CN104697440A - Multi-light-beam cascading staircase angle reflector laser interferometer and measurement method thereof - Google Patents
Multi-light-beam cascading staircase angle reflector laser interferometer and measurement method thereof Download PDFInfo
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Abstract
The invention relates to the technical field of laser interference measurement, and specifically relates to a multi-light-beam cascading staircase angle reflector laser interferometer. The multi-light-beam cascading staircase angle reflector laser interferometer comprises a laser source, a beam splitter mirror, a staircase plane angle reflector mirror, a movable angle reflector, a photoelectric detector set and a micro-moving platform; the reflecting surface of the staircase plane angle reflector mirror is composed of n staircase planes; the space between two adjacent reflecting surfaces is shown in the specification (k is a natural number); the laser source can generate a plurality of parallel lasers; the photoelectric detector set is equipped with n photoelectric detectors which alternatively enter the maximum laser interference state or the minimum laser interference state during the laser interference measurement, and the measurement precision is shown in the specification. According to the multi-light-beam cascading staircase angle reflector laser interferometer, the counting can be carried out only under the condition that multi-light-path interference states alternatively vary during measuring, namely, an AC signal is introduced during multi-light-path interference measurement; the measurement of the DC level in the traditional laser interference measurement is converted into the AC signal measurement, and thus the interference resistance of an interference instrument can be improved.
Description
Technical field
The present invention relates to laser interferometry techniques field, be specifically related to a kind of multiple beam ladder corner reflector laser interferometer.
Background technology
The appearance of laser instrument, makes ancient interference technique be developed rapidly, and laser has that brightness is high, good directionality, monochromaticity and the feature such as coherence is good, and laser interferometry techniques is comparative maturity.Laser interferometry system is applied widely: the measurement of accurate length, angle is as the detection of linear scale, grating, gauge block, precision lead screw; Position detecting system in exact instrument is as the control of precision optical machinery, correction; Position detecting system in large scale integrated circuit specialized equipment and detecting instrument; Minute sized measurement etc.In most of laser interference length-measuring system, all have employed Michelson interferometer or similar light channel structure.
The light beam that single frequency laser interferometer sends from laser instrument, is divided into two-way by spectroscope after beam-expanding collimation, and reflects can be combined in spectroscope from stationary mirror and moving reflector respectively and produce interference fringe.When moving reflector moves, the light intensity change of interference fringe is converted to electric impulse signal by the photo-electric conversion element in receptacle and electronic circuit etc., after shaping, amplification, input up-down counter calculate overall pulse number, calculating formula L=N × λ/2 are pressed again by robot calculator, in formula, λ is optical maser wavelength (N is electric pulse sum), calculates the displacement L of moving reflector.When using single frequency laser interferometer, require that ambient atmosphere is in steady state (SS), various air turbulence all can cause DC level change and affect measurement result.
One of weakness of single frequency laser interferometer is exactly seriously affected by environment, and severe at test environment, when measuring distance is longer, this shortcoming is very outstanding.Its reason is that it is a kind of direct current measurement system, must have the drawback of the gentle level drift of direct current light.When laser interferometer moveable mirror moves, photelectric receiver can output signal, if signal has exceeded the triggering level of counter, will go on record, if and laser beam intensity changes, with regard to likely making photosignal make counter stop counting lower than the triggering level of counter, the main cause of laser intensity or interference signal Strength Changes is made to be air turbulence, lathe mist of oil, cutting swarf is on the impact of light beam, and skew or corrugated distortion occur result light beam.
Single frequency laser interferometer is owing to measuring the problem of structure, and its measuring accuracy is limited to the wavelength of laser, and its precision can only be generally the integral multiple of its wavelength, is difficult to promote again, and the change of measurement environment simultaneously has considerable influence to measurement result.Along with the requirement of commercial production to precision measurement is more and more higher, the measuring accuracy of surveying instrument is had higher requirement.
Summary of the invention
The object of the invention is to overcome existing laser interferometer measurement precision and only can measure integral multiple wavelength in acquisition laser interference, measuring accuracy is difficult to the drawback promoted, on the basis of existing Michelson laser interferometer, in conjunction with micrometric displacement structure, except angle of critical deformation catoptron integral multiple can be obtained except the displacement part of optical maser wavelength, can also measure the displacement part obtaining being less than optical maser wavelength, therefore this laser interferometer improves the measuring accuracy of conventional laser interference measuring instrument greatly.Simultaneously due to multi-pass interference state checker, there is higher antijamming capability to the environmental change of optical path.
In order to realize foregoing invention object, the technical solution used in the present invention is:
A kind of multiple beam ladder corner reflector laser interferometer, comprise lasing light emitter, spectroscope, notch cuttype corner reflector, angle of critical deformation catoptron, photodetector group and micromotion platform, described lasing light emitter comprises n collimated laser beam, wherein n>=2, described photodetector group comprises n photodetector; Two reflectings surface of described notch cuttype corner reflector are at a right angle, and each reflecting surface is n and becomes the step-like plane of reflection, and adjacent two described plane of reflection spacing are
wherein k is natural number, λ is the optical maser wavelength that lasing light emitter sends; Described notch cuttype corner reflector is connected with removable micromotion platform; The laser that described lasing light emitter sends is through described spectroscope, and every Shu Jiguang injects described notch cuttype corner reflector respectively after reflection, reflects the laser light to corresponding each described photodetector after the internal reflection of described notch cuttype corner reflector; The laser that described lasing light emitter sends is through described spectroscope, and every Shu Jiguang of direct transmission incides described angle of critical deformation catoptron back reflection respectively to corresponding each photodetector.
The laser beam quantity that the lasing light emitter of this laser interferometer sends, the quantity of photodetector are n (n >=2), and be one_to_one corresponding, notch cuttype corner reflector has two reflective steps faces at a right angle, each reflective steps face comprises n the plane of reflection, and the reflecting surface of angle of critical deformation catoptron is two orthogonal planes.Every Shu Jiguang that lasing light emitter is launched is divided into two-way, wherein a road laser by dichroic mirror to notch cuttype corner reflector, after the reflection of the reflective steps face of notch cuttype corner reflector, then reflex to spectroscope, after reflect and finally incide one of them photodetector in detector set; Laser another road laser after transmission direct in spectroscope that this lasing light emitter is launched, spectroscope is reflexed to again after inciding angle of critical deformation catoptron, spectroscope reflects it to same photodetector again, and this photodetector can detect this two-way optical path difference and be subjected to displacement in process whether produce the strongest interference state or the most weak interference at angle of critical deformation catoptron.Due to two planes of reflection adjacent on notch cuttype corner reflector equidistantly and become stairstepping, therefore each Shu Jiguang that lasing light emitter is launched is not identical by the light path of the light path after the cascaded surface reflection of notch cuttype corner reflector, the retardation values arrived after every Shu Jiguang that lasing light emitter is launched simultaneously is divided into two-way after corresponding photodetector is all not identical, the interference that this laser interferometer produces is not only relevant with the wavelength of laser, also there is relation with two plane of reflection height difference in reflective steps face, because adjacent two plane of reflection spacing h of this cascaded surface (i.e. the stepped appearance plane of reflection) equal
wherein k is natural number, λ is the optical maser wavelength that lasing light emitter sends, and this difference brings two of adjacent two planes of reflection bundle laser light path differences to be
because in optical path difference formula, k λ can't affect the interference state of this laser beam, only have
difference just can have an impact to the interference state of this laser beam, therefore, as long as angle of critical deformation catoptron generation relative displacement, move it distance equal or integral multiple in
distance, the photodetector on this detector just can detect that it is in the change of laser interference state, therefore the accuracy of detection of this laser interferometer then corresponding optical maser wavelength of bringing up to
can only accuracy of detection be for laser wavelength lambda relative to existing laser interferometer, this measuring accuracy is significantly improved, and namely this measuring accuracy is determined by the spacing (also can be described as height or thickness) of adjacent two planes of reflection in reflective steps face on notch cuttype corner reflector and the optical maser wavelength of lasing light emitter.
In addition, due to notch cuttype corner reflector being connected with micromotion platform, this micromotion platform refers to that very little displacement can occur for it, the micrometric displacement structure of precision Da Na meter.Because notch cuttype corner reflector is connected on micromotion platform, when micromotion platform keeps motionless, during angle of critical deformation catoptron generation certain displacement, this photodetector can record length accuracy and be
the quantity of laser interference ripple, the precision now measured due to photodetector be integral multiple in
laser interference wave number amount, does not comprise and is less than
length thereof Δ d, this part also and and can not embody with the interference quantity of laser interference ripple, the reaction of distance d size that therefore the laser interference wave number amount of this measurement is corresponding be in fact in the actual distance that is subjected to displacement of angle of critical deformation catoptron integral multiple in
length thereof; When angle of critical deformation catoptron keeps motionless, micromotion platform is subjected to displacement, corresponding notch cuttype corner reflector also can be subjected to displacement, notch cuttype corner reflector after being subjected to displacement can change the light path of corresponding laser beam, two bundle laser light path differences thus received by photodetector change, the change of laser interference state can be produced, until photodetector detects when creating a laser interference ripple, micromotion platform stops displacement, now can calculate being less than of angle of critical deformation mirror displacements part according to the distance that micromotion platform is subjected to displacement
the displacement Δ d of length.
Therefore, this laser interferometry instrument accurately can be measured and obtain angle of critical deformation catoptron displacement length more accurately, and its measuring accuracy can record and be less than
the displacement part of length, thus improve measuring accuracy.
Owing to adopting multi-pass interferometry, in measuring process, the DC level that each photodetector detects should alternately change, if the DC level that the change of the measurement environment of a certain light path causes photodetector to measure offsets, and there is not alternately change in the DC level that the photodetector of other optical path detects, now think that this optical path is the impact being subject to measurement environment, ignore the change of its level.If the DC level that the change of the measurement environment of many light paths causes multiple photodetector to measure offsets, then think that measurement environment changes, ignore the change of its level.Only the situation strictly meeting the alternately change of multi-pass interference state in measuring process is just counted it, namely introduce AC signal in multi-pass interferometry, the measurement of DC level in traditional laser interferometry is converted to the measurement of AC signal.
Preferably, on the reflective steps face of described notch cuttype corner reflector, the spacing of adjacent two planes of reflection is equal, is equal to
wherein λ is the optical maser wavelength that lasing light emitter sends.
As the preferred embodiment of the present invention, described micromotion platform is piezoelectric ceramics.
Preferably, the displacement size that the described piezoelectric ceramics surface connecting described notch cuttype corner reflector produces is the optical maser wavelength of described lasing light emitter, and its displacement accuracy reaches nano-precision.
As the preferred embodiment of the present invention, in the multi beam parallel laser that described lasing light emitter generates, the spacing of adjacent laser beams is the integral multiple of optical maser wavelength.
The present invention also provides a kind of measuring method of above-mentioned multiple beam ladder corner reflector laser interferometer, and step comprises:
Step one, described notch cuttype corner reflector to be fixed on described micromotion platform, to adjust the position of described lasing light emitter, spectroscope, notch cuttype corner reflector, angle of critical deformation catoptron, photodetector;
Step 2, start described lasing light emitter, the laser that described lasing light emitter sends is to described dichroic mirror, laser after reflection injects corresponding described notch cuttype corner reflector, at the right angle reflective surface of described notch cuttype corner reflector to the described photodetector of correspondence; The laser that described lasing light emitter sends is to described spectroscope, laser after transmission incides described angle of critical deformation catoptron, reflex to described photodetector through described angle of critical deformation catoptron, photodetector can detect laser interference state, and optical interference circuit has adjusted;
Step 3, first described angle of critical deformation catoptron is fixed on the initial measuring position of measurand, now control described micromotion platform to move, described notch cuttype corner reflector is moved along laser incident direction or reflection direction, when described photodetector records a laser interference ripple, fixing described micromotion platform, by described angle of critical deformation catoptron at optical interference circuit direction displacement d, it be the quantity of the laser interference ripple of λ is N (n photodetector detects that interference wave adds up to N) that corresponding described photodetector records wavelength, the displacement obtaining described angle of critical deformation catoptron is now calculated according to laser wavelength lambda
Step 4, fixing described angle of critical deformation catoptron, control described micromotion platform to move, described notch cuttype corner reflector is moved in described laser incident direction, when described photodetector records an interference wave again, now micromotion platform displacement is set to l, the distance, delta d be not then detected in tested distance is l, can obtain step 3 survey displacement d exact value be
Because the moving direction of micromotion platform in above-mentioned steps four is the direction along laser incidence, so the displacement l of its micromotion platform is equivalent to the light path 2l adding this beam laser, if another light beam light path amount 2 Δ d that the partial distance Δ d that the light path recruitment of this beam laser just in time equals to be less than in angle of critical deformation catoptron displacement optical maser wavelength brings, i.e. 2 Δ d=2l, so Δ d=l, the displacement that therefore can obtain angle of critical deformation catoptron more accurately value is
When the direction that the sense of displacement of notch cuttype corner reflector is along laser reflection, the displacement l of its micromotion platform is equivalent to the light path 2l decreasing this beam laser, if the light path reduction of this beam laser adds another light beam light path amount that the partial distance Δ d being less than optical maser wavelength in angle of critical deformation catoptron displacement brings, just in time equal one and interfere wavelength
namely
therefore, the displacement of the angle of critical deformation catoptron that can be obtained by the method more accurately value is
In sum, owing to have employed technique scheme, the invention has the beneficial effects as follows: this multiple beam ladder corner reflector laser interferometer is by arranging a removable micromotion platform, notch cuttype corner reflector is subjected to displacement, coordinate angle of critical deformation catoptron, lasing light emitter, spectroscope, photodetector, the fraction part of the interference wave cannot measured in laser interference process can be obtained, the measuring accuracy of laser interferometer can be improved further.Simultaneously owing to adopting multi-pass interferometry, in measuring process, the DC level that each photodetector detects should alternately change, if the DC level that the change of the measurement environment of a certain light path causes photodetector to measure offsets, and there is not alternately change in the DC level that the photodetector of other optical path detects, now think that this optical path is the impact being subject to measurement environment, ignore the change of its level.If the DC level that the change of the measurement environment of many light paths causes multiple photodetector to measure offsets, then think that measurement environment changes, ignore the change of its level.Only the situation strictly meeting the alternately change of multi-pass interference state in measuring process is just counted it, namely AC signal is introduced in multi-pass interferometry, the measurement of DC level in traditional laser interferometry is converted to the measurement of AC signal, improves the antijamming capability of interferometer.
Accompanying drawing explanation
Fig. 1 is laser interferometry schematic diagram of the present invention
Fig. 2 is the notch cuttype corner reflector schematic diagram that embodiment 1 adopts
Fig. 3 is laser beam spacing schematic diagram
Fig. 4 is laser interference range measurement principle figure
Reference numeral: 1-lasing light emitter, 11-laser beam one, 12-laser beam two, 13-laser beam three, 14-laser beam four, 2-spectroscope, 3-micromotion platform, 4-notch cuttype corner reflector, 5-angle of critical deformation catoptron, 6-photodetector group, 61-photodetector one, 62-photodetector two, 63-photodetector three, angle of critical deformation catoptron measuring position, 64-photodetector four, 7-angle of critical deformation catoptron measuring position one, 8-two.
Embodiment
In order to make object of the present invention, technical scheme and advantage clearly understand, below in conjunction with drawings and Examples, the present invention will be further described.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
Embodiment 1
As shown in Figure 1, a kind of multiple beam ladder corner reflector laser interferometer, comprise lasing light emitter 1, spectroscope 2, micromotion platform 3, notch cuttype corner reflector 4, angle of critical deformation catoptron 5, photodetector group 6, described lasing light emitter 1 comprises n collimated laser beam, wherein n>=2, described photodetector group 6 comprises n photodetector, and two reflectings surface of notch cuttype corner reflector are at a right angle, each reflecting surface is n notch cuttype plane, and adjacent two plane of reflection spacing are
(k is natural number); One end of described notch cuttype corner reflector is connected with removable micromotion platform; The laser that described lasing light emitter 1 sends is through described spectroscope 2, and every Shu Jiguang injects notch cuttype corner reflector 4 respectively after reflection, reflects the laser light to corresponding each photodetector after the internal reflection of described notch cuttype corner reflector 4; The laser that described lasing light emitter 1 sends is through described spectroscope 2, and every Shu Jiguang of direct transmission incides described angle of critical deformation catoptron 5 back reflection respectively to corresponding each photodetector.
As shown in Figure 3, four laser beam are equally spaced, and namely select n=4, are respectively laser beam 1, laser beam 2 12, laser beam 3 13, laser beam 4 14, and the spacing e of adjacent two laser beam equals the integral multiple of optical maser wavelength.Spacing e between adjacent two laser beam is 100-10000 optical maser wavelength doubly.If select adjacent two laser beam spacing e to be 10000 times of optical maser wavelength, then can select the optical maser wavelength of 663 nanometers, the spacing e of so adjacent two laser beam is 6.63 millimeters.Corresponding photodetector group 6 is also respectively four, i.e. photodetector 1, photodetector 2 62, photodetector 3 63, photodetector 4 64.
N=4 is selected, adjacent two plane of reflection height difference in the reflective steps face of notch cuttype corner reflector in the present embodiment
the optical path difference △ d that can calculate the two bundle laser that adjacent two planes of reflection reflect is λ/4, therefore, as long as angle of critical deformation catoptron 5 carries out the distance of mobile λ/8 or integral multiple in the distance of λ/8, photodetector group on this detector 6 all has one of them to detect, and it is in the strongest interference state of laser, therefore the accuracy of detection of this laser interferometer then becomes λ/8, can only accuracy of detection be for laser wavelength lambda relative to existing laser interferometer, this measuring accuracy is significantly improved, namely this measuring accuracy is determined by the spacing (also can be described as height or thickness) of adjacent two notch cuttypes of the cascaded surface of notch cuttype corner reflector 4 and the optical maser wavelength of lasing light emitter 1.
When laser beam 1 be in the strongest interference state time, the retardation values after the laser that namely laser beam 1 sends is divided into two-way is integral multiple a
1λ, a
1for natural number.By photodetector 1 measure can go out laser interference state, now laser beam 2 12 to optical interference circuit, laser beam 3 13 to optical interference circuit and laser beam 4 14 the two-way retardation values of optical interference circuit is respectively: a
2λ-λ/4, a
3λ-λ/2, a
4λ-3 λ/4, wherein a
2, a
3, a
4for natural number, three's light path is now all in the strongest non-interference state.
When angle of critical deformation catoptron 5 moves λ/8, the two-way laser retardation values that laser beam 1 is divided into increases λ/4, and other laser beam optical path difference △ d also corresponding increase λ/4 of lasing light emitter 1, now, the retardation values that the laser that laser beam 1 sends is divided into two-way is a
1λ+λ/4, are in non-interfering state, and the retardation values that the laser that laser beam 2 12 sends is divided into two-way then becomes a
2λ, therefore photodetector 2 62 can detect that optical interference circuit will be in the strongest interference state, can measure it be in the strongest interference state of laser by photodetector 2 62, and the laser of laser beam 3 13 and laser beam 4 14 will be in the strongest non-interference state.When angle of critical deformation catoptron 5 moves λ/4, laser beam 3 13 will be in the strongest interference state to optical interference circuit, be measured can go out the strongest interference state of laser by photodetector 3 63.
Similar, when angle of critical deformation catoptron 5 moves 3 λ/8, when the two-way laser retardation values that laser beam 1 is divided into increases by 3 λ/4, laser light path difference also corresponding increase by 3 λ/4 of other laser beam, the retardation values that the laser that now laser beam 4 14 sends is divided into two-way then becomes a
4λ, the two-way light path that its laser beam is divided into will be in the strongest interference state, be measured can go out the strongest interference state of laser by photodetector 4 64.
Again, when angle of critical deformation catoptron 5 moves λ/2, when the two-way laser retardation values that laser beam 1 is divided into increases λ, the laser light path difference also corresponding increase λ of other laser beam, laser beam 1 will be in again the strongest interference state to optical interference circuit, be measured can go out the strongest interference state of laser by photodetector 1.Therefore, be just λ/8 for the measuring accuracy corresponding to the laser interferometer corresponding to four-step laser reflection structure, namely angle of critical deformation catoptron 5 displacement is equal to or greater than λ/8, and corresponding photodetector group 6 can either observe the interference state significant change of the light path of four laser that lasing light emitter 1 is launched.
The micromotion platform 3 of above-mentioned indication refers to that device of very little displacement can occur for it, and its mobile accuracy is nano-precision.
Preferably this micromotion platform 3 is piezoelectric ceramics.Piezoelectric ceramics is a kind of ceramic material mechanical energy and electric energy can changed mutually, its deformation quantity produced under electric field action is very little, be no more than at most the micrometric displacement of 1/10000000th of size own, have repetitive distortion recovery capability, good stability, precision are high.
The present invention also provides a kind of measuring method of above-mentioned multiple beam ladder corner reflector laser interferometer,
Step one, described notch cuttype corner reflector to be fixed on described micromotion platform, to adjust the position of described lasing light emitter, spectroscope, notch cuttype corner reflector, angle of critical deformation catoptron, photodetector;
Step 2, start described lasing light emitter, the laser that described lasing light emitter sends is to described dichroic mirror, laser after reflection injects corresponding described notch cuttype corner reflector, at the right angle reflective surface of described notch cuttype corner reflector to the described photodetector of correspondence; The laser that described lasing light emitter sends is to described spectroscope, laser after transmission incides described angle of critical deformation catoptron, reflex to described photodetector through described angle of critical deformation catoptron, photodetector can detect laser interference state, and optical interference circuit has adjusted;
Step 3, first described angle of critical deformation catoptron is fixed on the initial measuring position of measurand, now control described micromotion platform to move, described notch cuttype corner reflector is moved along laser incident direction or reflection direction, when described photodetector records a laser interference ripple, i.e. the strongest interference state or the most weak interference state, fixing described micromotion platform, by described angle of critical deformation catoptron at optical interference circuit direction displacement d, it be the quantity of the laser interference ripple of λ is N (n photodetector detects that interference wave adds up to N) that corresponding described photodetector records wavelength, the displacement obtaining described angle of critical deformation catoptron is now calculated according to laser wavelength lambda
Step 4, fixing described angle of critical deformation catoptron, control described micromotion platform to move, described notch cuttype corner reflector is moved in described laser incident direction, when described photodetector records an interference wave again, i.e. the strongest interference state or the most weak interference state, now micromotion platform displacement is set to l, then the distance, delta d be not detected in tested distance is l, can obtain step 3 survey displacement d exact value be
When the direction that the sense of displacement of notch cuttype corner reflector is along laser reflection, the displacement l of its micromotion platform is equivalent to the light path 2l decreasing this beam laser, if the light path reduction of this beam laser adds another light beam light path amount that the partial distance Δ d being less than optical maser wavelength in angle of critical deformation catoptron displacement brings, just in time equal one and interfere wavelength
namely
therefore, the displacement of the angle of critical deformation catoptron that can be obtained by the method more accurately value is
Owing to adopting multi-pass interferometry, in measuring process, the DC level that each photodetector detects should alternately change, if the DC level that the change of the measurement environment of a certain light path causes photodetector to measure offsets, and there is not alternately change in the DC level that the photodetector of other optical path detects, now think that this optical path is the impact being subject to measurement environment, ignore the change of its level.If the DC level that the change of the measurement environment of many light paths causes multiple photodetector to measure offsets, then think that measurement environment changes, ignore the change of its level.Only the situation strictly meeting the alternately change of multi-pass interference state in measuring process is just counted it, namely AC signal is introduced in multi-pass interferometry, the measurement of DC level in traditional laser interferometry is converted to the measurement of AC signal, improves the antijamming capability of interferometer.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any amendments done within the spirit and principles in the present invention, equivalent replacement and improvement etc., all should be included within protection scope of the present invention.
Claims (6)
1. a multiple beam ladder corner reflector laser interferometer, comprise lasing light emitter, spectroscope, notch cuttype corner reflector, angle of critical deformation catoptron, photodetector group and micromotion platform, it is characterized in that, described lasing light emitter comprises n collimated laser beam, wherein n>=2, described photodetector group comprises n photodetector, and described notch cuttype corner reflector comprises two reflectings surface at a right angle, reflecting surface is n the plane of reflection becoming notch cuttype, and the spacing of adjacent two planes of reflection equals
wherein k is natural number, λ is the optical maser wavelength that lasing light emitter sends; The laser that each described lasing light emitter sends, after described dichroic mirror, injects a corresponding plane of reflection respectively, and each described plane of reflection is by corresponding laser beam reflection each photodetector to corresponding described photodetector group; Every Shu Jiguang that described lasing light emitter sends, after described spectroscope transmission, reflexes to each photodetector of corresponding photodetector group again after inciding described angle of critical deformation catoptron respectively; Described notch cuttype corner reflector is connected on described micromotion platform.
2. multiple beam ladder corner reflector laser interferometer according to claim 1, it is characterized in that, described micromotion platform is piezoelectric ceramics.
3. multiple beam ladder corner reflector laser interferometer according to claim 1, is characterized in that, in the multi beam parallel laser that described lasing light emitter generates, the spacing of adjacent laser is the integral multiple of optical maser wavelength.
4. multiple beam ladder corner reflector laser interferometer according to claim 1, it is characterized in that, along with the movement of described angle of critical deformation catoptron in optical interference circuit direction, due to the optical interference circuit optical path difference of the different laser beam of lasing light emitter injection, each laser interference light path will alternately be in the strongest interference state of laser or the most weak interference state.
5. a measuring method for the multiple beam ladder corner reflector laser interferometer described in above-mentioned any one claim, is characterized in that, comprise the following steps:
Step one, described notch cuttype corner reflector to be fixed on described micromotion platform, to adjust the position of described lasing light emitter, spectroscope, notch cuttype corner reflector, angle of critical deformation catoptron, photodetector;
Step 2, start described lasing light emitter, the laser that described lasing light emitter sends is to described dichroic mirror, laser after reflection injects corresponding described notch cuttype corner reflector, at the right angle reflective surface of described notch cuttype corner reflector to the described photodetector of correspondence; The laser that described lasing light emitter sends is to described spectroscope, laser after transmission incides described angle of critical deformation catoptron, reflex to described photodetector through described angle of critical deformation catoptron, photodetector can detect laser interference state, and optical interference circuit has adjusted;
Step 3, first described angle of critical deformation catoptron is fixed on the initial measuring position of measurand, now control described micromotion platform to move, described notch cuttype corner reflector is moved along laser incident direction or reflection direction, when described photodetector records a laser interference ripple, fixing described micromotion platform, by described angle of critical deformation catoptron at optical interference circuit direction displacement d, it be the quantity of the laser interference ripple of λ is N (n photodetector detects that interference wave adds up to N) that corresponding described photodetector records wavelength, the displacement obtaining described angle of critical deformation catoptron is now calculated according to laser wavelength lambda
Step 4, fixing described angle of critical deformation catoptron, control described micromotion platform to move, described notch cuttype corner reflector is moved in described laser incident direction, when described photodetector records an interference wave again, now micromotion platform displacement is set to l, the distance, delta d be not then detected in tested distance is l, can obtain step 3 survey displacement d exact value be
6. the measuring method of multiple beam ladder corner reflector laser interferometer according to claim 5, it is characterized in that, the sense of displacement of the described notch cuttype corner reflector in described step 4 is the direction along described laser reflection, and the displacement of the so last described angle of critical deformation catoptron obtained more accurately value is
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| CN104964642A (en) * | 2015-06-29 | 2015-10-07 | 成都信息工程大学 | Magnetic micro-displacement platform type ladder angle mirror laser interferometer, calibration method and measurement method |
| CN105300275A (en) * | 2015-11-27 | 2016-02-03 | 成都信息工程大学 | Wavelength correction type multi-beam and multistep plane reflecting mirror laser interferometer and measuring method thereof |
| CN105352435A (en) * | 2015-11-27 | 2016-02-24 | 成都信息工程大学 | Laser wavelength correction type corner reflector laser interferometer and measuring method |
| CN105371756A (en) * | 2015-12-01 | 2016-03-02 | 成都信息工程大学 | Wavelength modification multiple beam cascade step angle reflector laser interferometer and laser wavelength modification method thereof |
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