CN105091506A - Vacuum drying device - Google Patents
Vacuum drying device Download PDFInfo
- Publication number
- CN105091506A CN105091506A CN201510550945.5A CN201510550945A CN105091506A CN 105091506 A CN105091506 A CN 105091506A CN 201510550945 A CN201510550945 A CN 201510550945A CN 105091506 A CN105091506 A CN 105091506A
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- reaction chamber
- pipeline
- described reaction
- minton dryer
- substrate
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Abstract
The invention provides a vacuum drying device. A first pipeline is arranged at the top of a reaction cavity, communicated with the outer portion of the reaction cavity and used for pumping gas in the reaction cavity or injecting gas into the reaction cavity. As multiple parallel second pipelines are arranged at the upper portion in the reaction cavity, and gaps are reserved between the second pipelines and the upper surface in the reaction cavity, it can be guaranteed that the steam pressures of all the positions in the reaction cavity are the same, a stable and even gas flow field for drying a light resistor is formed, it is further guaranteed that the volatilizing speeds of organic solvents in the light resistor on the surface of a substrate are the same, and finally the drying evenness of the light resistor on the surface of the substrate is guaranteed; and the problem that Mura is likely to be generated on the surface of the substrate when an existing vacuum drying device is used for drying the light resistor is solved, and the product yield is effectively improved.
Description
Technical field
The present invention relates to Display Technique field, particularly relate to a kind of Minton dryer.
Background technology
In the manufacture field of display floater, in gold-tinted processing procedure, general substrate surface being coated with photoresistance is placed in Minton dryer, make the organic solvent in substrate surface photoresistance volatilize and make photoresistance dry, but this drying means exists following shortcoming:
(1) because the impact of surrounding air-flow causes the organic solvent evaporation rate in the photoresistance on substrate four limit faster than the evaporation rate of the organic solvent in real estate;
(2) from utilizing Minton dryer (VacuumDry, rise when VCD) minimum pressure 50Pa being pumped to reaction chamber, be reduced in the process of atmospheric pressure to the pressure in reaction chamber, eddy current can be formed owing to entering air-flow in reaction chamber and entreat that to produce Mura (display brightness is uneven, causes the phenomenon of various vestige) etc. bad in a substrate.
Refer to Fig. 1, be a kind of cross-sectional view of existing Minton dryer, described Minton dryer mainly comprises reaction chamber 100, is located at the carrying platform 200 of reaction chamber 100 inside.Carrying platform 200 is located at the below of reaction chamber 100 inside, is coated with the substrate 800 of photoresistance 900 for load-bearing surface, containing organic solvent in described photoresistance 900.Bottom reaction chamber 100, two ends are provided with several first pipeline 110, for the gas of abstraction reaction chamber 100 inside.Being provided with several second pipeline 120 in the middle of bottom reaction chamber 100, for filling nitrogen or dry air to reaction chamber 100 inside, making the pressure in reaction chamber 100 reach atmospheric pressure.
When utilizing above-mentioned Minton dryer drying photoresistance 900, due to air-flow from top to bottom, air-flow is from reaction chamber 100 periphery to reaction chamber 100 diffusion inside, when arriving reaction chamber 100 center, air-flow mutually collides and forms air-flow and revolves, i.e. eddy current, cause there is impact to still undried photoresistance because eddy stress is comparatively large, and then can Mura be formed, namely when carrying out photoresistance and being dry, reaction chamber 100 inside fails to form uniform gas flow field, therefore causes substrate center easily to produce Mura etc. bad.
Summary of the invention
The object of the present invention is to provide a kind of Minton dryer, the uniformity of substrate surface photoresistance drying can be ensured, avoid producing Mura etc. at substrate surface bad.
For achieving the above object, the invention provides a kind of Minton dryer, comprise reaction chamber and be located at the carrying platform of described reaction chamber inside;
Described carrying platform is located at the below of described reaction chamber inside, is coated with the substrate of photoresistance for load-bearing surface; Containing organic solvent in described photoresistance;
Described reaction chamber top is provided with the first pipeline, and described first pipeline is connected with the outside of described reaction chamber, for extract described reaction chamber inside gas or to described reaction chamber filled with gas;
The top of described reaction chamber inside is provided with several the second pipeline be parallel to each other, and leaves space between the upper surface of described second pipeline and described reaction chamber inside, identical for ensureing the vapour pressure of described reaction chamber each position inner.
Described reaction chamber is connected with a vacuum extractor, is extracted the gas of described reaction chamber inside by described first pipeline.
Described reaction chamber is connected with a gas filling device, fills nitrogen or dry air by described first pipeline to described reaction chamber inside.
Described first pipeline is positioned at the centre position at described reaction chamber top.
The size of described second pipeline is less than the size of described first pipeline.
Described second pipeline is cellular distribution.
Described carrying platform comprise be positioned at bottom several support portions, be located at the supporting part on described several support portion and be located at several contact sites on described supporting part surface.
Described several support portion extends to described reaction chamber outside through the bottom of described reaction chamber; The length of described several support portion is scalable.
Described substrate is glass substrate.
Described organic solvent is 1-Methoxy-2-propyl acetate.
Beneficial effect of the present invention: Minton dryer of the present invention, is provided with the first pipeline at reaction chamber top, and described first pipeline is connected with the outside of reaction chamber, for the gas of abstraction reaction chamber interior or to described reaction chamber filled with gas; Several the second pipeline be parallel to each other is provided with above reaction chamber inside, space is left between described second pipeline and the upper surface of reaction chamber inside, can ensure that the vapour pressure of reaction chamber each position inner is identical, be formed with the gas flowfield of the stable and uniform being beneficial to photoresistance drying, and then ensure that the evaporation rate of the organic solvent in substrate surface photoresistance is identical, the uniformity of final guarantee substrate surface photoresistance drying, avoid when utilizing the dry photoresistance of existing Minton dryer, easily produce the problem of Mura at substrate surface, effective improving product yield.
Accompanying drawing explanation
In order to further understand feature of the present invention and technology contents, refer to following detailed description for the present invention and accompanying drawing, but accompanying drawing only provides reference and explanation use, is not used for being limited the present invention.
In accompanying drawing,
Fig. 1 is a kind of cross-sectional view of existing Minton dryer;
Fig. 2 is the cross-sectional view of Minton dryer of the present invention.
Detailed description of the invention
For further setting forth the technological means and effect thereof that the present invention takes, be described in detail below in conjunction with the preferred embodiments of the present invention and accompanying drawing thereof.
Refer to Fig. 2, the invention provides a kind of Minton dryer, comprise reaction chamber 1 and be located at the carrying platform 2 of described reaction chamber 1 inside.
Concrete, described carrying platform 2 is located at the below of described reaction chamber 1 inside, is coated with the substrate 8 of photoresistance 9 for load-bearing surface; Containing organic solvent in described photoresistance 9.
Described reaction chamber 1 top is provided with the first pipeline 11, and described first pipeline 11 is connected with the outside of described reaction chamber 1, for extract described reaction chamber 1 inside gas or to described reaction chamber 1 filled with gas; The top of described reaction chamber 1 inside is provided with several the second pipeline 12 be parallel to each other, and leaves space between described second pipeline 12 and the upper surface of described reaction chamber 1 inside, identical for ensureing the vapour pressure of described reaction chamber 1 each position inner.
Concrete, described reaction chamber 1 is connected with a vacuum extractor (not shown), extracts the gas of described reaction chamber 1 inside by described first pipeline 11, with the value making the Pressure Drop of described reaction chamber 1 inside be low to moderate needs.Described reaction chamber 1 is also connected with a gas filling device (not shown), nitrogen or dry air is filled to described reaction chamber 1 inside by described first pipeline 11, to increase the pressure of described reaction chamber 1 inside, the pressure of reaction chamber 1 inside is made to reach the value of needs as standard atmospheric pressure.
Concrete, described first pipeline 11 is positioned at the centre position at described reaction chamber 1 top, and the size of described second pipeline 12 is less than the size of described first pipeline 11, and described second pipeline 12 is in cellular distribution.All undertaken by described first pipeline 11 from described reaction chamber 1 extracting gases or to blanketing gas in described reaction chamber 1, and no matter be that gas is drawn out of or is filled to reaction chamber 1 from reaction chamber 1, gas all can through described cellular second pipeline 12, so just, can ensure that the vapour pressure of reaction chamber 1 each position inner is identical, be formed with the gas flowfield of the stable and uniform being beneficial to photoresistance drying, and then ensure that the evaporation rate of the organic solvent in the surperficial photoresistance of substrate 89 is identical, the uniformity of the surperficial photoresistance drying of final guarantee substrate 8, avoid when utilizing the dry photoresistance of existing Minton dryer, the problem of Mura is easily produced on substrate 8 surface, effectively improve product yield.
Concrete, described carrying platform 2 comprise be positioned at bottom several support portions 21, be located at the supporting part 22 on described several support portion 21 and be located at several contact sites 23 on described supporting part 22 surface, the lower surface of described substrate 8 contacts with described several contact site 23.Described several support portion 21 extends to described reaction chamber 1 outside through the bottom of described reaction chamber 1; The length of described several support portion 21 is scalable.
Concrete, described substrate 8 can be glass substrate, and described organic solvent can be 1-Methoxy-2-propyl acetate (PGMEA).
In sum, Minton dryer of the present invention, is provided with the first pipeline at reaction chamber top, and described first pipeline is connected with the outside of reaction chamber, for the gas of abstraction reaction chamber interior or to described reaction chamber filled with gas; Several the second pipeline be parallel to each other is provided with above reaction chamber inside, space is left between described second pipeline and the upper surface of reaction chamber inside, can ensure that the vapour pressure of reaction chamber each position inner is identical, be formed with the gas flowfield of the stable and uniform being beneficial to photoresistance drying, and then ensure that the evaporation rate of the organic solvent in substrate surface photoresistance is identical, the uniformity of final guarantee substrate surface photoresistance drying, avoid when utilizing the dry photoresistance of existing Minton dryer, easily produce the problem of Mura at substrate surface, effective improving product yield.
The above; for the person of ordinary skill of the art; can make other various corresponding change and distortion according to technical scheme of the present invention and technical conceive, and all these change and be out of shape the protection domain that all should belong to the accompanying claim of the present invention.
Claims (10)
1. a Minton dryer, is characterized in that, comprises reaction chamber (1) and is located at the inner carrying platform (2) of described reaction chamber (1);
Described carrying platform (2) is located at the inner below of described reaction chamber (1), is coated with the substrate (8) of photoresistance (9) for load-bearing surface; Containing organic solvent in described photoresistance (9);
Described reaction chamber (1) top is provided with the first pipeline (11), described first pipeline (11) is connected with the outside of described reaction chamber (1), for extracting the inner gas of described reaction chamber (1) or to described reaction chamber (1) filled with gas;
The top of described reaction chamber (1) inside is provided with several the second pipeline (12) be parallel to each other, space is left between the upper surface of described second pipeline (12) and described reaction chamber (1) inside, identical for ensureing the vapour pressure of described reaction chamber (1) each position inner.
2. Minton dryer as claimed in claim 1, it is characterized in that, described reaction chamber (1) is connected with a vacuum extractor, extracts the inner gas of described reaction chamber (1) by described first pipeline (11).
3. Minton dryer as claimed in claim 1, it is characterized in that, described reaction chamber (1) is connected with a gas filling device, fills nitrogen or dry air by described first pipeline (11) to described reaction chamber (1) inside.
4. Minton dryer as claimed in claim 1, it is characterized in that, described first pipeline (11) is positioned at the centre position at described reaction chamber (1) top.
5. Minton dryer as claimed in claim 1, it is characterized in that, the size of described second pipeline (12) is less than the size of described first pipeline (11).
6. Minton dryer as claimed in claim 1, it is characterized in that, described second pipeline (12) is in cellular distribution.
7. Minton dryer as claimed in claim 1, it is characterized in that, described carrying platform (2) comprises the several support portions (21) bottom being positioned at, is located at the supporting part (22) on described several support portion (21) and is located at the surperficial several contact sites (23) of described supporting part (22).
8. Minton dryer as claimed in claim 7, is characterized in that, described several support portion (21) extends to described reaction chamber (1) outside through the bottom of described reaction chamber (1); The length of described several support portion (21) is scalable.
9. Minton dryer as claimed in claim 1, it is characterized in that, described substrate (8) is glass substrate.
10. Minton dryer as claimed in claim 1, it is characterized in that, described organic solvent is 1-Methoxy-2-propyl acetate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510550945.5A CN105091506A (en) | 2015-08-31 | 2015-08-31 | Vacuum drying device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510550945.5A CN105091506A (en) | 2015-08-31 | 2015-08-31 | Vacuum drying device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105091506A true CN105091506A (en) | 2015-11-25 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510550945.5A Pending CN105091506A (en) | 2015-08-31 | 2015-08-31 | Vacuum drying device |
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105710019A (en) * | 2016-04-14 | 2016-06-29 | 京东方科技集团股份有限公司 | Substrate vacuum drying device |
| CN105783438A (en) * | 2016-03-09 | 2016-07-20 | 武汉华星光电技术有限公司 | Pressure-reducing heating and drying device |
| CN106369955A (en) * | 2016-08-31 | 2017-02-01 | 武汉华星光电技术有限公司 | Thin film dryer support and thin film dryer |
| CN107062828A (en) * | 2017-06-09 | 2017-08-18 | 京东方科技集团股份有限公司 | A kind of Minton dryer |
| CN107315325A (en) * | 2017-07-18 | 2017-11-03 | 武汉华星光电半导体显示技术有限公司 | Decompression drying equipment and decompression drying method |
| CN107413603A (en) * | 2017-07-20 | 2017-12-01 | 武汉华星光电技术有限公司 | Vacuum decompression drying equipment |
| CN107457164A (en) * | 2017-07-28 | 2017-12-12 | 武汉华星光电技术有限公司 | A kind of Minton dryer, system and vacuum drying method |
| CN107726752A (en) * | 2017-10-12 | 2018-02-23 | 京东方科技集团股份有限公司 | A kind of vacuum drying chamber |
| CN108132588A (en) * | 2017-12-21 | 2018-06-08 | 信利（惠州）智能显示有限公司 | A kind of novel VCD structures and its even pressure method |
| CN108344254A (en) * | 2017-09-28 | 2018-07-31 | 广东聚华印刷显示技术有限公司 | Minton dryer |
| CN110170433A (en) * | 2019-05-28 | 2019-08-27 | 昆山国显光电有限公司 | A kind of Minton dryer |
| CN110328975A (en) * | 2019-07-01 | 2019-10-15 | 深圳市华星光电半导体显示技术有限公司 | Minton dryer |
| CN111516399A (en) * | 2020-04-29 | 2020-08-11 | Tcl华星光电技术有限公司 | Mask plate and manufacturing method thereof, composite mask plate and vacuum drying device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105783438A (en) * | 2016-03-09 | 2016-07-20 | 武汉华星光电技术有限公司 | Pressure-reducing heating and drying device |
| CN105710019A (en) * | 2016-04-14 | 2016-06-29 | 京东方科技集团股份有限公司 | Substrate vacuum drying device |
| CN106369955A (en) * | 2016-08-31 | 2017-02-01 | 武汉华星光电技术有限公司 | Thin film dryer support and thin film dryer |
| CN107062828A (en) * | 2017-06-09 | 2017-08-18 | 京东方科技集团股份有限公司 | A kind of Minton dryer |
| CN107315325A (en) * | 2017-07-18 | 2017-11-03 | 武汉华星光电半导体显示技术有限公司 | Decompression drying equipment and decompression drying method |
| CN107315325B (en) * | 2017-07-18 | 2019-04-30 | 武汉华星光电半导体显示技术有限公司 | Decompression drying equipment and decompression drying method |
| WO2019015006A1 (en) * | 2017-07-18 | 2019-01-24 | 武汉华星光电半导体显示技术有限公司 | Pressure reducing and drying device and pressure reducing and drying method |
| CN107413603A (en) * | 2017-07-20 | 2017-12-01 | 武汉华星光电技术有限公司 | Vacuum decompression drying equipment |
| CN107457164A (en) * | 2017-07-28 | 2017-12-12 | 武汉华星光电技术有限公司 | A kind of Minton dryer, system and vacuum drying method |
| CN107457164B (en) * | 2017-07-28 | 2021-03-23 | 武汉华星光电技术有限公司 | Vacuum drying device, system and vacuum drying method |
| CN108344254A (en) * | 2017-09-28 | 2018-07-31 | 广东聚华印刷显示技术有限公司 | Minton dryer |
| CN108344254B (en) * | 2017-09-28 | 2020-10-23 | 广东聚华印刷显示技术有限公司 | Vacuum drying device |
| CN107726752A (en) * | 2017-10-12 | 2018-02-23 | 京东方科技集团股份有限公司 | A kind of vacuum drying chamber |
| CN108132588A (en) * | 2017-12-21 | 2018-06-08 | 信利（惠州）智能显示有限公司 | A kind of novel VCD structures and its even pressure method |
| CN110170433A (en) * | 2019-05-28 | 2019-08-27 | 昆山国显光电有限公司 | A kind of Minton dryer |
| CN110328975A (en) * | 2019-07-01 | 2019-10-15 | 深圳市华星光电半导体显示技术有限公司 | Minton dryer |
| CN111516399A (en) * | 2020-04-29 | 2020-08-11 | Tcl华星光电技术有限公司 | Mask plate and manufacturing method thereof, composite mask plate and vacuum drying device |
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Application publication date: 20151125 |