CN104698519B - Low-thermal-noise high-reflection type optical combined film structure and preparation method thereof - Google Patents

Low-thermal-noise high-reflection type optical combined film structure and preparation method thereof Download PDF

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CN104698519B
CN104698519B CN201510141832.XA CN201510141832A CN104698519B CN 104698519 B CN104698519 B CN 104698519B CN 201510141832 A CN201510141832 A CN 201510141832A CN 104698519 B CN104698519 B CN 104698519B
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film
film layer
low
layer
sapphire
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CN104698519A (en
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刘涛
许冠军
董瑞芳
张首刚
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National Time Service Center of CAS
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements

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  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

The invention discloses a low-thermal-noise high-reflection type optical combined film structure and a preparation method thereof. The low-thermal-noise high-reflection type optical combined film structure is that a ultralow-expansion optical material is used as a substrate; a film coats the substrate, wherein the film is a multi-layer film formed by a sapphire film layer and a diamond layer which are arranged alternatively and combined by bonding or contact blocking. According to the low-thermal-noise high-reflection type optical combined film structure, the sapphire and diamond materials are used as the film coating layers and have extremely low mechanical loss factors, so that the brown thermal noise of the film coating material can be greatly reduced; meanwhile, the sapphire and diamond materials have a large difference in refraction rate, and therefore, high and low film layers can be formed to achieve high reflection rate; the combined film can be applied to high-tech fields such as an optical reference cavity, an optical interference instrument, an ultralow linewidth laser, an optical atomic clock and gravitational wave detection.

Description

A kind of low-heat noise high reflection optical compound film structure and preparation method thereof
Technical field
The invention belongs to composite membrane field, is related to a kind of optical compound film structure, a kind of especially low-heat noise high reflection Optical compound film structure and preparation method thereof.
Background technology
The frequency noise of super-narrow line width laser instrument is reduced to high-techs such as optics atomic clock, gravitational wave detection and high-accuracy spectrum Skill field is using with vital effect.The laser extremely low in order to obtain frequency noise, usual Bian Pound-Drever- Hall (PDH) technologies are locked in laser frequency precision in the resonant frequency in super steady optical reference chamber.The frequency of super-narrow line width laser Rate stability is closely related with the stability of optical reference chamber effective cavity length.Affect the thermal noise of optical reference chamber change of cavity length but It is difficult to suppress and eliminates, it has also become one of key constraints that narrow-linewidth laser performance is further improved.
At present, reducing the method for optical reference chamber thermal noise includes：Reduce optical reference chamber temperature, Bian little with mechanical loss Plated film and cavity material, increase reference cavity chamber length and the spot radius etc. on increase minute surface, but all there is certain limitation Property.For example, the optics cavity for being made using single crystal silicon material can realize 10-16The super stabilized laser of magnitude, but silicon optical window only fits For infrared band and be lost it is larger, need complicated cryogenic system.And Coating Materials SiO conventional at present2/Ta2O5Although Optical window width, but its mechanical loss factor is big, directly results in larger frequency stability.2014, Ye Jun groups of the U.S. By the way that GaAs/AlGaAs DBR are attached to into molten silicon surface, loss angle is obtained for 2.5 × 10-5Coating Materials, be conventional Coating Materials SiO2/Ta2O51/10, but its thang-kng wave band, between 1000nm and 1100nm, range of application is greatly limited System.Therefore, design and develop and there is optical window width, while having extremely low Blang's thermal noise Coating Materials to seem very urgent.
Sapphire has that hardness is high, fusing point is high, translucency is good, and stable chemical performance is widely used in machinery, optics, letter The high-tech sectors such as breath.The sapphire tool of Artificial Growth has good wearability, and hardness is only second to diamond and reaches 9 grades of Mohs. Refractive index is 1.762-1.77, and the mechanical loss factor is 5.5 × 10-9.The transparency range of sapphire single-crystal is 140-6000nm, is covered Lid VUV, visible, near-infrared have very high optical transmittance to middle-infrared band in 3000-5000nm wave bands.
The chemical stability of diamond and DLC is good, and thermal conductivity and wearability are also very outstanding.The machinery of diamond Performance can meet the requirement of concrete application by designing.Additionally, the refractive index of diamond is 2.417, the mechanical loss factor For 2.96 × 10-6.Diamond transparency range is 30-3000nm.
In sum, the physics and optical property that sapphire and diamond have more is adapted to invention with sapphire and gold Hard rock material is the low-heat noise film plating layer of Coating Materials.The low mechanical loss factor having using both materials, Ke Yi great The big Blang's thermal noise for reducing Coating Materials, while the refringence of sapphire and diamond both materials is away from larger, can be with Height film layer is formed, higher reflectivity is realized.
The content of the invention
It is an object of the invention to overcome the shortcoming of above-mentioned prior art, there is provided a kind of low-heat noise high reflection optics is combined Membrane structure and preparation method thereof.
The purpose of the present invention is achieved through the following technical solutions：
This low-heat noise high reflection optical compound film structure, with super-low expansion optical material as substrate；Plate in substrate Film, the film by sapphire film layer with diamond film layer alternate group into assembly of thin films, between sapphire film layer and diamond film layer It is combined into by bonding or optical cement mode.
Further, the super-low expansion optical material is ULE or vitreous silica.
Further, described sapphire film layer with ultralow mechanical loss factor sapphire material by forming.
Further, described diamond film layer is by with ultralow mechanical loss factor diamond or diamond-like materials Formed.
Further, the assembly of thin films is alternately produced for two kinds of film layers of sapphire film layer and diamond film layer.
The present invention also propose a kind of preparation method of above-mentioned low-heat noise high reflection optical compound film structure, specifically include with Lower step：
1) substrate is selected
Super-low expansion optical material is fabricated to into lens substrate, and it is polished, it is ensured that surface smoothness；
2) molecular beam epitaxial growth or magnetically controlled sputter method is selected to carry out plated film；
3) determination of film layer size and number
It is T that diamond film layer is the thickness of H layersH, it is T that sapphire film layer is the thickness of L layersL, the layer number of L layers is m, that The layer number of H layers be m+1, layer number n=2m+1 of total film layer；The layer number of film layer is determined according to equation below calculating：
In above formula R for optical compound film structure reflectivity, nHFor the refractive index of diamond film layer, nLFor sapphire film layer Refractive index, nsFor the refractive index of substrate.
The invention has the advantages that：
The present invention is that, with sapphire and diamond (or DLC) material as film plating layer, have pole using both materials The low mechanical loss factor, can substantially reduce Blang's thermal noise of Coating Materials, while sapphire and diamond (or diamond-like Stone) both materials refringence away from larger, height film layer can be formed, realize higher reflectivity.Present invention design Composite membrane can apply to optical reference chamber, optical interdferometer, super-narrow line width laser instrument, optics atomic clock, gravitational wave detection etc. High-tech area.
Description of the drawings
Fig. 1 is the optical compound film structure schematic diagram of the present invention.
Specific embodiment
This kind of low-heat noise high reflection optical compound film structure of the present invention, with super-low expansion optical material as substrate； Plated film in substrate, the film is by sapphire film layer with diamond film layer alternate group into assembly of thin films, sapphire film layer and diamond It is combined into by bonding or optical cement mode between film layer.In highly preferred embodiment of the present invention, the super-low expansion optics material Expect for ULE or vitreous silica.Described sapphire film layer with ultralow mechanical loss factor sapphire material by forming.It is described Diamond film layer by being formed with ultralow mechanical loss factor diamond or diamond-like materials.The assembly of thin films is Two kinds of film layers of sapphire film layer and diamond film layer are alternately produced.
The present invention also proposes a kind of preparation method of above-mentioned low-heat noise high reflection optical compound film structure, including following step Suddenly：
1) substrate is selected
Super-low expansion optical material is fabricated to into lens substrate, and it is polished, it is ensured that surface smoothness；
2) molecular beam epitaxial growth or magnetically controlled sputter method is selected to carry out plated film；
3) determination of film layer size and number
It is T that diamond film layer is the thickness of H layersH, it is T that sapphire film layer is the thickness of L layersL, the layer number of L layers is m, that The layer number of H layers be m+1, layer number n=2m+1 of total film layer；The layer number of film layer is determined according to equation below calculating：
In above formula R for optical compound film structure reflectivity, nHFor the refractive index of diamond film layer, nLFor sapphire film layer Refractive index, nsFor the refractive index of substrate.
The present invention is described in further detail below in conjunction with the accompanying drawings：
Referring to Fig. 1：H layers are high refractive index layer, i.e. diamond film layer；L layers are low-index film, i.e. sapphire film Layer, n is film layer total quantity.ULE is ultra-low expansion glass (Ultralow-Expansion Glass), and FS is vitreous silica (Fused Silica)。
First select plated film substrate, such as ultra-low expansion glass (Ultralow-Expansion Glass are abbreviated as ULE), The super-low expansion optical materials such as vitreous silica (Fused Silica are abbreviated as FS) are used as substrate；According to the attribute of plated film layer material Suitable coating technique (such as molecular beam epitaxial growth, magnetron sputtering technology) is selected with the purposes of plated film；It is true in coating technique Under conditions of fixed, according to the optics and other physical property requirements of plated film, with itself attribute, such as refractive index of two kinds of film layers, Based on, the thickness and respective film layer sum of theoretical calculation each film layer and the gross thickness of final film layer.According to theoretical calculation Thicknesses of layers, alternate succession and quantity, using suitable coating technique alternate plating so that the film layer plated meets the requirements. The present invention given below prepares two kinds of embodiments of thermal noise high reflection optical compound film structure：
Embodiment 1
1st, substrate is selected：FS (vitreous silica) is made into the mirror of satisfactory certain size (including thickness, diameter etc.) Piece substrate, and it is polished, it is ensured that its surface smoothness, to ensure the quality of plated film；
2nd, the present invention selects two kinds of film layers (sapphire film layer and diamond film layer) alternately to plate：In order to obtain relatively low machinery Fissipation factor, sapphire film layer and diamond film layer must all have very high hardness.Sapphire and diamond itself are Jing has very high hardness and the very low mechanical loss factor, how to ensure plated film hardness using preferable film plating process It is one of key point of the present invention.In order to reach above-mentioned requirements, the present embodiment selects molecular beam epitaxy accretion method to carry out plated film；
3rd, the determination of film layer size and number：Under conditions of coating technique determines, according to the optics and other things of plated film Reason performance requirement, based on attribute of two kinds of film layers itself, the thickness and respective film layer sum of theoretical calculation each film layer with And the gross thickness of final film layer.It is assumed that the thickness of high refractive index layer H (diamond film layer) is TH, low-index film L (Buddha's warrior attendants Stone film layer) thickness be TL, L layer numbers be m, then H layer numbers be m+1, total film layer quantity n=2m+1.Film layer quantity determines Calculate according to equation below：
In above formula R for film layer reflectivity, nHFor the refractive index of high refractive index layer H (diamond film layer), nLFor low refraction The refractive index of rate film layer L (sapphire film layer), nsFor the refractive index of mirror substrate FS.
The substrate of plated film is vitreous silica FS, and plated film reaches reflectivity 99.999% for index, the film for 698nm wavelength Layer at least needs more than 41 layers of plated film, and diamond film individual layer physical thickness is 72.2nm, and it is more than gross thickness 1516.2nm, sapphire list Layer physical thickness is 98.87nm, and gross thickness is 1977.4nm.
Embodiment 2
1st, substrate is selected：ULE (ultra-low expansion glass) is fabricated to into the mirror of satisfactory size (including thickness, diameter) Piece substrate, and it is polished, it is ensured that its surface smoothness, to ensure the quality of plated film；
2nd, the present invention selects two kinds of film layers (sapphire film layer and diamond film layer) alternately to plate：In order to obtain relatively low machinery Fissipation factor, sapphire film layer and diamond film layer must all have very high hardness.Sapphire and diamond itself are Jing has very high hardness and the very low mechanical loss factor, how to ensure plated film hardness using preferable film plating process It is one of key point of the present invention.In order to reach above-mentioned requirements, the present embodiment selects the ways and means such as magnetron sputtering to carry out plated film；
3rd, the determination of film layer size and number：Under conditions of coating technique determines, according to the optics and other things of plated film Reason performance requirement, based on attribute of two kinds of film layers itself, the thickness and respective film layer sum of theoretical calculation each film layer with And the gross thickness of final film layer.It is assumed that the thickness of high refractive index layer H (diamond film layer) is TH, low-index film L (Buddha's warrior attendants Stone film layer) thickness be TL, L layer numbers be m, then H layer numbers be m+1, total film layer quantity n=2m+1.Film layer quantity determines Calculate according to equation below：
In above formula R for film layer reflectivity, nHFor the refractive index of high refractive index layer H (diamond film layer), nLFor low refraction The refractive index of rate film layer L (sapphire film layer), nsFor the refractive index of mirror substrate ULE.
The substrate of plated film is ULE in the present embodiment, and it is index that plated film reaches reflectivity 99.999% for 698nm wavelength, The film layer at least needs more than 39 layers of plated film, and diamond film individual layer physical thickness is 72.2nm, and it is more than gross thickness 1444nm, sapphire Individual layer physical thickness is 98.87nm, and gross thickness is 1878.5nm.

Claims (6)

1. a kind of low-heat noise high reflection optical compound film structure, it is characterised in that with super-low expansion optical material as substrate； Plated film in substrate, the film is by sapphire film layer with diamond film layer alternate group into assembly of thin films, sapphire film layer and diamond It is combined into by bonding or optical cement mode between film layer.
2. low-heat noise high reflection optical compound film structure according to claim 1, it is characterised in that the super-low expansion Optical material is ULE or vitreous silica.
3. low-heat noise high reflection optical compound film structure according to claim 1, it is characterised in that described sapphire Film layer with ultralow mechanical loss factor sapphire material by forming.
4. low-heat noise high reflection optical compound film structure according to claim 1, it is characterised in that described diamond Film layer with ultralow mechanical loss factor diamond or diamond-like materials by forming.
5. low-heat noise high reflection optical compound film structure according to claim 1, it is characterised in that the assembly of thin films It is alternately produced for two kinds of film layers of sapphire film layer and diamond film layer.
6. the preparation method of low-heat noise high reflection optical compound film structure described in a kind of claim 1, it is characterised in that include Following steps：
1) substrate is selected
Super-low expansion optical material is fabricated to into lens substrate, and it is polished, it is ensured that surface smoothness；
2) molecular beam epitaxial growth or magnetically controlled sputter method is selected to carry out plated film；
3) determination of film layer size and number；
It is T that diamond film layer is the thickness of H layersH, it is T that sapphire film layer is the thickness of L layersL, the layer number of L layers is m, then H layers Layer number be m+1, layer number n=2m+1 of total film layer；The layer number of film layer is determined according to equation below calculating：
R = ( 1 - ( n H / n L ) 2 m ( n H 2 / n s ) 1 + ( n H / n L ) 2 m ( n H 2 / n s ) ) 2
In above formula R for optical compound film structure reflectivity, nHFor the refractive index of diamond film layer, nLFor the folding of sapphire film layer Penetrate rate, nsFor the refractive index of substrate.
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