CN104831247A - Horizontal continuous magnetron sputtering film plating machine online panel constant-temperature heating apparatus - Google Patents
Horizontal continuous magnetron sputtering film plating machine online panel constant-temperature heating apparatus Download PDFInfo
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- CN104831247A CN104831247A CN201510176977.3A CN201510176977A CN104831247A CN 104831247 A CN104831247 A CN 104831247A CN 201510176977 A CN201510176977 A CN 201510176977A CN 104831247 A CN104831247 A CN 104831247A
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Abstract
The present invention discloses a horizontal continuous magnetron sputtering film plating machine online panel constant-temperature heating apparatus, wherein a conveying base plate is horizontally provided with a copper conducting plate, the copper conducting plate is provided with an embedded thermocouple temperature measuring rod and a PTC constant-temperature low-voltage heating element, the embedded thermocouple temperature measuring rod and the PTC constant-temperature low-voltage heating element are respectively and correspondingly connected to the copper disk electrodes on the conveying base plate, the bottom portion of a vacuum chamber is provided with rotary electric conduction wheel electrodes, the rotary electric conduction wheel electrodes comprise a group of power supply electrodes and a group of temperature measuring electrodes, and when the copper disk electrodes and the rotary electric conduction wheel electrodes correspondingly contact and are electrically connected, real-time temperature detection and heating control are performed. With the apparatus of the present invention, the problem of the difficult heating on the panel to be plated in the vacuum chamber of the continuous magnetron sputtering film plating is overcome, the film plating qualities of the transparent electric conduction film, the antireflection film and the high reflection film of the plated display panel are increased, and the apparatus is suitable for increasing of the film plating quality of the transparent electric conduction film, the antireflection film and the high reflection film of the display panel.
Description
Technical field
The present invention relates to the online panel constant temperature heating device of a kind of horizontal continuous magnetron sputtering coater, be specifically related to a kind of when horizontal vacuum splashing and plating plated film, panel to be plated is when entering each chamber of vacuum chamber, panel to be plated heating can be given, ensure panel constant temperature, and detected temperatures also controls the device of heating in real time, belongs to field of mechanical technique.
Background technology
Anti-reflection conductive film is a kind of metallic compound with good clear conductivity, have that forbidden band is wide, visible range optical transmittance is high and the characteristic such as resistivity is low, being widely used in flat-panel display device, solar cell, specific function window coating and other field of photoelectric devices, is the unique transparency conductive electrode material of the various types of flat panel display devices such as current LCD, PDP, OLED, touch-screen.As the key foundation material of flat-panel display device, its continuous renewal along with flat-panel display device and upgrading and there is the more wide market space.
In recent years, generally confirm in industry: along with the rising of base reservoir temperature, surface resistivity reduces rapidly, and visible light transmissivity and infrared reflectance are all significantly improved, and high base reservoir temperature improves the crystallization of film, decreases crystal boundary, makes mobility and the Sn of film
4+carrier density increases, thus reduces surface resistivity, and the raising of carrier density simultaneously decreases the generation of black InO, improves visible light transmissivity.
Therefore, in anti-reflection conductive film industry, counter plate plated film has had higher quality requirements.Except affecting except quality factor original, in vacuum chamber, before counter plate plating, heating is the key of dealing with problems.In order to better meet this technique, vertical magnetic control coating equipment adopts glass heats to adopt infrared heating, and simplicity of design, meets the needs of technique, but self there are some problems, and cause its coating anti reflection conducting film quality low, production capacity is few.Many companies adopt horizontal continous way magnetic control film coating machine better can overcome the problems referred to above, but before anti-reflection conductive film on panel homogeneous heating just there is bottleneck.
Summary of the invention
Object: in order to overcome the deficiencies in the prior art, the invention provides the online panel constant temperature heating device of a kind of horizontal continuous magnetron sputtering coater, carry out homogeneous heating under vacuum conditions plated material substrate, the sheet resistance of conducting film can be reduced and improve visible light transmissivity.
Technical scheme: for solving the problems of the technologies described above, the technical solution used in the present invention is:
The online panel constant temperature heating device of a kind of horizontal continuous magnetron sputtering coater, is characterized in that: comprise vacuum chamber, workplatform, transmission guide rail, transmission base plate, copper conductive plate and copper disc electrode; Workplatform is arranged on vacuum chamber inside, workplatform is arranged with a pair transmission guide rail in parallel, and transmission guide rail is slidably connected the transmission base plate be horizontally disposed with for transmitting panel to be plated; Transmission base plate is horizontally disposed with copper conductive plate, copper conductive plate is equipped with embedded thermocouple temperature measurement rod and PTC thermostatic low-voltage heating unit, and the power supply lead wire of PTC thermostatic low-voltage heating unit is connected with thermocouple temperature measurement rod lead-in wire is corresponding with the copper disc electrode on transmission base plate respectively;
Chamber bottom is provided with rotary conductive wheel electrode, and rotary conductive wheel electrode comprises two groups: wherein one group is power electrode, and another group is thermometric electrode;
When transmission base plate arrives a vacuum chamber job, copper disc electrode and the rotary conductive of transmission base plate take turnss electrode pair and should be contacted and be electrically connected, thus the control carried out panel real time temperature to be plated detection and heat.
The online panel constant temperature heating device of described horizontal continuous magnetron sputtering coater, it is characterized in that: the KF40 mouth place that vacuum chamber sidewall is reserved is provided with KF40 flange series vacuum electrode, KF40 flange series vacuum electrode is taken turns electrode by wire and rotary conductive and is connected.
The online panel constant temperature heating device of described horizontal continuous magnetron sputtering coater, is characterized in that: the junction surface of described copper conductive plate and panel to be plated offers air discharge duct and venting hole.
Preferably, the online panel constant temperature heating device of described horizontal continuous magnetron sputtering coater, it is characterized in that: described copper conductive plate and transmission base plate junction adopt multiple stainless steel square to support, make to leave gap between copper conductive plate and transmission base plate, ensure that transmission base plate enters into the vacuum state gas that can not overflow from atmospheric condition and affects plated film vacuum.
Preferably, the online panel constant temperature heating device of described horizontal continuous magnetron sputtering coater, it is characterized in that: described online panel constant temperature heating device also comprises insulator foot, rotary conductive wheel electrode is fixedly mounted on chamber bottom by insulator foot.
Preferably, the online panel constant temperature heating device of described horizontal continuous magnetron sputtering coater, it is characterized in that: described online panel constant temperature heating device also comprises the not imperial isolated flange pad of iron, copper disc electrode carries out insulation by the not imperial isolated flange pad of iron and is fixedly mounted on transmission base plate.
Beneficial effect: the online panel constant temperature heating device of horizontal continuous magnetron sputtering coater provided by the invention, one group of power electrode and one group of thermometric electrode is loaded onto in each work chamber of horizontal continuity coating equipment, when transmission base plate often arrives a work chamber, contact with power electrode and start to heat plated base material, the electrode of detected temperatures also touches corresponding thermometric electrode simultaneously, transmission temperature signal gives outside temperature control system, temperature control system carries out PID computer heating control to heating unit in real time according to temperature conditions, by heat conducting mode, in cavity, heat transfer plate passes to panel to be plated heat.Instant invention overcomes continuous magnetron sputtering plated film in vacuum chamber, treat the difficult problem of surfacing plate heating, improve the nesa coating of plated display panel, anti-reflective film, the plated film quality of highly reflecting films.Be suitable for improving display panel nesa coating, anti-reflective film, the plated film quality of highly reflecting films.At horizontal continous vacuum magnetic control film coating in the industry, adopt this heating unit, the cost of transformation is minimum, and physical construction is simple, convenient installation.Have the following advantages: (1) at horizontal continous vacuum magnetic control film coating in the industry, adopts this heating unit, and the cost of transformation is minimum, physical construction is simple, convenient installation.(2) good heat conductivity of copper, heater conductive heat, to fast response time on plated glass baseplate, copper conductive plate 5 with panel junction surface has venting hole, and copper conductive plate 5 and six the stainless steel squares in transmission base plate 4 junction support, and leave gap; Can ensure that transmission base plate does not exist excessive gas phenomenon in atmospheric condition to vacuum state like this, plated film vacuum can not be affected.(3) transmission base plate 4 is in plated film transmission, and four electrodes and the cavity base rotary conductive of transmission base plate 4 take turns electrode reliable contacts, and what plated base material heating and real time temperature were detected becomes a reality, and can not produce friction dust at cavity.(4) this heating unit adopts the mode of high current low voltage to heat, and Heating temperature is interval at 30-230 degree, can need to carry out temperature setting according to plated base material.Adopt the mode of high current low voltage, voltage is below safety voltage, safe and reliable in operational process.
Accompanying drawing explanation
Fig. 1 and Fig. 2 is structural representation of the present invention;
Fig. 3 be in Fig. 1 B-B to sectional view;
In figure: vacuum chamber 1, workplatform 2, transmission guide rail 3, transmission base plate 4, copper conductive plate 5, copper disc electrode 6, rotary conductive wheel electrode 7, insulator foot 8, KF40 flange series vacuum electrode 9, wire 10, the not imperial isolated flange pad 11 of iron.
Embodiment
Below in conjunction with accompanying drawing, the present invention is further described.
As shown in Figure 1, for the online panel constant temperature heating device of a kind of horizontal continuous magnetron sputtering coater, comprise vacuum chamber 1, workplatform 2, transmission guide rail 3, transmission base plate 4, copper conductive plate 5 and copper disc electrode 6, it is inner that workplatform 2 is arranged on vacuum chamber 1, described workplatform is arranged with a pair transmission guide rail 3 in parallel, described transmission guide rail 3 is slidably connected the transmission base plate 4 be horizontally disposed with for transmitting panel to be plated; Transmission base plate 4 is horizontally disposed with copper conductive plate 5, copper conductive plate 5 is equipped with embedded thermocouple temperature measurement rod and PTC thermostatic low-voltage heating unit, and the power supply lead wire of PTC thermostatic low-voltage heating unit and thermocouple temperature measurement rod go between respectively, and copper disc electrode 6 is corresponding is connected with four on transmission base plate 4; Transmission base plate 4 is provided with four copper disc electrodes, 6, four copper disc electrodes 6 corresponding low-pressure heating two poles and thermocouple temperature measurement the two poles of the earth respectively.
Be provided with four rotary conductive wheel electrodes 7 bottom vacuum chamber 1, rotary conductive wheel electrode 7 is fixedly mounted on bottom vacuum chamber 1 by insulator foot 8, and rotary conductive wheel electrode 7 comprises two groups: wherein one group is power electrode, and another group is thermometric electrode.
When transmission base plate 4 arrive a vacuum chamber 1 carry out plated film work time, four copper disc electrodes 6 and four rotary conductives of transmission base plate 4 take turnss corresponding contact of electrode 7 and are electrically connected, thus carry out panel real time temperature to be plated detection and heat control.What panel to be plated heating and real time temperature were detected becomes a reality, and can not produce friction dust in cavity.
The reserved KF40 mouth place of vacuum chamber sidewall is provided with KF40 flange series vacuum electrode 9, KF40 flange series vacuum electrode 9 and takes turns electrode 7 by wire 10 with rotary conductive and be connected; Outside carries out PID control by temperature controller to Heating temperature, inner at horizontal continuous magnetic control film coating machine vacuum cavity, according to the change of operation dislocation of transmission base plate 4 in vacuum chamber and the high-low signal of detected temperatures, carry out surveying in real time online to it, locate thermostatically heating in real time.
Preferably, the online panel constant temperature heating device of described horizontal continuous magnetron sputtering coater, is characterized in that: described copper conductive plate 5 and the junction surface of panel to be plated offer air discharge duct and venting hole.Copper conductive plate 5 and transmission base plate 4 junction adopt multiple stainless steel square to support, make to leave gap between copper conductive plate 5 and transmission base plate 4, can ensure that transmission base plate enters into vacuum state from atmospheric condition and there is not excessive gas phenomenon like this, plated film vacuum can not be affected.
Preferably, the online panel constant temperature heating device of described horizontal continuous magnetron sputtering coater, it is characterized in that: described online panel constant temperature heating device also comprises the not imperial isolated flange pad 11 of iron, copper disc electrode 6 carries out insulation by the not imperial isolated flange pad 11 of iron and is fixedly mounted on transmission base plate 4.The present invention, according to the feature of the continuous magnetic control film coating machine of horizontal, changes the transmission base plate 4 of vacuum chamber indoor transmissions panel to be plated, does four larger areas of copper disc electrodes at this transmission base plate 4, does insulation processing with the transmission base plate 4 not imperial isolated flange pad of iron; Corresponding low-voltage power supply the two poles of the earth and temperature-sensitive detect the two poles of the earth to four copper disc electrodes 6 respectively.
Working process of the present invention is as follows: when coating equipment starts to produce, transmission base plate 4 is sent to loading bay by coating equipment, panel to be plated is placed on the copper conductive plate 5 on transmission base plate 4, board transmitting device conveying transmission base plate 4 and panel to be plated together enter vacuum chamber 1, after arriving specified location, the rotary conductive wheel electrode 7 of chamber bottom is connected with the copper disc electrode 6 of transmission base plate 4, at this moment heating power supply and temperature measurement signal are connected, according to thermometric temperature, control (positive temperature coefficient thermistor) PTC thermostatic low-voltage heating unit and carry out computer heating control, the copper conductive plate 5 of homogeneous heating is treated plating panel surface by heat exchange pattern and is heat-treated, after temperature reaches technological temperature, board transmitting device conveying transmission base plate 4, to next vacuum chamber, carries out computer heating control in the same way, until after flat board completes coating process, send product in vacuum chamber.
Apparatus of the present invention and board perfect cooperation, temperature monitoring can be carried out by real-time panel substrates to be plated, and ensure that panel to be plated keeps constant temperature when each chamber internal conversion of vacuum chamber, arrive sputtering magnetic control film coating district, panel to be plated reaches reasonable process temperature, and plated film quality is improved greatly.This heating unit adopts the mode of high current low voltage to heat, and Heating temperature is interval at 30-230 degree, can need to carry out temperature setting according to plated base material.Adopt the mode of high current low voltage, voltage is below safety voltage, safe and reliable in operational process.In force, by verifying at panel display board coating anti reflection conducting film, result excellent is more than 97% in the transmissivity of visible ray, and index of refraction index is 1.0-1.25, and surface resistance is 300 ohm.
The above is only the preferred embodiment of the present invention; be noted that for those skilled in the art; under the premise without departing from the principles of the invention, can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (6)
1. the online panel constant temperature heating device of horizontal continuous magnetron sputtering coater, is characterized in that: comprise vacuum chamber, workplatform, transmission guide rail, transmission base plate, copper conductive plate and copper disc electrode; Workplatform is arranged on vacuum chamber inside, workplatform is arranged with a pair transmission guide rail in parallel, and transmission guide rail is slidably connected the transmission base plate be horizontally disposed with for transmitting panel to be plated; Transmission base plate is horizontally disposed with copper conductive plate, copper conductive plate is equipped with embedded thermocouple temperature measurement rod and PTC thermostatic low-voltage heating unit, and the power supply lead wire of PTC thermostatic low-voltage heating unit is connected with thermocouple temperature measurement rod lead-in wire is corresponding with the copper disc electrode on transmission base plate respectively;
Chamber bottom is provided with rotary conductive wheel electrode, and rotary conductive wheel electrode comprises two groups: wherein one group is power electrode, and another group is thermometric electrode;
When transmission base plate arrives a vacuum chamber job, copper disc electrode and the rotary conductive of transmission base plate take turnss electrode pair and should be contacted and be electrically connected, thus the control carried out panel real time temperature to be plated detection and heat.
2. the online panel constant temperature heating device of horizontal continuous magnetron sputtering coater according to claim 1, it is characterized in that: the KF40 mouth place that vacuum chamber sidewall is reserved is provided with KF40 flange series vacuum electrode, KF40 flange series vacuum electrode is taken turns electrode by wire and rotary conductive and is connected.
3. the online panel constant temperature heating device of horizontal continuous magnetron sputtering coater according to claim 1, is characterized in that: the junction surface of described copper conductive plate and panel to be plated offers air discharge duct and venting hole.
4. the online panel constant temperature heating device of horizontal continuous magnetron sputtering coater according to claim 1, it is characterized in that: described copper conductive plate and transmission base plate junction adopt multiple stainless steel square to support, make to leave gap between copper conductive plate and transmission base plate, ensure that transmission base plate enters into the vacuum state gas that can not overflow from atmospheric condition and affects plated film vacuum.
5. the online panel constant temperature heating device of horizontal continuous magnetron sputtering coater according to claim 1, it is characterized in that: described online panel constant temperature heating device also comprises insulator foot, rotary conductive wheel electrode is fixedly mounted on chamber bottom by insulator foot.
6. the online panel constant temperature heating device of horizontal continuous magnetron sputtering coater according to claim 1, it is characterized in that: described online panel constant temperature heating device also comprises the not imperial isolated flange pad of iron, copper disc electrode carries out insulation by the not imperial isolated flange pad of iron and is fixedly mounted on transmission base plate.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510176977.3A CN104831247B (en) | 2015-04-15 | 2015-04-15 | The online panel constant temperature heating device of horizontal continuous magnetron sputtering coater |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510176977.3A CN104831247B (en) | 2015-04-15 | 2015-04-15 | The online panel constant temperature heating device of horizontal continuous magnetron sputtering coater |
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| CN104831247A true CN104831247A (en) | 2015-08-12 |
| CN104831247B CN104831247B (en) | 2017-06-06 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017165987A1 (en) * | 2016-03-29 | 2017-10-05 | 苏政纬 | Mobile evaporation apparatus |
| CN109355635A (en) * | 2018-12-15 | 2019-02-19 | 湖南玉丰真空科学技术有限公司 | Substrate frame bias introducing device in a kind of continuous coating production line |
Citations (5)
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| US3616402A (en) * | 1968-05-31 | 1971-10-26 | Western Electric Co | Sputtering method and apparatus |
| JPH06179970A (en) * | 1992-12-15 | 1994-06-28 | Matsushita Electric Ind Co Ltd | Heating unit |
| WO2006064161A1 (en) * | 2004-12-13 | 2006-06-22 | Saint-Gobain Glass France | Method and installation for treating a glass substrate incorporating a magnetron line and a device generating an atmospheric pressure plasma |
| CN104060236A (en) * | 2014-05-14 | 2014-09-24 | 中国科学院广州能源研究所 | Continuous coating production system of sheet substrates |
| CN204570026U (en) * | 2015-04-15 | 2015-08-19 | 赫得纳米科技(昆山)有限公司 | The online panel constant temperature heating device of horizontal continuous magnetron sputtering coater |
-
2015
- 2015-04-15 CN CN201510176977.3A patent/CN104831247B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3616402A (en) * | 1968-05-31 | 1971-10-26 | Western Electric Co | Sputtering method and apparatus |
| JPH06179970A (en) * | 1992-12-15 | 1994-06-28 | Matsushita Electric Ind Co Ltd | Heating unit |
| WO2006064161A1 (en) * | 2004-12-13 | 2006-06-22 | Saint-Gobain Glass France | Method and installation for treating a glass substrate incorporating a magnetron line and a device generating an atmospheric pressure plasma |
| CN104060236A (en) * | 2014-05-14 | 2014-09-24 | 中国科学院广州能源研究所 | Continuous coating production system of sheet substrates |
| CN204570026U (en) * | 2015-04-15 | 2015-08-19 | 赫得纳米科技(昆山)有限公司 | The online panel constant temperature heating device of horizontal continuous magnetron sputtering coater |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017165987A1 (en) * | 2016-03-29 | 2017-10-05 | 苏政纬 | Mobile evaporation apparatus |
| CN109355635A (en) * | 2018-12-15 | 2019-02-19 | 湖南玉丰真空科学技术有限公司 | Substrate frame bias introducing device in a kind of continuous coating production line |
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| CN104831247B (en) | 2017-06-06 |
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