CN104894449A - Vanadium molybdenum alloy target material and preparation method thereof - Google Patents
Vanadium molybdenum alloy target material and preparation method thereof Download PDFInfo
- Publication number
- CN104894449A CN104894449A CN201510317776.0A CN201510317776A CN104894449A CN 104894449 A CN104894449 A CN 104894449A CN 201510317776 A CN201510317776 A CN 201510317776A CN 104894449 A CN104894449 A CN 104894449A
- Authority
- CN
- China
- Prior art keywords
- powder
- vanadium
- molybdenum
- alloy target
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
The invention provides a vanadium molybdenum alloy target material and a preparation method of the material. The target material is composed of vanadium powder, molybdenum powder and a binding agent. The mass ratio of the vanadium powder to the molybdenum powder is 99:1 to 90:10, and the purity of the vanadium powder and the molybdenum powder is 99.5 percent. The preparation method comprises the following steps that the vanadium powder and the molybdenum powder are proportionally weighed and are fully mixed; the binding agent is added to the evenly-mixed vanadium powder and the molybdenum powder to be further evenly mixed, and a dried composite powder material of the vanadium powder, the molybdenum powder and the binding agent is treated; plasma spraying operation is carried out on the composite powder material in the step (2); and a component obtained through spraying is taken down, and the component is treated to obtain a finished product. The vanadium molybdenum alloy target material is good in uniformity and high in stability; a plasma spraying manner adopted in the preparation method is simple and easy to implement, mold design and expensive pressing equipment are not needed, operation is convenient, the prepared target material is excellent in sputtering performance, few impurities exist, and the material is suitable for optical coating.
Description
Technical field
The present invention relates to a kind of material and preparation method thereof, particularly a kind of vanadium molybdenum alloy target material and preparation method thereof.
Background technology
Vanadium dioxide (VO
2) film is a kind of Studies of Vanadium Oxide Thin Films with unique phase-change characteristic, show characteristic of semiconductor when low temperature, there is high ir transmissivity, after high-temperature phase-change, then present metallic character, present high-reflectivity to infrared.And its transformation temperature is 68 DEG C, by metal molybdenum (Mo) doping, transformation temperature can be made to raise.So vanadium dioxide film has boundless application prospect in the field such as Intelligent energy-saving window, photoswitch.VO
2the method of film preparation has a lot, and wherein the advantage of reaction magnetocontrol sputtering technology film even compact, good stability, applicable suitability for industrialized production prepared by it, is VO
2the technology of preparing that film preparation is the most frequently used.At VO
2in film reaction magnetocontrol sputtering preparation process, usually after passing into a certain proportion of argon oxygen gas mixture volume ionization, sputter vanadium molybdenum alloy target, reactive deposition obtains VO
2film, wherein the performance of stability on film of alloys target plays very large impact.
The preparation of present vanadium molybdenum alloy target has two kinds of methods usually, and one is heat melting method, and another kind is powder hot pressing.So-called heat melting method, exactly cooling after requiring the vanadium molybdenum melting of ratio is obtained alloy target material, because vanadium is different with the fusing point of molybdenum, density difference is very large, so cannot obtain uniform vanadium molybdenum alloy target, and due to from molten state in solid-state process of cooling, target from inside to outside temperature is in larger graded, so target structurally exists larger heterogeneity, thus affect VO
2stability in thin film sputtering preparation.Powder hot pressing obtains vanadium molybdenum alloy target by hot pressing vacuum sintering is shaping after becoming the vanadium molybdenum powder Homogeneous phase mixing of certain mass proportioning, although it can obtain the target mixed, but the method pressing process needs design specialized mould, porosity is high, target is short for work-ing life, thus make film preparation cost high, and due to the impact of various factors in hot pressing, larger fluctuation is there is in the target of different batches in density and structure, thus affect sputtering yield in membrane-film preparation process, finally affect VO
2the performance of film.Vanadium has VO usually, V
2o
3, VO
2, V
2o
5the oxide compound of more than ten kind of different valence state, is applicable to generating VO
2condition and range very narrow, so at VO
2in film preparation, the stability of target is to VO
2the success of film is prepared most important.
Summary of the invention
In order to overcome above-mentioned technical problem, the invention provides a kind of vanadium molybdenum alloy target, this vanadium molybdenum alloy target good uniformity, stability is high, has good sputtering performance.The present invention provides a kind of method preparing above-mentioned vanadium molybdenum alloy target in addition, the method is simple, a large amount of doping vanadium molybdenum gold can be obtained, and without the need to die design and expensive pressing device, easy to operate, control fast, and the earth improves shaping efficiency, gained target as sputter excellent property, impurity is few.
The technical solution adopted in the present invention is:
A kind of vanadium molybdenum alloy target, made by vanadium powder, molybdenum powder and binding agent and form, wherein the quality proportioning of vanadium powder and molybdenum powder is 99:1 ~ 90:10, and the purity of described vanadium powder and molybdenum powder is greater than 99.5%.
Preferably, the solute of described binding agent is alkyd varnish, and solvent is 200# gasoline, and both volume ratios are 1:30 ~ 1:10.
Preferably, described vanadium powder granularity is 5 ~ 150um, and described molybdenum powder granularity is for being less than 150um.
A preparation method for vanadium molybdenum alloy target described above, comprises the following steps:
(1) take vanadium powder and molybdenum powder in proportion, and both are fully mixed;
(2) vanadium powder of mixing and molybdenum powder are added binding agent to mix further, and process obtains dry vanadium molybdenum powder and the composite powder material of binding agent;
(3) composite powder material of step (2) is carried out plasma spraying operation;
(4) take off the component of spraying gained, and process is carried out to described component obtain finished product.
Preferably, the blending manner of described step (1) is: with drum mixer mixing, its rotating speed is 60 ~ 100r/min, and mixing time is 0.5 ~ 2h.
Preferably, the plasma spraying operation of described step (3) adopts vacuum plasma spray coating system to operate, and the indoor temperature of system vacuum is 10 ~ 80 DEG C, oxygen level 0 ~ 600ppm, pressure is 100 ~ 125 kPa, spray distance 100 ~ 300mm, spray power 45 ~ 70kW, rotary speed is 300 ~ 500r/min, powder feeding rate is 3 ~ 7kg/h, spray gun rate travel is 70 ~ 150mm/s, and spray angle is 60 ° ~ 90 °, and the single continuous spray time is 30 ~ 60min.
Preferably, the core material of described plasma spray system adopts cylindrical graphite core, and coating thickness is 5 ~ 100mm.
Preferably, the processing mode of described step (4) is: adopt vacuum intermediate-frequency induction sintering furnace to carry out sintering processes to described component, carry out mechanical grinding and ultrasonic cleaning afterwards.
Preferably, the temperature rise rate of described sintering processes is 10 ~ 20 DEG C/min, and sintering temperature is 20 ~ 1400 DEG C, and the integral sintered time is 2 ~ 15h.
Beneficial effect of the present invention:
The present invention adopts vanadium molybdenum composite powder to carry out, and plasma spraying is shaping obtains a kind of plated film vanadium molybdenum alloy target, good uniformity, stability is high, there is good sputtering performance, this preparation method is simple, avoid the complicated die design adopting prior powder metallurgy drawing method to need, be very easy to the preparation of cylinder or tubulose vanadium target.Compared with prior powder metallurgy compacting sintering technique, this plasma spraying shaping vanadium molybdenum alloy target method milling method is simple, with low cost, and is painted with non-dynamics equilibrium process by plasma spray, large doping vanadium molybdenum alloy can be obtained, and without the need to die design and expensive pressing device, easy to operate, control fast, drastically increase shaping efficiency, gained target as sputter excellent property, impurity is few, is applicable to optical coating.
Accompanying drawing explanation
Fig. 1 is preparation method's flow chart of steps of the present invention.
Embodiment
Below in conjunction with drawings and embodiments, the present invention is further described.
As shown in Figure 1, the preparation method of a kind of vanadium molybdenum alloy target of the present invention is as follows:
Embodiment one:
Step 1: adopt granularity 5 ~ 20um, the vanadium powder that purity is greater than 99.5%, then calculate according to vanadium molybdenum mass ratio 99:1 ~ 90:10, the purity adding corresponding mass is greater than the molybdenum powder of below the granularity 150um of 99.5%, drum mixer mixes, rotating speed 60 ~ 100r/min, time 0.5 ~ 2h.The Main Function of this step is, vanadium powder and molybdenum powder is fully mixed, for next step and binding agent batch mixing ready because binding agent toughness, if directly by vanadium powder and molybdenum powder batch mixing together with binding agent, vanadium powder and molybdenum powder can be made to mix.
Step 2: add the composite powder of above-mentioned mixing, ethanol 200 ~ 300ml, sintered carbide ball 0.5 ~ 0.75kg in the ball grinder of ball-bearing mill, 4 ~ 24h is ground under an argon atmosphere with 100 ~ 300r/min, powder after grinding is taken out, in stink cupboard, places 10 ~ 30min.In this step, ethanol is as mixture, vanadium molybdenum composite powder is melted into one, is conducive to the grinding of ball-bearing mill, and vanadium molybdenum composite powder being mixed further, is placed on the process of stink cupboard exhausting, is to be drained by ethanol, to improve the purity of vanadium molybdenum composite powder.
Step 3: core material adopts pre-prepd cylindrical high-strength graphite core (diameter 5 ~ 100mm, length 50 ~ 200mm), uses the powder obtained in step 2, adopts vacuum plasma spray coating system, carries out plasma spraying operation.The indoor temperature 10 ~ 80 DEG C of this vacuum spraying system vacuum, oxygen level 0 ~ 600ppm in vacuum chamber, vacuum indoor pressure is 100 ~ 125 kPa, spray distance 100 ~ 300mm, spray power 45 ~ 70kW, rotary speed 300 ~ 500r/min, powder feeding rate 3 ~ 7kg/h, spray gun rate travel 70 ~ 150mm/s, spray angle 60 ° ~ 90 °, single continuous spray time 30 ~ 60min, until spray piece thickness reaches 5 ~ 100mm.By this step, vanadium molybdenum composite powder is heated to molten state in the flame stream of vacuum plasma spray coating system, and spray on the mold surface at a high speed, clash into the spherical powder generation viscous deformation of molten state during die surface, adhere to die surface, also rely on viscous deformation to be combined with each other between each powder, obtain the sprayed coating of 5 ~ 100mm thickness at die surface.
Step, 4: removing graphite core mould, leave spraying gained component.
Step 5: adopt vacuum intermediate-frequency induction sintering furnace, sintering processes is carried out to component, temperature rise rate 10 ~ 20 DEG C/min, temperature 20 ~ 1400 DEG C, integral sintered time 2 ~ 15h, finally cools to room temperature with the furnace.
Step 6: mechanical grinding is carried out to component, ultrasonic cleaning process obtains finished product.
Embodiment two:
Step 1: adopt granularity 50 ~ 150um, the vanadium powder of purity more than 99.5, then calculate according to vanadium molybdenum mass ratio 99:1 ~ 90:10, add molybdenum powder (purity more than 99.5, below granularity 20um), drum mixer mixes, rotating speed 60 ~ 100r/min, time 0.5 ~ 2h.The effect of this step is identical with the step 1 of embodiment 1.
Step 2: take alkyd varnish, measures 200# gasoline, and the two volume ratio is 1:30 ~ 3:30, the two is added in agitator, arranges agitator speed 60 ~ 100r/min, and it is stand-by that stirring 15min ~ 30min is prepared into binding agent.Binding agent prepared by this step is durable, and viscosity is strong, together with vanadium powder can being sticked by force with molybdenum powder.
Step: 3: the composite powder in step 1 is put into agitator, pours into the binding agent configured in step 2, starts agitator, arranges mixing speed 60 ~ 100r/min, time 1 ~ 3h, and whipping process can slightly generate heat, and can use water quench agitator.This step arranges mixing speed should not be too fast, in order to avoid cause raw material to splash, avoid whipping process heating excessive in addition, affects vanadium powder and molybdenum powder is mixed to get uneven.Also have this step generally to need to stir more than 1h, fully mix to make vanadium powder and molybdenum powder.
Step 4: produce the composite powder containing binding agent in stainless steel ware from agitator, put into stink cupboard, leaves standstill 6 ~ 12h, obtains the lump that composite powder is bonded together.The effect of this step is drained by the solvent 200# gasoline of binding agent, obtains the vanadium molybdenum composite powder lump that purity is higher.
Step 5: will the powder of lump be formed, grind alms bowl with molybdenum and pulverize, mill about 10min at every turn, the powder ground in alms bowl will be poured in 50 ~ 150 order mesh screens and sieve, then oversize powder is poured into grind in alms bowl and continue to mill, sieve again after 10min, so repeatedly till all powder all sieves.This step ensure that the granularity of all powder is all between 50 ~ 150um, is the feed powder being applicable to very much plasma spraying.
Step 6: core material adopts pre-prepd cylindrical high-strength graphite core (diameter 5 ~ 100mm, length 50 ~ 200mm), uses the powder obtained in step 7, adopts vacuum plasma spray coating system, carries out plasma spraying operation.The indoor temperature 10 ~ 80 DEG C of this vacuum spraying system vacuum, oxygen level 0 ~ 600ppm in vacuum chamber, vacuum indoor pressure is 100 ~ 125 kPa, spray distance 100 ~ 300mm, spray power 45 ~ 70kW, rotary speed 300 ~ 500r/min, powder feeding rate 3 ~ 7kg/h, spray gun rate travel 70 ~ 150mm/s, spray angle 60 ° ~ 90 °, single continuous spray time 30 ~ 60min, until spray piece thickness reaches 5 ~ 100mm.By this step, vanadium molybdenum composite powder is heated to molten state in the flame stream of vacuum plasma spray coating system, and spray on the mold surface at a high speed, clash into the spherical powder generation viscous deformation of molten state during die surface, adhere to die surface, also rely on viscous deformation to be combined with each other between each powder, obtain the sprayed coating of 5 ~ 100mm thickness at die surface.
Step 7: removing graphite core mould, leaves spraying gained component.
Step 8: adopt vacuum intermediate-frequency induction sintering furnace, sintering processes is carried out to component, temperature rise rate 10 ~ 20 DEG C/min, temperature 20 ~ 1400 DEG C, integral sintered time 2 ~ 15h, finally cools to room temperature with the furnace.
Step 9: mechanical grinding is carried out to component, ultrasonic cleaning process obtains finished product.
Embodiment three:
Step 1: adopt granularity 5 ~ 50um, the vanadium powder that purity is greater than 99.5%, then calculate according to vanadium molybdenum mass ratio 99:1 ~ 95:5, the purity adding corresponding mass is greater than the molybdenum powder of below the granularity 50um of 99.5%, drum mixer mixes, rotating speed 60 ~ 100r/min, time 0.5 ~ 2h.The effect of this step is identical with the step 1 of 2 with embodiment 1.
Step 2: the composite powder adding above-mentioned mixing in the ball grinder of ball-bearing mill, put into ethanol 200 ~ 300ml, sintered carbide ball 0.5 ~ 0.75kg, grind 12 ~ 48h with 100 ~ 300r/min under an argon atmosphere, the powder after grinding is taken out, in stink cupboard, place 10 ~ 30min.The effect of this step is identical with the effect of the step 2 of embodiment 1.
Step 3: the composite powder in step 2 is put into agitator, 1.25 ~ 12.5 parts of polyoxyethylene glycol PEG400,12 ~ 96 parts of ethanol, 1 ~ 10 part of defoamer, above-mentioned defoamer is selected from the one in silicone emulsion, the fatty acid ester compounded thing of higher alcohols, polyoxyethylene polyoxypropylene tetramethylolmethane ether, polyoxyethylene polyoxy propyl alcohol amidogen ether, polypropylene glycerol aether and polyoxypropylene.Carry out ball milling 15 ~ 30min with 100r/min rotating speed, adding the fatty acid ester compounded thing of 3g defoamer higher alcohols when being milled to 10min, mixing rear taking-up slip.Vanadium molybdenum composite powder is made uniform slip by this step, for centrifugal spray drying step is below ready.
Step 4: adopt centrifugal spray drying system, sends into slip described in step 3, spray dish diameter 120mm, rotating speed 10000 ~ 25000r/min, feed rate 50 ~ 200ml/min, temperature in 150 ~ 300 DEG C, temperature out 80 ~ 90 DEG C.Slurry atomization, by carrying out centrifugal spray drying to the slip of step 3, is dried to the powder of applicable plasma spraying operation by this step.
Step 5: core material adopts pre-prepd cylindrical high-strength graphite core (diameter 5 ~ 100mm, length 50 ~ 200mm), uses the powder obtained in step 4, adopts vacuum plasma spray coating system, carries out plasma spraying operation.The indoor temperature 10 ~ 80 DEG C of this vacuum spraying system vacuum, oxygen level 0 ~ 600ppm in vacuum chamber, vacuum indoor pressure is 100 ~ 125 kPa, spray distance 100 ~ 300mm, spray power 45 ~ 70kW, rotary speed 300 ~ 500r/min, powder feeding rate 3 ~ 7kg/h, spray gun rate travel 70 ~ 150mm/s, spray angle 60 ° ~ 90 °, single continuous spray time 30 ~ 60min, until spray piece thickness reaches 5 ~ 100mm.By this step, vanadium molybdenum composite powder is heated to molten state in the flame stream of vacuum plasma spray coating system, and spray on the mold surface at a high speed, clash into the spherical powder generation viscous deformation of molten state during die surface, adhere to die surface, also rely on viscous deformation to be combined with each other between each powder, obtain the sprayed coating of 5 ~ 100mm thickness at die surface.
Step 6: removing graphite core mould, leaves spraying gained component.
Step 7: adopt vacuum intermediate-frequency induction sintering furnace, sintering processes is carried out to component, temperature rise rate 10 ~ 20 DEG C/min, temperature 20 ~ 1400 DEG C, integral sintered time 2 ~ 15h, finally cools to room temperature with the furnace.
Step 8: mechanical grinding is carried out to component, ultrasonic cleaning process obtains finished product.
The above is the preferred embodiment of the present invention, and it does not form limiting the scope of the invention.
Claims (9)
1. a vanadium molybdenum alloy target, is characterized in that, made by vanadium powder, molybdenum powder and binding agent and form, wherein the quality proportioning of vanadium powder and molybdenum powder is 99:1 ~ 90:10, and the purity of described vanadium powder and molybdenum powder is greater than 99.5%.
2. vanadium molybdenum alloy target according to claim 1, is characterized in that, the solute of described binding agent is alkyd varnish, and solvent is 200# gasoline, and both volume ratios are 1:30 ~ 1:10.
3. vanadium molybdenum alloy target according to claim 1, is characterized in that, described vanadium powder granularity is 5 ~ 150um, and described molybdenum powder granularity is for being less than 150um.
4. a preparation method for the vanadium molybdenum alloy target as described in claims 1 to 3, is characterized in that, comprise the following steps:
(1) take vanadium powder and molybdenum powder in proportion, and both are fully mixed;
(2) vanadium powder of mixing and molybdenum powder are added binding agent to mix further, and process obtains dry vanadium molybdenum powder and the composite powder material of binding agent;
(3) composite powder material of step (2) is carried out plasma spraying operation;
(4) take off the component of spraying gained, and process is carried out to described component obtain finished product.
5. the preparation method of vanadium molybdenum alloy target according to claim 4, is characterized in that, the blending manner of described step (1) is: with drum mixer mixing, its rotating speed is 60 ~ 100r/min, and mixing time is 0.5 ~ 2h.
6. the preparation method of vanadium molybdenum alloy target according to claim 5, it is characterized in that, the plasma spraying operation of described step (3) adopts vacuum plasma spray coating system to operate, the indoor temperature of system vacuum is 10 ~ 80 DEG C, oxygen level 0 ~ 600ppm, pressure is 100 ~ 125 kPa, spray distance 100 ~ 300mm, spray power 45 ~ 70kW, rotary speed is 300 ~ 500r/min, and powder feeding rate is 3 ~ 7kg/h, and spray gun rate travel is 70 ~ 150mm/s, spray angle is 60 ° ~ 90 °, and the single continuous spray time is 30 ~ 60min.
7. the preparation method of vanadium molybdenum alloy target according to claim 6, is characterized in that, the core material of described plasma spray system adopts cylindrical graphite core, and coating thickness is 5 ~ 100mm.
8. the preparation method of alum molybdenum alloy target according to claim 6, it is characterized in that, the processing mode of described step (4) is: adopt vacuum intermediate-frequency induction sintering furnace to carry out sintering processes to described component, carry out mechanical grinding and ultrasonic cleaning afterwards.
9. the preparation method of alum molybdenum alloy target according to claim 8, is characterized in that, the temperature rise rate of described sintering processes is 10 ~ 20 DEG C/min, and sintering temperature is 20 ~ 1400 DEG C, and the integral sintered time is 2 ~ 15h.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510317776.0A CN104894449A (en) | 2015-06-10 | 2015-06-10 | Vanadium molybdenum alloy target material and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510317776.0A CN104894449A (en) | 2015-06-10 | 2015-06-10 | Vanadium molybdenum alloy target material and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104894449A true CN104894449A (en) | 2015-09-09 |
Family
ID=54027399
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510317776.0A Pending CN104894449A (en) | 2015-06-10 | 2015-06-10 | Vanadium molybdenum alloy target material and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104894449A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101287857A (en) * | 2005-05-05 | 2008-10-15 | H.C.施塔克有限公司 | Coating process for manufacture or reprocessing of sputter targets and x-ray anodes |
| CN102388159A (en) * | 2009-04-10 | 2012-03-21 | 圣戈班涂敷技术公司 | Target based on molybdenum and production method with thermal projection of a target |
| CN103060793A (en) * | 2013-02-01 | 2013-04-24 | 基迈克材料科技（苏州）有限公司 | Refractory metal rotary sputtering target material prepared by cold spraying method |
| CN103827345A (en) * | 2011-07-25 | 2014-05-28 | 埃卡特有限公司 | Use of specially coated powdered coating materials and coating methods using such coating materials |
| US20150034477A1 (en) * | 2007-05-04 | 2015-02-05 | H.C. Starck, Inc. | Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom |
-
2015
- 2015-06-10 CN CN201510317776.0A patent/CN104894449A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101287857A (en) * | 2005-05-05 | 2008-10-15 | H.C.施塔克有限公司 | Coating process for manufacture or reprocessing of sputter targets and x-ray anodes |
| US20150034477A1 (en) * | 2007-05-04 | 2015-02-05 | H.C. Starck, Inc. | Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom |
| CN102388159A (en) * | 2009-04-10 | 2012-03-21 | 圣戈班涂敷技术公司 | Target based on molybdenum and production method with thermal projection of a target |
| CN103827345A (en) * | 2011-07-25 | 2014-05-28 | 埃卡特有限公司 | Use of specially coated powdered coating materials and coating methods using such coating materials |
| CN103060793A (en) * | 2013-02-01 | 2013-04-24 | 基迈克材料科技（苏州）有限公司 | Refractory metal rotary sputtering target material prepared by cold spraying method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101319307B (en) | Method of manufacturing tin indium oxide target material | |
| CN104946950A (en) | Vanadium-tungsten alloy target and preparation method thereof | |
| CN101580379B (en) | Nb-doped nano indium tin oxide powder and method for preparing high density sputtering coating target thereof | |
| CN109943763B (en) | Preparation method of high-thermal-conductivity nuclear fuel pellet | |
| CN103754891B (en) | The method of a kind of boron/carbothermic method low-temperature growth hafnium boride powder | |
| CN106498205A (en) | A kind of manufacture method of the CuCr alloys of large scale high-compactness high uniformity | |
| CN101786160A (en) | Special molybdenum powder used for automatic forming and preparation method thereof | |
| CN104211062B (en) | A kind of non-oxidized substance eutectic ceramic amorphous powder reactive spray preparation method | |
| CN106747468B (en) | Drain tube material and preparation method thereof for aerosolization titanium or titanium alloy powder | |
| CN104894448A (en) | Vanadium-silicon alloy target and preparation method thereof | |
| CN106337158A (en) | Spherical titanium black powder and preparation methods thereof | |
| CN104028768A (en) | Nickel alloy powder atomization manufacturing process and equipment thereof | |
| CN106032323B (en) | It is a kind of using TiAl powder as the Ti of raw material2AlC ceramic powder preparation method | |
| CN105478745B (en) | A kind of method that low-temperature sintering prepares tungsten slab | |
| CN103710555B (en) | A kind of method utilizing casting method to prepare tungsten copper sheet or plate | |
| CN104355609A (en) | Spray granulation preparation method for YAG-based transparent ceramic powder | |
| CN102517483B (en) | Industrial production method for synthesizing cemented carbide block material in situ | |
| CN104556979B (en) | A kind of beryllium oxide ceramics supporting rod and preparation method thereof | |
| CN105458266A (en) | Method for manufacturing molybdenum plate blank through sintering | |
| CN106756187A (en) | A kind of powder metallurgic method that porous titanium material is prepared with rice hulls pore creating material | |
| CN104032253B (en) | A kind of Ti-B-C-N ceramic coating and preparation method thereof | |
| CN103274407A (en) | Preparation method of composite crystalline grain growth inhibitor with adjustable ratio | |
| CN104894449A (en) | Vanadium molybdenum alloy target material and preparation method thereof | |
| CN104947051A (en) | Vanadium-aluminum alloy target and preparation method thereof | |
| CN103060762B (en) | The production technology of molybdenum niobium alloy target |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information |
Address after: Futian District Shenzhen City, Guangdong province 518000 Shennan Road No. 1006 Shenzhen International Innovation Center C building 15 Floor Applicant after: Shenzhen Winner Technology Co., Ltd. Address before: 518000, Guangdong, Futian District, Xinzhou South Road, Shenzhen, 2 floor, 6 floor, South half of the floor Applicant before: Shenzhen Weileda Technology Development Co., Ltd. |
|
| CB02 | Change of applicant information | ||
| AD01 | Patent right deemed abandoned |
Effective date of abandoning: 20190507 |
|
| AD01 | Patent right deemed abandoned |