CN104391357A - Optical isolation method for large-power laser - Google Patents
Optical isolation method for large-power laser Download PDFInfo
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- CN104391357A CN104391357A CN201410650720.2A CN201410650720A CN104391357A CN 104391357 A CN104391357 A CN 104391357A CN 201410650720 A CN201410650720 A CN 201410650720A CN 104391357 A CN104391357 A CN 104391357A
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- grating
- laser
- diffraction
- wave plate
- light
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/34—Optical coupling means utilising prism or grating
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/32—Optical coupling means having lens focusing means positioned between opposed fibre ends
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
The invention relates to an optical isolation method for large-power laser, and belongs to the technical field of intense laser. The method comprises the following steps: arranging a laser source, a collimating lens and a half wave plate in a sequence, wherein the laser source is coaxial with the collimating lens and the half wave plate; determining grating-ruling spacing d according to the first-order diffraction condition of a diffraction equation; manufacturing a large-power diffraction type reflection grating; enable an optical axis to pass through the center of a grating after arranging to reach the half wave plate; enabling the laser source to send a laser beam to pass through the collimating lens and the half wave plate and finally be incident to the grating; driving the grating through piezoelectric ceramics to scan the angle of the grating and perform fine adjusting for an included angle between the grating and the optical axis until the incident laser can be completely output according to the first-order diffraction, so as to realize the optical isolation of the large-power laser. According to the method, the grating diffraction enables the optical isolation of the large-power laser up to 10,000w within any wavelength range, and the isolating efficiency is high; in addition, the adjusting is simple.
Description
Technical field
The present invention relates to a kind of light partition method for high power laser, belong to High-power Laser Technologies field.
Background technology
Optoisolator is in industry, and research application is more and more extensive.Normal light isolation can realize according to Faraday effect, as shown in Figure 1.But this kind of light isolation has certain restriction to the wavelength of light beam and power, isolates for high-power light, the light isolation of special wavelength, does not also have effective method at present.
Summary of the invention
The object of the invention is the problem in order to realize the isolation of high-power light, proposing a kind of light partition method for high power laser, utilize grating to realize the isolation of high power laser light.
For a light partition method for high power laser, concrete steps are as follows:
Step one, is arranged in order lasing light emitter, collimation lens, half-wave plate, lasing light emitter and collimation lens, the same optical axis of half-wave plate.
Step 2, the first-order diffraction condition according to diffraction equation:
d(sinα-sinβ)＝λ (1)
Wherein d is grating line spacing, and λ is the laser beam wavelength that lasing light emitter sends, and α is the incident angle that laser beam arrives grating, and β is the angle of diffraction of laser beam after grating.Determine grating line spacing d, make grating.α and β calculates according to the concrete angle requirement of light Quarantine Tasks.
Described grating is high-power diffraction type reflection grating, its bear power requirement 10000W and more than, its back side connect piezoelectric ceramics.Piezoelectric ceramic energy realizes the micro-control to grating slope angle.
Step 3, after grating alignment step 2 made to half-wave plate, optical axis is through the center of grating, and the corner dimension between grating normal and optical axis is α.
Step 4, lasing light emitter gives off laser beam, and through collimation lens, half-wave plate, incides on grating.Piezoelectric Ceramic grating, realizes the angle scanning of grating and finely tunes the corner dimension between grating and optical axis, and incident laser is exported according to first-order diffraction completely, realizes the light isolation of high power laser.
Step 5, the emergent light direction of step 4 is placed a level crossing and reflects it, adjustment level crossing angle, and light is fed back and again through grating, first-order diffraction occurs, its first-order diffraction light and former incident laser are not in opposite directions.Thus checking high power laser has realized light isolation.
Beneficial effect
Can realize isolating the light of the high power laser of the highest 10000w within the scope of any incident wavelength by optical grating diffraction, the isolation of special wavelength laser light can be realized, and realize high efficiency of isolation, and can regulate simple.Utilize high-power grating to realize the isolation of high power laser light, the wavelength of light beam and the traditional Faraday effect isolator of power ratio are had greatly improved.This design operation is simple, stable, has very strong practical value.
Accompanying drawing explanation
Fig. 1 uses Faraday effect to realize light isolation schematic diagram in background technology;
Fig. 2 is the schematic diagram that use grating that the present invention proposes realizes light isolation;
Fig. 3 is the vertical view of device embodiment in embodiment;
Label declaration: a-incident optical, incident GRIN, the c-polarizer of b-, d-Faraday rotator, e-analyzer, f-outgoing GRIN, g-outgoing optical fiber, B-magnetic field, 1-semiconductor cooler, 2-fiber laser, 3-aspheric collimation lens adjustment rack, 4-aspheric collimation lens AL, 5-light beam, 6-diffraction grating, 7-adjusting bracket moves plate, 8-piezoelectric ceramics, tuning for entirety, 9-micrometer adjusting screw, 10-output beam, 11-adjusting bracket determines plate, 12-HWP half-wave plate, 13-HWP half-wave plate adjustment rack.
Embodiment
Know-why of the present invention as shown in Figure 2, realizes light isolation by lasing light emitter, collimation lens AL, half-wave plate, grating GT.
Present embodiment provides device example as shown in Figure 3, comprises semiconductor cooler 1, fiber laser 2, aspheric collimation lens adjustment rack 3, aspheric collimation lens 4, diffraction grating 6, adjusting bracket moves plate 7, adjusting bracket piezoelectric ceramics 8, micrometer adjusting screw 9, adjusting bracket determines plate 11, half-wave plate 12.
Semiconductor cooler 1 is connected with fiber laser 2, carries out temperature control to fiber laser 2.Aspheric collimation lens 4 is arranged on aspheric collimation lens adjustment rack 3, fiber laser 2 and aspheric collimation lens 4, the same optical axis of half-wave plate 12.
Diffraction grating 6 is fixed on adjusting bracket and moves on plate 7, and piezoelectric ceramics 8 is pasted onto adjusting bracket and moves on plate 7, moves plate 7 drive diffraction grating 6 by adjusting bracket.Adjusting bracket moves plate 7 to be determined plate 11 with adjusting bracket and is connected, and micrometer adjusting screw 9 is arranged on adjusting bracket to be determined, on plate 11, to move plate 7 for integrated regulation.
Diffraction grating 6 is special gratings of the high damage threshold of customization, can carry 10000w luminous power.
Power 5000W wavelength is the laser beam that the fiber laser 2 of 1000nm sends, be 4mm through focal length, numerical aperture is after aspheric collimation lens 4 collimation of 0.6, with 25 ° of incident angles on the diffraction grating 6 that incisure density is 2400g/mm, groove size is 100mmX 100mm, thickness is 60mm, meet first-order diffraction equation, output beam 10 after first-order diffraction, output beam now has maximum diffraction efficiency.
This diffraction grating 6 does at a slow speed coarse adjustment on a large scale by piezoelectric ceramics 8, realizes angle scanning.Piezoelectric ceramics 8 is bonded in adjusting bracket and moves on plate 7, changes angle by micrometer adjusting screw 9.In the process changing angle, be fixed on the grating 6 that adjusting bracket moves on plate 7 and rotate together along with adjusting bracket moves plate 7, realize light isolation and amplifier.
Aspheric collimation lens adjustment rack 3 is for the adjustment of fixing aspheric mirror and laser beam datum, and diffraction grating 6 is fixed on adjusting bracket and moves on plate 7, and adjusting bracket moves plate 7 is determined on plate 11 micrometer adjusting screw adjustment by adjusting bracket.Adjusting bracket determines plate 11, semiconductor cooler 1, aspheric collimation lens adjustment rack 3 are all fixed on same base plate.
Grating in such scheme also can select other type, and size also can select other size, and optical maser wavelength can select other wavelength values, and lasing light emitter can select other lasing light emitters.
Claims (3)
1., for a light partition method for high power laser, it is characterized in that: comprise the steps:
Step one, is arranged in order lasing light emitter, collimation lens, half-wave plate, lasing light emitter and collimation lens, the same optical axis of half-wave plate;
Step 2, the first-order diffraction condition according to diffraction equation:
d(sinα-sinβ)＝λ (1)
Wherein d is grating line spacing, and λ is the laser beam wavelength that lasing light emitter sends, and α is the incident angle that laser beam arrives grating, and β is the angle of diffraction of laser beam after grating; Determine grating line spacing d, make grating;
Described grating is high-power diffraction type reflection grating, its power 10000W and more than, its back side connect piezoelectric ceramics;
Step 3, after grating alignment step 2 made to half-wave plate, optical axis is through the center of grating, and the corner dimension between grating normal and optical axis is α;
Step 4, lasing light emitter gives off laser beam, and through collimation lens, half-wave plate, incides on grating; Piezoelectric Ceramic grating, realizes the angle scanning of grating and finely tunes the corner dimension between grating and optical axis, and incident laser is exported according to first-order diffraction completely, realizes the light isolation of high power laser.
2. a kind of light partition method for high power laser according to claim 1, is characterized in that: α and β calculates according to the concrete angle requirement of light Quarantine Tasks.
3. a kind of light partition method for high power laser according to claim 1, is characterized in that: can realize isolating the light of the high power laser of the highest 10000w within the scope of any incident wavelength.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410650720.2A CN104391357A (en) | 2014-11-15 | 2014-11-15 | Optical isolation method for large-power laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410650720.2A CN104391357A (en) | 2014-11-15 | 2014-11-15 | Optical isolation method for large-power laser |
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| Publication Number | Publication Date |
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| CN104391357A true CN104391357A (en) | 2015-03-04 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201410650720.2A Pending CN104391357A (en) | 2014-11-15 | 2014-11-15 | Optical isolation method for large-power laser |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0801451B1 (en) * | 1996-04-10 | 2003-03-05 | Joachim Sacher | Tuning arrangement |
| CN101582561A (en) * | 2008-05-12 | 2009-11-18 | 中国计量科学研究院 | Grating diffraction external cavity semiconductor laser |
| CN102025106A (en) * | 2009-09-23 | 2011-04-20 | 中国计量科学研究院 | Grating external cavity semiconductor laser |
| CN102340100A (en) * | 2010-07-22 | 2012-02-01 | 中国计量科学研究院 | Grating outer-cavity laser and quasi-synchronization tuning method thereof |
-
2014
- 2014-11-15 CN CN201410650720.2A patent/CN104391357A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0801451B1 (en) * | 1996-04-10 | 2003-03-05 | Joachim Sacher | Tuning arrangement |
| CN101582561A (en) * | 2008-05-12 | 2009-11-18 | 中国计量科学研究院 | Grating diffraction external cavity semiconductor laser |
| CN102025106A (en) * | 2009-09-23 | 2011-04-20 | 中国计量科学研究院 | Grating external cavity semiconductor laser |
| CN102340100A (en) * | 2010-07-22 | 2012-02-01 | 中国计量科学研究院 | Grating outer-cavity laser and quasi-synchronization tuning method thereof |
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Application publication date: 20150304 |