CN104785471A - Automatic diode cleaning device and cleaning method thereof - Google Patents
Automatic diode cleaning device and cleaning method thereof Download PDFInfo
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- CN104785471A CN104785471A CN201510195589.XA CN201510195589A CN104785471A CN 104785471 A CN104785471 A CN 104785471A CN 201510195589 A CN201510195589 A CN 201510195589A CN 104785471 A CN104785471 A CN 104785471A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention belongs to the technical field of the manufacturing industry, and particularly relates to an automatic diode cleaning device and a cleaning method thereof. The automatic diode cleaning device comprises a working table, an PLC, linear rails, lifting air cylinders, a heater, ultrasonic vibrating boxes, blow-off valves, a translation air cylinder, a lifting frame, a translation frame and a cleaning basket. The diode cleaning method adopts the automatic cleaning device, diodes are sequentially cleaned through a first cleaning tank, a second cleaning tank, a third cleaning tank, a fourth cleaning tank, a fifth cleaning tank, a sixth cleaning tank, a seventh cleaning tank and an eighth cleaning tank. The automatic diode cleaning device and the cleaning method thereof have the advantages of saving labor, improving the cleaning efficiency and the like.
Description
Technical field
The invention belongs to manufacturing industry technical field, be specifically related to diode automatic flushing device and cleaning method thereof.
Background technology
Diode is widely used in the various household electrical appliance such as LED electricity-saving lamp, computer, TV, sound equipment, electric motor car, is requisite necessity in Modern Family's life.In the current age of technology rapid development, also nobody can find out the substitute that can substitute diode.The life of product of diode is also very long.
The cleaning technique of current diode, mostly still use hand fit ultrasonic wave to shake case cleaning, having the following disadvantages of this cleaning method: 1, scavenging period is by artificially controlling, cannot ensure scavenging period; The clean level of 2, cause between dish and dish, cleaning between batches differs widely, the employee that What is more has gets over groove cleaning for reducing labour intensity, not only cause material clean unclean, also can cause the pollution of rinse bath cleaning liquid inside, finally cause material quality yield bad; 3, the material at high temperature had is bad, and the environment for use of diode in complete machine is relatively severe, and temperature is higher very easily causes material failure, and 4, labor strength is large.
Summary of the invention
Goal of the invention: the present invention is directed to above-mentioned prior art Problems existing and make improvement, namely first object of the present invention is for disclosing diode automatic flushing device.Second object of the present invention is for disclosing diode cleaning method.
Technical scheme: diode automatic flushing device, comprises workbench, PLC, straight line rail, lift cylinder, heater, ultrasonic Vibration Box, blowoff valve, flat-removing air cyclinder, crane, pan carriage and cleaning basket,
Described PLC is arranged on workbench side,
First rinse bath, second rinse bath, 3rd rinse bath, 4th rinse bath, 5th rinse bath, 6th rinse bath, 7th rinse bath and the 8th rinse bath set gradually on the table, first rinse bath inside is provided with heater and multiple ultrasonic Vibration Box, the inside of the second rinse bath is provided with multiple ultrasonic Vibration Box, the inside of the 3rd rinse bath is provided with multiple ultrasonic Vibration Box, the inside of the 5th rinse bath is provided with multiple ultrasonic Vibration Box, the inside of the 6th rinse bath is provided with multiple ultrasonic Vibration Box, the bottom of the first rinse bath, the bottom of the second rinse bath, the bottom of the 3rd rinse bath, the bottom of the 4th rinse bath, the bottom of the 5th rinse bath, the bottom of the 6th rinse bath, the bottom of the 7th rinse bath and the bottom of the 8th rinse bath are equipped with blowoff valve,
Straight line rail is connected with crane packaged type, is provided with cleaning basket in crane, and PLC is coupled with lift cylinder and controls to clean the vertical movement of basket; PLC is coupled with pan carriage, flat-removing air cyclinder and controls to clean moving horizontally of basket.
Diode cleaning method, adopts above-mentioned automatic flushing device, comprises the following steps:
(1), diode enters into cleaning frame by charge door, the cleaning basket that diode is housed is put into the first rinse bath and is coordinated ultrasonic oscillation to clean 5 ~ 15 minutes by PLC, crane and pan carriage, the cleaning fluid of the first rinse bath to be temperature the be pure water of 30 ~ 50 DEG C;
(2), by PLC, crane and pan carriage being moved in the second rinse bath by the cleaning basket that diode is housed in the first rinse bath coordinates ultrasonic oscillation to clean 2 ~ 10 minutes, and the cleaning fluid of the second rinse bath is pure water;
(3), by PLC, crane and pan carriage being moved in the 3rd rinse bath by the cleaning basket that diode is housed in the second rinse bath coordinates ultrasonic oscillation to clean 2 ~ 10 minutes, and the cleaning fluid of the 3rd rinse bath is pure water;
(4), by PLC, crane and pan carriage to be moved in the 4th rinse bath by the cleaning basket that diode is housed in the 3rd rinse bath and leave standstill 3 ~ 10 minutes and open blowoff valve, the 4th rinse bath is dead slot;
(5), by PLC, crane and pan carriage being moved in the 5th rinse bath by the cleaning basket that diode is housed in the 4th rinse bath coordinates ultrasonic oscillation to clean 2 ~ 15 minutes, and the cleaning fluid of the 5th rinse bath is concentration is the isopropyl alcohol of 50% ~ 85%;
(6), by PLC, crane and pan carriage being moved in the 6th rinse bath by the cleaning basket that diode is housed in the 5th rinse bath coordinates ultrasonic oscillation to clean 2 ~ 10 minutes, and the cleaning fluid of the 6th rinse bath is concentration is the isopropyl alcohol of 40% ~ 75%;
(7), by PLC, crane and pan carriage to be moved in the 7th rinse bath by the cleaning basket that diode is housed in the 6th rinse bath and embathe 2 ~ 10 minutes, the cleaning fluid of the 7th rinse bath is concentration is the isopropyl alcohol of 30% ~ 65%;
(8), by PLC, crane and pan carriage to be moved in the 8th rinse bath by the cleaning basket that diode is housed in the 7th rinse bath and embathe 2 ~ 10 minutes, the cleaning fluid of the 8th rinse bath is concentration is the isopropyl alcohol of 20% ~ 55%;
(9), by PLC, crane and pan carriage, the cleaning basket that diode is housed in the 8th rinse bath is moved on to discharge pedestal.
A kind of preferred version as diode cleaning method in the present invention: the second rinse bath and the 3rd rinse bath adopt the mode of spilling water circulation, and water inlet is arranged in the 3rd rinse bath, and delivery port is arranged in the second rinse bath.
A kind of preferred version as diode cleaning method in the present invention: the ultrasonic frequency in step (1) is 28KHz, ultrasonic power is 1800W.
A kind of preferred version as diode cleaning method in the present invention: the power of the heater in step (1) is 6000W.
A kind of preferred version as diode cleaning method in the present invention: the ultrasonic frequency in step (2) is 28KHz, ultrasonic power is 1800W.
A kind of preferred version as diode cleaning method in the present invention: the ultrasonic frequency in step (3) is 28KHz, ultrasonic power is 1800W.
A kind of preferred version as diode cleaning method in the present invention: the ultrasonic frequency in step (5) is 28KHz, ultrasonic power is 1800W.
A kind of preferred version as diode cleaning method in the present invention: the ultrasonic frequency in step (6) is 28KHz, ultrasonic power is 1800W.
A kind of preferred version as diode cleaning method in the present invention: pure water and alcohol all recycle, the pure water of last process or alcohol washes are more than after 1000K diode, just the pure water of last procedure or alcohol are discharged, again the pure water of last process or alcohol are transferred to next procedure, in the first rinse bath, add appropriate amount of purified water again, in the 5th rinse bath, add alcohol.
Beneficial effect: the invention discloses diode automatic flushing device and cleaning method has following beneficial effect:
1, artificial consumption degree is decreased;
2, artificial labour intensity is decreased;
3, ensure that the scavenging period of diode, decrease the impact of human factor;
4, recycle cleaning fluid, decrease the use amount of cleaning fluid, protect environment;
5, the secondary pollution of diode is decreased;
6, improve stability and the hot properties of material;
7, method operability simply uses, workable, and economic and social benefit is obvious.
Accompanying drawing explanation
Fig. 1 is the front view of diode automatic flushing device disclosed by the invention;
Fig. 2 is the side view of diode automatic flushing device disclosed by the invention;
Wherein:
1-PLC controller 2-straight line rail
3-lift cylinder 4-flat-removing air cyclinder
The ultrasonic Vibration Box of 5-heater 6-
7-blowoff valve 8-crane
9-pan carriage 10-cleans basket
Detailed description of the invention:
Below the specific embodiment of the present invention is described in detail.
Specific embodiment 1:
Diode automatic flushing device, comprises workbench, PLC 1, straight line rail 2, lift cylinder 3, heater 5, ultrasonic Vibration Box 6, blowoff valve 7, flat-removing air cyclinder 4, crane 8, pan carriage 9 and cleaning basket 10,
PLC 1 is arranged on workbench side,
First rinse bath, second rinse bath, 3rd rinse bath, 4th rinse bath, 5th rinse bath, 6th rinse bath, 7th rinse bath and the 8th rinse bath set gradually on the table, first rinse bath inside is provided with heater 5 and multiple ultrasonic Vibration Box 6, the inside of the second rinse bath is provided with multiple ultrasonic Vibration Box 6, the inside of the 3rd rinse bath is provided with multiple ultrasonic Vibration Box 6, the inside of the 5th rinse bath is provided with multiple ultrasonic Vibration Box 6, the inside of the 6th rinse bath is provided with multiple ultrasonic Vibration Box 6, the bottom of the first rinse bath, the bottom of the second rinse bath, the bottom of the 3rd rinse bath, the bottom of the 4th rinse bath, the bottom of the 5th rinse bath, the bottom of the 6th rinse bath, the bottom of the 7th rinse bath and the bottom of the 8th rinse bath are equipped with blowoff valve 7,
Straight line rail 2 is connected with crane 8 packaged type, and be provided with cleaning basket 10 in crane 8, PLC 1 is coupled with lift cylinder 3 and controls to clean the vertical movement of basket 10; PLC 1 is coupled with pan carriage 9, flat-removing air cyclinder 4 and controls to clean moving horizontally of basket 10.
Diode cleaning method, adopts above-mentioned automatic flushing device, comprises the following steps:
(1), diode enters into cleaning frame by charge door, by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9, the cleaning basket 10 that diode is housed being put into the first rinse bath coordinates ultrasonic oscillation to clean 5 minutes, the cleaning fluid of the first rinse bath to be temperature the be pure water of 30 DEG C;
(2), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 being moved in the second rinse bath by the cleaning basket 10 that diode is housed in the first rinse bath coordinates ultrasonic oscillation to clean 2 minutes, and the cleaning fluid of the second rinse bath is pure water;
(3), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 being moved in the 3rd rinse bath by the cleaning basket 10 that diode is housed in the second rinse bath coordinates ultrasonic oscillation to clean 2 minutes, and the cleaning fluid of the 3rd rinse bath is pure water;
(4), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 to be moved into by the cleaning basket 10 that diode is housed in the 3rd rinse bath in the 4th rinse bath and leave standstill 3 minutes and open blowoff valve 7, the 4th rinse bath is dead slot;
(5), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 being moved in the 5th rinse bath by the cleaning basket 10 that diode is housed in the 4th rinse bath coordinates ultrasonic oscillation to clean 2 minutes, the cleaning fluid of the 5th rinse bath to be concentration be 50% isopropyl alcohol;
(6), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 being moved in the 6th rinse bath by the cleaning basket 10 that diode is housed in the 5th rinse bath coordinates ultrasonic oscillation to clean 2 minutes, the cleaning fluid of the 6th rinse bath to be concentration be 40% isopropyl alcohol;
(7), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 the cleaning basket 10 that diode is housed in the 6th rinse bath moved in the 7th rinse bath and embathes 2 minutes, the cleaning fluid of the 7th rinse bath to be concentration be 30% isopropyl alcohol;
(8), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 the cleaning basket 10 that diode is housed in the 7th rinse bath moved in the 8th rinse bath and embathes 2 minutes, the cleaning fluid of the 8th rinse bath to be concentration be 20% isopropyl alcohol;
(9), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9, the cleaning basket 10 that diode is housed in the 8th rinse bath is moved on to discharge pedestal.
In the present embodiment, the second rinse bath and the 3rd rinse bath adopt the mode of spilling water circulation, and water inlet is arranged in the 3rd rinse bath, and delivery port is arranged in the second rinse bath.
In the present embodiment, the ultrasonic frequency in step (1) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, the power of the heater 5 in step (1) is 6000W.
In the present embodiment, the ultrasonic frequency in step (2) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, the ultrasonic frequency in step (3) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, the ultrasonic frequency in step (5) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, the ultrasonic frequency in step (6) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, pure water and alcohol all recycle, the pure water of last process or alcohol washes are more than after 1000K diode, just the pure water of last procedure or alcohol are discharged, again the pure water of last process or alcohol are transferred to next procedure, in the first rinse bath, add appropriate amount of purified water again, in the 5th rinse bath, add alcohol.
Specific embodiment 2
Diode automatic flushing device, comprises workbench, PLC 1, straight line rail 2, lift cylinder 3, heater 5, ultrasonic Vibration Box 6, blowoff valve 7, flat-removing air cyclinder 4, crane 8, pan carriage 9 and cleaning basket 10,
PLC 1 is arranged on workbench side,
First rinse bath, second rinse bath, 3rd rinse bath, 4th rinse bath, 5th rinse bath, 6th rinse bath, 7th rinse bath and the 8th rinse bath set gradually on the table, first rinse bath inside is provided with heater 5 and multiple ultrasonic Vibration Box 6, the inside of the second rinse bath is provided with multiple ultrasonic Vibration Box 6, the inside of the 3rd rinse bath is provided with multiple ultrasonic Vibration Box 6, the inside of the 5th rinse bath is provided with multiple ultrasonic Vibration Box 6, the inside of the 6th rinse bath is provided with multiple ultrasonic Vibration Box 6, the bottom of the first rinse bath, the bottom of the second rinse bath, the bottom of the 3rd rinse bath, the bottom of the 4th rinse bath, the bottom of the 5th rinse bath, the bottom of the 6th rinse bath, the bottom of the 7th rinse bath and the bottom of the 8th rinse bath are equipped with blowoff valve 7,
Straight line rail 2 is connected with crane 8 packaged type, and be provided with cleaning basket 10 in crane 8, PLC 1 is coupled with lift cylinder 3 and controls to clean the vertical movement of basket 10; PLC 1 is coupled with pan carriage 9, flat-removing air cyclinder 4 and controls to clean moving horizontally of basket 10.
Diode cleaning method, adopts above-mentioned automatic flushing device, comprises the following steps:
(1), diode enters into cleaning frame by charge door, by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9, the cleaning basket 10 that diode is housed being put into the first rinse bath coordinates ultrasonic oscillation to clean 15 minutes, the cleaning fluid of the first rinse bath to be temperature the be pure water of 50 DEG C;
(2), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 being moved in the second rinse bath by the cleaning basket 10 that diode is housed in the first rinse bath coordinates ultrasonic oscillation to clean 10 minutes, and the cleaning fluid of the second rinse bath is pure water;
(3), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 being moved in the 3rd rinse bath by the cleaning basket 10 that diode is housed in the second rinse bath coordinates ultrasonic oscillation to clean 10 minutes, and the cleaning fluid of the 3rd rinse bath is pure water;
(4), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 to be moved into by the cleaning basket 10 that diode is housed in the 3rd rinse bath in the 4th rinse bath and leave standstill 10 minutes and open blowoff valve 7, the 4th rinse bath is dead slot;
(5), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 being moved in the 5th rinse bath by the cleaning basket 10 that diode is housed in the 4th rinse bath coordinates ultrasonic oscillation to clean 15 minutes, the cleaning fluid of the 5th rinse bath to be concentration be 85% isopropyl alcohol;
(6), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 being moved in the 6th rinse bath by the cleaning basket 10 that diode is housed in the 5th rinse bath coordinates ultrasonic oscillation to clean 10 minutes, the cleaning fluid of the 6th rinse bath to be concentration be 75% isopropyl alcohol;
(7), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 the cleaning basket 10 that diode is housed in the 6th rinse bath moved in the 7th rinse bath and embathes 10 minutes, the cleaning fluid of the 7th rinse bath to be concentration be 65% isopropyl alcohol;
(8), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 to be moved in the 8th rinse bath by the cleaning basket 10 that diode is housed in the 7th rinse bath and embathe 2 ~ 10 minutes, the cleaning fluid of the 8th rinse bath is concentration is the isopropyl alcohol of 55%;
(9), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9, the cleaning basket 10 that diode is housed in the 8th rinse bath is moved on to discharge pedestal.
In the present embodiment, the second rinse bath and the 3rd rinse bath adopt the mode of spilling water circulation, and water inlet is arranged in the 3rd rinse bath, and delivery port is arranged in the second rinse bath.
In the present embodiment, the ultrasonic frequency in step (1) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, the power of the heater 5 in step (1) is 6000W.
In the present embodiment, the ultrasonic frequency in step (2) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, the ultrasonic frequency in step (3) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, the ultrasonic frequency in step (5) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, the ultrasonic frequency in step (6) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, pure water and alcohol all recycle, the pure water of last process or alcohol washes are more than after 1000K diode, just the pure water of last procedure or alcohol are discharged, again the pure water of last process or alcohol are transferred to next procedure, in the first rinse bath, add appropriate amount of purified water again, in the 5th rinse bath, add alcohol.
Specific embodiment 3
Diode automatic flushing device, comprises workbench, PLC 1, straight line rail 2, lift cylinder 3, heater 5, ultrasonic Vibration Box 6, blowoff valve 7, flat-removing air cyclinder 4, crane 8, pan carriage 9 and cleaning basket 10,
PLC 1 is arranged on workbench side,
First rinse bath, second rinse bath, 3rd rinse bath, 4th rinse bath, 5th rinse bath, 6th rinse bath, 7th rinse bath and the 8th rinse bath set gradually on the table, first rinse bath inside is provided with heater 5 and multiple ultrasonic Vibration Box 6, the inside of the second rinse bath is provided with multiple ultrasonic Vibration Box 6, the inside of the 3rd rinse bath is provided with multiple ultrasonic Vibration Box 6, the inside of the 5th rinse bath is provided with multiple ultrasonic Vibration Box 6, the inside of the 6th rinse bath is provided with multiple ultrasonic Vibration Box 6, the bottom of the first rinse bath, the bottom of the second rinse bath, the bottom of the 3rd rinse bath, the bottom of the 4th rinse bath, the bottom of the 5th rinse bath, the bottom of the 6th rinse bath, the bottom of the 7th rinse bath and the bottom of the 8th rinse bath are equipped with blowoff valve 7,
Straight line rail 2 is connected with crane 8 packaged type, and be provided with cleaning basket 10 in crane 8, PLC 1 is coupled with lift cylinder 3 and controls to clean the vertical movement of basket 10; PLC 1 is coupled with pan carriage 9, flat-removing air cyclinder 4 and controls to clean moving horizontally of basket 10.
Diode cleaning method, adopts above-mentioned automatic flushing device, comprises the following steps:
(1), diode enters into cleaning frame by charge door, by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9, the cleaning basket 10 that diode is housed being put into the first rinse bath coordinates ultrasonic oscillation to clean 10 minutes, the cleaning fluid of the first rinse bath to be temperature the be pure water of 40 DEG C;
(2), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 being moved in the second rinse bath by the cleaning basket 10 that diode is housed in the first rinse bath coordinates ultrasonic oscillation to clean 5 minutes, and the cleaning fluid of the second rinse bath is pure water;
(3), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 being moved in the 3rd rinse bath by the cleaning basket 10 that diode is housed in the second rinse bath coordinates ultrasonic oscillation to clean 5 minutes, and the cleaning fluid of the 3rd rinse bath is pure water;
(4), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 to be moved into by the cleaning basket 10 that diode is housed in the 3rd rinse bath in the 4th rinse bath and leave standstill 3 ~ 10 minutes and open blowoff valve 7, the 4th rinse bath is dead slot;
(5), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 being moved in the 5th rinse bath by the cleaning basket 10 that diode is housed in the 4th rinse bath coordinates ultrasonic oscillation to clean 5 minutes, the cleaning fluid of the 5th rinse bath to be concentration be 65% isopropyl alcohol;
(6), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 being moved in the 6th rinse bath by the cleaning basket 10 that diode is housed in the 5th rinse bath coordinates ultrasonic oscillation to clean 5 minutes, the cleaning fluid of the 6th rinse bath to be concentration be 55% isopropyl alcohol;
(7), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 to be moved in the 7th rinse bath by the cleaning basket 10 that diode is housed in the 6th rinse bath and embathe 5 minutes, the cleaning fluid of the 7th rinse bath is the isopropyl alcohol of concentration 45%;
(8), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9 the cleaning basket 10 that diode is housed in the 7th rinse bath moved in the 8th rinse bath and embathes 5 minutes, the cleaning fluid of the 8th rinse bath to be concentration be 35% isopropyl alcohol;
(9), by PLC 1, lift cylinder 3, flat-removing air cyclinder 4, crane 8 and pan carriage 9, the cleaning basket 10 that diode is housed in the 8th rinse bath is moved on to discharge pedestal.
In the present embodiment, the second rinse bath and the 3rd rinse bath adopt the mode of spilling water circulation, and water inlet is arranged in the 3rd rinse bath, and delivery port is arranged in the second rinse bath.
In the present embodiment, the ultrasonic frequency in step (1) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, the power of the heater 5 in step (1) is 6000W.
In the present embodiment, the ultrasonic frequency in step (2) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, the ultrasonic frequency in step (3) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, the ultrasonic frequency in step (5) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, the ultrasonic frequency in step (6) is 28KHz, and ultrasonic power is 1800W.
In the present embodiment, pure water and alcohol all recycle, the pure water of last process or alcohol washes are more than after 1000K diode, just the pure water of last procedure or alcohol are discharged, again the pure water of last process or alcohol are transferred to next procedure, in the first rinse bath, add appropriate amount of purified water again, in the 5th rinse bath, add alcohol.
Above embodiments of the present invention are elaborated.But the present invention is not limited to above-mentioned embodiment, in the ken that art those of ordinary skill possesses, can also make a variety of changes under the prerequisite not departing from present inventive concept.
Claims (10)
1. diode automatic flushing device, is characterized in that, comprises workbench, PLC, straight line rail, lift cylinder, heater, ultrasonic Vibration Box, blowoff valve, flat-removing air cyclinder, crane, pan carriage and cleaning basket,
Described PLC is arranged on workbench side,
First rinse bath, second rinse bath, 3rd rinse bath, 4th rinse bath, 5th rinse bath, 6th rinse bath, 7th rinse bath and the 8th rinse bath set gradually on the table, first rinse bath inside is provided with heater and multiple ultrasonic Vibration Box, the inside of the second rinse bath is provided with multiple ultrasonic Vibration Box, the inside of the 3rd rinse bath is provided with multiple ultrasonic Vibration Box, the inside of the 5th rinse bath is provided with multiple ultrasonic Vibration Box, the inside of the 6th rinse bath is provided with multiple ultrasonic Vibration Box, the bottom of the first rinse bath, the bottom of the second rinse bath, the bottom of the 3rd rinse bath, the bottom of the 4th rinse bath, the bottom of the 5th rinse bath, the bottom of the 6th rinse bath, the bottom of the 7th rinse bath and the bottom of the 8th rinse bath are equipped with blowoff valve,
Straight line rail is connected with crane packaged type, is provided with cleaning basket in crane, and PLC is coupled with lift cylinder and controls to clean the vertical movement of basket; PLC is coupled with pan carriage, flat-removing air cyclinder and controls to clean moving horizontally of basket.
2. diode cleaning method, adopts automatic flushing device as claimed in claim 1, it is characterized in that, comprise the following steps:
(1), diode enters into cleaning frame by charge door, the cleaning basket that diode is housed is put into the first rinse bath and is coordinated ultrasonic oscillation to clean 5 ~ 15 minutes by PLC, crane and pan carriage, the cleaning fluid of the first rinse bath to be temperature the be pure water of 30 ~ 50 DEG C;
(2), by PLC, crane and pan carriage being moved in the second rinse bath by the cleaning basket that diode is housed in the first rinse bath coordinates ultrasonic oscillation to clean 2 ~ 10 minutes, and the cleaning fluid of the second rinse bath is pure water;
(3), by PLC, crane and pan carriage being moved in the 3rd rinse bath by the cleaning basket that diode is housed in the second rinse bath coordinates ultrasonic oscillation to clean 2 ~ 10 minutes, and the cleaning fluid of the 3rd rinse bath is pure water;
(4), by PLC, crane and pan carriage to be moved in the 4th rinse bath by the cleaning basket that diode is housed in the 3rd rinse bath and leave standstill 3 ~ 10 minutes and open blowoff valve, the 4th rinse bath is dead slot;
(5), by PLC, crane and pan carriage being moved in the 5th rinse bath by the cleaning basket that diode is housed in the 4th rinse bath coordinates ultrasonic oscillation to clean 2 ~ 15 minutes, and the cleaning fluid of the 5th rinse bath is concentration is the isopropyl alcohol of 50% ~ 85%;
(6), by PLC, crane and pan carriage being moved in the 6th rinse bath by the cleaning basket that diode is housed in the 5th rinse bath coordinates ultrasonic oscillation to clean 2 ~ 10 minutes, and the cleaning fluid of the 6th rinse bath is concentration is the isopropyl alcohol of 40% ~ 75%;
(7), by PLC, crane and pan carriage to be moved in the 7th rinse bath by the cleaning basket that diode is housed in the 6th rinse bath and embathe 2 ~ 10 minutes, the cleaning fluid of the 7th rinse bath is concentration is the isopropyl alcohol of 30% ~ 65%;
(8), by PLC, crane and pan carriage to be moved in the 8th rinse bath by the cleaning basket that diode is housed in the 7th rinse bath and embathe 2 ~ 10 minutes, the cleaning fluid of the 8th rinse bath is concentration is the isopropyl alcohol of 20% ~ 55%;
(9), by PLC, crane and pan carriage, the cleaning basket that diode is housed in the 8th rinse bath is moved on to discharge pedestal.
3. diode cleaning method as claimed in claim 2, is characterized in that, the second rinse bath and the 3rd rinse bath adopt the mode of spilling water circulation, and water inlet is arranged in the 3rd rinse bath, and delivery port is arranged in the second rinse bath.
4. diode cleaning method as claimed in claim 2, it is characterized in that, the ultrasonic frequency in step (1) is 28KHz, and ultrasonic power is 1800W.
5. diode cleaning method as claimed in claim 2, it is characterized in that, the power of the heater in step (1) is 6000W.
6. diode cleaning method as claimed in claim 2, it is characterized in that, the ultrasonic frequency in step (2) is 28KHz, and ultrasonic power is 1800W.
7. diode cleaning method as claimed in claim 2, it is characterized in that, the ultrasonic frequency in step (3) is 28KHz, and ultrasonic power is 1800W.
8. diode cleaning method as claimed in claim 2, it is characterized in that, the ultrasonic frequency in step (5) is 28KHz, and ultrasonic power is 1800W.
9. diode cleaning method as claimed in claim 2, it is characterized in that, the ultrasonic frequency in step (6) is 28KHz, and ultrasonic power is 1800W.
10. diode cleaning method as claimed in claim 2, it is characterized in that, pure water and alcohol all recycle, the pure water of last process or alcohol washes are more than after 1000K diode, just the pure water of last procedure or alcohol are discharged, again the pure water of last process or alcohol are transferred to next procedure, then add appropriate amount of purified water in the first rinse bath, in the 5th rinse bath, add alcohol.
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| CN201510195589.XA CN104785471A (en) | 2015-04-23 | 2015-04-23 | Automatic diode cleaning device and cleaning method thereof |
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| CN201510195589.XA CN104785471A (en) | 2015-04-23 | 2015-04-23 | Automatic diode cleaning device and cleaning method thereof |
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| CN201510195589.XA Pending CN104785471A (en) | 2015-04-23 | 2015-04-23 | Automatic diode cleaning device and cleaning method thereof |
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| CN106128981A (en) * | 2016-08-29 | 2016-11-16 | 天津汉德威药业有限公司 | A kind of axial diode acid dip pickle |
| CN107180776A (en) * | 2017-05-16 | 2017-09-19 | 重庆达标电子科技有限公司 | Diode heated wash device |
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