CN105137723A - Three-dimensional ellipse movement work table for two-photon polymerization processing - Google Patents

Abstract

The invention relates to a three-dimensional ellipse movement work table for two-photon polymerization processing, and belongs to the field of ultra-precise processing. A work table with a flexible hinge structure is driven by three piezoelectric stacks in the directions X, Y and Z; the micromotion in the three directions X, Y and Z can be realized; the three piezoelectric stacks are respectively pre-tightened by pre-tightening screws; the work table is respectively driven by the single piezoelectric stacks in each direction; the interference of the movement in the other directions on the driving direction is avoided; driving signals with the same frequency and non-zero phase difference are given to the three piezoelectric stacks; the two-dimensional ellipse movement or the three-dimensional ellipse movement of the work table in the space can be realized; through controlling the ellipse movement parameter, the position and the size of the ellipse can be regulated; the flexible hinges of the work table in the directions X and Y are formed by combining and connecting straight beam type hinges in an end-to-end way. The work table provided by the invention has the advantages that the processing is simple; the size is small; a better object carrying space is realized; high-frequency and continuous three-dimensional ellipse movement can be realized.

Description

A kind of three-dimensional elliptical motion workbench for two-photon polymerized processing

Technical field

The invention belongs to Ultra-precision Turning field, particularly relate to a kind of three-dimensional elliptical motion workbench for two-photon polymerized processing.

Background technology

The application of micro-nano structure function element not only relates to information and mechanics of communication, the industrial circles such as space, safety and defence, and relates to the social development fields such as health, the energy, environment.Two-photon polymerized (TwoPhotonPolymerization, TPP) is thought by many scholars a kind of the most rising method obtaining micro-nano structure function element.This mainly because: (1) TPP has very high spatial resolution, usually can obtain the characteristic dimension of 100nm or less; (2) polymerizable material needed for TPP is comparatively extensive, also obtains specific metal surface easily via the simple process such as electroless plating or chemical vapor deposition; (3) technique of TPP is simple, and required technological equipment is also uncomplicated, less demanding to processing environment; (4) volume elements (Voxel) formed by TPP can construct any complex geometry.

In existing research, according to Exposure mode, mainly contain two kinds of scan methods: i.e. precise positioning scanning (PinpointScanning) and continuous sweep (ContinuousScanning).Precise positioning scan method exposes polymeric material in each exact position, and the parameter of the method impact exposure more easy to control, can obtain very high forming accuracy, but consuming time oversize.Continuous sweep method be laser beam relative to exemplar or exemplar relative to the translation of laser beam in continue exposure, the method has higher working (machining) efficiency but is limited to mating between laser power with speed of feed, and the forming accuracy obtained is lower.

Summary of the invention

The invention provides a kind of three-dimensional elliptical motion workbench for two-photon polymerized processing, in order to realize workpiece to be added in fast feed process relative to laser plan static exposure, to solve how while precise motion platform high speed feed, make workpiece to be added produce the speed contrary with speed of feed direction, size is identical, and then realize workpiece to be added this problem demanding prompt solution of plan static exposure at laser spot place.

The technical solution used in the present invention is: side shield one is connected with base plate by screw three, screw four, side shield two is connected with base plate by screw five, screw six, and the stiff end one with the worktable of hinge arrangement is arranged on side shield one by screw seven, screw eight; Stiff end two is arranged on side shield two by screw nine, screw ten, X passes through pre-loading screw one with X to drive block apical grafting to piezoelectric stack one, Y-direction piezoelectric stack two is by pre-loading screw two and Y-direction drive block apical grafting, Z-direction block is fixed on X on drive block by gib screw one, gib screw two, Z-direction piezoelectric stack three is arranged on Z-direction block, by bottom pre-loading screw three and objective table apical grafting; X is consistent to piezoelectric stack one direction with X to displacement transducer, is arranged on X in piezoelectric stack one by one side through hole, is fixed by trip bolt three; Y-direction displacement transducer is consistent with Y-direction piezoelectric stack two direction, is arranged in Y-direction piezoelectric stack 21 side through hole, is fixed by trip bolt four; Z-direction displacement transducer is consistent with Z-direction piezoelectric stack three direction, is arranged on Z-direction block, in Z-direction piezoelectric stack three side, is fixed by trip bolt five;

The described worktable with hinge arrangement is by objective table, X is to drive block, Y-direction drive block, stiff end one, stiff end two is formed by connecting by the flexible hinge between them, described objective table is by flexible hinge one, flexible hinge two, flexible hinge three, flexible hinge four connects to drive block with X, X to drive block by compound hinges one, compound hinges two, compound hinges three, compound hinges four is connected with Y-direction drive block, compound hinges one and compound hinges two are symmetrical structure relative to main body Y-direction center, compound hinges three and compound hinges four are symmetrical structure relative to main body Y-direction center, compound hinges one is symmetrically distributed in X to drive block two ends with compound hinges two, compound hinges three with compound hinges four, be connected with Y-direction drive block, compound hinges five and compound hinges six are symmetrical structure relative to main body X to center, compound hinges seven and compound hinges eight are symmetrical structure relative to main body X to center, compound hinges five is symmetrically distributed in Y-direction drive block two ends with compound hinges six, compound hinges seven with compound hinges eight, and both sides are connected with stiff end one, stiff end two respectively,

Described compound hinges one, compound hinges two, compound hinges three or compound hinges four are joined end to end by four straight beam type hinges respectively and form.

By the ACTIVE CONTROL of the amplitude to piezoelectric stack one, piezoelectric stack two, piezoelectric stack three, frequency and phase place, realize worktable and do two-dimensional elliptic motion or three-dimensional elliptical motion in space.

The invention has the advantages that:

(1) all directions drive by single piezoelectric stack, respectively to motion series connection mutually, respectively between motion, do not have sports coupling, reduce piezoelectric stack at surface of contact generation lateral slip to the infringement that piezoelectric stack produces simultaneously.

(2) adopt even number straight beam type flexible hinge to join end to end the compound hinges combined, range of movement is large, highly sensitive; Symmetrical due to compound hinges, reduces the Run-out error brought when piezoelectric stack promotes flexible hinge; Adopt compound hinges greatly can reduce device volume.

(3) by the input signal of the piezoelectric stack in ACTIVE CONTROL X, Y, Z tri-directions, the ACTIVE CONTROL to three-dimensional elliptical movement locus amplitude, frequency and phase place can be realized, to adapt to the demand of various machining locus.

(4) described three-dimensional elliptical motion workbench structure is simple and be easy to processing.

Accompanying drawing explanation

Fig. 1 is structural representation of the present invention;

Fig. 2 looks up axonometric drawing after the present invention removes base plate;

Fig. 3 is the axonometric drawing that the present invention has the worktable main body of flexible hinge;

Fig. 4 is symmetrically distributed in the schematic diagram of stressed both sides by the join end to end compound hinges that forms of even number straight beam type hinge in the present invention;

Fig. 5 is the vertical view that the present invention has the worktable main body of flexible hinge.

Embodiment

Side shield 1 is connected with base plate 24 by screw 3 25, screw 4 27, side shield 2 14 is connected with base plate 24 by screw 5 12, screw 6 15, and the stiff end 1 with the worktable 9 of hinge arrangement is arranged on side shield 1 by screw 72, screw 88; Stiff end 2 911 is arranged on side shield 2 14 by screw 9 11, screw 10, X passes through pre-loading screw 1 with X to drive block 907 apical grafting to piezoelectric stack 1, Y-direction piezoelectric stack 26 is by pre-loading screw 25 and Y-direction drive block 906 apical grafting, Z-direction block 19 is fixed on X on drive block 907 by gib screw 1, gib screw 2 10, Z-direction piezoelectric stack 3 17 is arranged on Z-direction block 19, by bottom pre-loading screw 3 26 and objective table 916 apical grafting; X is consistent to piezoelectric stack 1 direction with X to displacement transducer 20, is arranged on X in piezoelectric stack 1 side through hole, is fixed by trip bolt 3 21; Y-direction displacement transducer 3 is consistent with Y-direction piezoelectric stack 26 direction, is arranged in Y-direction piezoelectric stack 261 side through hole, is fixed by trip bolt 44; Z-direction displacement transducer 18 is consistent with Z-direction piezoelectric stack 3 17 direction, is arranged on Z-direction block 19, in Z-direction piezoelectric stack 3 17 side, is fixed by trip bolt 5 16;

The described worktable 9 with hinge arrangement is by objective table 916, X is to drive block 907, Y-direction drive block 906, stiff end 1, stiff end 2 911 is formed by connecting by the flexible hinge between them, described objective table 916 is by flexible hinge 1, flexible hinge 2 904, flexible hinge 3 912, flexible hinge 4 914 connects to drive block 907 with X, X to drive block 907 by compound hinges 1, compound hinges 2 909, compound hinges 3 915, compound hinges 4 917 is connected with Y-direction drive block 906, compound hinges 1 and compound hinges 2 909 are symmetrical structure relative to main body Y-direction center, compound hinges 3 915 and compound hinges 4 917 are symmetrical structure relative to main body Y-direction center, compound hinges 1 is symmetrically distributed in X to drive block two ends with compound hinges 2 909, compound hinges 3 915 with compound hinges 4 917, be connected with Y-direction drive block, compound hinges 5 901 and compound hinges 6 905 are symmetrical structure relative to main body X to center, compound hinges 7 910 and compound hinges 8 913 are symmetrical structure relative to main body X to center, compound hinges 5 901 is symmetrically distributed in Y-direction drive block two ends with compound hinges 6 905, compound hinges 7 910 with compound hinges 8 913, and both sides are connected with stiff end 1, stiff end 2 911 respectively,

Described compound hinges one, compound hinges 2 909, compound hinges 3 915 or compound hinges four are joined end to end by four straight beam type hinges respectively and form.

By the ACTIVE CONTROL of the amplitude to piezoelectric stack 1, piezoelectric stack 26, piezoelectric stack 3 17, frequency and phase place, realize worktable and do two-dimensional elliptic motion or three-dimensional elliptical motion in space.

The drive singal of three piezoelectric stacks can be respectively:

In formula, u _x(t), u _y(t) and u _zt () is the input signal of piezoelectric stack one, piezoelectric stack two, piezoelectric stack three respectively, V _x, V _y, V _zinput signal u respectively _x(t), u _y(t), u _zthe amplitude of (t); input signal u respectively _x(t), u _y(t), u _zthe initial phase of (t).The voltage of piezoelectric stack input determines the collapsing length of piezoelectric stack, and then determines the displacement of worktable.Under the driving of three piezoelectric stacks, objective table does three-dimensional elliptical motion locus formula in space is:

$\{\begin{array}{c}x\left(t\right)=A_{x}cos(2\mathrm{\π}ft+{\mathrm{\ψ}}_x)\\ y\left(t\right)=A_{y}cos(2\mathrm{\π}ft+{\mathrm{\ψ}}_y)\\ z\left(t\right)=A_{z}cos(2\mathrm{\π}ft+{\mathrm{\ψ}}_z)\end{array}---\left(2\right)$

In formula, A _x, A _y, A _zthe amplitude of worktable in X, Y, Z tri-direction displacements respectively, ψ _x, ψ _y, ψ _zthe phase place of worktable in X, Y, Z tri-direction displacements respectively.ψ _x, ψ _y, ψ _zphase differential between any two can be expressed as:

$\{\begin{array}{c}{\mathrm{\Δ\ψ}}_{yx}={\mathrm{\ψ}}_y-{\mathrm{\ψ}}_x=n_1\mathrm{\π}\\ {\mathrm{\Δ\ψ}}_{zy}={\mathrm{\ψ}}_z-{\mathrm{\ψ}}_y\≠n_2\mathrm{\π}\\ {\mathrm{\Δ\ψ}}_{zx}={\mathrm{\ψ}}_z-{\mathrm{\ψ}}_x={\mathrm{\Δ\ψ}}_{zy}+n_1\mathrm{\π}\≠n_3\mathrm{\π}\end{array}---\left(3\right)$

In formula, n ₁, n ₂, n ₃be all integer, △ ψ _yxfor ψ _ywith ψ _xphase differential, △ ψ _zyfor ψ _zwith ψ _yphase differential, △ ψ _zxfor ψ _zwith ψ _xphase differential.Particularly when meeting

$\{\begin{array}{c}{\mathrm{\Δ\ψ}}_{yx}=n_1\mathrm{\π}\\ {\mathrm{\Δ\ψ}}_{zy}=(2n_2+1)\mathrm{\π}/2\\ {\mathrm{\Δ\ψ}}_{zx}={\mathrm{\Δ\ψ}}_{zy}+n_1\mathrm{\π}\end{array}---\left(4\right)$

Time, the projection of movement locus on coordinate plane XOZ and YOZ of three-dimensional elliptical motion workbench is respectively standard ellipse track, and namely the major axis of two elliptical orbits is parallel to coordinate axis OX and OY respectively.

By the speed component of three-dimensional elliptical motion workbench in X, Y, Z-direction can be obtained to formula (2) differentiate, and substitute into formula (3), formula (4), can obtain,

$\{\begin{array}{c}{v}_x=-2{\mathrm{\πA}}_{x}fsin(2\mathrm{\π}ft+{\mathrm{\ψ}}_x)\\ v_y=-2{\mathrm{\πA}}_{y}fsin(2\mathrm{\π}ft+{\mathrm{\ψ}}_x)cos\left(n_1\mathrm{\π}\right)\\ v_z=-2{\mathrm{\πA}}_{z}fsin(2\mathrm{\π}ft+{\mathrm{\ψ}}_x+{\mathrm{\Δ\ψ}}_{zy})cos\left(n_1\mathrm{\π}\right)\end{array}---\left(5\right)$

Be arranged on by three-dimensional elliptical motion workbench on precise motion axle, clamping workpiece to be added is on three-dimensional elliptical motion workbench.When workpiece to be added is when at a time speed is level to the movement velocity component of XOZ and YOZ plane, by the parameter of ACTIVE CONTROL three-dimensional elliptical motion workbench, make, the equal and opposite in direction contrary with the speed of feed direction of X, Y-direction kinematic axis respectively of the speed component in XOZ and YOZ plane.Now, open shutter, make laser complete single exposure to machined part, and with this position for initial exposure position.When frequency of exposure and elliptic motion frequency of operation match, can realize in the plan static exposure of workpiece to be added in the fast feed of precise motion axle.

Claims (3)

1. the three-dimensional elliptical motion workbench for two-photon polymerized processing, it is characterized in that: side shield one is connected with base plate by screw three, screw four, side shield two is connected with base plate by screw five, screw six, and the stiff end one with the worktable of hinge arrangement is arranged on side shield one by screw seven, screw eight; Stiff end two is arranged on side shield two by screw nine, screw ten, X passes through pre-loading screw one with X to drive block apical grafting to piezoelectric stack one, Y-direction piezoelectric stack two is by pre-loading screw two and Y-direction drive block apical grafting, Z-direction block is fixed on X on drive block by gib screw one, gib screw two, Z-direction piezoelectric stack three is arranged on Z-direction block, by bottom pre-loading screw three and objective table apical grafting; X is consistent to piezoelectric stack one direction with X to displacement transducer, is arranged on X in piezoelectric stack one by one side through hole, is fixed by trip bolt three; Y-direction displacement transducer is consistent with Y-direction piezoelectric stack two direction, is arranged in Y-direction piezoelectric stack 21 side through hole, is fixed by trip bolt four; Z-direction displacement transducer is consistent with Z-direction piezoelectric stack three direction, is arranged on Z-direction block, in Z-direction piezoelectric stack three side, is fixed by trip bolt five.

2. a kind of three-dimensional elliptical motion workbench for two-photon polymerized processing according to claim 1, it is characterized in that: described in there is the worktable of hinge arrangement by objective table, X is to drive block, Y-direction drive block, stiff end one, stiff end two is formed by connecting by the flexible hinge between them, described objective table is by flexible hinge one, flexible hinge two, flexible hinge three, flexible hinge four connects to drive block with X, X to drive block by compound hinges one, compound hinges two, compound hinges three, compound hinges four is connected with Y-direction drive block, compound hinges one and compound hinges two are symmetrical structure relative to main body Y-direction center, compound hinges three and compound hinges four are symmetrical structure relative to main body Y-direction center, compound hinges one is symmetrically distributed in X to drive block two ends with compound hinges two, compound hinges three with compound hinges four, be connected with Y-direction drive block, compound hinges five and compound hinges six are symmetrical structure relative to main body X to center, compound hinges seven and compound hinges eight are symmetrical structure relative to main body X to center, compound hinges five is symmetrically distributed in Y-direction drive block two ends with compound hinges six, compound hinges seven with compound hinges eight, and both sides are connected with stiff end one, stiff end two respectively.

3. a kind of three-dimensional elliptical motion workbench for two-photon polymerized processing according to claim 2, is characterized in that: described compound hinges one, compound hinges two, compound hinges three or compound hinges four are joined end to end by four straight beam type hinges respectively and form.