CN104863905B - Fluid accelerating device - Google Patents
Fluid accelerating device Download PDFInfo
- Publication number
- CN104863905B CN104863905B CN201510032313.XA CN201510032313A CN104863905B CN 104863905 B CN104863905 B CN 104863905B CN 201510032313 A CN201510032313 A CN 201510032313A CN 104863905 B CN104863905 B CN 104863905B
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- Prior art keywords
- ring portion
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- length
- ring
- rotating shaft
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- 239000012530 fluid Substances 0.000 title claims abstract description 58
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 37
- 239000000758 substrate Substances 0.000 claims description 164
- 238000000034 method Methods 0.000 claims description 36
- 230000008569 process Effects 0.000 claims description 28
- 230000007704 transition Effects 0.000 claims description 24
- 239000007921 spray Substances 0.000 claims description 13
- 239000007787 solid Substances 0.000 claims description 3
- 238000010276 construction Methods 0.000 claims description 2
- 238000005507 spraying Methods 0.000 abstract description 10
- 239000007788 liquid Substances 0.000 abstract description 8
- 101001070647 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) 60S ribosomal protein L20-A Proteins 0.000 description 10
- 101001070655 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) 60S ribosomal protein L20-B Proteins 0.000 description 10
- 238000004140 cleaning Methods 0.000 description 10
- 210000003739 neck Anatomy 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000008450 motivation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/40—Distributing applied liquids or other fluent materials by members moving relatively to surface
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention relates to a fluid accelerating device, which comprises a base, a first ring part and a second ring part; the first ring part is fixedly arranged on the base and provided with at least one water spraying channel and a plurality of air spraying channels which are arranged in the first ring part, the water spraying channel is provided with a water outlet hole which is arranged on the first ring part, the plurality of air spraying channels are provided with a plurality of corresponding air spraying holes which are arranged on the first ring part, and the water outlet hole is arranged on the outer side of the first ring part relative to the plurality of air spraying holes; the second ring part is rotatably connected with the base and surrounds the first ring part. The second ring part can rotate relative to the base, so that the fluid accelerating device can improve the collection rate of the processing liquid.
Description
【Technical field】
The present invention is on a kind of fluid accelerator, particularly relates to one kind and can be applied to semiconductor crystal wafer, solar energy base
The processing procedure of the flat-shaped substrates such as plate, display glass substrate, LED-baseplate, but these processing procedures are not limited to, and used in processing procedure
When different chemical product carries out monolithic spin etch, cleaning, the unnecessary process fluid that would be used for substrate is transported to collection device
Fluid accelerator.
【Background technology】
In substrate procedure for processing industry, be used in the process fluid of substrate may be not easy to obtain because of raw material, preparation procedure
It is numerous and diverse or need the factors such as specific preparation procedure so that process fluid often incurs a considerable or great expense, therefore by the processing stream for substrate
Body collect in specific collection container so that the recycling of processing is very important program, and the collection rate of process fluid
Therefore as one of processing procedure operating cost height index.
Fig. 5 shows the substrate processing machine 1001A of a prior art, and it has one base/support 1010A, a substrate rotating shaft
1016A, a substrate 1018A, a power set 1050A and one collect ring 1500A, and substrate rotating shaft is fixed in substrate 1018A systems
On 1016A, process fluid 2000A is put on substrate 1018A, and power set 1050A driving substrate rotating shaft 1016A and base
Plate 1018A rotates relative to base 1010A, process fluid 2000A is uniformly distributed in substrate 1018A, on the other hand thoroughly
Cross centrifugal force caused by substrate 1018A rotation and get rid of process fluid 2000A unnecessary on substrate 1018A to collection ring
1500A, with the process fluid 2000A unnecessary by ring 1500A collections are collected.However, this substrate processing machine 1001A collection ring
Size between 1500A and substrate 1018A is simultaneously improper so that has considerable process fluid 2000A to be dispersed to substrate processing machine
1001A inside, and process fluid 2000A collection rate is greatly reduced, and substrate processing machine 1001A may be caused bad
Influence.By taking the substrate processing machine an of this type as an example, one is suitable for the collection of 12 inch substrate processing machines of 12 inch substrates processing
Ring in collect process fluid collection rate up to 99.99%；If but the 12 inch substrate processing machine is used to process 8 inch substrates
When, ring is collected in the collection rate only about 60% for collecting process fluid.That is, the substrate processing machine of prior art can not be applied to it is more
The substrate processing of size.
Fig. 6 shows the substrate processing machine 1001B of another prior art, its have a base 1010B, a rotating ring 1014B,
One substrate 1018B, a power set 1050B and one collect ring 1500B, substrate 1018B systems be fixed on substrate rotating shaft 1016B it
On, rotating ring 1014B systems are attached to substrate rotating shaft 1016B, and process fluid (not shown) is put on substrate 1018B, and power
Device 1050B driving substrate rotating shafts 1016B, substrate 1018B and rotating ring 1014B are rotated together with, and through rotating ring 1014B
System extends close to collect ring 1500B position, the collection rate so as to lifting the process fluid.However, in this prior art
In configuration, substrate 1018B and rotating ring 1014B is driven by same power set 1050B, on the one hand may will fill power
Load excessive or the volume for putting 1050B are excessive；On the other hand, under a range of rotating speed, due to rotating ring 1014B rotating speed
It is identical with substrate 1018B so that rotating ring 1014B rotating speed is limited to substrate 1018B and effectively can not transported process fluid
Deliver to and collect ring 1500B.
Fig. 7 shows the substrate processing machine 1001C of the another prior art cleaning ring portion for being used for substrate back cleaning
1012C, it is affixed or affixed with base (not shown) with substrate rotating shaft (not shown)；That is, cleaning ring portion 1012C systems and base
Plate and substrate rotating shaft are the same as dynamic；Or substrate system can relative clean ring portion 1012C rotations.Wherein, cleaning ring portion 1012C has multiple
Apopore 1024C and one ring-like jet seam 1026C, apopore 1024C are used to provide cleaning solution in substrate back, ring-like jet seam
1026C is used to provide gas in substrate back, the cleaning so as to maintaining substrate back.However, apopore 1024C aperture may
There is the problem of too small, cause to be provided in the cleaning solution deficiency of substrate back, can not the effective cleaning base plate back side.In addition, ring-like spray
Air cleft 1026C is not easy have uniform annular gap, as long as the size or assembling process of associated component slightly have error, easily makes ring
Type jet, which is sewn in its ring-like one end, has a larger gap section, and has a less gap in its ring-like other end
Section, gas will so be not easy equably by the seam 1026C blowouts of ring-like jet.
【The content of the invention】
In order to solve the above problems, a system of the object of the invention provides a kind of fluid accelerator, and it, which has, is fixed on bottom
One first ring portion of seat, first ring portion has multiple fumaroles, and can solve the ring-like of prior art through such fumarole
The uneven missing of jet seam air blowing；In addition, utilize the fluid that the present invention with respect to base and one second ring portion of substrate rotating, can be made
The substrate processing of accelerator energy suitable for multiple sizes, and be not required to prior art such as and must be influenceed by the rotating speed of substrate.
Foundation one embodiment of the invention, a kind of fluid accelerator, including：One base, one first ring portion and one second
Ring portion；First ring portion is fixedly arranged on the base, and is arranged at an at least apopore with multiple fumaroles in first ring portion,
The relatively the plurality of fumarole of the apopore system is arranged at the outside of first ring portion；Second ring portion rotatably connects with the base
Connect, and surround first ring portion.
It is preferred that the fluid accelerator of the present invention further includes one second power set, so as to rotating second ring
Portion.According to this configuration, second ring portion of the invention has independent power set, the power set so as to that can reduce substrate
Load, and the rotating speed for making the rotating speed of second ring portion be higher than substrate is passed through, and then lift the collection rate of processing liquid.
It is preferred that first ring portion of the fluid accelerator of the present invention has a ring seat portion and a pressure ring portion, the ring seat
System of portion is fixed on base and has one first converging transition, and the system of pressure ring portion is removably fixedly arranged on the ring seat portion, and with one the
Two converging transitions, second converging transition and have multiple grooves；When the pressure ring portion is fixedly arranged on the ring seat portion, second converging transition is with being somebody's turn to do
First converging transition contacts, and the plurality of groove of second converging transition and first converging transition is formed the plurality of jet channel and is somebody's turn to do
Multiple fumaroles.According to this configuration, the plurality of fumarole of the invention can reach the effect of uniform jet.
Coordinate appended schema elaborate by specific embodiment below, when being easier to understand the purpose of the present invention, skill
Art content, feature and its it is reached the effect of.
【Brief description of the drawings】
Figure 1A, 1B are respectively a schematic diagram, show the stereogram and section view of the fluid accelerator of one embodiment of the invention
Figure.
Fig. 2 is a schematic diagram, shows the one of the second power set of the present invention partial cross-sectional perspective views for implementing example.
Fig. 3 A, 3B are respectively a schematic diagram, show that the decomposition of an implementation example of the component of the first ring portion of the present invention is stood
Body figure.
Fig. 3 C are a schematic diagram, show that the local assembling section view of an implementation example of the component of the first ring portion of the present invention is stood
Body figure.
Fig. 4 A, 4B are respectively a schematic diagram, show that various sizes of substrate covers the fluid accelerator for the present invention
Sectional view.
Fig. 5 is a schematic diagram, shows the substrate processing machine of a prior art.
Fig. 6 is a schematic diagram, shows the substrate processing machine with the rotating ring rotated together with substrate of a prior art.
Fig. 7 is a schematic diagram, and one prior art of display has apopore and the substrate of the cleaning ring portion of ring-type fumarole
Processing machine.
【Symbol description】
1 fluid accelerator
10 bases
12 first ring portions
14 second ring portions
16 substrate rotating shafts
18 substrates
20 water spray passages
22 jet channels
24 apopores
26 fumaroles
40 suction channels
50 first power set
52 first motors
54 rotary shafts
56 rotating shaft passages
60 second power set
62 second motors
64 second transmission mechanism groups
66 driving gears
68 driven gears
70 blades
80 ring seat portions
82 first converging transitions
84 first necks
90 pressure ring portions
92 second converging transitions
94 second necks
96 grooves
100 gas chamber
L12 the first ring portion length
L14 the second ring portion length
L18a first substrate length
L18b second substrate length
L24a the first water outlet hole lengths
L24b the second water outlet hole lengths
L26 jet hole lengths
1001A, 1001B, 1001C substrate processing machine
1010A, 1010B base
1012C cleans ring portion
1014A, 1014B rotating ring
1016A, 1016B substrate rotating shaft
1018A, 1018B substrate
1024C apopores
The ring-like jet seams of 1026C
1050A, 1050B power set
1500A, 1500B collect ring
2000A process fluids
【Embodiment】
Figure 1A, 1B are refer to, it shows the stereogram of the fluid accelerator 1 according to one embodiment of the invention with dividing respectively
Xie Tu.Fluid accelerator 1 includes a base 10, one first ring portion 12 and one second ring portion 14.First ring portion 12 is fixedly arranged on bottom
Seat 10, and be arranged at at least one water spray passage 20 with multiple jet channels 22 in the first ring portion 12, water spray passage 20 has
One apopore 24 is arranged in the first ring portion 12, and there are multiple jet channels 22 corresponding multiple fumaroles 26 to be arranged at the first ring
In portion 12, the relatively multiple fumaroles 26 of the system of apopore 24 are arranged at the outside of the first ring portion 12.Wherein, by multiple fumaroles 26
The relative apopore 24 of system is arranged at the inner side of the first ring portion 12, and the gas sprayed by multiple fumaroles 26 can generally form multiple
Air-flow barrier forms a common air-flow account wall, to ensure outer side spray of the liquid system of the outflow of apopore 24 to the first ring portion 12
Cloth.It is preferred that the first ring portion 12 has the water spray passage 20 of more than two, each passage 20 of spraying water has an apopore 24, water outlet
The system of hole 24 is symmetrically disposed in the first ring portion 12；For example, in one implements example, the first ring portion 12 has two water outlets
Hole 24 is set for symmetrically 180 degree each other.It is preferred that the aperture system of apopore 24 is 0.25 English inch, to solve prior art
Apopore 1024C (such as Fig. 7) aperture it is too small the problem of.The system of second ring portion 14 is rotatably connected with base 10, and surrounds
First ring portion 12.It should be noted that multiple jet channels 22 can partly be interconnected each other, there is a common jet to be formed
The part of passage；Multiple water spray passages 20 can partly or wholly be interconnected each other, have a common water spray logical to be formed
The part in road.
It is preferred that fluid accelerator 1 further includes a substrate rotating shaft 16, it is rotatably to be connected with base 10,
And it can be rotated relative to the second ring portion 14.It is preferred that there is a suction channel 40 to be disposed therein for substrate rotating shaft 16.It is preferred that stream
Body accelerator 1 further includes one first power set 50, so as to rotational substrate rotating shaft 16；It is preferred that the first power set
50 systems are one first motor 52, and the first motor 52 has a motor shaft 54, and the system of substrate rotating shaft 16 and rotary shaft 54 are affixed；
Or the system of the first power set 50 includes one first motor 52, first transmission mechanism group (not shown) corresponding with one, through this
First transmission mechanism group is connected between the first motor 52 and substrate rotating shaft 16, and the power of the first motor 52 is sent into substrate rotating shaft
16.It is preferred that fluid accelerator 1 further includes a substrate 18, it is to be fixed on substrate rotating shaft 16.Implement model one
In example, substrate rotating shaft 16 and motor shaft 54 are affixed, and one end of suction channel 40 is provided with a suction device (not shown), the suction
Device system is extracting the gas in suction channel 40；Thereby, the system of substrate 18 is inhaled through the suction from suction channel 40
It is fixed on substrate rotating shaft 16.In another implementation example, to be hollow to define a rotating shaft passage 56, substrate turns the system of rotary shaft 54
The system of axle 16 and rotary shaft 54 are affixed, and the system of suction channel 40 connects with rotating shaft passage 56, and are provided with one end of rotary shaft 54
One suction device (not shown)；Thereby, and the system of substrate 18 inhaled through the suction for coming self-suction channel 40 and rotating shaft channel 56 it is solid
On substrate rotating shaft 16.It should be noted that when substrate rotating shaft 16 and rotary shaft 54 are affixed, substrate rotating shaft 16 and rotary shaft 54
Visually it is integrated；That is, substrate rotating shaft 16 is rotary shaft 54, and suction channel 40 includes rotating shaft passage 56.In addition, substrate
18 mode for being fixed on substrate rotating shaft 16 is not limited in a manner of above-mentioned suction is solid；Such as substrate 18 can pass through other fixed machines
Structure (not shown) and be fixedly arranged on substrate rotating shaft 16.
It is preferred that fluid accelerator 1 further includes one second power set 60, so as to rotating the second ring portion 14.Compared with
Goodly, the rotating speed of the second ring portion 14 is more than 300RPM.In one implements example, the system of the second power set 60 includes one second motor
62 second transmission mechanism groups 64 corresponding with one, the system of the second motor 62 and base 10 are affixed, the connection of the system of the second transmission mechanism group 64
Between second motor 62 and the second ring portion 14, the power of the second motor 62 is sent to the second ring portion 14；It is preferred that second passes
Motivation structure group 64 includes a driving gear 66 and a driven gear 68, and the system of driving gear 66 is connected with the second motor 62, passive tooth
Take turns 68 systems to engage with driving gear 66, and the system of driven gear 68 is a part for the second ring portion 14；It is preferred that the second ring portion 14
The system of driven gear 68 is a kind of kenel of internal gear；It is preferred that at least an idle gear (not shown) rotatably connects with base 10
Connect, and be connected between driving gear 66 and driven gear 68.
In one implements example, substrate 18 has a base with the system of substrate rotating shaft 16 through the driving of the first power set 50
Plate rotating speed, the system of the second ring portion 14 has one second ring portion rotating speed through the driving of the second power set 60, and second ring
Rotating speed system of portion is higher than the substrate rotating speed；Thereby, when the unnecessary process fluid for putting on substrate 18 fails through the substrate rotating speed and
When getting rid of from substrate 18 is accelerated to a collection device (not shown), such unnecessary processing stream system is dropped down onto on the second ring portion 14,
And through the influence of the second ring portion rotating speed more than the substrate rotating speed, such unnecessary processing stream system is again by the quilt of the second ring portion 14
Acceleration is got rid of to the collection device, so as to avoiding unnecessary process fluid from flowing into internal body and situation about can not collect.
Fig. 2 is refer to, it shows an another implementation example of the second power set (not shown), the second power set system
For a gas compressing apparatus (not shown), the second ring portion 14 has multiple blades 70, by gas caused by the gas compressing apparatus
Stream blows to multiple blades 70 of the second ring portion 14, drives multiple blades 70 and rotates the second ring portion 14.
Fig. 3 A, 3B, 3C are refer to, it shows the stereogram of the component of the first ring portion 12 and the sectional view combined, to say
The construction of bright fumarole 26.First ring portion 12 further has a ring seat portion 80 and a pressure ring portion 90；System of ring seat portion 80 is fixed on
Base 10 simultaneously has one first converging transition 82 and a first neck 84, and the first converging transition 82 is connected with first neck 84；Pressure ring portion
90 systems are removably fixedly arranged on ring seat portion 80, and have one second converging transition 92 and a second neck 94, the second converging transition 92 with
Second neck 94 connects, and has multiple grooves 96；When pressure ring portion 90 is fixedly arranged on ring seat portion 80, the second converging transition 92 and first is gradually
Contracting section 82 contacts, and the converging transition 82 of multiple grooves 96 and first of the second converging transition 92 is formed multiple jet channels 22 and multiple sprays
Stomata 26, and a gas chamber 100 is defined between first neck 84 and second neck 94.It is preferred that the section length of gas chamber 100
Cross-sectional length of the degree system more than fumarole 26 so that spray gas from gas chamber 100 via fumarole 26 to during external eruption, tool
There is the air-flow uniformly and being reinforced.It should be noted that gas chamber 100 also belongs to a part for jet channel 22；That is, jet
The system of passage 22 is included by multiple grooves 96 of the second converging transition 92, the first converging transition 82, first neck 84 and the institute of second neck 94
The part defined.
Fig. 4 A are refer to, it shows that the size of each component for the fluid accelerator 1 for implementing example according to the present invention one is closed
System.Substrate 18 has a first substrate length L18a and second substrate a length L18b, first substrate length L18a and the second base
Plate length L18b systems are respectively any point of the outer boundaries of substrate 18 into the vertical range of the center line of substrate rotating shaft 16
Maxima and minima；There is first ring portion 12 one first ring portion length L12, one first water outlet hole length L24a, one second to go out
Water hole length L24b, a jet hole length L26, the first ring portion length L12 systems for the first ring portion 12 outer boundaries a little extremely
The maximum normal distance of the center line of substrate rotating shaft 16, the first water outlet hole length L24a and the second water outlet hole length L24b systems are distinguished
For the maxima and minima in any point to the vertical range of the center line of substrate rotating shaft 16 on the border of the first apopore 24,
Jet hole length L26 systems for fumarole 26 border to substrate rotating shaft 16 center line maximum normal distance；Second ring portion 14
With one second ring portion length L14, the second ring portion length L14 systems are the outer boundaries of the second ring portion 14 a little to substrate rotating shaft
The minimum perpendicular distance of 16 center line；Wherein, the second ring portion length L14 systems are more than first substrate length L18a, first substrate
Length L18a systems are more than or equal to second substrate length L18b, and second substrate length L18b systems are more than or equal to the first ring portion length
L12, the first ring portion length L12 systems are more than or equal to the first water outlet hole length L24a, and the first water outlet hole length L24a systems are more than the
Two water outlet hole length L24b, the second water outlet hole length L24b systems are more than jet hole length L26.Fig. 4 B are refer to, it shows foundation
The size relationship of each component of another fluid accelerator 1 for implementing example of the present invention.Wherein, first substrate length L18a is more than
Or it is more than or equal to the second ring portion length L14, second substrate length equal to second substrate length L18b, first substrate length L18a
L18b is more than the first ring portion length L12, the first ring portion length L12 systems more than the first ring portion length L12, the second ring portion length L14
More than or equal to the first water outlet hole length L24a, the first water outlet hole length L24a systems are more than the second water outlet hole length L24b, and second
Water outlet hole length L24b systems are more than jet hole length L26.Preferably, first substrate length L18a is equal to second substrate length
L18b.It should be noted that when first substrate length L18a is not equal to second substrate length L18b, the system of substrate 18 is one non-circular
Substrate；Or substrate 18 is a circular substrate, but its center of circle is not that position is online at the center of substrate rotating shaft 16.
The configuration of the fluid accelerator 1 of the present invention more than, the system of substrate 18 rotates relative to the first ring portion 12, therefore base
The gas that the liquid or fumarole 26 that the back of plate 18 can be sprayed by the apopore 24 in the first ring portion 12 spray cleans, and avoids
18 positive process fluid of substrate pollution substrate 18 back side is put on, and spraying to collection device (does not show outwardly by process fluid
Show) or the second ring portion 14 on；Wherein, the setting of fumarole 26 can ensure that liquid system that apopore 24 flows out to the first ring portion 12
Lateral direction spraying.Wherein, there is the ring portion 14 of substrate 18 and second of independent power device out of the ordinary, the first power set 50 can be made
Only need to drive substrate 18 to rotate, reduce the palpus of the power set in prior art rotational substrate 1018B and rotate the negative of ring 1014B
Lotus (such as Fig. 6)；And the second ring portion 14 with the second power set 60, the second ring portion 14 can be made to be rotated independently of substrate 18,
And by the rotation of the second ring portion 14 so that dropped to or got rid of by substrate 18 to the process fluid of the second ring portion 14 and by the first ring
The liquid of the spraying of portion 12, it can be got rid of to collection device.Wherein, by Fig. 4 A, 4B implementation example out of the ordinary, it is to be appreciated that working as substrate
When 18 length is less than the length of the second ring portion 14, the process fluid that the second ring portion 14 is dropped to by substrate 18 will be by the second ring portion
14 turn and get rid of to collection device；When the length of substrate 18 is more than or equal to the length of the second ring portion 14, on substrate 18
Process fluid will be dropped to almost in collection device totally.Therefore, complex chart 4A, 4B implementation example, it can be explained the present invention's
Liquid accelerator 1 is applicable to the processing of different size substrates 18, solve the board of the fluid collection device of prior art without
Method is applicable the processing of different size substrates 18 simultaneously.In an actual measurement, 12 inch and 8 inch substrates 18 are applied to the present invention's respectively
With base 10, the first ring portion 12, the second ring portion 14, substrate rotating shaft 16, the first power set 50 and the second power set 60
In liquid accelerator 1, the collection rate of its process fluid is all 99.99%；Wherein, when substrate 18 is 8 inch substrate, substrate 18
Length (L18a, L18b) system be less than the second ring portion length L14.
Embodiment described above is only technological thought and feature to illustrate the invention, and its purpose makes to be familiar with this skill
The personage of skill can understand present disclosure and implement according to this, when can not with restriction the present invention the scope of the claims, i.e., generally
The equivalent change made according to disclosed spirit or modification, should cover in the scope of the claims of the present invention.
Claims (9)
- A kind of 1. fluid accelerator, it is characterised in that including：One base；One substrate rotating shaft, it is rotatably connected with the base；One first ring portion, the base is fixedly arranged on, and surrounds the substrate rotating shaft, and set with an at least apopore with multiple fumaroles It is placed in first ring portion, the relatively the plurality of fumarole of the apopore is arranged at the outside of first ring portion；One second ring portion, is rotatably connected with the base, and surrounds first ring portion, and can be with respect to the substrate axis of rotation； AndOne substrate, it is to be fixed on the substrate rotating shaft, and the size of the substrate is more than the size of first ring portion, and the substrate Periphery be overlapped on second ring portion；By above-mentioned construction, second ring portion is used to get rid of the process fluid for directly dropping to second ring portion by the substrate to one Collection device.
- 2. fluid accelerator as claimed in claim 1, it is characterised in that first ring portion is led to the water spray of more than two Road, respectively the water spray passage there is an apopore, the apopore is symmetrically disposed in first ring portion.
- 3. fluid accelerator as claimed in claim 1, it is characterised in that there is a suction channel to be arranged at for the substrate rotating shaft Wherein.
- 4. fluid accelerator as claimed in claim 1, it is characterised in that further comprising one first power set, so as to Rotate the substrate rotating shaft.
- 5. fluid accelerator as claimed in claim 1, it is characterised in that when the size of the substrate is less than second ring portion When, the process fluid that second ring portion is dropped to by the substrate will be got rid of to a collection device by second ring portion.
- 6. fluid accelerator as claimed in claim 1, it is characterised in that the substrate has a first substrate length and one the Two zigs, the first substrate length and the second substrate length are respectively any point of the outer boundaries of the substrate to the base Maxima and minima in the vertical range of the center line of plate rotating shaft；First ring portion has one first ring portion length, one the One water outlet hole length, one second water outlet hole length, a jet hole length, the first ring portion length are the outer side edges of first ring portion Boundary a little to the substrate rotating shaft center line maximum normal distance, the first water outlet hole length and the second water outlet hole length Maxima and minima respectively in any point on the border of apopore to the vertical range of the center line of the substrate rotating shaft, should Jet hole length for the fumarole border to the substrate rotating shaft center line maximum normal distance；Second ring portion has one Second ring portion length, the second ring portion length are the outer boundaries of second ring portion a little to the center line of the substrate rotating shaft Minimum perpendicular distance；The first substrate length is more than or equal to the second substrate length, and the first ring portion length is more than or equal to The first water outlet hole length, the first water outlet hole length are more than the second water outlet hole length, and the second water outlet hole length is more than should Jet hole length；Wherein, when the size of the substrate is less than second ring portion, the second ring portion length is grown more than the first substrate Degree, the second substrate length are more than or equal to the first ring portion length.
- 7. the fluid accelerator as described in any one of claim 1 to 6, it is characterised in that further comprising one second Power set, so as to rotating second ring portion.
- 8. fluid accelerator as claimed in claim 7, it is characterised in that second ring portion is by second power set Driving, there is at least 300RPM rotating speed.
- 9. the fluid accelerator as described in any one of claim 1 to 6, it is characterised in that first ring portion has one Ring seat portion and a pressure ring portion, the system of ring seat portion are fixed on base and have one first converging transition, and the system of pressure ring portion is removably solid Located at the ring seat portion, and there is one second converging transition, second converging transition and there are multiple grooves；When the pressure ring portion is fixedly arranged on this Ring seat portion, second converging transition contact with first converging transition, make the plurality of groove of second converging transition first tapered with this Section forms multiple jet channels and the plurality of fumarole.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW103106517A TWI556878B (en) | 2014-02-26 | 2014-02-26 | Fluid accelerating device |
| TW103106517 | 2014-02-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104863905A CN104863905A (en) | 2015-08-26 |
| CN104863905B true CN104863905B (en) | 2018-03-16 |
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| TWI645913B (en) * | 2016-11-10 | 2019-01-01 | 辛耘企業股份有限公司 | Liquid processing device |
| JP2022039487A (en) | 2020-08-28 | 2022-03-10 | 株式会社荏原製作所 | Workpiece support device and workpiece support method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101276739A (en) * | 2007-03-29 | 2008-10-01 | 东京毅力科创株式会社 | Substrate processing system and substrate cleaning apparatus |
| CN101589453A (en) * | 2006-12-15 | 2009-11-25 | Sez股份公司 | The apparatus and method that are used for wet treating plate-like-articles |
| CN102656680A (en) * | 2009-12-18 | 2012-09-05 | 朗姆研究公司 | Reinforced pin for being used in a pin chuck, and a pin chuck using such reinforced pin |
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| JP2007115728A (en) * | 2005-10-18 | 2007-05-10 | Sumco Corp | Single wafer etching device and single wafer etching method |
| JP2009081250A (en) * | 2007-09-26 | 2009-04-16 | Toppan Printing Co Ltd | Chuck for spin coater, and spin coat method using the same |
| US8945341B2 (en) * | 2011-08-22 | 2015-02-03 | Lam Research Ag | Method and device for wet treatment of plate-like articles |
| US9136155B2 (en) * | 2011-11-17 | 2015-09-15 | Lam Research Ag | Method and device for processing wafer shaped articles |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101589453A (en) * | 2006-12-15 | 2009-11-25 | Sez股份公司 | The apparatus and method that are used for wet treating plate-like-articles |
| CN101276739A (en) * | 2007-03-29 | 2008-10-01 | 东京毅力科创株式会社 | Substrate processing system and substrate cleaning apparatus |
| CN102656680A (en) * | 2009-12-18 | 2012-09-05 | 朗姆研究公司 | Reinforced pin for being used in a pin chuck, and a pin chuck using such reinforced pin |
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| Publication number | Publication date |
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| TW201532683A (en) | 2015-09-01 |
| TWI556878B (en) | 2016-11-11 |
| CN104863905A (en) | 2015-08-26 |
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