CN104409313B - A kind of mass of ion analytical equipment - Google Patents
A kind of mass of ion analytical equipment Download PDFInfo
- Publication number
- CN104409313B CN104409313B CN201410806707.1A CN201410806707A CN104409313B CN 104409313 B CN104409313 B CN 104409313B CN 201410806707 A CN201410806707 A CN 201410806707A CN 104409313 B CN104409313 B CN 104409313B
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- magnetic pole
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- analytical equipment
- vacuum cavity
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
- H01J49/34—Dynamic spectrometers
- H01J49/42—Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
- H01J49/34—Dynamic spectrometers
- H01J49/42—Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons
- H01J49/4205—Device types
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Abstract
The invention discloses a kind of mass of ion analytical equipment, including analysis magnet module and bunch vacuum module, described analysis magnet module includes pole plate and lower magnetic pole plate;Hollow yoke it is fixed with between upper pole plate and lower magnetic pole plate;Upper pole plate lower surface and lower magnetic pole plate upper surface within described hollow yoke are respectively fixed with magnetic pole and lower magnetic pole;Also include two hot-wire coil modules;Described hot-wire coil module includes that three middle parts offer the water-cooled assembly of through hole, and described three water-cooled assemblies are sequentially overlapped, and are provided with hot-wire coil between two adjacent water-cooled assemblies;Said two hot-wire coil module is respectively fitted on described upper magnetic pole and lower magnetic pole by described through hole.The present invention can guarantee that mass of ion analytical equipment has higher resolution and bigger mass number scope.
Description
Technical field
The present invention relates to semiconductor device manufacturing control system, particularly a kind of mass of ion analytical equipment.
Background technology
Raising along with integrated circuit processing technique, ion implantation device is had higher requirement, the kind of ion implanting element is more, the range of application of ion implantation device is wider, it can be applicable to the fields such as various material modification, semiconductor device manufacture and high power device such as SiC electronic device manufacture, and require that ion implantation device automaticity is higher, and simple to operation, working stability.
Existing mass of ion analytical equipment can inject the elementary gas such as boron, phosphorus, hydrogen, nitrogen, xenon, but cannot realize the injection of the metallic elements such as nickel, molybdenum, zirconium.
Summary of the invention
The technical problem to be solved is, not enough for prior art, it is provided that a kind of mass number scope is big, and the mass of ion analytical equipment that resolution is high both can inject the elementary gas such as boron, phosphorus, hydrogen, nitrogen, xenon, and can inject again the metallic elements such as nickel, molybdenum, zirconium.
For solving above-mentioned technical problem, the technical solution adopted in the present invention is: a kind of mass of ion analytical equipment, including analysis magnet module and bunch vacuum module, described analysis magnet module includes pole plate and lower magnetic pole plate;Hollow yoke it is fixed with between upper pole plate and lower magnetic pole plate;Upper pole plate lower surface and lower magnetic pole plate upper surface within described hollow yoke are respectively fixed with magnetic pole and lower magnetic pole;Installing hole is offered in described hollow yoke;Described bunch vacuum module includes the vacuum cavity of a both ends open;Offer water-cooling groove on described vacuum cavity inwall, in described water-cooling groove, water cooling tube is installed;One opening extenal fixation of described vacuum cavity has analysis light hurdle, and another opening of described vacuum cavity is connected with described yoke by described installing hole;Also include two hot-wire coil modules;Described hot-wire coil module includes that three middle parts offer the water-cooled assembly of through hole, and described three water-cooled assemblies are sequentially overlapped, and are provided with hot-wire coil between two adjacent water-cooled assemblies;Said two hot-wire coil module is respectively fitted on described upper magnetic pole and lower magnetic pole by described through hole.
Described water-cooled assembly includes cooled plate, offers water-cooling groove, be provided with water cooling tube in described water-cooling groove in described cooled plate.
It is fixed with in described vacuum cavity and the graphite cake of described vacuum cavity form fit, because contacting the pollution produced with the metal inner surface of vacuum cavity when can prevent ion implanting.
Described vacuum cavity is arranged in described installing hole by mounting flange, convenient dismounting, convenient for installation and maintenance.
Compared with prior art, the had the beneficial effect that present configuration of the present invention is compact, dismounts easy to maintenance;Hot-wire coil module is provided with water-cooled assembly, the upper and lower both sides of each coil are assembled with cooled plate, it is able to ensure that coil is by under big current conditions, hot-wire coil module still has good cooling effect, ensure that mass of ion analytical equipment has higher resolution and bigger mass number scope, both can inject the elementary gas such as boron, phosphorus, hydrogen, nitrogen, xenon, the metallic elements such as nickel, molybdenum, zirconium can be injected again, stable performance, perfect in shape and function.
Accompanying drawing explanation
Fig. 1 is one embodiment of the invention structural representation;
Fig. 2 is Magnet bunch analysis chart;
Fig. 3 is one embodiment of the invention analysis magnet modular structure schematic diagram;
Fig. 4 is one embodiment of the invention hot-wire coil module front view;
Fig. 5 is one embodiment of the invention cooled plate sectional view;
Fig. 6 is the A-A face sectional view of Fig. 5;
Fig. 7 is one embodiment of the invention bunch vacuum module front view;
Fig. 8 is one embodiment of the invention bunch vacuum module sectional view.
Detailed description of the invention
As it is shown in figure 1, one embodiment of the invention includes analysis magnet module 1, two hot-wire coil modules 2, bunch vacuum modules 3.
This mass of ion analytical equipment uses uniform magnetic field to be analyzed.Ion is under the effect of Lorentz force, and movement locus produces bending, and the ion of different quality and speed all can have oneself different deflected trajectory, thus reaches to sort the purpose of ion.The resolution capability of quality analysis apparatus directly influences the purity of ion, bunch adjustment capability, the key parameter such as efficiency of transmission also directly influencing bunch.In order to meet Specific Ion implanter process requirements, the resolution capability of this mass of ion analytical equipment is more than 100, its deflection angle 90 °;Deflection radius 350mm.Fig. 2 is the bunch analysis chart of this quality analysis apparatus Magnet.
As shown in Figure 3, analysis magnet module includes magnetic pole 13, lower magnetic pole 14, upper pole plate 11, lower magnetic pole plate 12, hollow yoke 15, installing hole is offered in hollow yoke 15, upper magnetic pole 13, lower magnetic pole 14 uses C-shaped configuration, ion mass resolution is high, preferable magnetic field can be produced between magnetic pole, different kinds of ions element can be sorted, its deflection angle is 90 °, deflection radius is 350mm, analyzing focus point is 350mm to exit facet distance, pole pitch is 50mm, ion mass resolution > 100, can sort by Specific Ion multiple to gaseous state and metal ion etc..
As shown in Figure 7,8, bunch vacuum module 3 includes the vacuum cavity 31 of a both ends open;Offer water-cooling groove on vacuum cavity 31 inwall, water cooling tube 32 is installed in water-cooling groove;The ion entrance end of vacuum cavity is fixed with analysis light hurdle 33, and another opening of vacuum cavity is connected with yoke 15 by installing hole.
As shown in Fig. 4~Fig. 6, hot-wire coil module 2 includes that three middle parts offer the water-cooled assembly 21 of through hole 22, and three water-cooled assemblies 21 are sequentially overlapped, and is provided with hot-wire coil 24 between two adjacent water-cooled assemblies 21;Two hot-wire coil modules 2 are respectively fitted on magnetic pole 13 and lower magnetic pole 14 by through hole 22.Water-cooled assembly 21 includes cooled plate, offers water-cooling groove 23, be provided with water cooling tube in described water-cooling groove in described cooled plate.
Vacuum cavity is fixed in yoke by mounting flange 36, and such vacuum cavity can independent from mass of ion analytical equipment be extracted out, it is easy to handling are safeguarded.Water cooling tube is embedded in the water-cooling groove of vacuum cavity both sides, improves the cooling effect of vacuum cavity;Analyze light hurdle and be arranged on ion beam porch, and analysis diaphragm board can be changed as required, thus it is controlled to realize ion beam line glancing incidence subtended angle;Vacuum cavity is embedded in high purity graphite plate, can reduce the pollution of overall bunch system.Bunch vacuum module can provide vacuum environment for mass of ion sorting, improves ion implanting quality.
Claims (6)
1. a mass of ion analytical equipment, including analysis magnet module (1) and bunch vacuum module (3), described analysis magnet module (1) includes pole plate (11) and lower magnetic pole plate (12);Hollow yoke (15) it is fixed with between upper pole plate (11) and lower magnetic pole plate (12);Upper pole plate (11) lower surface and lower magnetic pole plate (12) upper surface that described hollow yoke (15) is internal are respectively fixed with magnetic pole (13) and lower magnetic pole (14);Installing hole is offered on described hollow yoke (15);Described bunch vacuum module (3) includes the vacuum cavity (31) of a both ends open;Offer water-cooling groove on described vacuum cavity (31) inwall, water cooling tube (32) is installed in described water-cooling groove;One opening extenal fixation of described vacuum cavity has analysis light hurdle (33), and another opening of described vacuum cavity is connected with described yoke (15) by described installing hole;It is characterized in that, also include two hot-wire coil modules (2);Described hot-wire coil module (2) includes that three middle parts offer the water-cooled assembly (21) of through hole (22), and described three water-cooled assemblies (21) are sequentially overlapped, and are provided with hot-wire coil (24) between two adjacent water-cooled assemblies (21);Said two hot-wire coil module (2) is respectively fitted on described upper magnetic pole (13) and lower magnetic pole (14) by described through hole (22).
Mass of ion analytical equipment the most according to claim 1, it is characterised in that described water-cooled assembly (21) includes cooled plate, offers water-cooling groove (23), be provided with water cooling tube in described water-cooling groove in described cooled plate.
Mass of ion analytical equipment the most according to claim 1 and 2, it is characterised in that be fixed with the graphite cake (34) with described vacuum cavity (31) form fit in described vacuum cavity (31).
Mass of ion analytical equipment the most according to claim 3, it is characterised in that described vacuum cavity (31) is arranged in described installing hole by mounting flange (36).
Mass of ion analytical equipment the most according to claim 4, it is characterised in that described upper magnetic pole (13) and lower magnetic pole (14) are C-shaped configuration.
Mass of ion analytical equipment the most according to claim 5, it is characterised in that be cased with cover plate (35) outside described vacuum cavity (31).
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CN201410806707.1A CN104409313B (en) | 2014-12-22 | 2014-12-22 | A kind of mass of ion analytical equipment |
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CN201410806707.1A CN104409313B (en) | 2014-12-22 | 2014-12-22 | A kind of mass of ion analytical equipment |
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CN104409313A CN104409313A (en) | 2015-03-11 |
CN104409313B true CN104409313B (en) | 2016-08-17 |
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JP6813048B2 (en) * | 2019-03-27 | 2021-01-13 | 日新イオン機器株式会社 | Mass spectrometer |
CN112837885B (en) * | 2020-12-30 | 2023-01-24 | 四川红华实业有限公司 | Pole shoe wire inclusion in mass spectrometer electromagnet and forming method |
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US6182831B1 (en) * | 1997-10-07 | 2001-02-06 | University Of Washington | Magnetic separator for linear dispersion and method for producing the same |
CN101467217A (en) * | 2006-06-13 | 2009-06-24 | 山米奎普公司 | Ion beam apparatus and method for ion implantation |
CN101692369A (en) * | 2009-07-23 | 2010-04-07 | 胡新平 | Mass analyzing magnet for broadband ion beam and implanter system |
CN102203914A (en) * | 2008-11-13 | 2011-09-28 | 瓦里安半导体设备公司 | Mass analysis magnet for a ribbon beam |
CN103377865A (en) * | 2012-04-20 | 2013-10-30 | 北京中科信电子装备有限公司 | Broadband ion beam transmission method and ion implanter |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0765784A (en) * | 1993-08-24 | 1995-03-10 | Jeol Ltd | Magnetic field of mass spectrograph |
JP4345793B2 (en) * | 2006-09-27 | 2009-10-14 | 日新イオン機器株式会社 | Analysis electromagnet, control method thereof, and ion implantation apparatus |
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- 2014-12-22 CN CN201410806707.1A patent/CN104409313B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6182831B1 (en) * | 1997-10-07 | 2001-02-06 | University Of Washington | Magnetic separator for linear dispersion and method for producing the same |
CN101467217A (en) * | 2006-06-13 | 2009-06-24 | 山米奎普公司 | Ion beam apparatus and method for ion implantation |
CN102203914A (en) * | 2008-11-13 | 2011-09-28 | 瓦里安半导体设备公司 | Mass analysis magnet for a ribbon beam |
CN101692369A (en) * | 2009-07-23 | 2010-04-07 | 胡新平 | Mass analyzing magnet for broadband ion beam and implanter system |
CN103377865A (en) * | 2012-04-20 | 2013-10-30 | 北京中科信电子装备有限公司 | Broadband ion beam transmission method and ion implanter |
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