CN104415930B - The fluid nozzle of application cleaning base plate method and fluid nozzle device - Google Patents
The fluid nozzle of application cleaning base plate method and fluid nozzle device Download PDFInfo
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- CN104415930B CN104415930B CN201310394829.XA CN201310394829A CN104415930B CN 104415930 B CN104415930 B CN 104415930B CN 201310394829 A CN201310394829 A CN 201310394829A CN 104415930 B CN104415930 B CN 104415930B
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- fluid nozzle
- treatment liquid
- head body
- interior sidewall
- sidewall surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/14—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/04—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
- B05B7/0416—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
- B05B7/0441—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with one inner conduit of liquid surrounded by an external conduit of gas upstream the mixing chamber
- B05B7/0458—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with one inner conduit of liquid surrounded by an external conduit of gas upstream the mixing chamber the gas and liquid flows being perpendicular just upstream the mixing chamber
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- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Nozzles (AREA)
Abstract
A kind of fluid nozzle applying cleaning base plate method and fluid nozzle device, this cleaning base plate method comprises the steps of (A) makes treatment fluid be dissolved with carbon dioxide, to form after-treatment liquid；(B) gas and after-treatment liquid are passed into a fluid nozzle, and gas extrusion after-treatment liquid flows downward；(C) after-treatment liquid is ejected on a substrate from this fluid nozzle；And (D) carbon dioxide disengages from after-treatment liquid, to increase the impulsive force on treatment fluid contact substrate surface.The fluid nozzle applying described cleaning base plate method includes a head body, a room, an air inlet pipe, a feed tube, and multiple injection runner.Apply the fluid nozzle device of described cleaning base plate method, comprise the fluid nozzle of about two settings.Whereby so that the cleaning efficiency of substrate is substantially improved, and then improving product qualification rate, and more environmental protection on processing procedure.
Description
Technical field
The present invention relates to a kind of cleaning base plate method, fluid nozzle and fluid nozzle device, particularly relate to a kind of to keep the cleaning base plate method of the board cleaning such as semiconductor crystal wafer or base plate for displaying, fluid nozzle and fluid nozzle device.
Background technology
Semiconductor crystal wafer is through multiple fabrication steps.Owing to every one silicon wafer process step has the polluter of potentiality, crystal column surface has residue such as chemical liquid composition or chemical polymerization thing, defect can be caused to generate and element characteristic lost efficacy.In manufacturing process for cleaning, utilize cleanout fluid that wafer is processed, eliminating particle and pollutant, and keep the cleaning of crystal column surface.
Existing cleaning way is the residue soaking or removing with nozzle substrate by chemical agent, and cleaning performance is not good, and affects the qualification rate of successive process；Furthermore, the process of the chemical agent after cleaning, quite complicated.
Summary of the invention
It is an object of the invention to provide and a kind of promote that cleaning effect is good and the cleaning base plate method of after-treatment liquid more environmental protection, fluid nozzle and fluid nozzle device.
Cleaning base plate method of the present invention, comprises the steps of
(A) treatment fluid is made to be dissolved with carbon dioxide, to form after-treatment liquid；
(B) gas and after-treatment liquid are passed into a fluid nozzle, and gas extrusion after-treatment liquid flows downward；
(C) after-treatment liquid is ejected on a substrate from this fluid nozzle；And
(D) carbon dioxide disengages from after-treatment liquid, to increase the impulsive force on treatment fluid contact substrate surface.
It is preferred that the treatment fluid of this step (A) is deionized water.
Applying the fluid nozzle of described cleaning base plate method, this fluid nozzle includes:
One head body, including one first interior sidewall surface, one along a first direction and this first interior sidewall surface the second interior sidewall surface separately, an interior wall surface being connected this first interior sidewall surface and this second interior sidewall surface, and one in contrast to the outer bottom wall of this interior wall surface；
One room, is formed at this head body and extends along this first direction, two opposition sides of this room respectively this first interior sidewall surface and this second interior sidewall surface, and the bottom surface of this room is this interior wall surface；
One air inlet pipe, is arranged at the top of this head body and connects this room；
One feed tube, extends along this first direction and one end connects this second interior sidewall surface, and includes the inlet of this first interior sidewall surface contiguous, and at least one in contrast to this air inlet pipe side and connect this room the ejiction opening extended along this first direction；And
Multiple injection runners, separately and are formed at this head body along this first direction each other, and connect this interior wall surface and this outer bottom wall of this head body.
It is preferred that the ejiction opening quantity of this feed tube is two and spaced apart.
It is preferred that this air inlet pipe is arranged at the top of these head body central authorities, the definition one axis by this air inlet pipe, described ejiction opening tilts an inclination angle relative to this axis.
It is preferred that described injection runner is long and narrow.
Applying the fluid nozzle device of described cleaning base plate method, this fluid nozzle device comprises:
Two fluid nozzles, are arranged around, and respectively this fluid nozzle includes
One head body, including one first interior sidewall surface, one along a first direction and this first interior sidewall surface the second interior sidewall surface separately, an interior wall surface being connected this first interior sidewall surface and this second interior sidewall surface, and one in contrast to the outer bottom wall of this interior wall surface；
One room, is formed at this head body and extends along this first direction, two opposition sides of this room respectively this first interior sidewall surface and this second interior sidewall surface, and the bottom surface of this room is this interior wall surface；
One air inlet pipe, is arranged at the top of this head body and connects this room；
One feed tube, extends along this first direction and one end connects this second interior sidewall surface, and includes the inlet of this first interior sidewall surface contiguous, and at least one in contrast to this air inlet pipe side and connect this room the ejiction opening extended along this first direction；And
Multiple injection runners, separately and are formed at this head body along this first direction each other, and connect this interior wall surface and this outer bottom wall of this head body.
It is preferred that respectively the ejiction opening quantity of this feed tube is two and spaced apart.
It is preferred that respectively this air inlet pipe is arranged at the top of these head body central authorities of correspondence, and defining an axis by this corresponding air inlet pipe, respectively this ejiction opening tilts an inclination angle relative to this corresponding axis.
Preferably, described injection runner is long and narrow, respectively this head body also includes one first lateral surface, respectively this first lateral surface of described head body is positioned at two opposition sides of this fluid nozzle device, and described injection runner this interior wall surface self-corresponding tilts to extend to this outer bottom wall of correspondence towards this corresponding first lateral surface.
The beneficial effects of the present invention is: by the design of fluid nozzle, and cleaning base plate method is that supply after-treatment liquid and gas are to fluid nozzle, when after-treatment liquid stream goes out to spray runner, carbon dioxide exposure air, carbon dioxide can produce to expand and explosion, and can increase treatment fluid and clean or remove the coating substance of substrate surface or the ability of polluter and efficiency so that the cleaning efficiency of substrate is substantially improved, contribute to successive process to process, and then improving product qualification rate；Furthermore, after-treatment liquid there is no reluctant waste water with gas after cleaning, more environmental protection on processing procedure.
Accompanying drawing explanation
Fig. 1 is a flow chart, and a preferred embodiment of cleaning base plate method of the present invention is described；
Fig. 2 is an axonometric chart, and the fluid nozzle device that this cleaning base plate method is applied is described；
Fig. 3 is the top view of corresponding diagram 2；
Fig. 4 is a line VI-VI along Fig. 3 sectional view intercepted；
Fig. 5 is the phantom that a room connects multiple injection runners；
Fig. 6 is the sectional view of a partial enlargement, and the inclination angle of this ejiction opening is described；
Fig. 7 is a cross-sectional schematic, illustrates that this gas on average advances each point after-treatment liquid stream to accelerate to be ejected to a substrate through corresponding injection runner；
Fig. 8 is the cross-sectional schematic at another visual angle, illustrates that this gas on average advances each point after-treatment liquid stream to accelerate to be ejected to a substrate through corresponding injection runner；
Fig. 9 is a cross-sectional schematic, and this fluid nozzle device also adjustable angle cleaning base plate is described；And
Figure 10 is the close-up schematic view of a corresponding Fig. 9.
Detailed description of the invention
Below in conjunction with drawings and Examples, the present invention is described in detail.
Before the present invention is described in detail, it shall be noted that in the following description content, similar element is to be identically numbered to represent.
The explanation of following preferred embodiment is graphic with reference to what add, is used for illustrating the present invention and can be used for the specific embodiment of enforcement.The direction term that the present invention is previously mentioned, for instance " on ", D score, "front", "rear", "left", "right" etc., be only the direction with reference to annexed drawings.Therefore, the direction term of use is used to illustrate, but not is used for limiting the present invention.
Consult Fig. 1, cleaning base plate method of the present invention, comprise the steps of
S1: make treatment fluid be dissolved with carbon dioxide, to form after-treatment liquid.
Specifically, treatment fluid is deionized water (DeionizedWater, DIW), but is not limited, and treatment fluid is alternatively pure water.
S2: gas and after-treatment liquid are passed into a fluid nozzle, and gas extrusion after-treatment liquid flows downward.
Specifically, gas is dry compression air (CleanDryAir, CDA), by gas-pressurized and after-treatment liquid, makes the after-treatment liquid speed that flows downward promote.
S3: after-treatment liquid is ejected on a substrate from fluid nozzle.
In the present embodiment, substrate is to explain with a semiconductor crystal wafer citing.
S4: carbon dioxide disengages from after-treatment liquid, to increase the impulsive force on treatment fluid contact substrate surface.
Consult Fig. 2, Fig. 3, Fig. 4 and Fig. 5, specifically, cleaning base plate method of the present invention utilizes a fluid ejecting device, to reach cleaning, this fluid nozzle device comprises: about two fluid nozzles being set up in parallel 1, wherein, being arranged in Fig. 2 right side is a fluid nozzle 1, and being positioned at left side is also a fluid nozzle 1.The structure of two fluid nozzles 1 is slightly different, below structure for convenience of description, is first explain for right side fluid nozzle 1.Besides the difference of bright left side fluid nozzle.Each fluid nozzle 1 includes head body 2, room 3, air inlet pipe 4, feed tube 5 and multiple injection runners 6.
Head body 2 outward appearance is substantially in cuboid, and include one first lateral surface 210, one in contrast to the second lateral surface 211 of the first lateral surface 210, two joint faces 212 connecting the first lateral surface 210 and the second lateral surface 211 respectively, first interior sidewall surface 213 of the one opposing joint face 212 in front side, one along a first direction D1 and the first interior sidewall surface 213 separately and second interior sidewall surface 214 opposing with the joint face 212 of rear side, connect wall surface 216 in an inner roof wall face 215 and of the first interior sidewall surface 213 and the second interior sidewall surface 214, and one in contrast to the outer bottom wall 217 of interior wall surface 216.
Room 3 is substantially the space of cuboid, it is formed at head body 2 D1 extension in the first direction, two opposition sides of room 3 are the first interior sidewall surface 213 and the second interior sidewall surface 214 respectively, and the end face of room 3 is inner roof wall face 215, and the bottom surface of room 3 is interior wall surface 216.
Air inlet pipe 4 is arranged at the top of head body 2, and connects inner roof wall face 215 and connection room 3.
Consulting Fig. 4, Fig. 5 and Fig. 6, feed tube 5 extends from joint face 212 D1 in the first direction of the front side of contiguous head body 2 and one end connects the second interior sidewall surface 214.Feed tube 5 includes the inlet 51 of contiguous first interior sidewall surface 213, and two in contrast to air inlet pipe 4 side spaced apart and connection room 3 and D1 extends in the first direction ejiction opening 52.Air inlet pipe 4 is arranged at the top of head body 2 central authorities, and the definition one axis L by air inlet pipe 4, two ejiction openings 52 all tilt an inclination alpha relative to axis L.In the present embodiment, feed tube 5 includes two ejiction openings 52, but is not limited, feed tube 5 also can only include one in contrast to air inlet pipe 4 side and connect with room 3 and in the first direction D1 extend ejiction opening 52；The inclination alpha of the present embodiment is 30 degree, but is not limited, and can adjust inclination alpha according to actual demand.
Described injection runner 6 each other in the first direction D1 separately and be formed at head body 2, and the interior wall surface 216 of connection head body 2 and outer bottom wall 217.It is preferred that described injection runner 6 tilts to extend to outer bottom wall 217 towards the first lateral surface 210 from interior wall surface 216.The caliber of described injection runner 6 and Design of length are long and narrow, contribute to fluid and flow through injection runner 6, make fluid velocity promote.
It should be noted that, as shown in Figure 4, it is positioned at the described injection runner 6 that right side is fluid nozzle 1 to tilt to extend to outer bottom wall 217 towards the first lateral surface 210 from wall surface 216, namely described injection runner 6 is tilted to the right, the fluid nozzle 1 being positioned at left side is roughly the same with the fluid nozzle 1 on right side, difference place is in that the setting direction of described injection runner 6, the described injection runner 6 that left side is fluid nozzle 1 tilts to extend to outer bottom wall 217 towards first lateral surface 210 in left side from interior wall surface 216, and namely described injection runner 6 is tilted to the left.Specifically, the described injection runner 6 of two fluid nozzles 1 is symmetrically towards outer incline.
Consult Fig. 2, should be noted that, two fluid nozzles 1 are to be affixed with the second lateral surface 211 of its head body 2 to be set up in parallel, respective first lateral surface 210 of two head body 2 is positioned at two opposition sides of this fluid nozzle device, use two fluid nozzles 1 mainly to increase and clean or remove substrate 9(as shown in Figure 7) efficiency of the coating substance on surface or polluter, to promote production capacity.In the present embodiment, two fluid nozzles 1 are to be set up in parallel, but are not limited, and two fluid nozzles 1 may also be setting spaced apart.
Consulting Fig. 1, Fig. 7 and Fig. 8, following description utilizes the operating process of fluid nozzle device cleaning base plate method of the present invention, and for convenience of description, is to coordinate a fluid nozzle 1 to explain.
When gas 8 enters room 3 by air inlet pipe 4, because of the set-up mode of feed tube 5 so that gas 8 flows through feed tube 5 and receives obstruction and be divided into two strands, then makes gas 8 toward dirty, it is to avoid gas 8 impacts directly down, and can reach average thrust；Simultaneously, owing to being that a large amount of after-treatment liquid 7 passes into feed tube 5, can first toward first direction D1 stream, then pass through two ejiction openings 52, and make after-treatment liquid 7 be more easy to diffusion downwards and flow to room 3, after-treatment liquid 7 can on average be accumulated in room 3, gas 8 on average advances each point after-treatment liquid 7 to flow through the injection runner 6 of correspondence and accelerate ejection, the injection runner 6 of contiguous inlet 51 can be made identical with the ejection speed of the after-treatment liquid 7 of the injection runner 6 away from inlet 51 by previous designs, the injection uniformity is substantially improved.
Specifically, when after-treatment liquid 7 flows out injection runner 6, now after-treatment liquid 7 contacts air and pressure declines, carbon dioxide 71 dissolubility declines, carbon dioxide 71 disengages from after-treatment liquid 7, carbon dioxide 71 volume rapid expanding and loss are to air, and treatment fluid 72 can erupt with carbon dioxide 71 loss, improve treatment fluid 72 and clean or remove the coating substance on substrate 9 surface or the ability of polluter and efficiency, the cleaning efficiency making substrate 9 is substantially improved, to increase the impulsive force on treatment fluid 72 contact substrate 9 surface, contribute to successive process to process, and then improving product qualification rate.
The after-treatment liquid 7 utilized due to this cleaning base plate method is deionized water (DeionizedWater, DIW) carbon dioxide 71 is added, gas 8 is dry compression air (CleanDryAir, CDA), these two kinds of fluids there is no reluctant waste water after cleaning, compared to the process of the chemical agent after the cleaning of prior art, more environmental protection on processing procedure.
On the other hand, the treatment fluid 72 of after-treatment liquid 7 adds the mode of carbon dioxide 71 be carbon dioxide 71 is be directly accessed treatment fluid pipe (not shown).When treatment fluid 72 flows, carbon dioxide 71 can be squeezed in treatment fluid 72 uniformly, again because fluid nozzle device is belonging to intermittent injection after-treatment liquid 7, namely process and cleaned a plate base 9 when waiting next plate base 9, after-treatment liquid 7 flows into the pipeline of feed tube 5 and is blocked, now carbon dioxide 71 also can be squeezed in treatment fluid 72 uniformly, and make after-treatment liquid 7 include a certain proportion of carbon dioxide 71, treat that next plate base 9 comes then, fluid nozzle device can be opened after-treatment liquid 7 and flow into the pipeline of feed tube 5, this substrate 9 is cleaned according to aforementioned S1 to S4 step, quantitative carbon dioxide 71 can help after-treatment liquid 7 to clean this substrate 9, and make manufacturing process for cleaning stable, avoid because there being carbon dioxide 71 to precipitate out from treatment fluid 72, cause carbon dioxide 71 content in after-treatment liquid 7 uneven, and affect cleaning efficiency.
Supplementary notes, the quantity of described injection runner 6 and distribution can the diameter dimension of counterpart substrate 9 and adjust, therefore the present embodiment fluid nozzle device can once translate a long and narrow block of cleaning substrate 9, contributes to the lifting of cleaning efficiency.
Consult Fig. 9 and Figure 10, further, fluid nozzle device of the present invention also adjustable angle cleaning base plate 9, namely utilize a support (not shown) suspension strut fluid nozzle device, the axis L opposing substrate 9 making head body 2 creates an angle, as shown in Figure 9, the described injection runner 6 of right side fluid nozzle 1 adjust opposing substrate 9 be 90 degree (what refer to injection runner 6 extends perpendicularly to substrate 9) time, now, the described injection runner 6 of right side fluid nozzle 1 is with two different angles hydro-peening substrate 9 surfaces with the described injection runner 6 of left side fluid nozzle 1, compensate mutually the cleaning performance of different angles, and as shown in Figure 10, owing to substrate 9 surface is not smooth, but have the block of fluctuating projection, the region being difficult to stretch in shape more can be cleaned by being obliquely installed of fluid nozzle device.In the present embodiment, described injection runner 6 opposing substrate 9 that fluid nozzle device adjustment angle is the fluid nozzle 1 to adjust right side illustrates for 90 degree, but is not limited, and can adjust angle according to actual demand.
In sum, design by fluid nozzle 1, and supply is dissolved with the after-treatment liquid 7 of carbon dioxide 71 and the cleaning base plate method of gas 8 to fluid nozzle 1, when making after-treatment liquid 7 flow out injection runner 6, carbon dioxide 71 contacts air, carbon dioxide 71 can produce to expand and explosion, and treatment fluid 72 can be increased and clean or remove the coating substance on substrate 9 surface or the ability of polluter and efficiency, the cleaning efficiency making substrate 9 is substantially improved, contribute to successive process to process, and then improving product qualification rate；Furthermore, after-treatment liquid 7 there is no reluctant waste water with gas 8 after cleaning, more environmental protection on processing procedure, therefore really can reach the purpose of the present invention.
Claims (8)
1. applying a fluid nozzle for cleaning base plate method, this cleaning base plate method comprises the steps of (A) makes treatment fluid be dissolved with carbon dioxide, to form after-treatment liquid；(B) gas and after-treatment liquid are passed into this fluid nozzle, and gas extrusion after-treatment liquid flows downward；(C) after-treatment liquid is ejected on a substrate from this fluid nozzle；And (D) carbon dioxide disengages from after-treatment liquid, to increase the impulsive force on treatment fluid contact substrate surface；It is characterized in that: this fluid nozzle includes
One head body, including one first interior sidewall surface, one along a first direction and this first interior sidewall surface the second interior sidewall surface separately, an interior wall surface being connected this first interior sidewall surface and this second interior sidewall surface, and one in contrast to the outer bottom wall of this interior wall surface；
One room, is formed at this head body and extends along this first direction, two opposition sides of this room respectively this first interior sidewall surface and this second interior sidewall surface, and the bottom surface of this room is this interior wall surface；
One air inlet pipe, is arranged at the top of this head body and connects this room；
One feed tube, extends along this first direction and one end connects this second interior sidewall surface, and includes the inlet of this first interior sidewall surface contiguous, and at least one in contrast to this air inlet pipe side and connect this room the ejiction opening extended along this first direction；And
Multiple injection runners, separately and are formed at this head body along this first direction each other, and connect this interior wall surface and this outer bottom wall of this head body.
2. fluid nozzle according to claim 1, it is characterised in that: the ejiction opening quantity of this feed tube is two and spaced apart.
3. fluid nozzle according to claim 2, it is characterised in that: this air inlet pipe is arranged at the top of these head body central authorities, and the definition one axis by this air inlet pipe, described ejiction opening tilts an inclination angle relative to this axis.
4. fluid nozzle according to claim 1, it is characterised in that: described injection runner is long and narrow.
5. applying a fluid nozzle device for cleaning base plate method, this cleaning base plate method comprises the steps of (A) makes treatment fluid be dissolved with carbon dioxide, to form after-treatment liquid；(B) gas and after-treatment liquid are passed into this fluid nozzle, and gas extrusion after-treatment liquid flows downward；(C) after-treatment liquid is ejected on a substrate from this fluid nozzle；And (D) carbon dioxide disengages from after-treatment liquid, to increase the impulsive force on treatment fluid contact substrate surface；It is characterized in that: this fluid nozzle device comprises:
Two fluid nozzles, are arranged around, and respectively this fluid nozzle includes
One head body, including one first interior sidewall surface, one along a first direction and this first interior sidewall surface the second interior sidewall surface separately, an interior wall surface being connected this first interior sidewall surface and this second interior sidewall surface, and one in contrast to the outer bottom wall of this interior wall surface；
One room, is formed at this head body and extends along this first direction, two opposition sides of this room respectively this first interior sidewall surface and this second interior sidewall surface, and the bottom surface of this room is this interior wall surface；
One air inlet pipe, is arranged at the top of this head body and connects this room；
One feed tube, extends along this first direction and one end connects this second interior sidewall surface, and includes the inlet of this first interior sidewall surface contiguous, and at least one in contrast to this air inlet pipe side and connect this room the ejiction opening extended along this first direction；And
Multiple injection runners, separately and are formed at this head body along this first direction each other, and connect this interior wall surface and this outer bottom wall of this head body.
6. fluid nozzle device according to claim 5, it is characterised in that: respectively the ejiction opening quantity of this feed tube is two and spaced apart.
7. fluid nozzle device according to claim 6, it is characterised in that: respectively this air inlet pipe is arranged at the top of these head body central authorities of correspondence, and defines an axis by this corresponding air inlet pipe, and respectively this ejiction opening tilts an inclination angle relative to this corresponding axis.
8. fluid nozzle device according to claim 5, it is characterized in that: described injection runner is long and narrow, respectively this head body also includes one first lateral surface, respectively this first lateral surface of described head body is positioned at two opposition sides of this fluid nozzle device, and described injection runner this interior wall surface self-corresponding tilts to extend to this outer bottom wall of correspondence towards this corresponding first lateral surface.
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| CN201310394829.XA CN104415930B (en) | 2013-09-03 | 2013-09-03 | The fluid nozzle of application cleaning base plate method and fluid nozzle device |
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| CN201310394829.XA CN104415930B (en) | 2013-09-03 | 2013-09-03 | The fluid nozzle of application cleaning base plate method and fluid nozzle device |
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| CN104415930B true CN104415930B (en) | 2016-06-29 |
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| CN104785482A (en) * | 2015-04-20 | 2015-07-22 | 武汉华星光电技术有限公司 | Substrate cleaning method and device |
| CN104874500B (en) * | 2015-06-04 | 2017-02-01 | 北京七星华创电子股份有限公司 | Two-phase flow atomizing cleaner |
| CN110142160A (en) * | 2019-05-15 | 2019-08-20 | 厦门理工学院 | A kind of array dry ice spray head and gas-solid mixture production method |
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| JP3638511B2 (en) * | 2000-09-08 | 2005-04-13 | 大日本スクリーン製造株式会社 | Substrate cleaning device |
| JP4527660B2 (en) * | 2005-06-23 | 2010-08-18 | 東京エレクトロン株式会社 | Substrate processing method and substrate processing apparatus |
| JP4986566B2 (en) * | 2005-10-14 | 2012-07-25 | 大日本スクリーン製造株式会社 | Substrate processing method and substrate processing apparatus |
| JP2008153322A (en) * | 2006-12-15 | 2008-07-03 | Dainippon Screen Mfg Co Ltd | Two-fluid nozzle, substrate processor, and method for processing substrates |
| TWI469832B (en) * | 2008-12-17 | 2015-01-21 | Aqua Science Corp | Object cleansing method and object cleansing system |
| JP5650896B2 (en) * | 2009-09-03 | 2015-01-07 | 芝浦メカトロニクス株式会社 | Substrate processing apparatus and substrate processing method |
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