CN104750322B - A kind of touch screen and preparation method thereof - Google Patents
A kind of touch screen and preparation method thereof Download PDFInfo
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- CN104750322B CN104750322B CN201310737034.4A CN201310737034A CN104750322B CN 104750322 B CN104750322 B CN 104750322B CN 201310737034 A CN201310737034 A CN 201310737034A CN 104750322 B CN104750322 B CN 104750322B
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Abstract
The preparation method of touch screen of the present invention, the photoresist layer of the first conductive layer of patterning is used to be allowed to insulate for the first connecting pattern of insulator separation and the second connecting pattern, so that the preparation process of the touch screen only needs twice mask and twice etching technics that can realize, production process is effectively reduced, production efficiency and yields are improved.Meanwhile touch screen of the present invention, covering is not set in the first sensing patterns and the second sensing patterns, one layer of photoresist layer is provided only between the first connecting pattern and the second connecting pattern, effectively increases the light transmittance of the touch screen.
Description
Technical field
A kind of display technology field of the present invention, and in particular to capacitance type touch control screen and preparation method thereof.
Background technology
Touch screen（Full name in English is Touch Panel）, also known as touch screen, touch panel, it is aobvious to be that one kind being formed in image
On showing device display surface, the device of instruction input is carried out using conductors such as human body or capacitance pens, mouse, keyboard etc. can be replaced external
The input equipments such as input unit and mechanical input button, can effectively simplify the electronic products structure such as computer, mobile phone, have non-
Often wide application prospect.
Touch screen is divided into resistance-type covering (resistive overlay) touch screen, photosensitive type touch screen, capacitance touching control
Screen etc..Wherein, capacitance type touch control screen（Full name in English is Capacity Touch Panel, referred to as CTP）It is to utilize human body
Electric current induction controls screen, according to the capacitance variations of detecting touch area, and then calculates touch position, has sensitive
The advantages that degree height, multipoint-touch-technology easy to implement, it is increasingly becoming the master applied in the electronic products such as smart mobile phone, tablet computer
Flow touch screen.
Chinese patent literature CN102163095A discloses a kind of capacitance type touch control screen and preparation method thereof, including is formed in
The first sensing figure in transparent substrates and the second sensing figure.First sensing figure is each other by the first connecting pattern along first
Direction connection setting, the second sensing figure connect setting, the first sensing figure in a second direction each other by the second connecting pattern
The row that the row being formed by connecting are formed by connecting with the second sensing figure forms insulation and structure intersected with each other.
First connecting pattern and the short circuit of the second connecting pattern in order to prevent, between the first connecting pattern and the second sensing figure
Insulating layer need to be formed, preparation method is：Conductive layer and insulating layer is sequentially formed on a transparent substrate；It is formed on the insulating layer photic
Resist layer and pattern form mask；Conductive layer and insulating layer is patterned respectively by mask, forms the first sensing
Figure, the second sensing figure and series connection first sense the first connecting pattern of figure, and mask is removed after patterning；In substrate
The conductive layer of covering the second sensing figure and insulating layer is formed, and patterns the second connection figure to form series connection the second sensing figure
Case.
In above-mentioned preparation method, it is both provided with absolutely in the first sensing figure, the second sensing figure and the first connecting pattern
Edge layer has seriously affected the light transmittance of the touch screen；Moreover, the first sensing figure, the second sensing figure, the first connection figure
The Patternized technique of case, the forming process of the second connecting pattern and insulating layer needs to execute twice mask and three etching works altogether
Skill, manufacturing process is complicated, to reduce the production efficiency and yields of touch screen, improves production cost.
Invention content
For this purpose, to be solved by this invention is the problem that touch screen light transmittance is low, preparation process is complicated in the prior art, carry
High, simple touch screen of preparation process and preparation method thereof for a kind of light transmittance.
In order to solve the above technical problems, the technical solution adopted by the present invention is as follows：
Several independent first sensing patterns on substrate are arranged in a kind of touch screen of the present invention, including substrate
With several independent second sensing patterns；
First sensing patterns are connected in series with by the first connecting pattern along first direction, and the first conductive unit is formed；
Second sensing patterns are connected in series in a second direction by the second connecting pattern, form the second conductive unit；
First conductive unit forms crossover network with second conductive unit, and insulated from each other by insulating layer；
The insulating layer is photoresist layer, first sensing patterns and the second sensing patterns same layer setting.
First connecting pattern is sequentially stacked with second connecting pattern edge perpendicular to the substrate direction, described exhausted
Edge layer is arranged between.
The photoresist layer is transparent or semitransparent film layer.
The photoresist is halftoning photoresist.
First sensing patterns are identical as second sensing patterns.
A kind of preparation method of touch screen of the present invention, includes the following steps：
S1, it is sequentially formed the first conductive layer and photoresist layer on substrate；
S2, photoresist layer is patterned by photoetching process, forms mask；
S3, it is patterned, is formed several using the first conductive layer of etching technics pair by mask obtained in step S2
First sensing patterns, the first connecting pattern of the first sensing patterns of connecting along first direction and several independent second sensing figures
Case；
S4, part mask is removed, retains the photoresist layer being covered in the first connecting pattern, and carry out hot setting
Processing so that photoresist layer coats the side of the first connecting pattern；
S5, the second conductive layer for covering the second conductive pattern and photoresist layer in a second direction is formed on substrate,
And pattern the second connecting pattern to form adjacent second conductive pattern of connecting in a second direction.
The photoresist is halftoning photoresist, and step S2 is formed by the mask, forms first and connects
The height in the region of map interlinking case is more than the height in other regions, and difference in height is 1.0 μm~2 μm.
Part mask is removed by cineration technics in step S4.
Step S3 is to the first connecting pattern over etching so that the projection of first connecting pattern over the substrate
In the drop shadow spread of the mask corresponding region over the substrate.
The above technical solution of the present invention has the following advantages over the prior art：
1, the preparation method of touch screen of the present invention, it is exhausted to use the photoresist layer of the first conductive layer of patterning
The first connecting pattern is isolated in edge layer and the second connecting pattern is allowed to insulate so that the preparation process of the touch screen only needs twice to cover
Film and twice etching technics can be realized, effectively reduce production process, improve production efficiency and yields.
2, the preparation method of touch screen of the present invention carries out over etching to first connecting pattern, and will cover
The photoresist layer covered in the first connecting pattern carries out hot setting processing so that the first connection of photoresist layer cladding
The side of pattern effectively prevents the generation of short circuit phenomenon between the first connecting pattern and the second connecting pattern.
Covering is not set in 3, touch screen of the present invention, the first sensing patterns and the second sensing patterns, and first connects
It is provided only with one layer of photoresist layer between map interlinking case and the second connecting pattern, effectively increases the light transmission of the touch screen
Rate.
Description of the drawings
In order to make the content of the present invention more clearly understood, it below according to specific embodiments of the present invention and combines
Attached drawing, the present invention is described in further detail, wherein
Fig. 1 is the vertical view of touch screen in the prior art；
Fig. 2 is the first sensing figure and the second sensing graph position relationship and connection relationship diagram in Fig. 1；
Fig. 3-1~Fig. 3-7 is touch screen of the present invention structural schematic diagram in preparation process.
Reference numeral is expressed as in figure：10- substrates, the first conductive layers of 12-, 12a- first sense figure, 12b- second feels
Mapping shape, the first connecting patterns of 12a1-, the second connecting patterns of 12b1-, 13- insulating layers, the second conductive layers of 14-.
Specific implementation mode
To make the objectives, technical solutions, and advantages of the present invention clearer, below in conjunction with attached drawing to the reality of the present invention
The mode of applying is described in further detail.
The present invention can be embodied in many different forms, and should not be construed as limited to embodiment set forth herein.
On the contrary, providing these embodiments so that the disclosure will be thorough and complete, and the design of the present invention will be fully conveyed to
Those skilled in the art, the present invention will only be defined by the appended claims.In the accompanying drawings, for clarity, the areas Ceng He can be exaggerated
The size and relative size in domain.It should be understood that when element such as layer, region or substrate are referred to as " being formed in " or " setting
" another element "upper" when, which can be arranged directly on another element, or there may also be intermediary elements.
On the contrary, when element is referred to as on " being formed directly into " or " being set up directly on " another element, intermediary element is not present；Work as element
It is referred to as " transparent or semitransparent ", indicates that the element has high optical transmittance.
The present embodiment provides a kind of touch screens, as shown in Figure 1, including substrate 10, several independences being arranged on substrate 10
The first sensing patterns 12a and several independent second sensing patterns 12b.
The substrate 10 is transparent or semitransparent substrate, the glass substrate of the present embodiment preferably clear.
The first sensing patterns 12a is connected in series with by the first connecting pattern 12a1 along first direction, is formed first and is led
Electric unit；The second sensing patterns 12b is connected in series in a second direction by the second connecting pattern 12b1, and it is conductive to form second
Unit.
First sensing patterns 12a described in the present embodiment is identical as the second sensing patterns 12b shapes, is diamond shape；
Along first direction and second direction, all first sensing patterns 12a and the second sensing patterns 12b is with corner phase
It is adjacent.
As the other embodiment of the present invention, the first sensing patterns 12a and the second sensing patterns 12b can also
Difference can also be achieved the object of the present invention, be belonged to the scope of protection of the present invention.
In the present embodiment, the first sensing patterns 12a and the second sensing patterns 12b is formed within the same layer, such as
Shown in Fig. 2, first connecting pattern is sequentially stacked with second connecting pattern edge perpendicular to the substrate direction, described exhausted
Edge layer is arranged between.So that first conductive unit forms crossover network with second conductive unit, and pass through
The insulating layer being arranged between the first connecting pattern 12a1 and the second connecting pattern 12b1 is insulated from each other, and the insulating layer is
Photoresist layer 13, the first sensing patterns 12a1 and the second sensing patterns 12b1 same layers setting.
In the present embodiment, the photoresist layer 13 is transparent or semitransparent film layer；And the photoresist layer 13
Preferably halftoning photoresist layer.
Covering is not set on touch screen described in the present embodiment, the first sensing patterns 12a and the second sensing patterns 12b,
It is provided only with one layer of photoresist layer 13 between first connecting pattern 12a1 and the second connecting pattern 12b1, effectively increases institute
State the light transmittance of touch screen.
The preparation method of the touch screen, includes the following steps：
S1, as shown in figure 3-1, is formed the first conductive layer 12 on substrate 10 by sputtering technology, is existed by spin coating proceeding
Photoresist layer 13 is formed on first conductive layer 12.
First conductive layer 12 described in the present embodiment is preferably indium tin oxide（ITO）Layer, other realities as the present invention
Example is applied, first conductive layer 12 is selected from but not limited to molybdenum (Mo), silver-colored (Ag), titanium (Ti), copper (Cu), aluminium (Al) or molybdenum/aluminium/molybdenum
(Mo/Al/Mo) etc. low-resistance materials, specific preparation method are selected according to material, and the purpose of the present invention may be implemented, belong to
Protection scope of the present invention.
S2, as shown in figure 3-2, patterns photoresist layer 13 by photoetching process, forms mask.
The preferred halftoning photoresist of photoresist described in the present embodiment（Purchased from An Zhi Electron Material Co., Ltd
AZ GXR600 series）, during patterned, mask overlay area corresponds to the first sensing patterns 12a, described second
The height of sensing patterns 12b and the first connecting pattern 12a1, the masked areas of corresponding first connecting pattern 12a1 are more than
The height in other regions, difference in height are 1.0 μm~2.0 μm, the preferred 1.5um of the present embodiment.
S3, as shown in Fig. 3-3, by mask obtained in step S2 using the first conductive layer of wet-etching technology pair 12 into
Row patterning forms several first sensing patterns 12a, the first connecting pattern for the first sensing patterns 12a that connects along first direction
12a1 and several independent second sensing patterns 12b.
Etching agent employed in the wet-etching technology is selected from but not limited to the acidic etchant comprising oxalic acid, this reality
Apply the preferred oxalic acid of example.In the present embodiment, preferably to the first connecting pattern 12a over etchings so that first connecting pattern
The side of 12a it is more inner than the side of the mask corresponding region to get the first connecting pattern 12a on the substrate 10
Be projected in the mask corresponding region in the drop shadow spread on the substrate 10.
S4, as shown in Figure 3-4, using cineration technics remove part mask, due to correspondence the first connecting pattern 12a1
The height of masked areas be more than the height in other regions, therefore the masked areas being arranged on the first connecting pattern 12a1
It is able to part reservation, the height of member-retaining portion is suitable with the region before ashing and the difference in height in other regions.
As in Figure 3-5, the present embodiment further includes the photoresist to being covered on the first connecting pattern 12a1
Layer 13 carries out the step of hot setting processing, since the side of the first connecting pattern 12a described in step S3 is than the mask pair
Answer the side in region more inner, the photoresist layer 13 is after hot setting is handled so that the photoresist layer 13
It is existing to effectively prevent short circuit between the first connecting pattern and the second connecting pattern for the side for coating first connecting pattern completely
The generation of elephant.
S5, as seen in figures 3-6, formed on substrate 10 by sputtering technology cover in a second direction the second conductive pattern and
Second conductive layer 14 of photoresist layer 13, as shown in fig. 3 to 7, by lithography and etching technique to second conductive layer 14
Carry out the second connecting pattern 12b1 that patterning forms adjacent second conductive pattern of connecting in a second direction.
Second conductive layer 14 selected from but not limited to molybdenum (Mo), silver-colored (Ag), titanium (Ti), copper (Cu), aluminium (Al) or molybdenum/
The low-resistance materials layers such as aluminium/molybdenum (Mo/Al/Mo), specific preparation method are selected according to material, and the mesh of the present invention may be implemented
, it belongs to the scope of protection of the present invention；The preferred molybdenum layer of the present embodiment.
The preparation method of touch screen of the present invention, use patterning the first conductive layer 12 photoresist layer 13 for
Insulator separation the first connecting pattern 12a1 and the second connecting pattern 12b1 are allowed to insulate so that the preparation process of the touch screen
It only needs twice mask and twice etching technics that can realize, effectively reduces production process, improve production efficiency and non-defective unit
Rate.
Obviously, the above embodiments are merely examples for clarifying the description, and does not limit the embodiments.It is right
For those of ordinary skill in the art, can also make on the basis of the above description it is other it is various forms of variation or
It changes.There is no necessity and possibility to exhaust all the enbodiments.And it is extended from this it is obvious variation or
Variation is still in the protection scope of this invention.
Claims (8)
1. several independent first sensing patterns on substrate and several independent is arranged in a kind of touch screen, including substrate
Two sensing patterns；
First sensing patterns are connected in series with by the first connecting pattern along first direction, and the first conductive unit is formed；
Second sensing patterns are connected in series in a second direction by the second connecting pattern, form the second conductive unit；
First conductive unit forms crossover network with second conductive unit, and insulated from each other by insulating layer；It is special
Sign is,
The insulating layer is photoresist layer, and the photoresist layer is provided only on first connecting pattern and second and connects
Between map interlinking case, first sensing patterns and the second sensing patterns same layer setting；
First sensing patterns, second sensing patterns and connect the first of first sensing patterns along first direction
Connecting pattern is by being formed directly into the photoresist layer after patterned on the first conductive layer as mask, to described
One conductive layer performs etching；
Second connecting pattern is covered by being formed in the photoresist layer on being only retained in first connecting pattern
The second conductive layer of second sensing patterns is covered, and second conductive layer pattern is formed.
2. a kind of touch screen according to claim 1, which is characterized in that the photoresist layer is transparent or semitransparent
Film layer.
3. a kind of touch screen according to claim 1, which is characterized in that the photoresist is halftoning photoresist
Agent.
4. a kind of touch screen according to claim 1, which is characterized in that first sensing patterns are sensed with described second
Pattern is identical.
5. a kind of preparation method of touch screen, which is characterized in that include the following steps：
S1, it is sequentially formed the first conductive layer and photoresist layer on substrate；
S2, photoresist layer is patterned by photoetching process, forms mask；
S3, it is patterned using the first conductive layer of etching technics pair by mask obtained in step S2, forms several first
Sensing patterns, the first connecting pattern of the first sensing patterns of connecting along first direction and several independent second sensing patterns；
S4, part mask is removed, retains the photoresist layer being covered in the first connecting pattern, and carry out at hot setting
Reason so that photoresist layer coats the side of the first connecting pattern；
S5, the second conductive layer for covering the second conductive pattern and photoresist layer in a second direction is formed on substrate, and scheme
Caseization forms the second connecting pattern of adjacent second conductive pattern of connecting in a second direction.
6. the preparation method of touch screen according to claim 5, which is characterized in that the photoresist is halftoning light
Resist, step S2 is caused to be formed by the mask, the height for forming the region of the first connecting pattern is more than other regions
Highly, difference in height is 1.0 μm~2 μm.
7. the preparation method of touch screen according to claim 5, which is characterized in that removed by cineration technics in step S4
Part mask.
8. the preparation method of touch screen according to claim 5, which is characterized in that step S3 is to first connecting pattern
Over etching so that first connecting pattern over the substrate be projected in the mask corresponding region over the substrate
In drop shadow spread.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102163097A (en) * | 2010-02-22 | 2011-08-24 | 三星移动显示器株式会社 | Fabricating method for touch screen panel |
| CN102163095A (en) * | 2010-02-22 | 2011-08-24 | 三星移动显示器株式会社 | Touch screen panel and fabricating method thereof |
| CN102339184A (en) * | 2010-07-14 | 2012-02-01 | 乐金显示有限公司 | Electrostatic capacity type touch screen panel and method of manufacturing the same |
| CN202230457U (en) * | 2010-11-09 | 2012-05-23 | 宸鸿光电科技股份有限公司 | Touch control panel structure |
| CN102866816A (en) * | 2012-09-03 | 2013-01-09 | 北京京东方光电科技有限公司 | Capacitive touch sensor, manufacturing method thereof, touch screen and display device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101475106B1 (en) * | 2011-08-23 | 2014-12-23 | 엘지디스플레이 주식회사 | Electrostatic capacity type touch screen panel and method of manufacturing the same |
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- 2013-12-27 CN CN201310737034.4A patent/CN104750322B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102163097A (en) * | 2010-02-22 | 2011-08-24 | 三星移动显示器株式会社 | Fabricating method for touch screen panel |
| CN102163095A (en) * | 2010-02-22 | 2011-08-24 | 三星移动显示器株式会社 | Touch screen panel and fabricating method thereof |
| CN102339184A (en) * | 2010-07-14 | 2012-02-01 | 乐金显示有限公司 | Electrostatic capacity type touch screen panel and method of manufacturing the same |
| CN202230457U (en) * | 2010-11-09 | 2012-05-23 | 宸鸿光电科技股份有限公司 | Touch control panel structure |
| CN102866816A (en) * | 2012-09-03 | 2013-01-09 | 北京京东方光电科技有限公司 | Capacitive touch sensor, manufacturing method thereof, touch screen and display device |
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| CN104750322A (en) | 2015-07-01 |
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Application publication date: 20150701 Assignee: Yungu (Gu'an) Technology Co., Ltd.|Bazhou Yungu Electronic Technology Co., Ltd.|Kunshan Institute of technology new flat panel display technology center Co., Ltd Assignor: Kunshan Guo Xian Photoelectric Co., Ltd. Contract record no.: X2019990000157 Denomination of invention: Touch screen and preparation method thereof Granted publication date: 20180904 License type: Common License Record date: 20191031 |
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Effective date of registration: 20191205 Address after: 510130 No.2 Xiangshan Avenue, Yongning Street, Zengcheng District, Guangzhou City, Guangdong Province (within the core area of Zengcheng economic and Technological Development Zone) Patentee after: Guangzhou Guoxian Technology Co., Ltd Address before: 215300, No. 1, Longteng Road, Kunshan Development Zone, Jiangsu, Suzhou, 4 Patentee before: Kunshan Guo Xian Photoelectric Co., Ltd. |