CN104591335A - New method for treating chlorpyrifos wastewater by using semiconductor nano materials - Google Patents

New method for treating chlorpyrifos wastewater by using semiconductor nano materials Download PDF

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Publication number
CN104591335A
CN104591335A CN201510016076.8A CN201510016076A CN104591335A CN 104591335 A CN104591335 A CN 104591335A CN 201510016076 A CN201510016076 A CN 201510016076A CN 104591335 A CN104591335 A CN 104591335A
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China
Prior art keywords
chlorpyrifos
waste water
semiconductor nano
nano material
material process
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Application number
CN201510016076.8A
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Chinese (zh)
Inventor
顾福海
强金凤
韦琛鸿
周浩
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Anhui Guoxing Biochemistry Co Ltd
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Anhui Guoxing Biochemistry Co Ltd
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Priority to CN201510016076.8A priority Critical patent/CN104591335A/en
Publication of CN104591335A publication Critical patent/CN104591335A/en
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/30Treatment of water, waste water, or sewage by irradiation
    • C02F1/32Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • C02F1/74Treatment of water, waste water, or sewage by oxidation with air
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00Nature of the contaminant
    • C02F2101/30Organic compounds
    • C02F2101/306Pesticides
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00Use of specific compounds during water treatment
    • C02F2305/10Photocatalysts

Abstract

The invention discloses a new method for treating chlorpyrifos wastewater by using semiconductor nano materials. The method mainly uses self-made semiconductor nano materials with different shapes and dimensions as a photocatalyst and uses chlorpyrifos wastewater subjected to acid-leaching as a model to perform reaction. The photocatalytic degradability test detects that the degradation rate of organic phosphorus in the chlorpyrifos wastewater can reach 94.97% within 0.5 hour. Compared with the common electrolytic process, Fenton process and other organic phosphorus degradation processes, the method has the advantages of lower cost and better effect, and is suitable for large-scale industrialized wastewater treatment.

Description

A kind of novel method using semiconductor nano material process Chlorpyrifos 94 waste water
Technical field
The present invention relates to the dephosphorization process of phosphoric acid ester organism P wastewater, belong to field of environment protection, be specifically related to a kind of novel method using semiconductor nano material process Chlorpyrifos 94 waste water.
Background technology
Chlorpyrifos 94 is a kind of broad spectrum insecticide of efficient, low toxicity, low residue, contain the large-tonnage pesticide species do not waned in the world for a long time, can effectively prevent and treat over one hundred kind of insect, can be widely used in the various crop such as water paddy and wheat class, corn, cotton, sugarcane, tealeaves, fruit tree, flowers and livestock breeding, and be put into the insecticide variety of non-polluted farm product recommendation, be one of substitute products of the high-toxic organic phosphorus sterilant that country is recommended.
Containing a large amount of hardly degraded organic substance such as organophosphorus, trichloro pyridyl sodium alcoholate in Chlorpyrifos 94 waste water, intractability is large, and organophosphorus can cause body eutrophication etc. serious ecological environment problem after entering water body.General organism P wastewater treatment process has electrolytic process, composite catalytic oxidation method, evaporative crystallization method, Fenton oxidation method etc., but all have that processing efficiency is low, organic phosphorus degrading is thorough, easily cause secondary pollution, and the waste water after process can not qualified discharge.
Patent CN200710113164.5 discloses a kind for the treatment of process of Chlorpyrifos 94 waste water, uses the processing steps such as acid out, complexometric extraction, Fenton oxidation and catalyzed oxidation.Need the objectionable constituent processed to be heavy metal copper, sulfide, organophosphorus and nitrogen heterocyclic ring etc. in the method, processing step is complicated, and cost of investment is high.
Use semiconductor nano material process Chlorpyrifos 94 waste water to be utilize semiconductor nano material as photocatalyst, organic phosphorus degrading in Chlorpyrifos 94 waste water is become inorganic phosphorus, then is removed by the precipitator method.The method processing efficiency is high, cost is low, non-secondary pollution, successfully solves the difficult degradation of Chlorpyrifos 94 waste water, challenge that colourity is high.
Summary of the invention
In order to solve the problems of the technologies described above, the invention provides a kind of with the novel method making semiconductor nano material process Chlorpyrifos 94 waste water by oneself.
The technical solution used in the present invention is as follows:
Use a method for semiconductor nano material process Chlorpyrifos 94 waste water, it is characterized in that comprising the following steps:
(1) appropriate semiconductor nano material is put into reaction flask, then add quantitative Chlorpyrifos 94 waste water and be placed in photoresponse instrument in room, lucifuge place stirs.
(2) then irradiate with the ultraviolet lamp that wavelength is 253 nm while stirring, time 0.5 h.
(3) after stopping illumination, add acclimatization agent, utilize NaOH regulation system pH to desired value, then suction filtration.
The semiconductor light-catalyst that present method adopts can be one or more the compound in following material: TiO 2, ZnO, In 2o 3, SnO 2, CdS, CdSe, CdTe, Co 3o 4, MnO 2and Fe 2o 3.
The semiconductor light-catalyst specific surface area adopted is 85 ~ 120 m 2/ g.
The Chlorpyrifos 94 waste water adopted is high density organophosphorus compounds waste water after acid out, and phosphorus concentration is in P, and total phosphorus value is 500mg/L ~ 1000mg/L, and pH value is 3-6.
Adding quantitative Chlorpyrifos 94 waste water is again placed in photoresponse instrument in room, and 10 ~ 50 min are stirred at lucifuge place.Will provide certain temperature during stirring, scope is more suitable at 15 ~ 45 ° of C.
The precipitation agent adopted after illumination is CaCl 2, CaO, MgO, FeCl 3and FeSO 4in one or more compound; ; Precipitation dosage is 0.005 ~ 0.5% of Chlorpyrifos 94 wastewater quality; In described precipitation process, pH adjusting agent is NaOH, and pH value is 9.5 ~ 11.5.
Positive progressive effect of the present invention is:
The present invention adopts homemade semiconductor light-catalyst, because having higher specific surface area and high catalytic activity, greatly increasing contact area, improving rate of mass transfer, reaction is launched on less time and space simultaneously, thus effectively raises the degradation efficiency of organophosphorus; After photochemical catalysis, only the simple precipitator method of need efficiently can remove the total phosphorus in waste water, and the method environmental friendliness, technique are simple, efficiency is high.
The present invention is splendid to high density organism P wastewater treatment effect especially, reaches waste water comprehensive treating process, cost-saving object.Technique is clean, step is simple, workable, is suitable for large-scale industrialization application.
Embodiment
What below enumerate is only several specific embodiments of the present invention.Obviously, the invention is not restricted to above embodiment, all distortion directly derived by content disclosed by the invention or associate, all should think protection scope of the present invention.
Embodiment 1, a kind of method using semiconductor nano material process Chlorpyrifos 94 waste water:
Take 0.05 g ZnO and put into 200 mL reaction flasks, then adding the Chlorpyrifos 94 waste water of 100 mL after acid out (total phosphorus 1000 mg/L, pH are 4.5) to be placed in photoresponse instrument in room, 20 min are stirred at lucifuge place, make system reach adsorption-desorption balance, then irradiate with the ultraviolet lamp that wavelength is 253 nm while stirring.Light application time 0.5 h, add MgO 0.10 g, NaOH0.30g under stirring after centrifuging, be cooled to room temperature suction filtration after reacting 0.5 h, obtain faint yellow clear liquor, total phosphorus 15.6 mg/L, pH are 10.35.
Embodiment 2, a kind of method using semiconductor nano material process Chlorpyrifos 94 waste water:
Take 0.05 g SnO 2put into 200 mL reaction flasks, then adding the Chlorpyrifos 94 waste water of 100 mL after acid out (total phosphorus 1000 mg/L, pH are 4.5) to be placed in photoresponse instrument in room, 20 min are stirred at lucifuge place, make system reach adsorption-desorption balance, then irradiate with the ultraviolet lamp that wavelength is 253 nm while stirring.Light application time 0.5 h, add CaO 0.15 g, NaOH0.32 g under stirring after centrifuging, be cooled to room temperature suction filtration after reacting 0.5 h, obtain faint yellow clear liquor, total phosphorus 19.6 mg/L, pH are 10.62.
Embodiment 3, a kind of method using semiconductor nano material process Chlorpyrifos 94 waste water:
Take 0.05 g In 2o 3put into 200 mL reaction flasks, then adding the Chlorpyrifos 94 waste water of 100 mL after acid out (total phosphorus 1000 mg/L, pH are 4.5) to be placed in photoresponse instrument in room, 20 min are stirred at lucifuge place, make system reach adsorption-desorption balance, then irradiate with the ultraviolet lamp that wavelength is 253 nm while stirring.Light application time 0.5 h, adds FeCl under stirring after centrifuging 30.12 g, NaOH0.35 g, is cooled to room temperature suction filtration after reacting 0.5 h, obtain faint yellow clear liquor, and total phosphorus 26.6 mg/L, pH are 11.15.
Embodiment 4, a kind of method using semiconductor nano material process Chlorpyrifos 94 waste water:
Take 0.05 g ZnO and put into 200 mL reaction flasks, then adding the Chlorpyrifos 94 waste water of 100 mL after acid out (total phosphorus 1000 mg/L, pH are 4.5) to be placed in photoresponse instrument in room, 20 min are stirred at lucifuge place, make system reach adsorption-desorption balance, then irradiate with the ultraviolet lamp that wavelength is 253 nm while stirring.Light application time 0.5 h, adds FeSO under stirring after centrifuging 40.16 g, NaOH0.35 g, is cooled to room temperature suction filtration after reacting 0.5 h, obtain faint yellow clear liquor, and total phosphorus 18.6 mg/L, pH are 9.86.
Embodiment 5, a kind of method using semiconductor nano material process Chlorpyrifos 94 waste water:
Take 0.05 g Co 3o 4put into 200 mL reaction flasks, then adding the Chlorpyrifos 94 waste water of 100 mL after acid out (total phosphorus 1000 mg/L, pH are 4.5) to be placed in photoresponse instrument in room, 20 min are stirred at lucifuge place, make system reach adsorption-desorption balance, then irradiate with the ultraviolet lamp that wavelength is 253 nm while stirring.Light application time 0.5 h, adds FeSO under stirring after centrifuging 40.12 g, NaOH0.28 g, is cooled to room temperature suction filtration after reacting 0.5 h, obtain faint yellow clear liquor, and total phosphorus 26.1 mg/L, pH are 10.25.

Claims (8)

1. one kind is used the method for semiconductor nano material process Chlorpyrifos 94 waste water, it is characterized in that: the semiconductor nano material of appropriate different-shape, size is put into reaction flask, then adding quantitative Chlorpyrifos 94 waste water to be placed in photoresponse instrument in room, stir at lucifuge place, system is made to reach adsorption-desorption balance, then irradiate with the ultraviolet lamp that wavelength is 253 nm while stirring, acclimatization agent is added again after light application time 0.5 h, utilize NaOH regulation system pH to 9.5 ~ 11.5, then suction filtration can remove inorganic phosphorus.
2. a kind of method using semiconductor nano material process Chlorpyrifos 94 waste water according to claim 1, is characterized in that: the semiconductor light-catalyst adopted can be one or more the compound in following material: TiO 2, ZnO, In 2o 3, SnO 2, CdS, CdSe, CdTe, Co 3o 4, MnO 2and Fe 2o 3.
3. a kind of method using semiconductor nano material process Chlorpyrifos 94 waste water according to claim 1, is characterized in that adopted semiconductor light-catalyst specific surface area is 85 ~ 120 m 2/ g.
4. a kind of method using semiconductor nano material process Chlorpyrifos 94 waste water according to claim 1, is characterized in that adopted semiconductor light-catalyst consumption is 0.005 ~ 1.5% of Chlorpyrifos 94 wastewater quality.
5. a kind of method using semiconductor nano material process Chlorpyrifos 94 waste water according to claim 1, it is characterized in that described Chlorpyrifos 94 waste water is high density organophosphorus compounds waste water after acid out, phosphorus concentration is in P, and total phosphorus value is 500mg/L ~ 1000mg/L, and pH value is 3-6.
6. a kind of method using semiconductor nano material process Chlorpyrifos 94 waste water according to claim 1, is characterized in that adding quantitative Chlorpyrifos 94 waste water is placed in photoresponse instrument in room, stirs 10 ~ 50 min at lucifuge place.
7. a kind of method using semiconductor nano material process Chlorpyrifos 94 waste water according to claim 1 or 4, is characterized in that in Chlorpyrifos 94 wastewater treatment, and the temperature that lucifuge stirs is 15 ~ 45 DEG C.
8. a kind of method using semiconductor nano material process Chlorpyrifos 94 waste water according to claim 1, the precipitation agent adopted again after it is characterized in that illumination is CaCl 2, CaO, MgO, FeCl 3and FeSO 4in one or more compound; Described precipitation dosage is 0.005 ~ 0.5% of Chlorpyrifos 94 wastewater quality.
CN201510016076.8A 2015-01-13 2015-01-13 New method for treating chlorpyrifos wastewater by using semiconductor nano materials Pending CN104591335A (en)

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CN105384212A (en) * 2015-11-27 2016-03-09 榆林学院 Device and method for degrading coke quenching wastewater by adopting nano-zinc oxide
CN107176766A (en) * 2017-07-18 2017-09-19 马鞍山中创环保科技有限公司 A kind of method of the novel nano photocatalyst treatment waste water of chlopyrifos containing high phosphorus
CN109806890A (en) * 2019-03-30 2019-05-28 深圳市泰兴和环保实业有限公司 A kind of application method except phosphorus catalyst and comprising dephosphorization agent and dephosphorization agent except phosphorus catalyst for chemical nickle-plating wastewater

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105384212A (en) * 2015-11-27 2016-03-09 榆林学院 Device and method for degrading coke quenching wastewater by adopting nano-zinc oxide
CN107176766A (en) * 2017-07-18 2017-09-19 马鞍山中创环保科技有限公司 A kind of method of the novel nano photocatalyst treatment waste water of chlopyrifos containing high phosphorus
CN109806890A (en) * 2019-03-30 2019-05-28 深圳市泰兴和环保实业有限公司 A kind of application method except phosphorus catalyst and comprising dephosphorization agent and dephosphorization agent except phosphorus catalyst for chemical nickle-plating wastewater
CN109806890B (en) * 2019-03-30 2021-11-26 深圳市泰兴和环保实业有限公司 Dephosphorization catalyst for chemical nickel plating wastewater, dephosphorization agent containing dephosphorization catalyst and use method of dephosphorization agent

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Application publication date: 20150506