CN105127599B - Method and system for exposing elliptic motion during femtosecond laser machining of motion workpiece - Google Patents
Method and system for exposing elliptic motion during femtosecond laser machining of motion workpiece Download PDFInfo
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- CN105127599B CN105127599B CN201510621717.2A CN201510621717A CN105127599B CN 105127599 B CN105127599 B CN 105127599B CN 201510621717 A CN201510621717 A CN 201510621717A CN 105127599 B CN105127599 B CN 105127599B
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- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000003754 machining Methods 0.000 title abstract description 5
- 230000008859 change Effects 0.000 claims abstract description 5
- 230000008569 process Effects 0.000 claims abstract description 5
- 150000001875 compounds Chemical class 0.000 claims description 71
- 241000219739 Lens Species 0.000 claims description 12
- 210000000695 crystalline len Anatomy 0.000 claims description 12
- 238000006073 displacement reaction Methods 0.000 claims description 12
- 230000003287 optical effect Effects 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
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- 238000005286 illumination Methods 0.000 claims description 3
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- 230000004907 flux Effects 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- NMFHJNAPXOMSRX-PUPDPRJKSA-N [(1r)-3-(3,4-dimethoxyphenyl)-1-[3-(2-morpholin-4-ylethoxy)phenyl]propyl] (2s)-1-[(2s)-2-(3,4,5-trimethoxyphenyl)butanoyl]piperidine-2-carboxylate Chemical compound C([C@@H](OC(=O)[C@@H]1CCCCN1C(=O)[C@@H](CC)C=1C=C(OC)C(OC)=C(OC)C=1)C=1C=C(OCCN2CCOCC2)C=CC=1)CC1=CC=C(OC)C(OC)=C1 NMFHJNAPXOMSRX-PUPDPRJKSA-N 0.000 description 2
- 230000036461 convulsion Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001727 in vivo Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 238000002679 ablation Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000007687 exposure technique Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
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Abstract
The invention relates to a method and a system for exposing elliptic motion during femtosecond laser machining of a motion workpiece, and belongs to the technical field of femtosecond laser machining. According to the method, an elliptic motion workbench is mounted on a motion platform; driven by the three-dimensional elliptic motion workbench, a to-be-machined workpiece performs high-frequency three-dimensional elliptic motion in a translational manner, relative to the motion platform for feeding in the X and Y directions; through frequency and amplitude adjustment of the elliptic motion, the projectional components in the X and Y directions of the instantaneous velocity of an expected exposure position p in the to-be-machined workpiece have the same magnitude but different directions with the feeding velocities in the X and Y directions of the motion platform at the upper vertex or the lower vertex of an ellipse, so that a laser beam can quasi-statically reside relative to the motion workpiece under the condition of sufficient luminous flux; through amplitude change of the elliptic motion, the distance between two adjacent exposure positions can be adjusted. The method and the system are easy to implement during femtosecond laser machining, and an expected exposure position in a workpiece can be efficiently exposed in a rapid workpiece feeding process.
Description
Technical field
The invention belongs to femtosecond laser processing technique field, ellipse in more particularly to a kind of Moving Workpieces femtosecond laser processing
Circular motion exposure method and system.
Background technology
Femtosecond laser process technology relates generally to carry out surface of the work ablation, in vivo blast, refraction using femtosecond laser beam
The processing technique such as rate changes, the polymerization of two photons, cannot be only used for preparing three-dimensional nano-micro structure function surface device, it may also be used for change
Become material internal property, and three-dimensional nano-micro structure functional device in vivo can be prepared, receive extensively in many important engineering fields
General concern.No matter material is removed using femtosecond laser beam, is modified, or shaping, femtosecond laser beam acts on workpiece
Must all have sufficient luminous flux.In order to obtain large-area three-dimensional nano-micro structure functional device, femtosecond laser beam must phase
For workpiece makees scanning motion, or workpiece makees feed motion relative to femtosecond laser beam.
Existing scanning feeds enforcement, relates generally to two kinds of fundamental types：First workpiece is motionless, by one-dimensional or two
Dimension galvanometer deflection femtosecond laser beam, makes femtosecond laser beam make scanning motion relative to workpiece；Which two is that laser beam is motionless, clamping work
The sports platform of part makees translation feed motion relative to femtosecond laser beam.Either the first scan method or second feeding side
Method, the interaction between femtosecond laser beam and workpiece relate generally to two kinds of exposure technique schemes：First, femtosecond laser beam and work
Catch cropping point position exposure (Pinpoint exposure) of part, this requires that laser beam must be in desired exposure position relative to workpiece
Put in geo-stationary, but the sports platform for making the laser beam of deflection at a high speed or quick translation feeding stops rapidly simultaneously at the volley
It is stably very difficult；Second, the catch cropping continuous exposure (Continuous exposure) of laser beam and workpiece, but it is
Workpiece material is caused to obtain enough luminous fluxes, femtosecond laser beam must be limited to spy relative to the scanning speed of workpiece to be added
Determine in scope, which has limited the raising of working (machining) efficiency.
The content of the invention
This provides elliptic motion exposure method and system in a kind of Moving Workpieces femtosecond laser processing, is flown with solving to load
The sports platform of second laser beam or workpiece is difficult to the problem of jerk due to motional inertia, and avoids femtosecond laser beam in continuous exposure
Scanning speed or sports platform feed speed are limited to the problem that luminous flux is difficult to improve, so as to preferably meet three-dimensional nano-micro structure
The requirement of highly-efficient processing.
The present invention is adopted the technical scheme that, is comprised the following steps：
(1) by clamping workpiece to be added on an elliptic motion workbench, elliptic motion workbench is arranged on can be along X and Y
To on the sports platform of feeding, under the driving of elliptic motion workbench, workpiece to be added is made relative to sports platform with translational movement
Two-dimensional elliptic move or three-dimensional elliptical motion, install elliptic motion workbench sports platform, from can along X to feeding sports platform and
Along the sports platform composition of Y-direction feeding, the translation that can carry out big stroke along X-axis and Y-axis in XOY faces enters to give to realize that workpiece is relative
In the scanning motion of femtosecond laser beam, femtosecond laser beam need not carry out oscillatory scanning, and sports platform and sports platform are air supporting respectively
Support the kinematic axiss directly driven using linear electric motors, each axle all have submicron order kinematic accuracy and big stroke；Focus on
Object lens are arranged on Z axis sports platform, and Z axis sports platform is used for realizing laser beam foucing in workpiece to be added along Z along the micromotion of Z axis
Feeding on direction of principal axis；Laser beam is sent by femto-second laser, Jing attenuators, optical shutter, beam expanding lens, reflecting mirror one, diaphragm, anti-
After penetrating mirror two, reflecting mirror three, beam splitter, focusing objective len, workpiece to be added is acted on along Z-direction, the break-make of laser beam passes through light
Shutter is controlled；The course of processing realizes online observation by digital camera, convex lenss, beam splitter, and illumination light is by lighting source
Send, reflected mirror reflection is radiated on workpiece to be added；
(2) the elliptic motion workbench described in, is respectively adopted the load that three piezoelectric actuating elements directly drive flexible support
Thing platform makees cycle movement along X, Y and Z-direction, by controlling the phase contrast between the two neighboring direction of motion, so that object stage point
The elliptical trajectory of two dimension is not formed on vertical plane XOZ and YOZ, forms reciprocal linear motion on horizontal plane XOY
Track；The input signal of three piezoelectric actuating elements is：
In formula, Vx、Vy、VzRespectively X, Y, three piezoelectric actuating elements drive signal u of Z-directionx(t)、uy(t)、uzThe width of (t)
Value；For being respectively the initial phase of X, Y, Z-direction drive signal；Frequencies of the f for drive signal.Transport in three-dimensional elliptical
Under the driving of dynamic workbench, workpiece desired exposure position p displacements to be added are represented by：
In formula, ax、ayAnd azBe respectively in workpiece to be added desired exposure position p X-axis, Y-axis, Z-direction amplitude；WithThe initial phase that to be desired exposure position p respectively vibrate in X, Y and Z-direction；F is three-dimensional elliptical motion workbench
Motion frequency；
In order that desired exposure position p forms straight path on coordinate plane XOY in workpiece, and in coordinate plane XOZ
With form elliptical orbit on YOZ respectively, between adjacent motion, phase contrast must is fulfilled for：
In formula, n1、n2、n3It is all integer.ForWithPhase contrast,ForWithPhase contrast,ForWithPhase contrast.Particularly work as satisfaction：
When, in workpiece to be added, desired exposure position p will form the oval rail of standard on coordinate plane XOZ and YOZ respectively
The oval major axis of mark, i.e., two will all be respectively parallel to coordinate axess OX and OY；
(3) in order that on workpiece to be added instantaneous velocitys of the desired exposure position p relative to laser beam on horizontal plane XOY be
Zero, it is necessary to meet following condition：
In formula, vpxAnd vpyIt is instantaneous velocity vs of the desired exposure position p relative to sports platform 12 on workpiece respectivelypIn X and Y
The component in direction；vfxAnd vfyIt is sports platform respectively along X and the feed speed of Y-direction；The instantaneous speed of desired exposure position p on workpiece
Degree direction is the linear reciprocating motion direction on the coordinate plane XOY of level, synthesizes feed speed vpWith sports platform 12
Synthesis feed speed vfIt is equal in magnitude, in opposite direction；
Available by formula (2), in workpiece, three velocity components of desired exposure position p are as follows：
Horizontal velocity v of the apex under ellipse is obtained by formula (6)pIt is respectively in the absolute value of X, Y-direction component：
Therefore can be by the amplitude a of change three-dimensional elliptical motion workbenchxAnd ayAnd the fortune of three-dimensional elliptical motion workbench
Dynamic frequency f is adjusting vpxAnd vpy, so as to match workbench feed speed v in x and y directionfxAnd vfy；
Now, shutter break-make once, completes single exposure；
(4) be the Continuous maching of laser beam being realized to workpiece, when each elliptical trajectory reaches lower summit, must complete to expose
Light once, i.e. break-make frequency f of optical shuttersFrequency f of elliptic motion should be made equal to workpiece, so that the break-make of femtosecond laser beam
It is synchronous with the elliptic motion of workpiece, that is, femtosecond laser beam acted in summit and local neighborhood only in the case where workpiece makees elliptic motion
In workpiece, next cycle exposure position is exposed on distance d of X, Y-direction with the previous cyclex、dyFor：
Can be obtained by formula (5), formula (7), formula (8) simultaneous：
Three-dimensional elliptical motion workbench is in X, the amplitude a of Y-directionx、ayBy adjacent periods exposure position X, Y-direction away from
From dx、dyDetermine.When three-dimensional elliptical motion workbench is in X, the amplitude a of Y-directionx、ayIt is determined that afterwards, can be obtained by formula (5), (7)：
The motion frequency f of three-dimensional elliptical motion workbench is by sports platform in X, feed speed v of Y-directionfx、vfyDetermine, fortune
The feed speed of dynamic platform determines the process velocity of workpiece to be added, when sports platform speed is lifted, improves three-dimensional elliptical motion work
Make the frequency of platform, the feed speed of sports platform can be matched, it is achieved thereby that to workpiece during workpiece makees fast feed
The position of middle desired exposure is efficiently exposed.
The present invention realizes that the system of elliptic motion exposure method in the processing of Moving Workpieces femtosecond laser is：
Femto-second laser, Jing attenuators, optical shutter, beam expanding lens, reflecting mirror one, diaphragm, reflecting mirror two, reflecting mirror three, point
Shu Jing, focusing objective len order light connects, digital camera and convex lenss are located above beam splitter, and moveable table position is in focusing objective len
Lower section, lighting source and reflecting mirror are located at below sports platform, and elliptic motion workbench is located above sports platform.
The structure of the elliptic motion workbench is：Side shield one is connected with base plate by screw three, screw four, side shield
Two are connected with base plate by screw five, screw six, and the fixing end one of the workbench with hinge arrangement passes through screw seven, screw eight
On side shield one；Fixing end two is arranged on side shield two by screw nine, screw ten, and X is to piezoelectric stack one
By pre-loading screw one with X to drive block apical grafting, Y-direction piezoelectric stack two is by pre-loading screw two and Y-direction drive block apical grafting, Z-direction
Block is fixed on X on drive block by fixing screws one, fixing screws two, Z-direction piezoelectric stack three be arranged on Z-direction block it
On, by bottom pre-loading screw three and object stage apical grafting；X is consistent to one direction of piezoelectric stack with X to displacement transducer, is arranged on
X is fixed by trip bolt three into piezoelectric stack one by one side through hole；Y-direction displacement transducer and two direction one of Y-direction piezoelectric stack
Cause, in 21 side through hole of Y-direction piezoelectric stack, fixed by trip bolt four；Z-direction displacement transducer and Z-direction piezoelectric stack
Three directions are consistent, on Z-direction block, in three side of Z-direction piezoelectric stack, fixed by trip bolt five；
The workbench with hinge arrangement is from object stage, X to drive block, Y-direction drive block, fixing end one, fixing end
Two are formed by connecting by the flexible hinge between them, and the object stage passes through flexible hinge one, flexible hinge two, flexible hinge
3rd, flexible hinge four is connected to drive block with X, and X is to drive block by compound hinges one, compound hinges two, compound hinges three, compound
Hinge four is connected with Y-direction drive block, and compound hinges one and compound hinges two are symmetrical junction relative to main body Y-direction center
Structure, compound hinges three and compound hinges four are symmetrical structure relative to main body Y-direction center；Compound hinges one and compound hinges
2nd, compound hinges three is symmetrically distributed in X to drive block two ends with compound hinges four, is connected with Y-direction drive block, compound hinges five
It is symmetrical structure relative to main body X to center with compound hinges six, compound hinges seven is with compound hinges eight relative to main body X
It is symmetrical structure to center, compound hinges five and compound hinges six, compound hinges seven are symmetrically distributed in Y with compound hinges eight
To drive block two ends, both sides are connected with fixing end one, fixing end two respectively；
The compound hinges one, compound hinges two, compound hinges three or compound hinges four are respectively by four straight beam type hinges
Join end to end composition.
It is by the active control to piezoelectric stack one, piezoelectric stack two, the amplitude of piezoelectric stack three, frequency and phase place, real
Existing workbench does two-dimensional elliptic motion or three-dimensional elliptical motion in space.
It is an advantage of the invention that can be in the sports platform of clamping workpiece relative to femtosecond laser using methods described and system
It is exposed in the fast feed of beam, to the desired exposure position of Moving Workpieces, can not only solves to load femtosecond laser beam or work
The sports platform of part is difficult to the problem of jerk due to motional inertia, can also avoid femtosecond laser beam scan velocity or fortune in continuous exposure
Dynamic platform feed speed is limited to the problem that luminous flux is difficult to improve, so as to preferably meet wanting for three-dimensional nano-micro structure highly-efficient processing
Ask.The present invention is easy to implement in femtosecond laser processing, can during workpiece makees fast feed to workpiece in expected expose
The position of light is efficiently exposed.
Description of the drawings
Fig. 1 is the structure chart of Moving Workpieces elliptic motion exposure system in femtosecond laser processing；
Fig. 2 is the X-Y being made up of to sports platform and Y-direction sports platform X to sports platform structural representation；
Fig. 3 be three-dimensional elliptical motion workbench formed three-dimensional elliptical track and three-dimensional elliptical track XOZ, YOZ,
Projection on XOY plane；
Fig. 4 is the schematic diagram that femtosecond laser beam carries out elliptic motion exposure in XOZ planes in workpiece motion s, femtosecond laser
Desired location of the beam on workpiece to be added is instantaneously resident and makees fixed point exposure, and elliptical trajectory is side clockwise in plane XOZ
To；
Fig. 5 is the schematic diagram that femtosecond laser beam carries out elliptic motion exposure in YOZ planes in workpiece motion s, femtosecond laser
Desired location of the beam on workpiece to be added is instantaneously resident and makees fixed point exposure, and elliptical trajectory is side clockwise in plane YOZ
To；
Fig. 6 be femtosecond laser beam in Moving Workpieces after desired exposure position p completes single exposure, arrive in next cycle
Up to next desired exposure position p' XOZ planes projection；
Fig. 7 be femtosecond laser beam in Moving Workpieces after desired exposure position p completes single exposure, arrive in next cycle
Up to next desired exposure position p' XOZ planes projection；
Fig. 8 is the structural representation of elliptic motion workbench of the present invention；
Fig. 9 is that elliptic motion workbench of the present invention removes and looks up axonometric drawing after base plate；
Figure 10 is the axonometric drawing of the workbench main body that elliptic motion workbench of the present invention has flexible hinge；
Figure 11 is that elliptic motion workbench is joined end to end by even number straight beam type hinge the compound hinges for constituting in the present invention
It is symmetrically distributed in the schematic diagram of stress both sides；
Figure 12 is the top view of the workbench main body that elliptic motion workbench of the present invention has flexible hinge.
Specific embodiment
Comprise the following steps：
(1) by 14 clamping of workpiece to be added on an elliptic motion workbench 2；Elliptic motion workbench 2 is arranged on can be along X
On the sports platform 12 of Y-direction feeding；Under the driving of elliptic motion workbench 2, workpiece to be added 14 with translational movement relative to
Sports platform 12 makees two-dimensional elliptic motion or three-dimensional elliptical motion；The sports platform 12 of elliptic motion workbench 2 is installed, from can along X to
The sports platform 1201 of feeding and the sports platform 1202 along Y-direction feeding are constituted, and can carry out big stroke along X-axis and Y-axis in XOY faces
Translation enters to give to realize scanning motion of the workpiece relative to femtosecond laser beam, and femtosecond laser beam need not carry out oscillatory scanning；Motion
Platform 1201 and sports platform 1202 are the kinematic axiss that air supporting is supported and directly driven using linear electric motors respectively, and each axle all has
Submicron order kinematic accuracy and big stroke；Focusing objective len 15 is arranged on Z axis sports platform, and Z axis sports platform is used along the micromotion of Z axis
In realizing feeding of the laser beam foucing in workpiece to be added in Z-direction；Laser beam 13 is sent by femto-second laser 1, and Jing declines
Subtract device 3, optical shutter 4, beam expanding lens 5, reflecting mirror 1, diaphragm 7, reflecting mirror 28, reflecting mirror 3 19, beam splitter 16, focusing objective len
After 15, workpiece to be added 14 is acted on along Z-direction；The break-make of laser beam 13 is controlled by optical shutter 4；The course of processing is by counting
Word video camera 18, convex lenss 17, beam splitter 16 realize online observation；Illumination light 11 is sent by lighting source 10, and reflected mirror 9 is anti-
Penetrate, be radiated on workpiece to be added 14.
(2) the elliptic motion workbench 2 described in, is respectively adopted the load that three piezoelectric actuating elements directly drive flexible support
Thing platform makees cycle movement along X, Y and Z-direction, by controlling the phase contrast between the two neighboring direction of motion, so that object stage point
The elliptical trajectory of two dimension is not formed on vertical plane XOZ and YOZ, forms reciprocal linear motion on horizontal plane XOY
Track；The input signal of three piezoelectric actuating elements is：
In formula, Vx、Vy、VzRespectively X, Y, three piezoelectric actuating elements drive signal u of Z-directionx(t)、uy(t)、uzThe width of (t)
Value；For being respectively the initial phase of X, Y, Z-direction drive signal；Frequencies of the f for drive signal.Transport in three-dimensional elliptical
Under the driving of dynamic workbench, workpiece desired exposure position p displacements to be added are represented by
In formula, ax、ayAnd azBe respectively in workpiece to be added desired exposure position p X-axis, Y-axis, Z-direction amplitude；WithThe initial phase that to be desired exposure position p respectively vibrate in X, Y and Z-direction；F is three-dimensional elliptical motion workbench
Motion frequency.
In order that desired exposure position p forms straight path on coordinate plane XOY in workpiece, and in coordinate plane XOZ
With form elliptical orbit on YOZ respectively, between adjacent motion, phase contrast must is fulfilled for：
In formula, n1、n2、n3It is all integer.ForWithPhase contrast,ForWithPhase contrast,ForWithPhase contrast.Particularly work as satisfaction
When, in workpiece to be added, desired exposure position p will form the oval rail of standard on coordinate plane XOZ and YOZ respectively
The oval major axis of mark, i.e., two will all be respectively parallel to coordinate axess OX and OY.
(3) in order that on workpiece to be added instantaneous velocitys of the desired exposure position p relative to laser beam on horizontal plane XOY be
Zero, it is necessary to meet following condition：
In formula, vpxAnd vpyIt is instantaneous velocity vs of the desired exposure position p relative to sports platform 12 on workpiece respectivelypIn X and Y
The component in direction；vfxAnd vfyIt is sports platform respectively along X and the feed speed of Y-direction.It follows that desired exposure position p on workpiece
Instantaneous velocity direction be the linear reciprocating motion direction on the coordinate plane XOY of level, synthesize feed speed vpWith fortune
Synthesis feed speed v of dynamic platform 12fIt is equal in magnitude, in opposite direction.
Available by formula (2), in workpiece, three velocity components of desired exposure position p are as follows：
Horizontal velocity v of the apex under ellipse is obtained by formula (6)pIt is respectively in the absolute value of X, Y-direction component：
Therefore can be by the amplitude a of change three-dimensional elliptical motion workbenchxAnd ayAnd the fortune of three-dimensional elliptical motion workbench
Dynamic frequency f is adjusting vpxAnd vpy, so as to match workbench feed speed v in x and y directionfxAnd vfy；
Now, shutter break-make once, completes single exposure.
(4) be the Continuous maching of laser beam being realized to workpiece, when each elliptical trajectory reaches lower summit, must complete to expose
Light once, i.e. break-make frequency f of optical shuttersFrequency f of elliptic motion should be made equal to workpiece, so that the break-make of femtosecond laser beam
It is synchronous with the elliptic motion of workpiece, that is, femtosecond laser beam acted in summit and local neighborhood only in the case where workpiece makees elliptic motion
In workpiece.Next cycle exposure position is exposed on distance d of X, Y-direction with the previous cyclex、dyFor：
Can be obtained by formula (5), formula (7), formula (8) simultaneous：
Three-dimensional elliptical motion workbench is in X, the amplitude a of Y-directionx、ayBy adjacent periods exposure position X, Y-direction away from
From dx、dyDetermine.When three-dimensional elliptical motion workbench is in X, the amplitude a of Y-directionx、ayIt is determined that afterwards, can be obtained by formula (5), (7)：
The motion frequency f of elliptic motion workbench is by sports platform in X, feed speed v of Y-directionfx、vfyDetermine.Sports platform
Feed speed determine the process velocity of workpiece to be added.When sports platform speed is lifted, three-dimensional elliptical motion workbench is improved
Frequency, the feed speed of sports platform can be matched, it is achieved thereby that during workpiece makees fast feed to workpiece in it is pre-
The phase position of exposure is efficiently exposed.
The present invention realizes that the system of elliptic motion exposure method in the processing of Moving Workpieces femtosecond laser is：
Femto-second laser 1, Jing attenuators 3, optical shutter 4, beam expanding lens 5, reflecting mirror 1, diaphragm 7, reflecting mirror 28, reflection
Mirror 3 19, beam splitter 16,15 order light connects of focusing objective len, digital camera 18 and convex lenss 17 are located above beam splitter 16,
Sports platform 12 is located at the lower section of focusing objective len 15, and lighting source 10 and reflecting mirror 9 are located at below sports platform 12, elliptic motion work
Platform 2 is located above sports platform 12.
The structure of the elliptic motion workbench 2 is：Side shield 1 passes through screw 3 225, screw 4 227 and base plate
224 connections, side shield 2 214 are connected with base plate 224 by screw 5 212, screw 6 215, the workbench with hinge arrangement
209 fixing end 1 is arranged on side shield 1 by screw 7 202, screw 8 208；Fixing end 2 20911
It is arranged on side shield 2 214 by screw 9 211, screw 10, X passes through pre-loading screw one to piezoelectric stack 1
223 and X to 20907 apical grafting of drive block, and Y-direction piezoelectric stack 2 206 is pushed up with Y-direction drive block 20906 by pre-loading screw 2 205
Connect, Z-direction block 219 is fixed on X on drive block 20907 by fixing screws 1, fixing screws 2 210, Z-direction piezo stack
Heap 3 217 is arranged on Z-direction block 219, by bottom pre-loading screw 3 226 and 20916 apical grafting of object stage；X is passed to displacement
Sensor 220 is consistent to one 222 direction of piezoelectric stack with X, installed in X into one 222 one side through hole of piezoelectric stack, by trip bolt
3 221 fix；Y-direction displacement transducer 203 is consistent with 2 206 direction of Y-direction piezoelectric stack, installed in Y-direction piezoelectric stack 2 206 1
In side through hole, fixed by trip bolt 4 204；Z-direction displacement transducer 218 is consistent with 3 217 direction of Z-direction piezoelectric stack, installs
On Z-direction block 219, in 3 217 side of Z-direction piezoelectric stack, fixed by trip bolt 5 216；
The workbench 209 with hinge arrangement is from object stage 20916, X to drive block 20907, Y-direction drive block
20906th, fixing end 1, fixing end 2 20911 are formed by connecting by the flexible hinge between them, the object stage
20916 by flexible hinge 1, flexible hinge 2 20904, flexible hinge 3 20912, flexible hinge 4 20914 and X to
Drive block 20907 connects, and X is to drive block 20907 by compound hinges 1, compound hinges 2 20909, compound hinges three
20915th, compound hinges 4 20917 is connected with Y-direction drive block 20906, compound hinges 1 and compound hinges 2 20909
It is symmetrical structure relative to main body Y-direction center, compound hinges 3 20915 is with compound hinges 4 20917 relative to main body Y-direction
Center is symmetrical structure；Compound hinges 1 and compound hinges 2 20909, compound hinges 3 20915 and compound hinges
4 20917 are symmetrically distributed in X to drive block two ends, are connected with Y-direction drive block, compound hinges 5 20901 and compound hinges six
20905 is symmetrical structure relative to main body X to center, and compound hinges 7 20910 is with compound hinges 8 20913 relative to master
Body X is symmetrical structure to center, compound hinges 5 20901 and compound hinges 6 20905, compound hinges 7 20910 and multiple
Close hinge 8 20913 and be symmetrically distributed in Y-direction drive block two ends, both sides respectively with fixing end 1,2 20911 phase of fixing end
Connection；
The compound hinges one, compound hinges 2 20909, compound hinges 3 20915 or compound hinges four are respectively by four
Straight beam type hinge joins end to end composition.
By the master to piezoelectric stack 1, piezoelectric stack 2 206, the amplitude of piezoelectric stack 3 217, frequency and phase place
Dynamic control, realizes that workbench does two-dimensional elliptic motion or three-dimensional elliptical motion in space.
Claims (5)
1. elliptic motion exposure method during a kind of Moving Workpieces femtosecond laser is processed, it is characterised in that comprise the following steps：
(1) by clamping workpiece to be added on an elliptic motion workbench, elliptic motion workbench is arranged on to enter along X and Y-direction
On the sports platform given, under the driving of elliptic motion workbench, workpiece to be added makees two dimension with translational movement relative to sports platform
Elliptic motion or three-dimensional elliptical motion, install elliptic motion workbench sports platform, from can along X to feeding sports platform and along Y
To feeding sports platform composition, the translation that big stroke can be carried out along X-axis and Y-axis in XOY faces enter to give to realize workpiece relative to
The scanning motion of femtosecond laser beam, femtosecond laser beam need not carry out oscillatory scanning, along X to the sports platform of feeding and along Y-direction feeding
Sports platform be that air supporting is supported and carries out direct drive kinematic axiss using linear electric motors respectively, each axle is all moved with submicron order
Precision and big stroke；Focusing objective len is arranged on Z axis sports platform, and Z axis sports platform is used for realizing that laser beam is burnt along the micromotion of Z axis
Feeding of the point in workpiece to be added in Z-direction；Laser beam is sent by femto-second laser, Jing attenuators, optical shutter, is expanded
After mirror, reflecting mirror one, diaphragm, reflecting mirror two, reflecting mirror three, beam splitter, focusing objective len, workpiece to be added is acted on along Z-direction,
The break-make of laser beam is controlled by optical shutter；The course of processing realizes online sight by digital camera, convex lenss, beam splitter
Survey, illumination light is sent by lighting source, reflected mirror reflection is radiated on workpiece to be added；
(2) the elliptic motion workbench described in, is respectively adopted the object stage that three piezoelectric actuating elements directly drive flexible support
Make cycle movement along X, Y and Z-direction, by controlling the phase contrast between the two neighboring direction of motion, so that object stage exists respectively
The elliptical trajectory of two dimension is formed on vertical plane XOZ and YOZ, forms reciprocal straight-line trajectory on horizontal plane XOY；
The drive signal of three piezoelectric actuating elements is：
In formula, Vx、Vy、VzRespectively X, Y, three piezoelectric actuating elements drive signal u of Z-directionx(t)、uy(t)、uzThe amplitude of (t)；
φx、φy、φzFor being respectively the initial phase of X, Y, Z-direction drive signal；Frequencies of the f' for drive signal, in three-dimensional elliptical motion work
Make under the driving of platform, workpiece desired exposure position p displacements to be added are represented by：
In formula, ax、ayAnd azBe respectively in workpiece to be added desired exposure position p X-axis, Y-axis, Z-direction amplitude；WithThe initial phase that to be desired exposure position p respectively vibrate in X, Y and Z-direction；F is three-dimensional elliptical motion workbench
Motion frequency；
In order that desired exposure position p forms straight path on coordinate plane XOY in workpiece, and in coordinate plane XOZ and YOZ
Upper to form elliptical orbit respectively, between adjacent motion, phase contrast must is fulfilled for：
In formula, n1、n2、n3It is all integer,ForWithPhase contrast,ForWithPhase contrast,ForWithPhase contrast, particularly work as satisfaction：
When, in workpiece to be added, desired exposure position p will form the elliptical orbit of standard on coordinate plane XOZ and YOZ respectively, i.e.,
Two oval major axis will all be respectively parallel to coordinate axess OX and OY；
(3) in order that instantaneous velocitys of the desired exposure position p relative to laser beam on horizontal plane XOY is zero on workpiece to be added,
It must is fulfilled for following condition：
In formula, vpxAnd vpyIt is instantaneous velocitys of the desired exposure position p relative to the sports platform fed along X and Y-direction on workpiece respectively
vpIn X and the component of Y-direction；vfxAnd vfyIt is sports platform respectively along X and the feed speed of Y-direction；Desired exposure position p on workpiece
Instantaneous velocity direction is the linear reciprocating motion direction on the coordinate plane XOY of level, synthesizes feed speed vpWith motion
Synthesis feed speed v of platformfIt is equal in magnitude, in opposite direction；
Available by formula (2), in workpiece, three velocity components of desired exposure position p are as follows：
Horizontal velocity v of the apex under ellipse is obtained by formula (6)pIt is respectively in the absolute value of X, Y-direction component：
Therefore can be by the amplitude a of change three-dimensional elliptical motion workbenchxAnd ayAnd the motion frequency of three-dimensional elliptical motion workbench
Rate f is adjusting vpxAnd vpy, so as to match workbench feed speed v in x and y directionfxAnd vfy；
Now, shutter break-make once, completes single exposure；
(4) be the Continuous maching of laser beam being realized to workpiece, when each elliptical trajectory reaches lower summit, must complete exposure one
It is secondary, i.e. break-make frequency f of optical shuttersFrequency f of elliptic motion should be made equal to workpiece, so that the break-make and work of femtosecond laser beam
The elliptic motion synchronization of part, that is, femtosecond laser beam only acts on work in the case where workpiece makees elliptic motion in summit and local neighborhood
Part, next cycle exposure position are exposed on distance d of X, Y-direction with the previous cyclex、dyFor：
Can be obtained by formula (5), formula (7), formula (8) simultaneous：
Three-dimensional elliptical motion workbench is in X, the amplitude a of Y-directionx、ayBy adjacent periods exposure position X, Y-direction apart from dx、
dyDetermine, when three-dimensional elliptical motion workbench is in X, the amplitude a of Y-directionx、ayIt is determined that afterwards, can be obtained by formula (5), (7)：
The motion frequency f of three-dimensional elliptical motion workbench is by the sports platform fed along X and Y-direction in X, feed speed v of Y-directionfx、
vfyDetermine, the feed speed of the sports platform fed along X and Y-direction determines the process velocity of workpiece to be added, when along X and Y-direction feeding
Sports platform speed lifted when, improve three-dimensional elliptical motion workbench frequency, the feed speed of sports platform can be matched, so as to
In realizing during workpiece makees fast feed to workpiece, the position of desired exposure is efficiently exposed.
2. the Moving Workpieces of elliptic motion exposure method during a kind of execution Moving Workpieces femtosecond laser as claimed in claim 1 is processed
The system of elliptic motion exposure, femto-second laser Jing attenuators, optical shutter, beam expanding lens, reflecting mirror one, light in femtosecond laser processing
Door screen, reflecting mirror two, reflecting mirror three, beam splitter, focusing objective len order light connects, digital camera and convex lenss are located on beam splitter
Side, moveable table position are located at below sports platform in the lower section of focusing objective len, lighting source and reflecting mirror, it is characterised in that：Oval fortune
Dynamic workbench is located above sports platform.
3. the system that elliptic motion exposes in a kind of Moving Workpieces femtosecond laser processing according to claim 2, its feature
It is：The structure of the elliptic motion workbench is：Side shield one is connected with base plate by screw three, screw four, side shield two
It is connected with base plate by screw five, screw six, the fixing end one of the workbench with hinge arrangement is pacified by screw seven, screw eight
It is mounted on side shield one；Fixing end two is arranged on side shield two by screw nine, screw ten, and X is logical to piezoelectric stack one
Pre-loading screw one is crossed with X to drive block apical grafting, Y-direction piezoelectric stack two is by pre-loading screw two and Y-direction drive block apical grafting, Z-direction gear
Block is fixed on X on drive block by fixing screws one, fixing screws two, and Z-direction piezoelectric stack three is arranged on Z-direction block,
By bottom pre-loading screw three and object stage apical grafting；X is consistent to one direction of piezoelectric stack with X to displacement transducer, installed in X to
Piezoelectric stack in side through hole, is fixed by trip bolt three one by one；Y-direction displacement transducer is consistent with two direction of Y-direction piezoelectric stack, peace
It is mounted in 21 side through hole of Y-direction piezoelectric stack, is fixed by trip bolt four；Z-direction displacement transducer and three direction of Z-direction piezoelectric stack
Unanimously, on Z-direction block, in three side of Z-direction piezoelectric stack, fixed by trip bolt five.
4. the system that elliptic motion exposes in a kind of Moving Workpieces femtosecond laser processing according to claim 3, its feature
It is：The workbench with hinge arrangement is from object stage, X to drive block, Y-direction drive block, fixing end one, fixing end two-way
The flexible hinge crossed between them is formed by connecting, the object stage by flexible hinge one, flexible hinge two, flexible hinge three,
Flexible hinge four is connected to drive block with X, and X is to drive block by compound hinges one, compound hinges two, compound hinges three, composite hinge
Chain four is connected with Y-direction drive block, and compound hinges one is with compound hinges two relative to the workbench Y-direction center with hinge arrangement
Position is symmetrical structure, and compound hinges three with compound hinges four relative to the workbench Y-direction center with hinge arrangement is
Symmetrical structure；Compound hinges one is symmetrically distributed in X to drive block two with compound hinges two, compound hinges three with compound hinges four
End, is connected with Y-direction drive block, and compound hinges five is with compound hinges six relative to the workbench X with hinge arrangement to center
Position is symmetrical structure, and compound hinges seven with compound hinges eight relative to the workbench X with hinge arrangement to center is
Symmetrical structure, compound hinges five are symmetrically distributed in Y-direction drive block two with compound hinges six, compound hinges seven with compound hinges eight
End, both sides are connected with fixing end one, fixing end two respectively.
5. the system that elliptic motion exposes in a kind of Moving Workpieces femtosecond laser processing according to claim 4, its feature
It is：The compound hinges one, compound hinges two, compound hinges three or compound hinges four are respectively by four straight beam type hinge head and the tail
It is connected to form.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2007305646A (en) * | 2006-05-09 | 2007-11-22 | Disco Abrasive Syst Ltd | Laser beam machining method of wafer |
| CN103658993A (en) * | 2013-12-11 | 2014-03-26 | 北京理工大学 | Crystal silicon surface femtosecond laser selective ablation method based on electron dynamic control |
| CN203900734U (en) * | 2014-06-11 | 2014-10-29 | 吉林大学 | Large-stroke cylindrical coordinate two-photon polymerization processing device |
| CN104155851A (en) * | 2014-08-01 | 2014-11-19 | 南方科技大学 | Femtosecond-laser and two-photon polymerization micro-nano machining system and method |
| CN204954168U (en) * | 2015-09-27 | 2016-01-13 | 长春工业大学 | Elliptic motion exposure system in processing of motion work piece femto second laser |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2007305646A (en) * | 2006-05-09 | 2007-11-22 | Disco Abrasive Syst Ltd | Laser beam machining method of wafer |
| CN103658993A (en) * | 2013-12-11 | 2014-03-26 | 北京理工大学 | Crystal silicon surface femtosecond laser selective ablation method based on electron dynamic control |
| CN203900734U (en) * | 2014-06-11 | 2014-10-29 | 吉林大学 | Large-stroke cylindrical coordinate two-photon polymerization processing device |
| CN104155851A (en) * | 2014-08-01 | 2014-11-19 | 南方科技大学 | Femtosecond-laser and two-photon polymerization micro-nano machining system and method |
| CN204954168U (en) * | 2015-09-27 | 2016-01-13 | 长春工业大学 | Elliptic motion exposure system in processing of motion work piece femto second laser |
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