CN104536210B - 一种配向膜印刷板的制备方法 - Google Patents

一种配向膜印刷板的制备方法 Download PDF

Info

Publication number
CN104536210B
CN104536210B CN201510055765.XA CN201510055765A CN104536210B CN 104536210 B CN104536210 B CN 104536210B CN 201510055765 A CN201510055765 A CN 201510055765A CN 104536210 B CN104536210 B CN 104536210B
Authority
CN
China
Prior art keywords
alignment film
printing plate
film printing
preparation
mass parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201510055765.XA
Other languages
English (en)
Other versions
CN104536210A (zh
Inventor
李鸿鹏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Beijing BOE Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Beijing BOE Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Beijing BOE Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to CN201510055765.XA priority Critical patent/CN104536210B/zh
Publication of CN104536210A publication Critical patent/CN104536210A/zh
Priority to US14/740,899 priority patent/US9381733B1/en
Application granted granted Critical
Publication of CN104536210B publication Critical patent/CN104536210B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Epoxy Resins (AREA)

Abstract

本发明涉及到显示装置的制作技术领域,尤其涉及到一种配向膜印刷板的制备方法。该方法包括以下步骤:将40~70质量份配向膜印刷板树脂K11、10~20质量份的环氧丙烯酸树脂、10~20质量份的光引发剂、20~30质量份的过氧化物引发剂混合后涂布在聚对苯二甲酸乙二酯树脂基板表面;通过紫外线进行曝光显影;对曝光显影后的基板进行热固化加工。在上述技术方案中,在配向膜印刷板制备的过程中,通过加入过氧化物引发剂,在配向膜印刷板曝光的同时加入热固化工艺,将碳碳双键反应率提高至95%左右,提高配向膜印刷板对强极性PI的耐受能力,改善异物。

Description

一种配向膜印刷板的制备方法
技术领域
本发明涉及到显示装置的制作技术领域,尤其涉及到一种配向膜印刷板的制备方法。
背景技术
传统的配向膜印刷板采用单一的聚胺脂丙烯酸树脂,曝光时虽然采用正反两面曝光以加强配向膜印刷板的强度和韧性,但由于近来PI液中极性溶剂的成分越来越高,聚胺脂丙烯酸树脂在强极性溶剂下发生溶胀,PI转印时配向膜印刷板树脂成分脱落与基板,形成异物。为了提高配向膜印刷板在与强极性PI搭配使用时的耐受能力,提高配向膜印刷板树脂的交联强度是最为有效的方法。传统的配向膜印刷板材料主要为PUA树脂,全部依靠曝光形成交联结果。受限于PUA树脂的本向特性及UV交联的特性,碳碳双键的反应率一般为80%左右。
发明内容
本发明提供了一种配向膜印刷板的制备方法,用于提高配向膜印刷板的在与强极性PI搭配使用时的耐受能力。
本发明提供了一种配向膜印刷板的制备方法,该方法包括以下步骤:
将40~70质量份配向膜印刷板树脂K11、10~20质量份的环氧丙烯酸树脂、10~20质量份的光引发剂、20~30质量份的过氧化物引发剂混合后涂布在聚对苯二甲酸乙二酯树脂基板表面;
通过紫外线进行曝光显影;
对曝光显影后的基板进行热固化加工。
在上述技术方案中,在配向膜印刷板制备的过程中,通过加入过氧化物引发剂,在配向膜印刷板曝光的同时加入热固化工艺,将碳碳双键反应率提高至95%左右,提高配向膜印刷板对强极性PI的耐受能力,改善异物。
优选的,在完成热固化加工后,还包括对基板进行清洗。
优选的,所述对基板进行清洗具体为:使用N,N-二甲基甲酰胺清洗液对基板进行清洗。
优选的,所述通过紫外线进行曝光显影具体为:
使用波长为265nm或者350nm、照度为7J的紫外线光进行曝光照射。
优选的,所述光引发剂为在350~400nm之前的光引发剂。
优选的,所述光引发剂为819号光引发剂。
优选的,所述过氧化物引发剂为过氧化苯甲酰或过氧化甲乙酮。
优选的,所述热固化加工的条件为:150℃*2hr。
优选的,将40~70质量份配向膜印刷板树脂、10~20质量份的环氧丙烯酸树脂、10~20质量份的光引发剂、20~30质量份的过氧化物引发剂混合后涂布在聚对苯二甲酸乙二酯树脂基板表面具体为:
将50质量分数的配向膜印刷板树脂、10质量分数的环氧丙烯酸树脂、10质量分数的光引发剂、及30质量分数的过氧化物引发剂混合后涂布在聚对苯二甲酸乙二酯树脂基板表面。
附图说明
图1为本发明实施例提供的配向膜印刷板的制备方法的流程图;
图2为本发明实施例提供的配向膜印刷板双键转化率对比图;
图3为本发明实施例提供的配向膜印刷板的异物发生率对比图。
具体实施方式
为了提高配向膜印刷板的在与强极性PI搭配使用时的耐受能力。并降低异物的形成率,本发明实施例提供了一种配向膜印刷板的制备方法,在本方法中,通过采用紫外线曝光及高温加热的制备方法增加了配向膜印刷板的碳碳双键的结合率,进而提高了配向膜印刷板的在与强极性PI搭配使用时的耐受能力。并降低异物的形成率。为使本发明的目的、技术方案和优点更加清楚,以下以非限制性的实施例为例对本发明作进一步详细说明。
如图1所示,图1为本发明实施例提供的配向膜印刷板的制备方法的流程图。
本发明实施例提供了一种配向膜印刷板的制备方法,该方法包括以下步骤:
将40~70质量份配向膜印刷板树脂K11、10~20质量份的环氧丙烯酸树脂、10~20质量份的光引发剂、20~30质量份的过氧化物引发剂混合后涂布在聚对苯二甲酸乙二酯树脂基板表面;
通过紫外线进行曝光显影;
对曝光显影后的基板进行热固化加工。
在上述实施例中,在配向膜印刷板制备的过程中,通过加入过氧化物引发剂,在配向膜印刷板曝光的同时加入热固化工艺,将碳碳双键反应率提高至95%左右,提高配向膜印刷板对强极性PI的耐受能力,改善异物。
为了方便对本实施例提供的配向膜印刷板的制备方法的理解,下面结合附图1对其进行详细的说明。
步骤一、将40~70质量份配向膜印刷板树脂K11、10~20质量份的环氧丙烯酸树脂、10~20质量份的光引发剂、20~30质量份的过氧化物引发剂混合后涂布在聚对苯二甲酸乙二酯树脂基板表面。
具体的,该成分的比例可以选用不同的成分,配向膜印刷板树脂K11(主要成分为PUA树脂)的质量分数可以为40、50、60、70等任意介于40~70之间的质量分数,环氧丙烯酸树脂可以为10、15、20等任意介于10~20之间的质量分数、光引发剂可以为10、15、20等任意介于10~20之间的质量分数、过氧化物引发剂可以为20、25、30等任意介于20~30之间的质量分数,较佳的,上述成分的质量分数为:50质量分数的配向膜印刷板树脂、10质量分数的环氧丙烯酸树脂、10质量分数的光引发剂、及30质量分数的过氧化物引发剂混合后涂布在聚对苯二甲酸乙二酯树脂基板表面,真空环境中2~3hr待有机溶剂挥发。
其中的环氧丙烯酸树脂为下面所述单体环氧树脂的混合物,其中R与单体中所述结构相同,n为正整数。
其中的光引发剂为在350~400nm之前的光引发剂。较佳的,所述光引发剂为819号光引发剂。
其中的过氧化物引发剂为过氧化苯甲酰或过氧化甲乙酮。
步骤二、通过紫外线进行曝光显影;
具体的,使用波长为265nm或者350nm、照度为7J的紫外线光进行曝光照射。这个数值波长与所添加的光引发剂对应,819光引发剂对应的吸收峰即为265nm和350nm。
步骤三、对曝光显影后的基板进行热固化加工。
具体的,在进行热固化加工时,热固化加工的条件为:150℃*2hr。
步骤四、在完成热固化加工后,还包括对基板进行清洗。
具体的,使用N,N-二甲基甲酰胺清洗液对基板进行清洗。
通过上述步骤完成对配向膜印刷板的制作,并且由图2可以看出,改善前也就是传统的配向膜印刷板树脂中碳碳双键的转化只在80%左右,改善后,在曝光过程中,PUA树脂与环氧丙烯酸树脂互相交联,形成交联结构。但随着反应的进行,树脂的粘度越来越高,光引发剂的反应速率逐渐降低,所以单纯靠曝光不能使碳碳双键的转化率达到较高的水平。因此,本方法中增加的加热固化的步骤,在热固化过程中,过氧化物引发剂在加热条件下形成热自由基,由于高温环境的存在,树脂中自由基的平均自由程变高,使未反应的碳碳双键进一步反应,提高反应率。而且由于环氧基团的存在,相当于提高最终获得的配向膜印刷板的交联程度,进一步提高的产品对强极性PI的耐受能力。一并参考图3,并且相对于传统的配向膜印刷板板制造工艺,本发明中的配向膜印刷板制作工艺通过在树脂中加入过氧化物引发剂,在紫外线固化后增加热固化工艺,进一步提高树脂的交联程度,这样,最终得到的配向膜印刷板板强度就会提高,在长期使用的过程中,配向膜印刷板板对PI液的耐候性增加,在PI转印过程中,配向膜印刷板成分不会脱落于液晶面板的基板上,因此异物发生率明显下降。
显然,本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样,倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内,则本发明也意图包含这些改动和变型在内。

Claims (9)

1.一种配向膜印刷板的制备方法,其特征在于,包括以下步骤:
将40~60质量份配向膜印刷板树脂K11、10~20质量份的环氧丙烯酸树脂、10~20质量份的光引发剂、20~30质量份的过氧化物引发剂混合后涂布在聚对苯二甲酸乙二酯树脂基板表面;
通过紫外线进行曝光显影;
对曝光显影后的基板进行热固化加工。
2.如权利要求1所述的配向膜印刷板的制备方法,其特征在于,在完成热固化加工后,还包括对基板进行清洗。
3.如权利要求2所述的配向膜印刷板的制备方法,其特征在于,所述对基板进行清洗具体为:使用N,N-二甲基甲酰胺清洗液对基板进行清洗。
4.如权利要求1所述的配向膜印刷板的制备方法,其特征在于,所述通过紫外线进行曝光显影具体为:
使用波长为265nm或者350nm、照度为7J的紫外线光进行曝光照射。
5.如权利要求1所述的配向膜印刷板的制备方法,其特征在于,所述光引发剂为在350~400nm之间的光引发剂。
6.如权利要求5所述的配向膜印刷板的制备方法,其特征在于,所述光引发剂为819号光引发剂。
7.如权利要求1~5任一项所述的配向膜印刷板的制备方法,其特征在于,所述过氧化物引发剂为过氧化苯甲酰或过氧化甲乙酮。
8.如权利要求6所述的配向膜印刷板的制备方法,其特征在于,所述热固化加工的条件为:150℃*2hr。
9.如权利要求6所述的配向膜印刷板的制备方法,其特征在于,将40~60质量份配向膜印刷板树脂、10~20质量份的环氧丙烯酸树脂、10~20质量份的光引发剂、20~30质量份的过氧化物引发剂混合后涂布在聚对苯二甲酸乙二酯树脂基板表面具体为:
将50质量分数的配向膜印刷板树脂、10质量分数的环氧丙烯酸树脂、10质量分数的光引发剂、及30质量分数的过氧化物引发剂混合后涂布在聚对苯二甲酸乙二酯树脂基板表面。
CN201510055765.XA 2015-02-03 2015-02-03 一种配向膜印刷板的制备方法 Expired - Fee Related CN104536210B (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201510055765.XA CN104536210B (zh) 2015-02-03 2015-02-03 一种配向膜印刷板的制备方法
US14/740,899 US9381733B1 (en) 2015-02-03 2015-06-16 Preparation method of printing plate for alignment film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510055765.XA CN104536210B (zh) 2015-02-03 2015-02-03 一种配向膜印刷板的制备方法

Publications (2)

Publication Number Publication Date
CN104536210A CN104536210A (zh) 2015-04-22
CN104536210B true CN104536210B (zh) 2017-09-29

Family

ID=52851760

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510055765.XA Expired - Fee Related CN104536210B (zh) 2015-02-03 2015-02-03 一种配向膜印刷板的制备方法

Country Status (2)

Country Link
US (1) US9381733B1 (zh)
CN (1) CN104536210B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200046234A (ko) * 2018-10-23 2020-05-07 주식회사 동진쎄미켐 하드코팅층 형성용 조성물 및 이를 이용한 입체 형상 기재

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1869779A (zh) * 2006-06-26 2006-11-29 友达光电股份有限公司 液晶面板及其制造方法
CN101930171A (zh) * 2009-06-26 2010-12-29 比亚迪股份有限公司 一种紫外光固化组合物及其制备方法、图纹制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0127252D0 (en) * 2001-11-13 2002-01-02 Vantico Ag Production of composite articles composed of thin layers
KR20100099048A (ko) * 2009-03-02 2010-09-10 주식회사 동진쎄미켐 감광성 수지 조성물
KR101042214B1 (ko) * 2009-04-09 2011-06-20 주식회사 엘지화학 배향막 조성물, 이로 제조된 배향막, 배향막 제조방법, 이를 포함하는 광학필름 및 광학필름을 포함하는 디스플레이 장치
US8899148B2 (en) * 2009-07-02 2014-12-02 E I Du Pont De Nemours And Company Method for printing a material onto a substrate
US8802792B2 (en) * 2010-09-17 2014-08-12 Empire Technology Development Llc Partially hydrogenated bisphenol-A-based polymers as substitutes for bisphenol-A-based polymers
US9487700B2 (en) * 2012-09-11 2016-11-08 Dic Corporation Liquid crystal display device
AU2013329253B2 (en) * 2012-10-09 2017-02-23 Avery Dennison Corporation Adhesives and related methods

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1869779A (zh) * 2006-06-26 2006-11-29 友达光电股份有限公司 液晶面板及其制造方法
CN101930171A (zh) * 2009-06-26 2010-12-29 比亚迪股份有限公司 一种紫外光固化组合物及其制备方法、图纹制备方法

Also Published As

Publication number Publication date
CN104536210A (zh) 2015-04-22
US9381733B1 (en) 2016-07-05

Similar Documents

Publication Publication Date Title
CN104974594B (zh) 一种水溶性溶剂的油墨组合物、其应用及印刷电路板
CN102286230B (zh) 一种紫外光固化油墨及其制备方法
CN107216715B (zh) 一种uv-led喷墨打印字符墨水及其制备方法
JP6303407B2 (ja) 硬化性組成物およびその用途
CN111607289B (zh) 一种双固化机理紫外光固化喷墨打印墨水及其制备方法
CN105966031B (zh) 一种可贴合弧边的夜光保护膜及其制备方法
CN104893595A (zh) 层叠体的制造方法和层叠体
CN104327593B (zh) 一种uv固化可剥离油墨及生产方法、施工方法
CN103897185A (zh) 感光型聚酰亚胺及负型光致抗蚀剂组合物
CN104536210B (zh) 一种配向膜印刷板的制备方法
CN109796853A (zh) 一种紫外光固化导热散热车辆反射罩涂料及其制备方法
CN104529762B (zh) 一种快干型双固化树脂及其制备方法与应用
CN103819994B (zh) 一种聚丙烯薄膜涂覆用uv光固化丙烯酸酯聚合物水乳液
CN106479328B (zh) 一种快干型紫外光固化漆
CN106117394B (zh) 一种含有氟碳链的膦酸酯类光引发剂及其制备方法
JP6874559B2 (ja) 硬化性組成物、立体造形物の製造方法および立体造形装置
CN110527334B (zh) 一种基于碳量子点的真空可见光室温固化复合膜和制备方法
CN115584217B (zh) 一种可识别的终止胶带
CN1248053C (zh) 一种耐水、耐溶剂重氮系丝网印刷制版感光胶
JP2020503419A (ja) 光硬化性接着剤組成物、硬化生成物およびそれらの使用
JP5606023B2 (ja) 配線板用透明接着剤樹脂組成物及びそれを用いた配線板用透明接着フィルム
CN109633799B (zh) 一种用于扩散增光复合膜贴合层的涂层组合物及一种扩散增光复合膜
KR20090039178A (ko) 컬러 필터 제조용 잉크 조성물
CN106995644B (zh) Uv印铁涂料及其制备方法
KR102004463B1 (ko) 하이드로겔의 제조방법

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20170929

Termination date: 20210203

CF01 Termination of patent right due to non-payment of annual fee