CN104677299A - Film detection device and method - Google Patents

Film detection device and method Download PDF

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Publication number
CN104677299A
CN104677299A CN201310618148.7A CN201310618148A CN104677299A CN 104677299 A CN104677299 A CN 104677299A CN 201310618148 A CN201310618148 A CN 201310618148A CN 104677299 A CN104677299 A CN 104677299A
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lens
film detecting
detecting device
illuminating bundle
measured
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周钰颖
王帆
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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Abstract

The invention discloses a film detection device which is characterized by comprising a light source, an optical element unit, a filter, an area-array detector and a processor, wherein the light source is used for providing illuminating beams comprising different wave bands; the optical element unit comprises an objective lens and is used for irradiating the illuminating beams to an object to be detected through the objective lens and collecting the reflected beams of the object to be detected; the filter is used for separating the illuminating beams of different wave bands and the reflected beams in space; the area-array detector is located on an objective lens pupil plane or the conjugate surface of the objective lens pupil plane to collect the angular spectrum information of the reflected beams; the processor is used for analyzing and calculating the angular spectrum information.

Description

A kind of film detecting device and method
Technical field
The present invention relates to a kind of semiconductor fabrication process technical field, particularly relate to a kind of film detecting device and method.
Background technology
Thin film testing widely uses at industrial circle, using thickness to detect to control technique, ensureing product quality, improving yield as all needed in many technological processs such as deposition, photoetching, etching, CMP of semiconductor fabrication process.
Thin film testing needs the thickness measuring monofilm or multilayer film, sometimes also needs to measure n, k value, and conventional detection means is that reflectometer is measured or ellipsometer measurement.For obtaining more information to improve measuring accuracy, the method for multi-wavelength measurement, multiangular measurement can be adopted.For realizing multi-wavelength and multiangular measurement, spectrometer is usually used to divide photodetection to measuring beam; If desired measure the information of different angles simultaneously, then need the angle changing illumination path and receiving light path, or change stop position is measured to select the reflected light of different angles, calculates thickness and optical constant by measurement result.
Patent US5166752 describes a kind of beam lighting sample using certain incident angle range, and measure the ellipsometer of different angles reflected light polarization information simultaneously, but this device can only measure the polarization information on a slit, the polarization information of different orientations cannot be measured.Patent US8139232 describes a kind of use convergent beam illuminated sample, and the ellipsometer of measured angular spectrum information, this measurement mechanism single only can use a kind of wavelength to measure, and realize multi-wavelength measurement needs to switch illumination wavelengths, cannot carry out multi-wavelength measurement simultaneously.
The polarization information that above-mentioned two schemes all cannot carry out multi-wavelength and whole angular spectrum is simultaneously measured and obtains more high precision measured thin film result.
Patent CN200980110569 describes a kind of pollution detection equipment, uses the broadband optical illumination sample of linear polarization, and uses the spectral information of a certain specific polarization component of spectrometer measurement reflected light; This measurement mechanism changes (skew of minimum intensity of light position corresponding wavelength) by measure spectrum zero-bit, calculates the deposit thickness of pollutant.This device adopts spectral measurement mode to obtain the reflective light intensity information of different wave length, with calculated thickness, but not adopts angular spectrum metering system acquisition different incidence angles and azimuthal reflective light intensity information to calculate thickness.
Summary of the invention
In order to overcome the defect existed in prior art, the invention provides a kind of can measure rete simultaneously thickness and optical constant film detecting device and method.
In order to realize foregoing invention object, the present invention discloses a kind of film detecting device, it is characterized in that, comprising: light source, for the illuminating bundle of providing package containing different-waveband; Optical element unit, comprises object lens, and this optical element unit for illuminating bundle is irradiated to object to be measured by these object lens, and collects the folded light beam of this object to be measured; Wave filter, is spatially separated for the illuminating bundle or folded light beam making different-waveband; Planar array detector, is positioned at the conjugate plane in this object lens pupil face or object lens pupil face to gather the angular spectrum information of folded light beam; Processor, for carrying out analytical calculation to this angular spectrum information.
Further, this light source is a broadband light source or multiple monochromatic source, and this light source comprises collimation camera lens.
Further, this optical element unit comprises the polarizer.
Further, the direction of this illuminating bundle is vertical with subject surface to be measured, this optical element unit also comprises beam splitting element, this illuminating bundle is surperficial to this measurand by this polarizer, beam splitting element and objective lens entrance successively, passed through these object lens, beam splitting element by after the reflection of this measurand, finally received by this planar array detector.
Further, this beam splitting element is right angle Amici prism or semi-transparent semi-reflecting lens.
Further, the numerical aperture of these object lens is more than 0.9.
Further, direction and the subject surface to be measured of this illuminating bundle have angle, these object lens comprise front group of lens and rear group of lens, after this illuminating bundle incides this measurand surface by this polarizer and front group of lens tilt, reflexed to rear group of lens by this measurand, finally received by this planar array detector.
Further, the numerical aperture of these object lens is 0.2 ~ 0.3.
Further, also analyzer is comprised between this object to be measured and planar array detector.
Further, this optical element unit comprises whirl compensator.
Further, this wave filter is narrow band pass filter, and this wave filter is between these light source and object lens.
Further, this wave filter is narrow band pass filter, and this wave filter is between this object to be measured and planar array detector.
Further, this light source comprises two monochromatic sources and the dichroic light beam bundling device of different luminescence band, and the illuminating bundle of these two monochromatic sources is respectively by this dichroic light beam bundling device transmittance and reflectance.
Further, also comprise beam splitter before this planar array detector, this beam splitter is used for the folded light beam of different-waveband to guide to different planar array detectors.This beam splitter is dichroic light splitting piece or the right angle Amici prism being coated with dichroic spectro-film.
The present invention discloses the method that film detecting device carries out thin film testing simultaneously, this light source sends the illuminating bundle comprising different-waveband, this illuminating bundle enters this optical element unit, by being irradiated on object to be measured after these object lens, this optical element unit collects the folded light beam of this object to be measured, this wave filter makes the illuminating bundle of different-waveband or folded light beam spatially be separated, gathered the angular spectrum information of folded light beam by this planar array detector, final processor carries out analytical calculation to this angular spectrum information.
Compared with prior art, film detecting device provided by the present invention, can measure whole angular spectrum face, and can measure multiple wavelength simultaneously.By simultaneously to multiple wavelength and whole angular spectrum planar survey, can more metrical information be obtained, thickness and the optical constant of rete can be measured simultaneously, also can measure more complicated multi-layer film structure, and precision, raising technique applicability can be improved, shorten multi-wavelength Measuring Time.
Accompanying drawing explanation
Can be further understood by following detailed Description Of The Invention and institute's accompanying drawings about the advantages and spirit of the present invention.
Fig. 1 is the first embodiment of film detecting device provided by the present invention;
Fig. 2 is the second embodiment of film detecting device provided by the present invention;
Fig. 3 is the third embodiment of film detecting device provided by the present invention;
Fig. 4 is the 4th kind of embodiment of film detecting device provided by the present invention;
Fig. 5 is the angular spectrum reflectance map of two wavelength of film detecting device provided by the present invention.
Embodiment
Specific embodiments of the invention are described in detail below in conjunction with accompanying drawing.
Thin film testing needs the thickness measuring monofilm or multilayer film, sometimes also needs to measure n value (refractive index), k value (absorptivity), and conventional detection means is that reflectometer is measured or ellipsometer measurement.Wherein reflectometer is by measuring the reflective light intensity of sample, calculates the reflectivity of sample.By measuring the reflectivity of different angles or different wave length, reflectivity and modeling and simulating (as RCWA algorithm simulating) will be surveyed when measuring wavelength and incident angle, the reflectivity obtained under different-thickness and n, k value condition compares, be met the modeling parameters (or find immediate data sample from precalculating the database that obtains, determine modeling parameters) of condition.The reflectivity Rp of ellipsometer measurement polarized light after sample reflection and Rs complex ratio, wherein Rp is the reflectivity that direction of vibration is positioned at the electric field of plane of incidence, and Rs is the reflectivity of direction of vibration perpendicular to the electric field of plane of incidence.Rp and Rs is plural number, and all relevant with measurement optical wavelength, incident angle, measurand thickness, optical constant.Ellipsometer parameter is defined as follows
Wherein for the change of polarized light, , , with be respectively direction of vibration and be positioned at the phase place of the electric field of plane of incidence and the direction of vibration phase place perpendicular to the electric field of plane of incidence.
By modeling and simulating (as RCWA algorithm simulating), can obtain under specified wavelength, incident angle, incident light polarization state and analyzer direction, different-thickness and n, k value condition with .Measured result is calculated with compare with simulation architecture, be met the modeling parameters of condition.
Measure the angular spectrum reflectivity information of multi-wavelength simultaneously, the information of different incidence angles and different wave length can be obtained in shorter Measuring Time, can measuring accuracy be improved, adapt to different process condition.
Fig. 1 is a kind of embodiment of the technical program.As shown in fig. 1,1 is light source cell, for the illuminating bundle of providing package containing different-waveband.Light source cell 1 comprises the light source 11 with certain spectral bandwidth, can be Halogen lamp LED, xenon lamp etc., and 12 is collimation camera lens; 3 is optical unit, comprises beam splitting element 47, objective lens 48, the polarizer 41 and wave filter 74.Beam splitter 47 can use right angle Amici prism or semi-transparent semi-reflecting lens.Camera lens 48 can adopt transmission-type or reflective eyeglass, and NA is 0.25 or larger, converges in measurand 61, form small size illumination spot 49 by light beam with certain angle.Wherein, measurand 61 can be transparent or semitransparent rete, as oxide, nitride, polysilicon etc.The polarizer 41, through the polarized light of particular polarization, can adopt polaroid or polarizing prism.Wave filter 74 is spatially separated for the illuminating bundle or folded light beam making different-waveband.Wave filter 74 can select narrow band pass filter.In various embodiments, wave filter 74 can between described light source 11 and camera lens 48, or between object 61 to be measured and planar array detector 51.In Fig. 1 74a be, 74b, 74c be 2 (or 4 or 3) regions respectively through different wavelength, as 780nm, 633nm, 550nm, 441nm and 360nm etc., and the corresponding incident angle of every bit on wave filter 74.51 is planar array detector, and the conjugate plane in the pupil face (for sample object plane, the corresponding specific incident angle of any point and position angle on this face) or camera lens 48 pupil face that are positioned at camera lens 48 is to gather the angular spectrum information of folded light beam.Planar array detector 51 can be CCD or CMOS, all has good response for wave filter 74 through wavelength, and the conjugate position that 51 are placed in pupil face, namely each pixel corresponds to the light of different incidence angles degree.9 is processor, processes the image of detector collection, calculates thickness and the optical constant of measurand rete.65 is sports platform, carrying measurand 61, and mobile measurand is to measuring position.In the present embodiment, the direction of illuminating bundle is vertical with object 61 surface to be measured.Illuminating bundle incides measurand 61 surface by the polarizer 41, beam splitting element 47 and camera lens 48 successively, by camera lens 48, beam splitting element 47 after measurand 61 reflects, is finally received by planar array detector 51.
Measurand 61 is moved to specified measurement position by sports platform 65.The light that light source cell 1 sends, after the polarizer 41, becomes linearly polarized light, after filtering after device 74, becomes the quasi-monochromatic light that 2 bundles (or 4 bundles or 3 are restrainted) wavelength is different, through beam splitting element 47, is converged at a certain angle in measurand 61 by camera lens 48.Beam splitting element 47 can be right angle Amici prism or semi-transparent semi-reflecting lens.The light reflected through measurand 61 is received by camera lens 48, reflects, received by detector 51 through beam splitting element 47; The angular spectrum intensity signal of 2 wavelength (or 4 or 3 wavelength) measured is passed to processor 9 by detector 51, processor 9 pairs of intensity signals carry out processing the change of each wavelength reflection of acquisition with incident angle, i.e. angular spectrum reflectivity, the simulation result obtained with Modeling Calculation is compared, and finally determines thicknesses of layers and optical constant.
In the present embodiment, the position of wave filter 74 can be moved into the front of detector 51 from the below being positioned at the polarizer 41.The light of illumination object under test is broadband polarized light, and reflected light carries out filtering after optical unit receives before detector 51, and detector 51 receives the angular spectrum intensity signal of each region different wave length, and passes to processor 9 and carry out analytical calculation.
Camera lens 48 in the present embodiment adopts more than 0.8 more excellent, and numerical aperture is higher, and resolution is stronger, and cost is also higher.Adopt in Fig. 1 and 2 NA be 0.9 camera lens, measure the SiO2 film that the suprabasil thickness of Si is 102.3nm, the angular spectrum face reflectivity calculated as shown in Figure 5, left field in Fig. 5 indicated by 81 is the angular spectrum reflectivity of 441nm wavelength light, right side area indicated by 82 is the angular spectrum reflectivity of 633nm wavelength light, the result that measurement result and the different-thickness measured under wavelength and n, k value modeling and simulating obtain is mated, when matching error is less than setting threshold value, the thickness of output film and n, k value.
Optical unit in embodiment 1, can increase polarizer, realizes the measurement function of similar ellipsometer.Analyzer is placed between detector 51 and beam splitting element 47, for detecting the reflected light of special polarization state.The PSA(polarizer-sample-analyzer structure can be realized) measurement function of ellipsometer, the change of angular spectrum reflectivity and the phase place of measuring multiple wavelength polarized light change.Can also analyzer be rotated, or add whirl compensator between light source 1 and beam splitting element 47, as quarter wave plate, realize the modulation of illumination light polarization state, measure the change of angular spectrum reflectivity and the phase place change of different wave length different polarization states light beam.
Fig. 2 is the second embodiment of film detecting device provided by the present invention.Compared with the first embodiment, the second embodiment uses dichroic beamsplitter to carry out wave band light splitting, and adds the narrow band filter slice of multi-wavelength before the detectors, to measure the change of reflectivity with incident angle of 8 (or 6) wavelength simultaneously.Again the reflectivity of measurement and the reflectivity of modeling and simulating are compared, finally determine thicknesses of layers and optical constant.
As shown in Figure 2,78 is spectroscope, can be dichroic light splitting piece or the right angle Amici prism being coated with dichroic spectro-film.Through beam splitting element 47 after the light of measurand reflection is collected by camera lens 48, its medium wavelength is greater than the light transmission dichroic beamsplitter 78 of specified wavelength, and the light that wavelength is less than specified wavelength is reflected by dichroic beamsplitter 78.Before detector 51 and 52, each filter plate 75(that places is as shown in 74b or 74c in Fig. 1), respectively through the light of 8 (or 6) wavelength.Detector 51 and 52 respectively receives the angular spectrum reflective light intensity of 4 (or 3) wavelength, passes to processor 9 and carries out analytical calculation.
Fig. 3 is the 3rd embodiment of film detecting device provided by the present invention.As shown in Figure 3, optical unit 31 is adopted to converge in measurand 61 by the light of light source 1 with certain angle, direction and the subject surface to be measured of described illuminating bundle have angle, light beam through measurand reflection is collected by optical unit 32, measured the polarized light angular spectrum intensity signal of 2 wavelength by detector 51, processor 9 carries out analytical calculation.Adopt in the present embodiment NA be less than 0.5 camera lens 48, NA more excellent in 0.2 ~ 0.3 scope, numerical aperture is lower, and resolution is lower, and cost is also more just.Adopt in Fig. 3 and Fig. 4 NA be 0.25 camera lens.
Repeat element is no longer repeated, and in optical unit 1,74a is narrow band filter, and its left and right sides is respectively by the light of two kinds of colors; ; Optical unit 2 comprises object lens, described object lens comprise front group of lens 45 and rear group of lens 46, described illuminating bundle is by after the described polarizer 41 and the oblique incidence of front group of lens 45, converging to described measurand 61 surface at a certain angle, form small size illumination spot 49, rear group of lens 46 are reflexed to by described measurand, enter analyzer 42, finally received by described planar array detector 51.The placement location of wave filter can be changed, will except wave filter 74a move be placed on detector 51 before or before front group of lens 45.In the present embodiment, can also remove narrow band filter 74a, add dichroic beamsplitter 78 before the planar array detector in optical unit 2 He after measurand, metering system is with the second embodiment.
Fig. 4 is the 4th embodiment of film detecting device provided by the present invention.With the 3rd embodiment unlike light source being changed into two monochromatic sources, wave filter can use dichroic beamsplitter 78.Identical components and parts are no longer repeated.Light source 2 is made up of two monochromatic sources 21 and 22, dichroic light beam bundling device 23 and collimation camera lens 12.Wherein, light source 21 and 22 can select the laser instrument of different luminescence band, and the light that wherein light source 21 sends will be reflected by dichroic light beam bundling device 23, and the light that light source 22 sends will through dichroic light beam bundling device 23.Through the light of two kinds of wavelength that measurand 61 reflects, will reflect through dichroic beamsplitter 78 with by dichroic beamsplitter 78 respectively.
Just preferred embodiment of the present invention described in this instructions, above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.

Claims (16)

1. a film detecting device, is characterized in that, comprising:
Light source, for the illuminating bundle of providing package containing different-waveband;
Optical element unit, comprises object lens, and described optical element unit for illuminating bundle is irradiated to object to be measured by described object lens, and collects the folded light beam of described object to be measured;
Wave filter, is spatially separated for the illuminating bundle or folded light beam making different-waveband;
Planar array detector, is positioned at the conjugate plane in described object lens pupil face or object lens pupil face to gather the angular spectrum information of folded light beam;
Processor, for carrying out analytical calculation to described angular spectrum information.
2. film detecting device as claimed in claim 1, it is characterized in that, described light source is a broadband light source or multiple monochromatic source, and described light source comprises collimation camera lens.
3. film detecting device as claimed in claim 1, it is characterized in that, described optical element unit comprises the polarizer.
4. film detecting device as claimed in claim 3, it is characterized in that, the direction of described illuminating bundle is vertical with subject surface to be measured, described optical element unit also comprises beam splitting element, described illuminating bundle is surperficial to described measurand by the described polarizer, beam splitting element and objective lens entrance successively, passed through described object lens, beam splitting element by after described measurand reflection, finally received by described planar array detector.
5. film detecting device as claimed in claim 4, it is characterized in that, described beam splitting element is right angle Amici prism or semi-transparent semi-reflecting lens.
6. film detecting device as claimed in claim 4, it is characterized in that, the numerical aperture of described object lens is more than 0.9.
7. film detecting device as claimed in claim 3, it is characterized in that, direction and the subject surface to be measured of described illuminating bundle have angle, described object lens comprise front group of lens and rear group of lens, after described illuminating bundle incides described measurand surface by the described polarizer and front group of lens tilt, reflexed to rear group of lens by described measurand, finally received by described planar array detector.
8. film detecting device as claimed in claim 7, it is characterized in that, the numerical aperture of described object lens is 0.2 ~ 0.3.
9. film detecting device as claimed in claim 1, is characterized in that, also comprise analyzer between described object to be measured and planar array detector.
10. film detecting device as claimed in claim 1, it is characterized in that, described optical element unit comprises whirl compensator.
11. film detecting devices as claimed in claim 1, it is characterized in that, described wave filter is narrow band pass filter, and described wave filter is between described light source and object lens.
12. film detecting devices as claimed in claim 1, is characterized in that, described wave filter be two or more different wave length through narrow band pass filter, described wave filter is between described object to be measured and planar array detector.
13. film detecting devices as claimed in claim 1, it is characterized in that, described light source comprises two monochromatic sources and the dichroic light beam bundling device of different luminescence band, and the illuminating bundle of described two monochromatic sources is respectively by described dichroic light beam bundling device transmittance and reflectance.
14. film detecting devices as claimed in claim 1, is characterized in that, also comprise beam splitter before described planar array detector, and described beam splitter is used for the folded light beam of different-waveband to guide to different planar array detectors.
15. film detecting devices as claimed in claim 14, is characterized in that, described beam splitter is dichroic light splitting piece or the right angle Amici prism being coated with dichroic spectro-film.
16. 1 kinds of methods adopting the film detecting device described in claim 1 to 15 to carry out thin film testing, it is characterized in that, described light source sends the illuminating bundle comprising different-waveband, described illuminating bundle enters described optical element unit, by being irradiated on object to be measured after described object lens, described optical element unit collects the folded light beam of described object to be measured, described wave filter makes the illuminating bundle of different-waveband or folded light beam spatially be separated, the angular spectrum information of folded light beam is gathered by described planar array detector, final processor carries out analytical calculation to described angular spectrum information.
CN201310618148.7A 2013-11-29 2013-11-29 Film detection device and method Pending CN104677299A (en)

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CN106501266A (en) * 2016-10-18 2017-03-15 淮阴师范学院 Optical thin film defect inspection method based on differential interference
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CN112255206A (en) * 2020-09-11 2021-01-22 中国科学院苏州生物医学工程技术研究所 Spectroscopic detection unit, particle detection device and method
CN112731344A (en) * 2020-12-21 2021-04-30 华中科技大学 Amplified area array sweep frequency distance measuring/thickness measuring device and method with active optical anti-shake function
CN112731345A (en) * 2020-12-21 2021-04-30 华中科技大学 Vibration-proof type area array frequency sweep distance measuring/thickness measuring device and method with active optical anti-shake function
CN112731344B (en) * 2020-12-21 2023-11-28 华中科技大学 Amplified area array sweep frequency distance measurement/thickness measurement device and method with active optical anti-shake function
CN112731345B (en) * 2020-12-21 2024-02-09 华中科技大学 Vibration-resistant type area array sweep frequency distance measurement/thickness measurement device and method with active optical anti-shake function
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CN114726995B (en) * 2022-06-09 2022-11-08 深圳中科飞测科技股份有限公司 Detection method and detection system
CN117697166A (en) * 2024-02-06 2024-03-15 中国工程物理研究院激光聚变研究中心 Method for etching organic film on surface of metal film by utilizing laser
CN117697166B (en) * 2024-02-06 2024-04-19 中国工程物理研究院激光聚变研究中心 Method for etching organic film on surface of metal film by utilizing laser

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