CN104923017A - Gas treatment device and control method thereof - Google Patents
Gas treatment device and control method thereof Download PDFInfo
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- CN104923017A CN104923017A CN201510306961.XA CN201510306961A CN104923017A CN 104923017 A CN104923017 A CN 104923017A CN 201510306961 A CN201510306961 A CN 201510306961A CN 104923017 A CN104923017 A CN 104923017A
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- filter layer
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Abstract
The invention provides a gas treatment device and a control method thereof. The gas treatment device is provided with an annular filter layer, wherein the annular filter layer rotates circularly in a liquid storage part; the gas is treated after passing the annular filter layer; through an attachment separation device separated from the liquid storage part, attachments of the annular filter layer can be separated from the outer part of the liquid storage part, so that lots of the attachments cannot return back to the liquid storage part along with the filter layer, the problem of secondary pollution to the filter layer after cleaning in the prior art can be solved, secondary pollution to the filter layer is reduced, and the gas treatment quality is improved. According to the control method of the gas treatment device, a driving device is started, and a windward side of the annular filter layer is controlled to rotate in the direction from the liquid storage part to the attachment separation device. Through the control method, the attachments can be separated from the gas treatment device preferentially, and secondary pollution of the liquid storage part to the filter layer can be reduced. The invention further provides another control method of the gas treatment device, that is, the humidity of gas to be treated can be adjusted by controlling the rotational speed of the filter layer.
Description
Technical field
The present invention relates to field of gas treatment, particularly the control method of gas treatment equipment and this device.
Background technology
Existing gas treatment equipment is as air purifier, and the general screen pack that adopts processes air.Screen pack can amass impurity above screen pack after having grown service time, needs to change screen pack, and user uses inconvenience.Clean technical problem is needed in order to solve screen pack, Korean Patent KR2010091734 discloses a kind of air purifier, this air purifier adopts circular filter net, circular filter net is by motor-driven rotation, and circular filter net one end is immersed in water tank, and in water tank, be provided with the cleaning brush to filtering net cleaning, washed by the pollutant of cleaning brush by screen pack, realize the cleaning to screen pack in this way, do not need to change screen pack, only need change the water in water tank.
Cleaning brush due to this clarifier is arranged in water tank, after cleaned filter screen, impurities left in screen pack is in water tank, again can be attached on screen pack when screen pack rotates, thus secondary pollution can be formed to gas, and after the cleaned filter screen of the water in water tank, also often to change, add user and use inconvenience.
Summary of the invention
The object of the invention is to solve in prior art, gas treatment equipment such as air purifier is when using liquid handling gas, be attached to pollutant on filter course and enter into the liquid to filter course process in a large number, thus add the problem of the comparatively serious secondary pollution that gas treatment equipment occurs when processing gas.
In order to solve this problem, the technical solution adopted in the present invention is:
A kind of gas treatment equipment, comprises gas passage, for the circulation of pending gas; Annular filter layer, is arranged in described gas passage, rotatable motion; Liquid storing part, described liquid storing part is for storing the liquid to the process of described annular filter layer, and described annular filter layer passes through via the liquid stored in described liquid storing part; Also comprise: attachment release unit, arrange independent of described liquid storing part, depart from outside described liquid storing part to make the attachment being attached to described annular filter layer.
Gas treatment equipment of the present invention, by being arranged independent of described liquid storing part by attachment release unit, the attachment of filter course can be separated to the outside of liquid storing part, reduce the attachment entering liquid storing part, alleviate the secondary pollution of attachment to filter course, thus improve the quality of gas treatment.
Wherein in an embodiment, described attachment release unit comprises the pressurizing unit to the extruding of annular filter layer, and described pressurizing unit departs to make the attachment being attached to described annular filter layer the extruding of annular filter layer.
Wherein in an embodiment, described gas treatment equipment comprises: the first rotating shaft and the second rotating shaft, is located at first end and second end of annular filter layer respectively; The first end of described annular filter layer is arranged in described liquid storing part; Second end of described annular filter layer is arranged on the outside of described liquid storing part; Described pressurizing unit comprises main shaft, and described main shaft is arranged with the second end corresponding to described annular filter layer, extrudes described annular filter layer depart to make described attachment with described second rotating shaft.
Wherein in an embodiment, described gas treatment equipment also comprises drive unit, and described drive unit drives described annular filter layer by the windward side of described annular filter layer to described attachment release unit direction gyration.
Wherein in an embodiment, also comprise attachment retracting device, described attachment retracting device correspond to described attachment release unit arrange and reclaim from described annular filter pull-up from attachment; Be provided with communicating passage between described attachment retracting device and described liquid storing part, described communicating passage is provided with filter.
Wherein in an embodiment, the position that described attachment retracting device is arranged is higher than described liquid storing part; Described annular filter layer is obliquely installed.
Wherein in an embodiment, in described attachment retracting device, be provided with electrolytic strip or add catalyst, with the attachment purified treatment to disengaging.
Wherein in an embodiment, in described liquid storing part, be provided with ultrasonic wave module or spray module, with the attachment that will do not depart from described annular filter layer from described annular filter pull-up from; The dump valve of being discharged by the liquid in described liquid storing part is also provided with bottom described liquid storing part.
Wherein in an embodiment, described annular filter layer is for being provided with the wet film of capillary structure, and the outer surface of described wet film is provided with fine hair.
Wherein in an embodiment, the liquid that described liquid storing part stores is water, photocatalyst solution, plant extraction liquid or formaldehyde absorbent.
The present invention also provides a kind of control method of gas treatment equipment as above, described control method comprises the steps: to start described drive unit, controls the windward side of described annular filter layer from described liquid storing part to the direction gyration of described attachment release unit.
Pending gas is first through windward side, pollutant in gas will be attached to the windward side of filter course, rotated from described liquid storing part to the direction of described attachment release unit by the windward side controlling described annular filter layer, the pollutant of windward side is first separated from filter course by attachment release unit, just avoiding a large amount of pollutants along with the rotation of filter course enters into liquid storing part, also just alleviate the secondary pollution to filter course, improve gas treatment quality.
Wherein in an embodiment, described gas treatment equipment also comprises air-supply arrangement; Described control method comprises the steps:, after the described drive unit of startup, to start described air-supply arrangement, and pending gas is first passed through from the windward side of described annular filter layer.
The present invention also provides the control method of another kind of gas treatment equipment as above, described control method comprises: control the velocity of rotation of described annular filter layer to adjust the humidity of pending gas, wherein, the velocity of rotation controlling described annular filter layer comprises with the humidity adjusting pending gas: improve rotating speed to increase gas humidity; Reduce rotating speed to reduce gas humidity.
This control method not only alleviates the secondary pollution problem of described gas treatment equipment, simultaneously can the humidity of adjustments of gas under the prerequisite not increasing construction and device, multifunction more.
As can be seen from the above, gas treatment equipment of the present invention, by attachment release unit is arranged independent of described liquid storing part, the attachment of filter course can be separated to the outside of liquid storing part, reduce the attachment entering liquid storing part, alleviate the secondary pollution of attachment to filter course, thus improve the quality of gas treatment.The control method of gas treatment equipment provided by the invention, rotated from described liquid storing part to the direction of described attachment release unit by the windward side controlling described annular filter layer, the pollutant of windward side is first separated from filter course by attachment release unit, just avoiding a large amount of pollutants along with the rotation of filter course enters into liquid storing part, also just alleviate the secondary pollution to filter course, improve gas treatment quality.The another kind of control method of this gas treatment equipment provided by the invention, as long as by the velocity of rotation of controlled filter layer and the humidity of adjustable gas, the basis not increasing structure is the humidity of adjustable gas, realizes multifunction.
Accompanying drawing explanation
Fig. 1, gas treatment equipment structural representation of the present invention.
In figure, 1-first rotating shaft, 2-communicating passage, 3-annular filter layer, 4-second rotating shaft, 5-passing away, 6-attachment retracting device, 7-pressurizing unit, 8-liquid storing part, 9-ultrasonic wave module.
Detailed description of the invention
See Fig. 1, gas treatment equipment provided by the invention comprises: gas passage, for the circulation of pending gas; Annular filter layer 3, is arranged in described gas passage; First rotating shaft 1 and the second rotating shaft 4, is located at first end and second end of annular filter layer 3 respectively; Drive unit, drives described first rotating shaft 1 and/or the second rotating shaft 4 to rotate, and drives the gyration of described annular filter layer 3; Liquid storing part 8, described liquid storing part 8 is for storing the liquid processed described annular filter layer 3, and described annular filter layer 3 passes through via the liquid stored in described liquid storing part 8; Also comprise: attachment release unit, arrange independent of described liquid storing part 8, depart from outside described liquid storing part 8 to make the attachment being attached to described annular filter layer 3.The liquid that liquid storing part 8 stores is water, photocatalyst solution, plant extraction liquid or formaldehyde absorbent, the liquid of annular filter layer 3 in liquid storing part 8, liquid adsorption is on annular filter layer 3, pending gas is first after annular filter layer 3, pollutant in gas such as dust, formaldehyde etc. can be attracted in the liquid of annular filter layer 3, when drive unit drives annular filter course 3 to rotate, attachment (i.e. pollutant) on annular filter layer 3 can be attached thing release unit and be separated in outside liquid storing part 8 by attachment (i.e. pollutant), a large amount of attachments (i.e. pollutant) is avoided to cause secondary pollution to the liquid in liquid storing part 8 in annular filter layer 3 rotation process, the quality of gas treatment equipment to gas treatment can be improved.
Wherein in a kind of embodiment, attachment release unit comprises pressurizing unit 7, and the attachment (pollutant) that pressurizing unit 7 pairs of annular filter layers 3 extrude to make to be attached to described annular filter layer 3 departs from.By the mode of extruding, the attachment (as hair, large particulate matter etc.) being insoluble to liquid can not only be separated in outside liquid storing part 8 from annular filter layer 3, the liquid being dissolved with pollutant can also be extruded from annular filter layer 3, avoid a large amount of liquid being dissolved with pollutant to rotate with annular filter layer 3 and get back to liquid storing part 8, reduce the secondary pollution to liquid storing part 8.
Wherein in a kind of embodiment, the first end of described annular filter layer 3 is arranged in described liquid storing part 8; Second end of described annular filter layer 3 is arranged on the outside of described liquid storing part; Described pressurizing unit 7 comprises main shaft, and described main shaft is arranged with the second end corresponding to described annular filter layer 3, extrudes described annular filter layer 3 depart to make described attachment with described second rotating shaft 4.In addition, pressurizing unit 7 can also arrange two roller bearings in addition and extrudes annular filter layer 3.
Wherein in a kind of embodiment, gas treatment equipment also comprises attachment retracting device 6, attachment retracting device 6 corresponds to attachment release unit and arranges, be provided with communicating passage 2 between described attachment retracting device 6 and described liquid storing part 8, described communicating passage 2 is provided with filter and communicating passage is carried out to the valve of switch control rule.The position that described attachment retracting device 6 is arranged is higher than described liquid storing part 8; Described annular filter layer 3 is obliquely installed.The liquid of liquid storing part 8 rotates along with annular filter layer 3, is attached thing release unit after annular filter layer 3 separation, is back to attachment retracting device 6, the liquid be recovered is after filtration, purification, liquid storing part 8 can be back to recycle, the cycle of liquid make-up can be extended, easy to use.Because attachment retracting device 6 arrange position higher than liquid storing part 8, therefore can under gravity natural back flow to liquid storing part 8; If arrange position lower than liquid storing part 8, also can by water circulating pump by the liquid-circulating in attachment retracting device 6 to liquid storing part 8.Annular filter layer 3 is obliquely installed, and also facilitates the setting of attachment retracting device 6, is convenient to collect separated attachment.Further, electrolytic strip can also be provided with in attachment retracting device 6 or add catalyst, can sterilization processing be carried out the liquid reclaimed or remove the gaseous contaminant dissolved in a liquid.
Wherein in a kind of embodiment, the direction that described drive unit drives described annular filter layer 3 to rotate is that the windward side of described annular filter layer 3 is rotated from described liquid storing part 8 to the direction of described attachment release unit.As shown in Figure 1, solid arrow represents gas flow direction, dotted arrow represents the rotation direction of annular filter course 3, pending gas is first through windward side, pollutant in gas will be attached to the windward side of filter course, rotated from described liquid storing part 8 to the direction of described attachment release unit by the windward side controlling described annular filter layer 3, the pollutant of windward side is first separated from filter course by attachment release unit, just avoiding a large amount of pollutants along with the rotation of filter course enters into liquid storing part 8, also the secondary pollution to filter course is just alleviated, improve gas treatment quality.
Wherein in an embodiment, be provided with ultrasonic wave module 9 or spray module in described liquid storing part 8, to be departed from from described annular filter layer 3 by the attachment not departing from described annular filter layer 3; Also be provided with described passing away 5 of being discharged by the liquid in liquid storing part 8 bottom described liquid storing part 8, passing away 5 is provided with controlled valve.Like this, after longtime running, user can independently according to actual needs clean annular filter layer 3, and is changed by the used liquid of liquid storing part 8 Inner eycle.
Wherein in an embodiment, described annular filter layer 3 is for being provided with the wet film of capillary structure, and the outer surface of described wet film is provided with fine hair.Capillary structure can make uniform liquid be distributed in each position of wet film, has certain storage capacity, can ensure the amount of liquid of the attachment of wet film.Further, wet film can also have additional copies biological fine hair structure, thus increases the contact interface of gas-liquid two, improves gas treatment effect.
Below gas treatment equipment of the present invention is described:
Wet film one end is immersed in the liquid of liquid reserve tank, liquid in absorption liquid storing part 8, drive unit drives wet film to rotate, moved from liquid storing part 8 to attachment release unit direction in the windward side of wet film, gas flow is when wet film windward side, contaminants in gas is (as dust, formaldehyde, ammonia etc.) be attracted on wet film, after wet film is extruded device 7 extruding, liquid on wet film and impurity are extruded device 7 and squeeze out, and drop into attachment retracting device 6, avoid a large amount of pollutants and get back to liquid storing part 8 with wet film motion, alleviate and secondary pollution is formed to the liquid of liquid storing part 8.After electrolytic strip in attachment retracting device 6 or catalyst process liquid, flow back to liquid storing part 8 through filtration and circulation passage and recycle.Liquid through filtration or catalyst treatment also mitigates secondary pollution.
The present invention also provides a kind of control method of above-mentioned gas treating apparatus, described control method comprises the steps: to start described drive unit, controls the windward side of described annular filter layer 3 from described liquid storing part 8 to the direction gyration of described attachment release unit.Pending gas is first through windward side, pollutant in gas will be attached to the windward side of filter course, rotated from described liquid storing part 8 to the direction of described attachment release unit by the windward side controlling described annular filter layer 3, the pollutant of windward side is first separated from filter course by attachment release unit, just avoiding a large amount of pollutants along with the rotation of filter course enters into liquid storing part 8, also just alleviate the secondary pollution to filter course, improve gas treatment quality.
Wherein in an embodiment, described gas treatment equipment also comprises air-supply arrangement; Described control method comprises the steps:, after the described drive unit of startup, to start described air-supply arrangement, and pending gas is first passed through from the windward side of described annular filter layer 3, to obtain the gas after processing.First start drive unit, ensure that the windward side of annular filter layer 3 is first adsorbed with the liquid to gas treatment, restart air-supply arrangement, ensure that the gas sent is first treated gas.Avoiding annular filter layer 3 when not attaching liquid, cannot process gas.
The present invention also provides the control method of another kind of gas treatment equipment as above, and described control method comprises: control the velocity of rotation of described annular filter layer 3 to adjust the humidity of pending gas.Further, the velocity of rotation controlling described annular filter layer 3 comprises with the humidity adjusting pending gas: improve rotating speed to increase gas humidity; Reduce rotating speed to reduce gas humidity.This control method not only alleviates the secondary pollution problem of described gas treatment equipment, simultaneously can the humidity of adjustments of gas under the prerequisite not increasing construction and device, multifunction more.
Claims (13)
1. a gas treatment equipment, comprising:
Gas passage, for the circulation of pending gas;
Annular filter layer (3), is arranged in described gas passage, rotatable motion;
Liquid storing part (8), described liquid storing part (8) is for storing the liquid processed described annular filter layer (3), and described annular filter layer (3) is passed through via the liquid stored in described liquid storing part (8);
It is characterized in that, also comprise:
Attachment release unit, is arranged independent of described liquid storing part (8), departs from outside described liquid storing part (8) to make the attachment being attached to described annular filter layer (3).
2. gas treatment equipment according to claim 1, is characterized in that,
Described attachment release unit comprises the pressurizing unit (7) extruded annular filter layer (3), and described pressurizing unit (7) departs to make the attachment being attached to described annular filter layer (3) annular filter layer (3) extruding.
3. gas treatment equipment according to claim 2, is characterized in that,
Described gas treatment equipment comprises: the first rotating shaft (1) and the second rotating shaft (4), is located at first end and second end of annular filter layer (3) respectively;
The first end of described annular filter layer (3) is arranged in described liquid storing part (8);
Second end of described annular filter layer (3) is arranged on the outside of described liquid storing part (8);
Described pressurizing unit (7) comprises main shaft, described main shaft is arranged with the second end corresponding to described annular filter layer (3), extrudes described annular filter layer (3) depart to make described attachment with described second rotating shaft (4).
4. the gas treatment equipment according to any one of claim 1-3, is characterized in that,
Described gas treatment equipment also comprises drive unit, and described drive unit drives described annular filter layer (3) by the windward side of described annular filter layer to described attachment release unit direction gyration.
5. gas treatment equipment according to claim 4, is characterized in that,
Also comprise attachment retracting device (6), described attachment retracting device (6) arranges corresponding to described attachment release unit and reclaims the attachment departed from from described annular filter layer (3);
Be provided with communicating passage (2) between described attachment retracting device (6) and described liquid storing part (8), described communicating passage (2) is provided with filter.
6. gas treatment equipment according to claim 5, is characterized in that,
The position that described attachment retracting device (6) is arranged is higher than described liquid storing part (8);
Described annular filter layer (3) is obliquely installed.
7. gas treatment equipment according to claim 5, is characterized in that,
Be provided with electrolytic strip or add catalyst in described attachment retracting device (6), with the attachment purified treatment to disengaging.
8. gas treatment equipment according to claim 1, is characterized in that,
Be provided with ultrasonic wave module (9) or spray module in described liquid storing part (8), depart from from described annular filter layer (3) with the attachment not departing from described annular filter layer (3);
Described liquid storing part (8) bottom is also provided with the dump valve of being discharged by the liquid in described liquid storing part (8).
9. gas treatment equipment according to claim 1, is characterized in that,
Described annular filter layer (3) is for being provided with the wet film of capillary structure, and the outer surface of described wet film is provided with fine hair.
10. gas treatment equipment according to claim 1, is characterized in that,
The liquid that described liquid storing part (8) stores is water, photocatalyst solution, plant extraction liquid or formaldehyde absorbent.
The control method of 11. 1 kinds of gas treatment equipments as claimed in claim 4, is characterized in that,
Start described drive unit, control the windward side of described annular filter layer (3) from described liquid storing part (8) to the direction gyration of described attachment release unit.
12. control methods according to claim 11, is characterized in that,
Described gas treatment equipment also comprises air-supply arrangement; Described control method comprises the steps:
After the described drive unit of startup, start described air-supply arrangement, pending gas is first passed through from the windward side of described annular filter layer (3).
The control method of 13. 1 kinds of gas treatment equipments as described in any one of claim 1-10, is characterized in that,
Control the velocity of rotation of described annular filter layer (3) to adjust the humidity of pending gas, wherein, the velocity of rotation controlling described annular filter layer (3) comprises with the humidity adjusting pending gas:
Improve rotating speed to increase gas humidity; Reduce rotating speed to reduce gas humidity.
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