CN104375388A - Multi-workpiece table direct-writing photoetching system - Google Patents
Multi-workpiece table direct-writing photoetching system Download PDFInfo
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- CN104375388A CN104375388A CN201410539094.XA CN201410539094A CN104375388A CN 104375388 A CN104375388 A CN 104375388A CN 201410539094 A CN201410539094 A CN 201410539094A CN 104375388 A CN104375388 A CN 104375388A
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Abstract
The invention discloses a multi-workpiece table direct-writing photoetching system, adopts a parallel exposure structure, and belongs to the direct-writing photoetching machine exposure technical field. The system includes multiple parallel workpiece tables and an optical system, wherein the multiple parallel workpiece tables are arranged on a support structure and mounted through a movement guide rail of the scanning direction, and the optical system is mounted through a movement guide rail at the stepping direction and realizes exposure of a substrate. Compared with a conventional single-workpiece table direct-writing photoetching technology, the system greatly reduces the complexity of the structure, and allows a conventional exposure process serially performed in sequence to be changed to the parallel exposure process, so as to greatly shorten the exposure time; compared with the capacity of the current mainstream single-workpiece table direct-writing exposure machine, the capacity is increased significantly. In addition, on one hand, the structural design is simplified, the vacuum adsorption effect can be better played, and the exposure quality and the production yield are improved; and on the other hand, due to the parallel design of the multiple workpiece tables, a focusing module and an alignment module are not required to move up and down, and any time consumption is not increased while the photoetching accuracy is ensured.
Description
Technical field
The present invention relates to a kind of direct-write photoetching system, specifically a kind of multi-work piece platform direct-write photoetching system, belongs to direct-write type lithography machine rapid scanning exposure technique field.
Background technology
Write-through photoetching technique be development in recent years faster, to substitute the direct transfer techniques of image of the traditional board-like photoetching technique of mask, in semiconductor and PCB production field, have more and more consequence.Can shortened process, and reduce manufacturing cost.
The direct-write type lithography machine of main flow carries out scan exposure mainly with single work stage mode greatly in the market, i.e. the workflow of serial.In single workpiece table system, carry out successively for the upper plate of the substrate that exposes, aligning, exposure, lower plate.According to current structural system, each operating process has reached the upper limit consuming time, is difficult to the running time shortening certain operation steps again, and namely the direct-write type lithography machine of single work stage is due to the serial nature of each operating process, has been difficult to improve production capacity again.
The direct-write type lithography machine of current employing double-workpiece-table design is all that at right angle setting mode carries out designing.Namely two work stage are up-down structure, due to two work stage drop in vertical direction, require that focus module and alignment modules must move up and down, which increase structural design difficulty, and move up and down frequently, the reduction of alignment precision can be caused and increase aligning consuming time.Too compact lifting workpiece platform structure also causes vacuum system to be difficult to install, and the substrate that the warpage of substrate itself and work stage cause in high-speed motion moves and all can reduce exposure quality and yield.
Summary of the invention
For above-mentioned prior art Problems existing, the invention provides a kind of multi-work piece platform direct-write photoetching system, make the script exposure process that serial is carried out in order become the exposure process of part parallel, effectively can shorten the time shutter of integral basis plate, significantly improve the production capacity of exposure machine.
To achieve these goals, this multi-work piece platform direct-write photoetching system comprises the parallel type multi-work piece platform installed by direction of scanning motion guide rail on the support structure; And to be installed by step direction motion guide rail, realize the light path system to base plate exposure.
Further, described parallel type multi-work piece platform is that left and right is arranged side by side, and carries substrate to be exposed.
Further, described direction of scanning motion guide rail carries the to-and-fro movement that multiple work stage independently does direction of scanning;
The range of movement of direction of scanning motion guide rail makes the longitudinal extent of multiple work stage be covered by light path system.
Further, the step direction motion guide rail carrying light path system of described installation light path system does the movement of step direction;
The scan exposure scope of whole light path system covers the lateral separation of whole multi-work piece platform.
Further, described supporting construction is gantry structure.
Compared with single work stage direct-write photoetching technology of the prior art, this multi-work piece platform direct-write photoetching system significantly reduces the complicacy of structure.Two work stage do not interfere with each other in respective perform region, a work stage is in the process of scan exposure, another work stage carries out the operating process such as upper and lower plates, aligning, the exposure process that serial is carried out in order is originally made to become parallel exposure process, highly shortened the time shutter, have significant increase than the production capacity of current main flow list workpiece desk-top write-through exposure machine.
In addition compared with work stage at right angle setting mode, the structural design that this multi-work piece platform direct-write photoetching system simplifies on the one hand, can better play vacuum suction effect, improves exposure quality and produces yield; On the other hand, due to the Parallel Design of two work stage, do not need focus module and alignment modules to move up and down, while guarantee lithographic accuracy, can not increase any consuming time.
Accompanying drawing explanation
Fig. 1 is agent structure schematic diagram of the present invention;
Fig. 2 is fundamental diagram of the present invention.
Embodiment
Below in conjunction with accompanying drawing, the present invention will be further described.
As shown in Figure 1, this multi-work piece platform direct-write photoetching system comprises the parallel type multi-work piece platform installed by direction of scanning motion guide rail on the support structure; And to be installed by step direction motion guide rail, realize the light path system to base plate exposure.Whole light path system is arranged on step direction motion guide rail, in exposure process, carry out transverse shifting with stepping axle.
Further, described parallel type multi-work piece platform is that left and right is arranged side by side, and carries substrate to be exposed.Multiple work stage is arranged on the motion guide rail of direction of scanning abreast, vertically moves respectively in exposure process with scan axis, completes the actions such as aligning, scan exposure.
Further, described direction of scanning motion guide rail carries the to-and-fro movement that multiple work stage independently does direction of scanning; The range of movement of direction of scanning motion guide rail makes the longitudinal extent of multiple work stage be covered by light path system.Realize parallel exposure process.Light path system according to different project organizations and design requirement, can increase or reduce illumination, imaging optical path, the most reasonably designing to be issued in different equipment performance demands.
Further, the step direction motion guide rail carrying light path system of described installation light path system does the movement of step direction; The scan exposure scope of whole light path system covers the lateral separation of whole multi-work piece platform.
Further, described supporting construction is gantry structure.Framework for whole system supports, and the design feature of marble gantry structure can well keep the stability of Platform movement, and has good isolation property.
As shown in Figure 2, for double-workpiece-table, the workflow of the serial in order such as script upper plate, aligning, exposure, lower plate can be improved as exposure with upper plate, aim at, lower plate classifies the workflow walked abreast, and reduces the whole plate running time, in order to improve production capacity.
When A work stage is while carrying out normal scan exposure, B work stage carries out the lower plate of last piece of substrate, and the upper plate of front substrate also carries out aligning preliminary work, and then to move to exposure reference position etc. to be exposed for B work stage.
After A work stage has exposed, light path system has moved on B work stage table top with stepping axle, starts to carry out scan exposure to B work stage.Meanwhile, A work stage exits carries out the work such as lower plate, upper next block substrate, aligning to home, then moves to exposure reference position etc. to be exposed.
Workflow as shown in Figure 2 moves in circles and carries out, and forms the work flow of ping-pong type, to walk abreast the object of carrying out to reach operating process.
As depicted in figs. 1 and 2, when using a set of light path system, respectively to the base board to explosure in A, B two work stage as shown in Figure 2, namely when increasing little cost, can significantly improve the production capacity of equipment.Structural design, wants simple a lot of relative to the method adopting up-down structure to place double-workpiece-table, such as, need not rethink the focus issues because different substrate thickness brings, need not rethink the alignment issues that up-down structure work stage is brought.
And for the work stage design of up-down structure, multi-work piece platform placed side by side can independent, non-interferingly move, whole exposing operation flow process can be simplified, and the effective travel of its guide rail is also shorter, only depend on the substrate sheet material size that designed equipment can be suitable for, such stability is better, and cost is lower.And the work stage design of up-down structure, the motion between two work stage has interference, can not independently move, and namely a work stage is when exposing, and another work stage wants timesharing to carry out alignment function, and therefore efficiency will reduce.The effective travel of its guide rail also can be longer.
In sum, this multi-work piece platform direct-write photoetching system significantly reduces the complicacy of structure, make the exposure process that serial is carried out in order originally become parallel exposure process, highly shortened the time shutter, have significant increase than the production capacity of current main flow list workpiece desk-top write-through exposure machine.In addition compared with work stage at right angle setting mode, the structural design that this multi-work piece platform direct-write photoetching system simplifies on the one hand, can better play vacuum suction effect, improves exposure quality and produces yield; On the other hand, due to the Parallel Design of multi-work piece platform, do not need focus module and alignment modules to move up and down, while guarantee lithographic accuracy, can not increase any consuming time.
Claims (5)
1. a multi-work piece platform direct-write photoetching system, is characterized in that,
Comprise the parallel type multi-work piece platform installed by direction of scanning motion guide rail on the support structure;
And to be installed by step direction motion guide rail, realize the light path system to base plate exposure.
2. a kind of multi-work piece platform direct-write photoetching system according to claim 1, is characterized in that,
Described parallel type multi-work piece platform is that left and right is arranged side by side, and carries substrate to be exposed.
3. a kind of multi-work piece platform direct-write photoetching system according to claim 1, is characterized in that,
Described direction of scanning motion guide rail carries the to-and-fro movement that multiple work stage independently does direction of scanning;
The range of movement of direction of scanning motion guide rail makes the longitudinal extent of multiple work stage be covered by light path system.
4. a kind of multi-work piece platform direct-write photoetching system according to claim 1, is characterized in that,
The step direction motion guide rail carrying light path system of described installation light path system does the movement of step direction;
The scan exposure scope of whole light path system covers the lateral separation of whole multi-work piece platform.
5. a kind of multi-work piece platform direct-write photoetching system according to claim 1, is characterized in that,
Described supporting construction is gantry structure.
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| CN201410539094.XA CN104375388B (en) | 2014-10-13 | 2014-10-13 | A kind of multi-work piece platform direct-write photoetching system |
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| CN201410539094.XA CN104375388B (en) | 2014-10-13 | 2014-10-13 | A kind of multi-work piece platform direct-write photoetching system |
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| CN104375388A true CN104375388A (en) | 2015-02-25 |
| CN104375388B CN104375388B (en) | 2016-09-14 |
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Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106066581A (en) * | 2016-08-02 | 2016-11-02 | 无锡影速半导体科技有限公司 | The exposure system of a kind of dual stage face write-through exposure machine and exposure method |
| CN107664927A (en) * | 2017-11-28 | 2018-02-06 | 苏州源卓光电科技有限公司 | A kind of novel sports platform architecture and workflow based on mask-free photolithography system |
| CN108303853A (en) * | 2016-11-22 | 2018-07-20 | 江苏影速光电技术有限公司 | A kind of removable light path direct write exposure machine of DMD structures XY multiaxises |
| CN108762007A (en) * | 2018-06-05 | 2018-11-06 | 苏州源卓光电科技有限公司 | A kind of raising exposure production capacity direct-write photoetching mechanism and its exposure method |
| CN109240048A (en) * | 2018-11-06 | 2019-01-18 | 无锡影速半导体科技有限公司 | A kind of multistation work stage single exposure molding direct-write photoetching system |
| CN110850687A (en) * | 2019-11-27 | 2020-02-28 | 江苏影速光电技术有限公司 | Laser direct-writing exposure system and exposure method for controlling board-out distance of platform |
| CN111399869A (en) * | 2020-02-28 | 2020-07-10 | 合肥芯碁微电子装备股份有限公司 | Method for controlling software upgrading of direct-writing exposure machine, control unit and exposure machine |
| CN111722469A (en) * | 2020-07-28 | 2020-09-29 | 苏州苏大维格科技集团股份有限公司 | Light guide plate lithography apparatus |
| CN112099315A (en) * | 2019-06-17 | 2020-12-18 | 上海微电子装备（集团）股份有限公司 | Photoetching equipment, control method and device thereof and storage medium |
| TWI726714B (en) * | 2019-06-19 | 2021-05-01 | 大陸商深圳凱世光研股份有限公司 | Cyclical scanning of exposure machine |
| CN113031404A (en) * | 2021-03-23 | 2021-06-25 | 合肥芯碁微电子装备股份有限公司 | Mass-production laser direct writing lithography machine and control method thereof |
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Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106066581A (en) * | 2016-08-02 | 2016-11-02 | 无锡影速半导体科技有限公司 | The exposure system of a kind of dual stage face write-through exposure machine and exposure method |
| CN108303853A (en) * | 2016-11-22 | 2018-07-20 | 江苏影速光电技术有限公司 | A kind of removable light path direct write exposure machine of DMD structures XY multiaxises |
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| CN107664927A (en) * | 2017-11-28 | 2018-02-06 | 苏州源卓光电科技有限公司 | A kind of novel sports platform architecture and workflow based on mask-free photolithography system |
| CN108762007A (en) * | 2018-06-05 | 2018-11-06 | 苏州源卓光电科技有限公司 | A kind of raising exposure production capacity direct-write photoetching mechanism and its exposure method |
| CN108762007B (en) * | 2018-06-05 | 2024-05-03 | 苏州源卓光电科技有限公司 | Direct-writing photoetching mechanism for improving exposure productivity and exposure method thereof |
| CN109240048A (en) * | 2018-11-06 | 2019-01-18 | 无锡影速半导体科技有限公司 | A kind of multistation work stage single exposure molding direct-write photoetching system |
| CN112099315B (en) * | 2019-06-17 | 2021-10-22 | 上海微电子装备（集团）股份有限公司 | Photoetching equipment, control method and device thereof and storage medium |
| CN112099315A (en) * | 2019-06-17 | 2020-12-18 | 上海微电子装备（集团）股份有限公司 | Photoetching equipment, control method and device thereof and storage medium |
| TWI726714B (en) * | 2019-06-19 | 2021-05-01 | 大陸商深圳凱世光研股份有限公司 | Cyclical scanning of exposure machine |
| CN110850687A (en) * | 2019-11-27 | 2020-02-28 | 江苏影速光电技术有限公司 | Laser direct-writing exposure system and exposure method for controlling board-out distance of platform |
| CN111399869A (en) * | 2020-02-28 | 2020-07-10 | 合肥芯碁微电子装备股份有限公司 | Method for controlling software upgrading of direct-writing exposure machine, control unit and exposure machine |
| CN111722469A (en) * | 2020-07-28 | 2020-09-29 | 苏州苏大维格科技集团股份有限公司 | Light guide plate lithography apparatus |
| CN113031404A (en) * | 2021-03-23 | 2021-06-25 | 合肥芯碁微电子装备股份有限公司 | Mass-production laser direct writing lithography machine and control method thereof |
| CN113031404B (en) * | 2021-03-23 | 2023-08-15 | 合肥芯碁微电子装备股份有限公司 | Mass production type laser direct writing lithography machine and control method thereof |
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Address after: 221000 west side of Hengshan Road, Pizhou City, Xuzhou City, Jiangsu Province Patentee after: Jiangsu Yingsu integrated circuit equipment Co., Ltd Address before: 221399 Huashan Road, Pizhou Economic Development Zone, Xuzhou, Jiangsu Patentee before: JIANGSU YINGSU PHOTOELECTRIC TECHNOLOGY Co.,Ltd. |