-A ' that parallels to the axis reversibly stretch at least 10%, preferably between 10% and 150%.
So when substrate 14 stretches, it has SME.It recovers its original shape after the stretch, means, uses the method described in WSP110.1-X standard method of test, and in drying stage, when 3 times cycle period stretching at least 50%, nonwoven cloth material should have the residual deformation lower than its original dimension 8%.
So, not stretching between configuration and the stretching configuration shown in Fig. 5 and 6, at least along axis A-A of the static state that substrate 14 is shown in Figure 1 ' or to be parallel to line A-A ' be that elasticity is stretchable.
In the example of fig. 1, the Breadth Maximum of the substrate 14 of the A-A ' that parallels to the axis between first end 40 and first end 42 is than perpendicular to axis A-A ' the maximum height of substrate 14 larger, the specifically twice of maximum height.
In addition, its Breadth Maximum of Thickness Ratio of substrate 14 is little at least ten times.
The width of static substrate 14 such as, between 150mm and 350mm.The height of substrate 14 such as, between 80mm and 250mm.The thickness of substrate 14 lower than 5mm, and preferably between 0.5mm and 2.5mm.
In the example of fig. 1, centre bore 16 is positioned in the geometric center 54 of substrate 14.
Centre bore 16 is through holes.It extends on the whole thickness of substrate 14, and gets through on the apparent surface of substrate 14.
In the example of fig. 1, centre bore 16 is along axis A-A ' extend.When facial mask extends along axis A-A ' the Breadth Maximum of centre bore be less than 20% of the Breadth Maximum of substrate 14.
As mentioned above, in order to allow user to breathe when facial mask 10 is placed in face 12, hole 16 can receive user's oral area, particularly user's lip.
Centre bore 16 has closed contour, that is, it is positioned at the position having some distances with the outline line of substrate 14, and also has the position of some distances with each Connection Element 18,20.
In this example, the first side Connection Element 18 and the second side Connection Element 20 are made up of the first side connecting hole 60 and the second side connecting hole 62 respectively.Other method of attachment/device can be used, such as cord, pliers, bandage; Rubber band etc.
Connecting hole 60,62 all has upper end 66,66 ' and lower end 64,64 ', and connecting hole 60,62 all extends between lower end 64 and upper end 66, along the respective side opening axis C-C ', the D-D ' that tilt relative to horizontal axis A-A '.
Advantageously, the top of axis C-C ', D-D ' and axis A-A ' outside between the angle [alpha] that limits between 0 ° and 90 °.
In the example of fig. 1, side opening axis C-C ', D-D ' all on the direction of lower end 64,64 ' to upper end 66,66 ' center 34 of opposing through-bores 16 turn to.Angle [alpha] is then greater than 35 ° and is less than 90 °.
In addition, in order to provide the crunch effect of user's skin and lift effect (lift-upeffect), the width W 1 that the upper end 66 of the first connecting hole 60 and the upper end 66 ' of the second connecting hole 62 separate is greater than the width W 2 separated in the lower end 64 of the first connecting hole 60 and the lower end 64 ' of the second connecting hole 62.
In a preferred embodiment, W1 and W2 is less than average distance E1 and E2 of 45 years old women shown in Fig. 5 respectively.
E1 distance is restricted to pass through under nose and the average distance that separated the upper end 80 of each ear 22 of 45-54 year Japanese women of the mode touching nose.In 2012, this distance E1 was 298.32mm.
Distance E2 is restricted to for same group of women, crosses the distance that chin 84 connects the lower end 82 of ear.
In 2012, this distance equaled 255.86mm.
Mean value measured during E1 value and E2 value are the research on typology carried out 203 women in Japan in 2011.
In a preferred embodiment, the percentage elongation M1 represented with percentage is defined as
equal with percentage elongation M2
they are in following interval:
20%≤M1<40% and 40%≤M2<60%; Or
0%≤M1<90% and 10%≤M2<35%.
As noted above, substrate 14 is configured to, in FIG shown in static configuration and shown in Fig. 5 and Fig. 6 stretching configuration between along or parallel to the axis A-A ' stretch.Stretch between the side 40,42 of substrate 14.It is between 10% and 150%.
According to the present invention, substrate 14 is configured to, when substrate 14 is along axis A-A ' be stretched beyond 10%, time preferably between 10% and 150%, be greater than 40mm at the distance D1 at the center 34 to centre bore 16 and be less than 1: 90 place of 75mm, the first pressure being greater than 3mmHg being applied on NARIKO mask 88 and (being shown in Fig. 3 and Figure 12 to Figure 15).
Be applied to first pressure of 1: 90 usually between 3mmHg and 35mmHg.
In addition, substrate 14 is configured to, when substrate 14 is along axis A-A ' horizontal stretch more than 10% time, to be greater than 35 ° relative to horizontal axis A-A ' and angle [alpha] between 35 ° and the 55 ° distance D2 in horizontal axis A-A ' below to the center 34 of centre bore 16 is greater than 65mm and is less than second point 92 place of 100mm, larger for the first pressure applied than 1: 90 the second pressure applied at second point 92 is applied on NARIKO mask.
So the second pressure is usually between 3mmHg and 35mmHg; And the second pressure always higher than the first pressure to provide lift effect.
The position of 1: 90 and the position of second point 92 schematically shown in Figure 4 with projection pattern.The pressure on actual mask 88 is measured actually by the measurement mechanism 100 shown in Fig. 3.
NARIKO mask 88 is shown in Figure 3.Mask 88 is standardized.Advantageously, mask 88 is supplied by the Zhong Jing process industry company (NakaiCraftIndustryCorporation) of Tokyo.
The fiber reinforced plastic core that it has been applied thereon by smooth polyurethane coating layer is made.
Referring to figs 12 to Figure 15, the size of mask 88 is summarized in following table.
table 1
Distance | Length (mm) |
E1 | 275 |
E2 | 255 |
E3 | 42 |
E4 | 63 |
E5 | 16 |
E6 | 72 |
E7 | 36 |
E8 | 145 |
E9 | 200 |
In order to measure the pressure of 1: 90 and second point 92 place, the measurement mechanism 100 shown in Fig. 3 can be used.
This device 100 comprises a pair jaw (jaw) 102, for the two ends 40,42 of clamping substrates 14.This device 100 also comprises for the tensioning apparatus 104 of horizontal stretch substrate 14 and the sensing system 106 for measuring 1: 90 and second point 92 place applied pressure.
In the example of fig. 3, tensioning apparatus 104 comprises dynamometer 108, and dynamometer makes nutted rod 110 movable and nutted rod 110 is connected to the connecting line 112,114 of the top and bottom of each jaw 106.
Nutted rod 110 is laterally extending relative to the sagittal surface of NORICO mask 18.Bar 110 moves horizontally by the movable rod 116 of tensometer 108.
Sensing system 106 comprises pressure sensor 115, and it is placed on before NORICO mask with above-mentioned defined distance.
In very concrete example, measurement mechanism comprises highly for 160mm, width are 11mm and weight is the vertical jaw 102 of 34.6g.
Jaw 102 clamps at two ends 40,42 place of substrate 14.Connecting line 112,114 is formed from steel.Their length is respectively 550mm and 550mm.Nutted rod 110 has the length of 155mm.Tensioning rod 116 is connected to that trade mark is IMADA, model is DPX-10T, commercially available dynamometer 108.
Nutted rod 110 is placed on the At The Height exceeding 220mm than the support 118 placing mask 88.The movable rod 116 of dynamometer extends in the sagittal axis of mask 88.
Sensor 115,125 is by the commercially available brand KIKUHIME of TTMediTradeSoleddet15, DK4180Soro.They are connected to the analyzer (secondary bandage & body pressure determinator) 117 that can measure the pressure be applied on each sensor 115.
Measure as follows.The temperature in room is adjusted to 23 DEG C.Hygrometry is adjusted to 50%.
Jaw 102 is placed on two ends 40,42 place of facial mask.Then, line 112,114 is connected to rod 110, and dynamometer 108 is activated to provide the pulling force to tensioning apparatus 106.Facial mask 10 is applied on the front surface of NARIKO mask 88.Pulling force makes the facial mask 10 applied in NARIKO mask 88 face produce horizontal extension.
Extend and be measured as the movement of dynamometer 108 along rule.
Particularly, the percentage elongation between 0% and 150% can be selected to measure with described measuring method.
Measure the pressure of 1: 90 by sensor 115 and measured the pressure of second point 92 by sensor 116, until usually the time more than 900 seconds after measured value be stable.
Now description facial mask 10 according to the present invention is used for the application of user face 12 cosmetic treatments.
First, user catches facial mask and it is placed on skin surface 10, and picks up the end 40,42 of facial mask 10 respectively with his hand.
Then, user is to resist the direction of elastic behavior of the nonwoven cloth material forming substrate 14 along axis A-A ' stretching facial mask 10 about 10% or more symmetrically.
In the first mode of operation, in accommodation facial mask 10 is packed, first cosmetics 24 flood facial mask 10.
As shown in Figure 5, user advantageously will have the surface applications of the facial mask 10 of cosmetics 24 on face line, nasolabial line, chin and cheek.
Then, ear 22 inserts in side opening 60,62 with lateral connection facial mask 10 by user.
Connection facial mask 10 after, be greater than 40mm along horizontal axis A-A ' to the distance at the center of centre bore 16 and be less than 1: 90 place of 75mm, substrate 14 by the first force applications in user face 12.
In addition, the distance with the angle being greater than 35 ° in horizontal axis A-A ' below to the center of centre bore is greater than 65mm and is less than second point 92 place of 100mm, substrate 14 by second force applications larger than the first pressure in user face 12.
Thus, facial mask 10 provides the cosmetic result strengthened user's skin.By means of the elastic property of nonwoven cloth material of substrate 14 forming facial mask 10, oneself fine adjustment on user's facial surface, and can not be lost its shape memory characteristic by facial mask 10.
When facial mask 10 stretches, it create following effect.
Because facial mask 10 is connected in user ear 22, strong pressure is applied on skin, and this can prevent facial mask 10 from getting back to its static configuration.
Facial mask 10 also provides the skin movements being called as " lift effect ", and this is derived from the attachment of non-woven fabrics and facial mask 10 to be applied to elastic force on skin.This elastic force makes user's skin fix.
Due to " sponge effect ", facial mask 10 also makes cosmetics desorb more significantly, and wherein more liquid is due to the distortion of facial mask 10 and pressure and desorb.
When width W 2 is less than width W 1, facial mask 10 provides strong " lift " effect to user's skin, and this provides the skin tightening effect to user face.
Second facial mask 150 according to the present invention is shown in Figure 7.This facial mask 150 and the first facial mask 10 are distinguished and are that it comprises the auricle 152 along lower limb.
Fig. 8 to Figure 11 discloses according to facial mask 160 of the present invention, at least one integration region 162 that the non-woven fabrics fiber that this facial mask comprises formation substrate 14 merges at least partly and at least one non-fused region 164 that non-woven fabrics fiber does not merge.The fusion of non-woven fabrics is avoided its distortion and is reduced the part that is elongated.This also produces the more pressure of skin.
In the example of Fig. 9, facial mask 160 comprises the non-fused region, center 164 that two integration regions 162 and non-woven fabrics fiber around Connection Element 18,20 do not merge.
Along axis A-A ' distance that the inward flange 166 of integration region 162 and Connection Element 18,20 are separated between 5mm and 20mm, particularly between 8mm and 12mm.
The facial mask 160 of Fig. 9 comprises the partial fusion region 162 of two band shapes.Each region 162 is laterally surrounded by the non-fused region, center 164 towards centre bore 16 and the sidepiece non-fused region 164 extending to facial mask two ends 40,42 away from centre bore 16.
Each integration region 162 is upwards boundary by top edge 44, and is boundary by the lower limb of substrate 14 downwards.
The facial mask 160 of Figure 10 comprises non-fused region, center 164 and extends to end 40,42 and comprise the integration region 162 of Connection Element 18,20.
Facial mask 160 also comprises two sidepiece non-fused regions 164 that the outward flange along each Connection Element 18,20 is arranged.
Facial mask 160 shown in Figure 11 has non-fused region, center 164 and extends to two side direction integration regions 162 at facial mask two ends 40,42.
Non-fused region, center 164 has two upper lateral regions 168, and they are positioned at above Connection Element 18,20.
In the embodiment of Fig. 8 to Figure 11, according to the composition of meltability fiber, by obtained for the non-woven fabrics local heat time of 0.2 second to 2 seconds integration region 162 at the temperature of 100 DEG C to 150 DEG C.
Integration region 162 has the beneficial effect avoiding when facial mask 10 is stretched being out of shape and/or tearing.Integration region 162 also can produce the pressure higher to skin by tensile surface by what reduce non-woven fabrics substrate 14.
Integration region 162 becomes repulsion make-up composition, thus prevents cosmetics to be positioned at towards ear or towards user's hair.
Execute stressed example to facial mask according to the present invention 1: 90 and second point 92 to provide in the following table.These pressure are when facial mask 10 stretches on NARIKO mask 88, such as measured during W1=E1 and W2=E2.
table 2
In alternative, facial mask 10 is not packaging together with cosmetics 24.Before application facial mask 10, cosmetics 24 are coated on facial mask 10 by user, or are directly placed on user on the face.
Claims (13)
1. be applied in user's non-woven fabrics facial mask on the face (10,150,160), comprise:
Mark off the substrate (14) of centre bore (16), described centre bore is for holding user's oral area, and described substrate (14) is defined through the horizontal axis (A-A ') at the center of described centre bore (16);
For being connected to the first side Connection Element (18) and the second side Connection Element (20) of user ear (22);
Wherein, described substrate (14) is made up of elastic nonwoven materials, described substrate (14) is configured to, when being greater than 10% when stretching along described horizontal axis, be greater than 40mm along described horizontal axis (A-A ') to the distance at the center of described centre bore (16) and be less than first point (90) place of 75mm, first pressure is applied on NARIKO mask (88), and, described substrate (14) is configured to, when being greater than 10% when stretching along described horizontal axis (A-A '), to be greater than 35 ° and the distance of the angle being advantageously less than 80 ° in described horizontal axis A-A ' below to the center of described centre bore (16) is greater than 65mm and is less than second point (92) place of 100mm, second pressure is applied on NARIKO mask (88), wherein, described second pressure is equal to or greater than described first pressure.
2. facial mask according to claim 1 (10,150,160), wherein, described first pressure is between 3mmHg and 35mmHg.
3. facial mask according to claim 1 and 2 (10,150,160), wherein, described second pressure is between 3mmHg and 35mmHg.
4. according to facial mask in any one of the preceding claims wherein (10,150,160), wherein, described substrate (14) comprising: the absorption nonwoven layer (30) receiving cosmetics (24) and the elasticity being attached to described absorbed layer (30) support nonwoven layer (32).
5. facial mask according to claim 4 (10,150,160), wherein, described absorbed layer (30) is the spunlace non-woven cloth layer advantageously comprising regenerated fiber; Described supporting layer (32) is the melt-blown nonwoven layer of cloth be advantageously made up of polyolefine fiber.
6. according to facial mask in any one of the preceding claims wherein (10,150,160), wherein, described first Connection Element (18) and described second Connection Element (20) include the side connecting hole (60,62) for receiving the corresponding ear of user (22).
7. facial mask according to claim 6 (10,150,160), wherein, at least one side connecting hole (60,62) extends along the side opening axis tilted relative to described horizontal axis (A-A ') (C-C ', D-D ').
8. facial mask according to claim 7 (10,150,160), wherein, the angle (α) be made up of the outer section of the side connecting hole axis (C-C ', D-D ') of described horizontal axis (A-A ') top and described horizontal axis (A-A ') between 30 ° and 135 °, advantageously between 30 ° and 90 °.
9. the facial mask (10,150,160) according to any one of claim 6 to 8, wherein, each side connecting hole (60,62) limits upper end (64,64 ') and lower end (66,66 '), top distance (W1) that the upper end (64) of the first side connecting hole (60) and the upper end (66) of the second side connecting hole (62) separate is greater than bottom distance (W2) separated in the lower end (64 ') of described first side connecting hole (60) and the lower end (66 ') of described second side connecting hole (62).
10. according to facial mask in any one of the preceding claims wherein (150,160), wherein, described substrate (14) comprising: at least one region (162) that the fiber of at least one integration region (164) that the fiber of non-woven fabrics merges at least partly and non-woven fabrics does not merge.
11. facial masks according to claim 10 (10,150,160), wherein, at least one integration region (164) extends through described first Connection Element (18) and/or passes described second Connection Element (20).
12. according to facial mask in any one of the preceding claims wherein (10,150,160), wherein, described facial mask comprises the cosmetics (24) carried by described substrate (14), described cosmetics (24) advantageously anti-aging product.
The cosmetic treatment method of 13. user faces, comprises the following steps:
There is provided according to facial mask in any one of the preceding claims wherein (10,150,160);
Along facial mask (10,150,160) described in horizontal axis (A-A ') elastic stretching, be advantageously greater than 10%;
Described facial mask (10,150,160) is applied on user's face (12), makes user's oral area be positioned in the face of described central opening (16);
Described first side Connection Element (18) and described second side Connection Element (20) are connected respectively to user ear (22);
Wherein, when being greater than 10% when stretching along described horizontal axis, first pressure, being greater than 40mm along described horizontal axis (A-A ') to the distance at the center of described centre bore (16) and being less than first point (90) place of 75mm, is applied in user face by described substrate (14); And, when being greater than 10% when stretching along described horizontal axis (A-A '), described substrate (14) is to be greater than 35 ° and the distance of the angle being advantageously less than 80 ° in described horizontal axis A-A ' below to the center of described centre bore (16) is greater than 65mm and is less than second point (92) place of 100mm, second pressure is applied in user face, further, described second pressure is equal to or greater than described first pressure.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/IB2013/000604 WO2014140663A1 (en) | 2013-03-12 | 2013-03-12 | Non-woven face mask and corresponding cosmetic treatment method. |
Publications (1)
Publication Number | Publication Date |
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CN105228488A true CN105228488A (en) | 2016-01-06 |
Family
ID=48483108
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201380074597.8A Pending CN105228488A (en) | 2013-03-12 | 2013-03-12 | Non-woven fabrics facial mask and corresponding cosmetic treatment method |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2016512456A (en) |
KR (1) | KR20150131082A (en) |
CN (1) | CN105228488A (en) |
SG (1) | SG11201507222WA (en) |
WO (1) | WO2014140663A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109496147A (en) * | 2017-08-01 | 2019-03-19 | 塚本进 | Facial mask piece |
CN113993418A (en) * | 2019-06-14 | 2022-01-28 | Lg伊诺特有限公司 | Mask and skin care device comprising same |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2018061596A1 (en) * | 2016-09-27 | 2019-07-18 | パナソニックIpマネジメント株式会社 | Thin film sticking apparatus and thin film forming method |
JP6587117B1 (en) * | 2019-02-22 | 2019-10-09 | 進一 塚本 | Pack sheet |
JP7339040B2 (en) * | 2019-07-12 | 2023-09-05 | 株式会社カナエテクノス | lift-up sheet, face mask |
US20210244924A1 (en) * | 2020-02-10 | 2021-08-12 | Icy Beauty Inc. | Mask assembly for face |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4117837A (en) * | 1976-05-26 | 1978-10-03 | Turbo, S.A. | Monopiece face mask for beauty treatment |
CN201239258Y (en) * | 2008-04-30 | 2009-05-20 | 诺斯贝尔(中山)无纺日化有限公司 | Face pack cloth |
JP2010012188A (en) * | 2008-07-02 | 2010-01-21 | Ritsuko Ozaki | Mask for preventing saggy face |
CN102014850A (en) * | 2008-05-08 | 2011-04-13 | 雅芳产品公司 | Stretchable cosmetic mask |
KR20110107956A (en) * | 2010-03-26 | 2011-10-05 | 이경록 | V-shaping mask pack |
CN102429727A (en) * | 2011-08-10 | 2012-05-02 | 四川华肤生物科技有限责任公司 | Noninvasive measuring and repeated positioning method for face skin of human body |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3120502B2 (en) | 1991-03-05 | 2000-12-25 | 日本ケミコン株式会社 | Exterior case for electrolytic capacitor and method of manufacturing the same |
US20030129750A1 (en) | 1998-02-05 | 2003-07-10 | Yitzhack Schwartz | Homing of donor cells to a target zone in tissue using active therapeutics or substances |
JP3499549B1 (en) | 2002-09-11 | 2004-02-23 | 英生 住野 | Irrigation bath |
JP2004267692A (en) * | 2003-03-04 | 2004-09-30 | Suzuko Sato | Face mask having sheet form for corresponding to three dimensional shape, and method of drafting the mask |
JP3944526B2 (en) | 2004-08-11 | 2007-07-11 | 大和紡績株式会社 | Skin covering sheet for impregnating cosmetics, method for producing the same, and face mask using the same |
JP5343247B2 (en) | 2007-10-19 | 2013-11-13 | 興司 中村 | Beauty aid |
JP2009113585A (en) | 2007-11-05 | 2009-05-28 | Asmo Co Ltd | Wiper arm, and wiper for vehicle |
JP2009147824A (en) | 2007-12-17 | 2009-07-02 | Toshiba Corp | Imaging apparatus and imaging method |
JP5201532B2 (en) | 2008-03-19 | 2013-06-05 | Jnc株式会社 | Elastic laminate sheet |
WO2009116118A1 (en) | 2008-03-19 | 2009-09-24 | 株式会社スイスセルラボ・ジャパン | Cosmetic mask |
JP5094606B2 (en) | 2008-07-15 | 2012-12-12 | キヤノン株式会社 | Image shake correction apparatus, optical apparatus including the same, image pickup apparatus, and image shake correction apparatus control method |
WO2010064710A1 (en) * | 2008-12-05 | 2010-06-10 | ダイワボウホールディングス株式会社 | Skin-covering sheet for impregnation with cosmetic preparation, manufacturing method thereof, and face mask utilizing the same |
JP2010259621A (en) * | 2009-05-07 | 2010-11-18 | Lion Corp | Mask for beauty |
JP2011000388A (en) * | 2009-06-22 | 2011-01-06 | Kao Corp | Face mask |
US20100324509A1 (en) | 2009-06-23 | 2010-12-23 | Tina Lee | Face Mask |
JP5198401B2 (en) | 2009-10-01 | 2013-05-15 | 株式会社平和 | Game machine |
JP4695208B1 (en) | 2009-12-28 | 2011-06-08 | 株式会社資生堂 | Beauty method and beauty kit |
JP5478297B2 (en) | 2010-02-24 | 2014-04-23 | 明広商事株式会社 | Pack sheet for beauty |
FR2968930B1 (en) * | 2010-12-17 | 2013-05-10 | Oreal | COSMETIC MASK FOR USE ON A BODILY SURFACE, USE AND METHOD THEREFOR. |
JP5979821B2 (en) * | 2011-04-27 | 2016-08-31 | ユニ・チャーム株式会社 | Face sheet |
-
2013
- 2013-03-12 CN CN201380074597.8A patent/CN105228488A/en active Pending
- 2013-03-12 KR KR1020157026963A patent/KR20150131082A/en not_active Application Discontinuation
- 2013-03-12 WO PCT/IB2013/000604 patent/WO2014140663A1/en active Application Filing
- 2013-03-12 SG SG11201507222WA patent/SG11201507222WA/en unknown
- 2013-03-12 JP JP2015562341A patent/JP2016512456A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4117837A (en) * | 1976-05-26 | 1978-10-03 | Turbo, S.A. | Monopiece face mask for beauty treatment |
CN201239258Y (en) * | 2008-04-30 | 2009-05-20 | 诺斯贝尔(中山)无纺日化有限公司 | Face pack cloth |
CN102014850A (en) * | 2008-05-08 | 2011-04-13 | 雅芳产品公司 | Stretchable cosmetic mask |
JP2010012188A (en) * | 2008-07-02 | 2010-01-21 | Ritsuko Ozaki | Mask for preventing saggy face |
KR20110107956A (en) * | 2010-03-26 | 2011-10-05 | 이경록 | V-shaping mask pack |
CN102429727A (en) * | 2011-08-10 | 2012-05-02 | 四川华肤生物科技有限责任公司 | Noninvasive measuring and repeated positioning method for face skin of human body |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109496147A (en) * | 2017-08-01 | 2019-03-19 | 塚本进 | Facial mask piece |
CN109496147B (en) * | 2017-08-01 | 2021-07-27 | 塚本进一 | Sheet for face pack |
CN113993418A (en) * | 2019-06-14 | 2022-01-28 | Lg伊诺特有限公司 | Mask and skin care device comprising same |
CN113993418B (en) * | 2019-06-14 | 2023-04-28 | Lg伊诺特有限公司 | Mask and skin care device comprising same |
Also Published As
Publication number | Publication date |
---|---|
JP2016512456A (en) | 2016-04-28 |
SG11201507222WA (en) | 2015-10-29 |
KR20150131082A (en) | 2015-11-24 |
WO2014140663A1 (en) | 2014-09-18 |
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