CN104914664A - Photomask detection structure and detection method thereof - Google Patents
Photomask detection structure and detection method thereof Download PDFInfo
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- CN104914664A CN104914664A CN201410093026.5A CN201410093026A CN104914664A CN 104914664 A CN104914664 A CN 104914664A CN 201410093026 A CN201410093026 A CN 201410093026A CN 104914664 A CN104914664 A CN 104914664A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
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- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
The invention relates to a photomask detection structure and a detection method thereof. The method comprises the following steps: a)providing a photomask, wherein the photomask has a chromium crystal rings array composed of mutual-isolated chromium crystal rings; b)determining a scope of an inspection area in the photomask, arranging a horizontal frame and a vertical frame at most external side in the chromium crystal ring array in the inspection area, setting as a non-inspection area; c)setting a first non-inspection area array in the photomask, covering the horizontal frame and the vertical frame in the chromium crystal ring array to form the non-inspection areal; d)arranging a second non-inspection area array in the photomask, covering a beveling frame of the chromium crystal ring in the chromium crystal ring array to form the non-inspection area. The method can ensure the largest detection area and the smallest which can be obtained, defect existence risk is reduced, and the obtained accurate detection result is more accurate.
Description
Technical field
The present invention relates to semiconductor applications, particularly, the present invention relates to a kind of detection architecture and detection method of light shield.
Background technology
Along with the development of semiconductor technology, the preparation of semiconductor devices is tending towards microminiaturized, and develop into Nano grade at present, the preparation technology of conventional device is ripe gradually simultaneously.In the preparation process of semiconductor devices, first design circuit is obtained by micro-shadow imaging, then by processing procedure by described layout precise definition on light shield, and utilize etching program by the design transfer on light shield to semiconductor base thus obtained required line construction.
Along with the development of semiconductor technology, phase displacement light-cover (Phase Shift Mask, PSM) be widely used, PSM adopts double-exposure (Double-exposure), and select the phase place of 0 and 180, by there being the region of figure to add material, form the phase differential of 180 with planless region.
The preparation method of the phase displacement light-cover used in semiconductor volume production processing procedure to be usually included in smooth bright and clean glass (or quartz) base version by Deposited By Dc Magnetron Sputtering photosensitive material chromium nitride-nitrogen chromium oxide thus to form chromium film base version; Then in this chromium film base version, even application one deck photoresist or electron sensitive resist make sol evenning chromium plate, and this sol evenning chromium plate is photomask-blank, and it makes the geometric desirable photonasty blank plate of micro.The final structure of its transfer pattern of described PSM, except the part of transmitting substrate, mostly has the rete of light bridging effect, has chromium metal (Cr) layer of complete light bridging effect and have the phase shifting materials layer of phase shift effect as normally used.Chromium metal (Cr) in wherein said PSM is positioned on the brilliant ring of chromium, the brilliant ring of such as octagon.
The detection described PSM being carried out to defect is needed after the preparation completing described PSM, to get rid of the defect existed in described PSM, do not need to detect the brilliant ring of described chromium in the inspection of defect, therefore brilliant for described chromium ring is set to not inspection area (do not inspection region, DNIR), other regions are set to inspection area, described PSM is detected, at present the method that brilliant for described chromium ring is set to DNIR there are 3 kinds, respectively as illustrated by figures 1 a-1 c, as shown in Figure 1a, in the brilliant ring 10 of described chromium, inspection area 11 is set, the area of described inspection area is less than the area of the brilliant ring 10 of described chromium, so that brilliant for described chromium ring is got rid of beyond described surveyed area, but described method Problems existing also has between the brilliant ring 10 of described chromium and described inspection area not to be detected greatly, as shown in the region 12 that the upper left corner in Fig. 1 a is filled, great risk is brought to testing result, second method as shown in Figure 1 b, first described inspection area 11 is arranged on the inner side of brilliant ring 10 array of described chromium, so that the outermost frame of the brilliant ring 10 of described chromium is set to DNIR, then Cutting Road array is set in the brilliant ring array of described chromium, the list structure that described Cutting Road array is multiple level or vertically arranges, so that the level of brilliant for described chromium ring array inside and vertical frame are covered, form DNIR region, but the shortcoming of described method the hypotenuse frame of brilliant for described chromium ring array inside cannot be set to DNIR region, the third method as shown in figure ic, wherein said method is the further improvement to second method, the width being in particular the Cutting Road arranged by described vertical direction strengthens, to cover the hypotenuse of the brilliant ring of described chromium, form DNIR region, but the shortcoming of described method is, described Cutting Road overlay area is excessive, cause the region 12 of filling as the upper left corner in Fig. 1 c to detect, in the brilliant ring of each chromium, all have similar region, bring great risk to testing result.
Therefore, the problem accuracy of the detection of described PSM being become to needs solution how is improved in prior art.
Summary of the invention
In summary of the invention part, introduce the concept of a series of reduced form, this will further describe in embodiment part.Summary of the invention part of the present invention does not also mean that the key feature and essential features that will attempt to limit technical scheme required for protection, does not more mean that the protection domain attempting to determine technical scheme required for protection.
The present invention, in order to solve problems of the prior art, provides a kind of detection method of light shield, comprising:
Step (a) provides light shield, has the brilliant ring array of chromium of mutually isolated chromium brilliant ring composition in described light shield;
Step (b) determines the scope of inspection area in described light shield, outermost horizontal frame and vertical frame in brilliant for described chromium ring array to be arranged on beyond described inspection area, is set as non-inspection area;
Step (c) arranges the first non-inspection area array in described light shield, covers the horizontal frame of the brilliant ring of the inner described chromium of the brilliant ring array of described chromium and vertical frame, to form non-inspection area;
Step (d) arranges the second non-inspection area array in described light shield, covers the hypotenuse frame of the brilliant ring of the inner described chromium of the brilliant ring array of described chromium, to form non-inspection area.
As preferably, described method also comprises step (e) further, arranges the 3rd non-inspection area array in described light shield, covers the outermost hypotenuse frame of the brilliant ring array of described chromium, to form non-inspection area.
As preferably, described 3rd non-inspection area array comprises multiple square patterns of mutually isolated setting.
As preferably, described 3rd non-inspection area array is arranged at the outside of described second non-inspection area array, to surround described second non-inspection area array.
As preferably, described 3rd non-inspection area array is with described second non-inspection area array for reference, and method is manually inserted.
As preferably, the brilliant ring of described chromium is octagon, and the frame of described octagon has crome metal, and the frame of described octagon needs to be set as non-inspection area.
As preferably, in the brilliant ring array of the frame of described inspection area and described chromium, outermost horizontal frame and vertical frame overlap, or the frame of described inspection area is arranged on the inner side of outermost horizontal frame and vertical frame in the brilliant ring array of described chromium, so that outermost horizontal frame and vertical frame in brilliant for described chromium ring array are set as non-inspection area.
As preferably, described first non-inspection area array is the strip-cutting road being horizontally disposed with and vertically arranging.
As preferably, the frame in each horizontally disposed described strip-cutting road overlaps with the horizontal frame of the brilliant rings of adjacent two described chromium and arranges; Or be arranged at the inside of horizontal frame of the brilliant ring of described chromium;
The frame in the described strip-cutting road of each vertical setting overlaps with the vertical frame of the brilliant ring of adjacent two described chromium and arranges; Or be arranged at the inside of vertical frame of the brilliant ring of described chromium.
As preferably, described first non-inspection area array is generated automatically by Run Script.
As preferably, described second non-inspection area array comprises multiple square patterns of mutually isolated setting.
As preferably, described second non-inspection area array is arranged at the inside of described inspection area, is automatically generated by Run Script.
As preferably, described light shield is phase displacement light-cover.
As preferably, the step that described method checks the defect existed in described light shield after being also included in further and determining inspection area and non-inspection area.
Present invention also offers a kind of detection architecture of light shield, comprising:
The brilliant ring array of chromium, is arranged in described light shield, comprises the brilliant ring of mutually isolated chromium;
Inspection area, is arranged in described light shield, outermost horizontal frame and vertical frame in brilliant for described chromium ring array to be arranged on beyond described inspection area, is set as non-inspection area;
First non-inspection area array, is arranged in described light shield and covers the horizontal frame of the brilliant ring of the inner chromium of the brilliant ring array of described chromium and vertical frame, to form non-inspection area;
Second non-inspection area array, is arranged in described inspection area, covers the hypotenuse frame of the brilliant ring array inside of described chromium, to form non-inspection area.
As preferably, described detection architecture also comprises the 3rd non-inspection area array further, is arranged in described light shield and covers the outermost hypotenuse frame of the brilliant ring array of described chromium, to form non-inspection area.
As preferably, described 3rd non-inspection area array comprises multiple square patterns of mutually isolated setting.
As preferably, described 3rd non-inspection area array is arranged at the outside of described second non-inspection area array, to surround described second non-inspection area array.
As preferably, the brilliant ring of described chromium is octagon, and the frame of described octagon has crome metal.
As preferably, described first non-inspection area array is the Cutting Road of the bar shaped being horizontally disposed with and vertically arranging.
As preferably, described second non-inspection area array comprises multiple square patterns of mutually isolated setting.
Described method can ensure to obtain maximum surveyed area, and minimum non-surveyed area, can reduce the risk that defect exists, and obtains testing result more accurately; Described method can not detect the defect in the brilliant ring region of chromium, and described method can be applicable to the detection in light shield, brilliant for described chromium ring patterns being set as a class light shield of non-surveyed area, is not limited to phase displacement light-cover one.
Accompanying drawing explanation
Following accompanying drawing of the present invention in this as a part of the present invention for understanding the present invention.Shown in the drawings of embodiments of the invention and description thereof, be used for explaining device of the present invention and principle.In the accompanying drawings,
Fig. 1 a-1c is the detection architecture schematic diagram of phase displacement light-cover in prior art;
Fig. 2 a-2d is the detection architecture schematic diagram of phase displacement light-cover in an embodiment of the present invention; Wherein Fig. 2 a-2c is respectively the structural representation of the first non-inspection area array, the second non-inspection area array and the 3rd non-inspection area array;
Fig. 3 is the detection method schematic flow sheet of phase displacement light-cover in an embodiment of the present invention.
Embodiment
In the following description, a large amount of concrete details is given to provide more thorough understanding of the invention.But, it is obvious to the skilled person that the present invention can be implemented without the need to these details one or more.In other example, in order to avoid obscuring with the present invention, technical characteristics more well known in the art are not described.
Should give it is noted that term used here is only to describe specific embodiment, and be not intended to restricted root according to exemplary embodiment of the present invention.As used herein, unless the context clearly indicates otherwise, otherwise singulative be also intended to comprise plural form.In addition, it is to be further understood that, " comprise " when using term in this manual and/or " comprising " time, it indicates exists described feature, entirety, step, operation, element and/or assembly, but does not get rid of existence or additional other features one or more, entirety, step, operation, element, assembly and/or their combination.
Now, describe in more detail with reference to the accompanying drawings according to exemplary embodiment of the present invention.But these exemplary embodiments can multiple different form be implemented, and should not be interpreted as being only limited to the embodiments set forth herein.Should be understood that, providing these embodiments to be of the present inventionly disclose thorough and complete to make, and the design of these exemplary embodiments fully being conveyed to those of ordinary skill in the art.In the accompanying drawings, for the sake of clarity, use the element that identical Reference numeral represents identical, thus will omit description of them.
The present invention, in order to solve problems of the prior art, provides a kind of detection method of phase displacement light-cover, comprising:
Step (a) provides phase displacement light-cover, has the brilliant ring array of chromium of mutually isolated chromium brilliant ring composition in described phase shift;
Step (b) determines the scope of inspection area in described phase displacement light-cover, outermost horizontal frame and vertical frame in brilliant for described chromium ring array to be arranged on beyond described inspection area, is set as non-inspection area;
Step (c) arranges the first non-inspection area array in described phase displacement light-cover, covers the horizontal frame of the brilliant ring of the inner chromium of the brilliant ring array of described chromium and vertical frame, to form non-inspection area;
Step (d) arranges the second non-inspection area array in described phase displacement light-cover, covers the hypotenuse frame of the brilliant ring array inside of described chromium, to form non-inspection area.
As a kind of preferred implementation, described method also comprises step (e) further, arranges the 3rd non-inspection area array in described phase displacement light-cover, covers the outermost hypotenuse frame of the brilliant ring array of described chromium, to form non-inspection area.
Described method can ensure to obtain maximum surveyed area, and minimum non-surveyed area, can reduce the risk that defect exists, and obtains testing result more accurately; Described method can not detect the defect in the brilliant ring region of chromium, and described method can be applicable to the detection in light shield, brilliant for described chromium ring patterns being set as a class light shield of non-surveyed area, is not limited to phase displacement light-cover one.
Embodiment 1
Be described further below in conjunction with the detection method of accompanying drawing to light shield of the present invention, be described for phase displacement light-cover in this embodiment, but it should be noted that this embodiment is only exemplary illustration, the method of the invention is not limited to phase displacement light-cover, can also be applied to the class light shield brilliant for described chromium ring patterns being set as non-surveyed area.
The method of the invention comprises:
Step (a) provides phase displacement light-cover, has the brilliant ring array of chromium that the brilliant ring 20 of mutually isolated chromium forms in described phase shift;
Step (b) determines the scope of inspection area 21 in described phase displacement light-cover, outermost horizontal frame and vertical frame in brilliant for described chromium ring array to be arranged on beyond described inspection area 21, is set as non-inspection area;
Step (c) arranges the first non-inspection area array 22 in described phase displacement light-cover, covers the horizontal frame of the brilliant ring of the inner chromium of the brilliant ring array of described chromium and vertical frame, to form non-inspection area;
Step (d) arranges the second non-inspection area array 23 in described phase displacement light-cover, covers the hypotenuse frame of the brilliant ring array inside of described chromium, to form non-inspection area;
Step (e), arranges the 3rd non-inspection area array 24 in described phase displacement light-cover, covers the outermost hypotenuse frame of the brilliant ring array of described chromium, to form non-inspection area.
Wherein, in described step (a), described phase displacement light-cover preparation method to be usually included in smooth bright and clean glass (or quartz) base version by Deposited By Dc Magnetron Sputtering photosensitive material chromium nitride-nitrogen chromium oxide thus to form chromium film base version; Then in this chromium film base version, even application one deck photoresist or electron sensitive resist make sol evenning chromium plate, and this sol evenning chromium plate is photomask-blank, and it makes the geometric desirable photonasty blank plate of micro.The final structure of its transfer pattern of described PSM, except the part of transmitting substrate, mostly has the rete of light bridging effect, has chromium metal (Cr) layer of complete light bridging effect and have the phase shifting materials layer of phase shift effect as normally used.
Chromium metal (Cr) in wherein said PSM is positioned on the frame of the brilliant ring of chromium, the brilliant ring of such as octagon, as shown in Figure 2 a, and the frame of the brilliant ring of described chromium has various defect, and the defect that described defect will carrying out in non-invention detects, therefore need the frame of brilliant for described chromium ring to be set to non-inspection area, cause interference, to improve detection efficiency to avoid the detection of defect to described PSM defect in the brilliant ring of described chromium.
Described in the brilliant ring array of wherein said chromium, the number of the brilliant ring of chromium is not limited to a certain numerical range, can set as required.
Wherein, mutually isolated setting between the brilliant ring 20 of described chromium, have certain gap, the size in described gap is relevant with described preparation method.
In described step (b), determine the size of described inspection area 21, in this embodiment described inspection area 21 is set to larger region, be used for surrounding the brilliant ring array of described chromium, to comprise the brilliant ring of all chromium.
Particularly, be preferably outermost horizontal frame and vertical frame in the frame of described inspection area 21 and the brilliant ring array of described chromium in the present invention to overlap, so that outermost horizontal frame and vertical frame in brilliant for described chromium ring array are set as non-inspection area, the loss of inspection area can not be caused, to reduce the risk of defects detection simultaneously.
Alternatively substitute mode, the frame of described inspection area 21 is arranged on the inner side of outermost horizontal frame and vertical frame in the brilliant ring array of described chromium, so that outermost horizontal frame and vertical frame in brilliant for described chromium ring array are set as non-inspection area, the inner side of outermost horizontal frame and vertical frame in brilliant for described chromium ring array is discharged at surveyed area by described method completely, the non-inspection area of part can be increased accordingly, but by reasonably arranging, the risk that defect exists can be reduced within error allowed band completely.
In described step (c), described first non-inspection area array 22 is for being horizontally disposed with the Cutting Road with the bar shaped vertically arranged, mutually isolated between the wherein said Cutting Road being horizontally disposed with bar shaped, mutually isolated between the described Cutting Road that bar shaped is vertically set, as shown in Figure 2 a.Distance between the described Cutting Road being horizontally disposed with bar shaped, and the distance between the described Cutting Road vertically arranging bar shaped is determined by the size of the brilliant ring of described chromium, is not limited to a certain numerical range.
Wherein, the Cutting Road of described bar shaped can be arranged on the inside of described inspection area 21, as long as the horizontal frame of the brilliant ring of the inner chromium of brilliant for described chromium ring array and vertical frame can be set to non-inspection area, as preferably, the Cutting Road of described bar shaped can exceed the scope of described inspection area 21, to be more prone to operation in actual process.
As preferably, the frame of the Cutting Road of each horizontally disposed described bar shaped overlaps with the horizontal frame of the brilliant rings of adjacent two described chromium and arranges; Or be arranged at the inside of horizontal frame of the brilliant ring of described chromium, so that the horizontal frame of the brilliant rings of described adjacent two described chromium is set to non-inspection area.
Further, the frame of the Cutting Road of the described bar shaped of each vertical setting overlaps with the vertical frame of the brilliant ring of adjacent two described chromium and arranges; Or be arranged at the inside of vertical frame of the brilliant ring of described chromium, so that the vertical frame of the brilliant rings of described adjacent two described chromium is set to non-inspection area.
Further, described first non-inspection area array 22 is generated automatically by Run Script.
In described step (c), described second non-inspection area array 23 comprises multiple square patterns of mutually isolated setting, such as can select rectangle or square, or even irregular polygon, to increase the area of surveyed area, cover the frame of the brilliant ring of described chromium completely, as shown in Figure 2 b simultaneously.
Described second non-inspection area array 23 is arranged at the inside of described inspection area 21 in this step, is automatically generated by Run Script.
In described step (d), described 3rd non-inspection area array 24 comprises multiple square patterns of mutually isolated setting, such as can select rectangle or square, as shown in Fig. 2 c-2d, or even irregular polygon, to increase the area of surveyed area, cover the frame of the brilliant ring of described chromium completely simultaneously.
As preferably, described 3rd non-inspection area array 24 is arranged at the outside of described second non-inspection area array 23, to surround described second non-inspection area array 23.
Described 3rd non-inspection area array 24 with described second non-inspection area array 23 for reference, carry out the setting of the 3rd non-inspection area array 24 according to described second non-inspection area array 23, and the 3rd non-inspection area array 24 method is manually inserted.
The step that described method checks the defect existed in described phase displacement light-cover after being also included in further and determining inspection area 21 and non-inspection area.
In order to detect the effect of described method, the present invention has also carried out contrast experiment to the method in method of the prior art and embodiment 1, and result is as shown in table 1.
Testing result contrast in table 1 embodiment 1 and prior art
Can be found out by table 1, described method can ensure to obtain maximum surveyed area in the present invention, and minimum non-surveyed area, can reduce the risk that defect exists, and obtains testing result more accurately.
Embodiment 2
Present invention also offers a kind of detection architecture of phase displacement light-cover, comprising:
The brilliant ring array of chromium, is arranged in described phase displacement light-cover, comprises the brilliant ring 20 of mutually isolated chromium;
Inspection area 21, is arranged in described phase displacement light-cover, outermost horizontal frame and vertical frame in brilliant for described chromium ring array to be arranged on beyond described inspection area 21, is set as non-inspection area;
First non-inspection area array 22, is arranged in described phase displacement light-cover and covers the horizontal frame of the brilliant ring of the inner chromium of the brilliant ring array of described chromium and vertical frame, to form non-inspection area;
Second non-inspection area array 23, is arranged in described inspection area 21, covers the hypotenuse frame of the brilliant ring array inside of described chromium, to form non-inspection area.
Wherein, described detection architecture also comprises the 3rd non-inspection area array 24 further, is arranged in described phase displacement light-cover and covers the outermost hypotenuse frame of the brilliant ring array of described chromium, to form non-inspection area.Described 3rd non-inspection area array 24 comprises multiple square patterns of mutually isolated setting.Described 3rd non-inspection area array 24 is arranged at the outside of described second non-inspection area array 23, to surround described second non-inspection area array 23.
Wherein, the brilliant ring 20 of described chromium is octagon, and the frame of described octagon has crome metal.
In the brilliant ring array of the frame of described inspection area 21 and described chromium, outermost horizontal frame and vertical frame overlap, or the frame of described inspection area 21 is arranged on the inner side of outermost horizontal frame and vertical frame in the brilliant ring array of described chromium, so that outermost horizontal frame and vertical frame in brilliant for described chromium ring array are set as non-inspection area.
Described first non-inspection area array 22 is for being horizontally disposed with the Cutting Road with the bar shaped vertically arranged, and the frame of the Cutting Road of each horizontally disposed described bar shaped overlaps with the horizontal frame of the brilliant rings of adjacent two described chromium and arranges; Or be arranged at the inside of horizontal frame of the brilliant ring of described chromium;
The frame of the Cutting Road of the described bar shaped of each vertical setting overlaps with the vertical frame of the brilliant ring of adjacent two described chromium and arranges; Or be arranged at the inside of vertical frame of the brilliant ring of described chromium.
Described second non-inspection area array 23 comprises multiple square patterns of mutually isolated setting, and described second non-inspection area array is arranged at the inside of described inspection area, is automatically generated by Run Script.
Fig. 3 is the detection method schematic flow sheet of phase displacement light-cover in an embodiment of the present invention, comprises the following steps particularly:
Step (a) provides phase displacement light-cover, has the brilliant ring array of chromium of mutually isolated chromium brilliant ring composition in described phase shift;
Step (b) determines the scope of inspection area in described phase displacement light-cover, outermost horizontal frame and vertical frame in brilliant for described chromium ring array to be arranged on beyond described inspection area, is set as non-inspection area;
Step (c) arranges the first non-inspection area array in described phase displacement light-cover, covers the horizontal frame of the brilliant ring of the inner chromium of the brilliant ring array of described chromium and vertical frame, to form non-inspection area;
Step (d) arranges the second non-inspection area array in described phase displacement light-cover, covers the hypotenuse frame of the brilliant ring array inside of described chromium, to form non-inspection area;
Step (e) arranges the 3rd non-inspection area array in described phase displacement light-cover, covers the outermost hypotenuse frame of the brilliant ring array of described chromium, to form non-inspection area.
The present invention is illustrated by above-described embodiment, but should be understood that, above-described embodiment just for the object of illustrating and illustrate, and is not intended to the present invention to be limited in described scope of embodiments.In addition it will be appreciated by persons skilled in the art that the present invention is not limited to above-described embodiment, more kinds of variants and modifications can also be made according to instruction of the present invention, within these variants and modifications all drop on the present invention's scope required for protection.Protection scope of the present invention defined by the appended claims and equivalent scope thereof.
Claims (21)
1. a detection method for light shield, comprising:
Step (a) provides light shield, has the brilliant ring array of chromium of mutually isolated chromium brilliant ring composition in described light shield;
Step (b) determines the scope of inspection area in described light shield, outermost horizontal frame and vertical frame in brilliant for described chromium ring array to be arranged on beyond described inspection area, is set as non-inspection area;
Step (c) arranges the first non-inspection area array in described light shield, covers the horizontal frame of the brilliant ring of the inner described chromium of the brilliant ring array of described chromium and vertical frame, to form non-inspection area;
Step (d) arranges the second non-inspection area array in described light shield, covers the hypotenuse frame of the brilliant ring of the inner described chromium of the brilliant ring array of described chromium, to form non-inspection area.
2. method according to claim 1, is characterized in that, described method also comprises step (e) further, arranges the 3rd non-inspection area array in described light shield, covers the outermost hypotenuse frame of the brilliant ring array of described chromium, to form non-inspection area.
3. method according to claim 2, is characterized in that, described 3rd non-inspection area array comprises multiple square patterns of mutually isolated setting.
4. method according to claim 2, is characterized in that, described 3rd non-inspection area array is arranged at the outside of described second non-inspection area array, to surround described second non-inspection area array.
5. the method according to claim 2 or 4, is characterized in that, described 3rd non-inspection area array is with described second non-inspection area array for reference, and method is manually inserted.
6. method according to claim 1, is characterized in that, the brilliant ring of described chromium is octagon, and the frame of described octagon has crome metal, and the frame of described octagon needs to be set as non-inspection area.
7. method according to claim 1, it is characterized in that, in the brilliant ring array of the frame of described inspection area and described chromium, outermost horizontal frame and vertical frame overlap, or the frame of described inspection area is arranged on the inner side of outermost horizontal frame and vertical frame in the brilliant ring array of described chromium, so that outermost horizontal frame and vertical frame in brilliant for described chromium ring array are set as non-inspection area.
8. method according to claim 1, is characterized in that, described first non-inspection area array is the strip-cutting road being horizontally disposed with and vertically arranging.
9. method according to claim 8, is characterized in that, the frame in each horizontally disposed described strip-cutting road overlaps with the horizontal frame of the brilliant ring of adjacent two described chromium and arranges; Or be arranged at the inside of horizontal frame of the brilliant ring of described chromium;
The frame in the described strip-cutting road of each vertical setting overlaps with the vertical frame of the brilliant ring of adjacent two described chromium and arranges; Or be arranged at the inside of vertical frame of the brilliant ring of described chromium.
10. method according to claim 1, is characterized in that, described first non-inspection area array is generated automatically by Run Script.
11. methods according to claim 1, is characterized in that, described second non-inspection area array comprises multiple square patterns of mutually isolated setting.
12. methods according to claim 1, is characterized in that, described second non-inspection area array is arranged at the inside of described inspection area, is automatically generated by Run Script.
13. methods according to claim 1, is characterized in that, described light shield is phase displacement light-cover.
14. methods according to claim 1, is characterized in that, the step that described method checks the defect existed in described light shield after being also included in further and determining inspection area and non-inspection area.
The detection architecture of 15. 1 kinds of light shields, comprising:
The brilliant ring array of chromium, is arranged in described light shield, comprises the brilliant ring of mutually isolated chromium;
Inspection area, is arranged in described light shield, outermost horizontal frame and vertical frame in brilliant for described chromium ring array to be arranged on beyond described inspection area, is set as non-inspection area;
First non-inspection area array, is arranged in described light shield and covers the horizontal frame of the brilliant ring of the inner chromium of the brilliant ring array of described chromium and vertical frame, to form non-inspection area;
Second non-inspection area array, is arranged in described inspection area, covers the hypotenuse frame of the brilliant ring array inside of described chromium, to form non-inspection area.
16. detection architecture according to claim 15, is characterized in that, described detection architecture also comprises the 3rd non-inspection area array further, are arranged in described light shield and cover the outermost hypotenuse frame of the brilliant ring array of described chromium, to form non-inspection area.
17. detection architecture according to claim 16, is characterized in that, described 3rd non-inspection area array comprises multiple square patterns of mutually isolated setting.
18. detection architecture according to claim 16, is characterized in that, described 3rd non-inspection area array is arranged at the outside of described second non-inspection area array, to surround described second non-inspection area array.
19. detection architecture according to claim 15, is characterized in that, the brilliant ring of described chromium is octagon, and the frame of described octagon has crome metal.
20. detection architecture according to claim 15, is characterized in that, described first non-inspection area array is the Cutting Road of the bar shaped being horizontally disposed with and vertically arranging.
21. detection architecture according to claim 15, is characterized in that, described second non-inspection area array comprises multiple square patterns of mutually isolated setting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410093026.5A CN104914664B (en) | 2014-03-13 | 2014-03-13 | photomask detection structure and detection method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410093026.5A CN104914664B (en) | 2014-03-13 | 2014-03-13 | photomask detection structure and detection method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104914664A true CN104914664A (en) | 2015-09-16 |
| CN104914664B CN104914664B (en) | 2019-12-17 |
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| JPH10161299A (en) * | 1996-12-05 | 1998-06-19 | Fujitsu Ltd | Pattern fault investigation apparatus |
| CN102169284A (en) * | 2010-02-26 | 2011-08-31 | 深圳清溢光电股份有限公司 | Method for checking chromium plate |
| CN102193304A (en) * | 2010-03-12 | 2011-09-21 | 中芯国际集成电路制造(上海)有限公司 | Photomask template and test method implemented by using photomask template |
| CN102262349A (en) * | 2010-05-24 | 2011-11-30 | 中芯国际集成电路制造(上海)有限公司 | Mask plate for semiconductor technique |
| CN102486604A (en) * | 2010-12-03 | 2012-06-06 | 中芯国际集成电路制造(北京)有限公司 | Phase shift mask, manufacturing method thereof and haze defect detection method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH10161299A (en) * | 1996-12-05 | 1998-06-19 | Fujitsu Ltd | Pattern fault investigation apparatus |
| CN102169284A (en) * | 2010-02-26 | 2011-08-31 | 深圳清溢光电股份有限公司 | Method for checking chromium plate |
| CN102193304A (en) * | 2010-03-12 | 2011-09-21 | 中芯国际集成电路制造(上海)有限公司 | Photomask template and test method implemented by using photomask template |
| CN102262349A (en) * | 2010-05-24 | 2011-11-30 | 中芯国际集成电路制造(上海)有限公司 | Mask plate for semiconductor technique |
| CN102486604A (en) * | 2010-12-03 | 2012-06-06 | 中芯国际集成电路制造(北京)有限公司 | Phase shift mask, manufacturing method thereof and haze defect detection method thereof |
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| CN104914664B (en) | 2019-12-17 |
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